CN202936476U - Adjustable air distribution system and magnetron sputtering coating device comprising same - Google Patents
Adjustable air distribution system and magnetron sputtering coating device comprising same Download PDFInfo
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- CN202936476U CN202936476U CN 201220680331 CN201220680331U CN202936476U CN 202936476 U CN202936476 U CN 202936476U CN 201220680331 CN201220680331 CN 201220680331 CN 201220680331 U CN201220680331 U CN 201220680331U CN 202936476 U CN202936476 U CN 202936476U
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Abstract
The utility model discloses an adjustable air distribution system and a magnetron sputtering coating device comprising the same. The adjustable air distribution system comprises at least two air distribution tubes which are arranged in parallel, wherein a flow meter is arranged on each air distribution tube; blowing sections are arranged on the two adjacent air distribution tubes in a staggered manner; each blowing section is formed by a plurality of air holes which are the same in specification and evenly arranged; each air hole is arranged along a radial direction of each air distribution tube; and the plurality of air holes are sequentially arranged along the axial direction on each air distribution tube. The gas blown from the air distribution system can evenly achieve the target surface by arranging the air distribution system into at least two air distribution tubes and arranging the blowing sections on the two adjacent air distribution tubes in the staggered manner, so that the uniformity of the film is ensured; and the flow of the gas can be adjusted in real time by arranging the flow meter on each air distribution tube, namely the flow of the gas can be accurately adjusted according to the difference of the distances from the target surface to the surface of an object to be coated and the coating thicknesses, and the flow of the gas blown on each air distribution tube can be equal, so as to achieve the targets of real-time control and accurate coating.
Description
Technical field
The utility model relates to the magnetron sputtering technology field, relates in particular to a kind of adjustable type gas distribution system, and the magnetic control sputtering film plating device that comprises this adjustable type gas distribution system.
Background technology
Magnetron sputtering technology is the coating technique method of current widespread use, is widely used in the industrial fields such as optics, microelectronics, wear-resisting, anti-corrosion, decoration, in order to reliable and stable thin film coating to be provided.Use colored plated film as decorated, mobile phone shell plated film, building glass low-e plated film, ITO transparent conducting glass plated film etc.
The homogeneity of magnetron sputtering plating is extremely important, and especially for optics, microelectronic product plated film, its homogeneity has material impact to quality and the yield rate of product.Affect the inhomogeneity factor of magnetron sputtering plating a lot, comprise warm field uniformity, the homogeneity in plasma uniformity, process gas gas distribution homogeneity, magnetic field etc.For gas distribution system, traditional is the mode that adopts single inlet pipe, adopt this kind of mode gas distribution easily to occur that gas distribution is even not, because planar target is mainly rectangle, long-width ratio is very large, therefore mainly there is vertical gas distribution problem of non-uniform in it, i.e. target surface gas distribution skewness from top to bottom, and gas distribution from left to right is substantially even.In order to address the above problem, there is the technician to propose a kind of mixed air distribution pipe, for solving the inhomogeneous problem of single inlet pipe gas distribution, for example, Chinese patent literature CN 202322999U discloses a kind of " mixed air distribution pipe ", it comprises inlet pipe and pneumatic tube, described inlet pipe is connected with the inlet mouth of described pneumatic tube, described pneumatic tube is distributed with multilayer, its air outlet is connected with relief pipe, be evenly equipped with production well on described relief pipe, above-mentioned mixed air distribution pipe is by setting up relief pipe, gas is by the depressurization expanded in the relief pipe internal volume, thereby obtain the uniform flow of each aperture gas of flowing through, reach the uniform effect of gas distribution.But this mixed air distribution pipe has following defect: although 1, this gas distribution system can further optimize the homogeneity of gas distribution, but it lacks controllability, it is a kind of default device fixed, only has certain scope of application, for the Application Areas high to the film coherence request, when gas flow rate changes, stopping up appears in pore, when the situations such as gaseous species change and target-substrate distance are inhomogeneous occur, its effect can descend; 2, to gas distribution, inhomogeneity adjusting lacks quantizating index, mostly judgement by rule of thumb.
Again for example, Chinese patent literature CN 201313933Y discloses a kind of " dualistic gas-distribution pipe ", it comprises the inlet pipe of magnetic control sputtering cathode, the valve of control inlet pipe flow, and the terminal portions of the inlet pipe of described magnetic control sputtering cathode and middle portion adopt independently inlet pipe difference air feed separately.By building a kind of dualistic gas-distribution pipe, make the air inlet more equably of magnetic control sputtering cathode terminal portions and middle portion, thereby make the reactive sputtering plated film more even.Although this dualistic gas-distribution pipe has controllability, but it does not have the function of the cloth tolerance of measuring different zones, can not realize quantitative measurment, therefore when being coated with different thicknesses of layers, can only rule of thumb regulate and judge, thus can not be applied in accurate plated film, and its gas distribution mode complex structure, become the product cost higher, operation and maintenance is also very difficult.
The utility model content
A purpose of the present utility model, be to provide a kind of adjustable type gas distribution system, make gas distribution more even, simultaneously the flow of adjustments of gas according to actual needs also, and the cloth tolerance of different zones is carried out to accurate quantitative measurment, reach the purpose of real-time control, accurate plated film.
Another purpose of the present utility model, be to provide a kind of adjustable type gas distribution system, and it is simple in structure, and operation and maintenance is convenient, becomes to produce with low cost.
Another purpose of the present utility model, be to provide a kind of magnetic control sputtering film plating device, by using adjustable gas distribution system, make gas distribution more even, the flow of adjustments of gas according to actual needs also simultaneously, and the cloth tolerance of different zones is carried out to accurate quantitative measurment, reach the purpose of real-time control, accurate plated film, and make simplifying the structure of whole device, operation and maintenance is convenient, reduces production costs.
For reaching above-mentioned purpose, the utility model by the following technical solutions:
A kind of adjustable type gas distribution system, comprise at least two gas distribution pipes that be arranged in parallel, on every described gas distribution pipe, under meter all is set, and on adjacent two described gas distribution pipes, stagger arrangement arranges air blowing section.
As a kind of preferred version of adjustable type gas distribution system, described air blowing section is that the evenly distributed pore identical by a plurality of specifications forms, and each pore is radially offered along gas distribution pipe, and a plurality of pores are axially arranged along it successively at gas distribution pipe.
Preferably, described gas distribution pipe has three, be respectively the first gas distribution pipe, the second gas distribution pipe and the 3rd gas distribution pipe, described the first gas distribution pipe, the air blowing section that length with the target surface of magnetron sputtering target is complementary all is set on the second gas distribution pipe and the 3rd gas distribution pipe, this section of blowing is divided into three sections from top to bottom, be respectively first paragraph, second segment, the 3rd section, the second segment of described the first gas distribution pipe arranges air blowing section, the first paragraph of described the second gas distribution pipe arranges air blowing section, the 3rd section of described the 3rd gas distribution pipe arranges air blowing section, the length of the length sum of three described air blowing sections and the target surface of magnetron sputtering target is complementary.
Be more preferably, described air blowing section comprises 23 evenly distributed pores.
Preferably, described gas distribution pipe has three, be respectively the first gas distribution pipe, the second gas distribution pipe and the 3rd gas distribution pipe, the air blowing section that length with the target surface of magnetron sputtering target is complementary all is set on described the first gas distribution pipe, the second gas distribution pipe and the 3rd gas distribution pipe, this section of blowing is divided into three sections from top to bottom, is respectively first paragraph, second segment, the 3rd section;
On the first paragraph of described the first gas distribution pipe, second segment and the 3rd section, the second air blowing section, the first air blowing section and the 3rd air blowing section are set respectively, on the first paragraph of described the second gas distribution pipe, second segment and the 3rd section, the 4th air blowing section, the 5th air blowing section and the 6th air blowing section are set respectively, on the first paragraph of described the 3rd gas distribution pipe, second segment and the 3rd section, the 8th air blowing section, the 9th air blowing section and the 7th air blowing section are set respectively;
The stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of described the second air blowing section, described the 3rd air blowing section, described the 5th air blowing section, described the 6th air blowing section, described the 8th air blowing section, described the 9th air blowing section is all identical, and is the first density;
The stomatal frequency of the stomatal frequency of the stomatal frequency of described the first air blowing section, described the 4th air blowing section, described the 7th air blowing section is all identical, and is the second density; The second density is greater than the first density;
The length of the length sum of described the first air blowing section, the second air blowing section, the 3rd air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 4th air blowing section, the 5th air blowing section, the 6th air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 7th air blowing section, the 8th air blowing section, the 9th air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the first air blowing section, the 4th air blowing section, the 7th air blowing section and the target surface of magnetron sputtering target is complementary.
Be more preferably, described the first air blowing section, the 4th air blowing section and the 7th air blowing section all have the first identical length, and distinguish evenly distributed 23 pores on the first identical length, so that above-mentioned three air blowing sections have the first identical stomatal frequency; Described the second air blowing section, the 3rd air blowing section, the 5th air blowing section, the 6th air blowing section, the 8th air blowing section, the 9th air blowing section all have the second identical length, and seven evenly distributed pores of difference on the second identical length, so that above-mentioned six air blowing sections have the second identical stomatal frequency; The first length is identical with the second length, makes the first stomatal frequency be greater than the second stomatal frequency.
Preferably, described gas distribution pipe has four, be respectively the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, the air blowing section that length with the target surface of magnetron sputtering target is complementary all is set on described the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, this section of blowing is divided into four sections from top to bottom, is respectively first paragraph, second segment, the 3rd section, the 4th section;
The 3rd section of described the first gas distribution pipe arranges air blowing section, the second segment of described the second gas distribution pipe arranges air blowing section, the first paragraph of described the 3rd gas distribution pipe arranges air blowing section, the 4th section of described the 4th gas distribution pipe arranges air blowing section, and the length of the length sum of four described air blowing sections and the target surface of magnetron sputtering target is complementary.
Be more preferably, described air blowing section comprises 16 evenly distributed pores.
Preferably, described gas distribution pipe has four, be respectively the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, the air blowing section that length with the target surface of magnetron sputtering target is complementary all is set on described the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, this section of blowing is divided into four sections from top to bottom, is respectively first paragraph, second segment, the 3rd section, the 4th section;
The first paragraph of described the first gas distribution pipe, second segment, the 3rd section, the 4th section arrange respectively the second air blowing section, the 3rd air blowing section, the first air blowing section and the 4th air blowing section; The first paragraph of described the second gas distribution pipe, second segment, the 3rd section, the 4th section arrange respectively the 6th air blowing section, the 5th air blowing section, the 7th air blowing section and the 8th air blowing section; The first paragraph of described the 3rd gas distribution pipe, second segment, the 3rd section, the 4th section arrange respectively the 9th air blowing section, the tenth air blowing section, the 11 air blowing section and the 12 air blowing section; The first paragraph of described the 4th gas distribution pipe, second segment, the 3rd section, the 4th section arrange respectively the 14 air blowing section, the 15 air blowing section, the 16 air blowing section and the 13 air blowing section;
The stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of described the second air blowing section, described the 3rd air blowing section, described the 4th air blowing section, described the 6th air blowing section, described the 7th air blowing section, described the 8th air blowing section, described the tenth air blowing section, the stomatal frequency of described the 11 air blowing section, the stomatal frequency of described the 12 air blowing section, the stomatal frequency of described the 14 air blowing section, the stomatal frequency of described the 15 air blowing section, described the 16 air blowing section is all identical, and is the first density;
The stomatal frequency of the stomatal frequency of the stomatal frequency of described the first air blowing section, described the 5th air blowing section, described the 9th air blowing section is all identical with the stomatal frequency of the 13 air blowing section, and is the second density; The second density is greater than the first density;
The length of the length sum of described the first air blowing section, the second air blowing section, the 3rd air blowing section, the 4th air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 5th air blowing section, the 6th air blowing section, the 7th air blowing section, the 8th air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 9th air blowing section, the tenth air blowing section, the 11 air blowing section, the 12 air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 13 air blowing section, the 14 air blowing section, the 15 air blowing section, the 16 air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the first air blowing section, the 5th air blowing section, the 9th air blowing section, the 13 air blowing section and the target surface of magnetron sputtering target is complementary.
Be more preferably, described the first air blowing section, the 5th air blowing section, the 9th air blowing section and the 13 air blowing section all have the 3rd identical length, evenly distributed 16 pores of difference on the 3rd identical length, so that four above-mentioned air blowing sections have the 3rd identical stomatal frequency; Described the second air blowing section, the 3rd air blowing section, the 4th air blowing section, the 6th air blowing section, the 7th air blowing section, the 8th air blowing section, the tenth air blowing section, the 11 air blowing section, the 12 air blowing section, the 14 air blowing section, the 15 air blowing section, the 16 air blowing section all have the 4th identical length, evenly distributed six pores of difference on the 4th identical length, so that 12 above-mentioned air blowing sections have the 4th identical stomatal frequency; The 3rd above-mentioned length is identical with the 4th length, so that the 3rd stomatal frequency is greater than the 4th stomatal frequency.
Preferably, described pore is circular port, square opening or profiled holes.
A kind of magnetic control sputtering film plating device, comprise adjustable type gas distribution system as described above, also comprise magnetron sputtering target, described magnetron sputtering target one side arranges target surface, at least one side of described target surface arranges described gas distribution system, and the gas flow of described gas distribution system is parallel with described target surface.
As a kind of preferred version of magnetic control sputtering film plating device, described target surface both sides all arrange described gas distribution system.
Preferably, described gas distribution system comprises at least two gas distribution pipes that be arranged in parallel, on every described gas distribution pipe, under meter all is set, and on adjacent two described gas distribution pipes, stagger arrangement arranges air blowing section.
The contrast prior art, the beneficial effects of the utility model are:
1, be set at least two gas distribution pipes by gas distribution system, and stagger arrangement arranges air blowing section on adjacent two gas distribution pipes, the gas that can make gas distribution system blow out can arrive target surface uniformly, guarantees the even film layer that magnetic control sputtering device is coated with, reliable and stable;
2, by under meter is set on gas distribution pipe, make the adjusting that the flow of gas can be real-time, according to the distance of target surface distance body surface to be coated, the difference of coating film thickness, the flow of accurate adjustments of gas, and can make the flow of the gas that blows out on each gas distribution pipe equate, reach real-time control, the accurate purpose of plated film;
3, by the adjustable type gas distribution system is applied in magnetic control sputtering film plating device, not only can adjust accurately in real time the flow of gas, make the even film layer be coated with, and whole device is simple in structure, operation and maintenance is convenient, and production cost is low.
The accompanying drawing explanation
The structural representation that Fig. 1 is the described adjustable type gas distribution system of embodiment mono-;
The structural representation that Fig. 2 is the first gas distribution pipe described in embodiment mono-;
The structural representation that Fig. 3 is the second gas distribution pipe described in embodiment mono-;
The structural representation that Fig. 4 is the 3rd gas distribution pipe described in embodiment mono-;
The structural representation that Fig. 5 is the described magnetic control sputtering film plating device that comprises the adjustable type gas distribution system of embodiment mono-;
The structural representation that Fig. 6 is the described adjustable type gas distribution system of embodiment bis-;
The structural representation that Fig. 7 is the first gas distribution pipe described in embodiment bis-;
The structural representation that Fig. 8 is the second gas distribution pipe described in embodiment bis-;
The structural representation that Fig. 9 is the 3rd gas distribution pipe described in embodiment bis-;
The structural representation that Figure 10 is the 4th gas distribution pipe described in embodiment bis-;
The structural representation that Figure 11 is the described magnetic control sputtering film plating device that comprises the adjustable type gas distribution system of embodiment bis-.
In Fig. 1～5:
1, gas distribution system;
11, the first gas distribution pipe; 111, the first air blowing section; 112, the second air blowing section; 113, the 3rd air blowing section;
12, the second gas distribution pipe; 121, the 4th air blowing section; 122, the 5th air blowing section; 123, the 6th air blowing section;
13, the 3rd gas distribution pipe; 131, the 7th air blowing section; 132, the 8th air blowing section; 133, the 9th air blowing section;
14, first flow meter; 15, the second under meter; 16, the 3rd under meter; 17, pore;
2, magnetron sputtering target; 3, target surface.
In Fig. 6～11:
4, gas distribution system;
41, the first gas distribution pipe; 411, the first air blowing section; 412, the second air blowing section; 413, the 3rd air blowing section; 414, the 4th air blowing section;
42, the second gas distribution pipe; 421, the 5th air blowing section; 422, the 6th air blowing section; 423, the 7th air blowing section; 424, the 8th air blowing section;
43, the 3rd gas distribution pipe; 431, the 9th air blowing section; 432, the tenth air blowing section; 433, the 11 air blowing section; 434, the 12 air blowing section;
44, the 4th gas distribution pipe; 441, the 13 air blowing section; 442, the 14 air blowing section; 443, the 15 air blowing section; 444, the 16 air blowing section;
45, first flow meter; 46, the second under meter; 47, the 3rd under meter; 48, the 4th under meter; 49, pore;
5, magnetron sputtering target; 6, target surface.
Embodiment
Embodiment mono-:
As shown in Figure 1, adjustable type gas distribution system described in this embodiment, comprise three gas distribution pipes that be arranged in parallel, be respectively the first gas distribution pipe 11, the second gas distribution pipe 12 and the 3rd gas distribution pipe 13, be provided for controlling the first flow meter 14 of its gas flow on the first gas distribution pipe 11, be provided for controlling the second under meter 15 of its gas flow on the second gas distribution pipe 12, be provided for controlling the 3rd under meter 16 of its gas flow on the 3rd gas distribution pipe 13.
Be provided with the air blowing section that the length with the target surface of magnetron sputtering target is complementary on the first gas distribution pipe 11, the second gas distribution pipe 12 and the 3rd gas distribution pipe 13, and the air blowing segment length of three gas distribution pipes is consistent.
As shown in Figure 2, the air blowing section of the first gas distribution pipe 11 is divided into three sections from top to bottom, be first paragraph, second segment, the 3rd section, on the first paragraph of the first gas distribution pipe 11, second segment and the 3rd section, the second air blowing section 112, the first air blowing section 111 and the 3rd air blowing section 113 are set respectively, air blowing section is all that the evenly distributed pore 17 identical by a plurality of specifications forms, and each pore 17 is radially offered along the first gas distribution pipe 11, a plurality of pores 17 are axial arranged along it on the first gas distribution pipe 11.
Pore quantity in the second air blowing section 112 equals the pore quantity in the 3rd air blowing section 113, and be seven pores 17, pore quantity in the first air blowing section 111 is greater than the pore quantity in the second air blowing section 112, and the length that is the target surface of the length sum of 23 pores, 17, the first air blowing sections 111, the second air blowing section 112, the 3rd air blowing section 113 and magnetron sputtering target is complementary.
As shown in Figure 3, the air blowing section of the second gas distribution pipe 12 is divided into three sections from top to bottom, be first paragraph, second segment, the 3rd section, on the first paragraph of the second gas distribution pipe 12, second segment and the 3rd section, the 4th air blowing section 121, the 5th air blowing section 122 and the 6th air blowing section 123 are set respectively, air blowing section is all that the evenly distributed pore 17 identical by a plurality of specifications forms, and each pore 17 is radially offered along the second gas distribution pipe 12, a plurality of pores 17 are axial arranged along it on the second gas distribution pipe 11.
Pore quantity in the 5th air blowing section 122 equals the pore quantity in the 6th air blowing section 123, and be seven pores 17, pore quantity in the 4th air blowing section 121 is greater than the pore quantity in the 5th air blowing section 122, and the length that is the target surface of the length sum of 23 pores, 17, the four air blowing sections 121, the 5th air blowing section 122, the 6th air blowing section 123 and magnetron sputtering target is complementary.
As shown in Figure 4, the air blowing section of the 3rd gas distribution pipe 13 is divided into three sections from top to bottom, be first paragraph, second segment, the 3rd section, on the first paragraph of the 3rd gas distribution pipe 13, second segment and the 3rd section, the 8th air blowing section 132, the 9th air blowing section 133 and the 7th air blowing section 131 are set respectively, air blowing section is all that the evenly distributed pore 17 identical by a plurality of specifications forms, and each pore 17 is radially offered along the 3rd gas distribution pipe 13, a plurality of pores 17 are axial arranged along it on the 3rd gas distribution pipe 13.
Pore quantity in the 8th air blowing section 132 equals the pore quantity in the 9th air blowing section 133, and be seven pores 17, pore quantity in the 7th air blowing section 131 is greater than the pore quantity in the 8th air blowing section 132, and the length that is the target surface of the length sum of 23 pores, 17, the seven air blowing sections 131, the 8th air blowing section 132, the 9th air blowing section 133 and magnetron sputtering target is complementary.
And the length of the length sum of the first air blowing section 111, the 4th air blowing section 121, the 7th air blowing section 131 and the target surface of magnetron sputtering target is complementary, and makes whole uniform air flow energy be covered with the target surface of magnetron sputtering target.
In this embodiment, pore 17 is circular port.
As shown in Figure 5, the magnetic control sputtering film plating device described in this embodiment, comprise magnetron sputtering target 2, magnetron sputtering target 2 front sides arrange target surface 3, target surface 3 is rectangle, and in a side of target surface 3, above-mentioned adjustable type gas distribution system 1 is set, and the flow direction of this gas distribution system 1 gas is parallel with target surface.
Principle of work is as follows:
Gas is by pipeline shunt to the first gas distribution pipe 11, in the second gas distribution pipe 12 and the 3rd gas distribution pipe 13, and then the air blowing section arranged from gas distribution pipe blows out, regulate first flow meter 14, the second under meter 15, the 3rd under meter 16 makes the first air blowing section 111, the 4th air blowing section 121, the gas uniform that the 7th air blowing section 131 blows out, because the first air blowing section 111, the 4th air blowing section 121, the 7th air blowing section 131 is that intensive pore 17 forms, therefore as long as guarantee that the steady air current of these three air blowing sections is consistent, can make the gas uniform on target surface 3 longitudinal directions, and then guarantee the even film layer be coated with, when target surface 3 is adjusted with the distance of the product of made membrane to be plated, only need to adjust under meter, just can reach the purpose of accurate plated film.
Embodiment bis-:
As shown in Figure 6, adjustable type gas distribution system described in this embodiment, comprise four gas distribution pipes that be arranged in parallel, be respectively the first gas distribution pipe 41, the second gas distribution pipe 42, the 3rd gas distribution pipe 43 and the 4th gas distribution pipe 44, be provided for controlling the first flow meter 45 of its gas flow on the first gas distribution pipe 41, be provided for controlling the second under meter 46 of its gas flow on the second gas distribution pipe 42, be provided for controlling the 3rd under meter 47 of its gas flow on the 3rd gas distribution pipe 43, be provided for controlling the 4th under meter 48 of its gas flow on the 4th gas distribution pipe 44.
Be provided with the air blowing section that the length with the target surface of magnetron sputtering target is complementary on the first gas distribution pipe 41, the second gas distribution pipe 42, the 3rd gas distribution pipe 43 and the 4th gas distribution pipe 44, and the air blowing segment length of four gas distribution pipes is consistent.
As shown in Figure 7, the air blowing section of the first gas distribution pipe 41 is divided into four sections from top to bottom, be first paragraph, second segment, the 3rd section, the 4th section, on the first paragraph of the first gas distribution pipe 41, second segment, the 3rd section and the 4th section, the second air blowing section 412, the 3rd air blowing section 413, the first air blowing section 411 and the 4th air blowing section 414 are set respectively, air blowing section is all that the evenly distributed pore 49 identical by a plurality of specifications forms, and each pore 49 is along the radially setting of the first gas distribution pipe 41, and a plurality of pores 49 are axial arranged along it on the first gas distribution pipe 41.
Pore quantity in the second air blowing section 412, the 3rd air blowing section 413 and the 4th air blowing section 414 is six, pore quantity in the first air blowing section 411 is greater than the pore quantity in the second air blowing section 412, and be 16, the length of the length sum of the first air blowing section 411, the second air blowing section 412, the 3rd air blowing section 413, the 4th air blowing section 414 and the target surface of magnetron sputtering target is complementary.
As shown in Figure 8, the air blowing section of the second gas distribution pipe 42 is divided into four sections from top to bottom, be first paragraph, second segment, the 3rd section, the 4th section, on the first paragraph of the second gas distribution pipe 42, second segment, the 3rd section and the 4th section, the 6th air blowing section 422, the 5th air blowing section 421, the 7th air blowing section 423 and the 8th air blowing section 424 are set respectively, air blowing section is all that the evenly distributed pore 49 identical by a plurality of specifications forms, and each pore 49 is along the radially setting of the second gas distribution pipe 42, and a plurality of pores 49 are axial arranged along it on the second gas distribution pipe 42.
Pore quantity in the 6th air blowing section 422, the 7th air blowing section 423 and the 8th air blowing section 424 is six, pore quantity in the 5th air blowing section 421 is greater than the pore quantity in the 6th air blowing section 422, and be 16, the length of the length sum of the 5th air blowing section 421, the 6th air blowing section 422, the 7th air blowing section 423, the 8th air blowing section 424 and the target surface of magnetron sputtering target is complementary.
As shown in Figure 9, the air blowing section of the 3rd gas distribution pipe 43 is divided into four sections from top to bottom, be first paragraph, second segment, the 3rd section, the 4th section, on the first paragraph of the 3rd gas distribution pipe 43, second segment, the 3rd section and the 4th section, the 9th air blowing section 431, the tenth the 432, the 11 air blowing section 433 and the 12 air blowing section 434 of air blowing section are set respectively, air blowing section is all that the evenly distributed pore 49 identical by a plurality of specifications forms, and each pore 49 is along the radially setting of the 3rd gas distribution pipe 43, a plurality of pores 49 on the 3rd gas distribution pipe 43 along its axial setting.
Pore quantity in the tenth the 432, the 11 air blowing section 433 of air blowing section and the 12 air blowing section 434 is six, pore quantity in the 9th air blowing section 431 is greater than the pore quantity in the tenth air blowing section 432, and be 16, the length of the length sum of the 9th air blowing section 431, the tenth the 432, the 11 air blowing section 433 of air blowing section and the 12 air blowing section 434 and the target surface of magnetron sputtering target is complementary.
As shown in figure 10, the air blowing section of the 4th gas distribution pipe 44 is divided into four sections from top to bottom, be first paragraph, second segment, the 3rd section, the 4th section, on the first paragraph of the 4th gas distribution pipe 44, second segment, the 3rd section and the 4th section, the 14 the 442, the 15 the 443, the 16 air blowing section 444 and the 13 air blowing section 441 of air blowing section of air blowing section is set respectively, air blowing section is all that the evenly distributed pore 49 identical by a plurality of specifications forms, and each pore 49 is along the radially setting of the 4th gas distribution pipe 44, a plurality of pores 49 on the 4th gas distribution pipe 44 along its axial setting.
Pore quantity in the 14 the 442, the 15 the 443, the 16 air blowing section 444 of air blowing section of air blowing section is six, pore quantity in the 13 air blowing section 441 is greater than the pore quantity in the 14 air blowing section 442, and be 16, the length of the length sum of the 13 the 441, the 14 the 442, the 15 the 443, the 16 air blowing section 444 of air blowing section of air blowing section of air blowing section and the target surface of magnetron sputtering target is complementary.
And the length of the length sum of the first air blowing section 411, the 5th air blowing section 421, the 9th the 431, the 13 air blowing section 441 of air blowing section and the target surface of magnetron sputtering target is complementary, and makes whole uniform air flow energy be covered with the target surface of magnetron sputtering target.
In this embodiment, pore 17 is circular port.
As shown in figure 11, the magnetic control sputtering film plating device described in this embodiment, comprise magnetron sputtering target 5, magnetron sputtering target 5 front sides arrange target surface 6, target surface 6 is rectangle, and in the zygomorphy of target surface 6, adjustable type gas distribution system 4 is set, and the flow direction of these two gas distribution system 4 gases is parallel with target surface 6.
Principle of work is as follows:
Gas is by pipeline shunt to the first gas distribution pipe 41, the second gas distribution pipe 42, in the 3rd gas distribution pipe 43 and the 4th gas distribution pipe 44, and then the air blowing section arranged from gas distribution pipe blows out, regulate first flow meter 45, the second under meter 46, the 3rd under meter 47, the 4th under meter 48 makes the first air blowing section 411, the 5th air blowing section 421, the gas uniform that the 9th air blowing section 431 and the 13 air blowing section 441 blow out, because the first air blowing section 411, the 5th air blowing section 421, the 9th air blowing section 431 and the 13 air blowing section 441 are that intensive pore 17 forms, therefore as long as guarantee that the steady air current of these four air blowing sections is consistent, can make the gas uniform on target surface 6 longitudinal directions, and then guarantee the even film layer be coated with, when target surface 6 is adjusted with the distance of the product of made membrane to be plated, only need to adjust under meter, just can reach the purpose of accurate plated film.
The quantity of gas distribution pipe is not limited to described three and four of above-described embodiment one and embodiment bis-, and the section of simultaneously blowing also is not limited to described three sections and four sections of above-described embodiment one and embodiment bis-.
Know-why of the present utility model has below been described in conjunction with specific embodiments.These are described is in order to explain principle of the present utility model, and can not be interpreted as by any way the restriction to the utility model protection domain.Explanation based on herein, those skilled in the art does not need to pay performing creative labour can associate other embodiment of the present utility model, within these modes all will fall into protection domain of the present utility model.
Claims (10)
1. an adjustable type gas distribution system, is characterized in that, comprises at least two gas distribution pipes that be arranged in parallel, on every described gas distribution pipe, under meter all is set, and on adjacent two described gas distribution pipes, stagger arrangement arranges air blowing section.
2. adjustable type gas distribution system according to claim 1, is characterized in that, described air blowing section is that the evenly distributed pore identical by a plurality of specifications forms, and each pore is radially offered along gas distribution pipe, and a plurality of pores are axially arranged along it successively at gas distribution pipe.
3. adjustable type gas distribution system according to claim 2, it is characterized in that, described gas distribution pipe has three, be respectively the first gas distribution pipe, the second gas distribution pipe and the 3rd gas distribution pipe, described the first gas distribution pipe, the air blowing section that length with the target surface of magnetron sputtering target is complementary all is set on the second gas distribution pipe and the 3rd gas distribution pipe, this section of blowing is divided into three sections from top to bottom, be respectively first paragraph, second segment, the 3rd section, the second segment of described the first gas distribution pipe arranges air blowing section, the first paragraph of described the second gas distribution pipe arranges air blowing section, the 3rd section of described the 3rd gas distribution pipe arranges air blowing section, the length of the length sum of three described air blowing sections and the target surface of magnetron sputtering target is complementary.
4. adjustable type gas distribution system according to claim 2, it is characterized in that, described gas distribution pipe has three, be respectively the first gas distribution pipe, the second gas distribution pipe and the 3rd gas distribution pipe, the air blowing section that length with the target surface of magnetron sputtering target is complementary all is set on described the first gas distribution pipe, the second gas distribution pipe and the 3rd gas distribution pipe, this section of blowing is divided into three sections from top to bottom, is respectively first paragraph, second segment, the 3rd section;
On the first paragraph of described the first gas distribution pipe, second segment and the 3rd section, the second air blowing section, the first air blowing section and the 3rd air blowing section are set respectively, on the first paragraph of described the second gas distribution pipe, second segment and the 3rd section, the 4th air blowing section, the 5th air blowing section and the 6th air blowing section are set respectively, on the first paragraph of described the 3rd gas distribution pipe, second segment and the 3rd section, the 8th air blowing section, the 9th air blowing section and the 7th air blowing section are set respectively;
The stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of described the second air blowing section, described the 3rd air blowing section, described the 5th air blowing section, described the 6th air blowing section, described the 8th air blowing section, described the 9th air blowing section is all identical, and is the first density;
The stomatal frequency of the stomatal frequency of the stomatal frequency of described the first air blowing section, described the 4th air blowing section, described the 7th air blowing section is all identical, and is the second density; The second density is greater than the first density;
The length of the length sum of described the first air blowing section, the second air blowing section, the 3rd air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 4th air blowing section, the 5th air blowing section, the 6th air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 7th air blowing section, the 8th air blowing section, the 9th air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the first air blowing section, the 4th air blowing section, the 7th air blowing section and the target surface of magnetron sputtering target is complementary.
5. adjustable type gas distribution system according to claim 2, it is characterized in that, described gas distribution pipe has four, be respectively the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, the air blowing section that length with the target surface of magnetron sputtering target is complementary all is set on described the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, this section of blowing is divided into four sections from top to bottom, is respectively first paragraph, second segment, the 3rd section, the 4th section;
The 3rd section of described the first gas distribution pipe arranges air blowing section, the second segment of described the second gas distribution pipe arranges air blowing section, the first paragraph of described the 3rd gas distribution pipe arranges air blowing section, the 4th section of described the 4th gas distribution pipe arranges air blowing section, and the length of the length sum of four described air blowing sections and the target surface of magnetron sputtering target is complementary.
6. adjustable type gas distribution system according to claim 2, it is characterized in that, described gas distribution pipe has four, be respectively the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, the air blowing section that length with the target surface of magnetron sputtering target is complementary all is set on described the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, this section of blowing is divided into four sections from top to bottom, is respectively first paragraph, second segment, the 3rd section, the 4th section;
The first paragraph of described the first gas distribution pipe, second segment, the 3rd section, the 4th section arrange respectively the second air blowing section, the 3rd air blowing section, the first air blowing section and the 4th air blowing section; The first paragraph of described the second gas distribution pipe, second segment, the 3rd section, the 4th section arrange respectively the 6th air blowing section, the 5th air blowing section, the 7th air blowing section and the 8th air blowing section; The first paragraph of described the 3rd gas distribution pipe, second segment, the 3rd section, the 4th section arrange respectively the 9th air blowing section, the tenth air blowing section, the 11 air blowing section and the 12 air blowing section; The first paragraph of described the 4th gas distribution pipe, second segment, the 3rd section, the 4th section arrange respectively the 14 air blowing section, the 15 air blowing section, the 16 air blowing section and the 13 air blowing section;
The stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of described the second air blowing section, described the 3rd air blowing section, described the 4th air blowing section, described the 6th air blowing section, described the 7th air blowing section, described the 8th air blowing section, described the tenth air blowing section, the stomatal frequency of described the 11 air blowing section, the stomatal frequency of described the 12 air blowing section, the stomatal frequency of described the 14 air blowing section, the stomatal frequency of described the 15 air blowing section, described the 16 air blowing section is all identical, and is the first density;
The stomatal frequency of the stomatal frequency of the stomatal frequency of described the first air blowing section, described the 5th air blowing section, described the 9th air blowing section is all identical with the stomatal frequency of the 13 air blowing section, and is the second density; The second density is greater than the first density;
The length of the length sum of described the first air blowing section, the second air blowing section, the 3rd air blowing section, the 4th air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 5th air blowing section, the 6th air blowing section, the 7th air blowing section, the 8th air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 9th air blowing section, the tenth air blowing section, the 11 air blowing section, the 12 air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 13 air blowing section, the 14 air blowing section, the 15 air blowing section, the 16 air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the first air blowing section, the 5th air blowing section, the 9th air blowing section, the 13 air blowing section and the target surface of magnetron sputtering target is complementary.
7. according to the arbitrary described adjustable type gas distribution system of claim 2～6, it is characterized in that, described pore is circular port, square opening or profiled holes.
8. a magnetic control sputtering film plating device, comprise adjustable type gas distribution system as described as claim 1～7 any one, it is characterized in that, also comprise magnetron sputtering target, described magnetron sputtering target one side arranges target surface, at least one side of described target surface arranges described gas distribution system, and the gas flow of described gas distribution system is parallel with described target surface.
9. magnetic control sputtering film plating device according to claim 8, is characterized in that, described target surface both sides all arrange described gas distribution system.
10. magnetic control sputtering film plating device according to claim 8 or claim 9, is characterized in that, described gas distribution system comprises at least two gas distribution pipes that be arranged in parallel, on every described gas distribution pipe, under meter all is set, and on adjacent two described gas distribution pipes, stagger arrangement arranges air blowing section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220680331 CN202936476U (en) | 2012-12-10 | 2012-12-10 | Adjustable air distribution system and magnetron sputtering coating device comprising same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220680331 CN202936476U (en) | 2012-12-10 | 2012-12-10 | Adjustable air distribution system and magnetron sputtering coating device comprising same |
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| CN202936476U true CN202936476U (en) | 2013-05-15 |
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| CN 201220680331 Expired - Lifetime CN202936476U (en) | 2012-12-10 | 2012-12-10 | Adjustable air distribution system and magnetron sputtering coating device comprising same |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103014642A (en) * | 2012-12-10 | 2013-04-03 | 广东志成冠军集团有限公司 | Adjustable gas distribution system and magnetron sputtering coating device comprising same |
| CN103757593A (en) * | 2014-01-06 | 2014-04-30 | 天津南玻节能玻璃有限公司 | Device for improving uniformity of magnetron sputtering gas field and operation method thereof |
| CN106893988A (en) * | 2015-12-18 | 2017-06-27 | 北京有色金属研究总院 | A kind of gas-distributing system for vacuum coating |
| CN113078081A (en) * | 2021-04-21 | 2021-07-06 | 长江存储科技有限责任公司 | Furnace tube machine platform |
-
2012
- 2012-12-10 CN CN 201220680331 patent/CN202936476U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103014642A (en) * | 2012-12-10 | 2013-04-03 | 广东志成冠军集团有限公司 | Adjustable gas distribution system and magnetron sputtering coating device comprising same |
| CN103014642B (en) * | 2012-12-10 | 2015-04-01 | 广东志成冠军集团有限公司 | Adjustable gas distribution system and magnetron sputtering coating device comprising same |
| CN103757593A (en) * | 2014-01-06 | 2014-04-30 | 天津南玻节能玻璃有限公司 | Device for improving uniformity of magnetron sputtering gas field and operation method thereof |
| CN106893988A (en) * | 2015-12-18 | 2017-06-27 | 北京有色金属研究总院 | A kind of gas-distributing system for vacuum coating |
| CN113078081A (en) * | 2021-04-21 | 2021-07-06 | 长江存储科技有限责任公司 | Furnace tube machine platform |
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