CN102954264A - Valve body, gate valve and substrate processing system - Google Patents
Valve body, gate valve and substrate processing system Download PDFInfo
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- CN102954264A CN102954264A CN2012102971294A CN201210297129A CN102954264A CN 102954264 A CN102954264 A CN 102954264A CN 2012102971294 A CN2012102971294 A CN 2012102971294A CN 201210297129 A CN201210297129 A CN 201210297129A CN 102954264 A CN102954264 A CN 102954264A
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- valve body
- connecting port
- process chamber
- relative parts
- main body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
- F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
Abstract
The invention provides a valve body, which enables a substrate processing system not to be stopped essentially when the valve body is cleaned. The substrate processing system 10 comprises a processing chamber for implementing a dry etching processing on a substrate S and a transmitting chamber 11 for transmitting the substrate S. The valve body 22 for opening or closing a communicating port 19a for communicating the processing chamber 13 and the transmitting chamber 11 comprises a movable main body 23 and a cover part 24, and the cover part 24 can be disassembled from the main body 23 and is composed of a relative part 40 relative to the processing chamber 13 across the communicating port 19a when the valve body closes the communicating port 19a, observes the valve body 22 from the side of the processing chamber 13 via the communicating port 19a when the valve body 22 closes the communicating port 19a, and can see the relative part 40 integrally in the communicating port 19a.
Description
Technical field
The present invention relates to separate valve body, gate valve and the base plate processing system of two chambers.
Background technique
In base plate processing system, comprise the transfer chamber of the arm that is built-in with conveying substrate and be configured in this transfer chamber a plurality of process chambers on every side, manage throughout the chamber to the processing of substrate enforcement regulation, for example Cement Composite Treated by Plasma.Between transfer chamber and process chamber, dispose the gate valve that separates these chambers.
Fig. 9 is the sectional view that schematically represents the structure of existing gate valve.
In Fig. 9, gate valve 90 is configured between transfer chamber and the process chamber, is included in bi-side and is provided with the clack box 92 of opening 91a, 91b with the inside that is connected clack box 92 and by bar (valve rod) 94 valve bodies 95 that are connected with actuator 93.
This gate valve 90, when separating transfer chamber and process chamber, make valve body 95 be close to the internal face occlusion of openings 91a of clack box 92 by actuator 93 and bar 94, when being communicated with transfer chamber and process chamber, make valve body 95 leave and be pulled up to the top from the internal face of clack box 92 by actuator 93 and bar 94.
When separating transfer chamber and process chamber, valve body 95 is relative with the inside of process chamber across opening 91a, therefore, when in process chamber, substrate being implemented to produce the processing (hereinafter referred to as " the deposition physical property is processed ") of sediments (デ Port), the also adventitious deposit on the surface of valve body 95 sometimes.
In gate valve 90, sedimentally remove operation for what be easy to be attached to valve body 95 surfaces, can for example easily pull down valve body 95(by the bonnet flange 96 of the open freely openable that consists of clack box 92 bottoms, with reference to patent documentation 1).And by jet flow etc. the surface of the valve body 95 that takes out is cleaned.
Technical paper formerly
Patent documentation
Patent documentation 1: Japanese kokai publication hei 11-108243 communique
Summary of the invention
The problem that invention will solve
But, in the gate valve of Fig. 9, need open bonnet flange 96 in order to clean valve body 95, therefore, the inside of transfer chamber is communicated with the outside by opening 91b, can not conveying substrate in the inside of transfer chamber, result, the problem that exists base plate processing system to stop in fact.
The object of the invention is to, need not valve body, gate valve and base plate processing system that base plate processing system is stopped in fact when being provided at the cleaning valve body.
For the method for dealing with problems
In order to achieve the above object, the valve body of technical solution of the present invention 1 record, it is in the base plate processing system that comprises the transfer chamber that substrate is implemented the process chamber of predetermined processing and carry described substrate to this process chamber, be used for connecting port open or that close the described process chamber of connection and described transfer chamber, this valve body is characterised in that, comprising: the main body that can move; With the coating member with relative parts, described relative parts are installed on this main body, and can pull down from described main body, when described valve body is closed described connecting port, described relative parts are relative with described process chamber across described connecting port, when described valve body is closed described connecting port, when observing described valve body via described connecting port from described process chamber side, can see that in described connecting port described relative parts are whole.
The valve body of technological scheme 2 records is characterized in that: on the basis of the valve body that technological scheme 1 is put down in writing, described coating member is installed to described main body by assembly.
The valve body of technological scheme 3 records is characterized in that: on the basis of the valve body that technological scheme 1 is put down in writing, described coating member comprises plate-shaped member.
The valve body of technological scheme 4 records is characterized in that: on the basis of the valve body that technological scheme 3 is put down in writing, described coating member has the framework of surrounding described relative parts, and this framework constitutes and can cut apart.
The valve body of technological scheme 5 records, it is characterized in that: on the basis of the valve body that technological scheme 4 is put down in writing, when described valve body was closed described connecting port, when observing described valve body via described connecting port from described process chamber side, the part of described framework was covered and can not be in sight.
The valve body of technological scheme 6 records, it is characterized in that: on the basis of technological scheme 4 or 5 valve bodies of putting down in writing, along the cross section of the direction of observing described valve body via described connecting port from described process chamber side, the gap of described framework and described relative parts is curved structure.
The valve body of technological scheme 7 records is characterized in that: on the basis of technological scheme 4 or 5 valve bodies of putting down in writing, described relative parts constitute and can cut apart.
The valve body of technological scheme 8 records is characterized in that: on the basis of the valve body that any one of technological scheme 1 to 5 is put down in writing, described connecting port is included in the hole of wall member opening, and the side in this hole is covered by guard block.
The valve body of technological scheme 9 records is characterized in that: on the basis of the valve body that technological scheme 8 is put down in writing, described guard block covers the part of coating member.
In order to achieve the above object, the gate valve of technological scheme 10 records has valve body, described valve body is in the base plate processing system that comprises the transfer chamber that substrate is implemented the process chamber of predetermined processing and carry described substrate to this process chamber, be used for connecting port open or that close the described process chamber of connection and described transfer chamber, described gate valve is characterised in that: described valve body comprises: the main body that can move; With the coating member with relative parts, described relative parts are installed on this main body, and can pull down from described main body, when described valve body is closed described connecting port, described relative parts are relative with described process chamber across described connecting port, when described valve body is closed described connecting port, when observing described valve body via described connecting port from described process chamber side, can see that in described connecting port described relative parts are whole.
The gate valve of technological scheme 11 records is characterized in that: on the basis of the gate valve that technological scheme 10 is put down in writing, described coating member has the framework of surrounding described relative parts, and this framework constitutes and can cut apart.
The gate valve of technological scheme 12 records, it is characterized in that: on the basis of technological scheme 10 or 11 gate valves of putting down in writing, when described valve body was closed described connecting port, when observing described valve body by described connecting port from described process chamber side, the part of described framework was blocked and can not looks and recognize.
In order to achieve the above object, the base plate processing system of technological scheme 13 records, comprise substrate is implemented the process chamber of predetermined processing and the transfer chamber that carries described substrate to this process chamber, this base plate processing system is characterised in that: have the valve body of opening or closing the connecting port that is communicated with described process chamber and described transfer chamber, described valve body comprises: the main body that can move; With the coating member with relative parts, described relative parts are installed on this main body, and can pull down from described main body, when described valve body is closed described connecting port, described relative parts are relative with described process chamber across described connecting port, when described valve body is closed described connecting port, when observing described valve body via described connecting port from described process chamber side, can see that in described connecting port described relative parts are whole.
The invention effect
According to the present invention, when valve body is closed connecting port, when observing valve body by connecting port from the process chamber side, in connecting port, can see the relative parts integral body that coating member has, therefore, can under the state of being closed connecting port by valve body, pull down relative parts from the process chamber side by connecting port, and the inside of transfer chamber can not be communicated with the outside.In addition, parts are relative with process chamber across connecting port relatively, and therefore, the sediments that produces at this process chamber mainly is attached on these relative parts.Its result cleans as long as pull down relative parts, just can clean in fact valve body.That is, the inside of transfer chamber can not be communicated with the outside when cleaning valve body, can need not to stop in fact base plate processing system.
Description of drawings
Fig. 1 is the plan view of structure that schematically represents the base plate processing system of embodiments of the present invention.
Fig. 2 is the figure of structure that schematically represents the gate valve that valve body was suitable for of present embodiment, and Fig. 2 (A) is amplification sectional view, and Fig. 2 (B) is the plan view when observing valve body from the process chamber side.
Fig. 3 is the figure of structure of the first variation that schematically represents the valve body of present embodiment, and Fig. 3 (A) is amplification sectional view, and Fig. 3 (B) is the plan view when observing valve body from the process chamber side.
Fig. 4 is the amplification sectional view of variation of sectional shape of the valve body of presentation graphs 3.
Fig. 5 is the plan view of the variation of the central part in the valve body of presentation graphs 3.
Fig. 6 is the figure of structure of the second variation that schematically represents the valve body of present embodiment, and Fig. 6 (A) is amplification sectional view, and Fig. 6 (B) is the plan view when observing valve body from the process chamber side.
Fig. 7 is the sectional view of the variation of the side cap assembly in the presentation graphs 6, the first variation of Fig. 7 (A) expression side cap assembly, the second variation of Fig. 7 (B) expression side cap assembly.
Fig. 8 is the sectional view of structure of the 3rd variation that schematically represents the valve body of present embodiment.
Fig. 9 is the sectional view that schematically represents the structure of existing gate valve.
Embodiment
Below, with reference to the description of drawings embodiments of the present invention.
Fig. 1 is the plan view of structure that schematically represents the base plate processing system of embodiments of the present invention.
In Fig. 1, base plate processing system 10 comprises: overlook be pentagonal transfer chamber 11, around this transfer chamber 11 radial configuration and 4 process chambers 13 that are connected with transfer chamber 11 by gate valve 12 respectively, pass through gate valve 14 load locking room 15 that is connected with transfer chamber 11 and the loader 16 that is connected with load locking room 15.
The inside of transfer chamber 11 is depressurized, and utilizes the conveying arm (not shown) of section's configuration within it that substrate S is moved into to chambers 13.The inside of chambers 13 is depressurized, and the substrate S that is moved into is implemented Cement Composite Treated by Plasma, for example dry etch process.The internal pressure of load locking room 15 can change to vacuum or barometric pressure, the substrate S that the conveying arm 17 that temporary transient conveying arm or the loader 16 of preserving by transfer chamber 11 has is moved into.In addition, taken out of by conveying arm or the conveying arm 17 of transfer chamber 11 at the temporary transient substrate S that preserves in the inside of load locking room 15.
In base plate processing system 10, when substrate S was implemented dry etch process, gate valve 12 separated process chamber 13 and transfer chamber 11, and the plasma that prevents from being directed to the processing gas of process chamber 13 inside and generation in dry etch process enters the inside of transfer chamber 11.
Fig. 2 is the figure of structure that schematically represents the gate valve that valve body was suitable for of present embodiment, and Fig. 2 (A) is amplification sectional view, and Fig. 2 (B) is the plan view when observing valve body from the process chamber side.
In Fig. 2 (A), gate valve 12 is configured between transfer chamber 11 and the process chamber 13, is included in the clack box 20 of offering connecting port 19a, 19b in the two side and is connected the clack box 20 inner valve bodies 22 that are connected with actuator (not shown) by bar 21.In addition, surround connecting port 19a at the inner face of the sidewall of the connecting port 19a of clack box 20 side and be provided with O type ring 27.
This gate valve 12, when separating transfer chamber 11 and process chamber 13, utilize actuator and bar 21 that valve body 22 is close to be disposed at the O type ring 27 of clack box 20 inwalls and close connecting port 19a, when being communicated with transfer chamber 11 and process chamber 13, utilize actuator and bar 21 to make valve body 22 leave and withdraw from from the internal face of clack box 20 downwards, as a result, connecting port 19a is opened, and transfer chamber 11 and process chamber 13 are communicated with via connecting port 19a, 19b.
When separating transfer chamber 11 and process chamber 13, valve body 22 is relative with the inside of process chamber 13 across connecting port 19a, but valve body 22 comprises basal main body 23 and the cap assembly 24(coating member that is made of the tabular relative parts 40 that are installed on this main body 23), these relative parts 40 main body covered 23 across the connecting port 19a part relative with the inside of process chamber 13.That is, parts 40 are relative with the inside of process chamber 13 across connecting port 19a relatively.Therefore, when in process chamber 13, substrate S being implemented to produce sedimental processing (hereinafter referred to as " the deposition physical property is processed "), claim long-pending thing nearly all to be attached on the relative parts 40.
In case relatively the relative mask in the inside with process chamber 13 of parts 40 has to make and is attached to the surface roughness that the sediments on the relative parts 40 is difficult to peel off, thus, can prevent that the sediments that peels off from again adhering to and pollute other parts.As mentioned above, the size of relative parts 40 is big or small corresponding with the opening of connecting port 19a, the size of the opening of connecting port 19a is big or small corresponding with substrate S's, therefore, the relative size of parts 40 horizontal width and substrate S big or small corresponding especially, for example, at 10 couples of large-scale FPD(Flat Panel Display of base plate processing system) the substrate S of usefulness implements in the situation of dry etch process, and the horizontal width of parts 40 is more than the 800mm relatively.
Consist of the relative parts 40 with cap assembly 24(of main body 23 of valve body 22) by the high parts of rigidity for example aluminium forms, surface separately is by for example sprayed coating covering of aluminium oxide or yittrium oxide of insulating material.Thus, can prevent paradoxical discharge.
Utilize the valve body 22 among Fig. 2, when valve body 22 is closed connecting port 19a, when observing valve body 22 by connecting port 19a from process chamber 13 sides, in connecting port 19a, can see relative parts 40 integral body, therefore, the operator can pull down relative parts 40 from process chamber 13 sides by connecting port 19a under the state of being closed connecting port 19a by valve body 22, and the inside of transfer chamber 11 can not be communicated with the outside.In addition, parts 40 are relative with process chamber 13 across connecting port 19a relatively, and therefore, the sediments that produces at this process chamber 13 mainly is attached on these relative parts 40.Its result cleans as long as pull down relative parts 40, just can clean in fact valve body 22.That is, the inside of transfer chamber 11 can not be communicated with the outside when cleaning valve body 22, can need not to stop in fact base plate processing system 10.
In valve body 22, parts 40 are installed on the main body 23 by screw 25 relatively, therefore relative parts 40 easily can be pulled down from main body 23 by the screw 25 of dismantling.In addition, in valve body 22, relatively parts 40 are made of plate-shaped member, therefore process easily.
In above-mentioned valve body 22, can see relative parts 40 integral body that consist of cap assembly 24 by connecting port 19a, therefore, in the opening of connecting port 19a, also can see the part of main body 23.That is, what have sediments to be attached to danger on the main body 23 that can not pull down from valve body 22.
The first variation of the valve body 22 in the following explanatory drawing 2.
The structure of this variation, effect and above-mentioned valve body 22 are basic identical, therefore, omit the structure that repeats, the explanation of effect, below different structures, effect are described.
Fig. 3 is the figure of structure of the first variation that schematically represents the valve body of present embodiment, and Fig. 3 (A) is amplification sectional view, and Fig. 3 (B) is the plan view when observing valve body from the process chamber side.
In Fig. 3 (A), gate valve 39 comprises the valve body 28 that clack box 20 and the inside that is connected clack box 20 are connected with actuator (not shown) by bar 21.
When separating transfer chamber 11 and process chamber 13, valve body 28 is relative with the inside of process chamber 13 across connecting port 19a, and valve body 28 comprises basal main body 29 and is installed on the cap assembly 30(coating member of this main body 29).
In this variation, when observing valve body 28 by connecting port 19a from process chamber 13 sides, shown in Fig. 3 (B), can see relative parts 31 integral body, and can see and surround relative parts 31 frame shape parts 32 on every side, but the part of frame shape parts 32 is blocked by the sidewall of clack box 20 and process chamber 13 and can not be in sight.In other words, only expose relative parts 31 and frame shape parts 32 in the opening of connecting port 19a, main body 29 is not exposed.Therefore, when in process chamber 13 substrate being implemented the deposition physical property and process, all sedimentss all are attached on relative parts 31 and the frame shape parts 32, can not adhere to main body 29.
In addition, be close to the O type ring 27 that is disposed at clack box 20 inwalls and when closing connecting port 19a, parts 31 and frame shape parts 32 can not exceed the scope that O type ring 27 encloses relatively in main body 29.
In this variation, frame shape parts 32 are alienable.Therefore, even the part of frame shape parts 32 is not exposed in the opening of connecting port 19a, the operator also can by connecting port 19a after process chamber 13 sides are pulled down relative parts 31, frame shape parts 32 and each cutting plate taken out by connecting port 19a respectively separately, thus pull down frame shape parts 32.When relative parts 31 and frame shape parts 32 are installed to main body 29, at first, embed to main body 29 by each cutting plate with frame shape parts 32, form frame shape parts 32 on the surface of main body 29, central part at these formed frame shape parts 32 embeds relative parts 31, then, utilize screw 25 that relative parts 31 are installed to main body 29.
According to above-mentioned variation, cap assembly 30 comprises as the relative parts 31 of plate-shaped member and surrounds the frame shape parts 32 of these relative parts 31, therefore, and larger main body covered 29 surface.In addition, frame shape parts 32 are alienable, therefore, can embed to main body 29 by each cutting plate by will having cut apart frame shape parts 32, main body 29 can be covered, until the position that can not see by connecting port 19a.Its result can prevent reliably that sediments from adhering to main body 29.And all sediments all is attached to relative parts 31 and frame shape parts 32, therefore, as long as relative parts 31 and frame shape parts 32 are pulled down cleaning, just can substantially remove whole sedimentss.
In this variation, consider operability, the gap of setting example such as 0.2mm between frame shape parts 32 and relative parts 31, but also can be, on the cross section of the direction of observing valve body 28 by connecting port 19a from process chamber 13 sides, the gap 33 of frame shape parts 32 and relative parts 31 is tortuous (labyrinth) structure as shown in Figure 4.Thus, can prevent that sediments from adhering to main body 29 by the gap of frame shape parts 32 and relative parts 31.Its result, the relative parts 31 that utilize screw 25 to be installed on main body 29 are pressed frame shape parts 32 to main body 29, therefore, can prevent that frame shape parts 32 from coming off from main body 29.Joining portion between two in addition, also can be in alienable frame shape parts 32 adjacent cutting plates arranges curved structure.
Also can be used in the screw (not shown) that frame shape parts 32 are installed in main body 29 arranges respectively with screw 25.In this case, this screw preferably is arranged on the position of not exposed on the surface of valve body 28 by relative parts 31 coverings.
The relative parts 40 of valve body 22 are formed by a kind of parts with the relative parts 31 of valve body 28, but as mentioned above, for example, implement in the situation of dry etch process at the substrate S that 10 couples of large-scale FPD of base plate processing system use, relatively parts 40 or relatively parts 31 maximizations, the processing difficult that the operator carries out.Corresponding to this, also relative parts 40 or relative parts 31 can be formed alienable (with reference to Fig. 5).Thus, the operator can with cap assembly 24 or relatively parts 31 cut apart and pull down, and, can make operator's processing become easy.
Below, the second variation of the valve body 22 in the explanatory drawing 2.
Therefore the structure of this variation, effect and above-mentioned valve body 22 are basic identical, omit the structure that repeats, the explanation of effect, below different structures, effect are described.
Fig. 6 is the figure of structure of the second variation that schematically represents the valve body of present embodiment, and Fig. 6 (A) is amplification sectional view, and Fig. 6 (B) is the plan view when observing valve body from the process chamber side.
In Fig. 6 (A), gate valve 34 comprises the valve body 22 that clack box 20 and the inside that is connected clack box 20 and actuator (not shown) are connected by bar 21.
In this variation, the side of connecting port 19a is by such as the side cap assembly 35(guard block that is made of insulating properties materials such as silica or yittrium oxide) cover, therefore, can prevent the adventitious deposit at connecting port 19a.Side cap assembly 35 is made of cartridge, can embed and can pull down to connecting port 19a.
In this variation, in the opening of side cap assembly 35, can see relative parts 40 integral body, but also can be shown in Fig. 7 (A), side cap assembly 35a is the shape of blocking main body 23 and the gap of relative parts 40, for example, be L font via connecting port 19a from the cross section that process chamber 13 sides are observed the direction of valve body 28 on the edge.In this case, blocked the gap of main body 23 and relative parts 40 by the bottom of L font.At this, when observing valve body 22 via connecting port 19a from process chamber 13 sides, the part of parts 40 is blocked and can not sees relatively in the opening that side cap assembly 35a forms, therefore, when pulling down relative parts 40, need to take out side cap assembly 35a from connecting port 19a, but since main body 23 and relative parts 40 the gap by side cap assembly 35a covering, can prevent that sediments from adhering to main body 23 by this gap.In addition, because side cap assembly 35a blocks the part of relative parts 40, the result, main body 23 all is blocked.Its result can reduce the sediments that is attached to main body 23.
Shown in Fig. 7 (B), have at valve body 28 in the situation of cap assembly 30, the edge that also can be side cap assembly 35b is the L font equally via cross section and the side cap assembly 35a that connecting port 19a observes the direction of valve body 28 from process chamber 13 sides, and the gap 33 of covering frame shape parts 32 and relative parts 31.In this case, when pulling down cap assembly 30, also need side cap assembly 35b is taken out from connecting port 19a, but the gap 33 of frame shape parts 32 and relative parts 31 is covered by side cap assembly 35b, therefore can prevent that sediments from adhering to main body 29 by this gap 33.
More than with above-mentioned mode of execution the present invention has been described, but has the invention is not restricted to above-mentioned mode of execution.
In the above-described embodiment, the substrate S that uses take 10 couples of FPD of base plate processing system implements dry etch process as prerequisite, but also can be that 10 pairs of wafers as semiconductor device substrate of base plate processing system are implemented dry etch process.
In the above-described embodiment, the part on the surface of process chamber 13 sides of valve body main body is covered by cap assembly, but also can be as shown in Figure 8, and the surface of process chamber 13 sides of the main body 37 of valve body 36 is all covered by removable cap assembly 38.In this case, the sediments that produces at process chamber 13 all is attached on the cap assembly 38, therefore, cleans by pulling down cap assembly 38, just can remove whole sedimentss.In addition, the valve body structure of Fig. 8 is simpler than the valve body structure in the above-mentioned mode of execution, but different from the valve body in the above-mentioned mode of execution, has to stop base plate processing system 10 when cleaning valve body, and, must open top or the bottom of clack box 20 and take out the cap assembly 38 of pulling down from main body 37.But, need not to take out valve body 36 itself, valve body 37 is stayed in the clack box 20 at least, therefore, compares with existing valve body, makes time that base plate processing system 10 stops short getting final product in order to clean valve body.Therefore, only pay the utmost attention to and obtain in the situation of such effect with the simple structure of needs, the valve body of Fig. 8 has superiority.
Description of reference numerals
10 base plate processing systems
11 transfer chambers
12 gate valves
13 process chambers
19a, 19b connecting port
22,28,36 valve bodies
23,29,37 main bodys
24,30,38 cap assemblies
25 screws
31 relative parts
32 frame shape parts
33 gaps
35,35a, 35b side cap assembly
Claims (13)
1. valve body, it is in the base plate processing system that comprises the transfer chamber that substrate is implemented the process chamber of predetermined processing and carry described substrate to this process chamber, be used for connecting port open or that close the described process chamber of connection and described transfer chamber, this valve body is characterised in that, comprising:
The main body that can move; With
Coating member with relative parts, described relative parts are installed on this main body, and can pull down from described main body, and when described valve body was closed described connecting port, described relative parts were relative with described process chamber across described connecting port,
When described valve body is closed described connecting port, when observing described valve body via described connecting port from described process chamber side, can see that in described connecting port described relative parts are whole.
2. valve body according to claim 1 is characterized in that:
Described coating member is installed to described main body by assembly.
3. valve body according to claim 1 is characterized in that:
Described coating member comprises plate-shaped member.
4. valve body according to claim 3 is characterized in that:
Described coating member has the framework of surrounding described relative parts, and this framework constitutes and can cut apart.
5. valve body according to claim 4 is characterized in that:
When described valve body was closed described connecting port, when observing described valve body via described connecting port from described process chamber side, the part of described framework was covered and can not be in sight.
6. it is characterized in that according to claim 4 or 5 described valve bodies:
Along the cross section of the direction of observing described valve body via described connecting port from described process chamber side, the gap of described framework and described relative parts is curved structure.
7. it is characterized in that according to claim 4 or 5 described valve bodies:
Described relative parts constitute and can cut apart.
8. the described valve body of any one in 5 according to claim 1 is characterized in that:
Described connecting port is included in the hole of wall member opening, and the side in this hole is covered by guard block.
9. valve body according to claim 8 is characterized in that:
Described guard block covers the part of coating member.
10. gate valve, it has valve body, described valve body is in the base plate processing system that comprises the transfer chamber that substrate is implemented the process chamber of predetermined processing and carry described substrate to this process chamber, be used for connecting port open or that close the described process chamber of connection and described transfer chamber, described gate valve is characterised in that:
Described valve body comprises: the main body that can move; With the coating member with relative parts, described relative parts are installed on this main body, and can pull down from described main body, and when described valve body was closed described connecting port, described relative parts were relative with described process chamber across described connecting port,
When described valve body is closed described connecting port, when observing described valve body via described connecting port from described process chamber side, can see that in described connecting port described relative parts are whole.
11. gate valve according to claim 10 is characterized in that:
Described coating member has the framework of surrounding described relative parts, and this framework constitutes and can cut apart.
12. according to claim 10 or 11 described gate valves, it is characterized in that:
When described valve body was closed described connecting port, when observing described valve body via described connecting port from described process chamber side, the part of described framework was covered and can not be in sight.
13. a base plate processing system comprises substrate is implemented the process chamber of predetermined processing and the transfer chamber that carries described substrate to this process chamber, this base plate processing system is characterised in that:
Have the valve body of opening or closing the connecting port that is communicated with described process chamber and described transfer chamber,
Described valve body comprises: the main body that can move; With the coating member with relative parts, described relative parts are installed on this main body, and can pull down from described main body, and when described valve body was closed described connecting port, described relative parts were relative with described process chamber across described connecting port,
When described valve body is closed described connecting port, when observing described valve body via described connecting port from described process chamber side, can see that in described connecting port described relative parts are whole.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011179570A JP5847487B2 (en) | 2011-08-19 | 2011-08-19 | Valve body, gate valve, and substrate processing system |
| JP2011-179570 | 2011-08-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102954264A true CN102954264A (en) | 2013-03-06 |
| CN102954264B CN102954264B (en) | 2015-08-12 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210297129.4A Active CN102954264B (en) | 2011-08-19 | 2012-08-20 | Valve body, gate valve and base plate processing system |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5847487B2 (en) |
| KR (1) | KR101418157B1 (en) |
| CN (1) | CN102954264B (en) |
| TW (1) | TWI559435B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104514891A (en) * | 2013-09-30 | 2015-04-15 | 东京毅力科创株式会社 | Gate valve and substrate processing apparatus |
| CN113140483A (en) * | 2021-03-03 | 2021-07-20 | 上海璞芯科技有限公司 | Wafer conveying method and wafer conveying platform |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102206550B1 (en) * | 2019-03-25 | 2021-01-25 | 주식회사 에이씨엔 | A gate valve, and a substrate processing apparatus including the same |
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| KR20020002787A (en) * | 2000-06-30 | 2002-01-10 | 윤종용 | Apparatus for dry etching |
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| KR20090108998A (en) * | 2008-04-14 | 2009-10-19 | 주성엔지니어링(주) | Separable blade and slot valve comprising the same |
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| JP2004281613A (en) * | 2003-03-14 | 2004-10-07 | Hitachi Kokusai Electric Inc | Substrate processing apparatus |
| US9105673B2 (en) * | 2007-05-09 | 2015-08-11 | Brooks Automation, Inc. | Side opening unified pod |
| JP2011054928A (en) * | 2009-08-04 | 2011-03-17 | Tokyo Electron Ltd | Gate valve, and substrate processing system using the same |
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- 2011-08-19 JP JP2011179570A patent/JP5847487B2/en active Active
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- 2012-08-16 TW TW101129710A patent/TWI559435B/en active
- 2012-08-16 KR KR1020120089625A patent/KR101418157B1/en active IP Right Grant
- 2012-08-20 CN CN201210297129.4A patent/CN102954264B/en active Active
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| JP2000340632A (en) * | 1999-05-31 | 2000-12-08 | Matsushita Electric Ind Co Ltd | Chemical processing device for substrate and chemical processing method for the substrate |
| KR20020002787A (en) * | 2000-06-30 | 2002-01-10 | 윤종용 | Apparatus for dry etching |
| JP2003007623A (en) * | 2001-06-22 | 2003-01-10 | Ulvac Japan Ltd | Vacuum processing device |
| KR20090108998A (en) * | 2008-04-14 | 2009-10-19 | 주성엔지니어링(주) | Separable blade and slot valve comprising the same |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104514891A (en) * | 2013-09-30 | 2015-04-15 | 东京毅力科创株式会社 | Gate valve and substrate processing apparatus |
| TWI630671B (en) * | 2013-09-30 | 2018-07-21 | 東京威力科創股份有限公司 | Gate valve and substrate processing device |
| CN113140483A (en) * | 2021-03-03 | 2021-07-20 | 上海璞芯科技有限公司 | Wafer conveying method and wafer conveying platform |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5847487B2 (en) | 2016-01-20 |
| CN102954264B (en) | 2015-08-12 |
| JP2013042077A (en) | 2013-02-28 |
| KR101418157B1 (en) | 2014-07-09 |
| TW201334109A (en) | 2013-08-16 |
| KR20130020607A (en) | 2013-02-27 |
| TWI559435B (en) | 2016-11-21 |
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