CN102945906A - 水平结构的led芯片 - Google Patents

水平结构的led芯片 Download PDF

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Publication number
CN102945906A
CN102945906A CN2012105169708A CN201210516970A CN102945906A CN 102945906 A CN102945906 A CN 102945906A CN 2012105169708 A CN2012105169708 A CN 2012105169708A CN 201210516970 A CN201210516970 A CN 201210516970A CN 102945906 A CN102945906 A CN 102945906A
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China
Prior art keywords
led
led chip
gan layer
chip
packaging
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Pending
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CN2012105169708A
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瞿崧
文国军
严华锋
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Shanghai Dangoo Electronic Trading Co Ltd
Shanghai Dangoo Electronics Co Ltd
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Shanghai Dangoo Electronic Trading Co Ltd
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Priority to CN2012105169708A priority Critical patent/CN102945906A/zh
Priority to PCT/CN2013/000140 priority patent/WO2014086081A1/zh
Publication of CN102945906A publication Critical patent/CN102945906A/zh
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • H01L33/30Materials of the light emitting region containing only elements of group III and group V of the periodic system
    • H01L33/32Materials of the light emitting region containing only elements of group III and group V of the periodic system containing nitrogen
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape

Abstract

本发明涉及一种水平结构的LED芯片,正装或倒装的LED芯片及GaN层、n-GaN层和p-GaN层上涂覆一层透明SiO2绝缘层,并在n-GaN和p-GaN层上分别镀上电极。正装芯片或倒装LED芯片的衬底为透明基板,蓝宝石或碳化硅。透明SiO2绝缘层的材料为硅胶,树脂或者是非导电有机薄膜。本发明的水平结构的LED芯片使得LED芯片在封装制造中,能够像传统贴片电阻、电容那样,用固晶机或贴片机直接贴到基板或支架上,相比较于传统的LED封装制造,适用于更多的LED芯片的封装方式、增加了LED芯片的封装基板材料、提高了LED芯片的封装效率、提升了LED芯片的封装产能。

Description

水平结构的LED芯片
技术领域
本发明涉及一种LED芯片,特别涉及一种水平结构的LED芯片。
背景技术
    LED是发光二极管 (LED,Lighting emitted diode),是利用在电场作用下,PN结发光的固态发光器件。具有高寿命/环保/节能的特点,是绿色环保的新光源。LED技术日趋发展成熟,目前通常LED发白光是通过蓝色芯片激发黄绿荧光粉,进行波长调和而产生出的白光,市场上大规模生产的暖白光效率达到 120 lm/W,超过大部分传统光源。一般而言,LED是通过MOCVD(Metal-organic Chemical Vapor Deposition,金属有机化合物化学气相沉淀)在蓝宝石衬底或碳化硅衬底上长出p型层、n型层以及p-n结发光层,然后通过点亮、切割、扩散颗粒、分等级等工艺做成不同尺寸的芯片,一般而言有10*10 mil, 10*23 mil, 24*24 mil, 40*40 mil等尺寸,可以承受从10mA~1A的恒流电流驱动。传统的封装是将这些芯片固定在一个封装支架上,通过金线焊接芯片的阴极和阳极,通入电流来驱动LED发出蓝色单波长光,从而激发黄绿荧光粉形成白光。支架一般采用工程塑料或者是带金属热沉的塑料,然后通过底部反射来增加其光萃取率,或者是通过硅胶,树脂或玻璃成型或带二次光学透镜来改变内部材料的折射率,从而增加其出光。
传统的封装方式,对于LED芯片的光利用率相当低,一般来讲,LED芯片背面侧面发出的光经过反射/折射之后,其光利用率不超过40%,而LED芯片在背面侧面发出的光占其整个芯片出光的60%,意味着接近有40%的光是被浪费掉的。另外传统的荧光粉点胶工艺,因为荧光粉贴近温度较高的芯片发热源,从而导致荧光粉效率降低,也会影响出光效果。出光效率的降低则意味着发热量的增加,从而对电子元器件的可靠性产生影响,这都是相互影响的结果。由于LED芯片通过封装成LED组件,然后在分别焊接在铝基板上,配上适合的驱动电源和结构壳体,最后做成整灯进行销售。这中间有过多的环节造成效率和成本的浪费。因此,基于简化的目的,通过设计一种最简单的封装结构,提高整体系统出光效率并降低成本。
发明内容
本发明的目的是为了克服LED芯片封装制造中由于现有LED芯片设计使LED芯片制造效率低的缺点,提供一种电极高度相同或相近的水平结构LED的芯片。
为此,本发明的技术方案是:一种水平结构的LED芯片,包括正装结构或倒装结构的LED芯片及GaN层、n-GaN层和p-GaN基层,正装或倒装的LED芯片及GaN层、n-GaN层和p-GaN层上涂覆一层透明SiO2绝缘层, 并在n-GaN和p-GaN层上分别镀上电极。
正装芯片或倒装LED芯片的衬底为透明基板,蓝宝石或碳化硅。透明SiO2绝缘层的材料为硅胶,树脂或者是非导电有机薄膜。
本发明的有益效果是:本发明的水平结构的LED芯片使得LED芯片在封装制造中,能够像传统贴片电阻、电容那样,用固晶机或贴片机直接贴到基板或支架上,相比较于传统的LED封装制造,适用于更多的LED芯片的封装方式、增加了LED芯片的封装基板材料、提高了LED芯片的封装效率、提升了LED芯片的封装产能。
附图说明
图1是本发明的结构示意图。
具体实施方式
下面结合附图和实施例对本发明做出进一步说明。
如图1所示,本发明的水平结构的LED芯片,包括正装结构或倒装结构的LED芯片及GaN层、n-GaN层5和p-GaN层2、透明SiO2绝缘层3、正、负电极1,4等
正装或倒装LED芯片的GaN层、n-GaN层5和p-GaN层2上涂覆一层透明SiO2绝缘层3, 并在n-GaN层5和p-GaN层2上分别镀上电极。
正装芯片或倒装LED芯片芯片的衬底为透明基板,蓝宝石6(AL2O3)或碳化硅(SiC)。透明SiO2绝缘层的材料为,硅胶,树脂或者是非导电有机薄膜。
如图1所示,水平结构LED芯片在蓝宝石6或碳化硅衬底上生长n-GaN层5(包括GaN缓冲层、GaN非掺杂层),在n-GaN层5上生长p-GaN层2,在p-GaN层2上生长  透明SiO2绝缘材料层3,硅胶,树脂或者是非导电有机薄膜。最后生长正电极1 和 负电极4 电极(金、银、铜及合金材料)。

Claims (3)

1.一种水平结构的LED芯片,包括正装结构或倒装结构的LED芯片及GaN层、n-GaN层(5)和p-GaN层(2),其特征在于:所述正装结构或倒装结构的LED芯片及GaN层、n-GaN层(5)和p-GaN层(6)上涂覆一层透明SiO2绝缘层(3), 并在n-GaN层(5)和p-GaN层(2)上分别镀上电极。
2.根据权利要求1所述的水平结构的LED芯片,其特征在于:所述正装芯片或倒装LED芯片的衬底为透明基板,蓝宝石(6)或碳化硅。
3.根据权利要求1所述的水平结构的LED芯片,其特征在于:所述透明SiO2绝缘层(3)的材料为硅胶,树脂或者是非导电有机薄膜。
CN2012105169708A 2012-12-06 2012-12-06 水平结构的led芯片 Pending CN102945906A (zh)

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PCT/CN2013/000140 WO2014086081A1 (zh) 2012-12-06 2013-02-16 水平结构的led芯片

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JPS63188938A (ja) * 1987-01-31 1988-08-04 Toyoda Gosei Co Ltd 窒化ガリウム系化合物半導体の気相成長方法
CN102110754A (zh) * 2009-12-28 2011-06-29 首尔Opto仪器股份有限公司 发光二极管
CN102468380A (zh) * 2010-11-23 2012-05-23 孙智江 一种led等高电极的制作方法
CN102544296A (zh) * 2012-02-24 2012-07-04 余丽 一种倒装led芯片的制作方法
CN203026553U (zh) * 2012-12-06 2013-06-26 上海顿格电子贸易有限公司 水平结构的led芯片

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US7598105B2 (en) * 2007-12-21 2009-10-06 Tekcore Co., Ltd. Light emitting diode structure and method for fabricating the same
JP5024247B2 (ja) * 2008-09-12 2012-09-12 日立電線株式会社 発光素子
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CN101702420B (zh) * 2009-10-15 2011-11-30 厦门市三安光电科技有限公司 一种具有倒置式N电极分布的薄膜GaN基发光器件的制造方法
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CN102044608A (zh) * 2010-11-17 2011-05-04 重庆大学 一种倒装焊led芯片结构及其制作方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63188938A (ja) * 1987-01-31 1988-08-04 Toyoda Gosei Co Ltd 窒化ガリウム系化合物半導体の気相成長方法
CN102110754A (zh) * 2009-12-28 2011-06-29 首尔Opto仪器股份有限公司 发光二极管
CN102468380A (zh) * 2010-11-23 2012-05-23 孙智江 一种led等高电极的制作方法
CN102544296A (zh) * 2012-02-24 2012-07-04 余丽 一种倒装led芯片的制作方法
CN203026553U (zh) * 2012-12-06 2013-06-26 上海顿格电子贸易有限公司 水平结构的led芯片

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Application publication date: 20130227