CN103245193B - 烧结炉 - Google Patents
烧结炉 Download PDFInfo
- Publication number
- CN103245193B CN103245193B CN201310043599.2A CN201310043599A CN103245193B CN 103245193 B CN103245193 B CN 103245193B CN 201310043599 A CN201310043599 A CN 201310043599A CN 103245193 B CN103245193 B CN 103245193B
- Authority
- CN
- China
- Prior art keywords
- floss hole
- chamber
- unit
- sintering furnace
- briquet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000005245 sintering Methods 0.000 title claims abstract description 59
- 238000009833 condensation Methods 0.000 claims abstract description 7
- 230000005494 condensation Effects 0.000 claims abstract description 7
- 241000628997 Flos Species 0.000 claims description 89
- 239000000463 material Substances 0.000 claims description 17
- 238000010438 heat treatment Methods 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 13
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 12
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 claims description 4
- 238000012423 maintenance Methods 0.000 claims description 2
- 239000000843 powder Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 11
- 238000001704 evaporation Methods 0.000 description 7
- 229910006404 SnO 2 Inorganic materials 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 6
- 238000002425 crystallisation Methods 0.000 description 5
- 230000008025 crystallization Effects 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229910016006 MoSi Inorganic materials 0.000 description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 4
- 229920002451 polyvinyl alcohol Polymers 0.000 description 4
- 239000011819 refractory material Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 238000004062 sedimentation Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000000641 cold extrusion Methods 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000000313 electron-beam-induced deposition Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02S—GENERATION OF ELECTRIC POWER BY CONVERSION OF INFRARED RADIATION, VISIBLE LIGHT OR ULTRAVIOLET LIGHT, e.g. USING PHOTOVOLTAIC [PV] MODULES
- H02S20/00—Supporting structures for PV modules
- H02S20/20—Supporting structures directly fixed to an immovable object
- H02S20/22—Supporting structures directly fixed to an immovable object specially adapted for buildings
- H02S20/23—Supporting structures directly fixed to an immovable object specially adapted for buildings specially adapted for roof structures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Civil Engineering (AREA)
- Structural Engineering (AREA)
- Furnace Details (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Physical Vapour Deposition (AREA)
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
Abstract
Description
Claims (12)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2012-0011136 | 2012-02-03 | ||
KR1020120011136A KR20130090075A (ko) | 2012-02-03 | 2012-02-03 | 소결로 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103245193A CN103245193A (zh) | 2013-08-14 |
CN103245193B true CN103245193B (zh) | 2015-01-07 |
Family
ID=48924882
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310043599.2A Expired - Fee Related CN103245193B (zh) | 2012-02-03 | 2013-02-04 | 烧结炉 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2013160498A (zh) |
KR (1) | KR20130090075A (zh) |
CN (1) | CN103245193B (zh) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1476420A (zh) * | 2001-07-26 | 2004-02-18 | ס�����������ʽ���� | 一氧化硅烧结体及其制造方法 |
CN1619754A (zh) * | 2003-10-21 | 2005-05-25 | 三星Sdi株式会社 | 等离子体显示板的保护层用氧化镁球粒和等离子体显示板 |
CN101466203A (zh) * | 2007-12-21 | 2009-06-24 | 株式会社田村制作所 | 回流焊装置 |
CN202061785U (zh) * | 2011-05-06 | 2011-12-07 | 京东方科技集团股份有限公司 | 一种预烤装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100415166B1 (ko) * | 2001-11-12 | 2004-01-16 | 주식회사 신명 | 세라믹 전자부품 제조용로 |
KR100826267B1 (ko) * | 2006-05-16 | 2008-04-29 | 삼성전기주식회사 | 세라믹 전자부품 제조용 회전식 소성로 및 그 소성 시스템 |
KR100896573B1 (ko) * | 2007-09-18 | 2009-05-07 | 삼성전기주식회사 | 세라믹 소성로 |
KR101153631B1 (ko) * | 2010-01-14 | 2012-06-18 | 삼성전기주식회사 | 세라믹 제품용 소성로 및 이를 이용한 소성방법 |
-
2012
- 2012-02-03 KR KR1020120011136A patent/KR20130090075A/ko not_active Application Discontinuation
-
2013
- 2013-02-01 JP JP2013018484A patent/JP2013160498A/ja active Pending
- 2013-02-04 CN CN201310043599.2A patent/CN103245193B/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1476420A (zh) * | 2001-07-26 | 2004-02-18 | ס�����������ʽ���� | 一氧化硅烧结体及其制造方法 |
CN1619754A (zh) * | 2003-10-21 | 2005-05-25 | 三星Sdi株式会社 | 等离子体显示板的保护层用氧化镁球粒和等离子体显示板 |
CN101466203A (zh) * | 2007-12-21 | 2009-06-24 | 株式会社田村制作所 | 回流焊装置 |
CN202061785U (zh) * | 2011-05-06 | 2011-12-07 | 京东方科技集团股份有限公司 | 一种预烤装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20130090075A (ko) | 2013-08-13 |
CN103245193A (zh) | 2013-08-14 |
JP2013160498A (ja) | 2013-08-19 |
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C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: SAMSUNG CORNING ADVANCED GLASS CO., LTD. Free format text: FORMER OWNER: SAMSUNG CORNING PRECISION MATERIALS CO., LTD. Effective date: 20140529 |
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C41 | Transfer of patent application or patent right or utility model | ||
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Effective date of registration: 20140529 Address after: South Korea Chung Cheong South Road Applicant after: SAMSUNG CORNING ADVANCED GLASS, LLC Address before: Gyeongbuk, South Korea Applicant before: Samsung Corning Precision Materials Co., Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150107 Termination date: 20150204 |
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