CN102937727B - Filtering structure - Google Patents
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- CN102937727B CN102937727B CN201210517067.3A CN201210517067A CN102937727B CN 102937727 B CN102937727 B CN 102937727B CN 201210517067 A CN201210517067 A CN 201210517067A CN 102937727 B CN102937727 B CN 102937727B
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Abstract
The invention discloses a filtering structure used for a visible light band. The filtering structure is composed of a three-layer structure comprising a metal grating, a medium and a metal film. The physical mechanism for generating perfect absorption is as follows: local magnetic resonance is excited to cause the fact that the equivalent impedance of the whole structure within a wide band range is matched with vacuum impedance and reflecting electromagnetism is inhibited, and in addition, the metal film is thicker and even can not be transmitted by electromagnetic waves, so that a wideband nearly-perfect absorption structure is formed. The structure can be applied to a solar cell to acquire more energy, can also provide a solution for realizing blackness in inkless printing, and has the effect of changing the traditional view that black printing can be realized by only using pigment.
Description
Technical field
The present invention relates to a kind of optical lightscreening element, be specifically related to a kind of perfection for visible light wave range and absorb filtering structure, can be applicable to that light display is shown, photovoltaic, solar cell and without fields such as ink printings.
Background technology
At print field, traditional printing technology is to be published picture and looked like and color by the ink printing of different colours on paper, plastic or other material surface, that the problem that the principle based on reflection complementary color exists is: be easy to fade, and ink comprises the objectionable impuritiess such as aromatic hydrocarbon, heavy metal, benzene, ketone, in the production of ink and the process of printing, very high to the harmfulness of operating personnel and environment.People attempted adopting micro-nano structure to realize without ink printing in recent years.Existing work mainly concentrates on and designs micro nano structure and realize magenta, cyan and yellow, but but can not realize black.Realize black if want, must realize the high-level efficiency of broadband (wavelength 400 ~ 700nm scope) light is absorbed, and polarization state and the incident angle of absorption characteristic to incident light is insensitive.In area of solar cell, people adopt catching of the enhancing solar energies such as photonic crystal, metal nanoparticle, metal grating.
In recent years, along with the development of micro-nano process technology, the perfection of design based on micro-nano structure absorbs device became study hotspot.People adopt the perfect absorption of the realizations such as metal film, optical grating construction and the meta-materials of punching.Metal grating-medium-metal film three-decker that Marcus Diem etc. adopts in Physics Review B 79,033101,2009 has realized nearly perfect absorption the in terahertz wave band wide angle arrowband.Hao etc. have designed the narrowband absorbers of optical band, and this structure realizes perfect absorption at specific wavelength (as 583nm).Patent " a kind of almost perfect absorbing structure for wide wave band " is middle employing Metal Ball particle-medium-metal film three-decker that proposes (200910243544.X), by optimizing diameter d and the distribution period p of particle, realize the expansion of Absorber Bandwidth, realized nearly perfect absorption of the broadband within the scope of visible light wave range.
The problem that existing technology exists is: the structure of (1) design is mostly operated in single wavelength, and other wavelength place absorption efficiency obviously declines, but wide band absorption for stealthy, heat emission and energy conversion is more value in use; (2) the polarization state sensitivity to incident light, and it is serious to degenerate in broad-angle-incident angle variation range absorption characteristic; (3) current perfect absorber, mainly for microwave section and terahertz wave band, in being mainly used in surveying, has limited the application in other field.
Summary of the invention
In view of this, the object of the invention is to: for visible light wave range, design a kind of perfect filtering structure that absorbs, wide bandwidth (approximately 200 ~ 300nm), be greater than 95% in wide angle of incidence variation range absorption characteristic, and the polarization state to incident light is insensitive, can be used for without producing black in ink printing.
This structure is made up of metal grating-medium-metal film three-decker, producing the perfect physical mechanism absorbing is owing to having excited local electromagentic resonance, cause equiva lent impedance and the vacuum impedance matching of total within the scope of broadband, reflected electromagnetic is suppressed, and because the thickness of metal film is thicker, electromagnetic wave also cannot transmission, thereby forms the nearly perfect absorbing structure in broadband.
This structure can be applicable in solar cell and catches more energy, also can, for providing solution without realizing black in ink printing, change and must use pigment could realize the traditional concept of black printing.
A kind of filtering structure proposing according to object of the present invention, comprise: substrate, be positioned at suprabasil metal level, be positioned at the dielectric layer on metal level and be positioned at the metal grating layer on dielectric layer, described metal layer thickness is greater than 0.02um, described thickness of dielectric layers is between 0.03um to 0.07um, and described metal grating layer is two-dimensional grating structure, the thickness of this metal grating layer between 0.01nm-0.05um, the cycle is less than 0.35um, dutycycle between 0.3 to 0.7.
Preferably, described substrate is transparent flexible material.
Preferably, the material of described metal level is aluminium, silver or copper.
Preferably, the material of described metal grating layer is nickel.
Preferably, the thickness of described metal level is greater than 0.04um.
Preferably, the thickness of described dielectric layer is 0.05um, and this dielectric layer is transparent flexible material.
Preferably, the thickness of described metal grating layer is 0.03um.
Preferably, the cycle of described metal grating layer is less than 0.2um, and dutycycle is 0.5.
Preferably, also can comprise overlayer, cover the surface of metal grating layer.
Preferably, described tectal material is transparent flexible material.
Due to the utilization of technique scheme, the present invention compared with prior art has following advantages:
1. filtering structure of the present invention, for visible light wave range.
2. filtering structure of the present invention, almost reaches 100% in broadband (about 200nm～300nm) scope absorption efficiency.
3. the perfect filtering structure that absorbs of the present invention, good in wide angle of incidence variation range absorption characteristic, when light vertical incidence, described structure almost reaches 100% in the absorption efficiency of visible light wave range, and when light changes within the scope of 0 ~ 45 degree, absorption efficiency is still greater than 90%.
4. the perfect filtering structure that absorbs of the present invention, insensitive to the polarization state of incident light.
5. the perfect filtering structure that absorbs of the present invention, has flexible characteristic, flexible.
Brief description of the drawings
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, to the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, do not paying under the prerequisite of creative work, can also obtain according to these accompanying drawings other accompanying drawing.
The absorption filtering structure schematic diagram that Fig. 1 designs for the present invention.
Fig. 2 is the graph of a relation of the absorption spectrum of TM light of filtering structure in the embodiment of the present invention one and incident angle, incident wavelength.
Fig. 3 is the graph of a relation of the absorption spectrum of TE light of photo structure in the embodiment of the present invention one and incident angle, incident wavelength.
Fig. 4 is the absorption spectrum of TM light of filtering structure in the embodiment of the present invention two and incident wavelength, the graph of a relation in cycle.
Fig. 5 be the TM light of filtering structure in the embodiment of the present invention three absorption spectrum and incident wavelength, account for the graph of a relation of wide ratio.
Fig. 6 is the graph of a relation of the thickness of the absorption spectrum of TM light of filtering structure in the embodiment of the present invention four and incident wavelength, metal grating layer.
Fig. 7 is the graph of a relation of the thickness of the absorption spectrum of TM light of filtering structure in the embodiment of the present invention five and incident wavelength, dielectric layer.
Fig. 8 is the graph of a relation of the thickness of the absorption spectrum of TM light of filtering structure in the embodiment of the present invention six and incident wavelength, metal level.
Fig. 9 is the absorption spectrum of TM light and the graph of a relation of incident wavelength of filtering structure in the embodiment of the present invention seven.
Figure 10 is the absorption spectrum of TE light and the graph of a relation of incident wavelength of filtering structure in the embodiment of the present invention seven.
Embodiment
Below in conjunction with drawings and Examples, the invention will be further described.
Referring to Fig. 1, the perfection designing for the present invention absorbs the schematic diagram of filtering structure, comprising: substrate 11, metal level 12, dielectric layer 13, metal grating layer 14 and overlayer 15.The material of substrate 11 is transparent flexible material, such as PET or PC.Metal level 12 is positioned in substrate 11, its material is such as being aluminium, silver or copper, this metal level 12 plays the effect of catoptron, in order to ensure reflection of light efficiency, the skin depth of the light that the thickness h 1 of this metal level 12 is greater than visible waveband on this metal material, in one embodiment, is greater than 0.02um by the thickness h of this metal level 12 1, in further preferred embodiment, the thickness h 1 of this metal level 12 is 0.04um.Dielectric layer 13 is positioned on metal level 12, and its material is similarly transparent flexible material, and such as PMMA, the thickness h 2 of this dielectric layer 13 is 0.03um to 0.07um, and more preferably, this thickness of dielectric layers h2 is 0.05um.Metal grating layer 14 is positioned on dielectric layer 13, and this metal grating layer 14 is two-dimensional grating structure, its thickness h 3 between 0.01um-0.05um, period p is less than 0.35um, dutycycle F between 0.3 to 0.7.In one, more preferably in scheme, the thickness h 3 of this metal grating layer 14 is 0.03um, and period p is less than 0.2um, and dutycycle F is 0.5.Overlayer 15 is positioned on metal grating layer 14, and its material is transparent flexible material.It is pointed out that overlayer 15 is not necessary in the present invention, but increasing after overlayer 15, not only play the effect of protection, its thickness also can exert an influence to absorption efficiency.
Below, to elaborate to technical scheme of the present invention by several embodiments, should be understood that, described several embodiments are only to have exemplified the part situation of the present invention that is suitable for, those skilled in the art are the description to technical scheme according to the present invention, can be extended in more concrete application.
Embodiment mono-:
Substrate 11 is flexible material PET or PC, and metal level 12 is nickel, and dielectric layer 13 is PMMA, and metal grating layer 14 is nickel, there is no overlayer.Period p=the 0.2um of metal grating layer 14, dutycycle F=0.5, the thickness h 1=0.08um of metal level 12, the thickness h 2=0.05um of dielectric layer 13, the thickness h 3=0.03um of metal grating layer 14.The quick property in absorption characteristic by rigorous coupled wave theory (RCWA) to filtering structure and angle is analyzed.TM polarized light, the from then on structural top incident of TE polarized light, the incident angle of this light at 0 degree to 45 degree range.
The graph of a relation of the absorption spectrum of the TM polarized light of the filtering structure that Fig. 2 designs for the present invention and incident angle, incident wavelength.As can be seen from Figure 2, at whole visible light wave range (bandwidth is about 300nm), when TM polarized light vertical incidence, the absorption efficiency of described structure almost reaches 100%, and when light changes within the scope of 0 ~ 45 degree, absorption efficiency is still greater than 90%.
The graph of a relation of the absorption spectrum of the TE polarized light of the filtering structure that Fig. 3 designs for the present invention and incident angle, incident wavelength.As can be seen from Figure 2, at whole visible light wave range (bandwidth is about 300nm), when TE polarized light vertical incidence, the absorption efficiency of described structure almost reaches 100%, and when light changes within the scope of 0 ~ 45 degree, absorption efficiency is still greater than 90%.
Therefore, described filtering structure is insensitive to the polarization state of incident light, and has in wide range (0 ~ 45 degree) absorption efficiency that is greater than 90%.In solar cell, apply this structure, can catch more solar energy.In without ink printing, apply this structure, human eye will be observed black in 0 ~ 45 degree angular field of view.
Embodiment bis-:
The period p of adjusting metal grating 14, p is being less than 0.35um range, and the observation cycle changes the impact of the absorption spectrum on filtering structure.Other structural parameters are identical with embodiment mono-.TM polarized light is structural top vertical incidence from then on, that is to say, incident angle is 0 degree.As can be seen from Figure 4, the cycle exerts an influence to absorption efficiency and bandwidth.Cycle, while being less than 0.2um, absorption efficiency almost reached 100%, the about 300nm of bandwidth.Along with the increase in cycle, absorption efficiency only reaches 100% in very narrow wavelength band (the about 100nm of bandwidth).
Embodiment tri-:
Adjust accounting for of metal grating 14 wide than F, observe the impact of the absorption spectrum of the variation that accounts for wide ratio on filtering structure.Other structural parameters are identical with embodiment mono-.TM polarized light is structural top vertical incidence from then on, that is to say, incident angle is 0 degree.As can be seen from Figure 5, account for wide comparison absorption efficiency and bandwidth and all produce obvious impact.In the time of F=0.5, absorption characteristic is best, reaches 100%, and in the time that F departs from 0.5, absorption efficiency reduces, and bandwidth reduces.
Embodiment tetra-:
Adjust the thickness h 3 of metal grating layer 14, the thickness h 3 of observing metal grating layer 14 changes the impact that perfection is absorbed to the absorption spectrum of filtering structure.Other structural parameters are identical with embodiment mono-.TM polarized light is structural top vertical incidence from then on, that is to say, incident angle is 0 degree.As can be seen from Figure 6, the thickness of metal grating all produces obvious impact to absorption efficiency and bandwidth.In the time of h3=0.03um, absorption characteristic is best, almost reaches 100%, and in the time that h3 departs from 0.03um, absorption efficiency reduces, and bandwidth reduces.
Embodiment five:
Adjust the thickness h 2 of dielectric layer 13, the thickness h 2 of observing dielectric layer 13 changes the impact that perfection is absorbed to the absorption spectrum of filtering structure.Other structural parameters are identical with embodiment mono-.TM polarized light is structural top vertical incidence from then on, that is to say, incident angle is 0 degree.As can be seen from Figure 7, the thickness of dielectric layer all produces obvious impact to absorption efficiency and bandwidth.In the time of h2=0.05um, absorption characteristic is best, almost reaches 100%, and in the time that h2 departs from 0.05um, absorption efficiency reduces, and bandwidth reduces.
Embodiment six:
Adjust the thickness h 1 of metal level, the variation in thickness of observing metal level absorbs the impact of the absorption spectrum of filtering structure on perfection.Other structural parameters are identical with embodiment mono-.TM polarized light is structural top vertical incidence from then on, that is to say, incident angle is 0 degree.As can be seen from Figure 8, the thickness of metal level all produces obvious impact to absorption efficiency and bandwidth.Metal level mainly plays catoptron, and when therefore its thickness is greater than 0.04um, absorption efficiency almost reaches 100%.When h1 is when lower than 0.04um, absorption efficiency reduces.
Embodiment seven:
The material that changes metal level, is respectively aluminium, silver, copper, observes the impact of the absorption spectrum of different materials on perfection absorption filtering structure.Other structural parameters are identical with embodiment mono-.By rigorous coupled wave theory (RCWA), the perfect absorption characteristic that absorbs filtering structure of different metal layer material is analyzed.The from then on structural top incident of TM polarized light, incident angle is 0 degree.Fig. 9, Figure 10 are respectively TM polarized light, the absorption spectrum of TE polarized light and the graph of a relation of incident wavelength of the perfection absorption filtering structure of different metal layer material.Can find out, under identical Parameter Conditions, at whole visible light wave range, the absorption characteristic of Al and Cu is better than Ag.
In sum, the present invention proposes the filtering structure that a kind of perfection for visible light wave range absorbs.This filtering structure is made up of metal grating-medium-metal film three-decker, producing the perfect physical mechanism absorbing is owing to having excited local electromagentic resonance, cause equiva lent impedance and the vacuum impedance matching of total within the scope of broadband, reflected electromagnetic is suppressed, and because the thickness of metal film is thicker, electromagnetic wave also cannot transmission, thereby forms the nearly perfect absorbing structure in broadband.This structure can be applicable in solar cell and catches more energy, also can, for providing solution without realizing black in ink printing, change and must use pigment could realize the traditional concept of black printing.
To the above-mentioned explanation of the disclosed embodiments, make professional and technical personnel in the field can realize or use the present invention.To be apparent for those skilled in the art to the multiple amendment of these embodiment, General Principle as defined herein can, in the situation that not departing from the spirit or scope of the present invention, realize in other embodiments.Therefore, the present invention will can not be restricted to embodiment illustrated herein, but will meet the widest scope consistent with principle disclosed herein and features of novelty.To the above-mentioned explanation of the disclosed embodiments, make professional and technical personnel in the field can realize or use the present invention.To be apparent for those skilled in the art to the multiple amendment of these embodiment, General Principle as defined herein can, in the situation that not departing from the spirit or scope of the present invention, realize in other embodiments.Therefore, the present invention will can not be restricted to embodiment illustrated herein, but will meet the widest scope consistent with principle disclosed herein and features of novelty.
Claims (10)
1. a filtering structure, act on visible light wave range, it is characterized in that comprising: substrate, be positioned at suprabasil metal level, be positioned at the dielectric layer on metal level and be positioned at the metal grating layer on dielectric layer, described metal layer thickness is greater than 0.02um, described thickness of dielectric layers is between 0.03um to 0.07um, described metal grating layer is two-dimensional grating structure, the thickness of this metal grating layer is between 0.01um-0.05um, cycle is less than 0.35um, dutycycle is between 0.3 to 0.7, described filtering structure is realized black, the physical mechanism of this filtering structure is owing to having excited local electromagentic resonance, cause equiva lent impedance and the vacuum impedance matching of whole filtering structure within the scope of broadband, reflected electromagnetic is suppressed.
2. filtering structure as claimed in claim 1, is characterized in that: described substrate is transparent flexible material.
3. filtering structure as claimed in claim 1, is characterized in that: the material of described metal level is aluminium, silver or copper.
4. filtering structure as claimed in claim 1, is characterized in that: the material of described metal grating layer is nickel.
5. filtering structure as claimed in claim 1, is characterized in that: the thickness of described metal level is greater than 0.04um.
6. filtering structure as claimed in claim 1, is characterized in that: the thickness of described dielectric layer is 0.05um, and this dielectric layer is transparent flexible material.
7. filtering structure as claimed in claim 1, is characterized in that: the thickness of described metal grating layer is 0.03um.
8. filtering structure as claimed in claim 1, is characterized in that: the cycle of described metal grating layer is less than 0.2um, and dutycycle is 0.5.
9. filtering structure as claimed in claim 1, is characterized in that: also can comprise overlayer, cover the surface of metal grating layer.
10. filtering structure as claimed in claim 9, is characterized in that: described tectal material is transparent flexible material.
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| CN201210517067.3A CN102937727B (en) | 2012-12-05 | 2012-12-05 | Filtering structure |
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| CN103513316B (en) * | 2013-09-29 | 2017-03-22 | 苏州大学 | Selective absorption filtering structure |
| CN105487153B (en) * | 2015-12-23 | 2018-03-09 | 中国科学院重庆绿色智能技术研究院 | A kind of high efficiency subtractive filter based on composite ultra-thin metal |
| CN107942425B (en) * | 2016-10-13 | 2021-05-04 | 上海矽越光电科技有限公司 | Buried metal type broadband reflection grating and manufacturing method thereof |
| CN109343163B (en) * | 2018-12-06 | 2021-04-20 | 深圳大学 | Manufacturing method of simple-period grating structure and terahertz filter |
| CN111812756B (en) * | 2020-07-30 | 2022-05-06 | 西北农林科技大学 | Grating-insulation-metal three-layer structured visible light perfect absorber and processing method |
| CN113359219B (en) * | 2021-05-12 | 2023-04-07 | 上海交通大学烟台信息技术研究院 | Two-dimensional periodic symmetry grating spectrum filtering optical film |
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| JP2009071024A (en) * | 2007-09-13 | 2009-04-02 | Fujimori Kogyo Co Ltd | Optical filter for display, and manufacturing method for optical filter for display |
| CN101546003B (en) * | 2009-04-30 | 2010-12-08 | 苏州大学 | Colored filter with grating structure |
| CN102346269B (en) * | 2011-11-09 | 2014-08-13 | 苏州大学 | Reflective color filter |
| CN102789021A (en) * | 2012-08-31 | 2012-11-21 | 苏州大学 | Reflection type color filter |
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Address after: 215123 No. 199 benevolence Road, Suzhou Industrial Park, Jiangsu, China Co-patentee after: SUZHOU SUDAVIG SCIENCE AND TECHNOLOGY GROUP Co.,Ltd. Patentee after: Suzhou University Address before: 215123 No. 199 benevolence Road, Suzhou Industrial Park, Jiangsu, China Co-patentee before: SVG OPTRONICS, Co.,Ltd. Patentee before: Suzhou University |
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