CN217026076U - Intelligent flow dividing device and plasma processing equipment - Google Patents
Intelligent flow dividing device and plasma processing equipment Download PDFInfo
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- CN217026076U CN217026076U CN202123168123.0U CN202123168123U CN217026076U CN 217026076 U CN217026076 U CN 217026076U CN 202123168123 U CN202123168123 U CN 202123168123U CN 217026076 U CN217026076 U CN 217026076U
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Abstract
The utility model discloses an intelligent flow dividing device and plasma processing equipment with the same, relates to the field of equipment processing and manufacturing, and is mainly used for solving the problems that defects are generated on appearance, shape and quality of a product due to uneven gas discharge, unstable gas delivery and unstable gas flow control in the conventional plasma surface treatment process. Its main structure includes: the device comprises an upper splitter plate, a lower splitter plate and a spray header, wherein a partition plate for dividing a middle space into a plurality of independent areas is arranged between the upper splitter plate and the lower splitter plate; the upper splitter plate is provided with a drainage hole, and a primary flow control valve is arranged on the drainage hole; the lower splitter plate is provided with splitter holes, the spray header is arranged on the splitter holes, the air inlet end of the spray header is provided with a secondary flow control valve, and the air outlet end of the spray header is provided with a permeable net. According to the plasma processing equipment with the intelligent shunting device, provided by the utility model, the energy and density of plasma in the reaction cavity are ensured to be uniform, the appearance quality of a product after treatment is uniform and consistent, and the product quality is ensured.
Description
Technical Field
The utility model belongs to the field of equipment processing and manufacturing, and particularly relates to an intelligent shunt device and plasma processing equipment.
Background
Vacuum plasma generating devices have many advantages over atmospheric pressure plasma generating devices, such as: better product effect, small external interference, accurate analysis and experiment data and the like. The excitation frequencies of the vacuum plasma generating device are three types: 40KHz, 13.56MHz and 20 MHz.
In the current plasma generating equipment, in order to ensure that the plasma acts on the surface of the substrate to be reacted, a gas spray header device is arranged at the upper part of a reaction cavity of a plasma processing device, the reaction gas is excited by radio frequency to form plasma, and then the plasma acts on the surface of the substrate to be processed through an electrostatic chuck at the lower part of the reaction cavity.
However, due to the reasons of uneven gas discharge, unstable gas delivery, unstable gas flow control and the like, different energy and density distributions appear in the surface area of the substrate under the action of plasma, the surface deposited film presents different color apertures, and the difference between the central area and the edge area is obvious. This non-uniformity of processing results in different properties in different areas of the substrate, which can have a negative impact on the appearance, topography, and quality of the product.
In order to solve the problem, the existing process conditions propose to use a metal mesh with dense and uniform holes for shunting and controlling the uniformity of plasma ejection, but the process has a plurality of unmeasurable factors. The prior art proposes a flow divider which can divide the reaction gas in various ways, but cannot ensure the uniformity of the plasma energy distribution inside the whole chamber.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide an intelligent flow dividing device and plasma processing equipment with the same, and aims to solve the problems that defects are generated on the appearance, shape and quality of a product due to uneven gas discharge, unstable gas delivery and unstable gas flow control in the conventional plasma surface treatment process.
In order to realize the purpose of the utility model, the adopted technical scheme is as follows: the utility model provides an intelligence diverging device, is provided with a plurality of independent reposition of redundant personnel chambeies, and reposition of redundant personnel chamber inlet end sets up one-level flow control valve, and the end of giving vent to anger sets up the shower head. The plurality of independent flow distribution cavities adopt a multi-zone gas flow distribution control method to ensure the accurate control of the flow of each zone; the primary flow control valve is electrically connected with the PLC, and when the PLC receives a feedback signal, the primary flow control valve is controlled, so that the flow velocity of gas flowing into each shunting cavity and the density of the gas in the shunting cavities are adjusted, and the uniformity of the gas is ensured; the primary flow control valves arranged in the shunting cavities are linkage valves, and the control areas are subjected to unified linkage opening and closing control, so that the simplification of control lines is facilitated; the gas flows out through the spray header, and the gas is further uniformly dispersed.
Furthermore, the vertical flow distribution plate that sets up in shower head middle part, the hemisphere arch is established to the flow distribution plate both sides, and the shower head inlet end sets up the second grade flow control valve, is connected with the PLC controller electricity, and the end of giving vent to anger sets up and passes through the net. The arrangement of the shunt plate enables the plasma to complete secondary shunt; the hemispherical bulges arranged on the two sides of the flow distribution plate enable low-temperature plasma to be buffered to a certain extent when passing through the spray header, and the low-temperature plasma is dispersed in the spray header, so that the phenomenon that the plasma enters the reaction cavity at an excessively high flow speed and flows back to a certain extent when contacting the bottom of the experiment table or the reaction cavity to cause uneven distribution of the plasma in the reaction cavity is avoided; the second-stage flow control valve arranged on the spray header is electrically connected with the PLC, when the PLC receives a corresponding signal, the second-stage flow control valve is controlled to adjust the flow rate of gas entering the spray header, and the second-stage flow control valve and the first-stage flow control valve act together to ensure that the flow rates of gas finally entering each spray header are consistent; the breathable net further ensures that the gas is uniformly dispersed when flowing out.
Furthermore, the flow distribution cavity comprises an upper flow distribution plate, a lower flow distribution plate and a spray header, and a partition plate for dividing the middle space into a plurality of independent areas is arranged between the upper flow distribution plate and the lower flow distribution plate; the upper splitter plate is provided with a drainage hole, and a primary flow control valve is arranged on the drainage hole; the lower splitter plate is provided with splitter holes, the spray header is arranged on the splitter holes, the air inlet end of the spray header is provided with a secondary flow control valve, and the air outlet end of the spray header is provided with a permeable net. The primary flow control valves are arranged in different numbers according to the corresponding independent areas, and the primary flow valves corresponding to the independent areas are linked to ensure that the gas entering the areas is uniform and equal; the flow distribution holes on the lower flow distribution plate are uniformly distributed on the flow distribution plate, so that the uniformity of gas discharged from the gas outlet end is ensured.
Furthermore, the upper splitter plate and the lower splitter plate are in corresponding circles, and the partition plates are a plurality of circular partition plates concentric with the splitter plates. The scheme is preferably circular, but not limited to circular, square, triangular and the like, and the partition plates can be in rectangular array distribution, annular array distribution or uniform equal distribution and the like according to the shape of the plate surface; the space between the upper and lower splitter plates is divided into a plurality of concentric annular spaces by the splitter plate, the drainage holes and the splitter holes are uniformly distributed in each corresponding annular space, and a multi-circle gas split control method is adopted, so that the gas flow is controlled by circle layers, and the operation is more accurate and easy.
The utility model provides a plasma processing equipment which characterized in that, is including the mixing gas chamber, plasma processing apparatus and the reaction chamber that set gradually, and plasma processing apparatus passes through above-mentioned intelligent diverging device with the reaction chamber and is connected. The mixed gas cavity uniformly mixes the reaction gas, and the reaction gas is sent to a plasma generating device for percussion, the plasma generating device adopts a radio frequency plasma excitation principle, selects an excitation frequency of 13.56MHz, and excites to generate a large amount of ions, excited molecules, free radicals and other active particles, and the intelligent shunting device uniformly shunts the struck plasma and sends the plasma to the reaction cavity for processing a workpiece sample.
Furthermore, the mixed gas cavity is provided with three air inlets, and the air inlets are provided with an air inlet plate and a flow control valve, wherein the angles of the air inlet plate and the flow control valve can be adjusted. The requirements of different processing on gas types are met; the accurate flow control and uniform mixing are ensured when multi-path gas enters together.
Further, the mixed gas cavity is provided with a vacuum extraction device, and the vacuum extraction device is a NEG pump and a turbo-molecular pump. The NEG pump has wide application in maintaining vacuum, the turbo molecular pump can obtain high vacuum degree, and the NEG pump and the turbo molecular pump act simultaneously to pump vacuum environment and ensure high vacuum degree without changing pumping speed.
Furthermore, a low-power fan is arranged in the mixed gas cavity. Ensure the even mixing of the multi-path gas and ensure the surface requirement of the multi-path gas for the plasma action.
Further, a plasma electron density detection device is arranged in the reaction cavity. The plasma electron density detection device such as Langmuir probe detects and monitors the plasma electron density in the reaction chamber in real time.
Furthermore, a flow monitoring device is arranged at the position of the gas inlet in the reaction cavity. The flow of each inlet position is monitored in real time to ensure that the reaction gas introduced into each inlet is uniform and stable, and the gas in the reaction cavity is uniform.
Furthermore, the plasma electron density detection device and the flow monitoring device are electrically connected with the PLC. The flow monitoring device monitors the gas flow at each gas inlet of the reaction cavity, the plasma electron density detection device monitors the plasma electron density in the reaction cavity, monitoring data signals are fed back to the PLC, and the PLC controls the first-stage flow valve and the second-stage flow valve.
The beneficial effects of the utility model are:
the plasma is uniformly and stably conveyed, so that the energy and density of the plasma in the reaction cavity are uniform, the appearance quality of the product after treatment is uniform and consistent, and the product quality is ensured;
the gas mixing device is provided with the gas mixing cavity, and the gas mixing cavity is provided with three gas inlets, so that the requirements of different processing on gas types are met, and the gas mixing device is wide in application range;
and the utility model adopts the PLC controller for control, has high automation degree, avoids uncertainty of manual operation and ensures more stable product quality.
Drawings
FIG. 1: the utility model discloses a structural schematic diagram of an intelligent shunting device;
FIG. 2: a schematic diagram of a spray head structure;
FIG. 3: a three-dimensional schematic diagram of the upper and lower splitter plates and the partition plate;
FIG. 4: a lower manifold schematic;
FIG. 5: a schematic through-mesh view;
FIG. 6: the structure schematic diagram of the plasma processing equipment of the utility model;
FIG. 7 is a schematic view of: a flow chart of gas control inside a plasma processing apparatus.
Reference numbers and corresponding part names in the drawings:
the device comprises a gas mixing chamber, a gas inlet, a fan, a vacuum extraction device, a plasma processing device, an intelligent flow dividing device, a first-stage flow control valve, a second-stage flow control valve, a 3-3 spray head, a 3-4 transmission net, a lower flow dividing plate, a 3-6 upper flow dividing plate, a 3-7 partition plate, a reaction chamber, a flow monitoring device, a 4-1 flow monitoring device, a plasma electron density detection device, a 4-3 exhaust port and a PLC (programmable logic controller), wherein the gas mixing chamber comprises 1 part of a gas mixing chamber, 1-1 part of a gas inlet, 1-2 parts of a fan, 1-3 parts of a vacuum extraction device, and the PLC is 5 parts of the plasma processing device.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The first embodiment is as follows:
fig. 1 to 5 show an intelligent flow divider provided by the present invention, which includes an upper flow divider 3-6, a lower flow divider 3-5, a shower head 3-3, and a transparent net 3-4, wherein the upper flow divider 3-6 and the lower flow divider 3-5 are corresponding circles, and partition plates 3-7 are provided therebetween, and the partition plates 3-7 are circular partition plates concentric with the flow dividers to partition a space between the upper and lower flow dividers into a plurality of independent annular flow dividing chambers; the upper shunt 3-6 is provided with a drainage hole, a primary flow control valve 3-1 is arranged on the drainage hole, the primary flow control valve 3-1 corresponding to the shunt cavity is a linkage valve, the lower shunt plate 3-5 is provided with a shunt hole, a spray head 3-3 is arranged on the shunt hole, the air inlet end of the spray head is provided with a secondary flow control valve 3-2, and the air outlet end of the spray head is provided with a permeable net 3-4; a flow distribution plate is vertically arranged in the middle of the spray header 3-3, and hemispherical bulges are arranged on two sides of the flow distribution plate; the primary flow control valve 3-1 and the secondary flow control valve 3-2 are electrically connected with a PLC 5.
When the device is used, gas is uniformly conveyed to each annular area through the primary flow control valve 3-1 corresponding to each annular area, then the gas is introduced to the spray header 3-3 through the primary flow control valve 3-1 on the spray header 3-3, and the gas is subjected to secondary flow distribution through the arrangement of the flow distribution plate in the spray header 3-3; the hemispherical bulges arranged on the two sides of the splitter plate ensure that gas can obtain certain buffering when passing through the spray header, and the gas is dispersed in the spray header, so that the phenomenon that the flow velocity is too high when the gas is discharged out of the spray header 3-3 is avoided; the gas is discharged through the permeable net 3-4 and is again dispersed through the permeable net 3-4. The primary flow control valve 3-1 and the secondary flow control valve 3-2 are automatically adjusted by the PLC 5, and the flow velocity of the introduced gas can be controlled, so that the gas is uniformly introduced.
The second embodiment:
fig. 6 and 7 show that a plasma processing apparatus provided for the present invention includes a mixed gas chamber 1, a plasma processing device 2, and a reaction chamber 4, which are sequentially disposed, where the plasma processing device 2 and the reaction chamber 4 are connected by an intelligent flow divider 3 according to one embodiment. The gas inlet end of the intelligent flow dividing device 3 is connected with the gas outlet end of the plasma processing device 2, the gas outlet end of the intelligent flow dividing device 3 is connected with the gas inlet end of the reaction cavity 4, the mixed gas cavity 1 is provided with three gas inlets 1-1, and the gas inlets are provided with angle-adjustable gas inlet plates and flow control valves, so that the requirements of different processing on gas types are met, and the accurate control of flow and uniform mixing when multiple paths of gases are fed together are ensured; a vacuum pumping device 1-3 is also arranged, and the vacuum pumping device is an NEG pump and a turbo molecular pump, so that the vacuum degree and the pumping speed are ensured; a low-power fan 1-2 is arranged in the mixed gas cavity to ensure that multiple paths of gas are uniformly mixed. A plasma electron density detection device 4-2 is arranged in the reaction cavity 4, and the plasma electron density in the reaction cavity is detected and monitored in real time; the gas inlet position in the reaction cavity is provided with a flow monitoring device 4-1 which monitors the flow of each inlet position in real time so as to ensure that the reaction gas introduced from each inlet is uniform and stable, thereby ensuring that the gas in the reaction cavity is uniform. The primary flow valve 3-1, the secondary flow valve 3-2, the plasma electron density detection device 4-2 and the flow monitoring device 4-1 are connected with the PLC controller 5, data signals detected by the plasma electron density detection device 4-2 and the flow monitoring device 4-1 are fed back to the PLC controller 5, and the primary flow valve 3-1 and the secondary flow valve 3-2 are controlled to ensure that gas flow at each air inlet is stable and uniform.
When the device is used, the vacuum extraction device 1-3 is started firstly, a vacuum environment of the mixed gas cavity 1 is created, the three gas inlets 1-1 are opened, reaction gas is introduced, and the fan 1-2 stirs the reaction gas and mixes the reaction gas uniformly; and opening the throttle valve 6 after the reaction gases are uniformly mixed, introducing the mixed gases into the plasma processing device 2 for percussion, introducing the struck reaction gases into the reaction cavity 4 through the intelligent flow dividing device 3, and processing the workpiece sample. The plasma electron density detection device 4-2 and the flow monitoring device 4-1 arranged in the reaction cavity 4 monitor the plasma electron density and the flow velocity in the reaction cavity, data signals are fed back to the PLC controller 5, and the PLC controller 5 adjusts the primary flow valve 3-1 and the secondary flow valve 3-2 to ensure that the gas flow at each gas inlet is stable and uniform.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. An intelligent flow dividing device is characterized in that a plurality of independent flow dividing cavities are arranged, each flow dividing cavity is provided with an air inlet end and an air outlet end, the air inlet end is provided with a primary flow control valve (3-1), the primary flow control valve (3-1) arranged in each flow dividing cavity is a linkage valve, and the air outlet end is provided with a spray head (3-3); the primary flow control valve (3-1) is electrically connected with the PLC (5).
2. The intelligent flow divider of claim 1, wherein a flow divider is vertically arranged in the middle of the spray header (3-3), and hemispherical protrusions are arranged on two sides of the flow divider; the air inlet end of the spray header (3-3) is provided with a secondary flow control valve (3-2) which is electrically connected with the PLC (5), and the air outlet end of the spray header (3-3) is provided with a permeable net (3-4).
3. An intelligent flow distribution device according to claim 1 or 2, wherein the flow distribution cavity comprises an upper flow distribution plate (3-6) and a lower flow distribution plate (3-5), and a partition plate (3-7) for dividing the middle space into a plurality of independent areas is arranged between the upper flow distribution plate and the lower flow distribution plate; the upper flow distribution plate (3-6) is provided with a drainage hole, and the primary flow control valve (3-1) is arranged on the drainage hole; the lower splitter plate (3-5) is provided with splitter holes, and the spray headers (3-3) are arranged on the splitter holes.
4. An intelligent shunt device according to claim 3, wherein the upper shunt plate (3-6) and the lower shunt plate (3-5) are of corresponding circular shapes, and the partition plate (3-7) is a plurality of annular partition plates concentric with the shunt plate.
5. Plasma processing equipment, characterized in that, including the mixed gas chamber (1), plasma treatment device (2) and reaction chamber (4) that set gradually, plasma treatment device (2) and reaction chamber (4) are through the intelligent diverging device of any claim 1-4 connection.
6. A plasma processing apparatus according to claim 5, characterized in that the mixed gas chamber (1) is provided with three gas inlets (1-1), and the three gas inlets (1-1) are provided with angle-adjustable gas inlet plates and flow control valves.
7. A plasma processing apparatus as claimed in claim 5, characterized in that the mixed gas chamber (1) is provided with vacuum extraction means (1-3) which are NEG pumps and turbo molecular pumps.
8. A plasma processing apparatus as claimed in claim 5, characterized in that a low-power fan (1-2) is arranged in the mixed gas chamber (1).
9. A plasma processing apparatus as claimed in claim 5, characterized in that the plasma electron density detection means (4-2) is provided in the reaction chamber (4), and the flow monitoring means (4-1) is provided at the gas inlet position in the reaction chamber.
10. A plasma processing apparatus as claimed in claim 9, characterized in that the plasma electron density detecting means (4-2) and the flow rate monitoring means (4-1) are electrically connected to the PLC controller (5).
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| CN202123168123.0U CN217026076U (en) | 2021-12-16 | 2021-12-16 | Intelligent flow dividing device and plasma processing equipment |
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| CN202123168123.0U CN217026076U (en) | 2021-12-16 | 2021-12-16 | Intelligent flow dividing device and plasma processing equipment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115613140A (en) * | 2022-12-16 | 2023-01-17 | 江苏邑文微电子科技有限公司 | Transverse plasma generating chamber and multifunctional high-temperature reaction device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115613140A (en) * | 2022-12-16 | 2023-01-17 | 江苏邑文微电子科技有限公司 | Transverse plasma generating chamber and multifunctional high-temperature reaction device |
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