CN108873621B - Cantilever type double-table-board double-side exposure machine and double-side exposure method - Google Patents

Cantilever type double-table-board double-side exposure machine and double-side exposure method Download PDF

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Publication number
CN108873621B
CN108873621B CN201810836042.7A CN201810836042A CN108873621B CN 108873621 B CN108873621 B CN 108873621B CN 201810836042 A CN201810836042 A CN 201810836042A CN 108873621 B CN108873621 B CN 108873621B
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CN
China
Prior art keywords
exposure
loading
loading platform
moving plate
exposed
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CN201810836042.7A
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Chinese (zh)
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CN108873621A (en
Inventor
汪孝军
廖平强
张胜
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中山新诺科技股份有限公司
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Priority to CN201810836042.7A priority Critical patent/CN108873621B/en
Publication of CN108873621A publication Critical patent/CN108873621A/en
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Publication of CN108873621B publication Critical patent/CN108873621B/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • G03F7/70725Stages control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70758Drive means, e.g. actuator, motor

Abstract

The invention relates to a cantilever type double-side exposure machine with double table-boards and a double-side exposure method, comprising an installation frame; the first exposure component and the second exposure component are respectively arranged on two sides of the mounting rack; a first loading platform and a second loading platform; and the driving mechanism comprises a driving component, and the first loading platform and the second loading platform respectively pass through the exposure area in a first motion state and a second motion state. When exposure is carried out, the first loading platform moves in a first circulating track and passes through the exposure area in a first moving state so as to expose a first part to be exposed, the second loading platform moves in a second circulating track and passes through the exposure area in a second moving state so as to expose a second part to be exposed, the first loading platform and the second loading platform both move circularly, unloading of a first exposure finished product or loading of the next first part to be exposed can be carried out when the second part to be exposed is exposed, the exposure efficiency is higher, and compared with the traditional mode of turning over double-sided exposure, the exposure precision is higher.

Description

Cantilever type double-table-board double-side exposure machine and double-side exposure method

Technical Field

The invention relates to the technical field of double-sided exposure, in particular to a cantilever type double-table-board double-sided exposure machine and a double-sided exposure method.

Background

In a conventional double-sided exposure machine, a film transfer is generally used to expose a double-sided circuit board. Before exposure, a film of a pattern to be transferred needs to be manufactured; then, fixing films with patterns on two sides on the upper and lower two-sided glass respectively; and then, clamping the circuit board to be transferred with the pattern between the upper glass and the lower glass, exposing by using a blue-violet high-brightness light source, transferring the circuit pattern onto the circuit board, and completing double-sided exposure. Whereas for a laser direct write exposure machine, single-sided exposure is generally employed. Exposing one surface of the circuit board, turning over after exposure is completed, then exposing the other surface of the circuit board, and finally completing double-sided exposure of the circuit board.

However, when the laser direct writing exposure machine performs double-sided exposure, the laser direct writing exposure machine needs to be turned over, and the turning operation inevitably causes the problem of alignment after turning over, so that not only is the exposure process increased, but also the exposure precision is affected due to the alignment precision problem, and the final exposure effect is affected.

Disclosure of Invention

Accordingly, it is desirable to provide a cantilever type double-side exposure machine and a double-side exposure method. The cantilever type double-table-board double-side exposure machine does not need to be turned over when exposure is carried out, so that the exposure flow is reduced, the exposure precision is improved, and the exposure imaging quality is further improved; the double-side exposure method is applied to the cantilever type double-table-board double-side exposure machine, the exposure efficiency is higher, and the automatic operation is convenient to realize.

The technical scheme is as follows:

on one hand, the cantilever type double-table-board double-side exposure machine comprises an installation frame, wherein the installation frame comprises a first exposure seat, a second exposure seat, a first support frame and a second support frame, the first exposure seat and the second exposure seat are oppositely arranged, and the first support frame and the second support frame are oppositely arranged and supported between the first exposure seat and the second exposure seat; the exposure mechanism comprises a first exposure component and a second exposure component, the first exposure component is arranged on the first exposure seat, the second exposure component is arranged on the second exposure seat, and the first exposure component and the second exposure component are oppositely arranged and form an exposure area; the loading mechanism comprises a first loading platform, a second loading platform, a first moving plate and a second moving plate, the first moving plate is movably connected with a first supporting frame, the first loading platform is arranged on the first moving plate in a cantilever manner and movably connected with the first moving plate, the second moving plate is movably connected with a second supporting frame, the second loading platform is arranged on the second moving plate in a cantilever manner and movably connected with the second moving plate, and the first loading platform and the second loading platform are both positioned between the first supporting frame and the second supporting frame; the driving mechanism comprises a first driving component and a second driving component, the first driving component comprises a first driving piece and a second driving piece, and the second driving component comprises a third driving piece and a fourth driving piece; the first driving part is used for driving the first moving plate to move back and forth on the first support frame, the second driving part is used for driving the first loading platform to move up and down on the first moving plate, and the first moving plate and the first loading platform move in a matched mode to enable the first loading platform to move along a rectangular first circulating track so that the first loading platform can be exposed through the exposure area in a first moving state; the third driving part is used for driving the second moving plate to move back and forth on the second supporting frame, the fourth driving part is used for driving the second loading platform to move up and down on the second moving plate, and the second moving plate and the second loading platform move in a matched mode to enable the second loading platform to move along a rectangular second circulating track so that the second loading platform can be exposed through the exposure area in a second moving state.

Above-mentioned cantilever type double-mesa's two-sided exposure machine, when exposing, first loading platform moves with first circulation orbit, and pass through the exposure area when first motion state, in order to expose first piece that treats exposing, and the second loading platform moves with second circulation orbit, and pass through the exposure area when the second motion state, in order to expose the second piece that treats exposing, first loading platform and second loading platform all circulate, and the second piece that treats exposing still can carry out the unloading of first exposure finished product or the loading of next first piece that treats exposing when exposing, and exposure efficiency is higher, compare the tradition and adopt the mode of upset two-sided exposure, exposure accuracy is also higher.

The technical solution is further explained below:

in one embodiment, the first exposure assembly includes a first exposure member and a second exposure member, the first exposure member has a plurality of first light source members, the first light source members are arranged in a row at intervals, the second exposure member has a plurality of second light source members, the second light source members are arranged in a row at intervals, the first light source members and the second light source members are arranged in parallel and staggered, and the arrangement position of one first light source member corresponds to the position of a gap between two second light source members.

In one embodiment, the first exposure assembly and the second exposure assembly form a maskless exposure system.

In one embodiment, the first support frame is provided with a first slide rail, the second support frame is provided with a second slide rail, the first moving plate is provided with a first sliding groove matched with the first slide rail, and the second moving plate is provided with a second sliding groove matched with the second slide rail;

or the first moving plate is provided with a first guide rod, the first loading platform is provided with a first guide hole matched with the first guide rod, the second moving plate is provided with a second guide rod, and the second loading platform is provided with a second guide hole matched with the second guide rod.

In one embodiment, the loading device further comprises a sensing mechanism, wherein the sensing mechanism comprises a first sensor, a second sensor, a third sensor and a fourth sensor, the first sensor is used for detecting the moving position of the first moving plate, the second sensor is used for detecting the moving position of the first loading platform, the third sensor is used for detecting the moving position of the second moving plate, and the fourth sensor is used for detecting the moving position of the second loading platform.

In one embodiment, the exposure device further comprises a control mechanism, the control mechanism comprises a controller, and the first exposure assembly, the second exposure assembly, the first driving piece, the second driving piece, the third driving piece, the fourth driving piece, the first sensor, the second sensor, the third sensor and the fourth sensor are all electrically connected with the controller.

In one embodiment, the first loading table is provided with a first loading portion and the second loading table is provided with a second loading portion.

On the other hand, a double-side exposure method is also provided, which can be applied to the cantilever type double-table-board double-side exposure machine in any one technical scheme, and comprises the following steps:

(S1) the first loading table being at a first initial position, the second loading table being at a second initial position, the first loading table being loaded with the first to-be-exposed member;

(S2) moving the first loading table to the first exposure position in the first circulation trajectory so that the first member to be exposed is located in the exposure region;

(S3) the first exposure component and the second exposure component expose the first piece to be exposed and obtain a first exposure finished product; simultaneously, loading a second member to be exposed on a second loading platform;

(S4), the first loading stage moves to a first initial position along a first circulation trajectory and unloads the first exposure product;

(S5) the second loading table moves to the second exposure position along the second circulation track to locate the second member to be exposed in the exposure area;

(S6) the first exposure component and the second exposure component expose the second to-be-exposed piece to obtain a second exposure finished product; simultaneously, loading the next first piece to be exposed on the first loading platform;

(S7), the second loading stage moves to a second initial position along a second circulation trajectory, and unloads the second exposure product.

According to the double-side exposure method, the first to-be-exposed part and the second to-be-exposed part are exposed sequentially through the cyclic motion of the first loading platform and the second loading platform, so that the automatic operation is convenient to realize, and when the second to-be-exposed part is exposed, the next first to-be-exposed part can be loaded synchronously, so that the time utilization efficiency during exposure is improved, and the exposure efficiency is improved.

Drawings

FIG. 1 is a flowchart illustrating a double-sided exposure method according to an embodiment;

FIG. 2 is a front view showing the whole structure of the cantilever type double-side exposure machine of the embodiment;

FIG. 3 is a top view showing the entire structure of the cantilever type double-side exposure machine of the embodiment.

Reference is made to the accompanying drawings in which:

100. the device comprises a mounting frame, 210, a first exposure component, 220, a second exposure component, 310, a first loading platform, 320, a second loading platform, 330, a first moving plate, 340, a second moving plate, 410, a first member to be exposed, 420 and a second member to be exposed.

Detailed Description

Embodiments of the present invention are described in detail below with reference to the accompanying drawings:

it will be understood that when an element is referred to herein as being "secured" to another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly on" another element, there are no intervening elements present. The terms "vertical," "horizontal," "left," "right," and the like as used herein are for illustrative purposes only and do not represent the only embodiments.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

As shown in fig. 1 to 3, a cantilever type double-side exposure machine is provided, which includes a mounting frame 100, wherein the mounting frame 100 includes a first exposure seat, a second exposure seat, a first support frame and a second support frame, the first exposure seat and the second exposure seat are arranged oppositely, and the first support frame and the second support frame are arranged oppositely and supported between the first exposure seat and the second exposure seat; the exposure mechanism comprises a first exposure component 210 and a second exposure component 220, the first exposure component 210 is arranged on a first exposure seat, the second exposure component 220 is arranged on a second exposure seat, and the first exposure component 210 and the second exposure component 220 are oppositely arranged and form an exposure area; the loading mechanism comprises a first loading platform 310 and a second loading platform 320, wherein the first loading platform 310 is movably connected with a first support frame and enables the first loading platform 310 to be arranged on the first support frame in a cantilever manner, the second loading platform 320 is movably connected with a second support frame and enables the second loading platform 320 to be arranged on the second support frame in a cantilever manner, and the first loading platform 310 and the second loading platform 320 are both positioned between the first support frame and the second support frame; the driving mechanism comprises a driving component; the driving component drives the first loading platform 310 to move on the first support frame in a first circular track, and the first loading platform 310 is exposed through the exposure area in a first moving state; the driving component also drives the second loading platform 320 to move in the second circular track on the second support frame, and exposes the second loading platform 320 through the exposure area in the second moving state.

When exposure is carried out, the first loading platform 310 moves in a first circulating track and passes through the exposure area in a first moving state so as to expose the first piece to be exposed 410, the second loading platform 320 moves in a second circulating track and passes through the exposure area in a second moving state so as to expose the second piece to be exposed 420, the first loading platform 310 and the second loading platform 320 both move circularly, unloading of a first exposure finished product or loading of the next first piece to be exposed 410 can be carried out when the second piece to be exposed 420 is exposed, the exposure efficiency is higher, and compared with the traditional mode of turning over double-sided exposure, the exposure precision is higher.

The traditional laser direct writing exposure machine can only expose a single side and can not expose two sides simultaneously, and needs to be turned over after one side is exposed so as to expose the other side; meanwhile, the traditional double-sided exposure mostly adopts film transfer printing, the process flow is also increased in the process of film manufacturing, the cost of film manufacturing is high, and the film needs to be replaced after being used for a period of time.

In this embodiment, the first exposure component 210 and the second exposure component 220 are respectively disposed on two sides of the mounting block 100, that is, the first exposure component 210 is disposed on the first exposure seat, the second exposure component is disposed on the second exposure seat, the first exposure component 210 and the second exposure component 220 are disposed opposite to each other, and an exposure area is formed in the mounting block 100, that is, the exposure area is disposed between the first exposure seat and the second exposure seat, when the first loading platform 310 or the second loading platform 320 passes through, the first exposure component 410 on the first loading platform 310 or the second exposure component 420 on the second loading platform 320 can be exposed. The relative arrangement of the first exposure module 210 and the second exposure module 220 means that the light emitting end of the first exposure module 210 and the light emitting end of the second exposure module 220 are arranged face to face and at intervals to form an exposure area therebetween, and the technical effect of completing front and back exposure at one time during exposure is achieved.

The first loading platform 310 and the second loading platform 320 are respectively movably connected with the first support frame and the second support frame of the mounting frame 100, and the first loading platform 310 and the second loading platform 320 respectively move along the first circular track and the second circular track to realize the circular movement of the first loading platform 310 and the second loading platform 320. When the first loading platform 310 is in a first moving state of a first circular track on the first support frame, the first loading platform 310 is located in an exposure area and performs exposure on the first to-be-exposed piece 410, at this time, the second loading platform 320 moves on the second support frame in a second circular track and is not located in the exposure area, and at this time, unloading of an exposed piece or loading of a next to-be-exposed piece can be performed on the second loading platform 320; when the second loading platform 320 is in the second moving state of the second circular track on the second support frame, the second loading platform 320 is located in the exposure area, and performs exposure on the second workpiece 420 to be exposed, at this time, the first loading platform 310 moves on the first circular track and leaves the exposure area, at this time, the first exposed finished product that has been exposed on the first loading platform 310 can be unloaded, and the next first workpiece 410 can be loaded. Through the operation, the unloading or loading operation on the first loading platform 310 is realized while the second member to be exposed 420 on the second loading platform 320 is exposed, and the exposure efficiency is improved. The first loading platform 310 and the second loading platform 320 both move circularly, so that the automatic operation is convenient to realize, the exposure efficiency can be further improved, the automation level is improved, the operation process standardization of the exposure operation process is realized, the manual operation process is reduced, and the labor cost is reduced.

Further, the first exposure module 210 and the second exposure module 220 are both fixedly disposed. As shown in fig. 2 and 3, the first exposure module 210 and the second exposure module 220 are vertically and respectively fixed on the first exposure seat and the second exposure seat of the mounting block 100, and an exposure area is formed inside the mounting block 100.

During installation, the installation accuracy of the first exposure component 210 and the second exposure component 220 needs to be ensured, so that the corresponding position accuracy of the first exposure component 210 and the second exposure component 220 is ensured, the alignment accuracy of subsequent exposure graphs is improved, and compared with a traditional double-sided exposure mode that a to-be-exposed piece is aligned again in a turnover mode, the exposure accuracy is higher.

In addition, as shown in fig. 3, the first exposure component 210 includes a first exposure component and a second exposure component, the first exposure component has a plurality of first light source components, the first light source components are arranged at intervals and are arranged in a row, the second exposure component has a plurality of second light source components, the second light source components are arranged at intervals and are arranged in a row, the first light source components and the second light source components are arranged in parallel and are staggered (as shown in fig. 3, the left end of the first exposure component and the left end of the second exposure component are not aligned but are staggered by a certain distance), so that the arrangement position of one first light source component corresponds to the position of the gap between the two second light source components; the second exposure module 220 can be configured similarly, and will not be described herein.

By such arrangement, exposure patterns during exposure are accurately butted to form a required exposure image, and the exposure accuracy is further improved.

Optionally, the first exposure module 210 and the second exposure module 220 form a maskless exposure system (DMD exposure system for short), the maskless exposure system amplifies an image through a projection objective lens to realize one-time exposure, the number of the first light source devices and the second light source devices of the DMD exposure system is determined according to the size of an exposure pattern, and the exposure precision is higher.

It should be noted that, when the first to-be-exposed part 410 or the second to-be-exposed part 420 is exposed in the exposure region, both the light emitted by the first exposure component 210 and the light emitted by the second exposure component 220 need to reach the first to-be-exposed part 410 or the second to-be-exposed part 420. Therefore, the first loading portion or the second loading portion should be provided to make the exposed front and back side regions of the first member to be exposed 410 or the front and back side exposed regions of the second member to be exposed 420 leak out, so as to meet the requirement of exposure. If the first loading part is arranged in a frame structure, the first piece to be exposed 410 is arranged on the outer frame of the first loading part, so that the middle part of the frame is not shielded, and light can irradiate the front and back areas of the first piece to be exposed 410 to carry out normal front and back exposure; if the first loading portion is a loading through groove, the first loading portion is a structure that needs to be set by a person skilled in the art as needed, and any prior art that can meet the setting requirements can be used for specific setting, and details are not described here.

As in the embodiment shown in fig. 2 and 3, the driving assembly further includes a first driving assembly for driving the first loading table 310 to move the first loading table 310 in a first circular path, and a second driving assembly for driving the second loading table 320 to move the second loading table 320 in a second circular path.

The first circular track and the second circular track may be rectangular tracks, or may be other tracks capable of meeting the requirement, such as circular tracks, and the specific arrangement may be performed by those skilled in the art as required.

Such as a rectangular trajectory for the first loop trajectory. At this time, a first support frame of the mounting frame 100 is provided with a first rectangular rail groove, a second support frame of the mounting frame 100 is provided with a second rectangular rail groove, and the first driving assembly drives the first loading platform 310 to move along the first rectangular rail groove on the first support frame and enables the first loading platform 310 to move along a first circulating track to realize exposure of the first to-be-exposed part 410 on the first loading platform; the second loop trajectory is the same and will not be described here.

In fact, the first loading platform 310 and the second loading platform 320 may also be disposed on the same side of the mounting frame 100, that is, the first loading platform 310 and the second loading platform 320 are disposed on the first support frame or the second support frame. At this time, the first rectangular track groove is nested in the second rectangular track groove, or the second rectangular track groove is nested in the first rectangular track groove, that is, the length and width of the first rectangular track groove are different from those of the second rectangular track groove, and the radius of the first circular track groove is also different from that of the second circular track groove, and those skilled in the art should be aware of the specific setting of avoiding interference when the first loading platform 310 and the second loading platform 320 move during the design, and the description is omitted here.

As shown in the embodiment of fig. 2, the loading mechanism further includes a first moving plate 330 and a second moving plate 340, the first moving plate 330 is movably connected to the first supporting frame, and the second moving plate 340 is movably connected to the second supporting frame; the first loading platform 310 is arranged on the first moving plate 330 and movably connected with the first moving plate 330, the first driving assembly comprises a first driving element and a second driving element, the first driving element is used for driving the first moving plate 330 to move on the first supporting frame, the second driving element is used for driving the first loading platform 310 to move on the first moving plate 330, and the first moving plate 330 and the first loading platform 310 move in a matching manner to enable the first loading platform 310 to move along a first circulation track;

the second loading platform 320 is disposed on the second moving plate 340 and movably connected to the second moving plate 340, the second driving assembly includes a third driving element and a fourth driving element, the third driving element is used for driving the second moving plate 340 to move on the second supporting frame, the fourth driving element is used for driving the second loading platform 320 to move on the second moving plate 340, and the second moving plate 340 and the second loading platform 320 move in a matching manner to enable the second loading platform 320 to move along the second circulation track.

As shown in fig. 2, the first driving element can drive the first moving plate 330 to move back and forth on the first supporting frame at the left side of the mounting block 100, the second driving element can drive the first loading table 310 to move up and down on the first moving plate 330, the third driving element can drive the second moving plate 340 to move back and forth on the second supporting frame at the right side of the mounting block 100, and the fourth driving element can drive the second loading table 320 to move up and down on the second moving plate 340.

The first moving plate 330, the second moving plate 340, the first loading platform 310 and the second loading platform 320 are moved in a matching manner through the driving action of the first driving element, the second driving element, the third driving element and the fourth driving element, so that the first loading platform 310 moves along a rectangular first moving track, and the second loading platform 320 moves along a rectangular second moving track.

As shown in fig. 2 and 3, the up-and-down movement regions of the first and second loading tables 310 and 320 are located in the up-and-down regions of the first and second exposing units 210 and 220; of course, the present invention is not limited thereto, if necessary.

In addition, as shown in fig. 2, the first moving plate 330 and the second moving plate 340 are disposed on the left and right sides of the mounting block 100, that is, the first moving plate 330 and the second moving plate 340 are respectively disposed on the first supporting frame and the second supporting frame, the first loading table 310 and the second loading table 320 are respectively disposed on the corresponding first moving plate 330 and the second moving plate 340, and the first loading table 310 and the second loading table 310 move in an upper-lower two-layer manner during movement, so that the occupied space of the mechanism is saved, and the production cost is reduced.

On the basis of any of the above embodiments, the first support frame is provided with a first slide rail, the second support frame is provided with a second slide rail, the first moving plate 330 is provided with a first slide groove matched with the first slide rail, and the second moving plate 340 is provided with a second slide groove matched with the second slide rail; or the first moving plate 330 is provided with a first guide bar, the first loading platform 310 is provided with a first guide hole matched with the first guide bar, the second moving plate 340 is provided with a second guide bar, and the second loading platform 320 is provided with a second guide hole matched with the second guide bar.

The sliding rails and the sliding grooves are matched, or the guide rods and the guide holes are arranged to realize the moving stability between the first moving plate 330 and the second moving plate 340 and between the first support frame and the second support frame, so that the moving stability of the first loading platform 310 and the second loading platform 320 is realized, the moving precision is improved, and the exposure precision is ensured.

On the basis of any of the above embodiments, a sensing mechanism is further included, and the sensing mechanism includes a first sensor for detecting the moving position of the first moving plate 330, a second sensor for detecting the moving position of the first loading table 310, a third sensor for detecting the moving position of the second moving plate 340, and a fourth sensor for detecting the moving position of the second loading table 320.

By the arrangement of the sensing mechanism, the movement accuracy of the first moving plate 330, the second moving plate 340, the first loading table 310 and the second loading table 320 is improved, and the exposure accuracy is improved.

On the basis of any of the above embodiments, the system further includes a control mechanism, the control mechanism includes a controller, and the first exposure module 210, the second exposure module 220, the first driving element, the second driving element, the third driving element, the fourth driving element, the first sensor, the second sensor, the third sensor, and the fourth sensor are all electrically connected to the controller.

The control mechanism is arranged to coordinate the work among the exposure mechanism, the loading mechanism and the driving mechanism, so that more accurate and efficient pattern exposure is realized.

In any of the above embodiments, the first loading table 310 is provided with a first loading portion, and the second loading table 320 is provided with a second loading portion.

The first and second loading parts are provided to facilitate loading of the first and second members to be exposed 410 and 420 and to improve loading efficiency.

The embodiment shown in fig. 1 further provides a double-sided exposure method, which can be applied to the cantilever type double-mesa double-sided exposure machine described in any one of the above embodiments, and comprises the following steps:

(S1), the first loading stage 310 is located at the first initial position, the second loading stage 320 is located at the second initial position, and the first to-be-exposed member 410 is loaded at the first loading stage 310;

(S2), the first loading table 310 moves to the first exposure position in the first circulation trajectory so that the first member to be exposed 410 is located in the exposure area;

(S3), the first exposure component 210 and the second exposure component 220 expose the first to-be-exposed piece 410 and obtain a first exposed finished product; simultaneously, the second to-be-exposed member 420 is loaded on the second loading stage 320;

(S4), the first loading stage 310 moves to the first initial position along the first circulation trajectory and unloads the first exposure product;

(S5), the second loading table 320 moves to the second exposure position along the second circulation track, so that the second member to be exposed 420 is located in the exposure area;

(S6), the first exposure component 210 and the second exposure component 220 expose the second member to be exposed 420 and obtain a second exposure finished product; at the same time, the next first to-be-exposed piece 410 is loaded at the first loading stage 310;

(S7), the second loading stage 320 moves to the second initial position along the second circulation trajectory, and unloads the second exposure product.

Through the cyclic motion of the first loading platform 310 and the second loading platform 320, the first piece 410 to be exposed and the second piece 420 to be exposed are exposed sequentially, so that the automatic operation is convenient to realize, and when the second piece 420 to be exposed is exposed, the next first piece 410 to be exposed can be loaded synchronously, so that the time utilization efficiency during exposure is improved, and the exposure efficiency is improved.

It should be noted that the sequence from the step (S1) to the step (S7) is not strict, and the manner from the step (S1) to the step (S7) is adopted for convenience of expression and description, and those skilled in the art can make specific adjustments as needed during actual operation, and details are not repeated here. As in step (S6), at the same time, unloading of the first exposure completed product may also be performed, and unloading may not necessarily be performed only in step (S4).

Further, as shown in fig. 1 and fig. 2, the following steps are performed during exposure:

the first loading platform 310 is located at the rear of the first support frame on the mounting rack 100, namely, at the first initial position, the second loading platform 320 is located at the front of the second support frame on the mounting rack 100, namely, at the second initial position, and the first piece to be exposed 410 is loaded on the first loading platform 310;

the first loading table 310 moves down along the first moving plate 330 to a first preset first position;

the first moving plate 330 moves forward to the first exposure position with the first loading stage 310 located at the exposure area;

the first exposure component 210 and the second exposure component 220 expose the first to-be-exposed piece 410 to obtain a first exposure finished product; simultaneously, the second to-be-exposed member 420 is loaded on the second loading stage 320;

the first moving plate 330 continues to move forward and reaches the first preset second position, leaving the first loading platform 310 away from the exposure area;

the second moving plate 340 moves backward to a second preset first position; the second loading table 320 moves down along the second moving plate 340 to a second preset second position; the second moving plate 340 moves forward to the second exposure position and the second loading stage 320 is located at the exposure area;

the first loading platform 310 moves upwards to a first preset third position; the first moving plate 330 moves backward and returns to the first initial position, and unloads the first exposure product on the first loading stage 310;

the first exposure component 210 and the second exposure component 220 expose the second member to be exposed 420 to obtain a second exposure finished product; at the same time, the next first to-be-exposed piece 410 is loaded at the first loading stage 310;

the second moving plate 340 continues to move forward to a second preset third position, the second loading platform 320 moves upward to a second preset fourth position, and the second moving plate 340 moves backward to a second initial position (here, the second preset fourth position may be directly the second initial position);

the step of moving the first loading table 310 down along the first moving plate 330 to the first preset first position is entered and is cyclically performed.

Here, in the embodiment shown in fig. 2 and 3, the first loading table 310 and the second loading table 320 move up and down between the upper first exposure module 210 and the lower second exposure module 220. Therefore, the second loading table 320 cannot pass through the exposure area when the first member to be exposed 410 is exposed, so as to avoid affecting the exposure of the first member to be exposed 410, and thus, the second moving plate 340 cannot pass through the exposure area when the first member to be exposed 410 is exposed;

similarly, when the second member to be exposed 420 is exposed, a person skilled in the art can reasonably arrange the time nodes of the circular motion and the like as needed to meet the exposure requirement, and details are not repeated herein.

In specific implementation, after the exposure of the first to-be-exposed member 410 is completed, the first loading platform 310 moves at a high speed and returns to the first initial position; after the exposure of the second member to be exposed 420 is completed, the second loading table 320 moves at a high speed and returns to the second initial position. Those skilled in the art can make specific settings as needed to obtain the appropriate motion node and match between exposure, loading and unloading.

The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.

The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.

Claims (8)

1. A cantilever type double-table-board double-side exposure machine is characterized by comprising:
the mounting frame comprises a first exposure seat, a second exposure seat, a first support frame and a second support frame, the first exposure seat and the second exposure seat are oppositely arranged, and the first support frame and the second support frame are oppositely arranged and supported between the first exposure seat and the second exposure seat;
the exposure mechanism comprises a first exposure component and a second exposure component, the first exposure component is arranged on the first exposure seat, the second exposure component is arranged on the second exposure seat, and the first exposure component and the second exposure component are oppositely arranged and form an exposure area;
the loading mechanism comprises a first loading platform, a second loading platform, a first moving plate and a second moving plate, the first moving plate is movably connected with the first support frame, the first loading platform is arranged on the first moving plate in a cantilever manner and is movably connected with the first moving plate, the second moving plate is movably connected with the second support frame, the second loading platform is arranged on the second moving plate in a cantilever manner and is movably connected with the second moving plate, and the first loading platform and the second loading platform are both positioned between the first support frame and the second support frame; and
the driving mechanism comprises a first driving assembly and a second driving assembly, the first driving assembly comprises a first driving piece and a second driving piece, and the second driving assembly comprises a third driving piece and a fourth driving piece;
the first driving part is used for driving the first moving plate to move back and forth on the first support frame, the second driving part is used for driving the first loading platform to move up and down on the first moving plate, and the first moving plate and the first loading platform move in a matched mode to enable the first loading platform to move along a rectangular first circulating track so that the first loading platform can be exposed through the exposure area in a first moving state;
the third driving part is used for driving the second moving plate to move back and forth on the second supporting frame, the fourth driving part is used for driving the second loading table to move up and down on the second moving plate, and the second moving plate and the second loading table move in a matched mode to enable the second loading table to move along a second rectangular circulating track so that the second loading table can be exposed through the exposure area in a second moving state.
2. The cantilevered double-side exposure machine according to claim 1, wherein the first exposure unit comprises a first exposure member and a second exposure member, the first exposure member has a plurality of first light source members arranged in a row at a pitch, the second exposure member has a plurality of second light source members arranged in a row at a pitch, the first light source members are arranged in parallel with the second light source members in a staggered arrangement so that the arrangement position of one first light source member corresponds to the position of the gap between two second light source members.
3. The cantilevered dual-mesa double exposure machine according to claim 2, wherein the first exposure assembly and the second exposure assembly form a maskless exposure system.
4. The cantilevered double-side exposure machine according to claim 1, wherein the first support frame is provided with a first slide rail, the second support frame is provided with a second slide rail, the first moving plate is provided with a first slide groove engaged with the first slide rail, and the second moving plate is provided with a second slide groove engaged with the second slide rail;
or the first moving plate is provided with a first guide rod, the first loading platform is provided with a first guide hole matched with the first guide rod, the second moving plate is provided with a second guide rod, and the second loading platform is provided with a second guide hole matched with the second guide rod.
5. The cantilevered double-deck double-side exposure machine according to claim 1, further comprising a sensing mechanism including a first sensor for detecting a moving position of the first moving plate, a second sensor for detecting a moving position of the first loading table, a third sensor for detecting a moving position of the second moving plate, and a fourth sensor for detecting a moving position of the second loading table.
6. The cantilevered double-sided exposure machine of claim 5, further comprising a control mechanism, the control mechanism comprising a controller, the first exposure assembly, the second exposure assembly, the first driving member, the second driving member, the third driving member, the fourth driving member, the first sensor, the second sensor, the third sensor and the fourth sensor being electrically connected to the controller.
7. A cantilevered double-table double-side exposure machine according to any one of claims 1-6, wherein the first loading station is provided with a first loading portion and the second loading station is provided with a second loading portion.
8. A double-side exposure method applicable to the cantilever type double-table-top double-side exposure machine according to any one of claims 1 to 7, comprising the steps of:
(S1) the first loading table being at a first initial position, the second loading table being at a second initial position, the first loading table being loaded with the first to-be-exposed member;
(S2) moving the first loading table to a first exposure position in a first cyclic trajectory so that the first member to be exposed is located in an exposure area;
(S3) exposing the first to-be-exposed piece by the first exposure component and the second exposure component to obtain a first exposed finished product; simultaneously, loading a second member to be exposed on the second loading platform;
(S4), the first loading stage moving to the first initial position along the first circulation trajectory and unloading the first exposure product;
(S5), the second loading platform moves to a second exposure position along the second circulation track, and the second member to be exposed is positioned in the exposure area;
(S6) exposing the second piece to be exposed by the first exposure component and the second exposure component to obtain a second exposure finished product; simultaneously, loading the next first piece to be exposed on the first loading platform;
(S7), the second loading stage moves to the second initial position along the second circulation trajectory, and unloads the second exposure product.
CN201810836042.7A 2018-07-26 2018-07-26 Cantilever type double-table-board double-side exposure machine and double-side exposure method CN108873621B (en)

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CN201810836042.7A CN108873621B (en) 2018-07-26 2018-07-26 Cantilever type double-table-board double-side exposure machine and double-side exposure method
PCT/CN2018/122484 WO2020019653A1 (en) 2018-07-26 2018-12-20 Cantilevered double-table double-sided digital exposure system and exposure method

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CN108873622B (en) * 2018-07-26 2020-03-31 中山新诺科技股份有限公司 Double-side exposure machine with double loading parts and double-side exposure method
CN108983556A (en) * 2018-07-26 2018-12-11 中山新诺科技股份有限公司 Sided exposure machine and double-faced exposure method
CN108873621B (en) * 2018-07-26 2020-06-05 中山新诺科技股份有限公司 Cantilever type double-table-board double-side exposure machine and double-side exposure method

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