CN203338285U - Optical filter with touch effect and touch display module - Google Patents
Optical filter with touch effect and touch display module Download PDFInfo
- Publication number
- CN203338285U CN203338285U CN2013204004394U CN201320400439U CN203338285U CN 203338285 U CN203338285 U CN 203338285U CN 2013204004394 U CN2013204004394 U CN 2013204004394U CN 201320400439 U CN201320400439 U CN 201320400439U CN 203338285 U CN203338285 U CN 203338285U
- Authority
- CN
- China
- Prior art keywords
- conductive
- conductive pattern
- touch
- layer
- optical filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Optical Filters (AREA)
Abstract
The utility model relates to an optical filter with a touch effect. The optical fiber comprises a transparent substrate, a black light resistance layer and R/G/B color light resistance layers, wherein the black light resistance layer and the R/G/B color resistance layers are arranged on the transparent substrate at intervals in a covering mode. A grid-shaped conducting layer is arranged on one side, far from the transparent substrate, of the black light resistance layer in a covering mode. The conducting layer comprises first conducting patterns and second conducting patterns, and the first conducting patterns and the second conducting layers are arranged at intervals to form an induction structure. According to the optical filter with the touch effect, the conducting patterns used for generating the touch effect are arranged, when the optical filter with the touch effect is applied to a display module, a touch induction device does not need to be bonded additionally, therefore, the display module can have the touch effect, and thickness is small.
Description
Technical field
The utility model relates to the touch-control field, particularly relates to a kind of optical filter with the touch-control effect and uses the touch-control display module of this optical filter.
Background technology
At present, touch-screen has given information interaction brand-new looks, is extremely attractive brand-new information interaction equipment.The development of touch screen technology has caused the common concern of information medium circle, has become the Chaoyang new high-tech industry that the photoelectricity industry is a dark horse.
For the touch-control display device, the display device element that is absolutely necessary, but the element (as optical filter) that forms display device itself does not possess the touch-control sensing effect.Therefore as shown in Figure 1, the touch-control display device is mainly obtained by the mode that use cementing agent 130 is fitted entirely or the frame subsides are combined by touch control induction device 110 and display device 120 at present, therefore, during production, need a step by the technique of touch control induction device 110 and display device 120 laminatings, but the touch control display apparatus thickness obtained like this is thicker.
The utility model content
Based on this, be necessary to propose a kind of optical filter with the touch-control effect, make the display device of using this optical filter possess the touch-control effect and thickness less; A kind of touch-control display module that uses this optical filter also is provided in addition.
A kind of optical filter with the touch-control effect, comprise that transparent substrates, interval are covered in black light resistance layer and the R/G/B colorama resistance layer on described transparent substrates, wherein said black light resistance layer also is covered with and has latticed conductive layer away from a side of described transparent substrates, described conductive layer comprises the first conductive pattern and the second conductive pattern, and described the first conductive pattern and the second conductive pattern space arrange the formation induction structure.
Therein in embodiment, described black light resistance layer has lattice structure, the elementary cell of described R/G/B colorama resistance layer is positioned at described grid, described the first conductive pattern and the second conductive pattern are formed by the conductive thread on the gridline that is arranged on described black light resistance layer, and described conductive thread intersects the conductive grid unit that forms described the first conductive pattern and the second conductive pattern.
Therein in embodiment, described the first conductive pattern and the second conductive pattern obtain by the conductive layer etching be arranged on described black light resistance layer, the conductive material of described conductive layer is selected from metal, metal alloy, conducting polymer, at least one in Graphene, carbon nano-tube, ITO and conductive ink.
Therein in embodiment, described the first conductive pattern arranges continuously, described the second conductive pattern be take described the first conductive pattern and is divided into a plurality of electrode blocks as interval, between the adjacent electrode piece by the conduction connection of putting up a bridge, described conduction put up a bridge and described the first conductive pattern between pass through insulator separation.
In embodiment, described surface of insulating layer is provided with latticed groove therein, and the conductive material that described conduction is put up a bridge in being filled in described latticed groove forms.
Therein in embodiment, two conducting blocks that described conduction is latticed bridging wire and is positioned at two ends and is communicated with the bridging wire in the middle of putting up a bridge and comprising, described bridging wire is embedded in described surface of insulating layer, and described two conducting blocks penetrate described insulation course and are communicated to respectively an electrode block.
In embodiment, the live width of described bridging wire is 0.2～5 μ m, line-spacing 50～500 μ m therein.
Therein in embodiment, described conducting block and at least two conductive threads overlap joints in be connected each second conductive pattern.
In embodiment, described conduction is put up a bridge and is utilized the electrically conducting transparent ink to be put up a bridge therein, makes the electrode block of second conductive pattern at described conduction bridging two ends realize being electrically connected to and not being connected with described the first conductive pattern.
Therein in embodiment, 80%～120% of the live width of the gridline that the live width of described conductive grid unit conductive thread is described black light resistance layer.
In embodiment, described conductive grid unit is corresponding one by one with the elementary cell of described R/G/B colorama resistance layer therein.
Therein in embodiment, described conductive layer extends upward with second party on mutually orthogonal first direction, wherein on first direction or second direction or simultaneously on described first direction and second direction, the elementary cell of a plurality of complete R/G/B colorama resistance layers is held in the projection of conductive grid unit on described black light resistance layer.
Therein in embodiment, described conductive unit grid is done whole interrupting or the local continuous conductive thread of processing formation multirow that interrupts, multirow conductive thread compartment of terrain on the direction of row is connected simultaneously, forms the first conductive pattern and the second conductive pattern that a plurality of shape complementarities are semi-surrounding or entirely surround shape.
In embodiment, described conductive grid unit is the multiple lines and multiple rows setting, wherein has the equal integral body in conductive grid unit of multiple row or part to interrupt and form independently the first conductive pattern of multiple row therein; The conductive grid unit that is arranged in same a line simultaneously and is positioned at described the first conductive pattern both sides is all interrupted by integral body or part, and form a plurality of electrode blocks that described the first conductive pattern is interval of take, described electrode block forms described the second conductive pattern, and, on the direction of described row, described the second conductive pattern is formed with multirow.
In embodiment, the distance of two broken string nodes of the conductive thread of conductive grid unit is 0.5～50 μ m therein.
In embodiment, the thickness of described R/G/B colorama resistance layer is more than or equal to the integral thickness of black light resistance layer and conductive layer therein.
A kind of touch-control display module, comprise the aforesaid optical filter with the touch-control effect.
Therein in embodiment, described touch-control display module comprises the upper polaroid that stacks gradually, described with alignment film, liquid crystal, lower alignment film and transistor electrodes on the optical filter of touch-control effect.
In embodiment, described conductive layer is towards a side at described liquid crystal place therein.
The above-mentioned optical filter with the touch-control effect, be provided with for producing the conductive pattern of touch-control effect, while being applied to display module, without other sticking touch control induction installation, can guarantee that display module possesses the touch-control effect and thickness is little.
The optical filter of above-mentioned touch-control display module is with the touch-control effect, therefore possess the touch-control effect and thickness little.
The accompanying drawing explanation
The structural representation that Fig. 1 is traditional touch-control display device;
Fig. 2 is the schematic diagram with the partial structurtes of the optical filter of touch-control effect;
The cross-sectional view of the optical filter that Fig. 3 is embodiment mono-;
The structural representation of the conductive layer of the optical filter that Fig. 4 is embodiment mono-;
The schematic diagram of the first conductive pattern of the optical filter that Fig. 5 is embodiment mono-and the first generation type of the second conductive pattern;
The schematic diagram of the first conductive pattern of the optical filter that Fig. 6 is embodiment mono-and the second generation type of the second conductive pattern;
Four kinds of different corresponding situations of the conductive grid unit that Fig. 7 to Figure 10 is conductive layer and the elementary cell of optical filter colorama resistance layer R/G/B;
The cross-sectional view of the optical filter that Figure 11 is embodiment bis-;
The structural representation of the conductive layer of the optical filter that Figure 12 is embodiment bis-;
The schematic diagram of the first conductive pattern of the optical filter that Figure 13 is embodiment bis-and the first generation type of the second conductive pattern;
The schematic diagram of the first conductive pattern of the optical filter that Figure 14 is embodiment bis-and the second generation type of the second conductive pattern;
The schematic diagram of the another kind of bridge formation mode of the conductive layer of the optical filter that Figure 15 is embodiment bis-;
The schematic diagram of another bridge formation mode of the conductive layer of the optical filter that Figure 16 is embodiment bis-;
Figure 17 is the exploded view of use with the touch-control display module of the optical filter of touch-control effect.
Embodiment
Fig. 2 is the schematic diagram with the partial structurtes of the optical filter 200 of touch-control effect.This optical filter 200 comprise be arranged on transparent substrates (not shown in Fig. 2), interval is covered in black light resistance layer 220 and R/G/B colorama resistance layer 230 on transparent substrates.Wherein, black light resistance layer 220 is the photoresist with black dyes, and it is lattice structure, and the R/G/B elementary cell of R/G/B colorama resistance layer 230 is plated or is coated in grid region.Simultaneously, the gridline of black light resistance layer 220 is provided with latticed conductive layer 240.This conductive layer 240 is divided into the first conductive pattern and the second conductive pattern, and the first conductive pattern and the separate insulation of the second conductive pattern and spaced formation induction structure, make optical filter 200 possess the touch-control ability.Below in conjunction with concrete example, be described in detail.
Embodiment mono-
Please refer to Fig. 3 to Figure 10, is the cross-sectional view of the optical filter 300 of embodiment mono-.Optical filter 300 comprises transparent substrates 310, is covered in black light resistance layer 320 and R/G/B colorama resistance layer 330 on transparent substrates 310, and is covered in the conductive layer 340 on black light resistance layer 320.
In the present embodiment, the first conductive pattern 344 and the second conductive pattern 346 are individual layer multipoint configurations, they are to obtain by conductive layer 340 after etchings are set on black light resistance layer 320 and R/G/B colorama resistance layer 330, and in this process, are to use broken string to process to obtain the first conductive pattern 344 and the second conductive pattern 346 independent of one another and insulation.Please refer to Fig. 5 and Fig. 6, conductive layer 340 extends on mutually orthogonal first direction X and second direction Y, and the conductive grid unit 342 of conductive layer 340 is the multiple lines and multiple rows setting, each corresponding R/G/B unit, conductive grid unit 342.Herein, be respectively the direction of row and column with first direction X and second direction Y, the mode that broken string is processed is: conductive unit grid 342 is interrupted to (as shown in Figure 5) as integral body or processing (as shown in Figure 6) is interrupted in part, form the continuous conductive thread of multirow, multirow conductive thread compartment of terrain on second direction Y is connected simultaneously, form thus the first conductive pattern 344 and the second conductive pattern 346 that a plurality of independent, shape complementarities are semi-surrounding or entirely surround shape, the distance of two broken string nodes of the conductive thread of conductive grid unit 342 is generally 0.5～50 μ m.Herein, compartment of terrain is connected can comprise multiple situation, in the present embodiment, clips the conductive thread of a line the second conductive pattern 346 in two row conductive threads of the first conductive pattern 344, can certainly be the conductive thread that clips two row the second conductive patterns 346.
As shown in Figure 7, in above-described embodiment, it is in the situation that each corresponding R/G/B unit, conductive grid unit 342 carries out that broken string is processed.But it may be noted that also can there be other corresponding situation conductive grid unit 342 and R/G/B unit.Please refer to Fig. 8, on first direction X, the elementary cell of a plurality of R/G/B colorama resistance layers 330 is held in the projection of conductive grid unit 342 on black light resistance layer 220.Please refer to Fig. 9, on second direction Y, the elementary cell of a plurality of R/G/B colorama of the projection of a conductive grid unit 342 on black light resistance layer 220 resistance layer 330.Please refer to Figure 10, on first direction X and second direction Y, the elementary cell of a plurality of R/G/B colorama resistance layers 330 is held in the projection of conductive grid unit 342 on black light resistance layer 220 simultaneously.
Step 1, on the surface of transparent substrates, cover the black light resistance layer.At glass baseplate, at first use beam-plasma to carry out bombardment processing on as sillico aluminate glass or calcium soda-lime glass, remove the dirty of glass surface, and make surface ion, increase the cohesive force of follow-up transparent substrates and black and colorama resistance layer.Then, on the surface of transparent substrates, whole is coated with or plates the photoresist with black dyes, forms the black light resistance layer.
Step 2, on the surface of black light resistance layer, cover conductive layer.At plated surface one deck conducting film of black light resistance layer or be coated with one deck conductive ink as conductive layer.The conductive material of conductive layer can also be metal simple-substance as argent, metal alloy, conducting polymer, Graphene, carbon nano-tube, ITO etc.
Step 3, at conductive layer surface coated polymeric layer, and by exposure-developing makes the shape of residual polymeric layer corresponding with the shape of the first conductive pattern and the second conductive pattern.After the coated polymeric layer is photoresist, utilize exposure-developing technique only on the grid grid line of corresponding the first conductive pattern of needs and the second conductive pattern, to cover photoresist, other place (comprises needs broken string zone, the mode of its interrupt line is associated description with reference to figure 7 to Figure 10 and above) photoresist remove, the shape of the polymeric layer under residual like this is just corresponding with the shape of the first conductive pattern of needs and the second conductive pattern.
Wherein, the shape step corresponding with the shape of the first conductive pattern and the second conductive pattern of residual polymeric layer comprised:
Described polymeric layer is carried out to etching, form the latticed pattern of multiple lines and multiple rows;
Described grid is interrupted to processing,, obtain the first consistent with the first conductive pattern shape respectively pattern and consistent the second pattern with the second conductive pattern shape.The mode that wherein interrupts processing is;
Described grid is interrupted as integral body or interrupt part, form the continuous mesh lines of multirow and be connected multirow mesh lines compartment of terrain on the direction of row simultaneously, form the first pattern and the second pattern that a plurality of shape complementarities are semi-surrounding or entirely surround shape.The mode specifically interrupted also can with reference in above about the description of Fig. 7 to Figure 10.
Step 4, utilize described polymeric layer for mask layer, described conductive layer is carried out to etching, obtain separate, the first conductive pattern of insulation and the conductive unit grid of the second conductive pattern.Process owing to also having carried out broken string as the polymeric layer of mask layer before this, just directly obtained the first separate conductive pattern and the second conductive pattern when described conductive layer is carried out to etching.
Step 5, to utilize described polymeric layer and conductive layer be mask layer, and described black light resistance layer is carried out to etching, obtains the gridline of black light resistance layer.Still utilize aforementioned polymeric layer under residual and conductive layer as mask layer, utilize etching solution to carry out etching to the black light resistance layer, just obtained the gridline of black light resistance layer, the shape of the first conductive pattern and the conductive thread of the second conductive pattern is consistent with gridline.
Step 6, remove the polymeric layer of described conductive layer surface.
Step 7, plating or coat the R/G/B chromatic photoresist in the grid of black light resistance layer.In corresponding grid region, the R/G/B chromatic photoresist is plated/coats in gradation, has just obtained spaced black light resistance layer and colorama resistance layer.
In the preparation method of above-mentioned optical filter 300, the gridline of conductive layer and black light resistance layer is to utilize same mask layer to carry out etching, and the conductive grid unit of conductive layer does not need to be aimed at the grid of black light resistance layer, reduces task difficulty.In addition, because conductive thread is consistent with the gridline shape of black light resistance layer, and be covered in the side of black light resistance layer away from substrate of glass, even therefore the conductive thread vision is opaque, also can be sheltered from by the black light resistance layer, the user can not see conductive thread in use, thereby improve the user, experiences.The optical filter that the present embodiment obtains, the gridline of black light resistance layer is consistent with the shape of the conductive thread of the first conductive pattern and the second conductive pattern, also exists broken string to process.
The another kind of preparation method of the optical filter 300 of above-described embodiment is as follows:
Step 1, on the surface of transparent substrates, cover the black light resistance layer.At glass baseplate, at first use beam-plasma to carry out bombardment processing on as sillico aluminate glass or calcium soda-lime glass, remove the dirty of glass surface, and make surface ion, increase the cohesive force of follow-up transparent substrates and black and colorama resistance layer.Then, on the surface of transparent substrates, whole is coated with or plates the photoresist with black dyes, forms the black light resistance layer.
Step 2, on the surface of black light resistance layer, cover conductive layer.At plated surface one deck conducting film of black light resistance layer or be coated with one deck conductive ink as conductive layer.The conductive material of conductive layer can also be metal simple-substance as argent, metal alloy, conducting polymer, Graphene, carbon nano-tube, ITO etc.
Step 3, at conductive layer surface coated polymeric layer, and by exposure-developing makes the shape of residual polymeric layer corresponding with the shape of the first conductive pattern and the second conductive pattern.After the coated polymeric layer is photoresist, utilize exposure-developing technique only on the grid grid line of corresponding the first conductive pattern of needs and the second conductive pattern, to cover photoresist, the photoresist in other place (not comprising the broken string zone) is removed, residual like this photoresist is complete latticed, consistent with the grid shape of required black light resistance layer.
Step 4, utilize described polymeric layer for mask layer, described conductive layer is carried out to etching, obtain the conductive grid consistent with above-mentioned residual photoresist shape, should be noted that conductive grid now is complete grid, the processing of also breaking.
Step 5, to utilize described polymeric layer and conductive layer be mask layer, and described black light resistance layer is carried out to etching, obtains the gridline of black light resistance layer.Still utilize aforementioned polymeric layer under residual and conductive layer as mask layer, utilize etching solution to carry out etching to the black light resistance layer, just obtained the gridline of black light resistance layer, should be noted that the gridline of the black light resistance layer that the present embodiment obtains is complete grid, the processing of breaking.
Step 6, remove the residual polymeric layer of described conductive layer surface (because this polymeric layer is photoresist, when the black light resistance layer is carried out to etching, this polymeric layer also can suffer etching, shape is destroyed, need to re-start and cover), again cover again the one layer of polymeric layer, and by exposure-develop, the first conductive pattern and the second conductive pattern polymeric layer of processing corresponding position that need to break is removed.Again, after being coated with polymeric layer and being photoresist, utilize exposure-developing technique that the first conductive pattern and the second conductive pattern regional photoresist that need to break is removed to (mode of its interrupt line is with reference to figure 7 to Figure 10 and middle associated description above).
Step 7, utilize described polymeric layer for mask layer, described conductive layer is carried out to etching again, obtain separate, the first conductive pattern of insulation after broken string is processed and the conductive thread of the second conductive pattern.
Step 8, polymeric layer is removed.
Step 9, plating or coat the R/G/B chromatic photoresist in the grid of black light resistance layer.In corresponding grid region, the R/G/B chromatic photoresist is plated/coats in gradation, has just obtained spaced black light resistance layer and colorama resistance layer.
In the preparation method of above-mentioned optical filter 300, the gridline of conductive layer and black light resistance layer is to utilize same mask layer to carry out etching, and the conductive grid unit of conductive layer does not need to be aimed at the grid of black light resistance layer, reduces task difficulty.In addition, because conductive thread is covered in the side of black light resistance layer away from substrate of glass, even therefore the conductive thread vision is opaque, can be sheltered from by the black light resistance layer, the user can not see conductive thread in use yet, thereby improve the user, experiences.Further, the black light resistance layer of the optical filter that the present embodiment makes is complete grid, and the processing of breaking, so can prevent that the black light resistance layer from affecting user's experience because broken string causes light leak.
Embodiment bis-
Please refer to Figure 11 to Figure 14, is the cross-sectional view of the optical filter 400 of embodiment bis-.Optical filter 400 comprises transparent substrates 410, is covered in black light resistance layer 420 and R/G/B colorama resistance layer 430 on transparent substrates 410, and is covered in the conductive layer 440 on black light resistance layer 420.
With embodiment mono-, transparent substrates 410 can be sillico aluminate glass or calcium soda-lime glass.Black light resistance layer 420 is lattice structure, and the R/G/B elementary cell of R/G/B colorama resistance layer 430 is plated or is coated in grid region, makes black light resistance layer 420 and R/G/B colorama resistance layer 430 spaced.Conductive layer 440 is to be located on the one side of black light resistance layer 420 away from transparent substrates 410.
In the present embodiment, the conductive pattern of conductive layer 440 is to adopt conduction bridging mode.Conductive layer 440 comprises the first conductive pattern 444 and the second conductive pattern 446, wherein the first conductive pattern 444 arranges continuously, the second conductive pattern 446 be take the first conductive pattern 444 and is divided into a plurality of electrode blocks 4462 as interval, put up a bridge and 448 connect by conduction between adjacent electrode piece 4462, and conduction is put up a bridge and isolated by insulation course 450 between the 448 and first conductive pattern 444.Conduction bridging 448 can adopt conductive ink to obtain by silk-screen or inkjet printing, also can obtain by the impression mode, will further describe hereinafter.
Similar with embodiment mono-, the first conductive pattern 444 and the second conductive pattern 446 obtain by etching on conductive layer 440, and in this process, are to use broken string to process to obtain the first conductive pattern 444 and the second conductive pattern 446 independent of one another and insulation.Please refer to Figure 13 and Figure 14, conductive layer 440 extends on mutually orthogonal first direction X and second direction Y, and the conductive grid unit 442 of conductive layer 440 is the multiple lines and multiple rows setting, each corresponding R/G/B unit, conductive grid unit 442.Herein, be respectively the direction of row and column with first direction X and second direction Y, the mode that broken string is processed is: X is upper in a first direction, has the conductive grid unit 442 of multiple row to be interrupted processings (ginseng Figure 13) by integral body or first conductive pattern 444 of processing (ginseng Figure 14) with the formation multiple row interrupted in part; Meanwhile, the conductive grid unit that is arranged in same a line and is positioned at the first conductive pattern 444 both sides is all interrupted by integral body or part, and form a plurality of electrode blocks 4462 that the first conductive pattern 444 is interval of take, and on second direction Y, there is the conductive grid unit 442 of multirow to do the above-mentioned processing that interrupts, form thus a plurality of the second conductive patterns 446.An electrode block 4462 can comprise one or more conductive grids unit 442.
Identical with embodiment mono-, in the present embodiment, also can there be multiple corresponding situation each conductive grid unit 342 with the R/G/B unit.That is, can be on first direction or second direction or simultaneously on described first direction and second direction, the elementary cell of a plurality of complete R/G/B colorama resistance layers 430 is held in the projection of conductive grid unit 442 on black light resistance layer 420.
Please refer to Figure 11, when conduction is built bridge 448 employing electrically conducting transparent ink, optical filter 400 the first preparation methods of the present embodiment are as follows:
Step 1, on the surface of transparent substrates, cover the black light resistance layer.At glass baseplate, at first use beam-plasma to carry out bombardment processing on as sillico aluminate glass or calcium soda-lime glass, remove the dirty of glass surface, and make surface ion, increase the cohesive force of follow-up transparent substrates and black and colorama resistance layer.Then, in the front, surface of transparent substrates, be coated with or plate the photoresist with black dyes, form the black light resistance layer.
Step 2, on the surface of black light resistance layer, cover conductive layer.At plated surface one deck conducting film of black light resistance layer or be coated with one deck conductive ink as conductive layer.The conductive material of conductive layer can be metal simple-substance as argent, metal alloy, conducting polymer, Graphene, carbon nano-tube, ITO.
Step 3, at conductive layer surface coated polymeric layer, and by exposure-developing makes the shape of residual polymeric layer corresponding with the shape of the first conductive pattern and the second conductive pattern.After the coated polymeric layer is photoresist, utilize exposure-developing technique only on the grid grid line of corresponding the first conductive pattern of needs and the second conductive pattern, to cover photoresist, other place (comprises needs broken string zone, the mode of broken string is associated description with reference to figure 7 to Figure 10 and above) photoresist remove, the shape of the polymeric layer under residual like this is just corresponding with the shape of the first conductive pattern of needs and the second conductive pattern.
Wherein, the shape step corresponding with the shape of the first conductive pattern and the second conductive pattern of residual polymeric layer specifically comprised:
Described polymeric layer is carried out to etching, form the latticed pattern of multiple lines and multiple rows;
Described grid is interrupted to processing, obtained the first consistent with the first conductive pattern shape respectively pattern and consistent the second pattern with the second conductive pattern shape.The mode that wherein interrupts processing is:
The grid of multiple row is all made to integral body or local interrupted and form independently first pattern consistent with the first conductive pattern shape of multiple row, the grid that will be arranged in same a line simultaneously and be positioned at described the first pattern both sides all makes integral body or processing is interrupted in part, and form a plurality of the second pattern units that described the first pattern is interval of take, described the second pattern unit forms second pattern consistent with described the second conductive pattern shape, and, on the direction of described row, form described the second pattern of multirow.The mode specifically interrupted can with reference in above about the description of Fig. 7 to Figure 10.The purpose interrupted is to make the shape of polymeric layer consistent with the pattern form of conductive layer, so that conductive layer is carried out to etching.
Step 4, utilize described polymeric layer for mask layer, described conductive layer is carried out to etching, obtain separate, the first conductive pattern of insulation and the conductive unit grid of the second conductive pattern, wherein the second conductive pattern be take the first conductive pattern and is divided into a plurality of electrode blocks as interval.Wherein, utilize the second pattern unit etching will obtain the electrode block of the second conductive pattern.
Step 5, to utilize described polymeric layer and conductive layer be mask layer, and described black light resistance layer is carried out to etching, obtains the gridline of black light resistance layer.Still utilize polymeric layer under residual as mask layer, utilize etching solution to carry out etching to the black light resistance layer, just obtained the gridline of black light resistance layer, the conductive thread shape of the first conductive pattern and the second conductive pattern is consistent with gridline.
Step 6, remove the polymeric layer of described conductive layer surface.
Step 7, plating or coat the R/G/B chromatic photoresist in the grid of black light resistance layer.In corresponding grid region, the R/G/B chromatic photoresist is plated/coats in gradation, has just obtained spaced black light resistance layer and colorama resistance layer.
Step 8, employing inkjet printing or screen printing technique cover the layer of transparent insulation course at the second conductive pattern and the first conductive pattern intersection.Cover the layer of transparent insulation course at needs bridge formation place.
Step 9, employing inkjet printing or screen printing technique cover the layer of transparent conductive ink and put up a bridge as conduction on described transparent insulating layer, make the electrode block of second conductive pattern at described conduction bridging two ends realize being electrically connected to and not being connected with described the first conductive pattern.The material of electrically conducting transparent ink is electrically conducting transparent macromolecular material or the conductive ink that comprises the nanometer grade gold metal particles, solidifies after-vision transparent.
In the first preparation method of above-mentioned optical filter 400, the gridline of conductive layer and black light resistance layer is to utilize same mask layer to carry out etching, and the conductive grid unit of conductive layer does not need to be aimed at the grid of black light resistance layer, reduces task difficulty.In addition, because conductive thread is consistent with the gridline shape of black light resistance layer, and be covered in the black light resistance layer away from substrate of glass one side, even therefore the conductive thread vision is opaque, can be sheltered from by the black light resistance layer, the user can not see conductive thread in use yet, thereby improve the user, experiences.The optical filter that the present embodiment obtains, the gridline of black light resistance layer is consistent with the shape of the conductive thread of the first conductive pattern and the second conductive pattern, also exists broken string to process.
The above-mentioned electrically conducting transparent ink that utilizes is as follows as the second preparation method of the optical filter 400 of conduction bridging:
Step 1, on the surface of transparent substrates, cover the black light resistance layer.At glass baseplate, at first use beam-plasma to carry out bombardment processing on as sillico aluminate glass or calcium soda-lime glass, remove the dirty of glass surface, and make surface ion, increase the cohesive force of follow-up transparent substrates and black and colorama resistance layer.Then, on the surface of transparent substrates, whole is coated with or plates the photoresist with black dyes, forms the black light resistance layer.
Step 2, on the surface of black light resistance layer, cover conductive layer.At plated surface one deck conducting film of black light resistance layer or be coated with one deck conductive ink as conductive layer.The conductive material of conductive layer can also be metal simple-substance as argent, metal alloy, conducting polymer, Graphene, carbon nano-tube, ITO etc.
Step 3, at conductive layer surface coated polymeric layer, and by exposure-developing makes the shape of residual polymeric layer corresponding with the shape of the first conductive pattern and the second conductive pattern.After the coated polymeric layer is photoresist, utilize exposure-developing technique only on the grid grid line of corresponding the first conductive pattern of needs and the second conductive pattern, to cover photoresist, the photoresist in other place (not comprising the broken string zone) is removed, residual like this photoresist is complete latticed, consistent with the grid shape of required black light resistance layer.
Step 4, utilize described polymeric layer for mask layer, described conductive layer is carried out to etching, obtain the conductive grid consistent with above-mentioned residual photoresist shape, should be noted that conductive grid now is complete grid, the processing of also breaking.
Step 5, to utilize described polymeric layer and conductive layer be mask layer, and described black light resistance layer is carried out to etching, obtains the gridline of black light resistance layer.Still utilize aforementioned polymeric layer under residual and conductive layer as mask layer, utilize etching solution to carry out etching to the black light resistance layer, just obtained the gridline of black light resistance layer, should be noted that the gridline of the black light resistance layer that the present embodiment obtains is complete grid, the processing of breaking.
Step 6, remove the residual polymeric layer of described conductive layer surface (because this polymeric layer is photoresist, when the black light resistance layer is carried out to etching, this polymeric layer also can suffer etching, shape is destroyed, need to re-start and cover), again cover again the one layer of polymeric layer, and by exposure-develop, the first conductive pattern and the second conductive pattern polymeric layer of processing corresponding position that need to break is removed.Again, after being coated with polymeric layer and being photoresist, utilize exposure-developing technique that the first conductive pattern and the second conductive pattern regional photoresist that need to break is removed to (mode of its interrupt line is with reference to figure 7 to Figure 10 and middle associated description above).
Step 7, to utilize the described polymeric layer again covered be mask layer, and described conductive layer is carried out to etching again, obtains separate, the first conductive pattern of insulation after broken string is processed and the conductive thread of the second conductive pattern.
Step 8, the described polymeric layer again covered is removed.
Step 9, plating or coat the R/G/B chromatic photoresist in the grid of black light resistance layer.In corresponding grid region, the R/G/B chromatic photoresist is plated/coats in gradation, has just obtained spaced black light resistance layer and colorama resistance layer.
Step 10, employing inkjet printing or screen printing technique cover the layer of transparent insulation course at the second conductive pattern and the first conductive pattern intersection.Cover the layer of transparent insulation course at needs bridge formation place.
Step 11, employing inkjet printing or screen printing technique cover the layer of transparent conductive ink and put up a bridge as conduction on described transparent insulating layer, make the electrode block of second conductive pattern at described conduction bridging two ends realize being electrically connected to and not being connected with described the first conductive pattern.The material of electrically conducting transparent ink is electrically conducting transparent macromolecular material or the conductive ink that comprises the nanometer grade gold metal particles, solidifies after-vision transparent.
In the preparation method of above-mentioned optical filter 400, the gridline of conductive layer and black light resistance layer is to utilize same mask layer to carry out etching, and the conductive grid unit of conductive layer does not need to be aimed at the grid of black light resistance layer, reduces task difficulty.In addition, because conductive thread is covered in the side of black light resistance layer away from substrate of glass, even therefore the conductive thread vision is opaque, can be sheltered from by the black light resistance layer, the user can not see conductive thread in use yet, thereby improve the user, experiences.Further, the black light resistance layer of the optical filter that the present embodiment makes is complete grid, and the processing of breaking, so can prevent that the black light resistance layer from affecting user's experience because broken string causes light leak.
The conduction bridge formation 448 of the optical filter 400 of the present embodiment can also adopt the impression mode to form, please refer to Figure 15, impression can be to obtain conduction with disposable method for stamping to build bridge 448,, after completing the step of plating/coating the R/G/B chromatic photoresist, carries out following steps:
Steps A, on the surface of described colorama resistance layer and described the first conductive pattern and the second conductive pattern, cover again the layer of transparent insulation course.
The impression block of the conduction bridging structural correspondence of step B, use and needs is impressed on described transparent insulating layer, make the protuberance of the impression block of corresponding conduction bridging two ends conducting block press to penetrate bright insulation course and be connected with the electrode block of second conductive pattern at corresponding interval, obtain and conduct electricity the nested groove of bridging structure.Please refer to Figure 16, tie up on insulation course 450 and impress out latticed groove, the two ends of this groove directly penetrate insulation course 450, and the centre of this groove does not penetrate insulation course 450.
Step C, to filled conductive material in above-mentioned groove and solidify, the conduction that obtains being communicated with adjacent two electrode blocks is put up a bridge.Conductive material can be metal simple-substance as Nano Silver, metal alloy, conducting polymer, Graphene, carbon nano-tube, ITO etc.Please refer to Figure 16, the two ends of conduction bridge formation 448 respectively are communicated with the electrode block of second conductive pattern 446.
In addition, conduction bridging 448 can also be that the mode that first adopts exposure imaging to obtain consent first forms the consent of conducting block, then impresses the latticed groove of formation, and then the filled conductive material forms and puts up a bridge.Under this kind of situation, please refer to Figure 16, two conducting blocks 4484 that are latticed bridging wire 4482 and are positioned at two ends and are communicated with bridging wire 4482 in the middle of conduction bridging 448 comprises, the wire 4482 of wherein putting up a bridge is embedded in insulation course 450 surfaces, two conducting blocks 4484 penetrate described insulation course 450 and are communicated to respectively an electrode block 4462, each conducting block 4484 at least with two conductive threads overlap joints in be connected electrode block 4462, conduction put up a bridge 448 with the first conductive pattern 444 between by described insulation course, separate.The live width of bridging wire 4482 is 0.2～5 μ m, and line-spacing 50～500 μ m, to guarantee the transparency of conduction bridging 448.Particularly, after the plating of completing steps seven/coat the R/G/B chromatic photoresist, carry out following steps:
Steps A, on the surface of described colorama resistance layer and described the first conductive pattern and the second conductive pattern, cover again one deck photoresist, and utilize mask plate to be exposed to described photoresist, and, by developing, two conducting block corresponding positions of putting up a bridge in follow-up conduction obtain respectively two photoresist mask layers that are connected with the electrode block of the second conductive pattern.
Step B, to the surface of the described conductive layer with the photoresist mask layer, be coated with the layer of transparent insulation course, the position between described two photoresist mask layers impresses out latticed bridging wire grooves and solidifies again.
Step C, described photoresist mask layer is removed, to form the conducting block groove that is communicated with surface of insulating layer and electrode block.
Step D, to filled conductive material in described bridging wire grooves and described conducting block groove and solidify, the conduction that obtains being communicated with adjacent two electrode blocks is put up a bridge.Photoetching glue laminated mask layer is removed rear formation consent, this consent obtains the conducting block 4482 at two ends after the filled conductive material also solidifies, form latticed bridging wire 4484 in the bridging wire grooves after the filled conductive material, present state as shown in figure 16.
Please refer to Figure 17; the application also provides a kind of touch-control display module 500, comprises the upper polaroid 510, the optical filter 520 with the touch-control effect, diaphragm 530, public electrode 540, upper alignment film 550, liquid crystal 560, lower alignment film 570, transistor electrodes 580 and the lower polaroid 590 that stack gradually.Optical filter 520 can be selected aforesaid optical filter 300 or optical filter 400, make touch-control display module 500 possess the touch-control display effect and thickness less.The conductive layer of optical filter 520 is towards a side at liquid crystal 560 places.
It may be noted that if it is polarized light source that touch-control display module 500 is used backlight, as OLED Organic Light Emitting Diode (Organic Light Emitting Diode) polarized light source, without lower polaroid 590, only have upper polaroid 510 to get final product.In certain embodiments, when thin film transistor (TFT) that transistor electrodes 580 is the wide-angle liquid crystal structure, without public electrode 540 and diaphragm 530.
The above embodiment has only expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (19)
1. the optical filter with the touch-control effect, comprise that transparent substrates, interval are covered in black light resistance layer and the R/G/B colorama resistance layer on described transparent substrates, it is characterized in that, wherein said black light resistance layer also is covered with and has latticed conductive layer away from a side of described transparent substrates, described conductive layer comprises the first conductive pattern and the second conductive pattern, and described the first conductive pattern and the second conductive pattern space arrange the formation induction structure.
2. the optical filter with the touch-control effect according to claim 1, it is characterized in that, described black light resistance layer has lattice structure, the elementary cell of described R/G/B colorama resistance layer is positioned at described grid, described the first conductive pattern and the second conductive pattern are formed by the conductive thread on the gridline that is arranged on described black light resistance layer, and described conductive thread intersects the conductive grid unit that forms described the first conductive pattern and the second conductive pattern.
3. the optical filter with the touch-control effect according to claim 2, it is characterized in that, described the first conductive pattern and the second conductive pattern obtain by the conductive layer etching be arranged on described black light resistance layer, the conductive material of described conductive layer is selected from metal, metal alloy, conducting polymer, at least one in Graphene, carbon nano-tube, ITO and conductive ink.
4. the optical filter with the touch-control effect according to claim 2, it is characterized in that, described the first conductive pattern arranges continuously, described the second conductive pattern be take described the first conductive pattern and is divided into a plurality of electrode blocks as interval, between the adjacent electrode piece by the conduction connection of putting up a bridge, described conduction put up a bridge and described the first conductive pattern between pass through insulator separation.
5. the optical filter with the touch-control effect according to claim 4, is characterized in that, described surface of insulating layer is provided with latticed groove, and the conductive material that described conduction is put up a bridge in being filled in described latticed groove forms.
6. according to the described optical filter with the touch-control effect of claim 4 or 5, it is characterized in that, two conducting blocks that described conduction is latticed bridging wire and is positioned at two ends and is communicated with the bridging wire in the middle of putting up a bridge and comprising, described bridging wire is embedded in described surface of insulating layer, and described two conducting blocks penetrate described insulation course and are communicated to respectively an electrode block.
7. the optical filter with the touch-control effect according to claim 6, is characterized in that, the live width of described bridging wire is 0.2～5 μ m, line-spacing 50～500 μ m.
8. the optical filter with the touch-control effect according to claim 6, is characterized in that, described conducting block and at least two conductive threads overlap joints in be connected each second conductive pattern.
9. the optical filter with the touch-control effect according to claim 4, it is characterized in that, described conduction is put up a bridge and is utilized the electrically conducting transparent ink to be put up a bridge, and makes the electrode block of second conductive pattern at described conduction bridging two ends realize being electrically connected to and not being connected with described the first conductive pattern.
10. the optical filter with the touch-control effect according to claim 2, is characterized in that, 80%～120% of the live width of the gridline that the live width of described conductive grid unit conductive thread is described black light resistance layer.
11. according to the optical filter with the touch-control effect claimed in claim 2, it is characterized in that, described conductive grid unit is corresponding one by one with the elementary cell of described R/G/B colorama resistance layer.
12. according to the optical filter with the touch-control effect claimed in claim 2, it is characterized in that, described conductive layer extends upward with second party on mutually orthogonal first direction, wherein on first direction or second direction or simultaneously on described first direction and second direction, the elementary cell of a plurality of complete R/G/B colorama resistance layers is held in the projection of conductive grid unit on described black light resistance layer.
13. the optical filter with the touch-control effect according to claim 2, it is characterized in that, described conductive unit grid is done whole interrupting or the local continuous conductive thread of processing formation multirow that interrupts, multirow conductive thread compartment of terrain on the direction of row is connected simultaneously, forms the first conductive pattern and the second conductive pattern that a plurality of shape complementarities are semi-surrounding or entirely surround shape.
14. the optical filter with the touch-control effect according to claim 2, is characterized in that, described conductive grid unit is the multiple lines and multiple rows setting, wherein has the equal integral body in conductive grid unit of multiple row or part to interrupt and form independently the first conductive pattern of multiple row; The conductive grid unit that is arranged in same a line simultaneously and is positioned at described the first conductive pattern both sides is all interrupted by integral body or part, and form a plurality of electrode blocks that described the first conductive pattern is interval of take, described electrode block forms described the second conductive pattern, and, on the direction of described row, described the second conductive pattern is formed with multirow.
15. according to the described optical filter with the touch-control effect of claim 13 or 14, it is characterized in that, the distance of two broken string nodes of the conductive thread of conductive grid unit is 0.5～50 μ m.
16. the optical filter with the touch-control effect according to claim 1 and 2, is characterized in that, the thickness of described R/G/B colorama resistance layer is more than or equal to the integral thickness of black light resistance layer and conductive layer.
17. a touch-control display module, is characterized in that, comprises the optical filter with the touch-control effect as described as arbitrary claim in claim 1 to 16.
18. touch-control display module according to claim 17, is characterized in that, described touch-control display module comprises the upper polaroid that stacks gradually, described with alignment film, liquid crystal, lower alignment film and transistor electrodes on the optical filter of touch-control effect.
19. touch-control display module according to claim 18, is characterized in that, described conductive layer is towards a side at described liquid crystal place.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013204004394U CN203338285U (en) | 2013-07-05 | 2013-07-05 | Optical filter with touch effect and touch display module |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013204004394U CN203338285U (en) | 2013-07-05 | 2013-07-05 | Optical filter with touch effect and touch display module |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203338285U true CN203338285U (en) | 2013-12-11 |
Family
ID=49706949
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2013204004394U Expired - Fee Related CN203338285U (en) | 2013-07-05 | 2013-07-05 | Optical filter with touch effect and touch display module |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203338285U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103389827A (en) * | 2013-07-05 | 2013-11-13 | 南昌欧菲光显示技术有限公司 | Light filter with touch effect, preparation method of light filter and touch display assembly |
| CN111341223A (en) * | 2020-04-09 | 2020-06-26 | 大连集思特科技有限公司 | Multilayer flexible transparent display circuit, display screen and manufacturing method thereof |
-
2013
- 2013-07-05 CN CN2013204004394U patent/CN203338285U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103389827A (en) * | 2013-07-05 | 2013-11-13 | 南昌欧菲光显示技术有限公司 | Light filter with touch effect, preparation method of light filter and touch display assembly |
| CN111341223A (en) * | 2020-04-09 | 2020-06-26 | 大连集思特科技有限公司 | Multilayer flexible transparent display circuit, display screen and manufacturing method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103389827A (en) | Light filter with touch effect, preparation method of light filter and touch display assembly | |
| US20140293160A1 (en) | Filter module and touch screen having the same | |
| CN203386176U (en) | Optical filter assembly and touch display assembly | |
| KR200479733Y1 (en) | Polarizer module, method of manufacturing the same and touch screen using the same | |
| CN103425327A (en) | Touch display screen and optical filter module thereof | |
| CN203338285U (en) | Optical filter with touch effect and touch display module | |
| CN103345335A (en) | Optical filter box, optical filter box manufacturing method and touch display screen | |
| CN103336382B (en) | Polarisation-filtration module and use the touch display screen of this polarisation-filtration module | |
| CN103345324B (en) | Touch display screen and optical filter box thereof | |
| CN203386167U (en) | Touch display screen and optical filter assembly thereof | |
| CN103399666B (en) | Optical filter box and touch display module | |
| CN203338293U (en) | Optical filter with touch effect and touch display module | |
| CN103345323A (en) | Touch display screen, optical filter assembly thereof and manufacturing method of optical filter assembly | |
| CN203276213U (en) | Optical filter assembly and touch display screen | |
| CN203178966U (en) | Touch display screen and optical filter module of touch display screen | |
| CN103425324A (en) | Light polarization and filtration module and touch display screen | |
| CN203338274U (en) | Polarized light filter module and touch display screen | |
| CN203338289U (en) | Optical filter assembly and touch displaying assembly | |
| CN103336623B (en) | Optical filter box and use the touch display screen of this optical filter box | |
| CN203386178U (en) | Optical filter module and touch display screen comprising optical filter module | |
| CN103336618B (en) | Polarisation filtration module and its preparation method and touch display screen | |
| CN103336617A (en) | Optical filter with touch effect, preparation method of optical filter and touch display assembly | |
| CN103336615A (en) | Optical filter assembly and touch display assembly | |
| CN203276210U (en) | Optical filter module and touch display screen comprising same | |
| CN103345319B (en) | Polarisation-filtration module and use the touch display screen of this polarisation-filtration module |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20170630 Address after: 330000 Jiangxi city of Nanchang province Huangjiahu road Nanchang economic and Technological Development Zone Patentee after: Nanchang OFilm Tech. Co.,Ltd. Address before: North to the East, 330013 in Jiangxi province Nanchang city Nanchang economic and technological development zones clove road Longtan ditch Co-patentee before: Shenzhen OFilm Tech Co.,Ltd. Patentee before: Nanchang Ofilm Display Tech Co.,Ltd. Co-patentee before: Suzhou OFilm Tech. Co.,Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20131211 Termination date: 20190705 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |