JP4799982B2 - Electromagnetic wave shielding material roll body and manufacturing method thereof - Google Patents

Description

  The present invention relates to an electromagnetic wave shielding material and a method for producing the same, and more specifically, is supplied in a continuous roll sheet state for use mainly by sticking to an outdoor side such as a window glass of a large building or a window glass of an automobile. The present invention relates to an electromagnetic shielding material roll body and a manufacturing method thereof.

  In recent years, electromagnetic waves generated from various electronic devices have a negative effect on the human body and malfunction of surrounding electronic devices has become a problem. Furthermore, with the spread of wireless LAN, communication data in buildings has been Therefore, it is necessary to prevent leakage and interception, and countermeasures against electromagnetic wave shielding are becoming increasingly important.

  Conventionally, various transparent conductive films and electromagnetic wave shielding films have been developed in response to the requirement that electromagnetic waves generated from electronic devices leak to the outside and prevent adverse effects on the human body. Known electromagnetic shielding materials are roughly classified into two types: an electromagnetic shielding material made of a transparent conductive film and an electromagnetic shielding material made of a conductive metal mesh. Among these, the electromagnetic shielding material using a transparent conductive film is superior in transparency to the electromagnetic shielding material using a metal mesh, but has a large surface resistivity and inferior electromagnetic shielding performance. For this reason, the electromagnetic shielding material by a metal mesh is preferable in the use where high electromagnetic shielding performance is required.

Furthermore, as a method for producing an electromagnetic wave shielding material using a conductive metal mesh, the following methods (1) to (3) are exemplified.
(1) An etching method in which a metal foil is bonded to a transparent substrate, or a metal thin film is deposited on the transparent substrate, and then a conductive metal pattern is formed by a photolithographic method (see, for example, Patent Document 1).
(2) A printing-plating method in which a conductive metal paste is printed on a transparent substrate and then plated to form a conductive metal pattern (see, for example, Patent Document 2).
(3) A photographic silver-plating method for forming a conductive metal pattern by forming a fine line pattern with metallic silver developed by a photographic method and then physically developing and / or plating the metallic silver (for example, Patent Document 3) And Patent Document 4).

  Then, there are two methods shown in the following (a) and (b) for forming a mesh pattern with metallic silver by a photographic manufacturing method.

(A) A silver salt-containing layer containing a silver salt provided on a support is exposed and developed to form a metallic silver part and a light-transmitting part, and the metallic silver part is further subjected to physical development and A method of forming a conductive metal part in which conductive metal particles are supported on the metal silver part by plating (see, for example, Patent Document 3). In this method, developed silver does not appear in the portion that is covered with the exposure mask and is not exposed, and developed silver appears in the portion that is not covered with the exposure mask and exposed. Therefore, compared with the exposure mask. This is a negative exposure / development method in which developed silver appears in an inverted form.

(B) A light-sensitive material having a physical development nucleus layer and a silver halide emulsion layer in this order is exposed on a transparent substrate, and metallic silver is deposited on the physical development nucleus in an arbitrary fine line pattern. A method of plating a metal using the physically developed metallic silver as a catalyst nucleus after removing a layer provided on the development nucleus (see, for example, Patent Document 4). In this method, developed silver appears in a portion which is covered with the exposure mask and is not exposed, and developed silver does not appear in a portion which is not covered with the exposure mask and exposed. Is a positive exposure / development method (silver complex diffusion transfer method, hereinafter referred to as DTR method).

In addition, Patent Document 5 describes etching of a metal foil laminated on a substrate via an adhesive layer using a photoresist method with respect to an electromagnetic wave shielding material to be attached to a window glass of a building, a window glass of a train or an automobile. A method for producing a mesh is described.
Japanese Patent Laid-Open No. 10-075087 JP 11-170420 A JP 2004-221564 A International Publication WO2004 / 007810 Pamphlet JP 2002-190692 A

In the etching method (1), it is a problem from the viewpoint of saving resources that only a very small portion which becomes a thin line portion is left by etching and most other metals are dissolved and removed. In addition, since the maximum standard dimension width of a commercially available metal foil is about 600 mm or less, an electromagnetic wave shielding material having a wider dimension width cannot be produced by the method of bonding the metal foil. In addition, when a metal thin film is deposited, there is a problem that it cannot be easily manufactured because a huge equipment cost is required.
In the printing-plating method (2), it is difficult to reduce the line width of the mesh pattern to 30 μm or less, and there is a problem in that the adhesiveness between the transparent substrate and the mesh pattern is poor and is easily peeled off.

  In the photographic silver-plating method of (3) above, high electromagnetic shielding properties are obtained, and there is no restriction on the dimensions of the transparent base material, so that it can be produced with a roll-to-roll and the productivity is very high. This is a preferred production method.

  By the way, as an application of the conventional electromagnetic wave shielding material, an electromagnetic wave shielding film incorporated in an optical filter of the PDP in order to shield an electromagnetic wave generated from a PDP (plasma display panel) is a main one. In such a comparatively small device, the area of the electromagnetic shielding film used per unit becomes narrow. In addition, an electromagnetic shielding film for PDP, etc., is produced by discontinuously manufacturing a PDP screen size mesh pattern at regular intervals on the roll sheet surface, and a continuous mesh pattern without any breaks on the roll sheet surface. It has not been known to produce an electromagnetic shielding material comprising:

  Patent Document 5 discloses an electromagnetic wave shielding material used by being attached to a window glass of a building made of metal foil mesh, a window glass of a train or an automobile, and the like. This document discloses a general technique of producing a metal foil mesh by etching a metal foil using a photoresist method. There is no disclosure or suggestion regarding the technology involved.

  In a large building, a mechanism for holding a window glass may be provided on the indoor side of the window glass. In such a case, it is necessary to attach an electromagnetic wave shielding material to the window glass from the outdoor side. For this reason, the electromagnetic shielding material supplied in a continuous roll sheet state in which a continuous mesh pattern without a break is formed to be used on the outdoor side such as a window glass of a large building, which is weather resistant, is inexpensive. There was a need for technology that could be provided.

  The present invention has been made in view of the above circumstances, and is a continuous roll sheet for use by being attached to the outdoor side such as a window glass of a large building that has weather resistance and cannot be handled by a conventional manufacturing method. It is an object of the present invention to provide an electromagnetic wave shielding material and a manufacturing method thereof.

In order to solve the above-mentioned problems, the present invention provides a metal mesh pattern in which a continuous line is continuous in the longitudinal direction of the transparent substrate on at least one surface of the long transparent substrate, and is supplied in a roll state. The electromagnetic mesh shielding material roll body, wherein the metal mesh pattern is generated by a photographic process in which developed silver is developed , the feeding of the transparent base material is continuous feeding, and the light to the transparent base material is transmitted. It was formed by exposing through an exposure mask using a continuous exposure apparatus that can form a continuous mesh pattern that can be continuously exposed without being interrupted and the lines can be continuously formed, and then developed. An electroless copper plating layer and / or an electroless nickel layer formed using a developed silver mesh pattern and an apparatus that continuously performs electroless plating with a roll-to-roll pattern thereon. And the metal mesh pattern is a metal mesh pattern in which lines are continuous in the longitudinal direction of the transparent base material, and a transparent resin is formed on the concave and convex portions of the metal mesh pattern. An electromagnetic shielding material roll body in which a layer is embedded is provided.

In the electromagnetic wave shielding material roll of the present invention, an antifouling layer is preferably laminated on the transparent resin layer. Further, a hard coat layer can be laminated between the transparent resin layer and the antifouling layer. Moreover, it can also be set as the structure which contained the ultraviolet absorber in the said transparent resin layer. The metal mesh pattern may be provided on one surface of the transparent substrate, and an adhesive layer may be provided on the other surface of the transparent substrate.
As the developed silver mesh pattern, either a negative-type development method in which developed silver appears in the exposed portion or a positive-type development method in which developed silver appears in the unexposed portion is adopted. It is also possible to do.

Further, the present invention provides an electromagnetic wave shielding material roll that is provided in a roll state in which a metal mesh pattern in which lines are continuous in the longitudinal direction of the transparent base material is provided on at least one surface of the long transparent base material. A transparent substrate provided with a layer containing a substance that deposits metallic silver by exposure and development, wherein the transparent substrate is continuously fed, and the light is transmitted to the transparent substrate. It is possible to expose continuously through an exposure mask using a continuous exposure apparatus capable of forming a continuous mesh pattern with continuous lines without irradiation, and then developing the transparent. in the longitudinal direction of the substrate, a step of lines constituting the mesh pattern to produce a master roll that contiguous developed silver mesh pattern is generated seamlessly, the developed silver mesh pattern After the continuously feeding the transparent substrate provided from the source roll, on the developed silver mesh pattern, using the apparatus continuously performs electroless plating a roll-to-roll, copper and / or A step of forming a metal plating layer by electroless plating of nickel, winding it again to form a roll body, and continuously feeding out the transparent substrate on which the metal mesh pattern is formed. And a transparent resin embedding step of embedding the transparent resin layer in the electromagnetic wave shielding material roll manufacturing method.

Further, the present invention provides an electromagnetic wave shielding material roll that is provided in a roll state in which a metal mesh pattern in which lines are continuous in the longitudinal direction of the transparent base material is provided on at least one surface of the long transparent base material. A transparent substrate provided with a layer containing a substance that deposits metallic silver by exposure and development is continuously fed out, and the transparent substrate is fed continuously to the transparent substrate. Exposed through an exposure mask using a continuous exposure apparatus that can continuously expose the light to the transparent substrate without intermittent light irradiation and can form a continuous mesh pattern with no line breaks. was followed by development, in the longitudinal direction of the transparent substrate, to produce a developed silver mesh pattern lines constituting the mesh pattern are continuously without a break, and subsequently, the developing Ginme On the shoe pattern using a device to continuously perform the electroless plating a roll-to-roll, after the copper and / or nickel to form a metal plating layer by electroless plating, roll and wound again And a transparent resin embedding step of continuously feeding out the transparent base material on which the metal mesh pattern is formed and embedding a transparent resin layer in the concavo-convex portion of the metal mesh pattern. A method for producing a roll body is provided.

  The developed silver mesh pattern can be generated by either a negative developing method in which developed silver appears in the exposed portion or a positive developing method in which developed silver appears in the unexposed portion.

  According to the present invention, the electromagnetic wave shielding material is provided in a continuous roll sheet state in which a continuous mesh pattern is formed that has weather resistance and is attached to an outdoor side such as a window glass of a large building. A roll body and a manufacturing method thereof can be provided. In addition, according to the present invention, the electromagnetic shielding material can be continuously manufactured and supplied by roll-to-roll, so that the manufacturing cost can be greatly reduced.

The electromagnetic shielding material roll body of the present invention is an electromagnetic shielding material provided with a metal mesh pattern on at least one surface of a long transparent base material and supplied in a roll state, and the metal mesh pattern is a photograph. A developed silver mesh pattern generated by the production method and a metal plating layer formed of an electroless copper plating layer and / or an electroless nickel plating layer thereon, and the metal mesh pattern is a longitudinal direction of the transparent substrate It is a continuous pattern in which a transparent resin layer is embedded in the concavo-convex portion of the metal mesh pattern.
The method for producing such an electromagnetic shielding material roll body is not particularly limited. For example, a layer containing a substance that deposits metallic silver by exposure and development is at least one of the long transparent base material. Preparing a base material provided on the surface, exposing the base material, and then developing the base material, thereby generating a continuous developed silver mesh pattern in the longitudinal direction of the transparent base material; and the development At least a plating step of forming a metal plating layer by electroless plating copper and / or nickel on the silver mesh pattern, and a transparent resin embedding step of embedding the transparent resin layer in the uneven portion of the metal mesh pattern It can be manufactured by a manufacturing method.
In order to further explain the present invention, the present invention will be described below with reference to the drawings based on the best mode of the electromagnetic shielding material roll of the present invention and the manufacturing method thereof.

  FIG. 1 is a schematic view showing an example of an apparatus for continuously performing electroless plating following exposure / development by roll-to-roll in the present invention. FIG. 2 is a schematic view showing an example of an apparatus for performing electroless plating by roll-to-roll in the present invention. FIG. 3A is a partial plan view showing an example of the arrangement of the mesh pattern in the electromagnetic wave shielding material roll of the present invention, FIG. 3B is a cross-sectional view showing an example of the layer structure of the electromagnetic wave shielding material, and FIG. (c) is sectional drawing which shows another example of the layer structure of an electromagnetic wave shielding material. FIG. 4 is a schematic view showing an example of a continuous exposure apparatus used in the present invention. FIG. 5 is a schematic view showing another example of the continuous exposure apparatus used in the present invention.

(Electroless plating process)
In the electromagnetic shielding material manufacturing apparatus 1 shown in FIG. 1, an original roll 2 is a roll sheet 3 in which a layer (details will be described later) containing a substance that deposits metallic silver by exposure and development is provided on a long transparent substrate. Is rolled up into a roll. The roll sheet 3 fed out from the raw roll 2 is transferred from left to right in the figure by transfer rolls 4, 4, 4,. The roll sheet 3 is first transferred to the continuous exposure device 5 and baked (exposed) with a predetermined mask pattern. Here, the continuous exposure apparatus 5 is an apparatus that performs exposure while transporting the transparent substrate by continuous feeding, as will be described in detail later.

  Next, the exposed roll sheet 3 is transferred to a developing device 6 where the developed silver developed by the photograph is fixed in a mesh pattern shape. Next, after passing through the water washing tank 7 and being washed to remove unnecessary foreign matters and contaminants, they are transferred to the electroless plating tank 8 for performing a plating process.

  In the electroless plating tank 8, electroless plating is performed through the electroless plating solution 9, and an electroless plating layer is deposited on the developed silver mesh pattern on the surface of the roll sheet 3. The temperature of the electroless plating solution 9 is controlled by a temperature regulator (not shown) so as to be a predetermined temperature. The electroless plating solution 9 can leak and fall from a gap (slit) through which the roll sheet 3 of the electroless plating tank 8 is passed. Therefore, a receiving tank 10 for receiving the leaked electroless plating solution 9 is installed below the electroless plating tank 8, and the electroless plating solution 9 received in the receiving tank 10 is supplied with the circulation pump 11 and the filter 12. Then, it is recirculated to the electroless plating tank 8 again.

The roll sheet 3 that has exited the electroless plating tank 8 is washed away with an unnecessary electroless plating solution 9 in a water washing tank 13, drained and dried in a drier 14, wound up again, and rolled into a roll-shaped electromagnetic shielding material roll. A body 15 is obtained.
Furthermore, the process of roll-to-roll is performed as many times as necessary using the obtained electromagnetic shielding material roll body 15 as an original fabric roll, and the transparent base material on which the metal mesh pattern is formed is continuously fed out. The electromagnetic wave shielding material roll of the present invention can be obtained by performing a transparent resin embedding step of embedding the transparent resin layer in the uneven portion.

  The electromagnetic wave shielding material roll of the present invention has a metal mesh pattern (electromagnetic wave shielding layer) 22 on at least one surface of a long transparent substrate 21, as shown in FIGS. 3 (a) and 3 (b). The electromagnetic shielding material 20 is wound up in a roll state, and the metal mesh pattern 22 is formed on the developed silver mesh pattern 23 generated by a photographic method using the continuous exposure device 5 and the developing device 6, A metal plating layer 24 generated using the electroless plating tank 8, and the metal mesh pattern 22 is a continuous pattern that is continuous in the longitudinal direction of the transparent base material 21. A transparent resin layer 25 is embedded in the uneven portion. When the number of metal plating layers 24 is one, this metal plating layer 24 is preferably an electroless copper plating layer or an electroless nickel plating layer.

  Here, the transparent resin layer 25 is a transparent resin layer provided in order to flatten the unevenness caused by the metal mesh pattern 22 provided on the transparent substrate 21. The thickness of the metal mesh pattern 22 is 0.5 μm to 15 μm. If an antireflection agent is directly applied to the upper surface of the metal mesh pattern 22 due to the unevenness of the metal mesh pattern 22 with the transparent base material 21, coating unevenness is likely to occur. Become. Moreover, even when the antireflection film is directly laminated, bubbles are likely to be generated. If coating unevenness or air bubbles are formed, the antireflection effect is lowered. Therefore, the transparent resin layer 25 is provided to flatten the unevenness between the metal mesh pattern 22 and the transparent base material 21 and prevent these problems. The transparent resin layer 25 preferably contains a metal oxide. Since this metal oxide does not reduce the transparency of the transparent resin layer 25, it is preferable that the metal oxide has excellent transparency and a high refractive index. The reason why a high refractive index is required is to obtain a higher antireflection effect by combining with a layer having a low refractive index provided on the upper surface of the transparent resin layer 25. The refractive index of the transparent resin layer 25 is preferably 1.7 or more. Examples of metal oxides that satisfy such conditions include titanium oxide, silicon oxide, and zinc oxide.

  An antifouling layer 27 is preferably laminated on the transparent resin layer 25. The antifouling layer 27 in the present invention aims at the protective film effect of the electromagnetic wave shielding material 20, and can always keep the antireflection effect by cleaning the surface that is soiled due to external factors. As a material for forming the antifouling layer 27, it is water repellant and / or oil repellant, thereby protecting the surface of the layer below it, further enhancing the antifouling property, and satisfying the required performance As long as it is any material, it is not limited, but it is necessary to ensure sufficient transparency when the electromagnetic wave shielding material is attached to the window glass and not to impair the antireflection property. Examples of such antifouling treatment agents include acrylic and fluorine treatment agents, and fluoroalkyl group-containing resins, fluorocarbons, fluorosilanes, and the like, or compounds thereof are preferable. A compound having a methyl group introduced is also suitable for wiping off fingerprints. The antifouling layer 27 can be formed by various coating methods such as vacuum deposition, sputtering, ion plating, plasma CVD, plasma polymerization, roll coating, spray coating, dip coating, etc., depending on the application material. Can be used.

Further, the transparent resin layer 25 preferably contains an ultraviolet absorber. As UV absorbers, benzotriazole UV absorbers, benzophenone UV absorbers, salicylic acid UV absorbers, phenyltriazine UV absorbers, and cyanoacrylate UV absorbers that are commonly used as UV absorbers for synthetic resins An agent or the like can be preferably used. Specific examples of the compound include the following compounds.
Benzotriazole series: Octyl-3- [3- (2H-benzotriazol-2-yl) -5-tert-butyl-4-hydroxyphenyl] propionate, 2- (2-hydroxy-3,5-di-t- Pentylphenyl) benzotriazole, 2- (2-hydroxy-5-methylphenyl) benzotriazole, 2- (5-tert-butyl-2-hydroxyphenyl) benzotriazole, 2- (2-hydroxy-3,5-di -T-butylphenyl) benzotriazole, 2- (3-t-butyl-2-hydroxy-5-methylphenyl) -5-chlorobenzotriazole, 2- (3,5-di-t-butyl-2-hydroxy Phenyl) -5-chlorobenzotriazole, 2- [2-hydroxy-5- (2-acryloyloxyethyl) phenyl] benzo Riazor, 2-hydroxy-3-methacryloyloxy propyl-3- [3- (2H-benzotriazol-2-yl) -4-hydroxy -5-t-butylphenyl] propionate, and the like.
Benzophenone series: 2,4-dihydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone, 2,2 ' , 4,4'-tetrahydroxybenzophenone, 2-hydroxy-4-octoxybenzophenone, and the like.
Salicylic acid type: pt-butylphenyl salicylate, phenyl salicylate, p-octylphenyl salicylate, and the like.
Phenyltriazine series: 2- [4- (2-hydroxy-3-dodecyloxypropyloxy) -2-hydroxyphenyl] -4,6-bis (2,4-dimethylphenyl) -1,3,5-triazine, Such.
Cyanoacrylate: ethyl 2-cyano-3,3-diphenylacrylate, 2-ethylhexyl 2-cyano-3,3-diphenylacrylate, and the like.

  Furthermore, it is preferable to laminate a hard coat layer 26 between the transparent resin layer 25 and the antifouling layer 27. As the hard coat layer 26, a dense silica layer obtained by curing polysilazane by irradiation of ultraviolet rays, an inorganic silica layer formed by complete hydrolysis of tetraalkoxysilanes, and alkoxysilanes having non-hydrolyzable groups such as alkyl groups. Examples include a polyorganosiloxane layer produced by partially or completely hydrolyzing the polymer, a layer obtained by curing an active energy ray-curable compound typified by (meth) acrylate or acrylic urethane, and the like.

  Furthermore, when the electromagnetic shielding material 20 is stuck on the outdoor side of the window glass, it is preferable to provide the metal mesh pattern 22 only on one surface of the transparent base material 21 and provide the adhesive layer 28 on the other surface. As the pressure-sensitive adhesive forming the pressure-sensitive adhesive layer 28, a known pressure-sensitive adhesive generally used for pressure-sensitive adhesive tapes and seals can be used. For example, natural rubber type, synthetic rubber type, acrylic type, polyvinyl ether type, urethane type, silicone type and the like can be mentioned. These pressure-sensitive adhesives can be used alone or in combination of two or more. The pressure-sensitive adhesive can further contain a tackifier, a filler, a softener, an antioxidant, an ultraviolet absorber, a crosslinking agent, and the like as necessary. The thickness of the pressure-sensitive adhesive layer 28 is usually 5 to 100 μm, preferably 10 to 50 μm. In addition, as a release sheet (not shown) provided to protect the pressure-sensitive adhesive layer 28, for example, a release agent such as silicone resin is applied to paper such as glassine paper, coated paper, laminated paper, and various plastic films. And the like. Although there is no restriction | limiting in particular about the thickness of this peeling sheet, Usually, it is about 20-150 micrometers.

  Further, in the plating process, a plurality of sets (two or more sets) of the electroless plating tank 8 and the water washing tank 13 are repeatedly installed, and the electroless plating is performed a plurality of times during one roll-to-roll process. As shown in FIG. 3C, the metal mesh pattern 22 includes a developed silver mesh pattern 23 and an electromagnetic wave shielding material 20 in which two or more metal plating layers 24a and 24b are stacked thereon. It can also be obtained. The combination of the metals constituting the plurality of metal plating layers 24a and 24b is not particularly limited. For example, the electroless copper plating layer as the metal plating layer 24a provided immediately above the developed silver mesh pattern 23, and the metal provided thereon The structure which has an electroless nickel plating layer as the plating layer 24b is mentioned.

  According to the configuration shown in FIG. 1, the development of a developed silver mesh pattern (exposure / development process) and the formation of an electroless plating layer (plating process) are continuously performed during one roll-to-roll process. Therefore, the processing speed can be further improved and the cost can be reduced. In this embodiment, it is preferable that after the development silver mesh pattern is generated by the photographic manufacturing method, the plating process is continuously performed while the surface of the transparent substrate is kept wet. In this case, it is possible to reduce the occurrence of plating defects due to the minute bubbles adhering to the surface of the developed silver mesh pattern and obstructing the contact with the plating solution.

Moreover, the electromagnetic wave shielding material manufacturing apparatus 1A shown in FIG. 2 is an original roll 2A in which developed silver is fixed in a mesh pattern shape by exposure and development by a photographic method on at least one surface of a long transparent substrate. The roll sheet 3 is fed out from the apparatus to continuously perform electroless plating. In the electromagnetic shielding material manufacturing apparatus 1A shown in FIG. 2, the roll sheet 3 is transferred from the raw roll 2A wound in a roll shape by transfer rolls 4, 4, 4,. Moved from left to right. The roll sheet 3 is first passed through the water washing tank 7 and washed to remove unnecessary foreign matters and contaminants. Next, it transfers to the electroless-plating tank 8 in order to perform a plating process.
In the electromagnetic shielding material manufacturing apparatus 1A of FIG. 2, the configuration from the electroless plating tank 8 to the electromagnetic shielding material roll body 15 is the same as that of the electromagnetic shielding material manufacturing apparatus 1 shown in FIG. 1, and this manufacturing apparatus 1A is used. 3 can manufacture the electromagnetic shielding material 20 having the configuration shown in FIG.

(Transparent substrate)
The transparent substrate 21 used in the present invention is preferably a transparent substrate having transparency in the visible region and generally having a total light transmittance of 90% or more. Especially, the resin film which has flexibility is used suitably at the point which is easy to handle. Specific examples of the transparent resin film used for the transparent substrate 21 include polyester resins such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), acrylic resins, epoxy resins, fluorine resins, silicone resins, polycarbonate resins, Single-layer film having a thickness of 50 to 300 μm made of acetate resin, triacetate resin, polyarylate resin, polyvinyl chloride, polysulfone resin, polyether sulfone resin, polyimide resin, polyamide resin, polyolefin resin, cyclic polyolefin resin, or the like A composite film having a plurality of layers made of a resin is exemplified.

(Metal mesh pattern production method)
The method for producing a conductive metal mesh applicable to the present invention is to form a conductive metal pattern by forming a fine line pattern with metallic silver developed by a photographic method and then physically developing and / or plating the metallic silver. This is due to the exposure development method.
In the exposure development method based on this photographic method applicable to the present invention, as described above, (a) developed silver appears in an exposed portion that is not covered with the exposure mask, that is, opposite to the exposure mask. A so-called negative exposure and development method in which developed silver appears in a shape; and (b) a developed silver appears in a portion that is covered with an exposure mask and not exposed, that is, a developed silver appears in the same shape as the exposure mask. There are two types of positive exposure development methods. Either (a) a negative exposure / development method or (b) a positive exposure / development method can be applied to the present invention.

  Hereinafter, a method for producing a metal mesh pattern using a positive exposure / development method (DTR method) and an electroless plating method will be described. In the case of the DTR method, it is preferable that a physical development nucleus layer is provided in advance on the transparent substrate surface. As the physical development nuclei, fine particles (having a particle size of about 1 to several tens of nm) made of heavy metals or sulfides thereof are used. Examples thereof include colloids such as gold and silver, metal sulfides obtained by mixing water-soluble salts such as palladium and zinc and sulfides, and the like. The fine particle layer of these physical development nuclei can be provided on the transparent substrate by a vacuum deposition method, a cathode sputtering method, a coating method or the like. From the viewpoint of production efficiency, a coating method is preferably used. The content of physical development nuclei in the physical development nuclei layer is suitably about 0.1 to 10 mg per square meter in solid content.

  The transparent substrate can be provided with an adhesive layer of a polymer latex layer such as vinylidene chloride or polyurethane, and an intermediate layer made of a hydrophilic binder such as gelatin can be provided between the adhesive layer and the physical development nucleus layer. it can.

  The physical development nucleus layer preferably contains a hydrophilic binder. The amount of the hydrophilic binder is preferably about 10 to 300% by mass with respect to the physical development nucleus. As the hydrophilic binder, gelatin, gum arabic, cellulose, albumin, casein, sodium alginate, various starches, polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylamide, a copolymer of acrylamide and vinyl imidazole, and the like can be used. The physical development nucleus layer may also contain a hydrophilic binder crosslinking agent.

  The physical development nucleus layer and the intermediate layer can be applied by an application method such as dip coating, slide coating, curtain coating, bar coating, air knife coating, roll coating, gravure coating, spray coating, and the like. In the present invention, the physical development nucleus layer is preferably provided as a continuous and uniform layer by the above-described coating method.

  The supply of silver halide for depositing metallic silver on the physical development nucleus layer is performed by a method in which the physical development nucleus layer and the silver halide emulsion layer are integrally formed in this order on a transparent substrate, or another paper or plastic resin. There is a method of supplying a soluble silver complex salt from a silver halide emulsion layer provided on a substrate such as a film. From the viewpoint of cost and production efficiency, the former physical development nucleus layer and the silver halide emulsion layer are preferably provided integrally.

The silver halide emulsion can be produced according to a general method for producing a silver halide emulsion of a silver halide photographic light-sensitive material. The silver halide emulsion is usually prepared by mixing and ripening an aqueous silver nitrate solution, an aqueous halogen solution of sodium chloride or sodium bromide in the presence of gelatin.
The silver halide composition of the silver halide emulsion layer preferably contains 80 mol% or more of silver chloride, and more preferably 90 mol% or more is silver chloride. The conductivity of the physically developed silver formed by increasing the silver chloride content is improved.

(Exposure method)
The silver halide emulsion layer is sensitive to various light sources. As one method for producing an electromagnetic wave shielding material, for example, formation of physically developed silver having a fine line pattern such as a mesh shape can be mentioned. In this case, the silver halide emulsion layer is exposed in a fine line pattern. As an exposure method, a method of exposing a fine line pattern transmission original and a silver halide emulsion layer in close contact with each other, or scanning exposure using various laser beams. There are ways to do this. The former contact exposure is possible even if the silver halide has relatively low photosensitivity, but in the case of scanning exposure using laser light, relatively high photosensitivity is required. Therefore, when the latter exposure method is used, the silver halide may be subjected to chemical sensitization or spectral sensitization with a sensitizing dye in order to increase the sensitivity of the silver halide. Chemical sensitization includes metal sensitization using a gold compound or silver compound, sulfur sensitization using a sulfur compound, or a combination thereof. Gold-sulfur sensitization using a gold compound and a sulfur compound in combination is preferable. In the above-described method of exposing with laser light, a laser beam having an oscillation wavelength of 450 nm or less, for example, a blue semiconductor laser (also referred to as a violet laser diode) having an oscillation wavelength of 400 to 430 nm is used. It can be handled even under a yellow fluorescent lamp.

(Exposure equipment)
As an exposure apparatus using the above exposure method, there are a single wafer processing type exposure apparatus using a single wafer type exposure mask (photomask) and a continuous exposure apparatus capable of forming a continuous pattern. A single wafer processing type exposure apparatus uses a single wafer type exposure mask (photomask) on which a predetermined mask pattern is formed, intermittently feeds a roll sheet to the exposure apparatus, and evacuates the inside of the apparatus for exposure. After the mask and the substrate are brought into close contact with each other and no gap is formed, exposure is performed with, for example, ultraviolet rays. In a single wafer processing type exposure apparatus, vacuum exhaust, exposure, and release to the atmosphere are intermittently performed, so that the processing speed becomes slow and a continuous pattern without a break cannot be obtained.

On the other hand, in the present invention, as illustrated in FIGS. 4 and 5, continuous exposure apparatuses 60 and 70 capable of continuously forming a pattern are used.
As shown in FIG. 1, these continuous exposure apparatuses 60 and 70 are continuous exposure incorporated in the electromagnetic shielding material manufacturing apparatus 1 when the exposure / development process and the plating process are continuously performed by roll-to-roll. As the apparatus 5, continuous exposure apparatuses 60 and 70 exemplified in FIGS. 4 and 5 can be used. In addition, as shown in FIG. 2, when performing the exposure / development process separately from the roll-to-roll process for performing the plating process, continuous exposure and development are performed by an apparatus provided separately from the electromagnetic shielding material manufacturing apparatus 1A. The raw fabric roll 2A is manufactured.
In the drawings showing these continuous exposure apparatuses 60 and 70, the transparent substrate used for the exposure uses the electromagnetic shielding material manufacturing apparatus 1 shown in FIG. 1 and the electromagnetic shielding material manufacturing apparatus 1A shown in FIG. The description will be made with common reference numerals 64 and 74 without distinguishing from the case.

  A continuous exposure apparatus 60 shown in FIG. 4 includes a cylindrical drum 61 made of a material that transmits light used for exposure in the photographic manufacturing method, an exposure mask portion 62 provided on the outer peripheral wall of the cylindrical drum 61, and the inside of the cylindrical drum 61. And an exposure light source 63 disposed on the surface of the cylindrical drum 61, and the transparent substrate 64 wound around the cylindrical drum 61 is exposed by light emitted from the light source 63 inside the cylindrical drum 61. In the continuous exposure apparatus 60, a light source cover 65 having an opening 66 that transmits light in a specific irradiation direction can be provided around the exposure light source 63. The pattern for exposing the transparent substrate 64 is determined by the pattern of the portion of the exposure mask portion 62 that transmits light. The exposure mask portion 62 is disposed on the cylindrical drum 61 by, for example, being provided on the surface (inner surface or outer surface) of the outer peripheral wall of the cylindrical drum 61, or being inserted or sandwiched inside the outer peripheral wall. FIG. 4 is a diagram illustrating the case where the exposure mask portion 62 is provided on the outer surface of the outer peripheral wall of the cylindrical drum 61.

  In this continuous exposure apparatus 60, the cylindrical drum 61 rotates at the same speed as the transparent substrate 64 that is continuously transferred, so that exposure is performed at locations where each part of the transparent substrate 64 is wound around the cylindrical drum 61. During this time, the pattern of the exposure mask portion 62 on the transparent base material 64 (the pattern of the portion that transmits light and the portion that blocks light) is not shifted, and the exposure for the required time can be continued. The light source 63 used in the exposure apparatus can be appropriately selected depending on the spectral characteristics and sensitivity of the silver halide emulsion contained in the silver halide emulsion layer. For example, a tungsten lamp, an ultraviolet lamp, a fluorescent lamp, a xenon lamp, a metal halide A lamp or the like can be used. At the time of exposure, the light source cover 65 does not rotate, and the opening 66 is always directed in a certain direction (the right direction in FIG. 4), so that the light source is in a portion where the transparent base material 64 is away from the surface of the cylindrical drum 61. 63 light is blocked by the light source cover 65. That is, the exposure of the transparent substrate 64 by the light source 63 of the exposure apparatus 60 is performed within a certain range 67 where the transparent substrate 64 is wound around the surface of the cylindrical drum 61 on its transfer path. By controlling the exposure light amount and the irradiation time in accordance with the sensitivity, the optimum light amount can be reliably irradiated.

On the other hand, a continuous exposure apparatus 70 shown in FIG. 5 includes a cylindrical drum 71, an exposure mask film 72 on which a continuous pattern is formed, and an exposure light source 73 disposed outside the cylindrical drum 71, In this apparatus, the transparent substrate 74 and the exposure mask film 72 wound around the cylindrical drum 71 are irradiated with light from the outside of the cylindrical drum 71 to expose the transparent substrate 74.
The exposure mask film 72 forms a mesh pattern to be a mask on a transparent resin film by a known method such as a photolithographic method using reduced exposure, and is exposed by being superposed on the transparent substrate 74 and the cylindrical drum 71. Thereafter, the exposure mask film 72 is cut off from the transparent base material 74, wound up, and used repeatedly.
When the light source 73 is outside the cylindrical drum 71, the transparency of the cylindrical drum 71 is not particularly limited and may be opaque.

  The continuous exposure apparatus 70 can be provided with a light source cover 75 having an opening 76 that transmits light in a specific irradiation direction around the exposure light source 73, whereby the transparent substrate 74 is exposed by the light source 73. Is performed within a certain range 77 in which the transparent base material 74 is wound around the surface of the cylindrical drum 71 on the transfer path, so that the exposure light amount and the irradiation time can be reliably controlled. Here, as the light source 73, the same light source 63 as that of the above-described continuous exposure apparatus 60 can be used.

The continuous exposure apparatus 70 continuously transfers the superposed transparent base material 74 and the exposure mask film 72 while being wound around the cylindrical drum 71. Therefore, the continuous exposure apparatus 70 can be transferred while applying appropriate tension to both. The speed can be easily controlled, and the pattern of the exposure mask film 72 on the transparent substrate 74 (light-transmitting portion and light-shielding portion) is exposed while the portions of the transparent substrate 74 are wound around the cylindrical drum 71. Therefore, the exposure for the required time can be continued.
In addition to the continuous exposure apparatuses 60 and 70 exemplified above, for example, the superimposed transparent base material and exposure mask film are continuously exposed using a light source while being continuously conveyed along a linear path. An apparatus or the like can also be used. Further, the number of light sources for exposure is not particularly limited, and a plurality (in a plurality of locations) may be provided as necessary.

  The continuous exposure apparatuses 60 and 70 have an advantage that the processing speed is high and a continuous pattern without a break is obtained as compared with a conventional single wafer processing type exposure apparatus. In the present invention, in order to produce a wide and continuous roll sheet electromagnetic shielding material for covering a large area such as a window glass of a large building, it is necessary to form a continuous unbroken mesh pattern. When the developed silver mesh pattern 23 is formed on the transparent substrate 21, the continuous exposure devices 60 and 70 are used for exposure prior to development.

  Halation at any position on the transparent substrate on which the physical development nucleus layer is provided, for example, an adhesive layer, an intermediate layer, a physical development nucleus layer or a silver halide emulsion layer, a protective layer, or a backing layer provided with a support interposed therebetween Or a dye or pigment for preventing irradiation may be contained.

  When producing an electromagnetic shielding material using a photosensitive material in which a silver halide emulsion layer is coated directly on the physical development nucleus layer or via an intermediate layer, an arbitrary fine line pattern such as a mesh pattern is used. After exposing a transparent original and the photosensitive material in close contact, or by scanning and exposing a digital image of an arbitrary fine line pattern to the photosensitive material with various laser light output machines, in the presence of a soluble silver complex salt forming agent and a reducing agent. Silver complex diffusion transfer development (DTR development) occurs by processing in an alkaline solution, the silver halide in the unexposed area is dissolved to form a silver complex salt, which is reduced on the physical development nuclei, and metallic silver is precipitated to form a fine line. A physically developed silver thin film with a pattern can be obtained. The exposed portion is chemically developed in the silver halide emulsion layer to become blackened silver. After development, the silver halide emulsion layer and the intermediate layer, or the protective layer provided as necessary, are washed away with water, and a physically developed silver thin film having a fine line pattern is exposed on the surface.

  After DTR development, the silver halide emulsion layer or the like provided on the physical development nucleus layer may be removed by washing with water or transferring and peeling to a release paper or the like. There are two methods for removing the water washing: a method of removing hot water using a scrubbing roller or the like while jetting it with a nozzle or the like, and a method of removing hot water by jetting with a nozzle or the like.

  On the other hand, when the soluble silver complex salt is supplied from a silver halide emulsion layer provided on a substrate different from the transparent substrate on which the physical development nucleus layer is coated, the silver halide emulsion layer is exposed as described above. After that, a transparent substrate coated with a physical development nucleus layer and another photosensitive material coated with a silver halide emulsion layer are superposed in an alkaline solution in the presence of a soluble silver complexing agent and a reducing agent. After several tens of seconds to several minutes after taking out from the alkaline solution, the both are removed to obtain a physically developed silver thin film having a fine line pattern deposited on the physical development nuclei.

  Next, a soluble silver complex salt forming agent, a reducing agent, and an alkali solution necessary for silver complex diffusion transfer development will be described. The soluble silver complex salt forming agent is a compound that dissolves silver halide to form a soluble silver complex salt, and the reducing agent is a compound that reduces this soluble silver complex salt to precipitate metallic silver on physical development nuclei. These actions are performed in an alkaline solution.

  Examples of the soluble silver complex forming agent used in the present invention include sodium thiosulfate, thiosulfate such as ammonium thiosulfate, thiocyanate such as sodium thiocyanate and ammonium thiocyanate, alkanolamine, sodium sulfite, and potassium bisulfite. Sulfites such as T. H. Examples include compounds described in 474 to 475 (1977) of James The Theory of the Photographic Process 4th edition.

  As the reducing agent, a developing agent known in the field of photographic development can be used. For example, polyhydroxybenzenes such as hydroquinone, catechol, pyrogallol, methylhydroquinone, chlorohydroquinone, 1-phenyl-4,4-dimethyl-3-pyrazolidone, 1-phenyl-3-pyrazolidone, 1-phenyl-4-methyl- Examples include 3-pyrazolidones such as 4-hydroxymethyl-3-pyrazolidone, paramethylaminophenol, paraaminophenol, parahydroxyphenylglycine, paraphenylenediamine, and the like.

  The above-mentioned soluble silver complex salt forming agent and reducing agent may be applied to the transparent substrate together with the physical development nucleus layer, added to the silver halide emulsion layer, or contained in the alkaline solution. It may be allowed to be contained, and may be further contained in a plurality of positions, but is preferably contained at least in the alkaline liquid.

  The content of the soluble silver complex salt forming agent in the alkaline solution is suitably used in the range of 0.1 to 5 mol per liter of the developer, and the reducing agent is 0.05 to 1 per liter of the developer. It is suitable to use in the molar range.

  The pH of the alkaline solution is preferably 10 or more, and more preferably in the range of 11-14. Application of the alkaline solution for silver complex diffusion transfer development may be an immersion method or a coating method. The immersion method is, for example, transporting while immersing a transparent substrate provided with a physical development nucleus layer and a silver halide emulsion layer in an alkaline solution stored in a large amount in a tank. For example, about 40 to 120 ml of an alkaline solution per square meter is applied on the silver halide emulsion layer.

As described above, there are fine line patterns in which, for example, fine lines having a line width of about 10 to 100 μm are provided in a grid pattern in the vertical and horizontal directions. If the narrow line width is reduced and the interval between the gratings is increased, the translucency increases. However, the conductivity decreases, and conversely, if the fine line width is increased to reduce the lattice spacing, the translucency is decreased and the conductivity is increased. The silver image formed by physical development of an arbitrary fine line pattern formed on the transparent substrate according to the present invention has a translucency with a total light transmittance of 50% or more and a conductivity with a surface resistivity of 10 ohms / □ or less simultaneously. It is difficult to satisfy. Specifically, the silver image by this physical development has a conductivity of a surface resistivity of 50 ohms / square or less, preferably 20 ohms / square or less, but a pattern with a fine line width of 50 μm or less, for example, a fine line width of 20 μm. When the total light transmittance is 50% or more, the surface resistivity becomes several hundred ohms / square to 1000 ohms / square or more. However, the silver image by the physical development itself forms a silver image because the metallic silver particles forming the silver image obtained after the development processing are extremely small and the amount of the hydrophilic binder present in the silver image is extremely small. Since silver silver particles are formed in a state close to the close-packed state and a silver image is formed, it has electrical conductivity. Therefore, by applying plating (plating) with metals such as copper and nickel, When the pattern has a thickness of 0.5 to 15 μm and a line width of 10 to 50 μm, even if it is a translucent thin line pattern with a total light transmittance of 50% or more, preferably 60% or more, the surface resistivity is 10 ohms. / □ or less, preferably 7 ohm / □ or less can be maintained.
In order to improve the total light transmittance of the metal mesh, it is necessary to sufficiently increase the area of the light transmission portion between the fine lines with respect to the area of the region where the fine lines are provided. For this reason, it is preferable that the space | interval of a thin wire | line is 100-900 micrometers, More preferably, it is 150-700 micrometers.

  The thickness of the metal-plated fine line pattern can be arbitrarily changed according to desired characteristics, but is in the range of 0.5 to 15 μm, preferably 2 to 12 μm. Moreover, the electromagnetic shielding material produced by the above-mentioned method can obtain a shielding effect of 30 dB or more over a wide frequency band such as 30 MHz to 1,000 MHz.

  The thin line pattern of physically developed silver can be plated by any of an electroless plating method, an electrolytic plating method, or a plating method that combines both methods. However, when the electromagnetic wave shielding layer 22 is formed on the transparent substrate 21, a roll shape is used. From the standpoint that a thin line pattern made of developed silver produced on a long web of silver can be plated without supplying power and the plating film thickness can be uniformly applied, a method by electroless plating Is preferred.

  In the present invention, the electroless plating method can be performed by a known method, but the electroless plating is conventionally known, for example, copper, nickel, silver, gold, tin, solder, or a multilayer or composite system of copper / nickel. These methods can be used, and for these, reference can be made to documents such as “Basics and Applications of Electroless Plating; Nikkan Kogyo Shimbun, May 30, 1994, First Edition”.

It is preferable to use copper and / or nickel for reasons such as easy plating, excellent electrical conductivity, plating on a thick film, and low cost. An example of an electroless copper plating bath is copper sulfate: 30 g / dm ³ , sodium potassium tartrate (Rochelle salt): 100 g / dm ³ , formaldehyde: 30 cm ³ / dm ³ , sodium carbonate: 30 g / dm ³ , hydroxylation Sodium: 50 g / dm ³ Electroless copper plating can be performed at a bath temperature of 24 ° C.
Further, as an example of an electroless nickel plating bath, nickel sulfate: 21 g / dm ³ , sodium phosphinate: 25 g / dm ³ , sodium acetate: 10 g / dm ³ , pH: 4-6, no bath temperature of 90 ° C. Electrolytic nickel plating can be performed.
The type of the electroless plating tank 8 to be used may be either a vertical type or a horizontal type, but the electroless plating tank 8 can be used in accordance with the transfer speed of the roll sheet 3 so as to ensure a predetermined plating residence time. It is desirable to determine the length.

  The electromagnetic wave shielding layer (metal mesh pattern) 22 obtained by the above method has a total light transmittance of 50% or more and a surface resistivity when the mesh pattern has a thickness of 0.5 to 15 μm and a line width of 10 to 50 μm. It has excellent translucency and conductive performance of 10 ohms / square or less, and can exhibit a shielding effect of 30 dB or more over a wide frequency band such as 30 MHz to 1,000 MHz.

  According to the present invention, an electromagnetic shielding material supplied in a continuous roll sheet state for use by being attached to an outdoor side such as a window glass of a large building, which has weather resistance, which cannot be handled by a conventional manufacturing method, is manufactured. This can greatly improve quality and reduce costs.

In this invention, it is the schematic which shows an example of the apparatus which performs electroless plating continuously following exposure and development with a roll to roll. In this invention, it is the schematic which shows an example of the apparatus which performs electroless plating with a roll to roll. (A) is a partial top view which shows an example of arrangement | positioning of the mesh pattern in the electromagnetic wave shielding material roll body of this invention, (b) is sectional drawing which shows an example of the layer structure of an electromagnetic wave shielding material, (c) is an electromagnetic wave shield. It is sectional drawing which shows another example of the layer structure of a material. It is the schematic which shows an example of the continuous exposure apparatus used by this invention. It is the schematic which shows another example of the continuous exposure apparatus used by this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1, 1A ... Electromagnetic-shielding material manufacturing apparatus 2, 2A ... Original fabric roll, 3 ... Roll sheet, 4 ... Transfer roll, 5 ... Continuous exposure apparatus, 6 ... Developing apparatus, 7 ... Water washing tank, 8 ... Electroless plating Tank, 9 ... Electroless plating solution, 10 ... Receiving tank, 11 ... Circulation pump, 12 ... Filter, 13 ... Water washing tank, 14 ... Dryer, 15 ... Electromagnetic shielding material roll body, 20 ... Electromagnetic shielding material, 21 ... Transparent substrate, 22 ... metal mesh pattern, 23 ... development silver mesh pattern, 24, 24a, 24b ... metal plating layer, 25 ... transparent resin layer, 26 ... hard coat layer, 27 ... antifouling layer, 28 ... adhesive layer , 60 ... Continuous exposure apparatus, 61 ... Cylindrical drum, 62 ... Exposure mask portion, 63 ... Light source for exposure, 64 ... Transparent substrate, 65 ... Light source cover, 70 ... Continuous exposure apparatus, 71 ... Cylindrical drum, 72 ... Exposure mask fill , 73 ... light source for exposure, 74 ... transparent substrate, 75 ... light source cover.

Claims (11)

At least one surface of the long transparent base material is provided with a continuous metal mesh pattern in the longitudinal direction of the transparent base material, and is an electromagnetic shielding material roll body supplied in a roll state,
The metal mesh pattern is generated by a photographic process in which developed silver is developed. The transparent substrate is continuously fed, and the transparent substrate is continuously exposed to light irradiation without interruption. A developed silver mesh pattern formed by exposing through an exposure mask using a continuous exposure apparatus capable of forming a continuous mesh pattern in which lines can be formed without breaks, and then developing, and a roll thereon a metal plating layer made of an electroless copper plating layer and / or an electroless nickel plating layer, formed using an apparatus that continuously performs electroless plating with a to roll, and the metal mesh pattern includes: A metal mesh pattern in which the lines constituting the mesh pattern in the longitudinal direction of the transparent base material are continuous, and the uneven portion of the metal mesh pattern. Electromagnetic shielding material roll body, wherein the transparent resin layer is embedded.   2. The electromagnetic wave shielding material roll according to claim 1, wherein an antifouling layer is laminated on the transparent resin layer.   The electromagnetic wave shielding material roll according to claim 2, wherein a hard coat layer is laminated between the transparent resin layer and the antifouling layer.   The electromagnetic wave shielding material roll according to any one of claims 1 to 3, wherein the transparent resin layer contains an ultraviolet absorber.   The metal mesh pattern is provided on one side of a transparent base material, and an adhesive layer is provided on the other side of the transparent base material. Electromagnetic shielding material roll body.   The electromagnetic wave shielding material roll according to any one of claims 1 to 5, wherein the developed silver mesh pattern is generated by a negative development method in which developed silver is developed in an exposed portion.   The electromagnetic wave shielding material roll according to any one of claims 1 to 5, wherein the developed silver mesh pattern is generated by a positive developing method in which developed silver appears in a portion not exposed to light. In at least one surface of a long transparent substrate, a metal mesh pattern in which lines are continuous in the longitudinal direction of the transparent substrate is provided, and a method for producing an electromagnetic shielding material roll body that is supplied in a roll state There,
A transparent substrate provided with a layer containing a substance that deposits metallic silver by exposure and development, the feeding of the transparent substrate is continuous feeding, and the irradiation of light to the transparent substrate continues without interruption. By exposing through an exposure mask using a continuous exposure apparatus capable of forming a continuous mesh pattern in which lines can be continuously formed, and then developing the mesh in the longitudinal direction of the transparent substrate. A step of producing an original roll in which a developed silver mesh pattern in which lines constituting the pattern are continuous is generated; and
After continuously feeding the transparent base material provided with the developed silver mesh pattern from the raw fabric roll, on the developed silver mesh pattern, using an apparatus for continuously performing electroless plating with a roll-to-roll Forming a metal plating layer by electroless plating of copper and / or nickel, and rewinding to form a roll body;
A transparent resin embedding step of continuously feeding out the transparent base material on which the metal mesh pattern is formed, and embedding a transparent resin layer in the concavo-convex portion of the metal mesh pattern;
A method for producing an electromagnetic wave shielding material roll comprising at least In at least one surface of a long transparent substrate, a metal mesh pattern in which lines are continuous in the longitudinal direction of the transparent substrate is provided, and a method for producing an electromagnetic shielding material roll body that is supplied in a roll state There,
A transparent base material provided with a layer containing a substance that deposits metallic silver by exposure and development is continuously fed out, and the transparent base material is continuously fed to the transparent base material. By exposing through an exposure mask using a continuous exposure apparatus that can form a continuous mesh pattern in which lines can be continuously exposed without being interrupted by light irradiation, and then developing, In the longitudinal direction of the transparent substrate, a developed silver mesh pattern in which the lines constituting the mesh pattern are continuously formed is generated. Subsequently, electroless plating is continuously performed on the developed silver mesh pattern by roll-to-roll. And forming a metal plating layer by electroless plating of copper and / or nickel using an apparatus performed in the above,
A transparent resin embedding step of continuously feeding out the transparent base material on which the metal mesh pattern is formed, and embedding a transparent resin layer in the concavo-convex portion of the metal mesh pattern;
A method for producing an electromagnetic wave shielding material roll comprising at least   The method for producing an electromagnetic shielding material roll according to claim 8 or 9, wherein the development silver mesh pattern is generated by a negative development method in which developed silver is developed in an exposed portion.   The method for producing an electromagnetic wave shielding material roll according to claim 8 or 9, wherein the development silver mesh pattern is generated by a positive development method in which developed silver appears in a portion not exposed to light.

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