JP2009071024A - Optical filter for display, and manufacturing method for optical filter for display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an optical filter for a display in which its electromagnetic shield film is manufactured with steady quality and inexpensively, and which is manufactured with high productivity and inexpensively as a whole, and to provide a manufacturing method thereof. <P>SOLUTION: The optical filter 60 for a display is formed such that on one surface of a transparent substrate 21, a mesh pattern made of a thin film of a conductive metal and a metal mesh pattern 22 where a plated layer is laminated thereon are formed, wherein around the metal mesh pattern 22, an electrode frame 24 according to the screen size of a display is allocated, the electrode frame 24 is formed by printing a conductive paste onto the metal mesh pattern 22 or pasting a conductive adhesive sheet, and an adhesive layer 51 is laminated onto the metal mesh pattern 22 inside the electrode frame 24, while on the other surface of the transparent substrate 21, at least a near-infrared absorption layer 41, an ultraviolet absorption layer 42, and an optical functional layer 44 containing an antireflection layer 43 are laminated in order from the substrate surface. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a method for manufacturing an optical filter used for various displays such as CRT and PDP (plasma display), and more particularly to an optical filter manufactured with high productivity and at a low cost, and an inexpensive method for manufacturing an optical filter.

  In recent years, in displays such as CRTs and PDPs (plasma displays), electromagnetic waves generated from the front of the display adversely affect the human body and malfunction of surrounding electronic devices has become a problem. Along with vividness, countermeasures against the influence of the display on the surroundings are becoming increasingly important.

In particular, in PDPs where demand is increasing as large thin displays, in addition to electromagnetic wave shielding films, near-infrared absorbing films for preventing misoperation of various remote control switches using the near-infrared wavelength region, UV light absorbing film used to prevent near-infrared absorbers used in the near infrared absorbing film from aging, neon light cut film for adjusting color tone in the visible light region, and external light reflected on the surface of the optical filter An antireflection film or the like for preventing intrusion is combined and configured according to a required function.
For example, Patent Document 1 discloses an optical filter for plasma display in which a metal mesh having electromagnetic wave shielding properties, a near-infrared absorber-containing adhesive layer having near-infrared absorption capability, an antireflection layer, and a neon light absorption layer are laminated. Is disclosed.

On the other hand, as PDPs and the like become popular in large quantities, there is a demand for products that are cheaper and maintain high quality, and there is a need for an optical filter for display that can be manufactured at low cost by increasing productivity. .
Conventionally, when a laminated film is produced by laminating a plurality of films, a so-called roll-to-roll is performed by laminating a plurality of types of functional films wound in a roll shape while rewinding them. It is used as one of the solutions which raise productivity to carry out using the continuous production method by a roll.

However, in the optical filter for display, it is necessary to take a ground (earth) from the electromagnetic wave shielding layer in order to exert the electromagnetic wave shielding function, and the entire surface of the electromagnetic wave shielding film is bonded to another functional film. I can't.
In a general optical filter for a PDP display, an electrode frame is arranged on the outer periphery of a mesh pattern of an electromagnetic wave shield, and a grounding (earth) conductor is connected and wired.
For this reason, it is necessary to expose the electrode frame portion without attaching it to another functional film, and various ideas have been made in this regard.

For example, Patent Document 2 discloses a light-transmitting film (functional film having a function of preventing reflection, etc.) in which an electromagnetic wave shielding film and a notch for providing an open portion at a portion corresponding to an electrode frame portion are formed. ) Are bonded by roll-to-roll.
A portion not covered with the light transmission film in the peripheral portion of the electromagnetic wave shielding film is covered with a conductive tape or a conductive resin to substitute for the electrode frame.

Further, in Patent Document 3, an electromagnetic wave shielding film and an optical filter film (functional film having functions such as antireflection) in which a portion facing the electrode frame portion is cut out, as in Patent Document 2, a roll A method of bonding by a to-roll is disclosed.
JP 2004-333743 A JP 2007-080930 A JP 2007-095915 A

In said patent document 2, it is supposed that an etching mesh and a conductive printing mesh can be used as an electromagnetic wave shielding film.
In Patent Document 3, as a method of forming a mesh of an electromagnetic shielding film, (1) a conductive ink printing mesh, (2) a conductive ink or a plating catalyst is applied, and then the mesh pattern is plated by a photolithography method. Etching of a deposited film formed by etching after forming a plating layer on a metal thin film formed by (3) a metal foil etching mesh, (4) sputtering, etc. A metal mesh by a known method such as a mesh can be used.

  However, as a method of forming a mesh pattern of an electromagnetic shielding film, an etching method uses only a small portion that becomes a thin line portion by etching, and it is a resource that dissolves and removes most other metals. It is a problem from the viewpoint of saving. In addition, there is a problem that the cost for treating the waste liquid generated by the etching method increases.

Further, as a method of forming a mesh pattern of the electromagnetic wave shielding film, in the method of forming a mesh pattern of a conductive thin film and plating on the conductive thin film, the plating metal is laminated only on the mesh pattern portion. It is a resource-saving and more preferable method for producing an electromagnetic wave shielding film with a metal mesh.
In particular, as a method for forming a mesh pattern of an electromagnetic wave shielding film, a method of plating on a developed silver mesh pattern generated by a photographic method can provide a high electromagnetic wave shielding property, and can be produced with a roll-to-roll and is extremely productive. This is a preferred production method because of its high properties.

In a plasma display, the optimum bias angle of the metal mesh of the electromagnetic shielding film varies depending on the resolution of the display panel in order to prevent the moire phenomenon caused by the interference of the metal mesh pattern with the black stripe pattern of the display. Therefore, it is necessary to manufacture an electromagnetic wave shielding film in which an electrode frame is formed for each combination of the display screen size and the bias angle.
Further, in the prior art, as in the above-mentioned Patent Document 3, in the process of forming a mesh pattern of a conductive thin film, which is the first process for manufacturing an electromagnetic wave shielding film for a display, according to the screen size of the display. Since the electrode frame is formed, the screen size of the display to be manufactured cannot be changed during the manufacturing process of the electromagnetic wave shielding film for display.

  Also, in the plating process, if the combination of display screen size and bias angle is different, the electrode frame dimensions, arrangement, and mesh angle will be different, so it is necessary to finely adjust the operating conditions of the plating tank each time. When multiple types of electromagnetic shielding films with electrode frames corresponding to the combination of size and bias angle are mixed and plated in the same plating tank, the plating quality of the metal mesh pattern is not uniformly stable. .

  The present invention has been made in view of the above circumstances, and an electromagnetic wave shielding film is manufactured at a low cost with a stable quality, and as a whole, the optical filter for display and the optical for display manufactured with high productivity and low cost. It is an object to provide an inexpensive method for manufacturing a filter.

  In order to solve the above-mentioned problems, the present invention provides a metal mesh pattern in which a mesh pattern made of a thin film of a conductive metal and a plating layer thereon are formed on one surface of a transparent substrate, and the metal mesh An electrode frame corresponding to the screen size of the display is arranged around the pattern, and the electrode frame is formed by printing a conductive paste on the metal mesh pattern or pasting a conductive adhesive sheet. The pressure-sensitive adhesive layer is formed on the metal mesh pattern in the electrode frame, and the other surface of the transparent substrate is at least near-infrared in order from the substrate surface. Provided is an optical filter for display, comprising an optical functional layer including an absorption layer, an ultraviolet absorption layer, and an antireflection layer.

  The mesh pattern made of a thin film of conductive metal is a developed silver mesh pattern generated by a photographic method, and a negative development method in which developed silver appears in an exposed portion, or developed silver appears in an unexposed portion. Preferably, the developed silver mesh pattern is generated by either of the positive developing methods.

  The mesh pattern made of the conductive metal thin film is a deposited film mesh pattern generated by metal deposition, a printed mesh pattern generated by printing a conductive paste ink, and a paste containing an electroless plating catalyst. It is preferable that any one of the printed mesh patterns generated in the above is selected.

  Moreover, this invention provides the display provided with the optical filter for displays of any one described above.

In order to solve the above-mentioned problems, the present invention is a method for manufacturing an optical filter for display using a roll-shaped electromagnetic wave shielding film, and includes at least the following steps (1), (2), and (3):
(1) On one surface of the long transparent substrate supplied by rewinding from the roll body, a continuous metal mesh pattern is provided in the longitudinal direction of the transparent substrate, and the metal mesh pattern is It has a mesh pattern made of a thin film of conductive metal and a plating layer electrolessly plated and / or electroplated thereon, and is wound from a roll body and the substrate surface side where the metal mesh pattern is not provided. A step of forming a long laminated film by laminating an optical functional film including an at least near-infrared absorbing layer, an ultraviolet absorbing layer, and an antireflection layer, which are supplied back, via an adhesive layer;
(2) An electrode frame corresponding to the screen size of the display is printed by printing a conductive paste on the continuous metal mesh pattern of the long laminated film, or by bonding a conductive adhesive sheet. A step of forming a long optical filter by arranging and forming an adhesive layer on the metal mesh pattern in the electrode frame, while arranging and forming the metal mesh pattern in a longitudinal direction with a predetermined interval.
(3) cutting the long optical filter with the outer dimensions of the electrode frame to form a single-sheet optical filter for each display;
A method for producing an optical filter for display is provided.

  The step of laminating the pressure-sensitive adhesive layer on the metal mesh pattern in the electrode frame is to apply an adhesive layer made of a thermosetting resin or an energy ray curable resin on the metal mesh pattern in the electrode frame, After curing and forming an adhesive resin layer to be the pressure-sensitive adhesive layer, a step of bonding a release film prepared in advance on the adhesive resin layer, or in the electrode frame Any one of the steps of laminating a release film of a sheet having a pressure-sensitive adhesive layer that is cut with an inner dimension of an electrode frame according to the screen size of a display prepared in advance on the metal mesh pattern of It is preferable that

  The mesh pattern made of a thin film of conductive metal is a developed silver mesh pattern generated by a photographic method, and a negative development method in which developed silver appears in an exposed portion, or developed silver appears in an unexposed portion. A developed silver mesh pattern generated by any one of the positive development methods is preferred.

  The mesh pattern made of the conductive metal thin film is a deposited film mesh pattern generated by metal deposition, a printed mesh pattern generated by printing a conductive paste ink, and a paste containing an electroless plating catalyst. It is preferable that any one of the printed mesh patterns generated in the above is selected.

  The near-infrared absorbing layer may be laminated using a near-infrared absorbing double-sided adhesive film in which an adhesive layer is laminated on both sides of a transparent resin layer containing at least one kind of near-infrared absorber. preferable.

  According to the present invention, in the manufacturing process of the electromagnetic wave shielding film used for the optical filter for display, the electrode frame of the display is manufactured after the step of continuously forming the metal mesh pattern seamlessly in the longitudinal direction of the transparent substrate. In this way, it is possible to flexibly cope with changing the production plan of the electromagnetic shielding film for each display screen size.

  In addition, the same metal mesh pattern is formed in the plating process regardless of the screen size of the display to be manufactured, so there is no need to change the operating conditions of the plating tank, and the electromagnetic mesh shield with stable metal mesh pattern plating finish quality. It is possible to produce a film. In particular, when electrolytic plating is performed, the quality of the metal mesh pattern finish can be remarkably stabilized as compared with the prior art.

  An electromagnetic shielding film that is rewound and supplied from a roll body and a long laminated film having at least a near-infrared absorbing layer, an ultraviolet absorbing layer, and an antireflection layer that are rewound and supplied from the roll body are bonded together and long. Productivity can be improved by manufacturing the process of forming a laminar laminated film with a roll-to-roll process.

  ADVANTAGE OF THE INVENTION According to this invention, while the electromagnetic wave shielding film is manufactured cheaply with stable quality, the optical filter for displays manufactured as a whole with high productivity and low cost, and the inexpensive manufacturing method of the optical filter for display are provided. be able to.

The present invention will be described below with reference to the drawings based on the best mode.
FIG. 1 is a partial plan view showing an example of an arrangement of a continuous mesh pattern plated on a conductive thin film and a power feeding layer, which is a roll body of an electromagnetic wave shielding film used in the present invention. FIG. 2 is a partial plan view showing an example of the arrangement of mesh patterns, electrode frames, and power feeding layers in an electromagnetic wave shielding film for PDP, for example, in the prior art.
FIG. 3 is a partial plan view showing an example of a long laminated film in which an electrode frame is formed in the present invention. FIG. 4 shows an electromagnetic wave shielding film that is supplied by rewinding from a roll body, and a laminated film that includes at least a near-infrared absorbing layer, an ultraviolet absorbing layer, and an antireflection layer that are rewinded and supplied from the roll body. It is a conceptual diagram which shows the process of bonding and forming a elongate laminated film.

FIG. 5 is a plan view showing an example of a single optical filter. FIG. 6 is a cross-sectional view taken along the line AA in FIG. 5 and illustrating an example of a single optical filter.
FIG. 7 is a schematic configuration diagram illustrating an example of an electrolytic plating apparatus. FIG. 8 is a schematic configuration diagram illustrating an example of an electroless plating apparatus.

  As shown in FIGS. 5 and 6, the optical filter for display according to the present invention is a metal in which a mesh pattern made of a conductive metal thin film and a plating layer are laminated on one surface of a transparent substrate 21. A mesh pattern 22 is formed, and an electrode frame 24 corresponding to the screen size of the display formed by printing a conductive paste around the metal mesh pattern 22 or bonding a conductive adhesive sheet. An adhesive layer 51 is laminated on the metal mesh pattern 22 in the electrode frame 24, and at least the near-infrared absorbing layer 41 in order from the substrate surface on the other surface of the transparent substrate 21. An optical filter for display 60, wherein an optical functional layer 44 including an ultraviolet absorbing layer and an antireflection layer 43 is laminated.

  The mesh pattern made of a conductive metal thin film is preferably a developed silver continuous mesh pattern produced by a photographic method. The developed silver mesh pattern generated by this photographic method is produced by a negative developing method in which developed silver appears in the exposed portion, or by a positive developing method in which developed silver appears in the unexposed portion. It is preferred that any of those produced.

  In addition, the mesh pattern made of the conductive metal thin film is a deposited film mesh pattern generated by metal deposition, a printed mesh pattern generated by printing a conductive paste ink, or a paste containing an electroless plating catalyst. It is preferably one selected from printed mesh patterns generated by printing.

The method for producing an optical filter for display according to the present invention is a method for producing an optical filter for display using an electromagnetic wave shielding film of a roll body,
As shown in FIG. 1 and FIG. 4, a metal mesh pattern that is seamless and continuous in the longitudinal direction of the transparent base material 21 on one surface of the long transparent base material 21 that is rewound and supplied from the roll body 30. 22, and the metal mesh pattern 22 has a mesh pattern made of a conductive metal thin film and a plating layer electrolessly plated and / or electroplated thereon. A base material surface side that is not provided and an optical functional film 32 including at least a long near-infrared absorbing layer, an ultraviolet absorbing layer, and an antireflection layer that are rewound and supplied from the roll body 31 are combined with an adhesive layer ( A step (step 1) of forming a long laminated film 33 by laminating through (not shown);
As shown in FIG. 3, on the continuous metal mesh pattern 22 of the long laminated film 33, as shown in FIG. 3, the conductive paste is printed or the conductive adhesive sheet is bonded to the screen size of the display. The corresponding electrode frame 24 is formed by being arranged at a predetermined interval in the longitudinal direction of the metal mesh pattern, and an adhesive layer 51 is laminated on the metal mesh pattern 22 in the electrode frame 24 to form a long Forming the optical filter of (Step 2),
Cutting the long optical filter with the outer dimensions of the electrode frame 24 to form a single-wafer optical filter 60 for each display (step 3).

  Here, the optical functional film 32 (see FIG. 4) including at least the near-infrared absorbing layer, the ultraviolet absorbing layer, and the antireflection layer completely covers the electrode frame disposed on the long electromagnetic shielding film 20. do it. For this reason, the width of the optical functional film 32 including at least the long near-infrared absorbing layer, the ultraviolet absorbing layer, and the antireflection layer is perpendicular to the longitudinal direction of the electrode disposed on the long electromagnetic shielding film 20. It should just be more than the same length as the external dimension of the horizontal width orthogonal to the longitudinal direction of a frame.

On the metal mesh pattern 22 in the electrode frame 24 of FIG. 5, an adhesive layer made of a thermosetting resin or an energy ray curable resin is applied and cured to form an adhesive resin layer (adhesive layer) 51. Is formed.
In addition, on the metal mesh pattern 22 in the electrode frame 24, the sheet having a pressure-sensitive adhesive layer for bonding, which is cut with an inner dimension of the electrode frame corresponding to the screen size of the display prepared in advance, is peeled off. The adhesive layer 51 may be formed by laminating a film.
Examples of the adhesive resin (pressure-sensitive adhesive layer) that can be used in the present invention include a thermosetting resin, an ultraviolet (UV) curable resin, a visible light curable resin, and an electron beam curable resin.

The transparent resin is not particularly limited as long as it is cured by the input energy. Examples of the energy to be input include heating and energy rays (ultraviolet rays, electron beams, and in some cases, visible rays).
In the case of energy ray curable resin, it is possible to complete the curing by performing a heat treatment as necessary after the energy ray irradiation. Of course, two or more types of energy beam irradiation may be combined.

Examples of the thermosetting resin include polyester resins, acrylic resins, epoxy resins, phenol resins, and modified resins thereof.
Resin compounds used for energy ray curable adhesive resins include monofunctional (meth) acrylate components such as alkyl acrylates and alkyl methacrylates; di-, tri- or poly (meth) acrylates of polyhydric alcohols and hydroxyalkyl (meth) acrylates Multifunctional (meth) acrylate components such as; acrylic acid, methacrylic acid, crotonic acid, itaconic acid, itaconic anhydride, maleic acid, maleic anhydride, fumaric acid, glycidyl (meth) acrylate, N-methylolacrylamide, etc. Group-containing monomer component; vinyl acetate, styrene, acrylic urethane oligomer and the like.

  In step 1 relating to the method for producing an optical filter for display according to the present invention, the electromagnetic wave shielding film 20 unwound from the roll body 30 can be used in common regardless of the screen size of the display to be produced, as shown in FIG. Therefore, the specific electrode frame is not disposed on the metal mesh pattern 22 that is seamlessly continuous in the longitudinal direction of the transparent base material 21. In this way, the same metal mesh pattern 22 that is continuously provided in the longitudinal direction of the transparent substrate 21 may be formed.

  As a result, in the plating step, which is a step after forming a mesh pattern made of a conductive metal thin film, the same metal mesh pattern 22 has only to be plated, so it is necessary to change the operating conditions of the plating tank each time. The plating finish quality of the metal mesh pattern can be stabilized. In particular, when electrolytic plating is performed, the quality of the metal mesh pattern finish can be remarkably stabilized as compared with the prior art.

  In FIG. 1, the mesh pattern 22 in the electromagnetic wave shielding film 20 is obtained by forming a plating layer on at least a developed silver mesh pattern of an original fabric by electrolytic plating. Although the width | variety of the continuous electric power feeding layer 23 is based also on the width | variety of the electric power feeding roll 7 currently used in FIG. 7, it is about 15-100 mm, More preferably, it is 15-80 mm, More preferably, it is 20-60 mm.

  In order to prevent the moire phenomenon caused by the interference of the metal mesh pattern 22 with the black stripe pattern of the display, it is necessary to form the metal mesh pattern so that the optimum bias angle is obtained according to the resolution of the display panel.

In the present invention, as shown in FIG. 3, the metal mesh pattern 22 has an optimum bias angle (θ) according to the resolution of the display panel, and two opposing sides of the electrode frame 24 are It is preferably formed so as to be parallel to the longitudinal direction of the transparent substrate 21.
As a result, the process of laminating the pressure-sensitive adhesive layer on the metal mesh pattern in the electrode frame 24 and forming a long optical filter can be easily automated.

  In the present specification, the bias angle of the metal mesh pattern 22 formed on the electromagnetic wave shielding film 20 refers to the optimum bias angle of the metal mesh pattern 22 with respect to the electrode frame 24 provided.

When electrolytic plating is applied to a mesh pattern made of a conductive metal thin film, the electromagnetic wave shielding film 20 unwound from the roll body is applied to at least one surface of a long transparent substrate 21 as shown in FIG. The metal mesh pattern 22 provided continuously in the longitudinal direction of the transparent substrate 21 is formed, and the continuous power feeding layers 23 and 23 having a constant width continuous in the longitudinal direction of the transparent substrate 21 are formed into the metal mesh pattern 22. Those provided in contact with both outer sides in the width direction are preferable.
Electrolytic plating is energized through the continuous power supply layers 23 and 23. When only electroless plating is performed and electrolytic plating is not performed, the continuous power feeding layers 23 and 23 may not be provided.

  Here, the metal mesh pattern 22 is a developed silver mesh pattern generated by a photographic process, a deposited film mesh pattern generated by metal deposition, a printed mesh pattern generated by printing a conductive paste ink, and electroless plating. A mesh pattern comprising a conductive metal thin film formed using any method selected from printed mesh patterns generated by printing a catalyst-containing paste, and the conductive metal thin film. It is preferable to have a plating layer produced by performing electroless plating and / or electrolytic plating on the mesh pattern.

In the prior art, as shown in FIG. 2, the electromagnetic wave shielding film 90 is formed on a long transparent base material 91 at a predetermined interval with a mesh pattern 92, 92,. The electrode frames 94, 94,... Are arranged, and the power supply layers 93, 93 are provided on both outer sides in the width direction of the respective electrode frames 94.
Thus, in the prior art, the electrode frame 94 corresponding to the screen size of the display is formed in the step of forming the conductive thin film mesh pattern, which is the first step of manufacturing the electromagnetic wave shielding film for display. Therefore, the screen size of the display to be manufactured could not be changed during the manufacturing process of the electromagnetic wave shielding film for display.

  In the prior art, in the electroplating apparatus 1 shown in FIG. 7, the roll sheet 3 is transferred stepwise by the transfer rolls 4, 4, 4,. This is an intermittent method in which electrolytic plating is performed for each mesh pattern 92 corresponding to one screen size in FIG. Such a conventional technique cannot cope with a technique of forming a continuous mesh pattern and continuously performing electrolytic plating.

In the present invention, an electrode frame corresponding to the screen size of the display is printed by printing a conductive paste on a continuous metal mesh pattern of a long electromagnetic shielding film, or by bonding a conductive adhesive sheet. The metal mesh pattern is formed by being arranged at a predetermined interval in the longitudinal direction.
This makes it possible to flexibly cope with changing the production plan of the electromagnetic shielding film for each display screen size.
Moreover, in this invention, since the mesh pattern is continuously provided in the longitudinal direction of the transparent base material 21 seamlessly, electrolytic plating can be performed continuously on it.

(Electromagnetic wave shielding film with metal mesh pattern laminated)
In the present invention, prior to the preparation of the plating layer, a mesh pattern made of a conductive metal thin film is formed on one surface of a transparent substrate, and then wound into a roll shape to form a mesh of the conductive metal thin film. An original fabric roll body in which a pattern is generated is produced.

This raw film is produced by printing a developed silver mesh pattern generated by a photographic method, a deposited film mesh pattern generated by metal deposition, and a conductive paste ink as a mesh pattern of the conductive metal thin film. A printed mesh pattern and a mesh pattern formed by any method selected from a printed mesh pattern generated by printing a paste containing an electroless plating catalyst.
The electromagnetic wave shielding film on which the metal mesh pattern is laminated can be produced by applying a plating layer by electroless plating and / or electrolytic plating on the conductive metal thin film mesh pattern.

  In the present invention, a conductive metal thin film mesh pattern is produced by printing a developed silver mesh pattern generated by a photographic method, a deposited film mesh pattern generated by metal deposition, and a conductive paste ink. Printed mesh patterns and printed mesh patterns generated by printing a paste containing an electroless plating catalyst can be mentioned. The electrolytic plating and the electrolytic plating method will be described in order.

(Developed silver mesh pattern generated by photographic process)
A method for producing a developed silver mesh pattern generated by a photographic method that can be applied to the present invention is to form a fine-line mesh pattern with metallic silver developed by a photographic method.
Hereinafter, the raw roll body formed with the developed silver mesh pattern formed by the photographic process and the method for producing the raw roll body that is electrolytically plated on the developed silver mesh pattern to form a metal mesh pattern will be described.

  In the exposure development method based on this photographic manufacturing method, as described above, (a) developed silver appears in the exposed portion that is not covered with the exposure mask, that is, the developed silver appears in a shape opposite to the exposure mask. A so-called negative-type exposure development method, and (b) a so-called positive-type exposure development method in which developed silver appears in a portion that is covered with an exposure mask and not exposed, that is, developed silver appears in the same shape as the exposure mask. There are two ways. Either (a) a negative exposure / development method or (b) a positive exposure / development method can be applied to the present invention.

(Photo production method)
Hereinafter, a method for producing a developed silver mesh pattern by a positive exposure / development method (DTR method) will be described. In the case of the DTR method, it is preferable that a physical development nucleus layer is provided in advance on the transparent substrate surface. As the physical development nuclei, fine particles (having a particle size of about 1 to several tens of nm) made of heavy metals or sulfides thereof are used. Examples thereof include colloids such as gold and silver, metal sulfides obtained by mixing water-soluble salts such as palladium and zinc and sulfides, and the like. The fine particle layer of these physical development nuclei can be provided on the transparent substrate by a vacuum deposition method, a cathode sputtering method, a coating method or the like. From the viewpoint of production efficiency, a coating method is preferably used. The content of physical development nuclei in the physical development nuclei layer is suitably about 0.1 to 10 mg per square meter in solid content.

  The transparent substrate can be provided with an adhesive layer of a polymer latex layer such as vinylidene chloride or polyurethane, and an intermediate layer made of a hydrophilic binder such as gelatin can be provided between the adhesive layer and the physical development nucleus layer. it can.

  The physical development nucleus layer preferably contains a hydrophilic binder. The amount of the hydrophilic binder is preferably about 10 to 300% by mass with respect to the physical development nucleus. As the hydrophilic binder, gelatin, gum arabic, cellulose, albumin, casein, sodium alginate, various starches, polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylamide, a copolymer of acrylamide and vinyl imidazole, and the like can be used. The physical development nucleus layer may also contain a hydrophilic binder crosslinking agent.

  The physical development nucleus layer and the intermediate layer can be applied by an application method such as dip coating, slide coating, curtain coating, bar coating, air knife coating, roll coating, gravure coating, spray coating, and the like. In the present invention, the physical development nucleus layer is preferably provided as a continuous and uniform layer by the above-described coating method.

  The supply of silver halide for depositing metallic silver on the physical development nucleus layer is performed by a method in which the physical development nucleus layer and the silver halide emulsion layer are integrally formed in this order on a transparent substrate, or another paper or plastic resin. There is a method of supplying a soluble silver complex salt from a silver halide emulsion layer provided on a substrate such as a film. From the viewpoint of cost and production efficiency, the former physical development nucleus layer and the silver halide emulsion layer are preferably provided integrally.

The silver halide emulsion can be produced according to a general method for producing a silver halide emulsion of a silver halide photographic light-sensitive material. The silver halide emulsion is usually prepared by mixing and ripening an aqueous silver nitrate solution, an aqueous halogen solution of sodium chloride or sodium bromide in the presence of gelatin.
The silver halide composition of the silver halide emulsion layer preferably contains 80 mol% or more of silver chloride, and more preferably 90 mol% or more is silver chloride. The conductivity of the physically developed silver formed by increasing the silver chloride content is improved.

  When producing an electromagnetic shielding material using a photosensitive material in which a silver halide emulsion layer is coated directly on the physical development nucleus layer or via an intermediate layer, an arbitrary fine line pattern such as a mesh pattern is used. After exposing the transparent original and the photosensitive material in close contact, or after scanning and exposing the photosensitive material to a digital image of an arbitrary fine line pattern with various laser light output machines, in the presence of a soluble silver complex salt forming agent and a reducing agent, Silver complex diffusion transfer development (DTR development) occurs by processing in an alkaline solution, the silver halide in the unexposed area is dissolved to form a silver complex salt, which is reduced on the physical development nuclei, and metallic silver is precipitated to form a fine line. A physically developed silver thin film with a pattern can be obtained. The exposed portion is chemically developed in the silver halide emulsion layer to become blackened silver. After development, the silver halide emulsion layer and the intermediate layer, or the protective layer provided as necessary, are washed away with water, and a physically developed silver thin film having a fine line pattern is exposed on the surface.

  After DTR development, the silver halide emulsion layer or the like provided on the physical development nucleus layer may be removed by washing with water or transferring and peeling to a release paper or the like. There are two methods for removing the water washing: a method of removing hot water using a scrubbing roller or the like while jetting it with a nozzle or the like, and a method of removing hot water by jetting with a nozzle or the like.

  On the other hand, when the soluble silver complex salt is supplied from a silver halide emulsion layer provided on a substrate different from the transparent substrate on which the physical development nucleus layer is coated, the silver halide emulsion layer is exposed as described above. After that, a transparent substrate coated with a physical development nucleus layer and another photosensitive material coated with a silver halide emulsion layer are superposed in an alkaline solution in the presence of a soluble silver complexing agent and a reducing agent. After several tens of seconds to several minutes after taking out from the alkaline solution, the both are removed to obtain a physically developed silver thin film having a fine line pattern deposited on the physical development nuclei.

(Development method)
Next, a soluble silver complex salt forming agent, a reducing agent, and an alkali solution necessary for silver complex diffusion transfer development will be described. The soluble silver complex salt forming agent is a compound that dissolves silver halide to form a soluble silver complex salt, and the reducing agent is a compound that reduces this soluble silver complex salt to precipitate metallic silver on physical development nuclei. These actions are performed in an alkaline solution.

  Examples of the soluble silver complex forming agent used in the present invention include sodium thiosulfate, thiosulfate such as ammonium thiosulfate, thiocyanate such as sodium thiocyanate and ammonium thiocyanate, alkanolamine, sodium sulfite, and potassium bisulfite. Sulfites such as T. H. Examples include the compounds described in 474-475 (1977) of James The Theory of the Photographic Process 4th edition.

  As the reducing agent, a developing agent known in the field of photographic development can be used. For example, hydroquinone, catechol, pyrogallol, methylhydroquinone, polyhydroxybenzenes such as chlorohydroquinone, 1-phenyl-4,4-dimethyl-3-pyrazolidone, 1-phenyl-3-pyrazolidone, 1-phenyl-4-methyl- Examples include 3-pyrazolidones such as 4-hydroxymethyl-3-pyrazolidone, paramethylaminophenol, paraaminophenol, parahydroxyphenylglycine, paraphenylenediamine, and the like.

The above-mentioned soluble silver complex salt forming agent and reducing agent may be applied to the transparent substrate together with the physical development nucleus layer, added to the silver halide emulsion layer, or contained in the alkaline solution. It may be allowed to be contained, and may be further contained in a plurality of positions, but is preferably contained at least in the alkaline liquid.
The content of the soluble silver complex salt forming agent in the alkaline solution is suitably used in the range of 0.1 to 5 mol per liter of the developer, and the reducing agent is 0.05 to 1 per liter of the developer. It is suitable to use in the molar range.

  The pH of the alkaline solution is preferably 10 or more, and more preferably in the range of 11-14. Application of the alkaline solution for silver complex diffusion transfer development may be an immersion method or a coating method. The immersion method is, for example, transporting while immersing a transparent substrate provided with a physical development nucleus layer and a silver halide emulsion layer in an alkaline solution stored in a large amount in a tank. About 40 to 120 ml of alkali solution per square meter is applied on the silver halide emulsion layer.

(Exposure method)
The silver halide emulsion layer is sensitive to various light sources. As one method for producing an electromagnetic wave shielding material, for example, formation of physically developed silver having a fine line pattern such as a mesh shape can be mentioned. In this case, the silver halide emulsion layer is exposed in a fine line pattern. As an exposure method, a method of exposing a fine line pattern transmission original and a silver halide emulsion layer in close contact with each other, or scanning exposure using various laser beams. There are ways to do this. The former contact exposure is possible even if the silver halide has relatively low photosensitivity, but in the case of scanning exposure using laser light, relatively high photosensitivity is required. Therefore, when the latter exposure method is used, the silver halide may be subjected to chemical sensitization or spectral sensitization with a sensitizing dye in order to increase the sensitivity of the silver halide.

  Chemical sensitization includes metal sensitization using a gold compound or silver compound, sulfur sensitization using a sulfur compound, or a combination thereof. Gold-sulfur sensitization using a gold compound and a sulfur compound in combination is preferable. In the above-described method of exposing with laser light, a laser beam having an oscillation wavelength of 450 nm or less, for example, a blue semiconductor laser (also referred to as a violet laser diode) having an oscillation wavelength of 400 to 430 nm is used. It can be handled even under a yellow fluorescent lamp.

(Exposure equipment)
As an exposure apparatus using the above exposure method, there are a single wafer processing type exposure apparatus using a single wafer type exposure mask (photomask) and a continuous exposure apparatus capable of forming a continuous pattern. A single wafer processing type exposure apparatus uses a single wafer type exposure mask (photomask) on which a predetermined mask pattern is formed, intermittently feeds a roll sheet to the exposure apparatus, and evacuates the inside of the apparatus for exposure. After the mask and the substrate are brought into close contact with each other and no gap is formed, exposure is performed with, for example, ultraviolet rays. In a single wafer processing type exposure apparatus, vacuum exhaust, exposure, and release to the atmosphere are intermittently performed, so that the processing speed is slow and a seamless continuous pattern cannot be obtained.

On the other hand, in the present invention, when producing a roll roll having a roll sheet in which a mesh pattern of a thin film of a conductive metal is provided on a long transparent base material, The thin film mesh pattern 22 needs to be provided continuously and seamlessly in the longitudinal direction of the transparent substrate 21.
For this reason, for example, a continuous exposure apparatus is used when producing an original roll body using a developed silver mesh pattern generated by a photographic process (not shown).

  As an example of a continuous exposure apparatus, a cylindrical drum made of a material that transmits light used for exposure in a photographic manufacturing method, an exposure mask portion provided on the outer peripheral wall of the cylindrical drum, and an exposure arranged inside the cylindrical drum And a light source for exposing a transparent substrate wound around the cylindrical drum by light emitted from the light source inside the cylindrical drum. In this continuous exposure apparatus, a light source cover having an opening that transmits light in a specific irradiation direction can be provided around the light source for exposure. The pattern for exposing the transparent substrate is determined by the pattern of the portion that transmits light in the exposure mask portion. The exposure mask portion is disposed on the cylindrical drum by, for example, being provided on the surface (inner surface or outer surface) of the outer peripheral wall of the cylindrical drum, or being inserted or sandwiched inside the outer peripheral wall.

  In this continuous exposure apparatus, since the cylindrical drum rotates at the same speed as the transparent substrate that is continuously transferred, the transparent drum is transparent while the portions of the transparent substrate are exposed at the portions wound around the cylindrical drum. It is possible to continue the exposure for the required time without shifting the pattern of the exposure mask portion with respect to the base material (the pattern of the light transmitting portion and the light shielding portion).

(Transparent substrate)
The transparent substrate 21 used in the present invention is preferably a transparent substrate having transparency in the visible region and generally having a total light transmittance of 90% or more. Especially, the resin film which has flexibility is used suitably at the point which is easy to handle. Specific examples of the transparent resin film used for the transparent substrate 21 include polyester resins such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), acrylic resins, epoxy resins, fluorine resins, silicone resins, polycarbonate resins, Single-layer film having a thickness of 50 to 300 μm made of acetate resin, triacetate resin, polyarylate resin, polyvinyl chloride, polysulfone resin, polyether sulfone resin, polyimide resin, polyamide resin, polyolefin resin, cyclic polyolefin resin, or the like A composite film having a plurality of layers made of a resin is exemplified.

(Thin line mesh pattern)
As described above, there are fine line patterns in which, for example, fine lines having a line width of about 10 to 100 μm are provided in a grid pattern in the vertical and horizontal directions. If the narrow line width is reduced and the interval between the gratings is increased, the translucency increases. However, the conductivity decreases, and conversely, if the fine line width is increased to reduce the lattice spacing, the translucency is decreased and the conductivity is increased. The silver image formed by physical development of an arbitrary fine line pattern formed on the transparent substrate according to the present invention has a translucency with a total light transmittance of 50% or more and a conductivity with a surface resistivity of 10 ohms / □ or less simultaneously. It is difficult to satisfy. Specifically, the silver image by this physical development has a conductivity of a surface resistivity of 50 ohms / square or less, preferably 20 ohms / square or less, but a pattern with a fine line width of 50 μm or less, for example, a fine line width of 20 μm. When the total light transmittance is 50% or more, the surface resistivity becomes several hundred ohms / square to 1000 ohms / square or more.

However, the silver image by the physical development itself forms a silver image because the metallic silver particles forming the silver image obtained after the development processing are extremely small and the amount of the hydrophilic binder present in the silver image is extremely small. Since the silver image is formed in a state close to the close-packed state and the electroconductive property is obtained, the fine silver wire pattern can be obtained by plating with a metal such as copper or nickel, especially by electroplating. Is a transparent thin line pattern having a total light transmittance of 50% or more, preferably 60% or more, when the thickness is 0.5 to 15 μm and the line width is 10 to 50 μm. The conductivity of □ or less, preferably 7 ohm / □ or less can be maintained.
In order to improve the total light transmittance of the metal mesh, it is necessary to sufficiently increase the area of the light transmission portion between the fine lines with respect to the area of the region where the fine lines are provided. For this reason, it is preferable that the space | interval of a thin wire | line is 100-900 micrometers, More preferably, it is 150-700 micrometers.

  The thickness of the metal-plated fine line pattern can be arbitrarily changed according to desired characteristics, but is in the range of 0.5 to 15 μm, preferably 2 to 12 μm. Moreover, the electromagnetic shielding material produced by the above-mentioned method can obtain a shielding effect of 30 dB or more over a wide frequency band such as 30 MHz to 1,000 MHz.

  The thin line pattern of physically developed silver can be plated by either electroless plating, electrolytic plating, or a combination of the two. However, when preparing an electromagnetic shielding layer on a transparent substrate, From the viewpoint that a roll-like long web provided with a physical development nucleus layer and a silver halide emulsion layer can be subjected to at least a series of treatments such as exposure of a fine line pattern, development treatment and plating treatment. Is preferred.

  In the present invention, the metal plating method can be performed by a known method. For example, the electrolytic plating method is a conventionally known method such as copper, nickel, silver, gold, solder, or a multilayer or composite system of copper / nickel. For these, reference can be made to documents such as “Surface Treatment Technology Overview; Technical Data Center, Inc., December 21, 1987, first edition, pages 281 to 422”.

It is preferable to use copper and / or nickel for reasons such as easy plating, excellent electrical conductivity, plating on a thick film, and low cost. As an example of electrolytic plating, the transparent base material on which the above-described physically developed silver is formed is immersed in a bath mainly composed of copper sulfate, sulfuric acid and the like, and a current density of 1 to 20 amperes / percent at 10 to 40 ° C. Plating can be performed by energizing at dm ² .
The type of electrolytic plating tank to be used may be either a vertical type or a horizontal type, but the length of the electrolytic plating tank is determined according to the transfer speed of the roll sheet 3 so as to ensure a predetermined plating residence time. To do.

  The electromagnetic wave shielding layer (metal mesh pattern) obtained by the above method has a total light transmittance of 50% or more and a surface resistivity of 10 when the mesh pattern has a thickness of 0.5 to 15 μm and a line width of 10 to 50 μm. It has excellent translucency and electrical conductivity of ohm / square or less, and can exhibit a shielding effect of 30 dB or more over a wide frequency band such as 30 MHz to 1,000 MHz.

  Next, a method for forming the electroless plating layer and the electrolytic plating layer will be described with reference to suitable examples.

(Method for forming electroless plating layer)
In order to form the electroless plating layer on the conductive metal thin film mesh pattern, the transparent substrate provided with the conductive metal thin film mesh pattern is continuously drawn out from the raw roll body, A plating layer is formed on the mesh pattern of the conductive metal thin film by at least electroless plating. The plated roll is subsequently subjected to electrolytic plating and then wound up again to form a roll body, which is then transferred to a step of forming an electrode frame corresponding to the screen size of the next display.

An electroless plating apparatus (see, for example, FIG. 8) is an apparatus that continuously performs electroless plating on a roll body on which a conductive mesh pattern is formed.
In the electroless plating apparatus 16 shown in FIG. 8, the raw fabric roll body 2 is obtained by winding a roll sheet 3 in which a conductive metal thin film mesh pattern is provided on a long transparent base material into a roll shape. . The roll sheet 3 fed out from the raw roll body 2 is transferred from left to right in the figure by transfer rolls 4, 4, 4,. The roll sheet 3 is passed through the water cleaning tank 5 and cleaned, and after unnecessary foreign matters and contaminants are removed, the roll sheet 3 is transferred to the electroless plating tank 17 for performing an electroless plating process.

  In the electroless plating tank 17, electroless plating is performed through the electroless plating solution 18, and an electroless plating layer is deposited on the conductive mesh pattern on the surface of the roll sheet 3. The temperature of the electroless plating solution 18 is controlled by a temperature regulator (not shown) so as to be a predetermined temperature. The electroless plating solution 18 can leak and fall from a gap (slit) through which the roll sheet 3 of the electroless plating tank 17 is passed. Therefore, a receiving tank 10 that receives the leaked electroless plating solution 18 is installed below the electroless plating tank 17, and the electroless plating solution 18 received in the receiving tank 10 is supplied to the circulation pump 11 and the filter 12. Then, it is configured to be recirculated to the electroless plating tank 17 again.

  The roll sheet 3 exiting the electroless plating tank 17 is washed with an unnecessary electroless plating solution 18 in the water washing tank 13 and subsequently subjected to an electroplating process, or drained and dried in a drier 14, and again. It is wound up and becomes a roll body 15 of an electromagnetic wave shielding film.

(Method for forming electrolytic plating layer)
In order to form a plating layer on a conductive metal thin film mesh pattern or an electroless plated mesh pattern, a transparent base material provided with a conductive metal thin film mesh pattern is continuously formed from the raw roll body. After the feeding, a plating layer is formed on the mesh pattern of the conductive metal thin film by at least electrolytic plating. In addition, the plated roll is wound up again to form a roll body of an electromagnetic wave shielding film, and transferred to a step of forming an electrode frame corresponding to the screen size of the next display.

  An electroplating apparatus 1 shown in FIG. 7 is an apparatus that continuously performs electroplating on a roll body on which a conductive mesh pattern is formed. In the electroplating apparatus 1 shown in FIG. 7, the raw fabric roll body 2 is obtained by winding a roll sheet 3 provided with a conductive metal thin film mesh pattern on a long transparent base material into a roll shape. The roll sheet 3 fed out from the raw roll body 2 is transferred from left to right in the figure by transfer rolls 4, 4, 4,. First, the roll sheet 3 is passed through the water washing tank 5 and washed to remove unnecessary foreign matters and contaminants. If necessary, it is passed through an electroless plating tank (not shown) and electrolessly plated on a mesh pattern made of a conductive metal thin film, and then transferred to at least the electrolytic plating tank 6.

  In the electrolytic plating tank 6, electrolytic plating is performed between the feed rolls 7, 7 serving as the cathode and the positive electrode plates 8, 8 serving as the anode through the electrolytic plating solution 9, and the conductive sheet thin film of the roll sheet 3 is formed. An electrolytic plating layer is deposited on the mesh pattern or on the electroless plating layer formed thereon. The temperature of the electrolytic plating solution 9 is controlled by a temperature regulator (not shown) so as to be a predetermined temperature. The power supply rolls 7 and 7 are provided at the entrance for the roll sheet 3 to enter and exit the electrolytic plating tank 6, and the electrolytic plating solution 9 leaks from the gap between the power supply rolls 7 and 7 of the electrolytic plating tank 6. Can fall.

For this reason, a receiving tank 10 for receiving the leaked electrolytic plating solution 9 is installed below the electrolytic plating tank 6, and the electrolytic plating solution 9 received in the receiving tank 10 passes through the circulation pump 11 and the filter 12 again. It is configured to recirculate to the electrolytic plating tank 6.
The roll sheet 3 exiting the electrolytic plating tank 6 is washed with an unnecessary electrolytic plating solution 9 in a water washing tank 13, then drained and dried in a drier 14, and wound up again to form a plated mesh pattern. The roll-shaped electromagnetic wave shielding material roll body 15 is obtained.

  If necessary, an electroless plating tank (not shown) is disposed between the water washing tank 5 and the electrolytic plating tank 6, and electroless plating is performed on the developed silver mesh pattern generated by exposure and development. Thereafter, it may be transferred to the electrolytic plating tank 6 to perform electrolytic plating. Thus, an electromagnetic wave shielding film with higher performance can be obtained by using both electroless plating and electrolytic plating in the plating step.

In the present invention, at the time of electrolytic plating in the electrolytic plating tank 6, a feed layer for electrolytic plating (hereinafter sometimes referred to as “continuous feed layer”) provided continuously in the longitudinal direction on the roll sheet 3. Then, power is supplied to the developed silver mesh pattern.
The continuous power supply layer 23 is in contact with the power supply rolls 7 and 7 serving as a cathode before and after the portion where the roll sheet 3 is introduced into the electrolytic plating tank 6. Accordingly, during electrolytic plating, an electrolytic current is supplied to the mesh pattern 22 through the continuous power supply layer 23 of FIG. 1, and electrolysis is applied on the developed silver mesh pattern and / or the electroless plating layer formed thereon. A plating layer is formed by plating.

  In the present invention, as shown in FIG. 7, the roll sheet 3 is continuously unwound from the exposed and developed raw roll body 2 and transferred to the electrolytic plating tank 6 by the continuous feed of the transfer rolls 4, 4,. In order to perform electrolytic plating continuously without interruption, a metal mesh pattern 22 provided on at least one surface of a long transparent base material 21 is formed of the transparent base material 21 as in the roll sheet 20 shown in FIG. A structure in which continuous feed layers 23 and 23 having a constant width continuous in the longitudinal direction of the transparent base material 21 are provided in contact with both outer sides in the width direction of the metal mesh pattern 22 are provided continuously in the longitudinal direction. Used.

  The raw fabric roll body 2 in FIG. 7 includes a developed silver mesh pattern and a constant width metal mesh provided continuously in the longitudinal direction of the transparent base material 21 on at least one surface of the long transparent base material 21. A continuous feeding layer 23 made of a metal thin film is formed. In order to provide the developed silver mesh pattern continuously in the longitudinal direction of the transparent substrate 21, the development is performed after the continuous mesh pattern is baked by the continuous exposure apparatus in the present invention.

In the present invention, the type of plating metal used in the electrolytic plating method can be a conventionally known one such as copper, nickel, silver, gold, solder, or a multilayer or composite system of copper / nickel, but plating is easy, In addition, it is preferable to use copper or nickel for reasons such as excellent conductivity, plating on a thick film, and low cost.
The surface of the electrolytic plating of copper or nickel can be blackened using a nickel blackening solution to suppress the metallic luster of the plated surface and increase the image contrast of the display.

(Deposited film mesh pattern generated by metal deposition)
Also in the production of a conductive metal thin film mesh pattern using a metal vapor-deposited film, the same transparent substrate and fine wire mesh pattern as those used in the above-described photographic method are used.
Here, in order to avoid a duplicate description, only items specific to the mesh pattern of the conductive metal thin film by the metal vapor deposition film will be described below.

As a vapor deposition method used in the present invention, a vacuum vapor deposition method, a sputtering method, an ion plating method, or the like can be used. However, the vacuum vapor deposition method is preferably used because of the ease of operation.
Electrolytic plating with a plating film thickness of 2 to 20 μm is processed on a vacuum deposition film with a deposition film thickness of 0.01 to 0.2 μm.
Copper or silver is preferably used as the type of metal to be deposited.
When the thickness of the deposited film is thicker than 0.2 μm, the processing time is significantly increased and the cost is increased.

In this invention, after forming a vapor deposition film on one surface of a transparent base material, an etching process is performed using a well-known photolithographic method, and the original fabric of the mesh pattern by a metal vapor deposition film is produced.
That is, a photoresist is applied on the metal vapor-deposited film layer, the mask film is exposed on the photoresist and exposed, the exposed portion is dissolved and removed with a developing solution, washed and dried, and then an etching solution is applied. Etching is performed. Further, the remaining photoresist is removed using an organic solvent, and a conductive metal thin film mesh pattern is formed by a metal vapor deposition film.
For the photoresist, water-soluble casein or the like can be used. As an etchant, ferric chloride, cupric chloride, or the like can be used.

  In the production of the mesh pattern of the conductive metal thin film by the metal vapor-deposited film, the transparent substrate and the fine wire mesh pattern were used in the same manner as the mesh pattern formation by the photographic method described above, and the thin film mesh pattern was formed. An original fabric roll body is produced, and further, an electroplated original fabric roll body is produced.

(Printed mesh pattern generated by printing conductive paste ink or paste containing electroless plating catalyst)
In the production of a mesh pattern of a conductive metal thin film by printing, a transparent base material and a fine line mesh pattern similar to the formation of the mesh pattern by the photographic method are used.
Here, in order to avoid redundant description, only items specific to the print mesh pattern will be described below.

The production of a mesh pattern of a conductive metal thin film by printing, which can be applied to the present invention, is performed, for example, by rotary intaglio offset printing. Printing using conductive paste ink produces a fine line mesh pattern.
In addition, in the case where the mesh pattern is printed by including the electroless plating catalyst core in the conductive paste ink, the electroless plating process is performed prior to the electrolytic plating process, and the electrolytic plating is performed thereon, Furthermore, it becomes a metal plated mesh pattern having excellent conductivity.

  In the case of rotary intaglio offset printing, the paste ink supplied to the intaglio cylinder is transferred to a blanket made of silicon rubber, and the paste ink is transferred to a transparent substrate film passed between the blanket and the impression cylinder. A fine line mesh pattern provided continuously in a seamless manner in the longitudinal direction of the material is printed. In addition, by setting the line width, depth, and pitch of the intaglio in a predetermined range, the mesh pattern line width, thickness, and pitch are adjusted, and the mesh pattern has excellent electromagnetic shielding properties, visibility, and light transmittance Can be obtained.

Since the conductive paste ink used in the present invention is subjected to electroless plating and / or electrolytic plating after the mesh pattern is printed and cured, the conductive paste ink is usually mixed with a resin component serving as a binder. A paste is used. When printing a mesh pattern with electroless plating catalyst cores contained in the conductive paste ink, the electroplating process can be easily performed prior to the electroplating process. become.
As said metal powder, metal powders, such as copper, silver, nickel, aluminum, are used, However, It is preferable to use the fine powder of copper or silver from the point of electroconductivity and a price.

Since the fine line width of the mesh pattern to be printed is preferably about 10 to 40 μm from the viewpoint of visibility, the particle diameter of the metal powder is preferably 0.01 to 2 μm.
For example, in a condition where the width of the printed thin line is as narrow as 10 to 20 μm and the thickness of the thin line is as thin as 2 to 10 μm, it is difficult to increase the conductivity if the particle diameter of the metal powder is larger than 2 μm. .
In order to eliminate the metallic luster of the printed thin-film mesh pattern to suppress reflection of external light and increase the image contrast of the display, it is preferable to incorporate a black pigment such as carbon black. The black pigment is preferably contained at 0.1 to 10% by weight in the conductive paste ink.

As the resin component used for the conductive paste ink, a thermoplastic resin such as a polyester resin, a (meth) acrylic resin, a polyethylene resin, a polystyrene resin, or a polyamide resin is preferably used. Moreover, thermosetting types, such as an epoxy resin, an amino resin, a polyimide resin, (meth) acrylic resin, may be sufficient.
In the conductive paste ink, a metal powder, a black pigment, and, if necessary, a catalyst core are mixed into these resin components, and then an organic solvent such as alcohol or ether is added to adjust the viscosity.

In the production of a mesh pattern of a conductive metal thin film by printing, a transparent base material, a fine wire mesh pattern similar to the mesh pattern formation by the photographic method described above is used, and an original fabric roll on which a thin film mesh pattern is formed A body is produced, and further, an electroplated raw roll body is produced.
In the present invention, the electrolytic plating method can be a conventionally known method such as copper, nickel, silver, gold, solder, or a multilayer or composite system of copper / nickel, but is easy to plate and excellent in conductivity, Further, it is preferable to use copper or nickel for reasons such as the ability to plate a thick film and low cost.

(Method for forming electrode frame)
Next, a method for forming an electrode frame corresponding to the screen size of the display on the metal mesh pattern of the electromagnetic wave shielding film by arranging it at a predetermined interval in the longitudinal direction of the metal mesh pattern will be described.
A method of forming an electrode frame according to the screen size of the display is shown in FIG. 1 in which a conductive paste printed on a metal mesh pattern 22 that is continuously provided in the longitudinal direction of the transparent base material 21 is connected; Or the electrode frame 24 is laminated | stacked through the fixed direction in the longitudinal direction of the metal mesh pattern 22 by any method of the electroconductive adhesive sheet bonded together, and the elongate laminated film 25 shown in FIG. 3 is formed. By doing.

(Electrode frame by printing using conductive paste)
In the electromagnetic wave shielding film 20 shown in FIG. 1, the present invention uses a method of printing using a conductive paste on a metal mesh pattern 22 that is continuously provided in the longitudinal direction of the transparent base material 21. The electrode frame 24 is laminated to obtain a long laminated film 25 shown in FIG.

  The said metal mesh pattern is a metal mesh pattern which has the mesh pattern which consists of a thin film of an electroconductive metal, and the plating layer on which it electrolessly plated and / or electroplated. In addition, the mesh pattern composed of the conductive metal thin film is a developed silver mesh pattern generated by a photographic method, a deposited film mesh pattern generated by vapor deposition of a metal, and a printed mesh generated by printing a conductive paste ink. It is formed by any one method selected from the group consisting of a pattern and a printed mesh pattern generated by printing a paste containing an electroless plating catalyst.

  Since the conductive paste used in the present invention is an electrode having a metal mesh pattern as an electrode frame, a conductive paste in which metal powder is mixed with a resin component serving as a binder is usually used. As said metal powder, metal powders, such as copper, silver, nickel, aluminum, are used, However, It is preferable to use the fine powder of copper or silver from the point of electroconductivity and a price.

  In order to eliminate the metallic luster caused by the metal powder contained in the printed electrode frame, suppress reflection of external light, and increase the image contrast of the display, a black pigment such as carbon black is mixed in the conductive paste. preferable. The black pigment is preferably contained at 0.1 to 10% by weight in the conductive paste.

Since the line width of the electrode frame to be printed is about 5 to 20 mm and wider than the thin line width of the metal mesh pattern, the metal powder used for the conductive paste does not need to be special ultra fine particles, The particle diameter of metal powder should just be 0.1-10 micrometers.
The thickness of the printed electrode frame is not particularly limited, but is about 1 μm to 1 mm.

As a resin component used for the conductive paste, a thermoplastic resin such as a polyester resin, a (meth) acrylic resin, a polyethylene resin, a polystyrene resin, or a polyamide resin is preferably used. Moreover, thermosetting types, such as an epoxy resin, an amino resin, a polyimide resin, (meth) acrylic resin, may be sufficient.
In the conductive paste, the metal powder and the black pigment are mixed into these resin components, and then the viscosity is adjusted by adding an organic solvent such as alcohol or ether.

  The method for applying the conductive paste to form the electrode frame is not particularly limited, but printing by screen printing is preferred for simplicity.

(Electrode frame by attaching a conductive adhesive sheet)
In the electromagnetic wave shielding film 20 shown in FIG. 1, the present invention attaches an electrode frame 24 made of a conductive adhesive sheet on a metal mesh pattern 22 that is continuously provided in the longitudinal direction of the transparent base material 21 without a joint. These are laminated together to obtain a long laminated film 25 shown in FIG.
The said metal mesh pattern is a metal mesh pattern which has the mesh pattern which consists of a thin film of an electroconductive metal, and the plating layer electroplated on it.

  In addition, the mesh pattern composed of the conductive metal thin film is a developed silver mesh pattern generated by a photographic method, a deposited film mesh pattern generated by vapor deposition of a metal, and a printed mesh generated by printing a conductive paste ink. The pattern is formed by any method selected from printed mesh patterns generated by printing a paste containing an electroless plating catalyst.

The conductive pressure-sensitive adhesive sheet used in the present invention is a conductive pressure-sensitive adhesive sheet in which a conductive pressure-sensitive adhesive mixed with at least conductive particles is applied to a base material for peeling, and the conductive particles are formed on one surface of a metal foil. It is good also as an electroconductive adhesive sheet which apply | coated the electroconductive adhesive which mixed this, and laminated | stacked the base material for peeling.
The base material for peeling is peeled off and bonded onto the metal mesh pattern to form an electrode frame.

That is, in the present invention, only the conductive adhesive may be used as the electrode frame, or a metal foil laminated on the conductive adhesive may be used.
In addition, as a conductive adhesive sheet, when a metal foil is laminated on a conductive adhesive, in order to protect the electrode surface that becomes the surface of the electrode frame without contacting the metal mesh pattern over a necessary period, It is preferable to put a protective film on the electrode surface by using a pressure-sensitive adhesive that can avoid adhesive residue.

As the conductive particles, metal particles, plastic resin subjected to conductive plating, glass particles subjected to conductive plating, and the like can be used. As the conductive particles, metal powders such as copper, silver, nickel, and aluminum are used from the viewpoint of conductivity and cost. In particular, fine powders of copper or silver are preferably used.
To suppress the reflection of external light by eliminating the metallic luster caused by the metal powder mixed with the conductive adhesive laminated on the metal mesh pattern and the metallic luster of the laminated metal foil, and to enhance the image contrast of the display An electrode frame can be obtained by mixing a black pigment such as carbon black into the conductive adhesive and blackening the surface of the metal foil.

  It does not specifically limit as an adhesive used for said electroconductive adhesive sheet, Although a conventionally well-known adhesive can be used, Acrylic adhesive is used suitably.

  As said metal foil, copper foil is used suitably from the point of electroconductivity and a price. The metal foil has a thickness of 3 to 100 μm. This is because a metal foil thinner than 3 μm is difficult to be bonded to a substrate and a metal mesh pattern, and is difficult to handle. In addition, a metal foil thicker than 100 μm is too stiff and lacks flexibility. As for the thickness of metal foil, 6-50 micrometers is more preferable.

  In the case of a conductive pressure-sensitive adhesive sheet in which a conductive pressure-sensitive adhesive is laminated on a substrate, the thickness of the conductive pressure-sensitive adhesive layer is not particularly limited, but in order to exert conductivity while making the appearance of the electrode frame black, A thickness of about 2 to 100 μm is preferable. If the thickness of the conductive pressure-sensitive adhesive sheet is less than 2 μm, it is necessary to excessively increase the content of the black pigment in order to make the appearance of the electrode frame black, and if it is thicker than 100 μm, it is applied to a uniform film thickness. Is difficult. As for the thickness of a conductive adhesive layer, 5-50 micrometers is more preferable.

(Optical functional film)
In the present invention, a method for producing a long laminated film by laminating a long electromagnetic shielding film and an optical functional film is performed as follows.
First, after laminating at least a near-infrared absorption layer, an ultraviolet absorption layer, and an antireflection layer as an optical functional layer on one side of a long release film having a smooth release surface, the optical functional film is wound in a roll shape. A roll body is prepared.
Next, as shown in FIG. 4, a long electromagnetic shielding film 20 that is rewound and supplied from the roll body 30, a long at least near-infrared absorbing layer that is rewound and supplied from the roll body 31, ultraviolet absorption The optical functional film 32 including the layers and the antireflection layer is bonded to each other via the pressure-sensitive adhesive layer 40 (see FIG. 6) to form a long laminated film 33.

Here, the width dimension of the long optical functional film 32 does not have to be the same as the width dimension of the electromagnetic wave shielding film 20 to be bonded, and at least an electrode corresponding to the display screen disposed on the electromagnetic wave shielding film 20. What is necessary is just to have the width dimension which can cover a frame completely.
In addition, when the electromagnetic wave shielding film 20 and the optical functional film 32 are bonded together, it is possible to bond the base material while coating the adhesive, but the electromagnetic wave shielding film 20 or the optical functional film 32 is previously provided. It is preferable that the pressure-sensitive adhesive layer 40 is laminated on either of the substrates and protected with a release film.

(Near-infrared absorbing layer)
In this invention, the optical functional film which has a long at least near-infrared absorption layer supplied by rewinding from a roll body is used.
The near infrared absorbing layer is preferably a double-sided pressure-sensitive adhesive film including a near infrared absorbing layer. In this case, the pressure-sensitive adhesive layer that is exposed on the outer surface of the optical functional film 32 among the pressure-sensitive adhesive layers constituting the double-sided pressure-sensitive adhesive film is used to bond the electromagnetic wave shielding film 20 and the optical functional film 32 together. It can be used as the layer 40.
Remove the release film (separator) made of transparent resin on both sides that constitutes the double-sided adhesive film for the near infrared absorbing layer, and for example, a long film mixed with an ultraviolet absorbent that is supplied by rewinding from a roll body. When pasting together with a transparent base material or a transparent resin layer, the separator of a double-sided adhesive film should just peel off only one side, and the separator on the opposite side may be united with a double-sided adhesive film.

The double-sided pressure-sensitive adhesive film of the near-infrared absorbing layer is preferably formed by sequentially laminating a pressure-sensitive adhesive layer and a release film made of a transparent resin on both sides of the transparent resin layer in which the near-infrared absorbing pigment is dispersed.
Further, the near-infrared absorbing dye is composed of two types of long-wavelength absorbing dye and short-wavelength absorbing dye having absorption maximum values in different wavelength bands in the absorption wavelength band of 850 nm to 1100 nm. Is preferred.

  The long-wavelength near-infrared absorbing dye is one selected from diimonium salt compounds, and the short-wavelength near-infrared absorbing dye is a phthalocyanine compound, a cyanine compound, or a thiol nickel complex compound. It is preferable that it is 1 type, or 2 or more types of pigment | dyes selected from these.

(Transparent resin layer in which near-infrared absorbing pigment is dispersed)
As a function of the transparent resin layer in which the near-infrared absorbing pigment is dispersed, it is desirable to reduce the near-infrared transmittance in the wavelength region of 850 to 1100 nm to 15% or less, preferably 10% or less.
Specific examples of near-infrared absorbing dyes include immonium salt compounds, diimmonium salt compounds, aminium salt compounds, nitroso compounds and their metal complexes, cyanine compounds, squarylium compounds, thiol nickel complex compounds, aminothiol nickel compounds Complex salt compounds, phthalocyanine compounds, naphthalocyanine compounds, triarylmethane compounds, naphthoquinone compounds, anthraquinone compounds, amino compounds, carbon black, antimony oxide, tin oxide doped with indium oxide, Group 4 of the periodic table, Examples thereof include oxides, carbides or borides of metals belonging to Group 5 or Group 6.

The near-infrared absorbing dye is composed of two or more kinds of dyes, a long-wavelength near-infrared absorbing dye and a short-wavelength near-infrared absorbing dye, each having absorption ability in different wavelength bands in the absorption wavelength band of 850 nm to 1100 nm. It is preferable.
The long-wavelength near-infrared absorbing dye is one selected from diimonium salt compounds, and the short-wavelength near-infrared absorbing dye is a phthalocyanine compound, a cyanine compound, or a thiol nickel complex compound. It is preferable that it is 1 type, or 2 or more types of pigment | dyes selected from these.

The transparent resin layer in which the near infrared absorbing dye is dispersed can be formed by dispersing the near infrared absorbing dye in a binder made of a transparent resin.
The glass transition temperature (Tg) of the binder resin is preferably 80 to 160 ° C. As a result, the weather resistance of the binder resin itself is improved, the near infrared absorbing performance of the near infrared absorbing coating film is maintained, and the weather resistance and physical properties of the near infrared absorbing coating film itself are further improved. Become. Preferably, it is -50-130 degreeC, More preferably, it is 20-110 degreeC, More preferably, it is 40-100 degreeC.

  Examples of the binder resin include (meth) acrylic resin, (meth) acrylic urethane resin, polyvinyl chloride resin, polyvinylidene chloride resin, melamine resin, urethane resin, styrene resin, and alkyd resin. Modification of resins, phenolic resins, epoxy resins, polyester resins, (meth) acrylic silicone resins, alkylpolysiloxane resins, silicone resins, silicone alkyd resins, silicone urethane resins, silicone polyester resins, silicone acrylic resins, etc. Examples include fluororesins such as silicone resins, polyvinylidene fluoride, and fluoroolefin vinyl ether polymers. Thermoplastic resins may be used, and thermosetting resins, moisture curable resins, UV curable resins, electron beam curable resins, etc. Resin may be usedAlso, organic binder resins such as synthetic rubber such as ethylene-propylene copolymer rubber, polybutadiene rubber, styrene-butadiene rubber, acrylonitrile-butadiene rubber or natural rubber; silica sol, alkali silicate, silicon alkoxide and their (hydrolysis) Conventionally known binder resins such as inorganic binders such as condensates and phosphates may be mentioned. These may be used alone or in combination of two or more.

  Among these, (meth) acrylic resins, (meth) acrylic urethane resins, (meth) acrylic silicone resins, polyesters can be dried at a relatively low temperature to form a near-infrared absorbing coating film. It is preferably a fluorine-based resin such as a modified resin such as a vinyl resin, a silicone resin, a silicone alkyd resin, a silicone urethane resin, a silicone polyester resin, or a silicone acrylic resin, a polyvinylidene fluoride, or a fluoroolefin vinyl ether polymer. Note that acrylic resins and methacrylic resins are also referred to as acrylic resins.

  When forming the transparent resin layer in which the near-infrared absorbing pigment is dispersed, as a compound other than those described above, for example, one or more solvents, additives, and the like may be included. Such a solvent is not particularly limited, and examples thereof include aromatic solvents such as toluene and xylene; alcohol solvents such as isopropyl alcohol, n-butyl alcohol, propylene glycol methyl ether, and dipropylene glycol methyl ether; butyl acetate. Ester solvents such as ethyl acetate and cellosolve acetate; ketone solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; one or more organic solvents such as dimethylformamide.

  In addition, as the additive, a conventionally known additive generally used in a resin composition for forming a film, a coating film, or the like can be used. For example, a leveling agent; inorganic fine particles such as colloidal silica and alumina sol; Antifoaming agent, anti-sagging agent, silane coupling agent, viscosity modifier, metal deactivator, peroxide decomposer, plasticizer, lubricant, rust preventive agent, organic and inorganic UV absorber, inorganic System heat ray absorbent, organic / inorganic flameproofing agent, antistatic agent and the like.

In order to improve the durability of the dye, a quencher or an antioxidant can be added.
Examples of such quenchers include metal complex materials, such as “MIR101” manufactured by Midori Chemical Co., “EST5” manufactured by Sumitomo Seika Co., Ltd., and the like.
Representative antioxidants include hindered amine compounds, hindered phenol compounds, phosphite compounds, and the like, and these can be used alone or in combination of two or more.

Examples of the method for applying the transparent resin layer in which the near-infrared absorbing dye is dispersed include immersion, spraying, brush coating, curtain flow coating, gravure coating, roll coating, spin coating, blade coating, bar coating, reverse coating, and die coating. , Spray coating, electrostatic coating and the like. In these cases, the organic solvent described above can be appropriately mixed and applied to the near-infrared absorbing resin composition.
The thickness of the near infrared absorber layer is not particularly limited as long as it is appropriately set depending on the intended use. For example, the thickness upon drying is 1 to 50 μm, preferably 1 to 20 μm.

(UV absorbing layer)
The ultraviolet absorbing layer is provided closer to the visual side than the near infrared absorbing layer in order to prevent the near infrared absorbing layer from being deteriorated by external light. If necessary, one or more ultraviolet absorbing layers can be provided at an appropriate position of the optical filter.
As a method for forming the ultraviolet absorbing layer, a method of mixing an ultraviolet absorber in a transparent substrate, a transparent resin layer, or an adhesive layer, a coating solution containing the ultraviolet absorber is directly or otherwise applied to the transparent substrate. The method of apply | coating through the layer of this is mentioned.

  As the ultraviolet absorber, both an organic ultraviolet absorber and an inorganic ultraviolet absorber can be used, but those having a wavelength at 50% transmittance of 350 to 420 nm are preferable, and 360 nm to 400 nm are more preferable. . An ultraviolet absorber having a wavelength of 50% transmittance and a wavelength lower than 350 nm is not preferable because the ultraviolet blocking ability is weak, and an ultraviolet absorber having a wavelength higher than 420 nm is strongly colored.

  Examples of organic ultraviolet absorbers include 2- (2′-hydroxy-5′-t-butylphenyl) benzotriazole and 2- (2′-hydroxy-3 ′, 5′-di-t-butylphenyl) benzotriazole. Benzotriazole compounds such as 2-hydroxy-4-methoxybenzophenone, 2-hydroxy-4-n-octyloxybenzophenone, etc., phenyl salicylate, 4-t-butylphenyl salicylate, 2, Hydroxybenzoate systems such as 5-t-butyl-4-hydroxybenzoic acid n-hexadecyl ester, 2,4-di-t-butylphenyl-3 ', 5'-di-t-butyl-4'-hydroxybenzoate Compounds and the like. Examples of inorganic ultraviolet absorbers include titanium oxide, zinc oxide, cerium oxide, iron oxide, and barium sulfate. These ultraviolet absorbers can be used alone or in combination of two or more.

(Functional layer)
Functional layers required for optical filters for displays include antireflection layers, hard coat layers, antifouling layers, antistatic layers, etc., but multiple functional layers are laminated according to the required functional level. It is generally done.

(Antireflection layer)
Here, the antireflection layer is for preventing reflection of visible light from the outside of the optical filter, and in the case of a single layer, a substance having a lower refractive index than a transparent substrate, for example, a polysiloxane structure A thin film made of fluorine-containing organic compound, MgF ₂ , SiO ₂ or the like is formed.
The film thickness of the antireflection layer is such that the optical film thickness d (nm) is set to d = λ / 4 (where λ is a design wavelength of 500 to 580 nm) to form a single antireflection layer.
In the case of multi-layers, a material having a higher refractive index than that of a transparent substrate, for example, a thin film such as titanium oxide, zirconium oxide or ITO, and a material having a lower refractive index than that of a transparent substrate, such as a thin film of silicon oxide Are stacked alternately.
The formation method of such a metal oxide thin film is not specifically limited, It can carry out using well-known methods, such as sputtering method, a vacuum evaporation method, and a wet coating method.

(Hard coat layer)
Abrasion resistance and scratch resistance can be imparted by applying the resin composition for the hard coat layer directly or through another layer to the transparent base film by a known method.
The hard coat layer can be formed by applying, drying, and curing a liquid obtained by dissolving a hard coat agent in a solvent as necessary.
The hard coat agent is not particularly limited, and various known hard coat agents such as a thermosetting hard coat agent and an ultraviolet curable hard coat agent can be used.
As the thermosetting hard coat agent, for example, a silicone resin-based, acrylic resin-based, melamine resin-based hard coat agent, or the like can be used. Silicone resin hard coating agents are superior in hardness, weather resistance, and scratch resistance compared to conventional acrylic resin hard coating agents.

In addition, as ultraviolet curable hard coating agents, hard coating agents such as radically polymerizable hard coating agents such as unsaturated polyester resins and acrylic resins, and cationic polymerizable hard coating agents such as epoxy resins and vinyl ether resins are used. Can be used.
In the case of an ultraviolet curable hard coat agent, it is cured by irradiation with ultraviolet rays. For ultraviolet irradiation, a lamp such as a xenon lamp, a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a metal halide lamp, a carbon arc lamp, or a tungsten lamp can be used.

The hard coat layer may further contain various additives such as an antioxidant, an antistatic agent and a flame retardant as required. Various additives can be added and applied to the hard coat agent.
By setting the thickness of the hard coat layer to 0.05 to 5 μm, preferably about 0.5 to 3 μm, the antireflection film can be provided with wear resistance and scratch resistance.

(Anti-fouling layer)
When coating an antifouling layer on the antireflection layer as the outermost layer, after applying a fluorine or silicone antifouling coating agent to the surface of the antireflection layer, the antifouling layer can be wiped off. Can be formed.
The antifouling layer protects the antireflection layer and enhances the antifouling performance.
As the antifouling coating agent, a fluorine resin or a silicone resin can be used. For example, in the case where the low refractive index layer of the antireflection layer was formed by SiO _2, the fluorosilicate water-repellent paints such as fluoroalkyl silane is preferably used.
The antifouling layer can be formed by applying an antifouling coating agent diluted with a solvent by screen printing, a micro gravure coater or the like.

Further, the thickness of the antifouling layer must be set so as not to hinder the function of the antireflection layer, and is preferably 1 to 30 nm, more preferably 5 to 15 nm.
Further, as a method for imparting an antifouling function to the hard coat layer, a small amount of a hard coating agent in the hard coat layer, for example, a fluorine-based ultraviolet curing antifouling additive in an ultraviolet curing acrylic resin hard coating agent. By adding, in addition to the water repellency and oil repellency characteristic of the fluorine-based compound as the surface functional material, an excellent antifouling property (prevention of fingerprint adhesion) can be imparted to the surface of the hard coat layer.

(Antistatic layer)
In the present invention, an antistatic layer is preferably formed on the surface or inside of the functional layer. As a result, it is possible to prevent dust from adhering to the surface of the optical filter due to the action of static electricity.
In order to completely prevent dust from adhering to the surface of the functional layer, the surface resistivity should be 10 ⁻¹⁰ (Ω / □) or less, more preferably 10 ⁻⁸ (Ω / □) or less. There is a need.

  In general, the antireflection layer, which is the outermost layer of the functional layer, can contain an antistatic agent so as to serve as the antistatic layer. Moreover, an antistatic agent can be apply | coated on a hard-coat layer and an antistatic layer can be formed. Alternatively, an antistatic agent may be added to the hard coat layer to provide an antistatic function and also serve as an antistatic layer.

Examples of the antistatic agent include fine metal oxide particles such as aluminum oxide, silicon dioxide, titanium dioxide, and zirconium oxide, fine particles of a conductive polymer, and a surfactant.
Examples of the surfactant include an anionic surfactant, a cationic surfactant, a nonionic surfactant, and an amphoteric surfactant.
A thin film of an antistatic layer can be formed by a method of directly applying a liquid containing these surfactants onto a resin film.
This antistatic layer can also be formed on the hard coat layer containing the conductive metal oxide fine particles.
As a method for applying the antistatic agent, a known method such as a gravure coater, a micro gravure coater, a die coater, a dip coater, or screen printing can be appropriately selected and used.

(Optical filter for display)
In the present invention, when an optical filter for display is manufactured using an electromagnetic shielding film of a roll body, an electrode frame 24 corresponding to the screen size of the display is laminated on the continuous metal mesh pattern 22 (FIG. 3). See). The dimensions and arrangement pattern of the electrode frame in the electromagnetic wave shielding film need to be changed according to the screen size of the display. Typical screen sizes of the display include 42 inches, 50 inches, 60 inches, and 65 inches.

In the optical filter for display, the bias angle θ of the metal mesh pattern 22 with respect to the electrode frame 24 is set to minimize the moire generated by the interference between the black matrix pattern of the display and the metal mesh pattern for electromagnetic wave shielding of the optical filter. Adjustment is required (see FIG. 3).
This is because the optimum value of the bias angle θ of the metal mesh pattern 22 with respect to the electrode frame 24 is determined according to the resolution of the display.

The following are typical examples of display resolution.
-VGA: 640 x 480 = 310,000 pixels-XGA: 1024 x 768 = 790,000 pixels-SXGA: 1280 x 1024 = 13.1 million pixels-HD: 1280 x 1080 = 1.38 million pixels-Full HD: 1920 x 1080 = 2.07 million Pixel

The metal mesh pattern has an optimum bias angle corresponding to the resolution of the display panel, and two opposing sides of the arranged electrode frame are parallel to the longitudinal direction of the transparent substrate. It is necessary to be formed as follows.
In order to form a single-sheet display optical filter for each display, a long optical filter is cut by the outer dimensions of the electrode frame.

  5 and 6 show an example of a display optical filter 60 obtained by cutting a long optical filter. On one surface of the transparent substrate 21, an adhesive layer made of a thermosetting resin or an energy curable resin layer is applied on the metal mesh pattern 22 in the electrode frame 24 and cured to form an adhesive resin layer ( A pressure-sensitive adhesive layer) 51 is laminated, and an optical functional layer 44 including at least a near-infrared absorbing layer 41, an ultraviolet absorbing layer 42, and an antireflection layer 43 is laminated on the other surface of the transparent substrate 21 in this order. Yes.

  When the display optical filter 60 is bonded to the front panel or front glass plate of the display, the adhesive layer 51 exposed by peeling the separator 52 is directed toward the front panel or the front side of the front glass plate and pressed. Therefore, it can be easily bonded.

According to the present invention, when manufacturing a display optical filter corresponding to a plurality of types of display screen sizes, even if the production plan for each display screen size to be manufactured is changed during the manufacturing process of the display optical filter, It can respond flexibly.
In addition, according to the present invention, an electromagnetic wave shielding film is manufactured with a stable quality and at a low cost, and an optical filter for display manufactured with high productivity and low cost as a whole, and an inexpensive method for manufacturing an optical filter for display Can be provided.

It is a roll body of the electromagnetic wave shielding film used for this invention, Comprising: It is a partial top view which shows an example of arrangement | positioning of the continuous mesh pattern plated on the electroconductive thin film, and an electric power feeding layer. It is a fragmentary top view which shows an example of arrangement | positioning of the mesh pattern in an electromagnetic wave shielding film for PDP, an electrode frame, and an electric power feeding layer in a prior art. It is a fragmentary top view which shows an example of the elongate laminated film in which the electrode frame was formed in this invention. Bonding an electromagnetic shielding film supplied by unwinding from a roll body and an optical functional film including at least a long near-infrared absorbing layer, an ultraviolet absorbing layer, and an antireflection layer supplied by unwinding from the roll body It is a conceptual diagram which shows the process of forming a long laminated film. It is a top view which shows an example of the optical filter formed into a sheet. FIG. 6 is a cross-sectional view taken along the line A-A in FIG. 5 and illustrating an example of a single optical filter. It is a schematic block diagram which shows an example of an electroplating apparatus. It is a schematic block diagram which shows an example of an electroless-plating apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Electrolytic plating apparatus, 2 ... Raw material roll body, 3 ... Roll sheet, 4 ... Transfer roll, 5 ... Water washing tank, 6 ... Electrolytic plating tank, 7 ... Feeding roll, 8 ... Positive electrode plate, 9 ... Electrolytic plating Liquid, 10 ... receiving tank, 11 ... circulating pump, 12 ... filter, 13 ... water washing tank, 14 ... dryer, 15 ... roll body of electromagnetic shielding film, 16 ... electroless plating apparatus, 17 ... electroless plating tank, DESCRIPTION OF SYMBOLS 18 ... Electroless plating solution, 20 ... Electromagnetic wave shielding film unwound from roll body, 21 ... Transparent base material, 22 ... Metal mesh pattern, 23 ... Continuous electric power feeding layer, 24 ... Electrode frame, 25 ... Electrode frame was formed Long laminated film, 30 ... roll body of electromagnetic shielding film, 31 ... roll body of optical functional film, 32 ... optical functional film, 33 ... laminated film, 34 ... roll, 35 ... roll, 36 Roll, 40 ... Adhesive layer, 41 ... Near infrared absorbing layer, 42 ... Ultraviolet absorbing layer, 43 ... Antireflection layer, 44 ... Optical functional layer, 51 ... Adhesive resin layer (adhesive layer), 52 ... Separator (peeling) Film), 60 ... Optical filter for display.

Claims (8)

  A mesh pattern made of a conductive metal thin film and a metal mesh pattern formed by laminating a plating layer thereon are formed on one surface of the transparent substrate, and the metal mesh pattern is surrounded by a display screen size. The electrode frame is formed by printing a conductive paste on the metal mesh pattern or pasting a conductive adhesive sheet, and the electrode. An adhesive layer is laminated on the metal mesh pattern in the frame, and on the other surface of the transparent base material, at least a near-infrared absorbing layer, an ultraviolet absorbing layer, and an antireflection layer are arranged in order from the base material surface. An optical filter for display, comprising: an optical functional layer that is laminated.   The mesh pattern made of a thin film of conductive metal is a developed silver mesh pattern generated by a photographic method, and a negative development method in which developed silver appears in an exposed portion, or developed silver appears in an unexposed portion. 2. The optical filter for display according to claim 1, wherein the optical filter for display is a developed silver mesh pattern generated by any one of the positive developing methods.   The mesh pattern made of the conductive metal thin film is a deposited film mesh pattern generated by metal deposition, a printed mesh pattern generated by printing a conductive paste ink, and a paste containing an electroless plating catalyst. The display optical filter according to claim 1, wherein the display optical filter is any one selected from printed mesh patterns generated in the above.   A display comprising the display optical filter according to claim 1. A method for producing an optical filter for display using an electromagnetic wave shielding film of a roll body, wherein at least the following steps (1), (2), and (3):
(1) On one surface of the long transparent substrate supplied by rewinding from the roll body, a continuous metal mesh pattern is provided in the longitudinal direction of the transparent substrate, and the metal mesh pattern is It has a mesh pattern made of a thin film of conductive metal and a plating layer electrolessly plated and / or electroplated thereon, and is wound from a roll body and the substrate surface side where the metal mesh pattern is not provided. A step of forming a long laminated film by laminating an optical functional film including an at least near-infrared absorbing layer, an ultraviolet absorbing layer, and an antireflection layer, which are supplied back, via an adhesive layer;
(2) An electrode frame corresponding to the screen size of the display is printed by printing a conductive paste on the continuous metal mesh pattern of the long laminated film, or by bonding a conductive adhesive sheet. A step of forming a long optical filter by arranging and forming an adhesive layer on the metal mesh pattern in the electrode frame, while arranging and forming the metal mesh pattern in a longitudinal direction with a predetermined interval.
(3) cutting the long optical filter with the outer dimensions of the electrode frame to form a single-sheet optical filter for each display;
A method for producing an optical filter for a display, comprising:   The step of laminating the pressure-sensitive adhesive layer on the metal mesh pattern in the electrode frame is to apply an adhesive layer made of a thermosetting resin or an energy ray curable resin on the metal mesh pattern in the electrode frame, After curing and forming an adhesive resin layer to be the pressure-sensitive adhesive layer, a step of bonding a release film prepared in advance on the adhesive resin layer, or in the electrode frame Any one of the steps of laminating a release film of a sheet having a pressure-sensitive adhesive layer that is cut with an inner dimension of an electrode frame according to the screen size of a display prepared in advance on the metal mesh pattern of The method for producing an optical filter for display according to claim 5, wherein:   The mesh pattern made of a thin film of conductive metal is a developed silver mesh pattern generated by a photographic method, and a negative development method in which developed silver appears in an exposed portion, or developed silver appears in an unexposed portion. 7. The method for producing an optical filter for display according to claim 5, wherein the developed silver mesh pattern is produced by any one of the positive developing methods.   The mesh pattern made of the conductive metal thin film is a deposited film mesh pattern generated by metal deposition, a printed mesh pattern generated by printing a conductive paste ink, and a paste containing an electroless plating catalyst. The method for manufacturing an optical filter for display according to claim 5 or 6, wherein the method is selected from print mesh patterns generated in the above.

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