CN103367524A - Solar cell substrate treatment technology - Google Patents
Solar cell substrate treatment technology Download PDFInfo
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- CN103367524A CN103367524A CN2012100888907A CN201210088890A CN103367524A CN 103367524 A CN103367524 A CN 103367524A CN 2012100888907 A CN2012100888907 A CN 2012100888907A CN 201210088890 A CN201210088890 A CN 201210088890A CN 103367524 A CN103367524 A CN 103367524A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
An embodiment of the invention provides solar cell substrate treatment technology comprising the steps of providing a solar cell substrate; subjecting the substrate to texturing treatment; subjecting the substrate to ion diffusion treatment; removing phosphorosilicate glass at the edge of the substrate; forming an antireflective layer on the front face of the substrate; subjecting the back face of the substrate to polishing treatment by using a polishing solution before removing the phosphorosilicate glass at the edge of the substrate. According to the solar cell substrate treatment technology provided by the embodiment of the invention, the back face of the solar cell substrate is enabled to be flat by subjecting the back face of the substrate to polishing treatment through utilization of the polishing solution before removing the phosphorosilicate glass at the edge of the substrate, and therefore the back face of the solar cell substrate can be good in ohmic contact, the solar cell can be further improved in working voltage, and furthermore the solar cell can be improved in photoelectric conversion efficiency.
Description
Technical field
The present invention relates to technical field of solar cell manufacturing, be specifically related to a kind for the treatment of process of used for solar batteries substrate.
Background technology
In recent years, along with constantly the advocating and promoting the use of of clean energy resource, solar cell is rapidly developed, and more and more is applied to numerous areas, and still, the raising of light utilization efficiency is the key factor of restriction solar cell development all the time in the solar cell.
At present, the manufacturing process of conventional solar cell comprises that acid or alkaline etching form phosphorosilicate glass (boro-phospho-silicate-glass, the PSG) etching at matte, ion diffusion, edge, form the steps such as anti-reflecting layer, silk screen printing sintering, go-on-go test.Wherein, it is for the sensitive surface that makes solar cell forms coarse surface that acid or alkaline etching form matte, injects the probability that the light of inside solar energy battery reflects away from sensitive surface with reduction; Simultaneously, sensitive surface at solar cell forms anti-reflecting layer, can further reduce the probability that the light of inside solar energy battery reflects away from sensitive surface, improve the utilance of light, thereby improve the photoelectric conversion efficiency of solar cell, in this way, the photoelectric conversion efficiency of solar cell can reach 16%-17%.
On the other hand, the photoelectric conversion efficiency of solar cell and the operating voltage of solar cell have substantial connection, and in the identical situation of other parameters, operating voltage is larger, and photoelectric conversion efficiency is higher.And operating voltage is usually relevant with the ohmic contact of solar cell backside of substrate, and ohmic contact is better, and operating voltage is larger.But the ohmic contact of the backside of substrate of existing solar cell is generally relatively poor, and this has limited the further raising of solar cell photoelectric conversion efficiency to a great extent.
Summary of the invention
In view of this, the object of the present invention is to provide a kind for the treatment of process of ohmic contact of the solar cell backside of substrate that can improve, the defective that can't further improve with the relatively poor photoelectric conversion efficiency that causes solar cell of the ohmic contact that solves solar cell backside of substrate in the prior art.
For achieving the above object, one embodiment of the present of invention provide a kind for the treatment of process of used for solar batteries substrate, comprise
The used for solar batteries substrate is provided;
Making herbs into wool is carried out in described substrate to be processed;
The ion DIFFUSION TREATMENT is carried out in described substrate;
Remove the phosphorosilicate glass of described basal edge;
Front in described substrate forms anti-reflecting layer;
Wherein, also comprise before the phosphorosilicate glass of the described basal edge of described removal:
Use polishing fluid that polishing is carried out at the back side of described substrate.
Preferably, described use polishing fluid also comprises before polishing is carried out at the back side of described substrate:
Remove the phosphorosilicate glass of described backside of substrate.
Preferably, described polishing fluid comprises organic base, and described organic base is Tetramethylammonium hydroxide, and the volume fraction of described Tetramethylammonium hydroxide is 3%-5%.
Preferably, the temperature of described polishing is 70 ℃-85 ℃, and the time of described polishing is 90s-200s.
Preferably, the volume fraction of described Tetramethylammonium hydroxide is 4%, and the temperature of described polishing is 80 ℃, and the time of described polishing is 120s.
The treatment process of the used for solar batteries substrate of usefulness is provided according to the embodiment of the invention, by before the phosphorosilicate glass of removing this basal edge, using polishing fluid that polishing is carried out at the back side of this substrate, so that the back side of used for solar batteries substrate is more smooth, because the back side of substrate becomes smooth, thereby there is better ohmic contact at the back side that makes the solar cell substrate, can further improve the operating voltage of solar cell, and then improve the photoelectric conversion efficiency of solar cell.On the other hand, the backside of substrate of solar cell is more smooth, can make to inject light and can be recycled by Multi reflection at inside solar energy battery, has increased the utilance of solar cell to incident ray, promote the electric current of solar cell, thereby improve the conversion efficiency of solar cell.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art, the below will do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art, apparently, accompanying drawing in the following describes is some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the flow chart for the treatment of process of the used for solar batteries substrate of the embodiment of the invention;
Fig. 2 is the flow chart for the treatment of process of the used for solar batteries substrate of another embodiment of the present invention;
Fig. 3 is the shape appearance figure at the polysilicon chip back side of not passing through polishing of another embodiment of the present invention;
Fig. 4 is the shape appearance figure at the polysilicon chip back side of the warp polishing later of another embodiment of the present invention.
Embodiment
For the purpose, technical scheme and the advantage that make the embodiment of the invention clearer, below in conjunction with the accompanying drawing in the embodiment of the invention, technical scheme in the embodiment of the invention is clearly and completely described, obviously, described embodiment is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment among the present invention, those of ordinary skills belong to the scope of protection of the invention not making the every other embodiment that obtains under the creative work prerequisite.
The embodiment of the invention provides a kind for the treatment of process of used for solar batteries substrate, with the evenness of raising backside of substrate, thus the ohmic contact of raising solar cell backside of substrate, and then the photoelectric conversion efficiency of raising solar cell.Be illustrated in figure 1 as its flow chart, this treatment process comprises:
Step S101: the used for solar batteries substrate is provided.
Particularly, the substrate in the embodiment of the invention can be silicon chip, can be monocrystalline silicon piece, also can be polysilicon chip or amorphous silicon chip; Substrate in the embodiment of the invention can also be the material of other types.
Step S102: substrate surface is carried out making herbs into wool process, make the sensitive surface of substrate form matte, inject the probability that the light of inside solar energy battery reflect away by sensitive surface with reduction, promote light utilization, and then the photoelectric conversion efficiency of raising solar energy.
Particularly, the making herbs into wool in the embodiment of the invention is processed can adopt the cleaning and texturing technology, and cleaning and texturing is processed and can be carried out according to the following steps:
At first, can adopt deionized water that Ultrasonic Cleaning is carried out in substrate, with magazines such as the grease of removing substrate surface, paraffin;
Then, can adopt concentrated acid or concentrated alkali solution (such as dense potassium hydroxide solution) that substrate is corroded, to remove the damage layer of substrate surface;
At last, can adopt acid solution or aqueous slkali that substrate surface is carried out anisotropic etch, make substrate surface form inverted pyramid structure, form matte.
Step S103: the ion DIFFUSION TREATMENT is carried out in substrate, in substrate, form PN junction.
After substrate surface forms matte, adopt deionized water that it is cleaned, to remove unnecessary chemical liquids, then drying is carried out in substrate, particularly, can place drying oven to dry substrate, perhaps place drier to dry, perhaps adopt N
2Or IPA dries up.
Particularly, the ion DIFFUSION TREATMENT in the embodiment of the invention can adopt P diffusion or N diffusion, and this step can be carried out in diffusion furnace.
Step 104: use polishing fluid that polishing is carried out at the back side of substrate, make backside of substrate form even curface, with the ohmic contact of raising solar cell backside of substrate, so the operating voltage of raising solar cell, the photoelectric conversion efficiency of raising solar cell.
Need to prove that the treatment process in the embodiment of the invention only carries out polishing to the back side of substrate, this treatment step is on the not impact of front (being sensitive surface) of substrate.
Polishing fluid in the embodiment of the invention can be the polishing fluid of pernitric acid, organic base and other types, particularly, polishing fluid in the embodiment of the invention can be organic base, such as Tetramethylammonium hydroxide, its volume fraction is 3%-5%, the temperature of polishing can be 70 ℃-85 ℃, and the time of polishing can be 90s-200s.If polishing time is long, can make the thickness attenuation of polysilicon chip; If polishing time is too short, can't make the back side of polysilicon chip form comparatively even curface, do not reach preferably polishing effect.
In other embodiments of the invention, before adopting organic base that polishing is carried out at the back side of substrate, can also comprise the step of the phosphorosilicate glass of removing backside of substrate.Particularly, can adopt nitric acid, hydrofluoric acid, deionized water and sulfuric acid liquid to remove the phosphorosilicate glass of backside of substrate.Before being carried out polishing, the back side of substrate removes the phosphorosilicate glass of backside of substrate, can remove a little PSG of backside of substrate, in the polishing process, just can use the polishing fluid (such as Tetramethylammonium hydroxide) that does not react with PSG, thereby the back side of substrate can be carried out evenly complete polishing, improve polishing effect.
Step 105: the phosphorosilicate glass of removing basal edge; Remove the phosphorosilicate glass of basal edge, can prevent that solar cell from producing short circuit current.
Particularly, can adopt wet etching that the front and back of substrate is corroded, make etching edge narrow, prevent over etching.
Step S106: the front in substrate forms anti-reflecting layer, with the photoelectric conversion efficiency of further raising solar cell.
Particularly, can the using plasma chemical vapour deposition (CVD) or other deposition processs commonly used form anti-reflection film in the front of substrate, such as silicon nitride etc.
The treatment process of the used for solar batteries substrate of usefulness is provided according to the embodiment of the invention, by before the phosphorosilicate glass of removing this basal edge, using polishing fluid that polishing is carried out at the back side of this substrate, so that the back side of used for solar batteries substrate is more smooth, because the back side of substrate becomes smooth, thereby there is better ohmic contact at the back side that makes the solar cell substrate, can further improve the operating voltage of solar cell, and then improve the photoelectric conversion efficiency of solar cell.On the other hand, the backside of substrate of solar cell is more smooth, can make to inject light and can be recycled by Multi reflection at inside solar energy battery, has increased the utilance of solar cell to incident ray, promote the electric current of solar cell, thereby improve the conversion efficiency of solar cell.
Another embodiment of the present invention provides a kind for the treatment of process of used for solar batteries substrate, is illustrated in figure 2 as its flow chart, and wherein this substrate is polysilicon chip, and this treatment process may further comprise the steps:
Step S201: the polysilicon chip substrate is provided.
Step S202: adopt sour making herbs into wool technology that making herbs into wool is carried out on the surface of polysilicon chip and process, make the polysilicon chip surface form matte.
Step S203: adopt phosphorus that polysilicon chip is carried out the ion DIFFUSION TREATMENT, in polysilicon chip, form PN junction.
Step S204: adopting the ratio of nitric acid, hydrofluoric acid, deionized water, sulfuric acid is 1: 6: 7: 4 mixed liquor corrodes the back side of polysilicon chip, to remove a little PSG of the polysilicon chip back side, thereby the back side of polysilicon chip can be carried out evenly complete polishing, improve the effect of polishing.
Step S205: adopting volume fraction is that 4% tetramethyl ammonium hydroxide solution carries out polishing to the back side of polysilicon chip, and the temperature of polishing is 80 ℃, and the time of polishing is 120s.
Step S206: remove the phosphorosilicate glass at polysilicon chip edge, produce short circuit current to prevent solar cell.
Step S207: the using plasma chemical vapour deposition (CVD) forms anti-reflecting layer in the front of polysilicon chip, particularly, can form on the polysilicon chip surface silicon nitride and inject light from the positive probability that reflects away of polysilicon chip with reduction, further improve the photoelectric conversion efficiency of solar cell.
In the embodiment of the invention, in the identical situation of other manufacturing process, surface topography to the polysilicon chip back side after the back side of polysilicon chip not being adopted polishing and adopting polishing has been done test and contrast with the electrical property of the solar cell of making, wherein, step in the steps such as the manufacturing process of solar cell such as silk screen printing sintering, go-on-go test and the traditional handicraft is as good as, and does not repeat them here.Test result is as follows:
Be illustrated in figure 3 as the shape appearance figure at the polysilicon chip back side of not passing through polishing, as seen, the back side of polysilicon chip has formed matte; As shown in Figure 4, be the shape appearance figure through the polysilicon chip back side after the polishing, the back side of visible polysilicon chip has formed comparatively smooth plane.Table one does not pass through the electric performance test result of one group of solar cell of polishing for the back side of polysilicon chip; Table two is that the back side of polysilicon chip is through the electric performance test result of another group solar cell of polishing.
By table one and table two as can be known, the back side of polysilicon chip is significantly increased through operating voltage of another group solar cell of polishing, and operating current and maximum power improve simultaneously.In addition, the photoelectric conversion efficiency of solar cell is significantly improved, and has reached more than 17%.
Table one
Table two
The treatment process of the used for solar batteries substrate of usefulness is provided according to the embodiment of the invention, by before the phosphorosilicate glass of removing this basal edge, using polishing fluid that polishing is carried out at the back side of this substrate, so that the back side of used for solar batteries substrate is more smooth, because the back side of substrate becomes smooth, thereby there is better ohmic contact at the back side that makes the solar cell substrate, can further improve the operating voltage of solar cell, and then improve the photoelectric conversion efficiency of solar cell.On the other hand, the backside of substrate of solar cell is more smooth, can make to inject light and can be recycled by Multi reflection at inside solar energy battery, has increased the utilance of solar cell to incident ray, promote the electric current of solar cell, thereby improve the conversion efficiency of solar cell.
The above only is preferred implementation of the present invention; should be pointed out that for those skilled in the art, under the prerequisite that does not break away from the principle of the invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (5)
1. the treatment process of a used for solar batteries substrate comprises
The used for solar batteries substrate is provided;
Described substrate surface is carried out making herbs into wool to be processed;
The ion DIFFUSION TREATMENT is carried out in described substrate;
Remove the phosphorosilicate glass of described basal edge;
Front in described substrate forms anti-reflecting layer;
It is characterized in that, also comprise before the phosphorosilicate glass of the described basal edge of described removal:
Use polishing fluid that polishing is carried out at the back side of described substrate.
2. treatment process according to claim 1 is characterized in that, described use polishing fluid also comprises before polishing is carried out at the back side of described substrate:
Remove the phosphorosilicate glass of described backside of substrate.
3. treatment process according to claim 1 and 2 is characterized in that, described polishing fluid comprises organic base, and described organic base is Tetramethylammonium hydroxide, and the volume fraction of described Tetramethylammonium hydroxide is 3%-5%.
4. treatment process according to claim 3 is characterized in that, the temperature of described polishing is 70 ℃-85 ℃, and the time of described polishing is 90s-200s.
5. treatment process according to claim 4 is characterized in that, the volume fraction of described Tetramethylammonium hydroxide is 4%, and the temperature of described polishing is 80 ℃, and the time of described polishing is 120s.
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| CN201210088890.7A CN103367524B (en) | 2012-03-29 | 2012-03-29 | A kind of handling process of substrate used for solar batteries |
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| CN201210088890.7A CN103367524B (en) | 2012-03-29 | 2012-03-29 | A kind of handling process of substrate used for solar batteries |
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| CN103367524B CN103367524B (en) | 2017-03-15 |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5468652A (en) * | 1993-07-14 | 1995-11-21 | Sandia Corporation | Method of making a back contacted solar cell |
| CN102064232A (en) * | 2010-10-28 | 2011-05-18 | 中山大学 | Process applied to single-surface corroded p-n junction or suede structure of crystalline silicon solar cell |
| CN102208486A (en) * | 2011-04-18 | 2011-10-05 | 晶澳（扬州）太阳能科技有限公司 | Preparation method of MWT (Metal Wrap Through) solar cell |
-
2012
- 2012-03-29 CN CN201210088890.7A patent/CN103367524B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5468652A (en) * | 1993-07-14 | 1995-11-21 | Sandia Corporation | Method of making a back contacted solar cell |
| CN102064232A (en) * | 2010-10-28 | 2011-05-18 | 中山大学 | Process applied to single-surface corroded p-n junction or suede structure of crystalline silicon solar cell |
| CN102208486A (en) * | 2011-04-18 | 2011-10-05 | 晶澳（扬州）太阳能科技有限公司 | Preparation method of MWT (Metal Wrap Through) solar cell |
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Address after: Shen Gang Town Cheng Road Jiangyin city Jiangsu Province, Wuxi City, No. 1011, 214443 Applicant after: China National Building Materials Group Corporation Jetion Solar (China) Co., Ltd. Address before: Shen Gang Town Cheng Road Jiangyin city Jiangsu Province, Wuxi City, No. 1011, 214443 Applicant before: Jetion Solar(China) Co., Ltd. |
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Address after: 214443 No. 1011 Chengcheng Road, Shengang Town, Jiangyin City, Wuxi City, Jiangsu Province Patentee after: In building materials jetion science and Technology Co Ltd Address before: 214443 No. 1011 Chengcheng Road, Shengang Town, Jiangyin City, Wuxi City, Jiangsu Province Patentee before: China National Building Materials Group Corporation Jetion Solar (China) Co., Ltd. |
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