CN103176366B - Active drive cable table of lithography machine wafer stage - Google Patents
Active drive cable table of lithography machine wafer stage Download PDFInfo
- Publication number
- CN103176366B CN103176366B CN201110436683.1A CN201110436683A CN103176366B CN 103176366 B CN103176366 B CN 103176366B CN 201110436683 A CN201110436683 A CN 201110436683A CN 103176366 B CN103176366 B CN 103176366B
- Authority
- CN
- China
- Prior art keywords
- cable
- wafer stage
- silicon wafer
- bar mechanism
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
The invention proposes an active drive cable table of a lithography machine wafer stage. The active drive cable table of the lithography machine wafer stage comprises a Y-direction sliding table, a Y-direction lead rail and a five-connecting rod mechanism, wherein the Y-direction sliding table is arranged on the Y-direction lead rail through an air bearing; one end of the five-connecting-rod mechanism is connected to the Y-direction sliding table; the other end of the five-connecting-rod mechanism is connected to the wafer stage through a cable facility; the Y-direction sliding table is driven by the motor to keep synchronous movement together with the wafer stage in a Y direction; the cable facility is conveyed to the wafer stage along the five-connecting-rod mechanism via the Y-direction sliding table; and the five-connecting-rod mechanism comprises an active drive joint for driving the five-connecting-rod mechanism to move along the X direction, so as to drive the cable facility to move along the X direction. The active drive cable table of the lithography machine wafer stage provided by the invention achieves active control on the cable table and pursuit movement of the wafer stage in an X-Y plane by the wafer stage.
Description
Technical field
The present invention relates to semiconductor lithography apparatus field, and in particular to a kind of active driving cable table of photo-etching machine silicon chip platform.
Background technology
In semiconductor lithography equipment, silicon wafer stage precision workpiece stage movement system is extremely important critical component, and its positioning precision directly affects the performance of lithographic equipment, and its travelling speed directly affects the production efficiency of lithographic equipment.Along with improving constantly of VLSI (very large scale integrated circuit) device integration, the continuous enhancing of photoetching resolution, to the characteristic line breadth index request of litho machine also in continuous lifting, the travelling speed of corresponding work stage, acceleration and accuracy requirement also improve constantly.
The typical version of lithography machine stage system is the structure that thick, fine motion combines, due to planar motor, to have force density high, the features such as high speed, high reliability, and be easy to be integrated in controlled device, there is fast response time, control the advantages such as highly sensitive, physical construction is simple, be applied in semiconductor lithography equipment at present, realized the Long travel coarse motion of silicon wafer stage.But realize the silicon wafer stage of Long travel coarse motion without X, Y-direction guide rail owing to adopting planar motor, and for the silicon wafer stage supporting various communications cables, power cable and the pipeline facility such as tracheae, water pipe to need to follow silicon wafer stage at XY move in plane, therefore need to arrange cable support guide piece.Common silicon wafer stage cable facility be passive silicon wafer stage of following at XY move in plane, when silicon wafer stage carries out high-speed motion and nanoscale is accurately located, the pipeline facility of dragging will be can not ignore the disturbance that silicon wafer stage produces.
A kind of planar motor that adopts that prior art is announced drives silicon wafer stage to realize the workpiece table system of Long travel coarse motion, its cable support guide piece mainly comprises one group of V-type link assembly linked together by a revolute pair, one end of link assembly is arranged on slide unit by revolute pair, the other end is arranged on silicon wafer stage by revolute pair, silicon wafer stage cable facility is sent to silicon wafer stage from slide unit along link assembly, and moves at the passive silicon wafer stage of following of Y-direction together with link assembly.Program pipeline facility has support vertical, avoids sagging with work top friction, but follows silicon wafer stage motion Y-direction is passive, can affect silicon wafer stage motion positions precision.
For another example a kind of cable stage adopting the photo-etching machine silicon chip platform of multi-joint manipulator of prior art announcement, this cable stage comprises a control device and at least one multi-joint manipulator, silicon wafer stage pipeline facility is gone on silicon wafer stage by multi-joint manipulator, ensure that pipeline facility initiatively follows silicon wafer stage at XY move in plane by the corner controlling each joint driver, avoid the impact of pipeline facility on silicon wafer stage motion positions precision, but this cable stage complex structure, the more number of drives causing using of manipulator joint number is more, About Redundant Manipulator Control System Design more complicated simultaneously, cost of development is relatively high.
Summary of the invention
The present invention proposes a kind of active driving cable table of photo-etching machine silicon chip platform, realizes the ACTIVE CONTROL of cable stage and cable stage the accompany movement of silicon wafer stage at X-Y plane.
In order to achieve the above object, the present invention proposes a kind of active driving cable table of photo-etching machine silicon chip platform, comprise Y-direction slide unit, Y-direction guide rail and five-bar mechanism, described Y-direction slide unit is arranged on described Y-direction guide rail by air-bearing, described five-bar mechanism one end is connected to described Y-direction slide unit, the other end is connected to silicon wafer stage by cable facility, wherein, described Y-direction slide unit is driven by motor and keeps being synchronized with the movement in Y-direction and silicon wafer stage, described cable facility is transported on described silicon wafer stage via described Y-direction slide unit along described five-bar mechanism, described five-bar mechanism has active drive joint, for driving described five-bar mechanism along X to moving, thus drive described cable facility along X to moving.
Further, described five-bar mechanism comprises five connecting rods, form A font to connect, 2 points of described Y-direction slide unit are wherein individually fixed near the end points of two connecting rods of described Y-direction slide unit, independent intermediate connecting rod is connected to the interlude of above-mentioned two connecting rods, be connected with two connecting rods near described Y-direction slide unit respectively near one end of two connecting rods of described silicon wafer stage, the other end is connected with each other and tapers off to a point and flexibly connected by described cable facility and described silicon wafer stage.
Further, the end points of described five connecting rods is all provided with turning axle pivot and bearing, makes described five-bar mechanism to positive Y-direction or negative Y-direction bending, thus drives the tip tangential movement in X direction of the described five-bar mechanism near described silicon wafer stage.
Further, one of them end of two connecting rods near described Y-direction slide unit is provided with spacer pin or angular stop means, in order to limit described five-bar mechanism only at the scope intrinsic deflection of unidirectional design angle, described connecting rod end is provided with back-moving spring simultaneously.
Further, described five connecting rod medial surfaces and/or lateral surface are provided with the buckle for cable facility cabling.
Further, two connecting rods near described silicon wafer stage are provided with for measuring the planar three freedom displacement transducer of connecting rod relative to silicon wafer stage locus.
Further, described five-bar mechanism is cantilever design, and described five connecting rod aluminium alloys, magnesium alloy, titanium alloy, carbon fiber, pottery or other non-magnetic materials carry out processing and manufacturing.
Further, described active drive joint is driven by electric rotating machine, and described electric rotating machine adopts DC servo motor, motor shaft is provided with rotary encoder or Circular gratings, is used for measuring and controlling motor corner.
Further, flexibly connected by the cable of described cable facility between described five-bar mechanism and silicon wafer stage.
Further, the length of described cable is 10mm ~ 20mm.
Further, described silicon wafer stage is plane air supporting single silicon-chip platform, the many silicon wafer stages of plane air supporting, planar magnetic floats single silicon-chip platform or planar magnetic floats many silicon wafer stages.
Further, described cable facility comprises the communications cable, power cable, tracheae, water pipe.
The present invention proposes a kind of active driving cable table of photo-etching machine silicon chip platform, propose a kind of five-bar mechanism device as mechanical arm, the one dimension free movement of work stage in X-direction is followed from cable stage for realizing, be arranged on Y-direction horizontal guide rail with cable stage, for realizing cable stage one dimension free movement in the Y direction; A whole set of cable stage device possesses the two-dimensional freedom at X-Y plane.
The servomotor of an ACTIVE CONTROL is only set in five-bar mechanism equipment mechanism, for realize mechanism's head cable X to degree of freedom ACTIVE CONTROL and follow micropositioner motion.All the other hinges adopt the bearing of passive freedom degree to connect, and mechanism rotates flexibly, and frictional dissipation is low, little to the interference of micropositioner; Realize the ACTIVE CONTROL of cable stage and cable stage the accompany movement of micropositioner at X-Y plane with this.
The number (servomotor) of reduction system ACTIVE CONTROL unit, increases Passive Control unit (bearing hinge and connecting rod), improves the reliability and stability of system with this.
By the mode of mechanical five-bar mechanism to the effective decoupling zero of system, corresponding outputs of system one input, reduces the difficulty of system and control strategy, reduces the cost of cable stage device, is convenient to the realization of the cable stage control of initiatively following.
Wiring module is assemblied on five-bar mechanism, and whole system possesses flexibility characteristics, meets the demand of cable flexible design.
A kind of fiber mount device, it can realize initiatively, and cable control again can as passive actuator, and wherein the difference of passive device and aggressive device is to change servomotor installation place into bearing.
Beneficial effect of the present invention is:
1) reduce system ACTIVE CONTROL unit number, increase Passive Control unit, improve the reliability and stability of system.
2) reduce the difficulty of system and control strategy, reduce the design cost of device.The realization that the cable stage of being convenient to initiatively follow controls.
3) the vertical size of cable stage is little, and occupy little space, quality is light, device is applicable to high-speed motion.
4) reduce cable stage to the disturbance of micropositioner, shorten the stabilization time of work stage, improve litho machine overall efficiency.
Accompanying drawing explanation
Figure 1 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of present pre-ferred embodiments.
Figure 2 shows that the operating diagram of the five-bar mechanism of present pre-ferred embodiments to negative Y-direction bending.
Figure 3 shows that the operating diagram of the five-bar mechanism of present pre-ferred embodiments to positive Y-direction bending.
Figure 4 shows that the Y-direction slide unit of present pre-ferred embodiments and the structural representation of five-bar mechanism cooperation.
Figure 5 shows that the bar linkage structure schematic diagram of the five-bar mechanism of present pre-ferred embodiments.
Figure 6 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of another preferred embodiment of the present invention.
Figure 7 shows that the Y-direction slide unit of another preferred embodiment of the present invention and the structural representation of five-bar mechanism cooperation.
Figure 8 shows that the passive matrix cable stage structural representation of present pre-ferred embodiments.
Embodiment
In order to more understand technology contents of the present invention, institute's accompanying drawings is coordinated to be described as follows especially exemplified by specific embodiment.
A kind of active driving cable table being applied to photo-etching machine silicon chip platform that the present invention proposes, being particularly useful for adopting planar motor to realize the work stage kinematic system of silicon wafer stage Long travel coarse motion, being also suitable for adopting the double-workpiece-table system of traditional H type frame structure.The present invention is introduced using planar motor as realizing silicon wafer stage Long travel coarse motion system.
Please refer to Fig. 1, Figure 1 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of present pre-ferred embodiments.Silicon wafer stage 11,12 is separately to there being an independently cable stage 410,420, and the structure of cable stage 410,420 is completely the same.Now for the cable stage 410 of the first half in detail its structure is described in detail:
The present invention proposes a kind of active driving cable table 410 of photo-etching machine silicon chip platform, comprise Y-direction slide unit 41, Y-direction guide rail 51 and five-bar mechanism 21, described Y-direction slide unit 41 is arranged on described Y-direction guide rail 51 by air-bearing, described five-bar mechanism 21 one end is connected to described Y-direction slide unit 41, the other end is connected to silicon wafer stage 11 by cable facility, wherein, described Y-direction slide unit 41 is driven by motor and keeps being synchronized with the movement in Y-direction and silicon wafer stage 11, described cable facility 23 is transported on described silicon wafer stage 11 via described Y-direction slide unit 41 along described five-bar mechanism 21, described cable facility 23 comprises the communications cable, power cable, tracheae, the pipelines such as water pipe, described five-bar mechanism 21 has active drive joint 31, for driving described five-bar mechanism 21 along X to moving, thus drive described cable facility along X to moving.
When silicon wafer stage 11 is along X to when moving, five-bar mechanism 21 can either play support guide effect to cable facility 23, can under the driving in active drive joint 31, drive cable facility 23 along X to moving again, control whole driving active driving cable table 410 in XY plane, initiatively to follow silicon wafer stage 11 move simultaneously, avoid cable facility 23 to move the disturbance propagation that produces to silicon wafer stage 11 at X to Y-direction, affect the kinematic accuracy of silicon wafer stage 11.
Please refer to Fig. 2 and Fig. 3 again, Figure 2 shows that the operating diagram of the five-bar mechanism of present pre-ferred embodiments to negative Y-direction bending, Figure 3 shows that the operating diagram of the five-bar mechanism of present pre-ferred embodiments to positive Y-direction bending.A whole set of five-bar mechanism can to positive Y-direction bending, to make forward terminal C tangential movement in X direction accurately.Meanwhile, five-bar mechanism also can be symmetrical to negative Y-direction bending, to make forward terminal C tangential movement in X direction accurately.The set direction of its cable support bending is any in principle, depends on the layout in work stage space, be suitable for suitable with work stage space layout in reality.
Described five-bar mechanism comprises five connecting rods, and forming " A " font and connect, is AB bar, BC bar, CD bar, DE bar and GF bar respectively.AB bar and DE bar are the connecting rods of a pair symmetry, and BC bar and CD bar are also the connecting rods of a pair symmetry, and intermediate connecting rod GF is overlapped on separately connecting rod AB and DE interlude.At its terminal A, B, C, D, E, F and G, be all provided with axle pivot and bearing that rotation can be provided, choose wherein a certain end points (such as A or B) as the mounting points in active rotation joint.A point and the E point of this five-bar mechanism are fixed on (or on base) on Y-direction slide unit, AB bar and DE bar can at certain angular range intrinsic deflections, retrain using GF bar as main degree of freedom, control five-bar mechanism, contraction and extension, guarantee that C point can move reciprocatingly along the direction of OC horizontal linear, namely the movement locus of C point is moving reciprocatingly along on OA straight line, and wherein OC is vertical in AE.
Flexibly connected by the cable 3 of described cable facility between described five-bar mechanism 2 and silicon wafer stage 1, the length of described cable 3 is 10mm ~ 20mm.With the flexible characteristic of cable 3 (electric wire and tracheae) self, compensate the difference that six degree of freedom silicon wafer stage 1 produces in the motion of the trace of Z-direction, Rx, Ry and Rz.
For restriction five-bar mechanism 2 support is to forward and any bending of negative sense both direction, five connecting rod AB bar (or DE bar) ends are provided with spacer pin (or angular stop means) 4 and limit AB bar (or DE bar) only at the scope intrinsic deflection of unidirectional design angle, be provided with back-moving spring 5 simultaneously, when five-bar mechanism 2 is in contraction state, back-moving spring 5 is in inelastic state.When five-bar mechanism 2 is in extended state, back-moving spring 5 is in extended state (spring-return power is maximum).Realize monolateral back and forth movement with this, and control the problem that deflection angle avoids crossing over critical extended state transfer point.
Please refer to Fig. 4 again, Figure 4 shows that the Y-direction slide unit of present pre-ferred embodiments and the structural representation of five-bar mechanism cooperation.At connecting rod medial surface and/or lateral surface (such as AB bar side 100 and BC bar side 200), the pipeline buckle 400 for fixed cable facility is installed.Connecting rod AB one end A point coexists on cable stage 300 and installs, and inside has rotation axis pivot 500 to be connected.Active drive joint is provided with electric rotating machine 600 and rotary encoder (not shown), described electric rotating machine 600 adopts DC servo motor, power needed for the selection of a whole set of connecting rod is provided, and control five connecting rods stretching in X-direction, motor shaft is provided with rotary encoder or Circular gratings, is used for measuring and controlling motor corner; Be connected by a rotation axis pivot 500 between connecting rod BC with connecting rod CD, its end is provided with for measuring the planar three freedom displacement transducer (not shown) of connecting rod relative to silicon wafer stage locus; All connecting rods must be less than silicon wafer stage laser interferometer catoptron at vertical height vertical with the overall height of joint motor, can not block the optical path of laser interferometer during to ensure that silicon wafer stage normally works.
Figure 5 shows that the bar linkage structure schematic diagram of the five-bar mechanism of present pre-ferred embodiments, for the structure three-dimensional view of AB bar and BC bar, the A end of connecting rod AB is fixed together with cable stage, inside have axle pivot/bearing to make it to rotate around A1A2 dot center axle, B end (centered by B1B2 axle) of connecting rod AB is fixed together with the stator axis bearing of electric rotating machine.B end (centered by B1B2 axle) of connecting rod BC is fixed together with the mover axle of electric rotating machine, and passing through to make electric rotating machine to select mover control AB bar and BC bar, take B1B2 as the angle of common central shaft folding.The C end of connecting rod BC is held coaxial (centered by C1C2 axle) with the C of CD bar, and owing to being subject to the change of angle and the geometrical constraint of whole five-bar mechanism of AB bar and the folding of BC bar, C is held can carry out one dimension tangential movement in X direction.The B end of connecting rod AB is arranged on rotating shaft B1B2 by two bearings, wherein connecting rod AB and bearing outer ring interference fit.Bearing inner race then links together with interference fit with rotation axis B1B2, motor is connected with rotation axis B1B2 by small size coupling, the B end of connecting rod BC is fixedly mounted on rotation axis B1B2, the C end of connecting rod BC is then provided with and measures the planar three freedom displacement transducer of connecting rod relative to silicon wafer stage.Pipeline buckle 400 for fixed cable facility is installed on outside connecting rod AB and BC, the left side of linkage assembly is used for signal cable, power cable equal diameter is less, the cable facility cabling that corresponding bending radius is relatively little, right side is then comparatively large for tracheae, water pipe equal diameter, the cable facility cabling that bending radius is also relatively large.
Further, described five-bar mechanism is cantilever design, in order to reduce cantilever quality, consider the occasion being applied in and adopting levitation planar motor simultaneously, the non-magnetic material that connecting rod aluminium alloy, magnesium alloy, titanium alloy, carbon fiber or ceramic isodensity are less carrys out processing and manufacturing, and described silicon wafer stage is plane air supporting single silicon-chip platform, the many silicon wafer stages of plane air supporting, planar magnetic floats single silicon-chip platform or planar magnetic floats many silicon wafer stages.
Sum up above embodiment, the five-bar mechanism that it comprises an active drive joint is one dimension degree of freedom motion, the end C of this linkage assembly can be made under electric rotating machine effect to arrive with any point on the AE line segment line of symmetry that is mid point, make C point along X to horizontal reciprocating movement.In addition, in conjunction with the shift motion of Y-direction slide unit in Y-direction, cable stage can drive the whole series in XY plane, initiatively to follow silicon wafer stage motion without connecting rod cable facility, and the disturbance produced when ensureing cable ride motion can not be delivered to silicon wafer stage system.Greatly reduced the difficulty of Systematical control and relevant device and cost by the mechanism of an Electric Machine Control simultaneously.
Please refer to Fig. 6 and Fig. 7 again, Figure 6 shows that the active driving cable table structural representation of the photo-etching machine silicon chip platform of another preferred embodiment of the present invention, Figure 7 shows that the Y-direction slide unit of another preferred embodiment of the present invention and the structural representation of five-bar mechanism cooperation.Wherein the layout of cable and pipeline can be arranged in the inner side of five-bar mechanism, arranges along AB and BC, and cable is same with the inwardly bending of five connecting rods with flexible pipe.In addition, the electric rotating machine as the active drive joint 31 of five-bar mechanism can be arranged in A end or E end, with the selected angle of control AB bar, controls the flexible of a whole set of five-bar mechanism, so control C point along X to motion in one dimension.Due to symmetric principle, AB and DE pole pair claims, BC and CD pole pair claims.This sentences AB bar and BC bar is that example describes corresponding arrangement, and wherein pipeline buckle is arranged in the inner side of two bars.Pipeline can need to select in inner side configuration or outside configuration according to configuration, or both configure simultaneously.Wherein the drive unit electric rotating machine of five connecting rods can be arranged in A end, and five connecting rod front end cantilever quality are alleviated, such that structure is simple and system is reliable.
Figure 8 shows that the passive matrix cable stage structural representation of present pre-ferred embodiments.This device also as the passive fiber mount device of one, can carry out the Passive Control dragging cable because of work stage motion.When as passive device, it and the difference of aggressive device are that servomotor installation place 310 being changed into bearing installs.The free-extension in X-direction of five connecting rod cable supports is realized with this.
When as active control device, whole five-bar mechanism relies on driven by servomotor, controls to shrink or extended state, controls five-bar mechanism C point and does motion in one dimension in X-direction.When as passive towed equipment, whole five-bar mechanism relies on micropositioner and drives, and controls to shrink or extended state, controls five-bar mechanism C point and does one dimension to-and-fro movement in X-direction.
Although the present invention with preferred embodiment disclose as above, so itself and be not used to limit the present invention.Persond having ordinary knowledge in the technical field of the present invention, without departing from the spirit and scope of the present invention, when being used for a variety of modifications and variations.Therefore, protection scope of the present invention is when being as the criterion depending on those as defined in claim.
Claims (11)
1. the active driving cable table of a photo-etching machine silicon chip platform, comprise Y-direction slide unit, Y-direction guide rail and five-bar mechanism, described Y-direction slide unit is arranged on described Y-direction guide rail by air-bearing, described five-bar mechanism one end is connected to described Y-direction slide unit, the other end is connected to silicon wafer stage by cable facility, wherein, described Y-direction slide unit is driven by motor and keeps being synchronized with the movement in Y-direction and silicon wafer stage, described cable facility is transported on described silicon wafer stage via described Y-direction slide unit along described five-bar mechanism, described five-bar mechanism has active drive joint, for driving described five-bar mechanism along X to moving, thus drive described cable facility along X to moving, it is characterized in that, described five-bar mechanism comprises five connecting rods, form A font to connect, 2 points of described Y-direction slide unit are wherein individually fixed near the end points of two connecting rods of described Y-direction slide unit, independent intermediate connecting rod is connected to the interlude of above-mentioned two connecting rods, be connected with two connecting rods near described Y-direction slide unit respectively near one end of two connecting rods of described silicon wafer stage, the other end is connected with each other and tapers off to a point and flexibly connected by described cable facility and described silicon wafer stage.
2. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, it is characterized in that, the end points of described five connecting rods is all provided with turning axle pivot and bearing, make described five-bar mechanism to positive Y-direction or negative Y-direction bending, thus drive the tip tangential movement in X direction of the described five-bar mechanism near described silicon wafer stage.
3. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, it is characterized in that, one of them end of two connecting rods near described Y-direction slide unit is provided with spacer pin or angular stop means, in order to limit described five-bar mechanism only at the scope intrinsic deflection of unidirectional design angle, described connecting rod end is provided with back-moving spring simultaneously.
4. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, is characterized in that, described five connecting rod medial surfaces and/or lateral surface are provided with the buckle for cable facility cabling.
5. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, is characterized in that, two connecting rods near described silicon wafer stage are provided with for measuring the planar three freedom displacement transducer of connecting rod relative to silicon wafer stage locus.
6. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, is characterized in that, described five-bar mechanism is cantilever design, and described five connecting rod aluminium alloys, magnesium alloy, titanium alloy, carbon fiber or potteries carry out processing and manufacturing.
7. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, it is characterized in that, described active drive joint is driven by electric rotating machine, described electric rotating machine adopts DC servo motor, motor shaft is provided with rotary encoder or Circular gratings, is used for measuring and controlling motor corner.
8. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, is characterized in that, is flexibly connected between described five-bar mechanism and silicon wafer stage by the cable of described cable facility.
9. the active driving cable table of photo-etching machine silicon chip platform according to claim 8, is characterized in that, the length of described cable is 10mm ~ 20mm.
10. the active driving cable table of photo-etching machine silicon chip platform according to claim 1, is characterized in that, described silicon wafer stage is plane air supporting single silicon-chip platform, the many silicon wafer stages of plane air supporting, planar magnetic floats single silicon-chip platform or planar magnetic floats many silicon wafer stages.
The active driving cable table of 11. photo-etching machine silicon chip platforms according to claim 1, is characterized in that, described cable facility comprises the communications cable, power cable, tracheae pipeline and water pipe pipeline.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110436683.1A CN103176366B (en) | 2011-12-22 | 2011-12-22 | Active drive cable table of lithography machine wafer stage |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110436683.1A CN103176366B (en) | 2011-12-22 | 2011-12-22 | Active drive cable table of lithography machine wafer stage |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103176366A CN103176366A (en) | 2013-06-26 |
| CN103176366B true CN103176366B (en) | 2015-01-21 |
Family
ID=48636330
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110436683.1A Active CN103176366B (en) | 2011-12-22 | 2011-12-22 | Active drive cable table of lithography machine wafer stage |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103176366B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108873621B (en) * | 2018-07-26 | 2020-06-05 | 中山新诺科技股份有限公司 | Cantilever type double-table-board double-side exposure machine and double-side exposure method |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0595612A (en) * | 1991-10-01 | 1993-04-16 | Sumitomo Electric Ind Ltd | Manipulator for wiring distribution line |
| CN1200321C (en) * | 2003-08-29 | 2005-05-04 | 清华大学 | Step-by-step projection photo-etching machine double set shifting exposure ultra-sophisticated positioning silicon chip bench system |
| US7131999B2 (en) * | 2004-09-28 | 2006-11-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP4540722B2 (en) * | 2008-04-24 | 2010-09-08 | 株式会社椿本チエイン | Cable protection guide device |
| JP2011081367A (en) * | 2009-09-10 | 2011-04-21 | Nikon Corp | Device for guiding power transmitting member, and substrate processing apparatus |
| CN101770180A (en) * | 2010-02-02 | 2010-07-07 | 清华大学 | Cable stage for lithography wafer stages, adopting multi-joint manipulators |
| CN102152300A (en) * | 2011-02-25 | 2011-08-17 | 天津大学 | Linear-driven high-speed planar parallel mechanical arm |
-
2011
- 2011-12-22 CN CN201110436683.1A patent/CN103176366B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN103176366A (en) | 2013-06-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103021473B (en) | Direct drive type motion decoupling high-accuracy servo platform | |
| CN102540442B (en) | Plane parallel three-degree-of-freedom precise operating platform | |
| CN103208867B (en) | Magnet unit, magnet array, magnetic levitation planar motor and lithographic device using magnetic levitation planar motor | |
| US7316149B2 (en) | Inter-pressing-machine work transfer device | |
| CN102623070A (en) | Precise two-degree of freedom micro-displacement positioning device | |
| CN103454864B (en) | The magnetic that a kind of thick essence moves one floats mask table system | |
| CN103104793A (en) | Integrated type six degrees of freedom precision positioning platform | |
| CN209774584U (en) | Planar three-degree-of-freedom fully-flexible parallel positioning platform | |
| TWI572542B (en) | Workpiece cable assembly | |
| CN103019046A (en) | Six-freedom-degree magnetic levitation micropositioner based on multi-group individual drive decoupling control | |
| CN206123167U (en) | Accurate motion platform of hard and soft coupling of single drive | |
| CN103246168B (en) | A kind of active driving cable table of photo-etching machine silicon chip platform | |
| CN112859535A (en) | Bridge type differential flexible displacement reducing mechanism | |
| CN101770180A (en) | Cable stage for lithography wafer stages, adopting multi-joint manipulators | |
| CN103176366B (en) | Active drive cable table of lithography machine wafer stage | |
| CN103383526A (en) | Coarse/precision laminated workbench | |
| CN105006255A (en) | Three-degree-of-freedom micro-positioning workbench | |
| CN103105742B (en) | Mask table system of six-degree-of-freedom coarse table with photoelectric position detector measurement function | |
| CN104343916A (en) | Parallel mechanism with two degrees of freedom | |
| CN202075293U (en) | Test stand for testing high speed driving and protection of numerical control machine | |
| CN100515659C (en) | X-Y objective table | |
| CN103116250B (en) | Masking platform system with laser interferometer measurement and six-freedom-degree coarse movement platform | |
| CN103137532B (en) | Coplanar three-axis positioning device | |
| CN102540739B (en) | Active driving cable table | |
| CN103454863B (en) | A kind of cable stage with flexible joint for photo-etching machine work-piece platform |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |
|
| CP01 | Change in the name or title of a patent holder |