CN103293858A - 感光性树脂组合物、硬化膜的制造方法、硬化膜、有机电致发光显示装置以及液晶显示装置 - Google Patents

感光性树脂组合物、硬化膜的制造方法、硬化膜、有机电致发光显示装置以及液晶显示装置 Download PDF

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CN103293858A
CN103293858A CN2013100614028A CN201310061402A CN103293858A CN 103293858 A CN103293858 A CN 103293858A CN 2013100614028 A CN2013100614028 A CN 2013100614028A CN 201310061402 A CN201310061402 A CN 201310061402A CN 103293858 A CN103293858 A CN 103293858A
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acid
mole
organic compound
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Chinese (zh)
Inventor
山﨑健太
米泽裕之
霜山达也
川岛敬史
下野胜弘
山田悟
汤本真敏
安藤豪
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Fujifilm Holdings Corp
Fujifilm Corp
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Fujifilm Corp
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Priority claimed from JP2013004275A external-priority patent/JP5593405B2/ja
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Publication of CN103293858A publication Critical patent/CN103293858A/zh
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/151—Copolymers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
    • H10K85/621—Aromatic anhydride or imide compounds, e.g. perylene tetra-carboxylic dianhydride or perylene tetracarboxylic di-imide
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Nonlinear Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
CN2013100614028A 2012-02-28 2013-02-27 感光性树脂组合物、硬化膜的制造方法、硬化膜、有机电致发光显示装置以及液晶显示装置 Pending CN103293858A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2012041217 2012-02-28
JP2012-041217 2012-02-28
JP2013-004275 2013-01-15
JP2013004275A JP5593405B2 (ja) 2012-02-28 2013-01-15 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置

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Publication Number Publication Date
CN103293858A true CN103293858A (zh) 2013-09-11

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KR (1) KR20130098909A (ko)
CN (1) CN103293858A (ko)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104658906A (zh) * 2013-11-22 2015-05-27 上海和辉光电有限公司 一种半导体平坦化层的制作方法
CN105895661A (zh) * 2015-02-17 2016-08-24 富士胶片株式会社 薄膜晶体管基板的制造方法及其应用
CN105938299A (zh) * 2015-03-06 2016-09-14 东友精细化工有限公司 化学增幅型感光性树脂组合物及由其制造的绝缘膜
CN106687865A (zh) * 2014-09-30 2017-05-17 富士胶片株式会社 Tft基板的制造方法、有机el显示装置及其制造方法以及液晶显示装置及其制造方法
CN107207868A (zh) * 2015-02-19 2017-09-26 日本瑞翁株式会社 树脂组合物、树脂膜及电子部件

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102144796B1 (ko) * 2012-10-02 2020-08-14 닛산 가가쿠 가부시키가이샤 네가티브형 감광성 수지조성물
JP6136727B2 (ja) * 2013-08-02 2017-05-31 Jsr株式会社 感放射線性樹脂組成物、硬化膜、その形成方法及び表示素子
CN105579898B (zh) * 2013-11-13 2017-07-21 积水化学工业株式会社 液晶显示元件用密封剂、上下导通材料、及液晶显示元件

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6279444A (ja) * 1985-10-03 1987-04-11 Kuraray Co Ltd 架橋性レジスト
CN1737683A (zh) * 2004-08-16 2006-02-22 富士胶片株式会社 平版印刷版原版
TW201015222A (en) * 2008-09-12 2010-04-16 Sumitomo Chemical Co A method for treating a resist layer and a use of positive resist composition
CN101876789A (zh) * 2009-05-01 2010-11-03 富士胶片株式会社 正型感光性树脂组合物以及使用了该组合物的固化膜形成方法
TW201140232A (en) * 2010-01-15 2011-11-16 Fujifilm Corp Photosensitive resin composition, cured film and method of producing the same, organic EL display device, and liquid crystal display device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6279444A (ja) * 1985-10-03 1987-04-11 Kuraray Co Ltd 架橋性レジスト
CN1737683A (zh) * 2004-08-16 2006-02-22 富士胶片株式会社 平版印刷版原版
TW201015222A (en) * 2008-09-12 2010-04-16 Sumitomo Chemical Co A method for treating a resist layer and a use of positive resist composition
CN101876789A (zh) * 2009-05-01 2010-11-03 富士胶片株式会社 正型感光性树脂组合物以及使用了该组合物的固化膜形成方法
TW201140232A (en) * 2010-01-15 2011-11-16 Fujifilm Corp Photosensitive resin composition, cured film and method of producing the same, organic EL display device, and liquid crystal display device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104658906A (zh) * 2013-11-22 2015-05-27 上海和辉光电有限公司 一种半导体平坦化层的制作方法
CN104658906B (zh) * 2013-11-22 2017-09-01 上海和辉光电有限公司 一种半导体平坦化层的制作方法
CN106687865A (zh) * 2014-09-30 2017-05-17 富士胶片株式会社 Tft基板的制造方法、有机el显示装置及其制造方法以及液晶显示装置及其制造方法
CN106687865B (zh) * 2014-09-30 2020-01-03 富士胶片株式会社 Tft基板、有机el显示装置及液晶显示装置的制造方法
CN105895661A (zh) * 2015-02-17 2016-08-24 富士胶片株式会社 薄膜晶体管基板的制造方法及其应用
CN105895661B (zh) * 2015-02-17 2019-03-01 富士胶片株式会社 薄膜晶体管基板的制造方法及其应用
TWI710839B (zh) * 2015-02-17 2020-11-21 日商富士軟片股份有限公司 薄膜電晶體基板的製造方法、有機電致發光顯示裝置及其製法、液晶顯示裝置及其製法
CN107207868A (zh) * 2015-02-19 2017-09-26 日本瑞翁株式会社 树脂组合物、树脂膜及电子部件
CN107207868B (zh) * 2015-02-19 2020-11-06 日本瑞翁株式会社 树脂组合物、树脂膜及电子部件
CN105938299A (zh) * 2015-03-06 2016-09-14 东友精细化工有限公司 化学增幅型感光性树脂组合物及由其制造的绝缘膜
CN105938299B (zh) * 2015-03-06 2020-10-09 东友精细化工有限公司 化学增幅型感光性树脂组合物及由其制造的绝缘膜

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