CN103074578A - Rotary deposition apparatus - Google Patents
Rotary deposition apparatus Download PDFInfo
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- CN103074578A CN103074578A CN2012102797936A CN201210279793A CN103074578A CN 103074578 A CN103074578 A CN 103074578A CN 2012102797936 A CN2012102797936 A CN 2012102797936A CN 201210279793 A CN201210279793 A CN 201210279793A CN 103074578 A CN103074578 A CN 103074578A
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- face glass
- deposition source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention discloses a rotary deposition apparatus which comprises the following components: at least one glass panel retaining shelf which retains a glass panel; at least one first rotating device which rotates the glass panel retaining shelf; at least one deposition source which stores deposition material and discharges the deposition material on the glass panel; and at least one compartment which comprises the glass panel retaining shelf, the first rotating device and the deposition. The rotary deposition apparatus can remarkably improve the uniformity of the film at the glass panel circumference, which is commonly lower than the uniformity at the central part of the glass panel. Furthermore, the distance between the glass panel and the deposition source can be adjusted to an optimal distance, so that the film can be uniformly formed on the glass panel with a higher deposition efficiency. Furthermore, in a linear arrangement structure in which a plurality of compartments are successively connected one by one, organic materials which form different kinds of films are respectively configured in the compartments, thereby preventing cross contamination of the organic materials.
Description
Technical field
The present invention relates in general to rotary depositing device, more specifically, relates to a kind of rotary depositing device that is constructed such that the nozzle unit rotation of face glass and/or deposition source, thereby improves the uniformity coefficient that is formed on the film on the face glass.
Background technology
Usually, Organic Light Emitting Diode (OLED) is the selfluminous device that causes extensive concern as display unit of future generation.OLED has lot of advantages, such as, the picture quality higher than photograph (photograph) quality, wide visual angle, almost do not have dead visual angle (dead viewing angle), be reduced to 1/3 thickness, the reduce power consumption of LCD and approximately be 1/1000 the fast response time of LCD.Therefore, utilize OLED to produce high-quality video etc.
In having the OLED of above-mentioned feature, the hole transfers to hole transmission layer from anode, and electronics is from cathode transport to electron transfer layer.Hole and electronics recombine each other in the luminescent layer that is arranged between hole transmission layer and the electron transfer layer, thus electron-hole pair (exciton) produced.Be obtained from the light of the power generation specific wavelength of electron-hole pair.
Typically, the formation of organic thin film layer (such as hole transmission layer, luminescent layer, electron transfer layer etc.) comprising: make the organic materials evaporation that comprises in the crucible (crucible) in high vacuum compartment (booth), and the organic materials of evaporation is deposited on the face glass.As shown in Figure 1, in conventional art, different types of organic materials is fed among deposition source 12a, the 12b and 12c that is arranged in the single compartment 10.When face glass 11 moved through compartment 10, well heater or allied equipment heating organic materials were so that organic materials deposits on the face glass 11.But in this deposition method, owing to moving freely of the organic materials that evaporates, the organic materials of different types of evaporation deposits on the face glass 11 in single compartment 11 randomly, therefore causes the crossed contamination of organic materials.In order to address this problem, attempted several method, for example, increase the spacing between the deposition source, perhaps before depositing to another kind of organic materials on the face glass, remove the front a kind of organic materials that remains in the compartment.But, can not from compartment, remove residual front a kind of organic materials fully.And, need extra time and readjust spacing between the deposition source to be fit to different types of organic materials and remove from compartment before a kind of organic materials.Especially, recently using in the situation of large-size glass panel, the homogeneity that is formed on the film on the deposition surface of face glass further reduces.The thickness of the organic material film that typically, deposits must
Extremely
Scope in, and the homogeneity of thickness is necessary for 5% or less.
In order to solve the problems referred to above in the conventional art, in being entitled as Korean Patent public publication 10-2004-0002362 number (on January 7th, 2004) (patent documentation 1) of " Deposition Apparatus(depositing device) ", a kind of depositing device has been proposed.Particularly, in the depositing device of patent documentation 1, be arranged on the top surface below of compartment with the retainer 4 that acts on the unit that keeps mask and face glass 3, and swivel arrangement 5 makes face glass 3 rotations, thereby the uniformity coefficient that is deposited on the film on the face glass 3 can be improved (with reference to Fig. 4 and the described embodiment of page 5 thereof of patent documentation 1).
But the depositing device of patent documentation 1 is constructed such that only to have the face glass rotation.Therefore, the degree that can improve uniformity of film is restricted, and does not propose solution for the cross-contamination issue of organic materials.
At Korean Patent public publication 10-2008-0007820 number (on January 23rd, 2008) (patent documentation 2) that is entitled as " Rotary deposition source for thin film deposition and thin film deposition apparatus using the same(is used for the rotary deposition source of thin film deposition and the film deposition equipment of this deposition source of use) " the another kind of equipment relevant with deposition technique has been proposed.Particularly, in patent documentation 2, axle 500 is installed in the lower surface below of deposition source 10, and deposition source 10 can be around axle 500 rotations, thereby has improved the uniformity coefficient that is deposited on the film on the face glass 20 (with reference to Fig. 2 of patent documentation 2 and the 4th and the 5th section of page 4 thereof).
But, in the depositing device of patent documentation 2, because 10 rotations of whole deposition source, so operation efficiency reduces.And centrifugal force can reduce the uniformity coefficient of centre portions and the film between its periphery of face glass.In addition, the technology of patent documentation 2 does not still have proposition for the solution of the cross-contamination issue of organic materials.
[prior art document]
[patent documentation]
1. Korean Patent public publication 10-2004-0002362 number (on January 7th, 2004)
2. Korean Patent public publication 10-2008-0007820 number (on January 23rd, 2008)
Summary of the invention
Therefore, consider the problems referred to above that occur in the prior art, the present invention has been proposed, and the object of the present invention is to provide a kind of rotary depositing device, therefore the nozzle unit rotation that it is constructed such that face glass and/or deposition source has improved the uniformity coefficient that is formed on the film on the face glass.
Another object of the present invention provides a kind of rotary depositing device, in this rotary depositing device, a plurality of compartments are constructed with the linear pattern decoration form, so that a plurality of compartments connect sequentially one by one, and film forming different types of organic materials can be separately positioned in separately the compartment, has therefore prevented the crossed contamination of organic materials.
To achieve these goals, on the one hand, the invention provides a kind of rotary depositing device, comprising: at least one face glass retainer keeps face glass; At least one first swivel arrangement makes the rotation of face glass retainer; At least one deposition source, the storage deposition material, described deposition source is discharged into deposition material on the face glass; And at least one compartment, comprise described face glass retainer, the first swivel arrangement and deposition source in the compartment.
This rotary depositing device can further comprise: at least one nozzle unit, be connected to deposition source, described nozzle unit comprises a plurality of nozzles so that deposition material by nozzle discharge to face glass; And at least one second swivel arrangement, make the nozzle unit rotation, wherein, the second swivel arrangement can make nozzle unit along the direction rotation opposite with the sense of rotation of face glass retainer.
On the other hand, the invention provides a kind of rotary depositing device, comprising: at least one face glass retainer keeps face glass; At least one deposition source, the storage deposition material, described deposition source is discharged into deposition material on the face glass; At least one nozzle unit is connected to deposition source, and described nozzle unit comprises a plurality of nozzles so that deposition material by nozzle discharge to face glass; At least one swivel arrangement makes the nozzle unit rotation; And at least one compartment, comprise described face glass retainer, deposition source, nozzle unit and swivel arrangement in the compartment.
Compartment can comprise a plurality of deposition sources, and each deposition source is stored different types of deposition material.
This rotary depositing device can comprise a plurality of compartments, and each compartment comprises deposition source and face glass retainer, and each deposition source of each compartment can be stored different types of deposition material.
This rotary depositing device can comprise a plurality of compartments that connect sequentially one by one with the linear pattern decoration form.In this case, each compartment can comprise deposition source and face glass retainer, and each deposition source of each compartment can be stored different types of deposition material.
Deposition source can be arranged on the basal surface of compartment, and the face glass retainer can be arranged in the top surface below of compartment, and wherein, face glass can be arranged between deposition source and the face glass retainer.
Description of drawings
From the detailed description below in conjunction with accompanying drawing, will more clearly understand above and other purpose of the present invention, feature and advantage, in the accompanying drawing:
Fig. 1 is the conceptual schematic view that conventional deposition equipment is shown;
Fig. 2 is the conceptual schematic view according to the example of linear type rotating formula depositing device of the present invention; And
Fig. 3 is the sectional view that illustrates according to the example of the internal structure of the compartment of rotary depositing device of the present invention.
Embodiment
Below, describe in detail with reference to the accompanying drawings according to rotary depositing device of the present invention, still, the present invention never limits or is subject to this.
As shown in Figure 3, the rotary depositing device according to embodiment of the present invention comprises face glass retainer 33, the first swivel arrangement 36, deposition source 39, the second swivel arrangement 43 and high vacuum compartment 30.Face glass retainer 33 keeps and support glass panel 31.The first swivel arrangement 36 comprises driver element 34 and axle 35, and this axle is connected to face glass retainer 33, so that 33 rotations of face glass retainer.Deposition source 39 evaporations have been stored in the deposition material 40 in the interior crucible, so that deposition material is deposited on the face glass 31 via the mask 32 with predetermined pattern with the steam form.The second swivel arrangement 43 comprises driver element 41 and axle 42, and so that nozzle unit 38 rotates, this nozzle unit has a plurality of nozzles 37 that are connected to deposition source 39.
In the present invention, only the first swivel arrangement 36 or only the second swivel arrangement 43 can operate, and therefore only face glass 31 or only nozzle unit 38 can be rotated.Alternatively, the first swivel arrangement 36 and the second swivel arrangement 43 both can operate, so that face glass 31 and nozzle unit 38 rotate simultaneously.If face glass 31 and nozzle unit 38 rotate simultaneously, preferably, make their sense of rotation opposite, thereby can utilize as much as possible the effect of whirlpool phenomenon, the organic materials that has therefore further improved evaporation is deposited on the effect on the face glass 31 equably.Especially, in this case, the uniformity coefficient that is deposited on the thickness of the film on the face glass 31 significantly improves, even also be like this along the periphery of usually poor than the uniformity coefficient in the centre of face glass 31 face glass 31.
In addition, the nozzle unit 38 of deposition source 39 or deposition source 39 is constructed such that the distance between any and the face glass 31 in them is adjustable.Therefore, can be with this distance adjustment to optimal distance, so that film can be formed uniformly on face glass 31 with higher sedimentation effect.
In the modification according to depositing device of the present invention, only have the first swivel arrangement 36(rather than the second swivel arrangement 43) can be arranged in the compartment 30, so that face glass 31 rotations of only being supported by face glass retainer 33.Alternatively, depositing device can be constructed such that only to arrange three swivel arrangement corresponding with the second swivel arrangement 43, and does not have the first swivel arrangement 36, thereby only has nozzle unit 38 rotations of deposition source 39.The detailed construction of the 3rd swivel arrangement is identical with the structure of the second swivel arrangement 43.
In rotary depositing device according to the present invention, each position in compartment 30 in the first to the 3rd swivel arrangement is not limited to specific position, as long as it can make nozzle unit 38 rotations of face glass 31 and/or deposition source 39, thereby can improve sedimentation effect and the uniformity coefficient that is formed on the film on the face glass 31.That is to say that the position of each swivel arrangement in compartment 30 can change according to deposition method.For example, the method can be make progress orthotype, downward orthotype or vertical-type.Preferably, rotary depositing device according to embodiment of the present invention has upwards orthotype structure, wherein, deposition source 39 is arranged on the bottom of compartment 30, face glass retainer 33 is arranged on the top surface below of compartment, and face glass 31 is arranged between deposition source 39 and the face glass retainer 33.
And, in rotary depositing device according to the present invention, the propulsion source of the driver element of each in the first to the 3rd swivel arrangement is not limited to the propulsion source of particular types, as long as it can suitably control the speed of rotation of the nozzle unit 38 of face glass 31 or deposition source 39.Preferably, propulsion source is the electric motor that is widely used as the propulsion source of typical swivel arrangement.
Rotary depositing device according to the present invention can be constructed such that single compartment comprises: at least one or a plurality of face glass retainer, and each face glass retainer keeps face glass; At least one or a plurality of deposition source, its storage deposition material also is discharged to deposition material on the corresponding glass panel; At least one or a plurality of nozzle unit, it is connected to corresponding deposition source, and each nozzle unit comprises a plurality of nozzles, thus deposition material is discharged by nozzle; And at least one or a plurality of swivel arrangement, it makes face glass retainer or nozzle unit rotation.The quantity that is included in face glass retainer, deposition source, nozzle unit and swivel arrangement in the single compartment is unrestricted.The area of consideration face glass, the projected area of nozzle, the quantity of nozzle etc. are determined the spacing that face glass retainer, deposition source, nozzle unit or swivel arrangement are spaced.In other words, the variation of the quantity and spacing of face glass retainer, deposition source, nozzle unit or swivel arrangement can suitably can be set for production efficiency and conformed to production cost, as long as the deposition material that can prevent from depositing on the face glass pollutes mutually.In addition, if two or more deposition sources are set in single compartment, these deposition sources can be stored different types of deposition material so.
Preferably, rotary depositing device according to the present invention can be designed to, so that be provided with two or more compartments, and wherein, each compartment comprises a deposition source and a face glass retainer, and each deposition source of each compartment is stored different types of deposition material.This structure can prevent more reliably that deposition material from polluting mutually.And according to the kind of deposition material, sedimentation effect changes.Therefore, preferably, suitably regulate the speed of rotation of each swivel arrangement and/or the distance between face glass and the deposition source according to the kind of deposition material, make it possible to satisfy sedimentation effect and the uniformity coefficient of film, and the loss of deposition material can be minimized.
As shown in Figure 2, rotary depositing device according to the present invention can comprise two or more compartments 60.In this case, compartment 60 can be constructed by the linear pattern decoration form, so that they connect sequentially one by one.This linear pattern arrangement can be enhanced productivity and is suitable for easily producing the large-size glass panel.Especially, in linear type rotating formula depositing device according to the present invention, preferably, each compartment all comprises deposition source and face glass retainer, and each deposition source of each compartment is stored different types of deposition material.Certainly, this rotary depositing device can use single compartment or be configured to utilize cluster (cluster) type, in the cluster type, the center compartment is arranged on predetermined locations, and other compartments arrange with pentagon or hexagonal arrangement around the center compartment, so that face glass is processed successively by each compartment.
Rotary depositing device according to the present invention also can be applicable to the large-size glass panel, for example, 4.5 generations (730mm * 920mm) or higher, preferably, 5.5 generations (1300mm * 1500mm) or higher, more preferably, 8 generations (2200mm * 2500mm) or higher.Can suitably design the size of compartment, with size and the quantity of the face glass that is fit to be comprised in the compartment.
Preferably, utilize rotary depositing device according to the present invention to make OLED.Except utilizing the electroless copper deposition operation according to equipment of the present invention, make the general process of OLED with typically the process for the manufacture of OLED is identical.In the method for this manufacturing OLED, face glass in cleaning forms anode layer in the following manner: deposit tin indium oxide (ITO) and metallic membrane by carry out sputter at face glass, by photoetching technique to tin indium oxide and metal film pattern, and and then it is carried out etching.Afterwards, depositing insulating layer carries out patterning by photoetching technique to insulation layer, and etching.Afterwards, utilize shadow mask board (shadow mask) to form cathode separator.Then, the different types of organic materials that forms respectively hole transmission layer, luminescent layer and the electron transfer layer of OLED is fed to for example according in the corresponding crucible in the high vacuum compartment of rotary depositing device of the present invention.Afterwards, the well heater that is arranged in the deposition source sequentially heats and evaporating organic materials so that the evaporation organic materials sequentially deposit on the respective surfaces of face glass, thereby form one by one above-mentioned organic material layer.During this process, the rotation of the nozzle unit of face glass and/or deposition source so that the organic materials of evaporation can deposit on the whole zone of face glass equably by the whirlpool phenomenon, has therefore improved the uniformity coefficient that is formed on the film on the face glass.After forming organic material layer, utilize the shadow mask board depositing metallic films, thereby form cathode layer.Afterwards, carry out sealing schedule, thereby finish OLED.
As mentioned above, rotary depositing device according to the present invention is constructed such that the nozzle unit rotation of face glass and/or deposition source, thereby the organic materials of evaporation can deposit on the whole zone of face glass equably by the whirlpool phenomenon, has therefore improved the uniformity coefficient that is formed on the film on the face glass.Especially, the present invention can improve the uniformity coefficient of the film on the face glass periphery significantly, and the film equality on the face glass periphery is poorer than the uniformity coefficient in face glass centre usually.Can be with the distance adjustment between face glass and the deposition source to optimal distance, so that film can be formed uniformly on face glass with higher sedimentation effect.
In addition, in the linear pattern arrangement that a plurality of compartments connect sequentially one by one, the organic materials that forms the different sorts film is arranged in each compartment individually, has therefore prevented the crossed contamination of organic materials.
Although for illustrative purpose and preferred implementation of the present invention is disclosed, but those skilled in the art will recognize that, in the situation that does not deviate from scope of the present invention disclosed in the accompanying claims and essence, various modifications, interpolation and replacement all are possible.
Claims (13)
1. rotary depositing device comprises:
At least one face glass retainer keeps face glass;
At least one first swivel arrangement rotates described face glass retainer;
At least one deposition source, the storage deposition material, described deposition source is discharged into described deposition material on the described face glass; And
At least one compartment comprises described face glass retainer, described the first swivel arrangement and described deposition source in the described compartment.
2. rotary depositing device according to claim 1 further comprises: at least one nozzle unit, be connected to described deposition source, described nozzle unit comprises a plurality of nozzles so that described deposition material by described nozzle discharge to described face glass; And
At least one second swivel arrangement makes described nozzle unit rotation,
Wherein, described the second swivel arrangement makes described nozzle unit along the direction rotation opposite with the sense of rotation of described face glass retainer.
3. each described rotary depositing device in 2 according to claim 1, wherein, described compartment comprises a plurality of deposition sources, each deposition source is stored different types of deposition material.
4. each described rotary depositing device in 2 according to claim 1, wherein, described rotary depositing device comprises a plurality of compartments, and each compartment all comprises deposition source and face glass retainer, and each deposition source of each compartment is stored different types of deposition material.
5. each described rotary depositing device in 2 according to claim 1, wherein, described rotary depositing device comprises a plurality of compartments that connect sequentially one by one with the linear pattern decoration form.
6. rotary depositing device according to claim 5, wherein, each described compartment comprises deposition source and face glass retainer, and each deposition source of each compartment is stored different types of deposition material.
7. each described rotary depositing device in 2 according to claim 1, wherein, described deposition source is arranged on the basal surface of described compartment, and described face glass retainer is arranged in the top surface below of described compartment,
Wherein, described face glass is arranged between described deposition source and the described face glass retainer.
8. rotary depositing device comprises:
At least one face glass retainer keeps face glass;
At least one deposition source, the storage deposition material, described deposition source is discharged into described deposition material on the described face glass;
At least one nozzle unit is connected to described deposition source, and described nozzle unit comprises a plurality of nozzles so that described deposition material by described nozzle discharge to described face glass;
At least one swivel arrangement makes described nozzle unit rotation; And
At least one compartment comprises described face glass retainer, described deposition source, described nozzle unit and described swivel arrangement in the described compartment.
9. rotary depositing device according to claim 3, wherein, described compartment comprises a plurality of deposition sources, each deposition source is stored different types of deposition material.
10. rotary depositing device according to claim 3, wherein, described rotary depositing device comprises a plurality of compartments, each compartment all comprises deposition source and face glass retainer, and each deposition source of each compartment is stored different types of deposition material.
11. rotary depositing device according to claim 3, wherein, described rotary depositing device comprises a plurality of compartments that connect sequentially one by one with the linear pattern decoration form.
12. rotary depositing device according to claim 11, wherein, each described compartment comprises deposition source and face glass retainer, and each deposition source of each compartment is stored different types of deposition material.
13. rotary depositing device according to claim 3, wherein, described deposition source is arranged on the basal surface of described compartment, and described face glass retainer is arranged in the top surface below of described compartment,
Wherein, described face glass is arranged between described deposition source and the described face glass retainer.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020110109618A KR20130045432A (en) | 2011-10-26 | 2011-10-26 | Rotary deposition apparatus |
| KR10-2011-0109618 | 2011-10-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103074578A true CN103074578A (en) | 2013-05-01 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012102797936A Pending CN103074578A (en) | 2011-10-26 | 2012-08-07 | Rotary deposition apparatus |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR20130045432A (en) |
| CN (1) | CN103074578A (en) |
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| CN106756807A (en) * | 2017-01-23 | 2017-05-31 | 京东方科技集团股份有限公司 | A kind of vapor deposition source, evaporation coating device and its evaporation coating method |
| CN107663628A (en) * | 2017-11-26 | 2018-02-06 | 滁州市金凯达电器装饰有限公司 | A kind of high rigidity minute surface durability IMD decoration film coating devices |
| CN107868939A (en) * | 2016-09-27 | 2018-04-03 | 合肥欣奕华智能机器有限公司 | A kind of evaporation coating method and evaporated device of line style evaporation source |
| WO2020169248A1 (en) * | 2019-02-20 | 2020-08-27 | Oerlikon Surface Solutions Ag, Pfäffikon | Optimized system and method for transporting and moving substrates in a modular coating facility |
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| KR102151616B1 (en) * | 2014-02-04 | 2020-09-03 | 어플라이드 머티어리얼스, 인코포레이티드 | In-line deposition system and method for operating an evaporation source for organic material |
| CN105624611B (en) * | 2016-03-29 | 2018-04-24 | 苏州方昇光电股份有限公司 | A kind of rotary organic material vaporising device |
| KR101965102B1 (en) * | 2018-06-15 | 2019-04-02 | 캐논 톡키 가부시키가이샤 | Film forming method, film forming apparatus and manufacturing method of electronic device |
| CN110158036A (en) * | 2019-03-15 | 2019-08-23 | 上海视涯信息科技有限公司 | A kind of vapor deposition equipment and its application method |
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| CN107868939A (en) * | 2016-09-27 | 2018-04-03 | 合肥欣奕华智能机器有限公司 | A kind of evaporation coating method and evaporated device of line style evaporation source |
| CN106756807A (en) * | 2017-01-23 | 2017-05-31 | 京东方科技集团股份有限公司 | A kind of vapor deposition source, evaporation coating device and its evaporation coating method |
| CN106756807B (en) * | 2017-01-23 | 2019-07-05 | 京东方科技集团股份有限公司 | A kind of evaporation source, evaporation coating device and its evaporation coating method |
| CN107663628A (en) * | 2017-11-26 | 2018-02-06 | 滁州市金凯达电器装饰有限公司 | A kind of high rigidity minute surface durability IMD decoration film coating devices |
| WO2020169248A1 (en) * | 2019-02-20 | 2020-08-27 | Oerlikon Surface Solutions Ag, Pfäffikon | Optimized system and method for transporting and moving substrates in a modular coating facility |
| CN113677823A (en) * | 2019-02-20 | 2021-11-19 | 欧瑞康表面处理解决方案股份公司普费菲孔 | Optimized system and method for transporting and moving substrates in a modular coating installation |
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