CN103165521B - 用于激光修复芯片的方法 - Google Patents
用于激光修复芯片的方法 Download PDFInfo
- Publication number
- CN103165521B CN103165521B CN201110415378.4A CN201110415378A CN103165521B CN 103165521 B CN103165521 B CN 103165521B CN 201110415378 A CN201110415378 A CN 201110415378A CN 103165521 B CN103165521 B CN 103165521B
- Authority
- CN
- China
- Prior art keywords
- chip
- repairing
- unit
- laser
- information
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Design And Manufacture Of Integrated Circuits (AREA)
Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110415378.4A CN103165521B (zh) | 2011-12-13 | 2011-12-13 | 用于激光修复芯片的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110415378.4A CN103165521B (zh) | 2011-12-13 | 2011-12-13 | 用于激光修复芯片的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103165521A CN103165521A (zh) | 2013-06-19 |
CN103165521B true CN103165521B (zh) | 2015-06-03 |
Family
ID=48588498
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201110415378.4A Active CN103165521B (zh) | 2011-12-13 | 2011-12-13 | 用于激光修复芯片的方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN103165521B (zh) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1316101A (zh) * | 1998-07-20 | 2001-10-03 | 株式会社艾塞米肯 | 测量产额损失芯片数目及各类差芯片数目的方法 |
CN101114609A (zh) * | 2006-07-24 | 2008-01-30 | 海力士半导体有限公司 | 具有竖直形成的保护膜的熔线盒的制造方法 |
CN101441336A (zh) * | 2007-11-23 | 2009-05-27 | 上海广电Nec液晶显示器有限公司 | 液晶显示装置及其修复方法 |
CN101552258A (zh) * | 2008-04-02 | 2009-10-07 | 海力士半导体有限公司 | 半导体器件的熔丝部以及制造方法 |
CN101587247A (zh) * | 2008-05-23 | 2009-11-25 | 上海广电Nec液晶显示器有限公司 | 液晶显示装置及其修复方法 |
CN101673666A (zh) * | 2008-09-12 | 2010-03-17 | 奥林巴斯株式会社 | 激光修复装置及激光修复方法 |
CN102074546A (zh) * | 2009-11-25 | 2011-05-25 | 采钰科技股份有限公司 | 具有熔丝结构的电子元件及其修复方法 |
-
2011
- 2011-12-13 CN CN201110415378.4A patent/CN103165521B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1316101A (zh) * | 1998-07-20 | 2001-10-03 | 株式会社艾塞米肯 | 测量产额损失芯片数目及各类差芯片数目的方法 |
CN101114609A (zh) * | 2006-07-24 | 2008-01-30 | 海力士半导体有限公司 | 具有竖直形成的保护膜的熔线盒的制造方法 |
CN101441336A (zh) * | 2007-11-23 | 2009-05-27 | 上海广电Nec液晶显示器有限公司 | 液晶显示装置及其修复方法 |
CN101552258A (zh) * | 2008-04-02 | 2009-10-07 | 海力士半导体有限公司 | 半导体器件的熔丝部以及制造方法 |
CN101587247A (zh) * | 2008-05-23 | 2009-11-25 | 上海广电Nec液晶显示器有限公司 | 液晶显示装置及其修复方法 |
CN101673666A (zh) * | 2008-09-12 | 2010-03-17 | 奥林巴斯株式会社 | 激光修复装置及激光修复方法 |
CN102074546A (zh) * | 2009-11-25 | 2011-05-25 | 采钰科技股份有限公司 | 具有熔丝结构的电子元件及其修复方法 |
Also Published As
Publication number | Publication date |
---|---|
CN103165521A (zh) | 2013-06-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6185707B1 (en) | IC test software system for mapping logical functional test data of logic integrated circuits to physical representation | |
CN102142355B (zh) | 物体制造缺陷的应用方法 | |
CN100410953C (zh) | 错误位置识别方法以及结合纯逻辑与物理布局信息的系统 | |
CN108519550A (zh) | 集成电路晶圆测试优化方法 | |
US11669957B2 (en) | Semiconductor wafer measurement method and system | |
US20120185818A1 (en) | Method for smart defect screen and sample | |
CN103150430A (zh) | 一种测试芯片版图的生成方法 | |
Khare et al. | From contamination to defects, faults and yield loss: simulation and applications | |
US9146270B2 (en) | Method for testing a plurality of transistors in a target chip | |
CN102683165A (zh) | 智能缺陷筛选及取样方法 | |
CN112420535A (zh) | 一种芯片制作方法及系统 | |
CN111104774A (zh) | 晶圆图的生成方法 | |
US10860774B2 (en) | Methodology for pattern density optimization | |
CN102662092A (zh) | 晶圆测试装置及方法 | |
US20140019927A1 (en) | Waferless measurement recipe | |
CN103165521B (zh) | 用于激光修复芯片的方法 | |
CN105067984B (zh) | 利用测试数据恢复tsk系列探针台map的方法 | |
US7356787B2 (en) | Alternative methodology for defect simulation and system | |
JP2004119963A (ja) | 経験的データに基づく試験最適化方法 | |
CN111259616B (zh) | 一种集成电路布局数据的处理方法 | |
CN103972122A (zh) | 一种晶圆针测方法及装置 | |
CN114661596A (zh) | 一种自动测试参数化单元功能的方法 | |
US20130336571A1 (en) | Mask pattern analysis apparatus and method for analyzing mask pattern | |
CN111429426B (zh) | 一种检测对象缺陷图案的提取装置、提取方法及存储介质 | |
CN111241777B (zh) | 一种PCB Layout中更新放置封装pad的方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING Free format text: FORMER OWNER: HUAHONG NEC ELECTRONICS CO LTD, SHANGHAI Effective date: 20140115 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 201206 PUDONG NEW AREA, SHANGHAI TO: 201203 PUDONG NEW AREA, SHANGHAI |
|
TA01 | Transfer of patent application right |
Effective date of registration: 20140115 Address after: 201203 Shanghai city Zuchongzhi road Pudong New Area Zhangjiang hi tech Park No. 1399 Applicant after: Shanghai Huahong Grace Semiconductor Manufacturing Corporation Address before: 201206, Shanghai, Pudong New Area, Sichuan Road, No. 1188 Bridge Applicant before: Shanghai Huahong NEC Electronics Co., Ltd. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant |