CN103185665A - Method for measuring optical axis of birefringence element - Google Patents
Method for measuring optical axis of birefringence element Download PDFInfo
- Publication number
- CN103185665A CN103185665A CN2013100797419A CN201310079741A CN103185665A CN 103185665 A CN103185665 A CN 103185665A CN 2013100797419 A CN2013100797419 A CN 2013100797419A CN 201310079741 A CN201310079741 A CN 201310079741A CN 103185665 A CN103185665 A CN 103185665A
- Authority
- CN
- China
- Prior art keywords
- laser
- birefringence element
- optical axis
- output
- outside gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
The invention provides a method for measuring the optical axis of a birefringence element. The method comprises the following steps of: continuously outputting laser light by a laser with a half external cavity in a single longitudinal mode; adjusting a polarizing film to ensure that the polarization direction of the polarizing film is perpendicular to the initial polarization direction of the output laser light of the laser with the half external cavity; arranging the birefringence element between an output cavity mirror and an external cavity plane mirror, wherein the birefringence element is provided with two parallel planes in the light path of the output laser light of the laser with the half external cavity and the laser light is incident in a direction perpendicular to the two planes; rotating the birefringence element by taking the axis parallel to the laser light output direction of the laser with the half external cavity as a rotation axis, and driving the external cavity plane mirror to reciprocate in the laser light output direction; and continuously rotating the birefringence element, so that the display device is in an extinction state, and then the optical axis of the birefringence element is obtained.
Description
Technical field
The present invention relates to a kind of measuring method of birefringence element optical axis.
Background technology
Many materials all show strong optical birefringence as biological tissue, optical fiber, liquid crystal and wave plate etc.For these materials, the performance of optical axis azimuthal influence material.The instrument system higher to ask for something, accurately measuring optical axis also has urgent demand.
Many methods are applied to the measurement of optical axis, as Polarization-Sensitive optical coherence tomography etc.But serve as the apparatus structure complexity that the basis is formed with these measuring methods, expensive, measuring accuracy is not high, can not be applied to the high precision field.
Summary of the invention
In sum, necessaryly provide a kind of price lower and have a measuring method of high-precision measurement birefringence element optical axis.
A kind of measuring method of birefringence element optical axis may further comprise the steps: step S10, the measurement mechanism of a birefringence element optical axis is provided, and comprise a half outside gas laser, laser feedback unit and a polarization state detection system; Described half outside gas laser comprises that a high anti-chamber mirror, gain tube, anti-reflection window and output cavity mirror are along the output laser optical path setting of half outside gas laser; Described laser feedback unit comprises an exocoel plane mirror, and described exocoel plane mirror is arranged on the light path of described output cavity mirror emitting laser, and arranges at interval with described output cavity mirror; Described polarization state detection system comprises that a polaroid, a photodetector and display device are along arranging at interval successively from described exocoel plane mirror emitting laser, described photodetector receives from the variation of described polaroid emitting laser with the sensing laser intensity, and described display device shows the variation of laser intensity; Step S11, half outside gas laser export laser continuously, and pattern is single longitudinal mode; Step S12 adjusts described polaroid, makes the polarization direction of described polaroid vertical with the initial polarization direction of described half outside gas laser output laser; Step S13, birefringence element to be measured is arranged between described output cavity mirror and the described exocoel plane mirror, described birefringence element is on two planes that the light path along half outside gas laser output laser has opposing parallel, and described laser is along the direction incident perpendicular to described two planes; Step S14, be the turning axle rotation with described birefringence element with the axis that is parallel to half outside gas laser output laser direction, and drive described exocoel plane mirror along the to-and-fro movement of output laser direction, make described display device the delustring state occur, the optical axis of described birefringence element is identical with the initial polarization direction of described half outside gas laser output laser, obtains the optical axis of birefringence element.
The measuring method of birefringence element optical axis provided by the present invention, based on laser feedback and polarization saltus step principle, by rotating described birefringence element, the optical axis that utilizes described birefringence element produces frosting phenomenon when identical with the polarization direction of half outside gas laser output laser, obtain the optical axis of birefringence element, measurement mechanism is simple in structure, and cost is lower, and have higher measuring accuracy, therefore have more wide application prospect.
Description of drawings
Fig. 1 is the measurement mechanism of the described birefringence element optical axis of the embodiment of the invention.
Fig. 2 is the laser intensity change curve in the described birefringence element rotary course.
The laser intensity change curve of Fig. 3 when to be the birefringence element optical axis consistent with the initial polarization direction of semiconductor laser output laser.
The main element symbol description
| High |
1 |
| |
2 |
| |
3 |
| The |
4 |
| |
5 |
| The |
6 |
| The exocoel |
7 |
| Polaroid | 8 |
| |
9 |
| |
10 |
| Half |
20 |
| The |
30 |
| The polarization |
40 |
Following specific embodiment will further specify the present invention in conjunction with above-mentioned accompanying drawing.
Embodiment
The present invention will be further described below in conjunction with Figure of description, and for convenience of description, the present invention at first describes the measurement mechanism of described birefringence element optical axis.
As shown in Figure 1, first embodiment of the invention provides a kind of measurement mechanism of birefringence element optical axis, and described measurement mechanism comprises a half outside gas laser 20, one laser feedback unit 30 and a polarization state detection system 40.
Described half outside gas laser 20 is used for output laser and forms laser optical path, described half outside gas laser 20 is not only as light source but also as sensor, to form laser feedback, described half outside gas laser 20 is half outer-cavity structure, and the laser of described half outside gas laser 20 outputs is the polarized light of single longitudinal mode.Laser type can be gas laser, semiconductor laser or solid state laser etc.Described half outside gas laser 20 comprises high anti-chamber mirror 1, gain tube 2, anti-reflection window 3 and output cavity mirror 4, and the anti-chamber of described height mirror 1, gain tube 2, anti-reflection window 3, output cavity mirror 4 set gradually and coaxial setting along the axis of described output laser.The anti-chamber of described height mirror 1 is fixedlyed connected away from an end of described output cavity mirror 4 with described gain tube 2, and described anti-reflection window 3 is fixedlyed connected near an end of described output cavity mirror 4 with described gain tube 2.The anti-chamber of described height mirror 1 and output cavity mirror 4 all are coated with the highly reflecting films (reflectivity is more than 98%) of optical maser wavelength, and the former reflectivity is higher than the latter.Described anti-reflection window 3 is coated with the anti-reflection film (not shown) of optical maser wavelength.In the present embodiment, described laser instrument is helium-neon laser, is full of He-Ne gas in the described gain tube 2, and gas ratio is 9:1, and Ne isotope ratio is: Ne
20: Ne
22=1:1, the high anti-chamber mirror 1 of laser instrument and the reflectivity of output cavity mirror 4 are respectively 99.8% and 98.8%.
Described laser feedback unit 30 comprises an exocoel plane mirror 6.Described exocoel plane mirror 6 is arranged on the output light path of described half outside gas laser 20, and with described output cavity mirror 4 formation one space is set at interval, to hold testing sample.The described half outside gas laser 20 of laser reflected back that described exocoel plane mirror 6 is used for half outside gas laser 20 outputs forms laser feedback.Described laser feedback unit 30 can further comprise an exocoel piezoelectric ceramics 7, and described exocoel piezoelectric ceramics 7 is connected with described exocoel plane mirror 6, is used for driving described exocoel plane mirror 6 along the direction to-and-fro movement of described output laser axis.Also available other fine motion elements are alternative to be appreciated that described exocoel piezoelectric ceramics 7, drive described exocoel plane mirror 6 to-and-fro movements.
Described polarization state detection system 40 is used for judging the polarization state of the laser that incides polarization state detection system 40, comprises polaroid 8, photodetector 9 and display device 10.Described polaroid 8 and described photodetector 9 are along the axis setting at described half outside gas laser 20 output laser places.Concrete, described polaroid 8 is arranged at half outside gas laser 20 on the light path of described exocoel plane mirror emitting laser, and arranges at interval with described exocoel plane mirror 6, to receive the laser of described exocoel plane mirror 6 transmissions.Described photodetector 9 is arranged on the light path of the laser that transmits from described polaroid 8, in order to receiving the laser from polaroid 8 transmissions, and described laser intensity is converted into electric signal imports described display device 10.Described display device 10 can show the form of described laser intensity with waveform.In the present embodiment, described display device 10 is an oscillograph.
The present invention further provides a kind of measurement mechanism of using described birefringence element optical axis and measure the measuring method of birefringence element, specifically may further comprise the steps:
Step S11, half outside gas laser 20 is output laser continuously, and pattern is single longitudinal mode;
Step S12 adjusts described polaroid 8, makes the polarization direction of described polaroid 8 vertical with the initial polarization direction of described half outside gas laser 20 output laser;
Step S13 is arranged at birefringence element 5 to be measured between described output cavity mirror 4 and the described exocoel plane mirror 6, and described birefringence element 5 is on two planes that have opposing parallel along the light path of exporting laser;
Step S14 is turning axle with described birefringence element 5 to be parallel to the axis of exporting laser direction, rotates to an angle, and drives described exocoel plane mirror along the direction to-and-fro movement of half outside gas laser 20 output laser;
Step S15 continues the described birefringence element 5 of rotation, makes described display device 10 the delustring state occur, and this moment, the optical axis of described birefringence element was identical with the initial polarization direction of described half outside gas laser 20 output laser, obtained the optical axis of birefringence element 5.
In step S13, two planes that the direction that described birefringence element 5 is exported laser at half outside gas laser 20 has opposing parallel.The laser vertical of described half outside gas laser 20 outputs is in the described plane incident of described birefringence element 5, the optical axis of described birefringence element 5 is parallel to described plane, according to the difference of birefringence element 5 materials, described optical axis can be fast axle or the slow axis of birefringence element 5.Further, two planes of described birefringence element 5 can be coated with anti-reflection film or index-matching fluid, to reduce or eliminate the interference on birefringence element 5 surfaces.
In step S14, serve as the axle rotation with described birefringence element 5 to be parallel to the axis of exporting laser direction.Because the laser vertical of described half outside gas laser 20 outputs in the surperficial incident of described birefringence element 5, can be the turning axle rotation with output laser with described birefringence element 5 therefore.In the process of rotation, to described exocoel piezoelectric ceramics 7 input triangle wave voltages, make described exocoel plane mirror 6 to-and-fro movements simultaneously.Described photodetector 9 is surveyed from polaroid 8 emitting laser Strength Changes, shows with waveform by display device 10 then.
In step S15, continue the described birefringence element 5 of rotation, drive described exocoel plane mirror 6 to-and-fro movements simultaneously, observe the variation of waveform described in the display device 10.As shown in Figure 2, in the process of rotation, as long as there is an angle in the initial polarization direction of the laser of the optical axis of described birefringence element 5 and 20 outputs of described half outside gas laser, then in exocoel plane mirror 6 reciprocating processes, there is laser emitting in the laser of half outside gas laser 20 outputs all the time through behind the polaroid 8, and can not complete extinction.At this moment, the voltage of described photodetector 9 outputs just zero point can not occur, that is to say that the laser intensity that described photodetector 9 receives is non-vanishing all the time.As shown in Figure 3, when zero point appears in the waveform of described display device 10 demonstrations, then the laser intensity that receives of described photodetector 9 also is zero as can be known, that is to say in display device 10 and the delustring state occurs, be that the voltage that display device 10 receives is zero, the optical axis that then can judge described birefringence element 5 this moment is consistent with the initial polarization direction of described half outside gas laser 20 output laser, and then can obtain the optical axis of described birefringence element 5.
The measuring method of described birefringence element optical axis provided by the invention, based on polarization saltus step principle, by rotating described birefringence element, the optical axis that utilizes described birefringence element produces frosting phenomenon when identical with the polarization direction of half outside gas laser output laser, obtains the optical axis of described birefringence element, and need not complex apparatus can measure, measurement mechanism is simple in structure, price is lower, and has very high measuring accuracy, therefore has broad application prospects.
In addition, those skilled in the art also can do other and change in spirit of the present invention, and these variations of doing according to spirit of the present invention certainly all should be included in the present invention's scope required for protection.
Claims (8)
1. the measuring method of a birefringence element optical axis may further comprise the steps:
Step S10 provides the measurement mechanism of a birefringence element optical axis, comprises a half outside gas laser, laser feedback unit and a polarization state detection system;
Described half outside gas laser comprises that a high anti-chamber mirror, gain tube, anti-reflection window and output cavity mirror are along the output laser optical path setting of half outside gas laser;
Described laser feedback unit comprises an exocoel plane mirror, and described exocoel plane mirror is arranged on the light path of described output cavity mirror emitting laser, and arranges at interval with described output cavity mirror;
Described polarization state detection system comprises that a polaroid, a photodetector and display device are along arranging at interval successively from described exocoel plane mirror emitting laser, described photodetector receives from the variation of described polaroid emitting laser with the sensing laser intensity, and described display device shows the variation of laser intensity;
Step S11, half outside gas laser export laser continuously, and pattern is single longitudinal mode;
Step S12 adjusts described polaroid, makes the polarization direction of described polaroid vertical with the initial polarization direction of described half outside gas laser output laser;
Step S13, birefringence element to be measured is arranged between described output cavity mirror and the described exocoel plane mirror, described birefringence element is on two planes that the light path along half outside gas laser output laser has opposing parallel, and described laser is along the direction incident perpendicular to described two planes;
Step S14, be the turning axle rotation with described birefringence element with the axis that is parallel to half outside gas laser output laser direction, and drive described exocoel plane mirror along the to-and-fro movement of output laser direction, make described display device the delustring state occur, the optical axis of described birefringence element is identical with the initial polarization direction of described half outside gas laser output laser, obtains the optical axis of birefringence element.
2. the measuring method of birefringence element optical axis as claimed in claim 1 is characterized in that, the laser of described laser instrument output incides described birefringence element along the direction perpendicular to described two planes.
3. the measuring method of birefringence element optical axis as claimed in claim 1 is characterized in that, described birefringence element is the turning axle rotation with output laser.
4. the measuring method of birefringence element optical axis as claimed in claim 1, it is characterized in that, link to each other with described exocoel plane mirror by an exocoel piezoelectric ceramics, and drive described exocoel plane mirror along the direction to-and-fro movement of described half outside gas laser output laser.
5. the measuring method of birefringence element optical axis as claimed in claim 4 is characterized in that, the voltage of described exocoel piezoelectric ceramics input is triangle wave voltage, drives the to-and-fro movement of described exocoel plane mirror.
6. the measuring method of birefringence element optical axis as claimed in claim 1, it is characterized in that, when the delustring state appears in the waveform that described display device shows, then the laser intensity that receives of described photodetector also is zero, be that the voltage that display device receives is zero, then the optical axis of described birefringence element is consistent with the initial polarization direction of described half outside gas laser output laser at this moment.
7. the measuring method of birefringence element optical axis as claimed in claim 1 is characterized in that, two planes of described birefringence element are coated with anti-reflection film or index-matching fluid.
8. the measuring method of birefringence element optical axis as claimed in claim 1 is characterized in that, the anti-chamber of described height mirror, gain tube, anti-reflection window, output cavity mirror set gradually and coaxial setting along the axis of described output laser.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310079741.9A CN103185665B (en) | 2013-03-13 | 2013-03-13 | The measuring method of birefringence element optical axis |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310079741.9A CN103185665B (en) | 2013-03-13 | 2013-03-13 | The measuring method of birefringence element optical axis |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103185665A true CN103185665A (en) | 2013-07-03 |
| CN103185665B CN103185665B (en) | 2015-08-12 |
Family
ID=48676954
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310079741.9A Expired - Fee Related CN103185665B (en) | 2013-03-13 | 2013-03-13 | The measuring method of birefringence element optical axis |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103185665B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103712781A (en) * | 2013-12-25 | 2014-04-09 | 天津大学 | Device and method for measuring multi-incidence-angle polarization interference in birefringence optical wedge optical axis direction |
| CN104833485A (en) * | 2015-05-12 | 2015-08-12 | 山东大学 | Device and method capable of simultaneously detecting optical axis directions of two birefringence devices |
| CN107817095A (en) * | 2017-09-14 | 2018-03-20 | 西安科佳光电科技有限公司 | A kind of high accuracy double optical axises and more plain shaft parallelism adjusting process in the same direction |
| CN107817094A (en) * | 2017-09-14 | 2018-03-20 | 西安科佳光电科技有限公司 | A kind of high accuracy double optical axises and more plain shaft parallelism adjusting process in the same direction |
| CN107843413A (en) * | 2017-09-14 | 2018-03-27 | 西安科佳光电科技有限公司 | A kind of high accuracy reversely double optical axises and more plain shaft parallelism adjusting process |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0489637A (en) * | 1990-07-25 | 1992-03-23 | Nec Corp | Optical information recording and reproducing device |
| DE4032323A1 (en) * | 1990-10-11 | 1992-04-16 | Adlas Gmbh & Co Kg | SINGLE FASHION LASER |
| CN1710398A (en) * | 2005-06-24 | 2005-12-21 | 清华大学 | Laser feed-back wave plate measuring apparatus |
| CN101021563A (en) * | 2007-03-16 | 2007-08-22 | 清华大学 | Double-refraction external cavity displacement measuring system |
| CN101055207A (en) * | 2007-06-01 | 2007-10-17 | 清华大学 | Device and method for trace to the source for measuring any wave plate retardation |
| CN101650226A (en) * | 2009-09-24 | 2010-02-17 | 清华大学 | Micro phase delay measuring device for optical element based on laser feedback |
-
2013
- 2013-03-13 CN CN201310079741.9A patent/CN103185665B/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0489637A (en) * | 1990-07-25 | 1992-03-23 | Nec Corp | Optical information recording and reproducing device |
| DE4032323A1 (en) * | 1990-10-11 | 1992-04-16 | Adlas Gmbh & Co Kg | SINGLE FASHION LASER |
| CN1710398A (en) * | 2005-06-24 | 2005-12-21 | 清华大学 | Laser feed-back wave plate measuring apparatus |
| CN101021563A (en) * | 2007-03-16 | 2007-08-22 | 清华大学 | Double-refraction external cavity displacement measuring system |
| CN101055207A (en) * | 2007-06-01 | 2007-10-17 | 清华大学 | Device and method for trace to the source for measuring any wave plate retardation |
| CN101650226A (en) * | 2009-09-24 | 2010-02-17 | 清华大学 | Micro phase delay measuring device for optical element based on laser feedback |
Non-Patent Citations (4)
| Title |
|---|
| B.HYLE PARK ET AL.: "Optic axis determination accuracy for fiber-based polarization-sensitive optical coherence tomography", 《OPTIC SLETTERS》 * |
| B.HYLE PARK ET AL.: "Optic axis determination accuracy for fiber-based polarization-sensitive optical coherence tomography", 《OPTIC SLETTERS》, vol. 30, no. 9, 1 October 2005 (2005-10-01) * |
| 刘名等: "激光回馈波片位相延迟测量的误差源及消除方法", 《应用光学》 * |
| 张书练等: "正交线偏振激光器及其在精密测量中的新应用", 《光电工程》 * |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103712781A (en) * | 2013-12-25 | 2014-04-09 | 天津大学 | Device and method for measuring multi-incidence-angle polarization interference in birefringence optical wedge optical axis direction |
| CN103712781B (en) * | 2013-12-25 | 2016-03-30 | 天津大学 | The multiple angles of incidence polarization interference measurement mechanism of birefringent wedge optical axis direction and method |
| CN104833485A (en) * | 2015-05-12 | 2015-08-12 | 山东大学 | Device and method capable of simultaneously detecting optical axis directions of two birefringence devices |
| CN104833485B (en) * | 2015-05-12 | 2017-09-01 | 山东大学 | It is a kind of to detect the device and method of two birefringence device optical axis directions simultaneously |
| CN107817095A (en) * | 2017-09-14 | 2018-03-20 | 西安科佳光电科技有限公司 | A kind of high accuracy double optical axises and more plain shaft parallelism adjusting process in the same direction |
| CN107817094A (en) * | 2017-09-14 | 2018-03-20 | 西安科佳光电科技有限公司 | A kind of high accuracy double optical axises and more plain shaft parallelism adjusting process in the same direction |
| CN107843413A (en) * | 2017-09-14 | 2018-03-27 | 西安科佳光电科技有限公司 | A kind of high accuracy reversely double optical axises and more plain shaft parallelism adjusting process |
| CN107817094B (en) * | 2017-09-14 | 2019-12-20 | 西安科佳光电科技有限公司 | High-precision homodromous double-optical-axis and multi-optical-axis parallelism adjusting method |
| CN107817095B (en) * | 2017-09-14 | 2019-12-20 | 西安科佳光电科技有限公司 | High-precision homodromous double-optical-axis and multi-optical-axis parallelism adjusting method |
| CN107843413B (en) * | 2017-09-14 | 2020-01-10 | 西安科佳光电科技有限公司 | High-precision reverse double-optical-axis and multi-optical-axis parallelism adjusting method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103185665B (en) | 2015-08-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101592537B (en) | Device and method for measuring stress of optical glass | |
| CN107131902B (en) | Calibration method for photoelastic modulator peak delay amount | |
| CN106289499B (en) | A kind of micrometer vibrational system and micrometer method for oscillating using femtosecond laser | |
| CN102735646B (en) | Measuring apparatus and measuring method for refractive index of transparent medium | |
| CN103185665B (en) | The measuring method of birefringence element optical axis | |
| CN110411335A (en) | Differential type sinusoidal phase modulation laser interference surface nanometer-displacement device and method | |
| CN107462849B (en) | Device and method for measuring radio frequency line transmission factor based on atomic energy level | |
| CN107655599B (en) | Method for measuring micro stress of optical element | |
| CN102735430B (en) | Method and device for detecting phase delay | |
| CN103185550B (en) | The measuring method of rotational angle | |
| CN105092530A (en) | Parallel flat crystal optical inhomogeneity absolute measurement method | |
| CN103075966B (en) | Displacement measurement system | |
| CN102998284B (en) | Measurement device and measurement method for transparent medium refractive index | |
| CN104535535B (en) | A kind of apparatus for measuring refractive index and method based on self-mixed interference | |
| CN102323237B (en) | Rapid high-precision absolute measurement device for refractive index of air and measurement method thereof | |
| CN201780263U (en) | Stress measurement device of optical material by laser feedback method | |
| CN103196865B (en) | Measure the measuring method of birefringence element thickness and refractive index simultaneously | |
| CN103604751B (en) | The device of property measuring period chiral structure transparent membrane optical activity and corresponding method | |
| CN102507450A (en) | Method and device for measuring refractive index of transparent medium based on Y-shaped-cavity orthogonal polarization laser | |
| CN204855372U (en) | Large-caliber uniaxial crystal refractive index uniformity measuring device | |
| CN108362412B (en) | Optical fiber laser pressure sensor and pressure measurement method thereof | |
| CN102506768B (en) | Dynamic characteristic calibration method and device for laser small angle measurement device | |
| CN105043612A (en) | Stress measuring system of optical materials | |
| CN103196868A (en) | Determination method of refractive index of photoresist | |
| CN104749137A (en) | Liquid refractive index measurement system and method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150812 Termination date: 20190313 |