CN103323982B - 一种液晶显示面板及其制造方法 - Google Patents
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- 238000000034 method Methods 0.000 title claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 title abstract description 7
- 239000012212 insulator Substances 0.000 claims abstract description 115
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 239000012528 membrane Substances 0.000 claims abstract description 25
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 22
- 230000003750 conditioning effect Effects 0.000 claims abstract description 14
- 239000000376 reactant Substances 0.000 claims description 24
- 239000000463 material Substances 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 12
- 238000000059 patterning Methods 0.000 claims description 10
- 238000002360 preparation method Methods 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 238000005842 biochemical reaction Methods 0.000 claims description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 2
- 229920001807 Urea-formaldehyde Polymers 0.000 claims description 2
- 229920005990 polystyrene resin Polymers 0.000 claims description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 2
- 239000000956 alloy Substances 0.000 description 12
- 229910045601 alloy Inorganic materials 0.000 description 12
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 2
- 230000003446 memory effect Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 230000000638 stimulation Effects 0.000 description 2
- FIDRAVVQGKNYQK-UHFFFAOYSA-N 1,2,3,4-tetrahydrotriazine Chemical compound C1NNNC=C1 FIDRAVVQGKNYQK-UHFFFAOYSA-N 0.000 description 1
- 229910007610 Zn—Sn Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000007171 acid catalysis Methods 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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-
- G—PHYSICS
- G02—OPTICS
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1341—Filling or closing of cells
-
- G—PHYSICS
- G02—OPTICS
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1248—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
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- H01L27/1259—Multistep manufacturing methods
- H01L27/1296—Multistep manufacturing methods adapted to increase the uniformity of device parameters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78633—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device with a light shield
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- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
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- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13398—Spacer materials; Spacer properties
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1341—Filling or closing of cells
- G02F1/13415—Drop filling process
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Abstract
本发明实施例提供了一种液晶显示面板及其制造方法,涉及显示技术领域,可修复真空气泡,从而增加产品良率;该液晶显示面板包括对盒成形的阵列基板和彩膜基板、以及设置在两基板之间的液晶层和隔垫物;还包括设置在所述隔垫物内部的形变层,所述形变层用于在外部条件作用下沿垂直盒厚方向膨胀。用于液晶显示器的制造。
Description
技术领域
本发明涉及显示技术领域,尤其涉及一种液晶显示面板及其制造方法。
背景技术
液晶显示面板主要由阵列基板、彩膜基板、以及位于两基板之间的液晶层等构成。在液晶显示面板制备过程中,比较常用的方法是,在制备好的阵列基板上先设置封框胶,然后在封框胶内注入液晶,最后与所述彩膜基板对盒,形成液晶显示面板。
然而在液晶显示面板的制备过程中,由于存在液晶滴头滴量误差、液晶量估算不足等原因,会导致液晶滴入不足。这样的话,在阵列基板和彩膜基板对盒后,盒内产生真空气泡而导致显示不良的发生。
发明内容
本发明的实施例提供一种液晶显示面板及其制造方法,可修复真空气泡,从而增加产品良率。
为达到上述目的,本发明的实施例采用如下技术方案:
一方面,提供一种液晶显示面板,包括对盒成形的阵列基板和彩膜基板、以及设置在两基板之间的液晶层和隔垫物;还包括设置在所述隔垫物内部的形变层,所述形变层用于在外部条件作用下使所述隔垫物沿垂直盒厚方向膨胀。
一方面,提供一种液晶显示面板的制备方法,包括对盒成形的阵列基板和彩膜基板、以及形成在两基板之间的液晶层和隔垫物;还包括形成在所述隔垫物内部的形变层,所述形变层用于在外部条件作用下使所述隔垫物沿垂直盒厚方向膨胀。
本发明实施例提供了一种液晶显示面板及其制造方法,该液晶显示面板包括对盒成形的阵列基板和彩膜基板、以及设置在两基板之间的液晶层和隔垫物;进一步还包括设置在所述隔垫物内部的形变层,所述形变层用于在外部条件作用下使所述隔垫物沿垂直盒厚方向膨胀;这样,当该液晶显示面板的盒内产生真空气泡时,便可以通过对该部位处或附近进行外部条件刺激,使位于该部位处或附近的形变层沿垂直盒厚方向发生形变,从而使内部设置有该形变层的隔垫物沿垂直盒厚方向发生膨胀,并填充真空气泡,进而解决液晶显示面板中存在真空气泡不良的问题,提高产品良率。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。
图1为本发明实施例提供的形状记忆合金的形变示意图;
图2为本发明实施例提供的彩膜基板上设置隔垫物的结构示意图;
图3为本发明实施例提供的阵列基板上设置隔垫物的结构示意图;
图4a为本发明实施例提供的包括形状记忆合金的液晶显示装置中具有真空气泡的结构示意图;
图4b为本发明实施例提供的包括形状记忆合金的液晶显示装置的隔垫物沿垂直盒厚方向膨胀的示意图;
图5a为本发明实施例提供的包括硬化剂载体和反应物的液晶显示装置中具有真空气泡的结构示意图;
图5b为本发明实施例提供的包括硬化剂载体和反应物的液晶显示装置的隔垫物沿垂直盒厚方向膨胀的示意图。
附图标记:
10-阵列基板;101-薄膜晶体管;20-彩膜基板;201-黑矩阵;30-液晶层;40-隔垫物;50-形变层;501-载体;502-反应物;503-生成物;60-真空气泡。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
本发明实施例提供了一种液晶显示面板,该液晶显示面板包括对盒成形的阵列基板10和彩膜基板20、以及设置在两基板之间的液晶层30和隔垫物40;进一步还包括设置在所述隔垫物40内部的形变层50,所述形变层50用于在外部条件作用下使所述隔垫物沿垂直盒厚方向膨胀。
需要说明的是,第一,不对形变层50的材料、图案形状进行限定,只要该形变层50能在外部条件作用下能使所述隔垫物40沿垂直盒厚方向膨胀即可。
第二,所述外部条件可以是激光、微波、温度、亮度等,只要能根据所述形变层50的材料或其组成,使所述隔垫物40发生膨胀即可。
本发明实施例提供了一种液晶显示面板,包括对盒成形的阵列基板10和彩膜基板20、以及设置在两基板之间的液晶层30和隔垫物40;进一步还包括设置在所述隔垫物40内部的形变层50,所述形变层50用于在外部条件作用下使所述隔垫物40沿垂直盒厚方向膨胀;这样,当该液晶显示面板的盒内产生真空气泡时,便可以通过对该部位处或附近进行外部条件刺激,使位于该部位处或附近的内部设置有该形变层50的隔垫物40沿垂直盒厚方向发生膨胀,并填充真空气泡,进而解决液晶显示面板中存在真空气泡不良的问题,提高产品良率。
优选的,所述形变层50的材质为形状记忆合金。其中,该形状记忆合金例如可以为:铜-锌-镓(Cu-Zn-Ga)、铜-锌-锡(Cu-Zn-Sn)等具有单程记忆效应的形状记忆合金。
其中,单程记忆效应即为,形状记忆合金在较低的温度下变形,并在外界条件刺激例如加热后可恢复变形前的形状。在本发明实施例中,由于在外部条件例如加热刺激下,需要所述形状记忆合金沿垂直盒厚方向膨胀,因此,本发明实施例中,当所述形变层50的材质为所述记忆合金时,其形状为较低温度下的形状。
示例的,如图1所示,冷却变形前到冷却变形后,所述记忆合金的形状为沿垂直盒厚方向收缩的过程,也就是说,冷却变形后的所述记忆合金相对冷却变形前所述记忆合金,其形状沿垂直盒厚方向收缩了。这样,当所述形变层50的记忆合金为冷却后的所述记忆合金时,在对该形变层50进行光照时,便可使冷却后的所述记忆合金沿垂直盒厚方向膨胀,达到使所述隔垫物40膨胀的目的。
需要说明的是,附图1中所述记忆合金冷却形变前和冷却形变后的形状仅为示意,对于所述记忆合金的形状可以为任意可以制作的形状,只要能使冷却后的所述记忆合金的形状,在外部条件刺激下,沿盒厚垂直方向膨胀即可。
对于设置在所述隔垫物40内部的形变层50的记忆合金的形状,例如可以在制备所述隔垫物40的过程中,先形成所述隔垫物40的一部分图形,然后通过转印技术,将特定形状的记忆合金形成在所述隔垫物40的一部分图形上,最后再形成所述隔垫物40的另一部分。
进一步优选的,可以将所述形变层50设置在所述隔垫物40的50%~80%的高度处。
这样,可以只引起所述隔垫物40中间部位的体积膨胀,而与所述阵列基板10和彩膜基板20的接触面积不发生改变,可以有效避免其他不良的发生。
进一步地,如图2所示,所述隔垫物40设置在所述彩膜基板20上,并与所述黑矩阵201对应设置。
和/或,如图3所示,所述隔垫物40设置在所述阵列基板10上,并与所述薄膜晶体管101对应设置。
对于所述液晶显示面板的结构,示例的,如图4a所示,该液晶显示面板包括对盒成形的阵列基板10和彩膜基板20、设置在两基板之间的液晶层30和隔垫物40、以及设置在所述隔垫物40的50%高度处的变形层50,所述形变层50的材质为形状记忆合金;其中,所述阵列基板10包括薄膜晶体管101,所述隔垫物40设置在所述阵列基板10的与所述薄膜晶体管101对应的位置处。
参考图4a所示,当盒内存在真空气泡60时,可以仅对该真空气泡60附近的所述隔垫物40进行外部条件刺激例如激光照射,使设置在所述隔垫物40内部的形状记忆合金材质的形变层50沿垂直盒厚方向形变,从而使所述隔垫物40沿垂直盒厚方向膨胀,参考如图4b所示,由于所述隔垫物40体积发生膨胀,增大的体积便可以填充原真空气泡引起的空洞,进而解决液晶显示面板中存在真空气泡不良的问题。
此外,由于所述变形层50设置在所述隔垫物40的50%高度处,可以只引起所述隔垫物40中间部位的体积膨胀,而与所述阵列基板10和彩膜基板20的接触面积不发生改变,可以有效避免其他不良的发生。
可选的,如图5a及5b所示,所述形变层50包括由硬化剂制成的载体501,以及填充在所述载体中的反应物502;其中所述反应物502在外部条件作用下发生化学反应生成生成物503,所述生成物503用于使所述隔垫物40沿垂直盒厚方向膨胀。
需要说明的是,所述反应物502还可以包括促进反应的催化剂等,具体可以根据实际情况进行设定,在此不做限定。此外,对于反应物502的量以及所述载体501的放置方式,在此也不做限定,以当填充在所述硬化剂制成的载体501中的反应物在外部条件作用下,发生化学反应生成生成物503时,该生成物503能使所述隔垫物40沿垂直盒厚方向膨胀,但不影响所述隔垫物40用于维持盒厚的作用即可。
参考图5a所示,当盒内存在真空气泡60时,对该真空气泡60附近的隔垫物40进行外部条件刺激例如微波高频振荡,或者激光局部高温照射下,参考图5b所示,由硬化剂的物理性能,放置在其内部的反应物502发生反应时,会沿着阻力相对较小的方向进行,因此,此处所述载体501放置的方向需与垂直盒厚方向一致,使反应物502沿所述载体501方向发生反应,得到生成物503,这些生成物503从所述硬化剂制成的载体501中出来,使所述隔垫物40沿垂直盒厚方向膨胀,增大的体积便可以填充原真空气泡引起的空洞,进而解决液晶显示面板中存在真空气泡不良的问题。
进一步地,所述生成物503优选包括密胺树脂,或尿素树脂,或聚苯乙烯树脂,或聚乙烯乙醇。
例如,反应物2,4,6-三氨基-1,3,5-三嗪和甲醛在酸催化作用下进行激光照射,反应生成密胺树脂。
这样,由于发生反应前反应物502放置在所述硬化剂中,与外界隔绝,不会造成污染;在发生反应后,由于上述的生成物503与目前一般使用的所述隔垫物40的组成相似,也可以避免引入杂质而造成对液晶的污染。
本发明实施例还提供了一种液晶显示面板的制备方法,包括对盒成形的阵列基板10和彩膜基板20、以及形成在两基板之间的液晶层30和隔垫物40;进一步还包括形成在所述隔垫物40内部的形变层50,所述形变层50用于在外部条件作用下使所述隔垫物40沿垂直盒厚方向膨胀。
优选的,所述形变层50形成在所述隔垫物的50%~80%的高度处。
当所述隔垫物40形成在所述阵列基板10上,且在所述隔垫物40内部形成形状记忆合金材质的形变层50时,所述形变层50形成在所述隔垫物的50%~80%的高度处具体可以包括如下步骤;
S101、在所述阵列基板上10,通过一次构图工艺形成50%~80%高度的第一隔垫物图案。
S102、在完成上述S101的基板上,在所述第一隔垫物图案上通过转印技术形成形状记忆合金材质的所述形变层图案。
此处,具体的可以为:将带有形状记忆合金微粒的印版表面与所有所述第一隔垫物图案接触,其中在每个所述第一隔垫物图案位置对应处有相应大小、数目的印版微孔,用于提供形状记忆合金微粒。在所述阵列基板10背面,转印电极的电场给所述阵列基板10充以比印版更多的电荷,把在印版表面上形状记忆合金微粒吸附转移到第一隔垫物上。其中,此处的形状记忆合金微粒其形状例如可以参考附图1中的在较低温度下变形后的形状,当然也可以是其他,只要该形状能在外部条件刺激下,沿盒厚垂直方向膨胀即可。
S103、在完成上述S102的基板上,通过一次构图工艺形成剩余20%~50%的第二隔垫物图案。其中,所述第一隔垫物图案与所述第二隔垫物图案构成所述隔垫物40。
当所述隔垫物40形成在所述彩膜基板20上时,且在所述隔垫物40内部形成形状记忆合金材质的形变层50时,所述形变层50形成在所述隔垫物的50%~80%的高度处具体可以包括如下步骤:
S201、在所述彩膜基板20上,通过一次构图工艺形成50%~80%高度的第一隔垫物图案。
S202、在完成上述S201的基板上,在所述第一隔垫物图案上通过转印技术形成形状记忆合金材质的所述形变层图案。
S203、在完成上述S202的基板上,通过一次构图工艺形成剩余20%~50%的第二隔垫物图案。其中,所述第一隔垫物图案与所述第二隔垫物图案构成所述隔垫物40。
对于,当所述隔垫物40形成在所述阵列基板10上,且在所述隔垫物40内部形成包括硬化剂制成的载体501以及填充在所述载体中的反应物502的形变层50时,所述形变层50形成在所述隔垫物40的50%~80%的高度处具体可以包括步骤:
S301、在所述阵列基板10上,通过一次构图工艺形成50%~80%高度的第一隔垫物图案。
S302、在完成上述S301的基板上,将填充有所述反应物502的硬化剂载体501沿垂直盒厚的方向放置在所述第一隔垫物图案上。
具体的,可以先将硬化剂制作成例如圆柱形的载体501,将反应物502例如2,4,6-三氨基-1,3,5-三嗪、甲醛和酸催化剂放入所述载体501中,然后将填充有所述反应物502的载体501的轴沿垂直盒厚方向放置在所述第一隔垫物图案上。
S303、在完成上述S302的基板上,通过一次构图工艺形成剩余20%~50%的第二隔垫物图案。其中,所述第一隔垫物图案与所述第二隔垫物图案构成所述隔垫物40。
这样,当所述阵列基板10和所述彩膜基板20对盒后,盒内有真空气泡存在时,可局部对该气泡附近的隔垫物40进行外部条件例如激光照射,使得位于所述载体501中的反应物502发生化学反应生成密胺树脂,由于该化学反应沿所述载体501的轴的方向发生,且该轴沿垂直盒厚方向放置,使得反应物503密胺树脂从所述载体501两端出来,从而使所述隔垫物40沿垂直盒厚方向膨胀。
同理,当所述隔垫物40形成在所述彩膜基板20上,且在所述隔垫物40内部形成包括硬化剂制成的载体501以及填充在所述载体中的反应物502的形变层50的情况,与上述S301-S303类似,在此不再赘述。
以上所述,仅为本发明的具体实施方式,但本发明的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本发明揭露的技术范围内,可轻易想到变化或替换,都应涵盖在本发明的保护范围之内。因此,本发明的保护范围应以所述权利要求的保护范围为准。
Claims (10)
1.一种液晶显示面板,包括对盒成形的阵列基板和彩膜基板、以及设置在两基板之间的液晶层和隔垫物;其特征在于,还包括设置在所述隔垫物内部的形变层,所述形变层用于在外部条件作用下使所述隔垫物沿垂直盒厚方向膨胀。
2.根据权利要求1所述的液晶显示面板,其特征在于,所述形变层的材质为形状记忆合金。
3.根据权利要求1所述的液晶显示面板,其特征在于,所述形变层包括由硬化剂制成的载体,以及填充在所述载体中的反应物;其中所述反应物在外部条件作用下发生化学反应生成生成物,所述生成物用于使所述隔垫物沿垂直盒厚方向膨胀。
4.根据权利要求3所述的液晶显示面板,其特征在于,所述生成物包括密胺树脂,或尿素树脂,或聚苯乙烯树脂,或聚乙烯乙醇。
5.根据权利要求1至4任一项所述的液晶显示面板,其特征在于,所述形变层设置在所述隔垫物的50%~80%的高度处。
6.根据权利要求1所述的液晶显示面板,其特征在于,所述隔垫物设置在所述彩膜基板上或所述阵列基板上。
7.一种液晶显示面板的制备方法,包括对盒成形的阵列基板和彩膜基板、以及形成在两基板之间的液晶层和隔垫物;其特征在于,还包括形成在所述隔垫物内部的形变层,所述形变层用于在外部条件作用下使所述隔垫物沿垂直盒厚方向膨胀。
8.根据权利要求7所述的制备方法,其特征在于,所述形变层形成在所述隔垫物的50%~80%的高度处。
9.根据权利要求8所述的制备方法,其特征在于,所述形变层形成在所述隔垫物的50%~80%的高度处包括:
在所述阵列基板或彩膜基板上,通过一次构图工艺形成50%~80%高度的第一隔垫物图案;
在所述第一隔垫物图案上通过转印技术形成形状记忆合金材质的所述形变层的图案,并通过一次构图工艺形成剩余20%~50%的第二隔垫物图案;
其中,所述第一隔垫物图案与所述第二隔垫物图案构成所述隔垫物。
10.根据权利要求8所述的制备方法,其特征在于,所述形变层形成在所述隔垫物的50%~80%的高度处包括:
在所述阵列基板或彩膜基板上,通过一次构图工艺形成50%~80%高度的第一隔垫物图案;
在所述第一隔垫物图案上放置填充有反应物的硬化剂载体,所述填充有反应物的硬化剂载体形成所述形变层;其中,所述反应物在外部条件作用下发生化学反应生成生成物,所述生成物用于使所述隔垫物沿垂直盒厚方向膨胀;
通过一次构图工艺形成剩余20%~50%的第二隔垫物图案;
其中,所述第一隔垫物图案与所述第二隔垫物图案构成所述隔垫物。
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CN114815403B (zh) * | 2022-04-06 | 2023-10-13 | Tcl华星光电技术有限公司 | 一种显示面板及其制备方法、修复方法 |
CN116761472B (zh) * | 2023-07-31 | 2024-08-09 | 惠科股份有限公司 | 显示面板和显示装置 |
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JPH04355727A (ja) * | 1991-06-03 | 1992-12-09 | Matsushita Electric Ind Co Ltd | 液晶表示素子 |
US5285304A (en) * | 1992-01-24 | 1994-02-08 | Canon Kabushiki Kaisha | Ferroelectric liquid crystal device having spacers including the thermosetting adhesive particles and the thermoplastic polymer particles |
JP4168488B2 (ja) * | 1998-08-28 | 2008-10-22 | ソニー株式会社 | 液晶表示装置 |
JP4304852B2 (ja) * | 2000-09-04 | 2009-07-29 | コニカミノルタホールディングス株式会社 | 非平面液晶表示素子及びその製造方法 |
US7253868B2 (en) * | 2002-08-21 | 2007-08-07 | Samsung Electronics Co., Ltd. | Liquid crystal display device comprising a plurality of spacers having compression ratios gradually increasing as advancing from a center to left and right edges of display region |
KR20050105571A (ko) * | 2004-04-30 | 2005-11-04 | 엘지.필립스 엘시디 주식회사 | 액정표시장치용 컬러필터 기판의 제조 방법 |
JP4599484B2 (ja) * | 2004-05-31 | 2010-12-15 | 凸版印刷株式会社 | 硬化性樹脂組成物及びそれを用いて形成したフォトスペーサを有するカラーフィルタ |
KR100611672B1 (ko) * | 2005-01-31 | 2006-08-10 | 삼성에스디아이 주식회사 | Ocb 모드 액정층을 구비하는 액정표시장치 및 그의제조방법 |
KR101114233B1 (ko) * | 2005-04-29 | 2012-03-06 | 엘지디스플레이 주식회사 | 액정표시패널 및 그 제조방법 |
JP2006350211A (ja) * | 2005-06-20 | 2006-12-28 | Toshiba Matsushita Display Technology Co Ltd | 液晶表示装置 |
CN103323982B (zh) * | 2013-06-20 | 2015-09-23 | 北京京东方光电科技有限公司 | 一种液晶显示面板及其制造方法 |
CN103792735B (zh) * | 2014-01-22 | 2016-08-24 | 京东方科技集团股份有限公司 | 隔垫物、应用其的液晶面板及显示装置 |
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US10288951B2 (en) | 2019-05-14 |
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