CN202936476U - Adjustable gas distribution system and magnetron sputtering coating device including it - Google Patents

Adjustable gas distribution system and magnetron sputtering coating device including it Download PDF

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Publication number
CN202936476U
CN202936476U CN 201220680331 CN201220680331U CN202936476U CN 202936476 U CN202936476 U CN 202936476U CN 201220680331 CN201220680331 CN 201220680331 CN 201220680331 U CN201220680331 U CN 201220680331U CN 202936476 U CN202936476 U CN 202936476U
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blowing part
section
distribution pipe
air distribution
air
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CN 201220680331
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Chinese (zh)
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陈宇
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Guangdong Zhicheng Champion Group Co Ltd
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Guangdong Zhicheng Champion Group Co Ltd
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Abstract

The utility model discloses a regulation formula gas distribution system and contain its magnetron sputtering coating device, including two piece at least parallel arrangement's gas distribution pipe, all set up the flowmeter on the every gas distribution pipe, the staggered arrangement sets up the portion of blowing on two adjacent gas distribution pipes, and the portion of blowing comprises a plurality of specifications the same align to grid's gas pocket, and every gas pocket is radially seted up along gas distribution pipe, and a plurality of gas pockets are arranged along its axial in proper order at gas distribution pipe. The gas distribution system is provided with at least two gas distribution pipes, and the blowing parts are staggered on two adjacent gas distribution pipes, so that gas blown out by the gas distribution system can uniformly reach a target surface, and the uniformity of a film layer is ensured; the gas distribution pipes are provided with the flow meters, so that the flow of gas can be adjusted in real time, namely, the flow of the gas can be accurately adjusted according to the difference of the distance between the target surface and the surface of the object to be coated and the coating thickness, the flow of the gas blown out of each gas distribution pipe can be equal, and the purposes of real-time control and accurate coating are achieved.

Description

Adjustable type gas distribution system and the magnetic control sputtering film plating device that comprises it
Technical field
The utility model relates to the magnetron sputtering technology field, relates in particular to a kind of adjustable type gas distribution system, and the magnetic control sputtering film plating device that comprises this adjustable type gas distribution system.
Background technology
Magnetron sputtering technology is the coating technique method of current widespread use, is widely used in the industrial fields such as optics, microelectronics, wear-resisting, anti-corrosion, decoration, in order to reliable and stable thin film coating to be provided.Use colored plated film as decorated, mobile phone shell plated film, building glass low-e plated film, ITO transparent conducting glass plated film etc.
The homogeneity of magnetron sputtering plating is extremely important, and especially for optics, microelectronic product plated film, its homogeneity has material impact to quality and the yield rate of product.Affect the inhomogeneity factor of magnetron sputtering plating a lot, comprise warm field uniformity, the homogeneity in plasma uniformity, process gas gas distribution homogeneity, magnetic field etc.For gas distribution system, traditional is the mode that adopts single inlet pipe, adopt this kind of mode gas distribution easily to occur that gas distribution is even not, because planar target is mainly rectangle, long-width ratio is very large, therefore mainly there is vertical gas distribution problem of non-uniform in it, i.e. target surface gas distribution skewness from top to bottom, and gas distribution from left to right is substantially even.In order to address the above problem, there is the technician to propose a kind of mixed air distribution pipe, for solving the inhomogeneous problem of single inlet pipe gas distribution, for example, Chinese patent literature CN 202322999U discloses a kind of " mixed air distribution pipe ", it comprises inlet pipe and pneumatic tube, described inlet pipe is connected with the inlet mouth of described pneumatic tube, described pneumatic tube is distributed with multilayer, its air outlet is connected with relief pipe, be evenly equipped with production well on described relief pipe, above-mentioned mixed air distribution pipe is by setting up relief pipe, gas is by the depressurization expanded in the relief pipe internal volume, thereby obtain the uniform flow of each aperture gas of flowing through, reach the uniform effect of gas distribution.But this mixed air distribution pipe has following defect: although 1, this gas distribution system can further optimize the homogeneity of gas distribution, but it lacks controllability, it is a kind of default device fixed, only has certain scope of application, for the Application Areas high to the film coherence request, when gas flow rate changes, stopping up appears in pore, when the situations such as gaseous species change and target-substrate distance are inhomogeneous occur, its effect can descend; 2, to gas distribution, inhomogeneity adjusting lacks quantizating index, mostly judgement by rule of thumb.
Again for example, Chinese patent literature CN 201313933Y discloses a kind of " dualistic gas-distribution pipe ", it comprises the inlet pipe of magnetic control sputtering cathode, the valve of control inlet pipe flow, and the terminal portions of the inlet pipe of described magnetic control sputtering cathode and middle portion adopt independently inlet pipe difference air feed separately.By building a kind of dualistic gas-distribution pipe, make the air inlet more equably of magnetic control sputtering cathode terminal portions and middle portion, thereby make the reactive sputtering plated film more even.Although this dualistic gas-distribution pipe has controllability, but it does not have the function of the cloth tolerance of measuring different zones, can not realize quantitative measurment, therefore when being coated with different thicknesses of layers, can only rule of thumb regulate and judge, thus can not be applied in accurate plated film, and its gas distribution mode complex structure, become the product cost higher, operation and maintenance is also very difficult.
The utility model content
A purpose of the present utility model, be to provide a kind of adjustable type gas distribution system, make gas distribution more even, simultaneously the flow of adjustments of gas according to actual needs also, and the cloth tolerance of different zones is carried out to accurate quantitative measurment, reach the purpose of real-time control, accurate plated film.
Another purpose of the present utility model, be to provide a kind of adjustable type gas distribution system, and it is simple in structure, and operation and maintenance is convenient, becomes to produce with low cost.
Another purpose of the present utility model, be to provide a kind of magnetic control sputtering film plating device, by using adjustable gas distribution system, make gas distribution more even, the flow of adjustments of gas according to actual needs also simultaneously, and the cloth tolerance of different zones is carried out to accurate quantitative measurment, reach the purpose of real-time control, accurate plated film, and make simplifying the structure of whole device, operation and maintenance is convenient, reduces production costs.
For reaching above-mentioned purpose, the utility model by the following technical solutions:
A kind of adjustable type gas distribution system, comprise at least two gas distribution pipes that be arranged in parallel, on every described gas distribution pipe, under meter all is set, and on adjacent two described gas distribution pipes, stagger arrangement arranges air blowing section.
As a kind of preferred version of adjustable type gas distribution system, described air blowing section is that the evenly distributed pore identical by a plurality of specifications forms, and each pore is radially offered along gas distribution pipe, and a plurality of pores are axially arranged along it successively at gas distribution pipe.
Preferably, described gas distribution pipe has three, be respectively the first gas distribution pipe, the second gas distribution pipe and the 3rd gas distribution pipe, described the first gas distribution pipe, the air blowing section that length with the target surface of magnetron sputtering target is complementary all is set on the second gas distribution pipe and the 3rd gas distribution pipe, this section of blowing is divided into three sections from top to bottom, be respectively first paragraph, second segment, the 3rd section, the second segment of described the first gas distribution pipe arranges air blowing section, the first paragraph of described the second gas distribution pipe arranges air blowing section, the 3rd section of described the 3rd gas distribution pipe arranges air blowing section, the length of the length sum of three described air blowing sections and the target surface of magnetron sputtering target is complementary.
Be more preferably, described air blowing section comprises 23 evenly distributed pores.
Preferably, described gas distribution pipe has three, be respectively the first gas distribution pipe, the second gas distribution pipe and the 3rd gas distribution pipe, the air blowing section that length with the target surface of magnetron sputtering target is complementary all is set on described the first gas distribution pipe, the second gas distribution pipe and the 3rd gas distribution pipe, this section of blowing is divided into three sections from top to bottom, is respectively first paragraph, second segment, the 3rd section;
On the first paragraph of described the first gas distribution pipe, second segment and the 3rd section, the second air blowing section, the first air blowing section and the 3rd air blowing section are set respectively, on the first paragraph of described the second gas distribution pipe, second segment and the 3rd section, the 4th air blowing section, the 5th air blowing section and the 6th air blowing section are set respectively, on the first paragraph of described the 3rd gas distribution pipe, second segment and the 3rd section, the 8th air blowing section, the 9th air blowing section and the 7th air blowing section are set respectively;
The stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of described the second air blowing section, described the 3rd air blowing section, described the 5th air blowing section, described the 6th air blowing section, described the 8th air blowing section, described the 9th air blowing section is all identical, and is the first density;
The stomatal frequency of the stomatal frequency of the stomatal frequency of described the first air blowing section, described the 4th air blowing section, described the 7th air blowing section is all identical, and is the second density; The second density is greater than the first density;
The length of the length sum of described the first air blowing section, the second air blowing section, the 3rd air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 4th air blowing section, the 5th air blowing section, the 6th air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 7th air blowing section, the 8th air blowing section, the 9th air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the first air blowing section, the 4th air blowing section, the 7th air blowing section and the target surface of magnetron sputtering target is complementary.
Be more preferably, described the first air blowing section, the 4th air blowing section and the 7th air blowing section all have the first identical length, and distinguish evenly distributed 23 pores on the first identical length, so that above-mentioned three air blowing sections have the first identical stomatal frequency; Described the second air blowing section, the 3rd air blowing section, the 5th air blowing section, the 6th air blowing section, the 8th air blowing section, the 9th air blowing section all have the second identical length, and seven evenly distributed pores of difference on the second identical length, so that above-mentioned six air blowing sections have the second identical stomatal frequency; The first length is identical with the second length, makes the first stomatal frequency be greater than the second stomatal frequency.
Preferably, described gas distribution pipe has four, be respectively the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, the air blowing section that length with the target surface of magnetron sputtering target is complementary all is set on described the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, this section of blowing is divided into four sections from top to bottom, is respectively first paragraph, second segment, the 3rd section, the 4th section;
The 3rd section of described the first gas distribution pipe arranges air blowing section, the second segment of described the second gas distribution pipe arranges air blowing section, the first paragraph of described the 3rd gas distribution pipe arranges air blowing section, the 4th section of described the 4th gas distribution pipe arranges air blowing section, and the length of the length sum of four described air blowing sections and the target surface of magnetron sputtering target is complementary.
Be more preferably, described air blowing section comprises 16 evenly distributed pores.
Preferably, described gas distribution pipe has four, be respectively the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, the air blowing section that length with the target surface of magnetron sputtering target is complementary all is set on described the first gas distribution pipe, the second gas distribution pipe, the 3rd gas distribution pipe and the 4th gas distribution pipe, this section of blowing is divided into four sections from top to bottom, is respectively first paragraph, second segment, the 3rd section, the 4th section;
The first paragraph of described the first gas distribution pipe, second segment, the 3rd section, the 4th section arrange respectively the second air blowing section, the 3rd air blowing section, the first air blowing section and the 4th air blowing section; The first paragraph of described the second gas distribution pipe, second segment, the 3rd section, the 4th section arrange respectively the 6th air blowing section, the 5th air blowing section, the 7th air blowing section and the 8th air blowing section; The first paragraph of described the 3rd gas distribution pipe, second segment, the 3rd section, the 4th section arrange respectively the 9th air blowing section, the tenth air blowing section, the 11 air blowing section and the 12 air blowing section; The first paragraph of described the 4th gas distribution pipe, second segment, the 3rd section, the 4th section arrange respectively the 14 air blowing section, the 15 air blowing section, the 16 air blowing section and the 13 air blowing section;
The stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of the stomatal frequency of described the second air blowing section, described the 3rd air blowing section, described the 4th air blowing section, described the 6th air blowing section, described the 7th air blowing section, described the 8th air blowing section, described the tenth air blowing section, the stomatal frequency of described the 11 air blowing section, the stomatal frequency of described the 12 air blowing section, the stomatal frequency of described the 14 air blowing section, the stomatal frequency of described the 15 air blowing section, described the 16 air blowing section is all identical, and is the first density;
The stomatal frequency of the stomatal frequency of the stomatal frequency of described the first air blowing section, described the 5th air blowing section, described the 9th air blowing section is all identical with the stomatal frequency of the 13 air blowing section, and is the second density; The second density is greater than the first density;
The length of the length sum of described the first air blowing section, the second air blowing section, the 3rd air blowing section, the 4th air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 5th air blowing section, the 6th air blowing section, the 7th air blowing section, the 8th air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 9th air blowing section, the tenth air blowing section, the 11 air blowing section, the 12 air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the 13 air blowing section, the 14 air blowing section, the 15 air blowing section, the 16 air blowing section and the target surface of magnetron sputtering target is complementary; The length of the length sum of described the first air blowing section, the 5th air blowing section, the 9th air blowing section, the 13 air blowing section and the target surface of magnetron sputtering target is complementary.
Be more preferably, described the first air blowing section, the 5th air blowing section, the 9th air blowing section and the 13 air blowing section all have the 3rd identical length, evenly distributed 16 pores of difference on the 3rd identical length, so that four above-mentioned air blowing sections have the 3rd identical stomatal frequency; Described the second air blowing section, the 3rd air blowing section, the 4th air blowing section, the 6th air blowing section, the 7th air blowing section, the 8th air blowing section, the tenth air blowing section, the 11 air blowing section, the 12 air blowing section, the 14 air blowing section, the 15 air blowing section, the 16 air blowing section all have the 4th identical length, evenly distributed six pores of difference on the 4th identical length, so that 12 above-mentioned air blowing sections have the 4th identical stomatal frequency; The 3rd above-mentioned length is identical with the 4th length, so that the 3rd stomatal frequency is greater than the 4th stomatal frequency.
Preferably, described pore is circular port, square opening or profiled holes.
A kind of magnetic control sputtering film plating device, comprise adjustable type gas distribution system as described above, also comprise magnetron sputtering target, described magnetron sputtering target one side arranges target surface, at least one side of described target surface arranges described gas distribution system, and the gas flow of described gas distribution system is parallel with described target surface.
As a kind of preferred version of magnetic control sputtering film plating device, described target surface both sides all arrange described gas distribution system.
Preferably, described gas distribution system comprises at least two gas distribution pipes that be arranged in parallel, on every described gas distribution pipe, under meter all is set, and on adjacent two described gas distribution pipes, stagger arrangement arranges air blowing section.
The contrast prior art, the beneficial effects of the utility model are:
1, be set at least two gas distribution pipes by gas distribution system, and stagger arrangement arranges air blowing section on adjacent two gas distribution pipes, the gas that can make gas distribution system blow out can arrive target surface uniformly, guarantees the even film layer that magnetic control sputtering device is coated with, reliable and stable;
2, by under meter is set on gas distribution pipe, make the adjusting that the flow of gas can be real-time, according to the distance of target surface distance body surface to be coated, the difference of coating film thickness, the flow of accurate adjustments of gas, and can make the flow of the gas that blows out on each gas distribution pipe equate, reach real-time control, the accurate purpose of plated film;
3, by the adjustable type gas distribution system is applied in magnetic control sputtering film plating device, not only can adjust accurately in real time the flow of gas, make the even film layer be coated with, and whole device is simple in structure, operation and maintenance is convenient, and production cost is low.
The accompanying drawing explanation
The structural representation that Fig. 1 is the described adjustable type gas distribution system of embodiment mono-;
The structural representation that Fig. 2 is the first gas distribution pipe described in embodiment mono-;
The structural representation that Fig. 3 is the second gas distribution pipe described in embodiment mono-;
The structural representation that Fig. 4 is the 3rd gas distribution pipe described in embodiment mono-;
The structural representation that Fig. 5 is the described magnetic control sputtering film plating device that comprises the adjustable type gas distribution system of embodiment mono-;
The structural representation that Fig. 6 is the described adjustable type gas distribution system of embodiment bis-;
The structural representation that Fig. 7 is the first gas distribution pipe described in embodiment bis-;
The structural representation that Fig. 8 is the second gas distribution pipe described in embodiment bis-;
The structural representation that Fig. 9 is the 3rd gas distribution pipe described in embodiment bis-;
The structural representation that Figure 10 is the 4th gas distribution pipe described in embodiment bis-;
The structural representation that Figure 11 is the described magnetic control sputtering film plating device that comprises the adjustable type gas distribution system of embodiment bis-.
In Fig. 1～5:
1, gas distribution system;
11, the first gas distribution pipe; 111, the first air blowing section; 112, the second air blowing section; 113, the 3rd air blowing section;
12, the second gas distribution pipe; 121, the 4th air blowing section; 122, the 5th air blowing section; 123, the 6th air blowing section;
13, the 3rd gas distribution pipe; 131, the 7th air blowing section; 132, the 8th air blowing section; 133, the 9th air blowing section;
14, first flow meter; 15, the second under meter; 16, the 3rd under meter; 17, pore;
2, magnetron sputtering target; 3, target surface.
In Fig. 6～11:
4, gas distribution system;
41, the first gas distribution pipe; 411, the first air blowing section; 412, the second air blowing section; 413, the 3rd air blowing section; 414, the 4th air blowing section;
42, the second gas distribution pipe; 421, the 5th air blowing section; 422, the 6th air blowing section; 423, the 7th air blowing section; 424, the 8th air blowing section;
43, the 3rd gas distribution pipe; 431, the 9th air blowing section; 432, the tenth air blowing section; 433, the 11 air blowing section; 434, the 12 air blowing section;
44, the 4th gas distribution pipe; 441, the 13 air blowing section; 442, the 14 air blowing section; 443, the 15 air blowing section; 444, the 16 air blowing section;
45, first flow meter; 46, the second under meter; 47, the 3rd under meter; 48, the 4th under meter; 49, pore;
5, magnetron sputtering target; 6, target surface.
Embodiment
Embodiment mono-:
As shown in Figure 1, adjustable type gas distribution system described in this embodiment, comprise three gas distribution pipes that be arranged in parallel, be respectively the first gas distribution pipe 11, the second gas distribution pipe 12 and the 3rd gas distribution pipe 13, be provided for controlling the first flow meter 14 of its gas flow on the first gas distribution pipe 11, be provided for controlling the second under meter 15 of its gas flow on the second gas distribution pipe 12, be provided for controlling the 3rd under meter 16 of its gas flow on the 3rd gas distribution pipe 13.
Be provided with the air blowing section that the length with the target surface of magnetron sputtering target is complementary on the first gas distribution pipe 11, the second gas distribution pipe 12 and the 3rd gas distribution pipe 13, and the air blowing segment length of three gas distribution pipes is consistent.
As shown in Figure 2, the air blowing section of the first gas distribution pipe 11 is divided into three sections from top to bottom, be first paragraph, second segment, the 3rd section, on the first paragraph of the first gas distribution pipe 11, second segment and the 3rd section, the second air blowing section 112, the first air blowing section 111 and the 3rd air blowing section 113 are set respectively, air blowing section is all that the evenly distributed pore 17 identical by a plurality of specifications forms, and each pore 17 is radially offered along the first gas distribution pipe 11, a plurality of pores 17 are axial arranged along it on the first gas distribution pipe 11.
Pore quantity in the second air blowing section 112 equals the pore quantity in the 3rd air blowing section 113, and be seven pores 17, pore quantity in the first air blowing section 111 is greater than the pore quantity in the second air blowing section 112, and the length that is the target surface of the length sum of 23 pores, 17, the first air blowing sections 111, the second air blowing section 112, the 3rd air blowing section 113 and magnetron sputtering target is complementary.
As shown in Figure 3, the air blowing section of the second gas distribution pipe 12 is divided into three sections from top to bottom, be first paragraph, second segment, the 3rd section, on the first paragraph of the second gas distribution pipe 12, second segment and the 3rd section, the 4th air blowing section 121, the 5th air blowing section 122 and the 6th air blowing section 123 are set respectively, air blowing section is all that the evenly distributed pore 17 identical by a plurality of specifications forms, and each pore 17 is radially offered along the second gas distribution pipe 12, a plurality of pores 17 are axial arranged along it on the second gas distribution pipe 11.
Pore quantity in the 5th air blowing section 122 equals the pore quantity in the 6th air blowing section 123, and be seven pores 17, pore quantity in the 4th air blowing section 121 is greater than the pore quantity in the 5th air blowing section 122, and the length that is the target surface of the length sum of 23 pores, 17, the four air blowing sections 121, the 5th air blowing section 122, the 6th air blowing section 123 and magnetron sputtering target is complementary.
As shown in Figure 4, the air blowing section of the 3rd gas distribution pipe 13 is divided into three sections from top to bottom, be first paragraph, second segment, the 3rd section, on the first paragraph of the 3rd gas distribution pipe 13, second segment and the 3rd section, the 8th air blowing section 132, the 9th air blowing section 133 and the 7th air blowing section 131 are set respectively, air blowing section is all that the evenly distributed pore 17 identical by a plurality of specifications forms, and each pore 17 is radially offered along the 3rd gas distribution pipe 13, a plurality of pores 17 are axial arranged along it on the 3rd gas distribution pipe 13.
Pore quantity in the 8th air blowing section 132 equals the pore quantity in the 9th air blowing section 133, and be seven pores 17, pore quantity in the 7th air blowing section 131 is greater than the pore quantity in the 8th air blowing section 132, and the length that is the target surface of the length sum of 23 pores, 17, the seven air blowing sections 131, the 8th air blowing section 132, the 9th air blowing section 133 and magnetron sputtering target is complementary.
And the length of the length sum of the first air blowing section 111, the 4th air blowing section 121, the 7th air blowing section 131 and the target surface of magnetron sputtering target is complementary, and makes whole uniform air flow energy be covered with the target surface of magnetron sputtering target.
In this embodiment, pore 17 is circular port.
As shown in Figure 5, the magnetic control sputtering film plating device described in this embodiment, comprise magnetron sputtering target 2, magnetron sputtering target 2 front sides arrange target surface 3, target surface 3 is rectangle, and in a side of target surface 3, above-mentioned adjustable type gas distribution system 1 is set, and the flow direction of this gas distribution system 1 gas is parallel with target surface.
Gas distribution system 1 comprises the first gas distribution pipe 11, the second gas distribution pipe 12 and the 3rd gas distribution pipe 13 that is set in parallel in target surface 3 one sides, on the first gas distribution pipe 11, first flow meter 14 is set, the second under meter 15 is set on the second gas distribution pipe 12, the 3rd under meter 16 is set on the 3rd gas distribution pipe 13.
Principle of work is as follows:
Gas is by pipeline shunt to the first gas distribution pipe 11, in the second gas distribution pipe 12 and the 3rd gas distribution pipe 13, and then the air blowing section arranged from gas distribution pipe blows out, regulate first flow meter 14, the second under meter 15, the 3rd under meter 16 makes the first air blowing section 111, the 4th air blowing section 121, the gas uniform that the 7th air blowing section 131 blows out, because the first air blowing section 111, the 4th air blowing section 121, the 7th air blowing section 131 is that intensive pore 17 forms, therefore as long as guarantee that the steady air current of these three air blowing sections is consistent, can make the gas uniform on target surface 3 longitudinal directions, and then guarantee the even film layer be coated with, when target surface 3 is adjusted with the distance of the product of made membrane to be plated, only need to adjust under meter, just can reach the purpose of accurate plated film.
Embodiment bis-:
As shown in Figure 6, adjustable type gas distribution system described in this embodiment, comprise four gas distribution pipes that be arranged in parallel, be respectively the first gas distribution pipe 41, the second gas distribution pipe 42, the 3rd gas distribution pipe 43 and the 4th gas distribution pipe 44, be provided for controlling the first flow meter 45 of its gas flow on the first gas distribution pipe 41, be provided for controlling the second under meter 46 of its gas flow on the second gas distribution pipe 42, be provided for controlling the 3rd under meter 47 of its gas flow on the 3rd gas distribution pipe 43, be provided for controlling the 4th under meter 48 of its gas flow on the 4th gas distribution pipe 44.
Be provided with the air blowing section that the length with the target surface of magnetron sputtering target is complementary on the first gas distribution pipe 41, the second gas distribution pipe 42, the 3rd gas distribution pipe 43 and the 4th gas distribution pipe 44, and the air blowing segment length of four gas distribution pipes is consistent.
As shown in Figure 7, the air blowing section of the first gas distribution pipe 41 is divided into four sections from top to bottom, be first paragraph, second segment, the 3rd section, the 4th section, on the first paragraph of the first gas distribution pipe 41, second segment, the 3rd section and the 4th section, the second air blowing section 412, the 3rd air blowing section 413, the first air blowing section 411 and the 4th air blowing section 414 are set respectively, air blowing section is all that the evenly distributed pore 49 identical by a plurality of specifications forms, and each pore 49 is along the radially setting of the first gas distribution pipe 41, and a plurality of pores 49 are axial arranged along it on the first gas distribution pipe 41.
Pore quantity in the second air blowing section 412, the 3rd air blowing section 413 and the 4th air blowing section 414 is six, pore quantity in the first air blowing section 411 is greater than the pore quantity in the second air blowing section 412, and be 16, the length of the length sum of the first air blowing section 411, the second air blowing section 412, the 3rd air blowing section 413, the 4th air blowing section 414 and the target surface of magnetron sputtering target is complementary.
As shown in Figure 8, the air blowing section of the second gas distribution pipe 42 is divided into four sections from top to bottom, be first paragraph, second segment, the 3rd section, the 4th section, on the first paragraph of the second gas distribution pipe 42, second segment, the 3rd section and the 4th section, the 6th air blowing section 422, the 5th air blowing section 421, the 7th air blowing section 423 and the 8th air blowing section 424 are set respectively, air blowing section is all that the evenly distributed pore 49 identical by a plurality of specifications forms, and each pore 49 is along the radially setting of the second gas distribution pipe 42, and a plurality of pores 49 are axial arranged along it on the second gas distribution pipe 42.
Pore quantity in the 6th air blowing section 422, the 7th air blowing section 423 and the 8th air blowing section 424 is six, pore quantity in the 5th air blowing section 421 is greater than the pore quantity in the 6th air blowing section 422, and be 16, the length of the length sum of the 5th air blowing section 421, the 6th air blowing section 422, the 7th air blowing section 423, the 8th air blowing section 424 and the target surface of magnetron sputtering target is complementary.
As shown in Figure 9, the air blowing section of the 3rd gas distribution pipe 43 is divided into four sections from top to bottom, be first paragraph, second segment, the 3rd section, the 4th section, on the first paragraph of the 3rd gas distribution pipe 43, second segment, the 3rd section and the 4th section, the 9th air blowing section 431, the tenth the 432, the 11 air blowing section 433 and the 12 air blowing section 434 of air blowing section are set respectively, air blowing section is all that the evenly distributed pore 49 identical by a plurality of specifications forms, and each pore 49 is along the radially setting of the 3rd gas distribution pipe 43, a plurality of pores 49 on the 3rd gas distribution pipe 43 along its axial setting.
Pore quantity in the tenth the 432, the 11 air blowing section 433 of air blowing section and the 12 air blowing section 434 is six, pore quantity in the 9th air blowing section 431 is greater than the pore quantity in the tenth air blowing section 432, and be 16, the length of the length sum of the 9th air blowing section 431, the tenth the 432, the 11 air blowing section 433 of air blowing section and the 12 air blowing section 434 and the target surface of magnetron sputtering target is complementary.
As shown in figure 10, the air blowing section of the 4th gas distribution pipe 44 is divided into four sections from top to bottom, be first paragraph, second segment, the 3rd section, the 4th section, on the first paragraph of the 4th gas distribution pipe 44, second segment, the 3rd section and the 4th section, the 14 the 442, the 15 the 443, the 16 air blowing section 444 and the 13 air blowing section 441 of air blowing section of air blowing section is set respectively, air blowing section is all that the evenly distributed pore 49 identical by a plurality of specifications forms, and each pore 49 is along the radially setting of the 4th gas distribution pipe 44, a plurality of pores 49 on the 4th gas distribution pipe 44 along its axial setting.
Pore quantity in the 14 the 442, the 15 the 443, the 16 air blowing section 444 of air blowing section of air blowing section is six, pore quantity in the 13 air blowing section 441 is greater than the pore quantity in the 14 air blowing section 442, and be 16, the length of the length sum of the 13 the 441, the 14 the 442, the 15 the 443, the 16 air blowing section 444 of air blowing section of air blowing section of air blowing section and the target surface of magnetron sputtering target is complementary.
And the length of the length sum of the first air blowing section 411, the 5th air blowing section 421, the 9th the 431, the 13 air blowing section 441 of air blowing section and the target surface of magnetron sputtering target is complementary, and makes whole uniform air flow energy be covered with the target surface of magnetron sputtering target.
In this embodiment, pore 17 is circular port.
As shown in figure 11, the magnetic control sputtering film plating device described in this embodiment, comprise magnetron sputtering target 5, magnetron sputtering target 5 front sides arrange target surface 6, target surface 6 is rectangle, and in the zygomorphy of target surface 6, adjustable type gas distribution system 4 is set, and the flow direction of these two gas distribution system 4 gases is parallel with target surface 6.
Gas distribution system 4 comprises the first gas distribution pipe 41, the second gas distribution pipe 42, the 3rd gas distribution pipe 43 and the 4th gas distribution pipe 44, be provided for controlling the first flow meter 45 of its gas flow on the first gas distribution pipe 41, be provided for controlling the second under meter 46 of its gas flow on the second gas distribution pipe 42, be provided for controlling the 3rd under meter 47 of its gas flow on the 3rd gas distribution pipe 43, be provided for controlling the 4th under meter 48 of its gas flow on the 4th gas distribution pipe 44.
Principle of work is as follows:
Gas is by pipeline shunt to the first gas distribution pipe 41, the second gas distribution pipe 42, in the 3rd gas distribution pipe 43 and the 4th gas distribution pipe 44, and then the air blowing section arranged from gas distribution pipe blows out, regulate first flow meter 45, the second under meter 46, the 3rd under meter 47, the 4th under meter 48 makes the first air blowing section 411, the 5th air blowing section 421, the gas uniform that the 9th air blowing section 431 and the 13 air blowing section 441 blow out, because the first air blowing section 411, the 5th air blowing section 421, the 9th air blowing section 431 and the 13 air blowing section 441 are that intensive pore 17 forms, therefore as long as guarantee that the steady air current of these four air blowing sections is consistent, can make the gas uniform on target surface 6 longitudinal directions, and then guarantee the even film layer be coated with, when target surface 6 is adjusted with the distance of the product of made membrane to be plated, only need to adjust under meter, just can reach the purpose of accurate plated film.
The quantity of gas distribution pipe is not limited to described three and four of above-described embodiment one and embodiment bis-, and the section of simultaneously blowing also is not limited to described three sections and four sections of above-described embodiment one and embodiment bis-.
Know-why of the present utility model has below been described in conjunction with specific embodiments.These are described is in order to explain principle of the present utility model, and can not be interpreted as by any way the restriction to the utility model protection domain.Explanation based on herein, those skilled in the art does not need to pay performing creative labour can associate other embodiment of the present utility model, within these modes all will fall into protection domain of the present utility model.

Claims (10)

1.一种调节式布气系统，其特征在于，包括至少两根平行设置的布气管，每根所述布气管上均设置流量计，相邻两根所述布气管上错列设置吹气部。1. An adjustable air distribution system, characterized in that it includes at least two air distribution pipes arranged in parallel, a flow meter is arranged on each of the air distribution pipes, and air blowing is arranged in a staggered arrangement on two adjacent air distribution pipes department. 2.根据权利要求1所述的调节式布气系统，其特征在于，所述吹气部是由多个规格相同的均匀排列的气孔构成，每个气孔沿布气管的径向开设，多个气孔在布气管沿其轴向依次布置。2. The adjustable air distribution system according to claim 1, characterized in that the air blowing part is composed of a plurality of uniformly arranged air holes of the same specification, each air hole is opened along the radial direction of the air distribution pipe, and a plurality of The air holes are arranged in sequence along the axial direction of the air distribution pipe. 3.根据权利要求2所述的调节式布气系统，其特征在于，所述布气管有三根，分别为第一布气管、第二布气管和第三布气管，所述第一布气管、第二布气管和第三布气管上均设置与磁控溅射靶的靶面的长度相匹配的吹气段，此吹气段从上至下均分为三段，分别为第一段、第二段、第三段，所述第一布气管的第二段设置吹气部，所述第二布气管的第一段设置吹气部，所述第三布气管的第三段设置吹气部，三个所述吹气部的长度之和与磁控溅射靶的靶面的长度相匹配。3. The adjustable air distribution system according to claim 2, characterized in that there are three air distribution pipes, which are respectively the first air distribution pipe, the second air distribution pipe and the third air distribution pipe, the first air distribution pipe, Both the second air distribution pipe and the third air distribution pipe are provided with an air blowing section matching the length of the target surface of the magnetron sputtering target. This air blowing section is divided into three sections from top to bottom, namely the first section, In the second section and the third section, the second section of the first air distribution pipe is provided with an air blowing part, the first section of the second air distribution pipe is provided with an air blowing part, and the third section of the third air distribution pipe is provided with a blowing part. The gas part, the sum of the lengths of the three gas blowing parts matches the length of the target surface of the magnetron sputtering target. 4.根据权利要求2所述的调节式布气系统，其特征在于，所述布气管有三根，分别为第一布气管、第二布气管和第三布气管，所述第一布气管、第二布气管和第三布气管上均设置与磁控溅射靶的靶面的长度相匹配的吹气段，此吹气段从上至下均分为三段，分别为第一段、第二段、第三段；4. The adjustable air distribution system according to claim 2, characterized in that there are three air distribution pipes, namely the first air distribution pipe, the second air distribution pipe and the third air distribution pipe, the first air distribution pipe, Both the second air distribution pipe and the third air distribution pipe are provided with an air blowing section matching the length of the target surface of the magnetron sputtering target. This air blowing section is divided into three sections from top to bottom, namely the first section, second paragraph, third paragraph; 所述第一布气管的第一段、第二段和第三段上分别设置第二吹气部、第一吹气部和第三吹气部，所述第二布气管的第一段、第二段和第三段上分别设置第四吹气部、第五吹气部和第六吹气部，所述第三布气管的第一段、第二段和第三段上分别设置第八吹气部、第九吹气部和第七吹气部；The first section, the second section and the third section of the first air distribution pipe are respectively provided with a second air blowing part, a first air blowing part and a third air blowing part, the first section of the second air distribution pipe, The fourth blowing part, the fifth blowing part and the sixth blowing part are respectively arranged on the second section and the third section, and the first section, the second section and the third section of the third air distribution pipe are respectively provided with the first Eight blows, ninth blows and seventh blows; 所述第二吹气部的气孔密度、所述第三吹气部的气孔密度、所述第五吹气部的气孔密度、所述第六吹气部的气孔密度、所述第八吹气部的气孔密度、所述第九吹气部的气孔密度均相同，且均为第一密度；The pore density of the second blowing part, the pore density of the third blowing part, the pore density of the fifth blowing part, the pore density of the sixth blowing part, the eighth blowing part The pore density of the part and the pore density of the ninth blowing part are the same, and both are the first density; 所述第一吹气部的气孔密度、所述第四吹气部的气孔密度、所述第七吹气部的气孔密度均相同，且均为第二密度；第二密度大于第一密度；The air hole density of the first air blowing part, the air hole density of the fourth air blowing part, and the air hole density of the seventh air blowing part are all the same, and all of them are the second density; the second density is greater than the first density; 所述第一吹气部、第二吹气部、第三吹气部的长度之和与磁控溅射靶的靶面的长度相匹配；所述第四吹气部、第五吹气部、第六吹气部的长度之和与磁控溅射靶的靶面的长度相匹配；所述第七吹气部、第八吹气部、第九吹气部的长度之和与磁控溅射靶的靶面的长度相匹配；所述第一吹气部、第四吹气部、第七吹气部的长度之和与磁控溅射靶的靶面的长度相匹配。The sum of the lengths of the first blowing part, the second blowing part and the third blowing part matches the length of the target surface of the magnetron sputtering target; the fourth blowing part and the fifth blowing part , The sum of the lengths of the sixth blowing part matches the length of the target surface of the magnetron sputtering target; the sum of the lengths of the seventh blowing part, the eighth blowing part, and the ninth blowing part matches the The length of the target surface of the sputtering target matches; the sum of the lengths of the first blowing part, the fourth blowing part and the seventh blowing part matches the length of the target surface of the magnetron sputtering target. 5.根据权利要求2所述的调节式布气系统，其特征在于，所述布气管有四根，分别为第一布气管、第二布气管、第三布气管和第四布气管，所述第一布气管、第二布气管、第三布气管和第四布气管上均设置与磁控溅射靶的靶面的长度相匹配的吹气段，此吹气段从上至下均分为四段，分别为第一段、第二段、第三段、第四段；5. The adjustable air distribution system according to claim 2, characterized in that there are four air distribution pipes, namely the first air distribution pipe, the second air distribution pipe, the third air distribution pipe and the fourth air distribution pipe. The first air distribution pipe, the second air distribution pipe, the third air distribution pipe and the fourth air distribution pipe are provided with an air blowing section matching the length of the target surface of the magnetron sputtering target, and the air blowing section is uniform from top to bottom. Divided into four paragraphs, namely, the first paragraph, the second paragraph, the third paragraph, and the fourth paragraph; 所述第一布气管的第三段设置吹气部，所述第二布气管的第二段设置吹气部，所述第三布气管的第一段设置吹气部，所述第四布气管的第四段设置吹气部，四个所述吹气部的长度之和与磁控溅射靶的靶面的长度相匹配。The third section of the first air distribution pipe is provided with an air blowing part, the second section of the second air distribution pipe is provided with an air blowing part, the first section of the third air distribution pipe is provided with an air blowing part, and the fourth air distribution pipe is provided with an air blowing part. The fourth section of the gas pipe is provided with blowing parts, and the sum of the lengths of the four blowing parts matches the length of the target surface of the magnetron sputtering target. 6.根据权利要求2所述的调节式布气系统，其特征在于，所述布气管有四根，分别为第一布气管、第二布气管、第三布气管和第四布气管，所述第一布气管、第二布气管、第三布气管和第四布气管上均设置与磁控溅射靶的靶面的长度相匹配的吹气段，此吹气段从上至下均分为四段，分别为第一段、第二段、第三段、第四段；6. The adjustable air distribution system according to claim 2, characterized in that there are four air distribution pipes, namely the first air distribution pipe, the second air distribution pipe, the third air distribution pipe and the fourth air distribution pipe. The first air distribution pipe, the second air distribution pipe, the third air distribution pipe and the fourth air distribution pipe are provided with an air blowing section matching the length of the target surface of the magnetron sputtering target, and the air blowing section is uniform from top to bottom. Divided into four paragraphs, namely, the first paragraph, the second paragraph, the third paragraph, and the fourth paragraph; 所述第一布气管的第一段、第二段、第三段、第四段分别设置第二吹气部、第三吹气部、第一吹气部和第四吹气部；所述第二布气管的第一段、第二段、第三段、第四段分别设置第六吹气部、第五吹气部、第七吹气部和第八吹气部；所述第三布气管的第一段、第二段、第三段、第四段分别设置第九吹气部、第十吹气部、第十一吹气部和第十二吹气部；所述第四布气管的第一段、第二段、第三段、第四段分别设置第十四吹气部、第十五吹气部、第十六吹气部和第十三吹气部；The first section, the second section, the third section, and the fourth section of the first air distribution pipe are respectively provided with a second blowing part, a third blowing part, a first blowing part and a fourth blowing part; The first section, the second section, the third section, and the fourth section of the second air distribution pipe are respectively provided with the sixth blowing part, the fifth blowing part, the seventh blowing part and the eighth blowing part; The first section, the second section, the third section, and the fourth section of the air distribution pipe are respectively provided with the ninth blowing part, the tenth blowing part, the eleventh blowing part and the twelfth blowing part; The first section, the second section, the third section, and the fourth section of the air distribution pipe are respectively provided with the fourteenth blowing part, the fifteenth blowing part, the sixteenth blowing part and the thirteenth blowing part; 所述第二吹气部的气孔密度、所述第三吹气部的气孔密度、所述第四吹气部的气孔密度、所述第六吹气部的气孔密度、所述第七吹气部的气孔密度、所述第八吹气部的气孔密度、所述第十吹气部的气孔密度、所述第十一吹气部的气孔密度、所述第十二吹气部的气孔密度、所述第十四吹气部的气孔密度、所述第十五吹气部的气孔密度、所述第十六吹气部的气孔密度均相同，且均为第一密度；The pore density of the second blowing part, the pore density of the third blowing part, the pore density of the fourth blowing part, the pore density of the sixth blowing part, the seventh blowing part The pore density of the eighth blowing part, the pore density of the tenth blowing part, the pore density of the eleventh blowing part, the pore density of the twelfth blowing part , the pore density of the fourteenth blowing part, the pore density of the fifteenth blowing part, and the pore density of the sixteenth blowing part are all the same, and are all the first density; 所述第一吹气部的气孔密度、所述第五吹气部的气孔密度、所述第九吹气部的气孔密度和第十三吹气部的气孔密度均相同，且均为第二密度；第二密度大于第一密度；The pore density of the first blowing part, the pore density of the fifth blowing part, the pore density of the ninth blowing part and the thirteenth blowing part are all the same, and they are all the second density; the second density is greater than the first density; 所述第一吹气部、第二吹气部、第三吹气部、第四吹气部的长度之和与磁控溅射靶的靶面的长度相匹配；所述第五吹气部、第六吹气部、第七吹气部、第八吹气部的长度之和与磁控溅射靶的靶面的长度相匹配；所述第九吹气部、第十吹气部、第十一吹气部、第十二吹气部的长度之和与磁控溅射靶的靶面的长度相匹配；所述第十三吹气部、第十四吹气部、第十五吹气部、第十六吹气部的长度之和与磁控溅射靶的靶面的长度相匹配；所述第一吹气部、第五吹气部、第九吹气部、第十三吹气部的长度之和与磁控溅射靶的靶面的长度相匹配。The sum of the lengths of the first blowing part, the second blowing part, the third blowing part and the fourth blowing part matches the length of the target surface of the magnetron sputtering target; the fifth blowing part , The sum of the lengths of the sixth blowing part, the seventh blowing part and the eighth blowing part matches the length of the target surface of the magnetron sputtering target; the ninth blowing part, the tenth blowing part, The sum of the lengths of the eleventh blowing part and the twelfth blowing part matches the length of the target surface of the magnetron sputtering target; the thirteenth blowing part, the fourteenth blowing part, the fifteenth blowing part The sum of the lengths of the blowing part and the sixteenth blowing part matches the length of the target surface of the magnetron sputtering target; the first blowing part, the fifth blowing part, the ninth blowing part, the tenth blowing part The sum of the lengths of the three blowing parts matches the length of the target surface of the magnetron sputtering target. 7.根据权利要求2～6任一所述的调节式布气系统，其特征在于，所述气孔为圆形孔、方形孔或者异型孔。7. The adjustable air distribution system according to any one of claims 2-6, wherein the air holes are circular holes, square holes or special-shaped holes. 8.一种磁控溅射镀膜装置，包含如权利要求1～7任一项所述的调节式布气系统，其特征在于，还包括磁控溅射靶，所述磁控溅射靶一侧设置靶面，所述靶面至少一侧设置所述布气系统，所述布气系统的气体流向与所述靶面平行。8. A magnetron sputtering coating device, comprising the adjustable gas distribution system as claimed in any one of claims 1 to 7, characterized in that, it also includes a magnetron sputtering target, and the magnetron sputtering target is a A target surface is arranged on one side, the gas distribution system is arranged on at least one side of the target surface, and the gas flow direction of the gas distribution system is parallel to the target surface. 9.根据权利要求8所述的磁控溅射镀膜装置，其特征在于，所述靶面两侧均设置所述布气系统。9 . The magnetron sputtering coating device according to claim 8 , wherein the gas distribution system is arranged on both sides of the target surface. 10.根据权利要求8或9所述的磁控溅射镀膜装置，其特征在于，所述布气系统包括至少两根平行设置的布气管，每根所述布气管上均设置流量计，相邻两根所述布气管上错列设置吹气部。10. The magnetron sputtering coating device according to claim 8 or 9, wherein the gas distribution system comprises at least two gas distribution pipes arranged in parallel, each of which is provided with a flowmeter, corresponding to Air blowing parts are arranged in staggered rows adjacent to the two air distribution pipes.
CN 201220680331 2012-12-10 2012-12-10 Adjustable gas distribution system and magnetron sputtering coating device including it Expired - Lifetime CN202936476U (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103014642A (en) * 2012-12-10 2013-04-03 广东志成冠军集团有限公司 Adjustable gas distribution system and magnetron sputtering coating device comprising same
CN103757593A (en) * 2014-01-06 2014-04-30 天津南玻节能玻璃有限公司 Device for improving uniformity of magnetron sputtering gas field and operation method thereof
CN106893988A (en) * 2015-12-18 2017-06-27 北京有色金属研究总院 A kind of gas-distributing system for vacuum coating
CN113078081A (en) * 2021-04-21 2021-07-06 长江存储科技有限责任公司 Furnace tube machine platform

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103014642A (en) * 2012-12-10 2013-04-03 广东志成冠军集团有限公司 Adjustable gas distribution system and magnetron sputtering coating device comprising same
CN103014642B (en) * 2012-12-10 2015-04-01 广东志成冠军集团有限公司 Adjustable gas distribution system and magnetron sputtering coating device comprising same
CN103757593A (en) * 2014-01-06 2014-04-30 天津南玻节能玻璃有限公司 Device for improving uniformity of magnetron sputtering gas field and operation method thereof
CN106893988A (en) * 2015-12-18 2017-06-27 北京有色金属研究总院 A kind of gas-distributing system for vacuum coating
CN113078081A (en) * 2021-04-21 2021-07-06 长江存储科技有限责任公司 Furnace tube machine platform

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