CN103290385A - Roll-to-roll vertical type magnetic control film plating device - Google Patents
Roll-to-roll vertical type magnetic control film plating device Download PDFInfo
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- CN103290385A CN103290385A CN2013101963435A CN201310196343A CN103290385A CN 103290385 A CN103290385 A CN 103290385A CN 2013101963435 A CN2013101963435 A CN 2013101963435A CN 201310196343 A CN201310196343 A CN 201310196343A CN 103290385 A CN103290385 A CN 103290385A
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- 238000007747 plating Methods 0.000 title abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 59
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 49
- 238000009498 subcoating Methods 0.000 claims description 148
- 238000000576 coating method Methods 0.000 claims description 54
- 239000011248 coating agent Substances 0.000 claims description 49
- 238000005096 rolling process Methods 0.000 claims description 30
- 239000007888 film coating Substances 0.000 claims description 29
- 238000009501 film coating Methods 0.000 claims description 29
- 230000007704 transition Effects 0.000 claims description 21
- 238000010849 ion bombardment Methods 0.000 claims description 9
- 239000012535 impurity Substances 0.000 abstract description 3
- 239000000843 powder Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 28
- 239000012298 atmosphere Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 239000007789 gas Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 3
- 229910001423 beryllium ion Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 238000001994 activation Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
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Abstract
The invention discloses a roll-to-roll vertical type magnetic control film plating device. The roll-to-roll vertical type magnetic control film plating device comprises a film plating chamber, wherein one end of the film plating chamber is connected with an unreeling chamber; the unreeling chamber is internally provided with an unreeling roller and a guide roller with vertical shafts; the other end of the film plating chamber is connected with a reeling chamber; the reeling chamber is provided with a reeling roller and a first guide roller with vertical shafts; the side wall of the film plating chamber is provided with a magnetron sputtering target; the target face of the magnetron sputtering target is vertical and is parallel to a plane of a flexible substrate; slits, through which the flexible substrate passes, are respectively arranged between the unreeling chamber and the film plating chamber, and between the film plating chamber and the reeling chamber; the unreeling chamber, the film plating chamber and the reeling chamber are respectively provided with an independent air exhausting system. The device disclosed by the invention can prevent foreign gas from polluting the film plating chamber so as to guarantee that a film layer is not polluted by impurities; meanwhile, fine powder and grains generated in a chamber body are prevented from falling onto the surface of the flexible substrate and the target face of the magnetron sputtering target, thereby avoiding a needle hole in the film layer and guaranteeing the quality of the film layer.
Description
Technical field
The present invention relates to the coating technique field, especially relate to the vertical magnetic control film coating device of a kind of volume to volume.
Background technology
The vertical magnetic control sputtering film plating device of volume to volume is mainly used under the vacuum condition plating retes such as matel coated, nonmetal and/or oxide compound at flexible substrate.Its specifically can be applicable to as: be coated with the conductive layer of flexible thin-film solar cell face electrode, back electrode, CIG semiconductor layer and flexible circuit board etc.
Volume to volume vacuum magnetic control film coating equipment common in the prior art is single devices, equipment basic structure generally is made up of a vacuum chamber, wind-up roll, let off roll, a plurality of deflector roll, a cold drum, one group of correction roller etc., and be horizontal type structure, be target below the cold drum or above, in the equipment work process, thin-film material place face is on the horizontal plane all the time.
Existing this volume to volume vacuum magnetic control film coating equipment is less because of target position that structure is limit, and sputter material is single; Owing to adopt horizontal type structure; target and flexible substrate are flat prone position attitude during equipment work; the fine particle that the coating process internal vacuum chamber forms can drop and form pollution at institute's flexible substrate and target, thereby needle pore defect can appear in the plated film rete that causes flexible substrate to form.
The retractable winding up roller of existing this volume to volume vacuum magnetic control film coating equipment is in same plated film vacuum chamber simultaneously, unreel flexible substrate to be plated in the process during works better and under vacuum state, can discharge a large amount of foreign gas, thereby work atmosphere and the composition of target in the plated film vacuum chamber produce adverse influence to rete.
In addition, the retractable winding up roller of existing this volume to volume vacuum magnetic control film coating equipment and the position of cold drum are limited, and the deflector roll of wind-up roll side unavoidably can make institute's coatings defectives such as " scuffings " occur to the not high coating materials of hardness to the rete extruding that is coated with easily.And owing to have only a plated film vacuum chamber, so working vacuum atmosphere has only one, can't plate simultaneously and be coated with two or more has different requirements to atmosphere retes.
Summary of the invention
Main purpose of the present invention is to provide a kind of volume to volume vertical magnetic control film coating device, prevents that from there is needle pore defect in the rete that forms on the flexible substrate, prevents foreign gas pollution coating chamber, to guarantee the film quality of flexible substrate.
The present invention proposes the vertical magnetic control film coating device of a kind of volume to volume, comprising: coating chamber, and an end of this coating chamber is connected with one and unreels the chamber, and this unreels the indoor roll shaft that is provided with is let off roll and the guide roller that vertical direction arranges; The other end of coating chamber is connected with a rolling chamber, and it is wind-up roll and first guide roller that vertical direction arranges that this rolling chamber is provided with roll shaft; The sidewall of described coating chamber is provided with magnetron sputtering target, and the target surface of this magnetron sputtering target is the vertical direction setting, and parallel with flexible substrate place face; The described slit that is respectively equipped with between chamber and coating chamber, coating chamber and the rolling chamber by flexible substrate that unreels; Described chamber, coating chamber and the rolling chamber of unreeling is respectively equipped with independently air-bleed system.
Preferably, described coating chamber comprises: the first sub-coating chamber, the second sub-coating chamber; Connect between the described first sub-coating chamber and the second sub-coating chamber transition chamber is set;
The end that the described first sub-coating chamber is not connected with transition chamber connects the described chamber that unreels, and the end that the described second sub-coating chamber is not connected with transition chamber connects described rolling chamber;
Described unreeling between chamber and the first sub-coating chamber, the first sub-coating chamber and transition chamber, transition chamber and the second sub-coating chamber, the second sub-coating chamber and the rolling chamber is respectively equipped with described slit;
The described first sub-coating chamber, transition chamber and the second sub-coating chamber are respectively arranged with independently air-bleed system.
Preferably, the described first sub-coating chamber comprises: the first preceding sub-coating chamber, the sub-coating chamber in first back that is connected with sub-coating chamber before first; Be provided with described slit between the sub-coating chamber of sub-coating chamber and first back before described first.
Preferably, be respectively equipped with at least one described magnetron sputtering target on the sidewall of the sub-coating chamber of the described first preceding sub-coating chamber and first back.
Preferably, the magnetron sputtering target in the described first preceding sub-coating chamber is arranged on left side wall or the right side wall; Magnetron sputtering target in the sub-coating chamber in described first back is arranged on left side wall or the right side wall.
Preferably, the described second sub-coating chamber comprises: the second preceding sub-coating chamber, the sub-coating chamber in second back that is connected with sub-coating chamber before second; Be provided with described slit between the sub-coating chamber of sub-coating chamber and second back before described second.
Preferably, be equipped with at least one described magnetron sputtering target on the sidewall of the sub-coating chamber of the described second preceding sub-coating chamber and second back.
Preferably, the magnetron sputtering target in the described second preceding sub-coating chamber is arranged on left side wall or the right side wall, and the magnetron sputtering target in the sub-coating chamber in described second back is arranged on left side wall or the right side wall.
Preferably, described unreeling between chamber and the first sub-coating chamber is provided with pretreatment chamber, and this pretreatment chamber is provided with flexible substrate is carried out pretreated ion bombardment instrument before the plated film.
Preferably, be provided with after-processing chamber between described rolling chamber and the second sub-coating chamber, be provided with the ion bombardment instrument that the flexible substrate rete is carried out the film aftertreatment in this after-processing chamber.
The vertical magnetic control film coating device of a kind of volume to volume provided by the present invention, isolate by unreeling chamber, coating chamber and rolling chamber, can prevent the foreign gas pollution coating chamber that flexible substrate discharges in the process of unreeling, keep the simple atmosphere of coating chamber, be not subjected to contaminating impurity to guarantee the flexible substrate rete; The roll shaft of let off roll, wind-up roll is set to vertical direction simultaneously, and the target surface of magnetron sputtering target 111 is set to vertical direction; The target surface of flexible substrate place face and magnetic magnetic sputtering target all is in vertical state in coating process, the fine dusts that produces in the body of chamber and particle can not fall on the target surface of flexible substrate surface and magnetron sputtering target, therefore avoid the flexible substrate rete pin hole phenomenon to occur, further guaranteed the quality of flexible substrate rete.
Description of drawings
Fig. 1 is the perspective view of the vertical magnetic control film coating device of volume to volume of the present invention;
Fig. 2 is the plan structure synoptic diagram of the vertical magnetic control film coating device of volume to volume of the present invention.
The realization of the object of the invention, functional characteristics and advantage will be in conjunction with the embodiments, are described further with reference to accompanying drawing.
Embodiment
Should be appreciated that specific embodiment described herein only in order to explaining the present invention, and be not used in restriction the present invention.
Referring to Fig. 1 and Fig. 2, vertical magnetic control film coating device 100 1 embodiment of a kind of volume to volume of the present invention are proposed, it comprises: coating chamber 110, and an end of this coating chamber 110 is connected with one and unreels chamber 120, and this unreels and is provided with roll shaft in the chamber 120 is let off roll 121 and the guide roller 122 that vertical direction arranges; The other end of coating chamber 110 is connected with a rolling chamber 130, and it is wind-up roll 131 and first guide roller 132 that vertical direction arranges that this rolling chamber 130 is provided with roll shaft; The sidewall of described coating chamber 110 is provided with magnetron sputtering target 111, and the target surface of this magnetron sputtering target 111 is the vertical direction setting, and parallel with flexible substrate 101 place faces; The described slit (scheming not shown) that is respectively equipped with between chamber 120 and coating chamber 110, coating chamber 110 and the rolling chamber 130 by flexible substrate 101 that unreels; Described chamber 120, coating chamber 110 and the rolling chamber 130 of unreeling is respectively equipped with independently air-bleed system 103.
In the present embodiment, all be in high vacuum state owing to unreel chamber 120, rolling chamber 130 and coating chamber 110, internal gas density is little; Therefore unreeling gases in chamber 120, coating chamber 110 and the rolling chamber 130 can not pass slit (scheming not shown) and enter in the adjacent chamber body.
In the present embodiment, because the roll shaft of described let off roll 121, guide roller 122, wind-up roll 131, first guide roller 132 is the vertical direction setting.Let off roll 131 unreels, and flexible substrate 101 place faces are in vertical state in wind-up roll 131 wrapup procedures, therefore flexible substrate 101 during 130 migrations, unreels the fine dusts and the particles that produce in chamber 120, coating chamber 110, the rolling chamber 130 and can not fall on its surface to the rolling chamber by unreeling chamber 120.The target surface of described magnetron sputtering target 111 is the vertical direction setting simultaneously, the fine dusts and the particle that produce in the coating chamber 110 can not fall on the target surface, therefore can effectively avoid the rete of flexible substrate 101 the pin hole phenomenon to occur, guarantee the quality of flexible substrate 101 retes.
In addition, in the present embodiment, because unreeling chamber 120, coating chamber 110 and rolling chamber 130 is isolated into independently vacuum chamber body respectively, let off roll 121 flexible substrate 101 in the process of unreeling can discharge a large amount of foreign gas at vacuum state, the gas of Shi Fanging can be good at being isolated in outside the coating chamber 110 simultaneously, therefore can guarantee that coating chamber 110 is not polluted by foreign gas, keep simple atmosphere, prior art can guarantee further that the rete behind flexible substrate 101 plated films is not subjected to contaminating impurity relatively.
Further, referring to Fig. 1 and Fig. 2, among vertical magnetic control film coating device 100 embodiment of described volume to volume, described coating chamber 110 comprises: the first sub-coating chamber 1110, the second sub-coating chamber 1120; Connect between the described first sub-coating chamber 1110 and the second sub-coating chamber 1120 transition chamber 1130 is set.The end that the described first sub-coating chamber 1110 is not connected with transition chamber 1130 connects the described chamber 120 that unreels, and the end that the described second sub-coating chamber 1120 is not connected with transition chamber 1130 connects described rolling chamber 130.Described unreeling between chamber 120 and the first sub-coating chamber 1110, the first sub-coating chamber 1110 and transition chamber 1130, transition chamber 1130 and the second sub-coating chamber 1120, the second sub-coating chamber 1120 and the rolling chamber 130 is respectively equipped with described slit (scheming not shown); The described first sub-coating chamber 1110, transition chamber 1130 and the second sub-coating chamber 1120 are respectively arranged with independently air-bleed system 103.
In the present embodiment, because coating chamber 110 comprises the first sub-coating chamber 1110 and the second sub-coating chamber 1120, connection arranges a transition chamber 1130 between the two, and the first sub-coating chamber 1110, the second sub-coating chamber 1120 and transition chamber 1130 are respectively equipped with independently air-bleed system 103; Therefore the magnetron sputtering target 111 of the first sub-coating chamber 1110 and the second sub-coating chamber 1120 can adopt different coating materials simultaneously, and can realize that two kinds of coating materials sputter on the flexible substrate 101 simultaneously under the different process atmospheric condition, as the first sub-coating chamber 1110 splash-proofing sputtering metal material in straight argon atmosphere, the second sub-coating chamber 1120 sputter oxide compound in being furnished with the atmosphere of trace oxygen can be implemented in and be coated with two kinds of retes on the flexible substrate 101.
In addition, if product requirement is coated with multilayer film, can be in last institute device 100 unreel the sub-coating chamber of setting up corresponding number between chamber 120 and the rolling chamber 130, connection arranges a transition chamber 1130 and gets final product between the adjacent sub-coating chamber.
Further, referring to Fig. 1 and Fig. 2, among vertical magnetic control film coating device 100 embodiment of above-mentioned volume to volume, the described first sub-coating chamber 1110 comprises: the first preceding sub-coating chamber 1111, the sub-coating chamber 1112 in first back that is connected with sub-coating chamber 1111 before first; Be provided with described slit (scheming not shown) between the sub-coating chamber 1112 of sub-coating chamber 1111 and first back before described first.Be respectively equipped with at least one described magnetron sputtering target 111 on the sidewall of the sub-coating chamber 1112 of sub-coating chamber 1111 and first back before described first.
In the present embodiment, the sub-coating chamber 1112 of the described first preceding sub-coating chamber 1111 and first back should adopt with a kind of atmosphere, but the two inner magnetron sputtering target 111 can adopt the corresponding flexible substrate 101 of different coating materials to carry out sputter coating.Wherein, described different coating materials can be in same atmosphere sputter coating.
Further, among vertical magnetic control film coating device 100 embodiment of described volume to volume, the magnetron sputtering targets 111 in the described first preceding sub-coating chamber 1111 are arranged on left side wall or the right side wall; Magnetron sputtering target 111 in the sub-coating chamber 1112 in described first back is arranged on left side wall or the right side wall.
In the present embodiment, be arranged at the left surface plated film of the 111 pairs of flexible substrates of magnetron sputtering target on the left side wall, be arranged at the right surface coating of the 111 pairs of flexible substrates of magnetron sputtering target on the left side wall.Magnetron sputtering target 111 in sub-coating chamber 1112 behind the sub-coating chamber 1111 and first before first all is arranged on the left side wall, and behind the sub-coating chamber 1112 of sub-coating chamber 1111 and first back, its left surface just can be coated with two-layer plated film before then flexible substrate 101 passed through first.Magnetron sputtering target 111 in sub-coating chamber 1112 behind the sub-coating chamber 1111 and first before first all is arranged on the right side wall.Behind the sub-coating chamber 1112 of sub-coating chamber 1111 and first back, its right surface just can be coated with two-layer plated film before then flexible substrate 101 passed through first.Magnetron sputtering target 111 in sub-coating chamber 1111 before first is arranged at left side wall; Magnetron sputtering target 111 in the sub-coating chamber 1112 in described first back is arranged on the right side wall.Behind the sub-coating chamber 1112 of sub-coating chamber 1111 and first back, its left and right surfaces just can be coated with one deck plated film respectively before then flexible substrate 101 passed through first.Magnetron sputtering target 111 in sub-coating chamber 1111 before first is arranged at right side wall; Magnetron sputtering target 111 in the sub-coating chamber 1112 in described first back is arranged on the left side wall.Behind the sub-coating chamber 1112 of sub-coating chamber 1111 and first back, its left and right surfaces just can be coated with one deck plated film respectively before then flexible substrate 101 passed through first.Be that the device 100 that present embodiment provides both can have been realized flexible substrate 101 coating single sides, can realize flexible substrate 101 double-sided coatings again.
Further, referring to Fig. 1 and Fig. 2, among vertical magnetic control film coating device 100 embodiment of above-mentioned volume to volume, the described second sub-coating chamber 1120 comprises: the second preceding sub-coating chamber 1121, the sub-coating chamber 1122 in second back that is connected with sub-coating chamber 1121 before second; Be provided with described slit (scheming not shown) between the sub-coating chamber 1122 of sub-coating chamber 1121 and second back before described second.Be equipped with at least one described magnetron sputtering target 111 on the sidewall of the sub-coating chamber 1121 of sub-coating chamber 1121 and second back before described second.
In the present embodiment, the sub-coating chamber 1122 of the described second preceding sub-coating chamber 1121 and first back should adopt with a kind of atmosphere, but the two inner magnetron sputtering target 111 can adopt the corresponding flexible substrate 101 of different coating materials to carry out sputter coating.Wherein, described different coating materials can be in same atmosphere sputter coating.
Further, among vertical magnetic control film coating device 100 embodiment of above-mentioned volume to volume, magnetron sputtering target 111 before described second in the sub-coating chamber 1121 is arranged on left side wall or the right side wall, and the magnetron sputtering target 111 in the sub-coating chamber 1122 in described second back is arranged on left side wall or the right side wall.
In the present embodiment, be arranged at the left surface plated film of the 111 pairs of flexible substrates 101 of magnetron sputtering target on the left side wall, be arranged at the right surface coating of the 111 pairs of flexible substrates 101 of magnetron sputtering target on the left side wall.Magnetron sputtering target 111 in sub-coating chamber 1122 behind the sub-coating chamber 1121 and second before second all is arranged on the left side wall, and behind the sub-coating chamber 1122 of sub-coating chamber 1121 and second back, its left surface just can be coated with two-layer plated film before then flexible substrate 101 passed through second.Magnetron sputtering target 111 in sub-coating chamber 1122 behind the sub-coating chamber 1121 and second before second all is arranged on the right side wall.Behind the sub-coating chamber 1122 of sub-coating chamber 1121 and second back, its right surface just can be coated with two-layer plated film before then flexible substrate 101 passed through second.Magnetron sputtering target 111 in sub-coating chamber 1121 before second is arranged at left side wall; Magnetron sputtering target 111 in the sub-coating chamber 1122 in described second back is arranged on the right side wall.Behind the sub-coating chamber 1122 of sub-coating chamber 1121 and second back, its left and right surfaces just can be coated with one deck plated film respectively before then flexible substrate 101 passed through second.Magnetron sputtering target 111 in sub-coating chamber 1121 before second is arranged at right side wall; Magnetron sputtering target 111 in the sub-coating chamber 1122 in described second back is arranged on the left side wall.Behind the sub-coating chamber 1122 of sub-coating chamber 1121 and second back, its left and right surfaces just can be coated with one deck plated film respectively before then flexible substrate 101 passed through second.Be that the device 100 that present embodiment provides both can have been realized flexible substrate 101 coating single sides, can realize flexible substrate 101 double-sided coatings again.
Further, referring to Fig. 1 and Fig. 2, among vertical magnetic control film coating device 100 embodiment of above-mentioned volume to volume, described unreeling between chamber 120 and the first sub-coating chamber 1110 is provided with pretreatment chamber 140, and this pretreatment chamber 140 is provided with flexible substrate 101 is carried out pretreated ion bombardment instrument 141 before the plated film.Described ion bombardment instrument 141 can be ion source.The preceding pre-treatment of described plated film mainly comprises to be carried out cleaning and/or surface activation process before the plated film to flexible substrate 101, with the film quality behind assurance flexible substrate 101 plated films.
Further, referring to Fig. 1 and Fig. 2, among vertical magnetic control film coating device 100 embodiment of above-mentioned volume to volume, be provided with after-processing chamber 150 between the 130 and second sub-coating chamber 1120 of described rolling chamber, be provided with the first ion bombardment instrument 151 that flexible substrate 101 retes is carried out the film aftertreatment in this after-processing chamber 150.The described first ion bombardment instrument 151 can be ion source.In the present embodiment, the rete by 151 pairs of flexible substrates 101 of the first ion bombardment instrument carries out the film aftertreatment and can further improve film quality.
In addition, device 100 provided by the present invention, be isolated into independently chamber body owing to unreel chamber 120, coating chamber 110, rolling chamber 130, the distance that rolling chamber 130 interior wind-up rolls 131 and first guide roller are 132 is in the safety range, first guide roller 132 can not be expressed to the rete on the flexible substrate 101, therefore can be to the defectives such as " scuffings " of the rete on the flexible substrate 101.
Should be understood that; below only be the preferred embodiments of the present invention; can not therefore limit claim of the present invention; every equivalent structure or equivalent flow process conversion that utilizes specification sheets of the present invention and accompanying drawing content to do; or directly or indirectly be used in other relevant technical fields, all in like manner be included in the scope of patent protection of the present invention.
Claims (10)
1. the vertical magnetic control film coating device of volume to volume is characterized in that, comprising: coating chamber, and an end of this coating chamber is connected with one and unreels the chamber, and this unreels the indoor roll shaft that is provided with is let off roll and the guide roller that vertical direction arranges; The other end of coating chamber is connected with a rolling chamber, and it is wind-up roll and first guide roller that vertical direction arranges that this rolling chamber is provided with roll shaft; The sidewall of described coating chamber is provided with magnetron sputtering target, and the target surface of this magnetron sputtering target is the vertical direction setting, and parallel with flexible substrate place face; The described slit that is respectively equipped with between chamber and coating chamber, coating chamber and the rolling chamber by flexible substrate that unreels; Described chamber, coating chamber and the rolling chamber of unreeling is respectively equipped with independently air-bleed system.
2. according to the vertical magnetic control film coating device of the described volume to volume of claim 1, it is characterized in that described coating chamber comprises: the first sub-coating chamber, the second sub-coating chamber; Connect between the described first sub-coating chamber and the second sub-coating chamber transition chamber is set;
The end that the described first sub-coating chamber is not connected with transition chamber connects the described chamber that unreels, and the end that the described second sub-coating chamber is not connected with transition chamber connects described rolling chamber;
Described unreeling between chamber and the first sub-coating chamber, the first sub-coating chamber and transition chamber, transition chamber and the second sub-coating chamber, the second sub-coating chamber and the rolling chamber is respectively equipped with described slit;
The described first sub-coating chamber, transition chamber and the second sub-coating chamber are respectively arranged with independently air-bleed system.
3. according to the vertical magnetic control film coating device of the described volume to volume of claim 2, it is characterized in that the described first sub-coating chamber comprises: the first preceding sub-coating chamber, the sub-coating chamber in first back that is connected with sub-coating chamber before first; Be provided with described slit between the sub-coating chamber of sub-coating chamber and first back before described first.
4. according to the vertical magnetic control film coating device of the described volume to volume of claim 3, it is characterized in that, be respectively equipped with at least one described magnetron sputtering target on the sidewall of the sub-coating chamber of the described first preceding sub-coating chamber and first back.
5. according to the vertical magnetic control film coating device of the described volume to volume of claim 4, it is characterized in that the magnetron sputtering target in the described first preceding sub-coating chamber is arranged on left side wall or the right side wall; Magnetron sputtering target in the sub-coating chamber in described first back is arranged on left side wall or the right side wall.
6. according to the vertical magnetic control film coating device of the described volume to volume of claim 2, it is characterized in that the described second sub-coating chamber comprises: the second preceding sub-coating chamber, the sub-coating chamber in second back that is connected with sub-coating chamber before second; Be provided with described slit between the sub-coating chamber of sub-coating chamber and second back before described second.
7. according to the vertical magnetic control film coating device of the described volume to volume of claim 6, it is characterized in that, be equipped with at least one described magnetron sputtering target on the sidewall of the sub-coating chamber of the described second preceding sub-coating chamber and second back.
8. according to the vertical magnetic control film coating device of the described volume to volume of claim 7, it is characterized in that, magnetron sputtering target before described second in the sub-coating chamber is arranged on left side wall or the right side wall, and the magnetron sputtering target in the sub-coating chamber in described second back is arranged on left side wall or the right side wall.
9. according to the vertical magnetic control film coating device of each described volume to volume of claim 1 to 8, it is characterized in that described unreeling between chamber and the first sub-coating chamber is provided with pretreatment chamber, this pretreatment chamber is provided with flexible substrate is carried out pretreated ion bombardment instrument before the plated film.
10. according to the vertical magnetic control film coating device of each described volume to volume of claim 1 to 8, it is characterized in that, be provided with after-processing chamber between described rolling chamber and the second sub-coating chamber, be provided with the ion bombardment instrument that the flexible substrate rete is carried out the film aftertreatment in this after-processing chamber.
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| CN201310196343.5A CN103290385B (en) | 2013-05-24 | 2013-05-24 | Roll-to-roll vertical type magnetic control film plating device |
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| CN201310196343.5A CN103290385B (en) | 2013-05-24 | 2013-05-24 | Roll-to-roll vertical type magnetic control film plating device |
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| CN103290385B CN103290385B (en) | 2015-07-22 |
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| CN104775102A (en) * | 2015-05-04 | 2015-07-15 | 上海产业技术研究院 | Vacuum coating system combining reel-to-reel magnetron sputtering cathode and columnar multi-arc source |
| CN106086822A (en) * | 2016-07-28 | 2016-11-09 | 河北大学 | Be suitable to the volume to volume vacuum coating reaction unit of batch processing |
| CN106282958A (en) * | 2016-11-03 | 2017-01-04 | 成都捷翼电子科技有限公司 | A kind of volume to volume fine vacuum sputter system for flexible electronic component and method |
| CN106319473A (en) * | 2016-08-31 | 2017-01-11 | 湘潭宏大真空技术股份有限公司 | CIGS solar cell film production line |
| CN109049660A (en) * | 2018-08-01 | 2018-12-21 | 嘉兴高正新材料科技股份有限公司 | A kind of high performance membrane material plasma processing equipment |
| CN113097393A (en) * | 2021-04-12 | 2021-07-09 | 辽宁分子流科技有限公司 | Production equipment for preparing flexible organic new energy battery assembly |
| CN115198245A (en) * | 2022-07-18 | 2022-10-18 | 浙江弘康半导体技术股份有限公司 | Oxide high-barrier film, preparation method and vacuum winding coating equipment |
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| CN106086822A (en) * | 2016-07-28 | 2016-11-09 | 河北大学 | Be suitable to the volume to volume vacuum coating reaction unit of batch processing |
| CN106086822B (en) * | 2016-07-28 | 2018-06-08 | 河北大学 | Suitable for the roll-to-roll vacuum coating reaction unit of batch processing |
| CN106319473A (en) * | 2016-08-31 | 2017-01-11 | 湘潭宏大真空技术股份有限公司 | CIGS solar cell film production line |
| CN106319473B (en) * | 2016-08-31 | 2019-04-16 | 旭科新能源股份有限公司 | CIGS solar battery thin film production line |
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| CN109049660A (en) * | 2018-08-01 | 2018-12-21 | 嘉兴高正新材料科技股份有限公司 | A kind of high performance membrane material plasma processing equipment |
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| CN113097393B (en) * | 2021-04-12 | 2024-02-13 | 辽宁分子流科技有限公司 | Production equipment for preparing flexible organic new energy battery assembly |
| CN115198245A (en) * | 2022-07-18 | 2022-10-18 | 浙江弘康半导体技术股份有限公司 | Oxide high-barrier film, preparation method and vacuum winding coating equipment |
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Denomination of invention: Roll-to-roll vertical type magnetic control film plating device Effective date of registration: 20191023 Granted publication date: 20150722 Pledgee: Science and Technology Branch of Torch Development Zone of Zhongshan Rural Commercial Bank Co.,Ltd. Pledgor: Guangdong Sheng Boer Photoelectric Technology Co.,Ltd. Registration number: Y2019980000293 |
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Address after: Building 4, Haiyin Technology Industrial Park, No.1 Industrial Avenue, Banfu Community, Banfu Town, Zhongshan City, Guangdong Province, 528400 Patentee after: Guangdong Sheng Boer Photoelectric Technology Co.,Ltd. Address before: 528400 Room 403, four floor, government side economic and trade building, 25 of ban Fu town, 25 of ban Fu Road, Zhongshan, Guangdong. Patentee before: Guangdong Sheng Boer Photoelectric Technology Co.,Ltd. |