CN102954264B - Valve body, gate valve and base plate processing system - Google Patents
Valve body, gate valve and base plate processing system Download PDFInfo
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- CN102954264B CN102954264B CN201210297129.4A CN201210297129A CN102954264B CN 102954264 B CN102954264 B CN 102954264B CN 201210297129 A CN201210297129 A CN 201210297129A CN 102954264 B CN102954264 B CN 102954264B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
- F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
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- Condensed Matter Physics & Semiconductors (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Details Of Valves (AREA)
- Chemical Vapour Deposition (AREA)
- Sliding Valves (AREA)
Abstract
The invention provides a kind of valve body, can when cleaning valve body without the need to stopping base plate processing system in fact.Base plate processing system 10 comprises implements the process chamber 13 of dry etch process and the transfer chamber 11 of conveying substrate S to substrate S, the valve body 22 that open or closedown is communicated with the connecting port 19a of process chamber 13 and transfer chamber 11 comprises moveable main body 23 and cap assembly 24, cap assembly 24 can be pulled down from main body 23, form across the opposed parts 40 that connecting port 19a is relative with process chamber 13 by when valve body 22 closes connecting port 19a, when valve body 22 closes connecting port 19a, valve body 22 is observed from process chamber 13 side by connecting port 19a, can be overall depending on recognizing opposed parts 40 in connecting port 19a.
Description
Technical field
The present invention relates to the valve body, gate valve and the base plate processing system that separate two chambers.
Background technique
In base plate processing system, the transfer chamber comprising the arm being built-in with conveying substrate and the multiple process chambers be configured in around this transfer chamber, manage regulation is implemented in room process to substrate, such as plasma treatment throughout.The gate valve separating these chambers is configured with between transfer chamber and process chamber.
Fig. 9 is the sectional view of the structure schematically representing existing gate valve.
In fig .9, gate valve 90 is configured between transfer chamber and process chamber, be included in clack box 92 that bi-side are provided with opening 91a, 91b be configured in clack box 92 inside and by bar (valve rod) 94 valve bodies 95 be connected with actuator 93.
This gate valve 90, when separating transfer chamber and process chamber, make valve body 95 be close to the internal face occlusion of openings 91a of clack box 92 by actuator 93 and bar 94, be communicated with transfer chamber and process chamber time, by actuator 93 and bar 94 make valve body 95 from the internal face of clack box 92 leave and be pulled up to top.
When separating transfer chamber and process chamber, valve body 95 is relative with the inside of process chamber across opening 91a, therefore, when can produce process (hereinafter referred to as " process of deposition physical property ") of sediments (デ Port) in the process chamber to substrate enforcement, sometimes on the surface of valve body 95 also adventitious deposit.
In gate valve 90, for ease of carrying out the sedimental removing operation being attached to valve body 95 surface, can easily pull down valve body 95(for example, referring to patent documentation 1 by the bonnet flange 96 of the freely openable of open formation clack box 92 bottom).And by jet flow etc., the surface of the valve body 95 taken out is cleaned.
At first technical paper
Patent documentation
Patent documentation 1: Japanese Unexamined Patent Publication 11-108243 publication
Summary of the invention
The problem that invention will solve
But in the gate valve of Fig. 9, need open bonnet flange 96 to clean valve body 95, therefore, the inside of transfer chamber, can not conveying substrate in the inside of transfer chamber by opening 91b and ft connection, and result, exists the problem that base plate processing system stops in fact.
The object of the invention is to, being provided in valve body, gate valve and base plate processing system without the need to making base plate processing system stop in fact when cleaning valve body.
For the method for dealing with problems
In order to achieve the above object, the valve body that technical solution of the present invention 1 is recorded, its comprise to substrate implement predetermined processing process chamber and carry in the base plate processing system of transfer chamber of described substrate to this process chamber, the connecting port of described process chamber and described transfer chamber is communicated with for open or closedown, the feature of this valve body is, comprising: can the main body of movement; With the coating member with opposed parts, described opposed parts is installed on this main body, and can pull down from described main body, when described valve body closes described connecting port, described opposed parts is relative with described process chamber across described connecting port, when described valve body closes described connecting port, when observing described valve body via described connecting port from described process chamber side, can see that in described connecting port described opposed parts is overall.
The valve body that technological scheme 2 is recorded, is characterized in that: on the basis of the valve body of technological scheme 1 record, and described coating member is installed to described main body by assembly.
The valve body that technological scheme 3 is recorded, is characterized in that: on the basis of the valve body of technological scheme 1 record, and described coating member comprises plate-shaped member.
The valve body that technological scheme 4 is recorded, is characterized in that: on the basis of the valve body of technological scheme 3 record, and described coating member has the framework of surrounding described opposed parts, and this framework is configured to split.
The valve body that technological scheme 5 is recorded, it is characterized in that: on the basis of the valve body of technological scheme 4 record, when described valve body closes described connecting port, when observing described valve body via described connecting port from described process chamber side, a part for described framework can not be in sight by covering.
The valve body that technological scheme 6 is recorded, it is characterized in that: on the basis of the valve body of technological scheme 4 or 5 record, along observing the cross section in the direction of described valve body via described connecting port from described process chamber side, the gap of described framework and described opposed parts is curved structure.
The valve body that technological scheme 7 is recorded, is characterized in that: on the basis of the valve body of technological scheme 4 or 5 record, and described opposed parts is configured to split.
The valve body that technological scheme 8 is recorded, is characterized in that: on the basis of the valve body recorded in any one of technological scheme 1 to 5, described connecting port is included in the hole of wall member opening, and the side in this hole is covered by guard block.
The valve body that technological scheme 9 is recorded, is characterized in that: on the basis of the valve body of technological scheme 8 record, and described guard block covers a part for coating member.
In order to achieve the above object, the gate valve that technological scheme 10 is recorded has valve body, described valve body comprise to substrate implement predetermined processing process chamber and carry in the base plate processing system of transfer chamber of described substrate to this process chamber, for open or close the connecting port being communicated with described process chamber and described transfer chamber, the feature of described gate valve is: described valve body comprises: can the main body of movement; With the coating member with opposed parts, described opposed parts is installed on this main body, and can pull down from described main body, when described valve body closes described connecting port, described opposed parts is relative with described process chamber across described connecting port, when described valve body closes described connecting port, when observing described valve body via described connecting port from described process chamber side, can see that in described connecting port described opposed parts is overall.
The gate valve that technological scheme 11 is recorded, is characterized in that: on the basis of the gate valve of technological scheme 10 record, and described coating member has the framework of surrounding described opposed parts, and this framework is configured to split.
The gate valve that technological scheme 12 is recorded, it is characterized in that: on the basis of the gate valve of technological scheme 10 or 11 record, when described valve body closes described connecting port, when observing described valve body by described connecting port from described process chamber side, a part for described framework is blocked and can not depending on recognizing.
In order to achieve the above object, the base plate processing system that technological scheme 13 is recorded, comprise and the process chamber of predetermined processing is implemented to substrate and carries the transfer chamber of described substrate to this process chamber, the feature of this base plate processing system is: have open or close the valve body of the connecting port being communicated with described process chamber and described transfer chamber, described valve body comprises: can the main body of movement; With the coating member with opposed parts, described opposed parts is installed on this main body, and can pull down from described main body, when described valve body closes described connecting port, described opposed parts is relative with described process chamber across described connecting port, when described valve body closes described connecting port, when observing described valve body via described connecting port from described process chamber side, can see that in described connecting port described opposed parts is whole.
Invention effect
According to the present invention, when valve body closes connecting port, during by connecting port from process chamber side observation valve body, can see that in connecting port the opposed parts that coating member has is overall, therefore, under the state being closed connecting port by valve body, opposed parts can be pulled down from process chamber side by connecting port, and, the inside of transfer chamber can not with ft connection.In addition, opposed parts is relative with process chamber across connecting port, and therefore, the sediments produced at this process chamber is mainly attached on this opposed parts.Its result, cleans as long as pull down opposed parts, just can clean valve body in fact.That is, clean valve body time transfer chamber inside can not with ft connection, can without the need to stopping base plate processing system in fact.
Accompanying drawing explanation
Fig. 1 is the plan view of the structure of the base plate processing system schematically representing embodiments of the present invention.
Fig. 2 be schematically represent present embodiment valve body the figure of the structure of gate valve that is suitable for, Fig. 2 (A) is amplification sectional view, and Fig. 2 (B) is plan view when observing valve body from process chamber side.
Fig. 3 is the figure of the structure of the first variation of the valve body schematically representing present embodiment, Fig. 3 (A) is amplification sectional view, and Fig. 3 (B) is plan view when observing valve body from process chamber side.
Fig. 4 is the amplification sectional view of the variation of the sectional shape of the valve body representing Fig. 3.
Fig. 5 is the plan view of the variation of the central part represented in the valve body of Fig. 3.
Fig. 6 is the figure of the structure of the second variation of the valve body schematically representing present embodiment, Fig. 6 (A) is amplification sectional view, and Fig. 6 (B) is plan view when observing valve body from process chamber side.
Fig. 7 is the sectional view of the variation of the side cap assembly represented in Fig. 6, and Fig. 7 (A) represents the first variation of side cap assembly, and Fig. 7 (B) represents the second variation of side cap assembly.
Fig. 8 is the sectional view of the structure of the 3rd variation of the valve body schematically representing present embodiment.
Fig. 9 is the sectional view of the structure schematically representing existing gate valve.
Embodiment
Hereinafter, with reference to the accompanying drawings of embodiments of the present invention.
Fig. 1 is the plan view of the structure of the base plate processing system schematically representing embodiments of the present invention.
In FIG, base plate processing system 10 comprises: overlook the product configuration in pentagonal transfer chamber 11, in this transfer chamber 11 and 4 process chambers 13 be connected with transfer chamber 11 respectively by gate valve 12, the load locking room 15 be connected with transfer chamber 11 by gate valve 14 and the loader 16 be connected with load locking room 15.
The inside of transfer chamber 11 is depressurized, and utilizes the conveying arm (not shown) configured to be moved into chambers 13 by substrate S therein.The inside of chambers 13 is depressurized, and implements plasma treatment, such as dry etch process to the substrate S be moved to.The internal pressure of load locking room 15 can change to vacuum or barometric pressure, temporarily preserves the substrate S that the conveying arm 17 that had by conveying arm or the loader 16 of transfer chamber 11 is moved into.In addition, the substrate S temporarily preserved in the inside of load locking room 15 is taken out of by the conveying arm of transfer chamber 11 or conveying arm 17.
Loader 16 comprises conveying arm 17 and two buffer cells 18a, 18b, buffer cell 18a loads multiple untreated substrate S by its temporary safe-keeping, buffer cell 18b loads multiple processed substrate S by its temporary safe-keeping, and conveying arm 17 is at load locking room 15 and conveying substrate S between two buffer cells 18a, 18b.
In base plate processing system 10, when implementing dry etch process to substrate S, gate valve 12 separates process chamber 13 and transfer chamber 11, prevents the plasma of the process gas and generation being directed to process chamber 13 inside in dry etch process from entering the inside of transfer chamber 11.
Fig. 2 be schematically represent present embodiment valve body the figure of the structure of gate valve that is suitable for, Fig. 2 (A) is amplification sectional view, and Fig. 2 (B) is plan view when observing valve body from process chamber side.
In Fig. 2 (A), gate valve 12 is configured between transfer chamber 11 and process chamber 13, is included in the clack box 20 of offering connecting port 19a, 19b in two side and the valve body 22 being configured in clack box 20 inside and being connected with actuator (not shown) by bar 21.In addition, the inner face of the sidewall in the connecting port 19a side of clack box 20 surrounds connecting port 19a and is provided with O type ring 27.
This gate valve 12, when separating transfer chamber 11 and process chamber 13, utilize actuator and bar 21 that valve body 22 is close to and be configured at the O type ring 27 of clack box 20 inwall and close connecting port 19a, when being communicated with transfer chamber 11 and process chamber 13, actuator and bar 21 is utilized to make valve body 22 leave from the internal face of clack box 20 and exit downwards, as a result, connecting port 19a is opened, and transfer chamber 11 is communicated with via connecting port 19a, 19b with process chamber 13.
When separating transfer chamber 11 and process chamber 13, valve body 22 is relative with the inside of process chamber 13 across connecting port 19a, but the cap assembly 24(coating member that valve body 22 comprises basal main body 23 and is made up of the opposed parts 40 of the tabular being installed on this main body 23), the part relative with the inside of process chamber 13 across connecting port 19a of this opposed parts 40 main body covered 23.That is, opposed parts 40 is relative with the inside of process chamber 13 across connecting port 19a.Therefore, when can produce sedimental process (hereinafter referred to as " process of deposition physical property ") to substrate S enforcement in process chamber 13, long-pending thing is claimed nearly all to be attached on opposed parts 40.
Opposed parts 40 is configured to, by multiple screw 25(mounting parts) be arranged in main body 23, and can pull down from main body 23.Each screw 25 is covered by lid 26 and does not expose on the surface of valve body 22.In addition, during by connecting port 19a from process chamber 13 side observation valve body 22, as shown in Fig. 2 (B), can see that opposed parts 40 is overall.That is, the size of opposed parts 40 is slightly less than the opening area of connecting port 19a, and such as, the periphery of opposed parts 40 is positioned at the position of edge of opening about the 2mm ~ 3mm in the inner part than connecting port 19a.Therefore, when utilizing valve body 22 to close connecting port 19a, cap assembly 24 can be pulled down from process chamber 13 side by connecting port 19a by operator, and the opposed parts 40 of formation cap assembly 24 can not be made to interference with connecting port 19a.
The mask relative with the inside of process chamber 13 of opposed parts 40 has can be made once the sediments be attached on opposed parts 40 is difficult to the surface roughness of peeling off, thereby, it is possible to prevent the sediments peeled off from again adhering to and polluting other parts.As mentioned above, the size of opposed parts 40 is corresponding with the size of the opening of connecting port 19a, the size of the opening of connecting port 19a is corresponding with the size of substrate S, therefore, especially horizontal width is corresponding with the size of substrate S for the size of opposed parts 40, such as, at base plate processing system 10 to large-scale FPD(Flat Panel Display) substrate S implement dry etch process, the horizontal width of opposed parts 40 is more than 800mm.
Form main body 23 and the cap assembly 24(opposed parts 40 of valve body 22) formed by the parts such as aluminium that rigidity is high, respective surface is covered by the sprayed coating of insulating material such as aluminium oxide or yittrium oxide.Thereby, it is possible to prevent paradoxical discharge.
Utilize the valve body 22 in Fig. 2, when valve body 22 closes connecting port 19a, during by connecting port 19a from process chamber 13 side observation valve body 22, can see that in connecting port 19a opposed parts 40 is overall, therefore, operator can pull down opposed parts 40 from process chamber 13 side by connecting port 19a under the state being closed connecting port 19a by valve body 22, and, the inside of transfer chamber 11 can not with ft connection.In addition, opposed parts 40 is relative with process chamber 13 across connecting port 19a, and therefore, the sediments produced at this process chamber 13 is mainly attached on this opposed parts 40.Its result, cleans as long as pull down opposed parts 40, just can clean in fact valve body 22.That is, clean valve body 22 time transfer chamber 11 inside can not with ft connection, can without the need to stopping in fact base plate processing system 10.
In valve body 22, opposed parts 40 is arranged in main body 23 by screw 25, therefore opposed parts 40 easily can be pulled down from main body 23 by screw 25 of dismantling.In addition, in valve body 22, opposed parts 40 is made up of plate-shaped member, therefore easily processes.
In above-mentioned valve body 22, can see that the opposed parts 40 forming cap assembly 24 is overall by connecting port 19a, therefore, in the opening of connecting port 19a, also can see a part for main body 23.That is, the danger the main body 23 how much having sediments to be attached to can not to pull down from valve body 22.
First variation of the valve body 22 in following explanatory drawing 2.
Structure, the effect of this variation are substantially identical with above-mentioned valve body 22, therefore, omit the explanation to the structure repeated, effect, are described below to different structures, effect.
Fig. 3 is the figure of the structure of the first variation of the valve body schematically representing present embodiment, Fig. 3 (A) is amplification sectional view, and Fig. 3 (B) is plan view when observing valve body from process chamber side.
In Fig. 3 (A), gate valve 39 comprises the valve body 28 that clack box 20 is connected with actuator (not shown) by bar 21 with the inside being configured in clack box 20.
When separating transfer chamber 11 and process chamber 13, valve body 28 is relative with the inside of process chamber 13 across connecting port 19a, and valve body 28 comprises basal main body 29 and is installed on the cap assembly 30(coating member of this main body 29).
Cap assembly 30 comprises the opposed parts 31 as plate-shaped member being arranged on main body 29 central part and the frame-shaped parts 32(framework being arranged on main body 29 in the mode of surrounding this opposed parts 31), the part relative with the inside of process chamber 13 across connecting port 19a of opposed parts 31 and frame-shaped parts 32 main body covered 29.
In this variation, during by connecting port 19a from process chamber 13 side observation valve body 28, as shown in Fig. 3 (B), can see that opposed parts 31 is overall, and the frame-shaped parts 32 surrounded around opposed parts 31 can be seen, but the parts of frame-shaped parts 32 is blocked by the sidewall of clack box 20 and process chamber 13 and can not be in sight.In other words, in the opening of connecting port 19a, only expose opposed parts 31 and frame-shaped parts 32, main body 29 is not exposed.Therefore, when implementing deposition physical property process to substrate in process chamber 13, whole sediments is all attached on opposed parts 31 and frame-shaped parts 32, can not adhere to main body 29.
In addition, when main body 29 is close to the O type ring 27 that is configured at clack box 20 inwall and is closed connecting port 19a, opposed parts 31 and frame-shaped parts 32 can not exceed the scope that O type ring 27 encloses.
In this variation, frame-shaped parts 32 are alienable.Therefore, even if a part for frame-shaped parts 32 is not exposed in the opening of connecting port 19a, operator also can by connecting port 19a from after opposed parts 31 is pulled down in process chamber 13 side, separately frame-shaped parts 32 each cutting plate is taken out respectively by connecting port 19a, thus pull down frame-shaped parts 32.When opposed parts 31 and frame-shaped parts 32 are installed to main body 29, first, by each cutting plate of frame-shaped parts 32 is embedded to main body 29, frame-shaped parts 32 are formed on the surface of main body 29, opposed parts 31 is embedded at the central part of these frame-shaped parts 32 formed, then, utilize screw 25 that opposed parts 31 is installed to main body 29.
According to above-mentioned variation, cap assembly 30 comprise as plate-shaped member opposed parts 31 and surround the frame-shaped parts 32 of this opposed parts 31, therefore, it is possible to larger main body covered 29 surface.In addition, frame-shaped parts 32 are alienable, therefore, it is possible to by being embedded to main body 29 by each cutting plate having split frame-shaped parts 32, main body 29 can be covered, until the position can not seen by connecting port 19a.Its result, can reliably prevent sediments from adhering to main body 29.And whole sediments is all attached to opposed parts 31 and frame-shaped parts 32, therefore, as long as opposed parts 31 and frame-shaped parts 32 are pulled down cleaning, just whole sediments can substantially be removed.
In this variation, consider operability, between frame-shaped parts 32 and opposed parts 31, setting example is as the gap of 0.2mm, but also can be, observing the cross section in the direction of valve body 28 along passing through connecting port 19a from process chamber 13 side, the gap 33 of frame-shaped parts 32 and opposed parts 31 is as shown in Figure 4 in tortuous (labyrinth) structure.Thereby, it is possible to prevent sediments from being adhered to main body 29 by the gap of frame-shaped parts 32 and opposed parts 31.Its result, frame-shaped parts 32 press to main body 29 by the opposed parts 31 utilizing screw 25 to be installed on main body 29, therefore, it is possible to prevent frame-shaped parts 32 from coming off from main body 29.In addition, the joining portion between two cutting plates that also can be adjacent in alienable frame-shaped parts 32 arranges curved structure.
Also can be used in the screw (not shown) frame-shaped parts 32 being arranged on main body 29 to arrange respectively with screw 25.In this case, this screw is preferably arranged on and is covered by opposed parts 31 and not in the position that the surface of valve body 28 is exposed.
The opposed parts 40 of valve body 22 and the opposed parts 31 of valve body 28 are formed by a kind of parts, but as mentioned above, such as, when base plate processing system 10 implements dry etch process to the substrate S of large-scale FPD, opposed parts 40 or opposed parts 31 maximize, and the process that operator carries out becomes difficulty.Corresponding to this, also opposed parts 40 or opposed parts 31 can be formed as alienable (with reference to Fig. 5).Thus, cap assembly 24 or opposed parts 31 segmentation can be pulled down by operator, and, the process of operator can be made to become easy.
Below, the second variation of the valve body 22 in explanatory drawing 2.
Structure, the effect of this variation are substantially identical with above-mentioned valve body 22, therefore omit the explanation to the structure repeated, effect, are described below to different structures, effect.
Fig. 6 is the figure of the structure of the second variation of the valve body schematically representing present embodiment, Fig. 6 (A) is amplification sectional view, and Fig. 6 (B) is plan view when observing valve body from process chamber side.
In Fig. 6 (A), gate valve 34 comprises the valve body 22 that clack box 20 is connected by bar 21 with actuator (not shown) with the inside being configured in clack box 20.
In this variation, the side of connecting port 19a is by the side cap assembly 35(guard block be such as made up of the Ins. ulative material such as silica or yittrium oxide) cover, therefore, it is possible to prevent at connecting port 19a adventitious deposit.Side cap assembly 35 is made up of cartridge, can embed to connecting port 19a and can pull down.
When side cap assembly 35 is embedded connecting port 19a, and valve body 22 is when closing connecting port 19a, when passing through connecting port 19a from process chamber 13 side observation valve body 22, as shown in Fig. 6 (B), can see that opposed parts 40 is overall in the opening that side cap assembly 35 is formed.That is, the size of opposed parts 40 is less than the opening area of side cap assembly 35.Therefore, when closing connecting port 19a by valve body 22, operator just can pull down opposed parts 40 via connecting port 19a without the need to pulling down side cap assembly 35.
In this variation, can see that in the opening of side cap assembly 35 opposed parts 40 is overall, but also can as shown in Fig. 7 (A), side cap assembly 35a is in the shape in gap blocking main body 23 and opposed parts 40, such as, be L-shaped along the cross section in the direction observing valve body 28 via connecting port 19a from process chamber 13 side.In this case, the gap of main body 23 and opposed parts 40 is blocked by the bottom of L-shaped.At this, via connecting port 19a from process chamber 13 side observe valve body 22 time, in the opening that side cap assembly 35a is formed, a part for opposed parts 40 is blocked and can not sees, therefore, when pulling down opposed parts 40, need to take out side cap assembly 35a from connecting port 19a, but due to main body 23 and opposed parts 40 gap covered by side cap assembly 35a, can prevent sediments from being adhered to main body 23 by this gap.In addition, because side cap assembly 35a blocks a part for opposed parts 40, result, main body 23 is all blocked.Its result, can reduce the sediments being attached to main body 23.
As shown in Fig. 7 (B), when valve body 28 has cap assembly 30, the cross section along the direction observing valve body 28 via connecting port 19a from process chamber 13 side that also can be side cap assembly 35b is same with side cap assembly 35a in L-shaped, and covers the gap 33 of frame-shaped parts 32 and opposed parts 31.In this case, also need side cap assembly 35b to take out from connecting port 19a when pulling down cap assembly 30, but the gap 33 of frame-shaped parts 32 and opposed parts 31 is covered by side cap assembly 35b, therefore, it is possible to prevent sediments from being adhered to main body 29 by this gap 33.
Describe the present invention with above-mentioned mode of execution above, but the invention is not restricted to above-mentioned mode of execution.
In the above-described embodiment, implement premised on dry etch process by the substrate S of base plate processing system 10 couples of FPD, but also can be that base plate processing system 10 implements dry etch process to the wafer as semiconductor device substrate.
In the above-described embodiment, the part on the surface of process chamber 13 side of valve body is covered by cap assembly, but also can as shown in Figure 8, and the surface of process chamber 13 side of the main body 37 of valve body 36 is all covered by removable cap assembly 38.In this case, the sediments produced at process chamber 13 is all attached on cap assembly 38, therefore, cleaning, just can remove whole sediments by pulling down cap assembly 38.In addition, the valve body structure of Fig. 8 is simpler than the valve body structure in above-mentioned mode of execution, but different from the valve body in above-mentioned mode of execution, has to stop base plate processing system 10 when cleaning valve body, and the cap assembly 38 pulled down from main body 37 is taken out in top or the bottom that must open clack box 20.But without the need to taking out valve body 36 itself, at least valve body 37 is stayed in clack box 20, therefore, compared with existing valve body, shorter in order to clean the time that valve body makes base plate processing system 10 stop.Therefore, when paying the utmost attention to only to need simple structure to obtain such effect, the valve body of Fig. 8 has superiority.
Description of reference numerals
10 base plate processing systems
11 transfer chambers
12 gate valves
13 process chambers
19a, 19b connecting port
22,28,36 valve bodies
23,29,37 main bodys
24,30,38 cap assemblies
25 screws
31 opposed parts
32 frame-shaped parts
33 gaps
35,35a, 35b side cap assembly
Claims (8)
1. a valve body, its comprise to substrate implement predetermined processing process chamber and carry in the base plate processing system of transfer chamber of described substrate to this process chamber, be communicated with the connecting port of described process chamber and described transfer chamber for open or closedown, the feature of this valve body is, comprising:
Can the main body of movement; With
Have the coating member of opposed parts, described opposed parts is installed on this main body, and can pull down from described main body, and when described valve body closes described connecting port, described opposed parts is relative with described process chamber across described connecting port,
When described valve body closes described connecting port, when observing described valve body via described connecting port from described process chamber side, can see that in described connecting port described opposed parts is overall,
Described coating member comprises plate-shaped member,
Described coating member has the framework of surrounding described opposed parts, this framework by being formed by the cutting plate of described connecting port,
When described valve body closes described connecting port, when observing described valve body via described connecting port from described process chamber side, the peripheral part of described framework and described main body can not be in sight by covering.
2. valve body according to claim 1, is characterized in that:
Described coating member is installed to described main body by assembly.
3. valve body according to claim 1, is characterized in that:
Along observing the cross section in the direction of described valve body via described connecting port from described process chamber side, the gap of described framework and described opposed parts is curved structure.
4. valve body according to claim 1, is characterized in that:
Described opposed parts is configured to split.
5. valve body according to claim 1 and 2, is characterized in that:
Described connecting port is included in the hole of wall member opening, and the side in this hole is covered by guard block.
6. valve body according to claim 5, is characterized in that:
Described guard block covers a part for coating member.
7. a gate valve, it has valve body, described valve body comprise to substrate implement predetermined processing process chamber and carry in the base plate processing system of transfer chamber of described substrate to this process chamber, be communicated with the connecting port of described process chamber and described transfer chamber for open or closedown, the feature of described gate valve is:
Described valve body comprises: can the main body of movement; With the coating member with opposed parts, described opposed parts is installed on this main body, and can pull down from described main body, and when described valve body closes described connecting port, described opposed parts is relative with described process chamber across described connecting port,
When described valve body closes described connecting port, when observing described valve body via described connecting port from described process chamber side, can see that in described connecting port described opposed parts is overall,
Described coating member comprises plate-shaped member,
Described coating member has the framework of surrounding described opposed parts, this framework by being formed by the cutting plate of described connecting port,
When described valve body closes described connecting port, when observing described valve body via described connecting port from described process chamber side, the peripheral part of described framework and described main body can not be in sight by covering.
8. a base plate processing system, comprise and implement the process chamber of predetermined processing to substrate and carry the transfer chamber of described substrate to this process chamber, the feature of this base plate processing system is:
There is the valve body opening or close the connecting port being communicated with described process chamber and described transfer chamber,
Described valve body comprises: can the main body of movement; With the coating member with opposed parts, described opposed parts is installed on this main body, and can pull down from described main body, and when described valve body closes described connecting port, described opposed parts is relative with described process chamber across described connecting port,
When described valve body closes described connecting port, when observing described valve body via described connecting port from described process chamber side, can see that in described connecting port described opposed parts is overall,
Described coating member comprises plate-shaped member,
Described coating member has the framework of surrounding described opposed parts, this framework by being formed by the cutting plate of described connecting port,
When described valve body closes described connecting port, when observing described valve body via described connecting port from described process chamber side, the peripheral part of described framework and described main body can not be in sight by covering.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-179570 | 2011-08-19 | ||
| JP2011179570A JP5847487B2 (en) | 2011-08-19 | 2011-08-19 | Valve body, gate valve, and substrate processing system |
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| Publication Number | Publication Date |
|---|---|
| CN102954264A CN102954264A (en) | 2013-03-06 |
| CN102954264B true CN102954264B (en) | 2015-08-12 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210297129.4A Active CN102954264B (en) | 2011-08-19 | 2012-08-20 | Valve body, gate valve and base plate processing system |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5847487B2 (en) |
| KR (1) | KR101418157B1 (en) |
| CN (1) | CN102954264B (en) |
| TW (1) | TWI559435B (en) |
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|---|---|---|---|---|
| JP6209043B2 (en) * | 2013-09-30 | 2017-10-04 | 東京エレクトロン株式会社 | Gate valve and substrate processing apparatus |
| US11286562B2 (en) * | 2018-06-08 | 2022-03-29 | Asm Ip Holding B.V. | Gas-phase chemical reactor and method of using same |
| KR102206550B1 (en) * | 2019-03-25 | 2021-01-25 | 주식회사 에이씨엔 | A gate valve, and a substrate processing apparatus including the same |
| CN113140483A (en) * | 2021-03-03 | 2021-07-20 | 上海璞芯科技有限公司 | Wafer conveying method and wafer conveying platform |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000340632A (en) * | 1999-05-31 | 2000-12-08 | Matsushita Electric Ind Co Ltd | Chemical processing device for substrate and chemical processing method for the substrate |
| KR20020002787A (en) * | 2000-06-30 | 2002-01-10 | 윤종용 | Apparatus for dry etching |
| JP3664998B2 (en) * | 2001-06-22 | 2005-06-29 | 株式会社アルバック | Vacuum processing equipment |
| JP2004281613A (en) * | 2003-03-14 | 2004-10-07 | Hitachi Kokusai Electric Inc | Substrate processing apparatus |
| TWI475627B (en) * | 2007-05-17 | 2015-03-01 | Brooks Automation Inc | Substrate carrier, substrate processing apparatus and system, for reducing particle contamination of substrate during processing and method of interfacing a carrier with a processing tool |
| KR101442775B1 (en) * | 2008-04-14 | 2014-09-23 | 주성엔지니어링(주) | Separable blade and slot valve comprising the same |
| JP2011054928A (en) * | 2009-08-04 | 2011-03-17 | Tokyo Electron Ltd | Gate valve, and substrate processing system using the same |
-
2011
- 2011-08-19 JP JP2011179570A patent/JP5847487B2/en active Active
-
2012
- 2012-08-16 KR KR1020120089625A patent/KR101418157B1/en active IP Right Grant
- 2012-08-16 TW TW101129710A patent/TWI559435B/en active
- 2012-08-20 CN CN201210297129.4A patent/CN102954264B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP5847487B2 (en) | 2016-01-20 |
| KR20130020607A (en) | 2013-02-27 |
| TWI559435B (en) | 2016-11-21 |
| TW201334109A (en) | 2013-08-16 |
| CN102954264A (en) | 2013-03-06 |
| JP2013042077A (en) | 2013-02-28 |
| KR101418157B1 (en) | 2014-07-09 |
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