CN103014642B - Adjustable gas distribution system and magnetron sputtering coating device comprising same - Google Patents
Adjustable gas distribution system and magnetron sputtering coating device comprising same Download PDFInfo
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- CN103014642B CN103014642B CN201210531667.5A CN201210531667A CN103014642B CN 103014642 B CN103014642 B CN 103014642B CN 201210531667 A CN201210531667 A CN 201210531667A CN 103014642 B CN103014642 B CN 103014642B
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Abstract
The invention discloses an adjustable gas distribution system and a magnetron sputtering coating device comprising the adjustable gas distribution system. The adjustable gas distribution system comprises at least two parallel gas distribution pipes; a flowmeter is arranged on each gas distribution pipe; blowing parts are arranged on two adjacent gas distribution pipes in a staggered manner and comprise a plurality of air holes which are of the same specification and formed uniformly; each air hole is formed in the radial direction of one gas distribution pipe; and the air holes are arranged in the axial directions of the gas distribution pipes in sequence. The gas distribution system is provided with at least two gas distribution pipes, and the blowing parts are on two adjacent gas distribution pipes in a staggered manner, so that gas blown out by the gas distribution system can reach a target surface uniformly, and then a film is ensured uniformity; the flowmeters are arranged on the gas distribution pipes, so that the flow rate of gas can be adjusted in real time, namely, the flow rate of gas can be adjusted accurately according to the distance between the target surface and the surface of an object to be coated, and different coating thicknesses; and the flow rates of gas blown out from all the gas distribution pipes can be the same, so that the purposes of controlling in real time and coating accurately can be achieved.
Description
Technical field
The present invention relates to magnetron sputtering technology field, particularly relate to a kind of adjustable type gas distribution system, and comprise the magnetic control sputtering film plating device of this adjustable type gas distribution system.
Background technology
Magnetron sputtering technology is the coating technique method of current widespread use, is widely used in the industrial fields such as optics, microelectronics, wear-resisting, anti-corrosion, decoration, in order to provide reliable and stable thin film coating.Colored plated film is used, mobile phone shell plated film, building glass low-e plated film, ITO transparent conducting glass plated film etc. as decorated.
The homogeneity of magnetron sputtering plating is extremely important, and especially for optics, microelectronic product plated film, its homogeneity has material impact to the quality of product and yield rate.The factor affecting magnetron sputtering film uniformity is a lot, comprises warm field uniformity, plasma uniformity, process gas uniform air distribution, magnetic field's regularity etc.For gas distribution system, traditional is the mode adopting single inlet pipe, this kind of mode gas distribution is adopted easily to occur that gas distribution is even not, due to planar target mainly rectangle, long-width ratio is very large, therefore mainly there is longitudinal gas distribution problem of non-uniform in it, i.e. target surface gas distribution skewness from top to bottom, and gas distribution is from left to right then substantially even.In order to solve the problem, technician is had to propose a kind of mixed air distribution pipe, for solving the uneven problem of single inlet pipe gas distribution, such as, Chinese patent literature CN202322999U open a kind of " mixed air distribution pipe ", it comprises inlet pipe and pneumatic tube, described inlet pipe is connected with the inlet mouth of described pneumatic tube, described pneumatic tube is distributed with multilayer, its air outlet is connected with relief pipe, described relief pipe is evenly equipped with production well, above-mentioned mixed air distribution pipe is by setting up relief pipe, the depressurization of gas by expanding in relief pipe internal volume, thus obtain the uniform flow flowing through each aperture gas, reach the effect of uniform air distribution.But this mixed air distribution pipe has following defect: although 1, this gas distribution system can optimize the homogeneity of gas distribution further, but it lacks controllability, it is a kind of default device fixed, only has certain scope of application, require high Application Areas for film uniformity, when gas flow rate changes, there is blocking in pore, when the situations such as gaseous species changes and target-substrate distance is uneven occur, its effect can decline; 2, quantizating index is lacked to the adjustment of uniform air distribution, mostly judge by rule of thumb.
Again such as, Chinese patent literature CN201313933Y open a kind of " dualistic gas-distribution pipe ", it comprises the inlet pipe of magnetic control sputtering cathode, controls the valve of inlet pipe flow, and the terminal portions of the inlet pipe of described magnetic control sputtering cathode and middle portion adopt independently inlet pipe air feed respectively separately.By building a kind of dualistic gas-distribution pipe, make magnetic control sputtering cathode terminal portions and middle portion can air inlet more equably, thus make reactive sputtering plated film more even.Although this dualistic gas-distribution pipe has controllability, but it does not have the function of the cloth tolerance measuring different zones, quantitative measurment can not be realized, therefore when being coated with different thicknesses of layers, can only rule of thumb regulate and judge, so can not be applied in accurate plated film, and its gas distribution mode complex structure, become to produce cost higher, operation and maintenance is also very difficult.
Summary of the invention
One object of the present invention, be to provide a kind of adjustable type gas distribution system, make gas distribution more even, simultaneously also can the flow of adjustments of gas according to actual needs, and accurate quantitative measurment is carried out to the cloth tolerance of different zones, reach the object of real-time control, accurately plated film.
Another object of the present invention, is to provide a kind of adjustable type gas distribution system, and its structure is simple, and operation and maintenance is convenient, becomes to produce with low cost.
Another object of the present invention, be to provide a kind of magnetic control sputtering film plating device, by using adjustable gas distribution system, make gas distribution more even, simultaneously also can the flow of adjustments of gas according to actual needs, and accurate quantitative measurment is carried out to the cloth tolerance of different zones, reach the object of real-time control, accurately plated film, and make simplifying the structure of whole device, operation and maintenance is convenient, reduces production cost.
For reaching above-mentioned purpose, the present invention by the following technical solutions:
A kind of adjustable type gas distribution system, comprise at least two gas distribution pipes be arranged in parallel, gas distribution pipe described in every root all arranges under meter, on adjacent two described gas distribution pipes, stagger arrangement arranges air blowing portion.
As a kind of preferred version of adjustable type gas distribution system, described air blowing portion is made up of the evenly distributed pore that multiple specification is identical, and each pore is offered along the radial direction of gas distribution pipe, and multiple pore is axially arranged along it successively at gas distribution pipe.
Preferably, described gas distribution pipe has three, be respectively the first gas distribution pipe, second gas distribution pipe and the 3rd gas distribution pipe, described first gas distribution pipe, second gas distribution pipe and the 3rd gas distribution pipe all arrange the air blowing section matched with the length of the target surface of magnetron sputtering target, this air blowing section is divided into three sections from top to bottom, be respectively first paragraph, second segment, 3rd section, the second segment of described first gas distribution pipe arranges air blowing portion, the first paragraph of described second gas distribution pipe arranges air blowing portion, the 3rd section of described 3rd gas distribution pipe arranges air blowing portion, the length of the length sum in three described air blowing portions and the target surface of magnetron sputtering target matches.
Be more preferably, described air blowing portion comprises 23 evenly distributed pores.
Preferably, described gas distribution pipe has three, be respectively the first gas distribution pipe, the second gas distribution pipe and the 3rd gas distribution pipe, described first gas distribution pipe, the second gas distribution pipe and the 3rd gas distribution pipe are all arranged the air blowing section matched with the length of the target surface of magnetron sputtering target, this air blowing section is divided into three sections from top to bottom, be respectively first paragraph, second segment, the 3rd section;
The first paragraph of described first gas distribution pipe, second segment and the 3rd section arrange the second air blowing portion, the first air blowing portion and the 3rd air blowing portion respectively, the first paragraph of described second gas distribution pipe, second segment and the 3rd section arrange the 4th air blowing portion, the 5th air blowing portion and the 6th air blowing portion respectively, the first paragraph of described 3rd gas distribution pipe, second segment and the 3rd section arrange the 8th air blowing portion, the 9th air blowing portion and the 7th air blowing portion respectively;
The stomatal frequency in the stomatal frequency in described second air blowing portion, the stomatal frequency in described 3rd air blowing portion, the stomatal frequency in described 5th air blowing portion, the stomatal frequency in described 6th air blowing portion, the stomatal frequency in described 8th air blowing portion, described 9th air blowing portion is all identical, and is the first density;
The stomatal frequency in the stomatal frequency in described first air blowing portion, the stomatal frequency in described 4th air blowing portion, described 7th air blowing portion is all identical, and is the second density; Second density is greater than the first density;
The length of described first air blowing portion, the second air blowing portion, the length sum in the 3rd air blowing portion and the target surface of magnetron sputtering target matches; The length of described 4th air blowing portion, the 5th air blowing portion, the length sum in the 6th air blowing portion and the target surface of magnetron sputtering target matches; The length of described 7th air blowing portion, the 8th air blowing portion, the length sum in the 9th air blowing portion and the target surface of magnetron sputtering target matches; The length of described first air blowing portion, the 4th air blowing portion, the length sum in the 7th air blowing portion and the target surface of magnetron sputtering target matches.
Be more preferably, described first air blowing portion, the 4th air blowing portion and the 7th air blowing portion all have the first identical length, and distinguish evenly distributed 23 pores in the first identical length, have the first identical stomatal frequency to make above-mentioned three air blowing portions; Described second air blowing portion, the 3rd air blowing portion, the 5th air blowing portion, the 6th air blowing portion, the 8th air blowing portion, the 9th air blowing portion all have the second identical length, and seven pores evenly distributed respectively in the second identical length, have the second identical stomatal frequency to make above-mentioned six air blowing portions; First length is identical with the second length, makes the first stomatal frequency be greater than the second stomatal frequency.
Preferably, described gas distribution pipe has four, be respectively the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, described first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe are all arranged the air blowing section matched with the length of the target surface of magnetron sputtering target, this air blowing section is divided into four sections from top to bottom, be respectively first paragraph, second segment, the 3rd section, the 4th section;
The 3rd section of described first gas distribution pipe arranges air blowing portion, the second segment of described second gas distribution pipe arranges air blowing portion, the first paragraph of described 3rd gas distribution pipe arranges air blowing portion, the 4th section of described 4th gas distribution pipe arranges air blowing portion, and the length of the length sum in four described air blowing portions and the target surface of magnetron sputtering target matches.
Be more preferably, described air blowing portion comprises 16 evenly distributed pores.
Preferably, described gas distribution pipe has four, be respectively the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, described first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe are all arranged the air blowing section matched with the length of the target surface of magnetron sputtering target, this air blowing section is divided into four sections from top to bottom, be respectively first paragraph, second segment, the 3rd section, the 4th section;
The first paragraph of described first gas distribution pipe, second segment, the 3rd section, the 4th section the second air blowing portion, the 3rd air blowing portion, the first air blowing portion and the 4th air blowing portion are set respectively; The first paragraph of described second gas distribution pipe, second segment, the 3rd section, the 4th section the 6th air blowing portion, the 5th air blowing portion, the 7th air blowing portion and the 8th air blowing portion are set respectively; The first paragraph of described 3rd gas distribution pipe, second segment, the 3rd section, the 4th section the 9th air blowing portion, the tenth air blowing portion, the 11 air blowing portion and the 12 air blowing portion are set respectively; The first paragraph of described 4th gas distribution pipe, second segment, the 3rd section, the 4th section the 14 air blowing portion, the 15 air blowing portion, the 16 air blowing portion and the 13 air blowing portion are set respectively;
The stomatal frequency in the stomatal frequency in the stomatal frequency in the stomatal frequency in the stomatal frequency in described second air blowing portion, the stomatal frequency in described 3rd air blowing portion, the stomatal frequency in described 4th air blowing portion, the stomatal frequency in described 6th air blowing portion, the stomatal frequency in described 7th air blowing portion, described 8th air blowing portion, the stomatal frequency in described tenth air blowing portion, described 11 air blowing portion, the stomatal frequency in described 12 air blowing portion, described 14 air blowing portion, the stomatal frequency in described 15 air blowing portion, described 16 air blowing portion is all identical, and is the first density;
The stomatal frequency in the stomatal frequency in described first air blowing portion, the stomatal frequency in described 5th air blowing portion, described 9th air blowing portion is all identical with the stomatal frequency in the 13 air blowing portion, and is the second density; Second density is greater than the first density;
The length of described first air blowing portion, the second air blowing portion, the 3rd air blowing portion, the length sum in the 4th air blowing portion and the target surface of magnetron sputtering target matches; The length of described 5th air blowing portion, the 6th air blowing portion, the 7th air blowing portion, the length sum in the 8th air blowing portion and the target surface of magnetron sputtering target matches; The length of described 9th air blowing portion, the tenth air blowing portion, the 11 air blowing portion, the length sum in the 12 air blowing portion and the target surface of magnetron sputtering target matches; The length of described 13 air blowing portion, the 14 air blowing portion, the 15 air blowing portion, the length sum in the 16 air blowing portion and the target surface of magnetron sputtering target matches; The length of described first air blowing portion, the 5th air blowing portion, the 9th air blowing portion, the length sum in the 13 air blowing portion and the target surface of magnetron sputtering target matches.
Be more preferably, described first air blowing portion, the 5th air blowing portion, the 9th air blowing portion and the 13 air blowing portion all have the 3rd identical length, in the 3rd identical length, evenly distributed 16 pores of difference, have the 3rd identical stomatal frequency to make four above-mentioned air blowing portions; Described second air blowing portion, the 3rd air blowing portion, the 4th air blowing portion, the 6th air blowing portion, the 7th air blowing portion, the 8th air blowing portion, the tenth air blowing portion, the 11 air blowing portion, the 12 air blowing portion, the 14 air blowing portion, the 15 air blowing portion, the 16 air blowing portion all have the 4th identical length, in the 4th identical length, evenly distributed six pores of difference, have the 4th identical stomatal frequency to make 12 above-mentioned air blowing portions; The 3rd above-mentioned length is identical with the 4th length, is greater than the 4th stomatal frequency to make the 3rd stomatal frequency.
Preferably, described pore is circular port, square opening or profiled holes.
A kind of magnetic control sputtering film plating device, comprise adjustable type gas distribution system as described above, also comprise magnetron sputtering target, described magnetron sputtering target side arranges target surface, described target surface at least side arranges described gas distribution system, and the gas flow of described gas distribution system is parallel with described target surface.
As a kind of preferred version of magnetic control sputtering film plating device, described target surface both sides all arrange described gas distribution system.
Preferably, described gas distribution system comprises at least two gas distribution pipes be arranged in parallel, and gas distribution pipe described in every root all arranges under meter, and on adjacent two described gas distribution pipes, stagger arrangement arranges air blowing portion.
Contrast prior art, beneficial effect of the present invention is:
1, by gas distribution system is set at least two gas distribution pipes, and stagger arrangement arranges air blowing portion on adjacent two gas distribution pipes, and the gas that gas distribution system can be made to blow out can arrive target surface uniformly, ensures the even film layer that magnetic control sputtering device is coated with, reliable and stable;
2, by arranging under meter on gas distribution pipe, make the adjustment that the flow of gas can be real-time, namely according to the distance of target surface apart from body surface to be coated, the difference of coating film thickness, the flow of accurate adjustments of gas, and the flow of the gas that each gas distribution pipe blows out can be made equal, reach the object of real-time control, accurately plated film;
3, by applying in magnetic control sputtering film plating device by adjustable type gas distribution system, not only can adjust the flow of gas in real time accurately, making the even film layer be coated with, and the structure of whole device is simple, operation and maintenance is convenient, and production cost is low.
Accompanying drawing explanation
Fig. 1 is the structural representation of the adjustable type gas distribution system described in embodiment one;
Fig. 2 is the structural representation of the first gas distribution pipe described in embodiment one;
Fig. 3 is the structural representation of the second gas distribution pipe described in embodiment one;
Fig. 4 is the structural representation of the 3rd gas distribution pipe described in embodiment one;
Fig. 5 is the structural representation comprising the magnetic control sputtering film plating device of adjustable type gas distribution system described in embodiment one;
Fig. 6 is the structural representation of the adjustable type gas distribution system described in embodiment two;
Fig. 7 is the structural representation of the first gas distribution pipe described in embodiment two;
Fig. 8 is the structural representation of the second gas distribution pipe described in embodiment two;
Fig. 9 is the structural representation of the 3rd gas distribution pipe described in embodiment two;
Figure 10 is the structural representation of the 4th gas distribution pipe described in embodiment two;
Figure 11 is the structural representation comprising the magnetic control sputtering film plating device of adjustable type gas distribution system described in embodiment two.
In Fig. 1 ~ 5:
1, gas distribution system;
11, the first gas distribution pipe; 111, the first air blowing portion; 112, the second air blowing portion; 113, the 3rd air blowing portion;
12, the second gas distribution pipe; 121, the 4th air blowing portion; 122, the 5th air blowing portion; 123, the 6th air blowing portion;
13, the 3rd gas distribution pipe; 131, the 7th air blowing portion; 132, the 8th air blowing portion; 133, the 9th air blowing portion;
14, first-class gauge; 15, second gauge; 16, the 3rd under meter; 17, pore;
2, magnetron sputtering target; 3, target surface.
In Fig. 6 ~ 11:
4, gas distribution system;
41, the first gas distribution pipe; 411, the first air blowing portion; 412, the second air blowing portion; 413, the 3rd air blowing portion; 414, the 4th air blowing portion;
42, the second gas distribution pipe; 421, the 5th air blowing portion; 422, the 6th air blowing portion; 423, the 7th air blowing portion; 424, the 8th air blowing portion;
43, the 3rd gas distribution pipe; 431, the 9th air blowing portion; 432, the tenth air blowing portion; 433, the 11 air blowing portion; 434, the 12 air blowing portion;
44, the 4th gas distribution pipe; 441, the 13 air blowing portion; 442, the 14 air blowing portion; 443, the 15 air blowing portion; 444, the 16 air blowing portion;
45, first-class gauge; 46, second gauge; 47, the 3rd under meter; 48, the 4th under meter; 49, pore;
5, magnetron sputtering target; 6, target surface.
Embodiment
Embodiment one:
As shown in Figure 1, adjustable type gas distribution system described in this embodiment, comprise three gas distribution pipes be arranged in parallel, be respectively the first gas distribution pipe 11, second gas distribution pipe 12 and the 3rd gas distribution pipe 13, first gas distribution pipe 11 arranges the first-class gauge 14 for controlling its gas flow, second gas distribution pipe 12 arranges the second gauge 15 for controlling its gas flow, the 3rd gas distribution pipe 13 arranges the 3rd under meter 16 for controlling its gas flow.
First gas distribution pipe 11, second gas distribution pipe 12 and the 3rd gas distribution pipe 13 are provided with the air blowing section matched with the length of the target surface of magnetron sputtering target, and the air blowing segment length of three gas distribution pipes is consistent.
As shown in Figure 2, the air blowing section of the first gas distribution pipe 11 is divided into three sections from top to bottom, namely first paragraph, second segment, the 3rd section, the first paragraph of the first gas distribution pipe 11, second segment and the 3rd section arrange the second air blowing portion 111 of air blowing portion 112, first and the 3rd air blowing portion 113 respectively, air blowing portion is made up of the evenly distributed pore 17 that multiple specification is identical, and each pore 17 is offered along the radial direction of the first gas distribution pipe 11, multiple pore 17 is axial arranged along it on the first gas distribution pipe 11.
Pore quantity in second air blowing portion 112 equals the pore quantity in the 3rd air blowing portion 113, and be seven pores 17, pore quantity in first air blowing portion 111 is greater than the pore quantity in the second air blowing portion 112, and be air blowing portion 112 of 23 pores 17, first air blowing portion 111, second, the length of the length sum in the 3rd air blowing portion 113 and the target surface of magnetron sputtering target matches.
As shown in Figure 3, the air blowing section of the second gas distribution pipe 12 is divided into three sections from top to bottom, namely first paragraph, second segment, the 3rd section, the first paragraph of the second gas distribution pipe 12, second segment and the 3rd section arrange the 4th air blowing portion 121, the 5th air blowing portion 122 and the 6th air blowing portion 123 respectively, air blowing portion is made up of the evenly distributed pore 17 that multiple specification is identical, and each pore 17 is offered along the radial direction of the second gas distribution pipe 12, multiple pore 17 is axial arranged along it on the second gas distribution pipe 11.
Pore quantity in 5th air blowing portion 122 equals the pore quantity in the 6th air blowing portion 123, and be seven pores 17, pore quantity in 4th air blowing portion 121 is greater than the pore quantity in the 5th air blowing portion 122, and be 23 pores the 17, four air blowing portion 121, the 5th air blowing portion 122, the length sum in the 6th air blowing portion 123 and the target surface of magnetron sputtering target length match.
As shown in Figure 4, the air blowing section of the 3rd gas distribution pipe 13 is divided into three sections from top to bottom, namely first paragraph, second segment, the 3rd section, the first paragraph of the 3rd gas distribution pipe 13, second segment and the 3rd section arrange the 8th air blowing portion 132, the 9th air blowing portion 133 and the 7th air blowing portion 131 respectively, air blowing portion is made up of the evenly distributed pore 17 that multiple specification is identical, and each pore 17 is offered along the radial direction of the 3rd gas distribution pipe 13, multiple pore 17 is axial arranged along it on the 3rd gas distribution pipe 13.
Pore quantity in 8th air blowing portion 132 equals the pore quantity in the 9th air blowing portion 133, and be seven pores 17, pore quantity in 7th air blowing portion 131 is greater than the pore quantity in the 8th air blowing portion 132, and be 23 pores the 17, seven air blowing portion 131, the 8th air blowing portion 132, the length sum in the 9th air blowing portion 133 and the target surface of magnetron sputtering target length match.
And the length of the first air blowing portion 111, the 4th air blowing portion 121, the length sum in the 7th air blowing portion 131 and the target surface of magnetron sputtering target matches, and makes whole uniform air flow energy be covered with the target surface of magnetron sputtering target.
In this embodiment, pore 17 is circular port.
As shown in Figure 5, the magnetic control sputtering film plating device described in this embodiment, comprises magnetron sputtering target 2, target surface 3 is set on front side of magnetron sputtering target 2, target surface 3 is rectangle, and arranges above-mentioned adjustable type gas distribution system 1 in the side of target surface 3, and the flow direction of this gas distribution system 1 gas is parallel with target surface.
Gas distribution system 1 comprises the first gas distribution pipe 11, second gas distribution pipe 12 and the 3rd gas distribution pipe 13 that are set in parallel in target surface 3 side, first gas distribution pipe 11 arranges first-class gauge 14, second gas distribution pipe 12 arranges second gauge 15, the 3rd gas distribution pipe 13 arranges the 3rd under meter 16.
Principle of work is as follows:
Gas is by pipeline shunt to the first gas distribution pipe 11, in second gas distribution pipe 12 and the 3rd gas distribution pipe 13, and then from the air blowing portion blowout that gas distribution pipe is arranged, regulate first-class gauge 14, second gauge 15, 3rd under meter 16 makes the first air blowing portion 111, 4th air blowing portion 121, the gas uniform that 7th air blowing portion 131 blows out, because the first air blowing portion 111, 4th air blowing portion 121, 7th air blowing portion 131 is that intensive pore 17 is formed, as long as therefore ensure that the steady air current in these three air blowing portions is consistent, the gas uniform on target surface 3 longitudinal direction can be made, and then the even film layer that guarantee is coated with, when target surface 3 adjusts with the distance of the product of film to be plated, only need to adjust under meter, just can reach the object of accurate plated film.
Embodiment two:
As shown in Figure 6, adjustable type gas distribution system described in this embodiment, comprise four gas distribution pipes be arranged in parallel, be respectively the first gas distribution pipe 41, second gas distribution pipe 42, the 3rd gas distribution pipe 43 and the 4th gas distribution pipe 44, first gas distribution pipe 41 arranges the first-class gauge 45 for controlling its gas flow, second gas distribution pipe 42 arranges the second gauge 46 for controlling its gas flow, 3rd gas distribution pipe 43 arranges the 3rd under meter 47 for controlling its gas flow, the 4th gas distribution pipe 44 arranges the 4th under meter 48 for controlling its gas flow.
First gas distribution pipe 41, second gas distribution pipe 42, the 3rd gas distribution pipe 43 and the 4th gas distribution pipe 44 are provided with the air blowing section matched with the length of the target surface of magnetron sputtering target, and the air blowing segment length of four gas distribution pipes is consistent.
As shown in Figure 7, the air blowing section of the first gas distribution pipe 41 is divided into four sections from top to bottom, namely first paragraph, second segment, the 3rd section, the 4th section, the first paragraph of the first gas distribution pipe 41, second segment, the 3rd section and the 4th section arranges the second air blowing portion 412, the 3rd air blowing portion 411 of air blowing portion 413, first and the 4th air blowing portion 414 respectively, air blowing portion is made up of the evenly distributed pore 49 that multiple specification is identical, and each pore 49 is arranged along the radial direction of the first gas distribution pipe 41, multiple pore 49 is axial arranged along it on the first gas distribution pipe 41.
Pore quantity in second air blowing portion 412, the 3rd air blowing portion 413 and the 4th air blowing portion 414 is six, pore quantity in first air blowing portion 411 is greater than the pore quantity in the second air blowing portion 412, and be 16, the length of the first air blowing portion 412 of air blowing portion 411, second, the 3rd air blowing portion 413, the length sum in the 4th air blowing portion 414 and the target surface of magnetron sputtering target matches.
As shown in Figure 8, the air blowing section of the second gas distribution pipe 42 is divided into four sections from top to bottom, namely first paragraph, second segment, the 3rd section, the 4th section, the first paragraph of the second gas distribution pipe 42, second segment, the 3rd section and the 4th section arranges the 6th air blowing portion 422, the 5th air blowing portion 421, the 7th air blowing portion 423 and the 8th air blowing portion 424 respectively, air blowing portion is made up of the evenly distributed pore 49 that multiple specification is identical, and each pore 49 is arranged along the radial direction of the second gas distribution pipe 42, multiple pore 49 is axial arranged along it on the second gas distribution pipe 42.
Pore quantity in 6th air blowing portion 422, the 7th air blowing portion 423 and the 8th air blowing portion 424 is six, pore quantity in 5th air blowing portion 421 is greater than the pore quantity in the 6th air blowing portion 422, and be 16, the length of the 5th air blowing portion 421, the 6th air blowing portion 422, the 7th air blowing portion 423, the length sum in the 8th air blowing portion 424 and the target surface of magnetron sputtering target matches.
As shown in Figure 9, the air blowing section of the 3rd gas distribution pipe 43 is divided into four sections from top to bottom, namely first paragraph, second segment, the 3rd section, the 4th section, the first paragraph of the 3rd gas distribution pipe 43, second segment, the 3rd section and the 4th section arranges the 9th air blowing portion 431, the tenth air blowing portion 434 of air blowing portion the 433 and the 12 of air blowing portion the 432, the 11 respectively, air blowing portion is made up of the evenly distributed pore 49 that multiple specification is identical, and each pore 49 is arranged along the radial direction of the 3rd gas distribution pipe 43, multiple pore 49 is axially arranged along it on the 3rd gas distribution pipe 43.
Pore quantity in tenth air blowing portion 434 of air blowing portion the 433 and the 12 of air blowing portion the 432, the 11 is six, pore quantity in 9th air blowing portion 431 is greater than the pore quantity in the tenth air blowing portion 432, and be 16, the length of the 9th air blowing portion 431, the length sum in the tenth air blowing portion 434 of air blowing portion the 433 and the 12 of air blowing portion the 432, the 11 and the target surface of magnetron sputtering target matches.
As shown in Figure 10, the air blowing section of the 4th gas distribution pipe 44 is divided into four sections from top to bottom, namely first paragraph, second segment, the 3rd section, the 4th section, the first paragraph of the 4th gas distribution pipe 44, second segment, the 3rd section and the 4th section arranges the 14 air blowing portion 441 of air blowing portion the 444 and the 13 of air blowing portion the 443, the 16 of air blowing portion the 442, the 15 respectively, air blowing portion is made up of the evenly distributed pore 49 that multiple specification is identical, and each pore 49 is arranged along the radial direction of the 4th gas distribution pipe 44, multiple pore 49 is axially arranged along it on the 4th gas distribution pipe 44.
Pore quantity in 14 air blowing portion 444 of air blowing portion the 443, the 16 of air blowing portion the 442, the 15 is six, pore quantity in 13 air blowing portion 441 is greater than the pore quantity in the 14 air blowing portion 442, and be 16, the length of the length sum in the 13 air blowing portion 444 of air blowing portion the 443, the 16 of air blowing portion the 442, the 15 of air blowing portion the 441, the 14 and the target surface of magnetron sputtering target matches.
And the length of the first air blowing portion 411, the 5th air blowing portion 421, the length sum in the 9th air blowing portion 441 of air blowing portion the 431, the 13 and the target surface of magnetron sputtering target matches, and makes whole uniform air flow energy be covered with the target surface of magnetron sputtering target.
In this embodiment, pore 17 is circular port.
As shown in figure 11, the magnetic control sputtering film plating device described in this embodiment, comprises magnetron sputtering target 5, target surface 6 is set on front side of magnetron sputtering target 5, target surface 6 is rectangle, and arranges adjustable type gas distribution system 4 in the zygomorphy of target surface 6, and the flow direction of these two gas distribution system 4 gases is parallel with target surface 6.
Gas distribution system 4 comprises the first gas distribution pipe 41, second gas distribution pipe 42, the 3rd gas distribution pipe 43 and the 4th gas distribution pipe 44, first gas distribution pipe 41 arranges the first-class gauge 45 for controlling its gas flow, second gas distribution pipe 42 arranges the second gauge 46 for controlling its gas flow, 3rd gas distribution pipe 43 arranges the 3rd under meter 47 for controlling its gas flow, the 4th gas distribution pipe 44 arranges the 4th under meter 48 for controlling its gas flow.
Principle of work is as follows:
Gas is by pipeline shunt to the first gas distribution pipe 41, second gas distribution pipe 42, in 3rd gas distribution pipe 43 and the 4th gas distribution pipe 44, and then from the air blowing portion blowout that gas distribution pipe is arranged, regulate first-class gauge 45, second gauge 46, 3rd under meter 47, 4th under meter 48 makes the first air blowing portion 411, 5th air blowing portion 421, the gas uniform of the 9th air blowing portion 441 of air blowing portion the 431 and the 13 blowout, because the first air blowing portion 411, 5th air blowing portion 421, 9th air blowing portion 441 of air blowing portion the 431 and the 13 is that intensive pore 17 is formed, as long as therefore ensure that the steady air current in these four air blowing portions is consistent, the gas uniform on target surface 6 longitudinal direction can be made, and then the even film layer that guarantee is coated with, when target surface 6 adjusts with the distance of the product of film to be plated, only need to adjust under meter, just can reach the object of accurate plated film.
The quantity of gas distribution pipe is not limited to above-described embodiment one and described in embodiment two three and four, and air blowing section simultaneously is also not limited to above-described embodiment one and described in embodiment two three sections and four sections.
Below know-why of the present invention is described in conjunction with specific embodiments.These describe just in order to explain principle of the present invention, and can not be interpreted as limiting the scope of the invention by any way.Based on explanation herein, those skilled in the art does not need to pay performing creative labour can associate other embodiment of the present invention, and these modes all will fall within protection scope of the present invention.
Claims (10)
1. an adjustable type gas distribution system, is characterized in that, comprises at least two gas distribution pipes be arranged in parallel, gas distribution pipe described in every root all arranges under meter, and on adjacent two described gas distribution pipes, stagger arrangement arranges air blowing portion;
Gas distribution pipe described in every root is all arranged the air blowing section matched with the length of the target surface of magnetron sputtering target, air blowing section is divided into three sections or four sections from top to bottom, one wherein section is set to described air blowing portion, and the length sum in described air blowing portion on all described gas distribution pipes and the length of the target surface of magnetron sputtering target match.
2. adjustable type gas distribution system according to claim 1, is characterized in that, described air blowing portion is made up of the evenly distributed pore that multiple specification is identical, and each pore is offered along the radial direction of gas distribution pipe, and multiple pore is axially arranged along it successively at gas distribution pipe.
3. adjustable type gas distribution system according to claim 2, it is characterized in that, described gas distribution pipe has three, be respectively the first gas distribution pipe, second gas distribution pipe and the 3rd gas distribution pipe, described first gas distribution pipe, second gas distribution pipe and the 3rd gas distribution pipe all arrange the air blowing section matched with the length of the target surface of magnetron sputtering target, this air blowing section is divided into three sections from top to bottom, be respectively first paragraph, second segment, 3rd section, the second segment of described first gas distribution pipe arranges air blowing portion, the first paragraph of described second gas distribution pipe arranges air blowing portion, the 3rd section of described 3rd gas distribution pipe arranges air blowing portion, the length of the length sum in three described air blowing portions and the target surface of magnetron sputtering target matches.
4. adjustable type gas distribution system according to claim 2, it is characterized in that, described gas distribution pipe has three, be respectively the first gas distribution pipe, the second gas distribution pipe and the 3rd gas distribution pipe, described first gas distribution pipe, the second gas distribution pipe and the 3rd gas distribution pipe are all arranged the air blowing section matched with the length of the target surface of magnetron sputtering target, this air blowing section is divided into three sections from top to bottom, be respectively first paragraph, second segment, the 3rd section;
The first paragraph of described first gas distribution pipe, second segment and the 3rd section arrange the second air blowing portion, the first air blowing portion and the 3rd air blowing portion respectively, the first paragraph of described second gas distribution pipe, second segment and the 3rd section arrange the 4th air blowing portion, the 5th air blowing portion and the 6th air blowing portion respectively, the first paragraph of described 3rd gas distribution pipe, second segment and the 3rd section arrange the 8th air blowing portion, the 9th air blowing portion and the 7th air blowing portion respectively;
The stomatal frequency in the stomatal frequency in described second air blowing portion, the stomatal frequency in described 3rd air blowing portion, the stomatal frequency in described 5th air blowing portion, the stomatal frequency in described 6th air blowing portion, the stomatal frequency in described 8th air blowing portion, described 9th air blowing portion is all identical, and is the first density;
The stomatal frequency in the stomatal frequency in described first air blowing portion, the stomatal frequency in described 4th air blowing portion, described 7th air blowing portion is all identical, and is the second density; Second density is greater than the first density;
The length of described first air blowing portion, the second air blowing portion, the length sum in the 3rd air blowing portion and the target surface of magnetron sputtering target matches; The length of described 4th air blowing portion, the 5th air blowing portion, the length sum in the 6th air blowing portion and the target surface of magnetron sputtering target matches; The length of described 7th air blowing portion, the 8th air blowing portion, the length sum in the 9th air blowing portion and the target surface of magnetron sputtering target matches; The length of described first air blowing portion, the 4th air blowing portion, the length sum in the 7th air blowing portion and the target surface of magnetron sputtering target matches.
5. adjustable type gas distribution system according to claim 2, it is characterized in that, described gas distribution pipe has four, be respectively the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, described first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe are all arranged the air blowing section matched with the length of the target surface of magnetron sputtering target, this air blowing section is divided into four sections from top to bottom, be respectively first paragraph, second segment, the 3rd section, the 4th section;
The 3rd section of described first gas distribution pipe arranges air blowing portion, the second segment of described second gas distribution pipe arranges air blowing portion, the first paragraph of described 3rd gas distribution pipe arranges air blowing portion, the 4th section of described 4th gas distribution pipe arranges air blowing portion, and the length of the length sum in four described air blowing portions and the target surface of magnetron sputtering target matches.
6. adjustable type gas distribution system according to claim 2, it is characterized in that, described gas distribution pipe has four, be respectively the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, described first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe are all arranged the air blowing section matched with the length of the target surface of magnetron sputtering target, this air blowing section is divided into four sections from top to bottom, be respectively first paragraph, second segment, the 3rd section, the 4th section;
The first paragraph of described first gas distribution pipe, second segment, the 3rd section, the 4th section the second air blowing portion, the 3rd air blowing portion, the first air blowing portion and the 4th air blowing portion are set respectively; The first paragraph of described second gas distribution pipe, second segment, the 3rd section, the 4th section the 6th air blowing portion, the 5th air blowing portion, the 7th air blowing portion and the 8th air blowing portion are set respectively; The first paragraph of described 3rd gas distribution pipe, second segment, the 3rd section, the 4th section the 9th air blowing portion, the tenth air blowing portion, the 11 air blowing portion and the 12 air blowing portion are set respectively; The first paragraph of described 4th gas distribution pipe, second segment, the 3rd section, the 4th section the 14 air blowing portion, the 15 air blowing portion, the 16 air blowing portion and the 13 air blowing portion are set respectively;
The stomatal frequency in the stomatal frequency in the stomatal frequency in the stomatal frequency in the stomatal frequency in described second air blowing portion, the stomatal frequency in described 3rd air blowing portion, the stomatal frequency in described 4th air blowing portion, the stomatal frequency in described 6th air blowing portion, the stomatal frequency in described 7th air blowing portion, described 8th air blowing portion, the stomatal frequency in described tenth air blowing portion, described 11 air blowing portion, the stomatal frequency in described 12 air blowing portion, described 14 air blowing portion, the stomatal frequency in described 15 air blowing portion, described 16 air blowing portion is all identical, and is the first density;
The stomatal frequency in the stomatal frequency in described first air blowing portion, the stomatal frequency in described 5th air blowing portion, described 9th air blowing portion is all identical with the stomatal frequency in the 13 air blowing portion, and is the second density; Second density is greater than the first density;
The length of described first air blowing portion, the second air blowing portion, the 3rd air blowing portion, the length sum in the 4th air blowing portion and the target surface of magnetron sputtering target matches; The length of described 5th air blowing portion, the 6th air blowing portion, the 7th air blowing portion, the length sum in the 8th air blowing portion and the target surface of magnetron sputtering target matches; The length of described 9th air blowing portion, the tenth air blowing portion, the 11 air blowing portion, the length sum in the 12 air blowing portion and the target surface of magnetron sputtering target matches; The length of described 13 air blowing portion, the 14 air blowing portion, the 15 air blowing portion, the length sum in the 16 air blowing portion and the target surface of magnetron sputtering target matches; The length of described first air blowing portion, the 5th air blowing portion, the 9th air blowing portion, the length sum in the 13 air blowing portion and the target surface of magnetron sputtering target matches.
7., according to the arbitrary described adjustable type gas distribution system of claim 2 ~ 6, it is characterized in that, described pore is circular port, square opening or profiled holes.
8. a magnetic control sputtering film plating device, comprise the adjustable type gas distribution system as described in any one of claim 1 ~ 7, it is characterized in that, also comprise magnetron sputtering target, described magnetron sputtering target side arranges target surface, described target surface at least side arranges described gas distribution system, and the gas flow of described gas distribution system is parallel with described target surface.
9. magnetic control sputtering film plating device according to claim 8, is characterized in that, described target surface both sides all arrange described gas distribution system.
10. magnetic control sputtering film plating device according to claim 8 or claim 9, it is characterized in that, described gas distribution system comprises at least two gas distribution pipes be arranged in parallel, and gas distribution pipe described in every root all arranges under meter, and on adjacent two described gas distribution pipes, stagger arrangement arranges air blowing portion.
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| CN201210531667.5A CN103014642B (en) | 2012-12-10 | 2012-12-10 | Adjustable gas distribution system and magnetron sputtering coating device comprising same |
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| CN201210531667.5A CN103014642B (en) | 2012-12-10 | 2012-12-10 | Adjustable gas distribution system and magnetron sputtering coating device comprising same |
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| CN103014642B true CN103014642B (en) | 2015-04-01 |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103757593A (en) * | 2014-01-06 | 2014-04-30 | 天津南玻节能玻璃有限公司 | Device for improving uniformity of magnetron sputtering gas field and operation method thereof |
| CN104878361B (en) * | 2015-06-24 | 2017-05-31 | 安徽纯源镀膜科技有限公司 | Magnetic-controlled sputtering coating equipment |
| CN107400879B (en) * | 2017-08-01 | 2019-04-05 | 成都天马微电子有限公司 | A kind of display panel film-forming apparatus and method |
| CN112899637B (en) * | 2019-12-04 | 2023-03-31 | 江苏菲沃泰纳米科技股份有限公司 | Air inlet system of film coating device |
| CN112281126B (en) * | 2020-10-29 | 2022-11-25 | 河南卓金光电科技股份有限公司 | Reaction magnetron sputtering separation type gas distribution method |
| CN115323342B (en) * | 2022-09-20 | 2023-09-29 | 中核四0四有限公司 | Control system and method for pipeline coating based on magnetron sputtering |
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