CN102896104A - Base plate washing equipment and base plate washing system - Google Patents
Base plate washing equipment and base plate washing system Download PDFInfo
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- CN102896104A CN102896104A CN2012103912202A CN201210391220A CN102896104A CN 102896104 A CN102896104 A CN 102896104A CN 2012103912202 A CN2012103912202 A CN 2012103912202A CN 201210391220 A CN201210391220 A CN 201210391220A CN 102896104 A CN102896104 A CN 102896104A
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Abstract
The embodiment of the invention provides base plate washing equipment and a base plate washing system, relating to the field of display manufacture and being capable of adaptively replenishing a washing liquid to a washing unit through a liquid replenishing unit, saving the washing liquid, shortening resetting time of the base plate washing equipment and avoiding a crash problem caused by synchronous resetting of two base plate washing equipment on an assembly line. The base plate washing equipment comprises the washing unit and the liquid replenishing unit which are communicated with each other, a liquid replenishing control device arranged between the washing unit and the liquid replenishing unit and used for controlling a flowing state of the liquid, and a controller connected with the liquid replenishing control device and used for controlling the liquid replenishing control device to act, wherein the washing unit is used for storing the washing liquid and washing a base plate; the liquid replenishing unit is used for storing the washing liquid and replenishing the washing liquid to the washing unit; and the controller is used for controlling the flowing state of the washing liquid between the liquid replenishing unit and the washing unit by controlling actions of the liquid replenishing control device.
Description
Technical field
The present invention relates to art of display device manufacture, relate in particular to a kind of substrate cleaning apparatus and basal plate cleaning system.
Background technology
At TFT-LCD (Thin Film Transistor-Liquid Crystal Display, Thin Film Transistor-LCD) in the manufacture process, cleaning equipment need to clean the substrate (namely apply photoresist before substrate) that carries out before the photoetching technique, to remove the impurity of substrate surface.
In the process of current base-plate cleaning, often adopt the mode of two stylobate plate cleaning equipment alternations to carry out base-plate cleaning.After setting respectively the cleaning frequency on the two stylobate plate cleaning equipments, cleaning quantity, two equipment are regularly reset in turn.Wherein, " replacement " refers to the substrate cleaning apparatus effluent discharge, again adds the process of cleaning fluid and heating to cleaning case.Cleaning fluid is mixed by washing agent and water, and rinse liquid temperature need to reach 43 ℃ usually.
But, in the base-plate cleaning process of reality, the First substrate cleaning apparatus cleans first, substrate is positioned on the streamline above the substrate cleaning apparatus, substrate cleaning apparatus pumps up cleaning fluid by the water plug that inside arranges, flusher by substrate cleaning apparatus sprays cleaning fluid to the substrate on the streamline again, with cleaning base plate.Carrying out (" flow " refers to that substrate passes through the transportation of streamline through the process of substrate cleaning apparatus cleaning) along with flow, substrate can be taken away the part cleaning fluid, cause when the quantity of cleaning base plate does not also reach First substrate cleaning apparatus predetermined number, cleaning fluid just has been lower than the liquid level bottom line.At this moment, the First substrate cleaning apparatus need to replenish cleaning fluid full and again reset.When the First substrate cleaning apparatus was reset, the second stylobate plate cleaning equipment carried out base-plate cleaning.After the replacement of First substrate cleaning apparatus is finished, switch back again the First substrate cleaning apparatus and carry out base-plate cleaning.At this moment, because the First substrate cleaning apparatus has cleaned the substrate of some, therefore, after reaching the cleaning quantity that sets when the First substrate cleaning apparatus, First substrate cleaning apparatus all cleaning fluids of can draining, replenish new cleaning fluid, this process has caused the significant wastage of cleaning fluid, and resetting simultaneously can the waste plenty of time.In addition, if First substrate cleaning apparatus and the second stylobate plate cleaning equipment are reset simultaneously, will cause crashing, then not have substrate cleaning apparatus to carry out work on the streamline, affect cleaning efficiency.
Summary of the invention
Embodiments of the invention provide a kind of substrate cleaning apparatus and basal plate cleaning system, can adaptability by the fluid infusion unit to cleaning unit supply cleaning fluid, save cleaning fluid, shorten the time that substrate cleaning apparatus is reset, avoid the deadlock problem of resetting simultaneously and causing owing to two stylobate plate cleaning equipments on the streamline.
For achieving the above object, embodiments of the invention adopt following technical scheme:
On the one hand, the embodiment of the invention provides a kind of substrate cleaning apparatus, comprising:
The cleaning unit that is interconnected and fluid infusion unit;
Be arranged between described cleaning unit and the described fluid infusion unit, be used for the liquid supplementing control device of control liquid flow;
Be connected with described liquid supplementing control device, control the controller of described liquid supplementing control device action;
Wherein, described cleaning unit is used for store washing liquid described substrate is cleaned;
Described fluid infusion unit is used for storing described cleaning fluid to described cleaning unit additional clean liquid;
Described controller by controlling the action of described liquid supplementing control device, is controlled described cleaning fluid flowing between described fluid infusion unit and described cleaning unit.
Described controller specifically is used for: when the liquid level of cleaning fluid described in the described cleaning unit is lower than preset height, regulate described liquid supplementing control device, so that described fluid infusion unit is to the described cleaning fluid of described cleaning unit supply.
Described controller, specifically be used for: when the liquid level of cleaning fluid described in the described cleaning unit is lower than preset height, according to the quantity of the substrate that has cleaned and the difference of predetermined number, regulate described liquid supplementing control device, so that described fluid infusion unit is to the corresponding described cleaning fluid of described cleaning unit supply.
Described controller also is used for, and controls described liquid supplementing control device, cuts off cleaning fluid flowing between described cleaning unit and fluid infusion unit.
Described cleaning unit and described fluid infusion unit cavity communicate;
Described liquid supplementing control device comprises: be arranged between described cleaning unit and the described fluid infusion unit movably every Yehmen (ying-Spring point SJ 2).
Described every Yehmen (ying-Spring point SJ 2), concrete being used for by described rising every Yehmen (ying-Spring point SJ 2) or decline, control described cleaning fluid flowing between described fluid infusion unit and described cleaning unit.
Described cleaning fluid is mixed by washing agent and water.
Described substrate cleaning apparatus also comprises the washing agent pipeline, filling pipe, drainage pipeline and the washing lotion reflux line that all are connected with described cleaning unit, wherein,
Described washing agent pipeline is used for injecting described washing agent in described cleaning unit and fluid infusion unit;
Described filling pipe is used for injecting described water in described cleaning unit and fluid infusion unit;
Described drainage pipeline is used for discharging the described cleaning fluid in the described cleaning unit;
Described washing lotion reflux line is used for so that the described cleaning fluid that carries out behind the base-plate cleaning passes back into described cleaning unit.
Described substrate cleaning apparatus also comprises: be arranged at first heater and the first liquid level sensor in the described cleaning unit, wherein,
Described first heater is used for heating the described cleaning fluid in the described cleaning unit;
Described the first liquid level sensor is for detection of the liquid level of the described cleaning fluid in the described cleaning unit.
Described substrate cleaning apparatus also comprises: be arranged at secondary heating mechanism and second liquid level sensor of described fluid infusion unit, wherein,
Described secondary heating mechanism is used for heating the described cleaning fluid in the described fluid infusion unit;
Described the second liquid level sensor is for detection of the liquid level of the described cleaning fluid in the described fluid infusion unit.
On the one hand, the embodiment of the invention provides a kind of basal plate cleaning system, comprises at least two substrate cleaning apparatus with above-mentioned arbitrary characteristics.
The substrate cleaning apparatus that the embodiment of the invention provides and basal plate cleaning system, the cleaning unit and the fluid infusion unit that are interconnected by setting, be arranged between cleaning unit and the fluid infusion unit, the liquid supplementing control device that is used for the control liquid flow, be connected with liquid supplementing control device, the controller of control liquid supplementing control device action, wherein, cleaning unit is used for store washing liquid, the fluid infusion unit, be used for store washing liquid, controller, by the action of control liquid supplementing control device, the control cleaning fluid is flowed in the cleaning unit by the fluid infusion unit.By this scheme, owing between cleaning unit and fluid infusion unit, being provided with liquid supplementing control device, can adaptability by the fluid infusion unit to cleaning unit supply cleaning fluid, save cleaning fluid, shorten the time that substrate cleaning apparatus is reset, simultaneously, because two stylobate plate cleaning equipments all are just to reset after having cleaned the substrate of preset number, the replacement time is controlled, prevent because additional clean liquid occurs repeatedly to reset, cause two stylobate plate cleaning equipments to reset simultaneously and cause crashing, affect the equipment normal operation.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art, the below will do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art, apparently, accompanying drawing in the following describes only is some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
The substrate cleaning apparatus structural representation that Fig. 1 provides for the embodiment of the invention;
The substrate cleaning apparatus workflow diagram one that Fig. 2 provides for the embodiment of the invention;
The substrate cleaning apparatus workflow diagram two that Fig. 3 provides for the embodiment of the invention;
The substrate cleaning apparatus workflow diagram three that Fig. 4 provides for the embodiment of the invention.
The specific embodiment
Below in conjunction with the accompanying drawing in the embodiment of the invention, the technical scheme in the embodiment of the invention is clearly and completely described, obviously, described embodiment only is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment among the present invention, those of ordinary skills belong to the scope of protection of the invention not making the every other embodiment that obtains under the creative work prerequisite.
The embodiment of the invention provides a kind of substrate cleaning apparatus, comprising:
The cleaning unit that is interconnected and fluid infusion unit;
Be arranged between described cleaning unit and the described fluid infusion unit, be used for the liquid supplementing control device of control liquid flow;
Be connected with described liquid supplementing control device, control the controller of described liquid supplementing control device action;
Wherein, described cleaning unit is used for store washing liquid described substrate is cleaned;
Described fluid infusion unit is used for storing described cleaning fluid to described cleaning unit additional clean liquid;
Described controller by controlling the action of described liquid supplementing control device, is controlled described cleaning fluid flowing between described fluid infusion unit and described cleaning unit.
Exemplary, the embodiment of the invention provides a kind of substrate cleaning apparatus 1, as shown in Figure 1, comprising:
The cleaning unit 10 that is interconnected, fluid infusion unit 11 are arranged between cleaning unit 10 and the fluid infusion unit 11, are used for the liquid supplementing control device 12 of control liquid flow, and are connected with liquid supplementing control device 12, the controller 13 of control liquid supplementing control device action;
Further, substrate cleaning apparatus 1 also comprises the washing agent pipeline 14, filling pipe 15, drainage pipeline 16 and the washing lotion reflux line 17 that all are connected with this cleaning unit 10, wherein, washing agent pipeline 14 is used for to cleaning unit 10 and fluid infusion unit 11 interior injection washing agent;
Filling pipe 15 is used for to cleaning unit 10 and fluid infusion unit 11 interior injected waters;
Washing lotion reflux line 17 is used for so that the cleaning fluid that carries out behind the base-plate cleaning passes back into cleaning unit 10.
Further, substrate cleaning apparatus 1 also comprises the first heater 100 and the first liquid level sensor 101 that are arranged in the cleaning unit 10, wherein,
The first liquid level sensor 101 is for detection of the liquid level of cleaning unit 10 cleaning liquid insides.
Particularly, when base-plate cleaning is equipped 1 cleaning base plate, generally need first heater 100 will be heated to by the cleaning fluid that washing agent and water mix 43 ℃.
Need to prove, according to subscriber policy, first heater 100 quits work after cleaning fluid can being heated to 43 ℃, when the temperature of cleaning fluid heats less than 43 ℃ the time again, keep constant temperature after also cleaning fluid can being heated to 43 ℃, the temperature of keeping cleaning fluid is 43 ℃ always.
In the embodiment of the invention, in carrying out the base-plate cleaning process, substrate can be taken away the part cleaning fluid.Increase along with base-plate cleaning quantity, when the liquid level that detects the cleaning fluid in the cleaning unit 10 when the first liquid level sensor 101 had been lower than the preset height of substrate cleaning apparatus 1, fluid infusion unit 11 just need to be to cleaning unit 10 adaptive additional clean liquid.How fluid infusion unit 11 will be discussed in more detail below to the process of cleaning unit 10 adaptive additional clean liquid.
What need to replenish is, the first liquid level sensor 101, not only whether be lower than the preset height of substrate cleaning apparatus 1 for detection of the liquid level of the cleaning fluid in the cleaning unit 10, also equal the predetermined number of substrate cleaning apparatus 1 cleaning base plate for detection of the quantity when substrate cleaning apparatus 1 cleaning base plate, all cleaning fluids of draining, when replenishing new cleaning fluid, detect cleaning fluid and whether be full of substrate cleaning apparatus 1.
At first, in conjunction with washing agent pipeline 14, filling pipe 15, drainage pipeline 16 and washing lotion reflux line 17, the workflow of cleaning unit 10 cleaning base plates 2 of substrate cleaning apparatus 1 is described.
During substrate cleaning apparatus 1 cleaning base plate 2 that the embodiment of the invention provides, as shown in Figure 2, substrate 2 is positioned on the conveyer 3 above the substrate cleaning apparatus 1, substrate cleaning apparatus 1 is pumped cleaning fluid to flusher 19 (flow direction of cleaning fluid is shown in solid arrow among Fig. 2) by water plug 18, spray cleaning fluid with the substrate 2 on streamline, and then cleaning base plate 2, the cleaning fluid that cleaned substrate 2 is back to cleaning unit 10 interior recycling (flow direction of cleaning fluid is shown in dotted arrow among Fig. 2) by washing lotion reflux line 17.When the quantity of the substrate that cleaned when substrate cleaning apparatus 1 equals the predetermined number of cleaning base plate, substrate cleaning apparatus 1 is by drainage pipeline 16 effluent discharges, again by washing agent pipeline 14 and filling pipe 15 according to certain ratio to cleaning unit 10 interior injection washing agent and water, be mixed into cleaning fluid, to prepare to enter the cleaning process of next round.
Need to prove, being used for the cleaning fluid of cleaning base plate 2 is that washing agent and water mix according to a certain percentage, respectively inject washing agent and water according to certain ratio to cleaning unit 10 is interior by washing agent pipeline 14 and filling pipe 15, so that washing agent and water are mixed into cleaning fluid.
Further, substrate cleaning apparatus 1 also comprises secondary heating mechanism 110 and the second liquid level sensor 111 that is arranged in the fluid infusion unit 11, wherein,
The first liquid level sensor 101 is for detection of the liquid level of fluid infusion unit 11 cleaning liquid insides.
Particularly, when base-plate cleaning is equipped 1 cleaning base plate, generally need secondary heating mechanism 110 will be heated to by the cleaning fluid that washing agent and water mix 43 ℃.
Need to prove, secondary heating mechanism 110 quits work after cleaning fluid can being heated to 43 ℃, keeps constant temperature after the temperature of cleaning fluid heats less than 43 ℃ the time again, also cleaning fluid can be heated to 43 ℃, the temperature of keeping cleaning fluid is 43 ℃ always, and the present invention does not limit.Simultaneously, because secondary heating mechanism 110 is so that the temperature of the cleaning fluid of fluid infusion unit maintains 43 ℃, when cleaning unit needs the supply cleaning fluid, the cleaning fluid that replenishes from the fluid infusion unit can directly use and the heating of need not resetting in addition, and then reduced the time that substrate cleaning apparatus is reset, improved the efficient of base-plate cleaning.
Secondly, will how describe to the process of cleaning unit 10 supply cleaning fluids adaptively fluid infusion unit 11.
In the base-plate cleaning process of the embodiment of the invention, the substrate that cleaned can be taken away the part cleaning fluid, increase along with base-plate cleaning quantity, when the liquid level that detects the cleaning fluid in the cleaning unit 10 when the first liquid level sensor 101 had been lower than the preset height of substrate cleaning apparatus 1, fluid infusion unit 11 just need to be to cleaning unit 10 adaptive additional clean liquid.Fluid infusion unit 11 is by the second liquid level sensor 111, detect the liquid level of the cleaning fluid in the fluid infusion unit 11, the difference of the predetermined number of the substrate that the number of substrates of then having cleaned according to substrate cleaning apparatus 1 and needs clean, adaptive to cleaning unit 10 interior additional clean liquid.
What need to replenish is, the second liquid level sensor 111, not only for detection of the liquid level of the cleaning fluid in the fluid infusion unit 11, with adaptive to cleaning unit 10 interior additional clean liquid, also equal the predetermined number of substrate cleaning apparatus 1 cleaning base plate for detection of the quantity when substrate cleaning apparatus 1 cleaning base plate, all cleaning fluids of draining when replenishing new cleaning fluid, detect cleaning fluid and whether have been full of substrate cleaning apparatus 1.
Liquid supplementing control device 12 is used for flowing of control fluid infusion unit 11 and cleaning unit 10 cleaning liquid insides.
Particularly, when the liquid level of cleaning fluid in the cleaning unit 10 is lower than preset height, according to the quantity of the substrate that has cleaned and the difference of predetermined number, regulate liquid supplementing control device 12, so that fluid infusion unit 11 is to the cleaning fluid of cleaning unit 10 supply respective amount.
Further, controller 13 also is used for, and control liquid supplementing control device 12 cuts off the liquid flow between cleaning unit 10 and the fluid infusion unit 11.
Particularly, after cleaning unit 10 and 11 fluid infusion of fluid infusion unit were finished, controller 13 also was used for cutting out liquid supplementing control device 12, cuts off the liquid flow between cleaning unit 10 and the fluid infusion unit 11.
Need to prove, cleaned the substrate of preset number when substrate cleaning apparatus after, cleaning fluid in the cleaning unit 10 can be all emptying, need to refill new cleaning fluid, in injection process, controller 13 also is used for control liquid supplementing control device 12 and is communicated with described cleaning unit 10 and fluid infusion unit 11, so that new cleaning fluid is full of described cleaning unit 10 and fluid infusion unit 11.
At last, will how to control liquid supplementing control device 12 to controller 13, the process that the cleaning fluid of fluid infusion unit 11 is supplemented to cleaning unit 10 describes.
Substrate cleaning apparatus of the prior art is in the base-plate cleaning process, article one, have at least two stylobate plate cleaning equipments to devote oneself to work on the streamline, the First substrate cleaning apparatus cleans first, the substrate that cleaned can be taken away the part cleaning fluid, when causing the quantity of cleaning base plate not reach the predetermined number of First substrate cleaning apparatus, the liquid level of cleaning fluid just has been lower than the preset height that substrate cleaning apparatus cleans liquid level, at this moment the First substrate cleaning apparatus need to replenish cleaning fluid full and again reset, wherein, replacement refers to the substrate cleaning apparatus effluent discharge, again the process that adds cleaning fluid and heating to cleaning case, when the First substrate cleaning apparatus is reset, the second stylobate plate cleaning equipment carries out base-plate cleaning, after the replacement of First substrate cleaning apparatus is finished, switch back again the First substrate cleaning apparatus and carry out base-plate cleaning, at this moment, because the First substrate cleaning apparatus has cleaned the substrate of some, therefore, after the quantity of First substrate cleaning apparatus cleaning base plate equals the predetermined number of substrate cleaning apparatus cleaning base plate, First substrate cleaning apparatus all cleaning fluids of can draining, replenish new cleaning fluid, this process has caused the significant wastage of cleaning fluid, and resetting simultaneously can the waste plenty of time.If First substrate cleaning apparatus and the second stylobate plate cleaning equipment are reset simultaneously, then there is not substrate cleaning apparatus to carry out work on the streamline, will cause crashing.
The substrate cleaning apparatus 1 that the embodiment of the invention provides is in the base-plate cleaning process, substrate can be taken away the part cleaning fluid, increase along with base-plate cleaning quantity, when the liquid level that detects the cleaning fluid in the cleaning unit 10 when the first liquid level sensor 101 has been lower than the preset height of substrate cleaning apparatus 1, fluid infusion unit 11 just need to be to cleaning unit 10 adaptive additional clean liquid, according to the quantity of the substrate that has cleaned and the difference of predetermined number, controller 13 is regulated liquid supplementing control device 12, so that fluid infusion unit 11 is to the corresponding cleaning fluid of cleaning unit 10 supplies.
Exemplary, preset substrate cleaning apparatus 1 needing the predetermined number of cleaning base plate is 150 substrates, the preset height of cleaning fluid liquid level is 80 centimetres, in the base-plate cleaning process of reality, when substrate cleaning apparatus 1 is full of cleaning fluid, the liquid level of cleaning fluid is 100 centimetres, the substrate that cleaned can be taken away the part cleaning fluid, when the quantity of substrate cleaning apparatus 1 cleaning base plate reaches 130, the liquid level that the first liquid level sensor 101 detects the cleaning fluid in the cleaning unit 10 has been lower than 80 centimetres of the preset height of substrate cleaning apparatus 1, at this moment fluid infusion unit 11 just need to be to cleaning unit 10 adaptive additional clean liquid, according to the quantity of the substrate that has cleaned and the difference of predetermined number, this substrate cleaning apparatus also need clean 20 substrates and just can reset, controller 13 is regulated liquid supplementing control device 12, so that fluid infusion unit 11 need to clean the corresponding cleaning fluid of remaining 20 substrates to cleaning unit 10 supplies, compared with prior art, the substrate cleaning apparatus 1 that the embodiment of the invention provides can adaptability by the fluid infusion unit to cleaning unit supply cleaning fluid, farthest saved cleaning fluid.
What need to replenish is, controller 13 is regulated liquid supplementing control device 12, fluid infusion unit 11 need to clean the cleaning fluid of remaining 20 substrates to cleaning unit 10 supplies, the cleaning fluid quantity of being replenished is more bigger than the quantity of cleaning 20 needed cleaning fluids of substrate, because the carrying out along with flow, substrate can be taken away the part cleaning fluid, 20 needed cleaning fluids of substrate of cleaning that can cause like this being replenished are not enough to clean 20 substrates, generally speaking, according to the quantity of the substrate that has cleaned and the difference of predetermined number, fluid infusion unit 11 replenishes than the quantity of the substrate that has cleaned and the bigger corresponding cleaning fluid of difference of predetermined number to cleaning unit 10.
When the quantity of cleaning unit 10 cleaning base plates equaled predetermined number, substrate cleaning apparatus 1 was reset.Drainage pipeline 16 can be discharged all cleaning fluids in the cleaning unit 10.After discharging all cleaning fluids, controller 13 can be opened liquid supplementing control device 12, cleaning unit 10 and fluid infusion unit 11 are connected, washing agent pipeline 14 and filling pipe 15 to cleaning unit 10 interior injection washing agent and water, make cleaning fluid be full of cleaning unit 10 and fluid infusion unit 11 according to certain ratio.
After cleaning unit 10 and 11 fluid infusion of fluid infusion unit are finished, controller 13, also be used for closing liquid supplementing control device 12, cut off the liquid flow between cleaning unit 10 and the fluid infusion unit 11, at this moment first heater 100 and secondary heating mechanism 110 heat the cleaning fluid in cleaning unit 10 and the fluid infusion unit 11 respectively.
Exemplary, as shown in Figure 3, liquid supplementing control device can be to be built up in a fan between the cleaning unit 10 that is interconnected and the fluid infusion unit 11 movably every Yehmen (ying-Spring point SJ 2) 12, should be every Yehmen (ying-Spring point SJ 2) 12, be used for by rising and decline every Yehmen (ying-Spring point SJ 2) 12, the control cleaning fluid is flowed in the cleaning unit 10 by fluid infusion unit 11.
Need to prove, cleaning unit 10 and fluid infusion unit 11 cavitys communicate, for example, cleaning unit 10 and fluid infusion unit 11 can be two independent cavitys, cleaning unit 10 links to each other (as shown in Figure 1) by a pipeline with fluid infusion unit 11, when fluid infusion unit 11 during to the corresponding cleaning fluid of cleaning unit 10 supplies, by extruding, the mode such as draw water is to the corresponding cleaning fluid of cleaning unit 10 interior supplies, can utilize Pneumatic pipe cleaner to cross to be built up in the cleaning unit 10 that is interconnected and the fan between the fluid infusion unit 11 movably every the flowing of Yehmen (ying-Spring point SJ 2) 12 control liquid, the present invention does not limit yet.When real work, adopt preferred version to carry out work (as shown in Figure 3), cleaning unit 10 and fluid infusion unit 11 are complete cavitys, liquid supplementing control device is to be built up in a fan between the cleaning unit 10 that is interconnected and the fluid infusion unit 11 movably every Yehmen (ying-Spring point SJ 2) 12, by rising and the decline every Yehmen (ying-Spring point SJ 2) 12, the control cleaning fluid is flowed in the cleaning unit 10 by fluid infusion unit 11.
Particularly, workflow above-described embodiment of base plate cleaning device 1 is described, and repeats no more herein.How the below will control every Yehmen (ying-Spring point SJ 2) 12 controller 13, and the process that the cleaning fluid of fluid infusion unit 11 is supplemented to cleaning unit 10 describes.
Substrate cleaning apparatus of the prior art is in the base-plate cleaning process, article one, have at least two stylobate plate cleaning equipments to devote oneself to work on the streamline, the First substrate cleaning apparatus cleans first, the substrate that cleaned can be taken away the part cleaning fluid, when causing the quantity of cleaning base plate not reach the predetermined number of First substrate cleaning apparatus, the liquid level of cleaning fluid just has been lower than the preset height that substrate cleaning apparatus cleans liquid level, at this moment the First substrate cleaning apparatus need to replenish cleaning fluid full and again reset, wherein, replacement refers to the substrate cleaning apparatus effluent discharge, again the process that adds cleaning fluid and heating to cleaning case, when the First substrate cleaning apparatus is reset, the second stylobate plate cleaning equipment carries out base-plate cleaning, after the replacement of First substrate cleaning apparatus is finished, switch back again the First substrate cleaning apparatus and carry out base-plate cleaning, at this moment, because the First substrate cleaning apparatus has cleaned the substrate of some, therefore, after the quantity of First substrate cleaning apparatus cleaning base plate equals the predetermined number of substrate cleaning apparatus cleaning base plate, First substrate cleaning apparatus all cleaning fluids of can draining, replenish new cleaning fluid, this process has caused the significant wastage of cleaning fluid, and resetting simultaneously can the waste plenty of time.If First substrate cleaning apparatus and the second stylobate plate cleaning equipment are reset simultaneously, then do not have substrate cleaning apparatus to carry out work on the streamline, and then cause crashing.
The substrate cleaning apparatus 1 that the embodiment of the invention provides is in the base-plate cleaning process, substrate can be taken away the part cleaning fluid, increase along with base-plate cleaning quantity, when the liquid level that detects the cleaning fluid in the cleaning unit 10 when the first liquid level sensor 101 has been lower than the preset height of substrate cleaning apparatus 1, fluid infusion unit 11 just need to be to cleaning unit 10 adaptive additional clean liquid, according to the quantity of the substrate that has cleaned and the difference of predetermined number, controller 13 is regulated every Yehmen (ying-Spring point SJ 2) 12 and is descended accordingly highly, so that fluid infusion unit 11 is to the corresponding cleaning fluid of cleaning unit 10 supplies.
Exemplary, preset substrate cleaning apparatus 1 needing the predetermined number of cleaning base plate is 150 substrates, the preset height of cleaning fluid liquid level is 80 centimetres, in the base-plate cleaning process of reality, when substrate cleaning apparatus 1 is full of cleaning fluid, the liquid level of cleaning fluid is 100 centimetres, the substrate that cleaned can be taken away the part cleaning fluid, when the quantity of substrate cleaning apparatus 1 cleaning base plate reaches 130, the liquid level that the first liquid level sensor 101 detects the cleaning fluid in the cleaning unit 10 has been lower than 80 centimetres of the preset height of substrate cleaning apparatus 1, at this moment fluid infusion unit 11 just need to be to cleaning unit 10 adaptive additional clean liquid, according to the quantity of the substrate that has cleaned and the difference of predetermined number, this substrate cleaning apparatus also need clean 20 substrates and just can reset, controller 13 is regulated and is descended highly corresponding every Yehmen (ying-Spring point SJ 2) 12, so that fluid infusion unit 11 need to clean the corresponding cleaning fluid of remaining 20 substrates to cleaning unit 10 supplies, compared with prior art, the substrate cleaning apparatus 1 that the embodiment of the invention provides can adaptability by the fluid infusion unit to cleaning unit supply cleaning fluid, farthest saved cleaning fluid.Simultaneously, because secondary heating mechanism 110 is so that the temperature of the cleaning fluid of fluid infusion unit maintains 43 ℃, when cleaning unit needs the supply cleaning fluid, the cleaning fluid that replenishes from the fluid infusion unit can directly use and the heating of need not resetting in addition, and then reduced the time that substrate cleaning apparatus is reset, improved the efficient of base-plate cleaning.
What need to replenish is, controller 13 is regulated and is descended highly corresponding every Yehmen (ying-Spring point SJ 2) 12, fluid infusion unit 11 need to clean the cleaning fluid of remaining 20 substrates to cleaning unit 10 supplies, the cleaning fluid quantity of being replenished is more bigger than the quantity of cleaning 20 needed cleaning fluids of substrate, because the carrying out along with flow, substrate can be taken away the part cleaning fluid, 20 needed cleaning fluids of substrate of cleaning that can cause like this being replenished are not enough to clean 20 substrates, generally speaking, according to the quantity of the substrate that has cleaned and the difference of predetermined number, fluid infusion unit 11 replenishes than the quantity of the substrate that has cleaned and the bigger corresponding cleaning fluid of difference of predetermined number to cleaning unit 10.
When the quantity of cleaning unit 10 cleaning base plates equaled predetermined number, substrate cleaning apparatus 1 was reset.Drainage pipeline 16 can be discharged all cleaning fluids in the cleaning unit 10.After discharging all cleaning fluids, controller 13 can rise every Yehmen (ying-Spring point SJ 2) 12 in control, cleaning unit 10 and fluid infusion unit 11 are connected, and washing agent pipeline 14 and filling pipe 15 to cleaning unit 10 interior injection washing agent and water, make cleaning fluid be full of cleaning unit 10 and fluid infusion unit 11 according to certain ratio.
After cleaning unit 10 and 11 fluid infusion of fluid infusion unit are finished, controller 13, also be used for closing every Yehmen (ying-Spring point SJ 2) 12, so that the cleaning fluid of fluid infusion unit 11 does not flow into cleaning unit 10, at this moment first heater 100 and secondary heating mechanism 110 heat the cleaning fluid in cleaning unit 10 and the fluid infusion unit 11 respectively.
What need to replenish is, can be the structure of similar " sliding door " every the structure of Yehmen (ying-Spring point SJ 2) 12, rise or descend by the partition board of controller 13 controls every Yehmen (ying-Spring point SJ 2), and can be the structures such as rolling screen door, folding door also every the structure of Yehmen (ying-Spring point SJ 2) 12, the present invention does not limit.
Exemplary, as shown in Figure 4, the cleaning unit 10 that is interconnected and fluid infusion unit 11 can be up-down structure settings, can reach equally adaptability by fluid infusion unit 11 to cleaning unit 10 supply cleaning fluids, the purpose of having saved cleaning fluid.
The substrate cleaning apparatus 1 that the embodiment of the invention provides is in the base-plate cleaning process, substrate can be taken away the part cleaning fluid, increase along with base-plate cleaning quantity, when the liquid level that detects the cleaning fluid in the cleaning unit 10 when the first liquid level sensor 101 has been lower than the preset height of substrate cleaning apparatus 1, fluid infusion unit 11 just need to be to cleaning unit 10 adaptive additional clean liquid, according to the quantity of the substrate that has cleaned and the difference of predetermined number, controller 13 is regulated liquid supplementing control device 12, so that fluid infusion unit 11 is to the cleaning fluid of cleaning unit 10 supply respective amount.
When the quantity of cleaning unit 10 cleaning base plates equaled predetermined number, substrate cleaning apparatus 1 was reset.Drainage pipeline 16 can be discharged all cleaning fluids in the cleaning unit 10.After discharging all cleaning fluids, controller 13 can be opened liquid supplementing control device 12, cleaning unit 10 and fluid infusion unit 11 are connected, washing agent pipeline 14 and filling pipe 15 to cleaning unit 10 interior injection washing agent and water, make cleaning fluid be full of cleaning unit 10 and fluid infusion unit 11 according to certain ratio.
After cleaning unit 10 and 11 fluid infusion of fluid infusion unit are finished, controller 13, also be used for closing liquid supplementing control device 12, so that the cleaning fluid of fluid infusion unit 11 does not flow into cleaning unit 10, at this moment first heater 100 and secondary heating mechanism 110 heat the cleaning fluid in cleaning unit 10 and the fluid infusion unit 11 respectively.
The substrate cleaning apparatus that the embodiment of the invention provides, the cleaning unit and the fluid infusion unit that are interconnected by setting, be arranged between cleaning unit and the fluid infusion unit, the liquid supplementing control device that is used for the control liquid flow, be connected with liquid supplementing control device, the controller of control liquid supplementing control device action, wherein, cleaning unit is used for store washing liquid, the fluid infusion unit, be used for store washing liquid, controller, by the action of control liquid supplementing control device, the control cleaning fluid is flowed in the cleaning unit by the fluid infusion unit.By this scheme, owing between cleaning unit and fluid infusion unit, being provided with liquid supplementing control device, can adaptability by the fluid infusion unit to cleaning unit supply cleaning fluid, saved cleaning fluid, shorten the time that substrate cleaning apparatus is reset, simultaneously, because two stylobate plate cleaning equipments all are just to reset after having cleaned the substrate of preset number, the replacement time is controlled, prevent because additional clean liquid occurs repeatedly to reset, cause two stylobate plate cleaning equipments to reset simultaneously and cause crashing, affect the equipment normal operation.
The embodiment of the invention also provides a kind of basal plate cleaning system, comprises at least two substrate cleaning apparatus with above-mentioned arbitrary characteristics.
Be provided with at least two above-mentioned substrate cleaning apparatus on every streamline, the substrate cleaning apparatus that at least two playscript with stage directions inventive embodiments provide adopts the mode of alternation to carry out base-plate cleaning.
Exemplary, two stylobate plate cleaning equipments are arranged on every streamline, describe for convenient, minute this two stylobates plate cleaning equipment of another name is first substrate cleaning equipment and second substrate cleaning equipment, and first substrate cleaning equipment and second substrate cleaning equipment adopt the mode of alternation to carry out base-plate cleaning.If the quantity of first substrate cleaning equipment cleaning base plate has reached predetermined number, then the first substrate cleaning equipment is reset, when the first substrate cleaning equipment is reset, the second substrate cleaning equipment is devoted oneself to work, when the second substrate cleaning equipment is reset, the first substrate cleaning equipment is devoted oneself to work, and two equipment are regularly reset in turn.
Need to prove, when the first substrate cleaning equipment is reset, the second substrate cleaning equipment is devoted oneself to work, the time that the time of the substrate of second substrate cleaning equipment cleaning predetermined number resets greater than the first substrate cleaning equipment, so when the second substrate cleaning equipment is reset, the first substrate cleaning equipment is sure devotes oneself to work, and then has a stylobate plate cleaning equipment on the streamline always and devotes oneself to work.
The basal plate cleaning system that the embodiment of the invention provides, this system comprises at least two substrate cleaning apparatus with above-mentioned arbitrary characteristics, cleaning unit and fluid infusion unit that described cleaning equipment is interconnected by setting, be arranged between cleaning unit and the fluid infusion unit, the liquid supplementing control device that is used for the control liquid flow, be connected with liquid supplementing control device, the controller of control liquid supplementing control device action, wherein, cleaning unit, be used for store washing liquid, the fluid infusion unit is used for store washing liquid, controller, by the action of control liquid supplementing control device, the control cleaning fluid is flowed in the cleaning unit by the fluid infusion unit.By this scheme owing between cleaning unit and fluid infusion unit, being provided with liquid supplementing control device, can adaptability by the fluid infusion unit to cleaning unit supply cleaning fluid, save cleaning fluid, the time of shortening substrate cleaning apparatus replacement.Simultaneously, because two stylobate plate cleaning equipments all are just to reset after having cleaned the substrate of preset number, the replacement time is controlled, prevents because additional clean liquid occurs repeatedly to reset, cause two stylobate plate cleaning equipments to reset simultaneously and cause crashing, affect the equipment normal operation.
The above; be the specific embodiment of the present invention only, but protection scope of the present invention is not limited to this, anyly is familiar with those skilled in the art in the technical scope that the present invention discloses; can expect easily changing or replacing, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of described claim.
Claims (11)
1. a substrate cleaning apparatus is characterized in that, comprising:
The cleaning unit that is interconnected and fluid infusion unit;
Be arranged between described cleaning unit and the described fluid infusion unit, be used for the liquid supplementing control device of control liquid flow;
Be connected with described liquid supplementing control device, control the controller of described liquid supplementing control device action;
Wherein, described cleaning unit is used for store washing liquid described substrate is cleaned;
Described fluid infusion unit is used for storing described cleaning fluid to described cleaning unit additional clean liquid;
Described controller by controlling the action of described liquid supplementing control device, is controlled described cleaning fluid flowing between described fluid infusion unit and described cleaning unit.
2. substrate cleaning apparatus according to claim 1, it is characterized in that, described controller, specifically be used for: when the liquid level of cleaning fluid described in the described cleaning unit is lower than preset height, regulate described liquid supplementing control device, so that described fluid infusion unit is to the described cleaning fluid of described cleaning unit supply.
3. substrate cleaning apparatus according to claim 2, it is characterized in that, described controller, specifically be used for: when the liquid level of cleaning fluid described in the described cleaning unit is lower than preset height, according to the quantity of the substrate that has cleaned and the difference of predetermined number, regulate described liquid supplementing control device, so that described fluid infusion unit is to the described cleaning fluid of described cleaning unit supply respective amount.
4. according to claim 1 and 2 or 3 described substrate cleaning apparatus, it is characterized in that, described controller also is used for, and controls described liquid supplementing control device, cuts off described cleaning fluid flowing between described cleaning unit and fluid infusion unit.
5. substrate cleaning apparatus according to claim 1 is characterized in that,
Described cleaning unit and described fluid infusion unit cavity communicate;
Described liquid supplementing control device comprises: be arranged between described cleaning unit and the described fluid infusion unit movably every Yehmen (ying-Spring point SJ 2).
6. substrate cleaning apparatus according to claim 5 is characterized in that, and is described every Yehmen (ying-Spring point SJ 2), specifically is used for: by described rising every Yehmen (ying-Spring point SJ 2) or decline, control described cleaning fluid flowing between described fluid infusion unit and described cleaning unit.
7. substrate cleaning apparatus according to claim 1 is characterized in that, described cleaning fluid is mixed by washing agent and water.
8. substrate cleaning apparatus according to claim 7 is characterized in that, also comprises: the washing agent pipeline, filling pipe, drainage pipeline and the washing lotion reflux line that all are connected with described cleaning unit, wherein,
Described washing agent pipeline is used for injecting described washing agent in described cleaning unit and fluid infusion unit;
Described filling pipe is used for injecting described water in described cleaning unit and fluid infusion unit;
Described drainage pipeline is used for discharging the described cleaning fluid in the described cleaning unit;
Described washing lotion reflux line is used for so that the described cleaning fluid that carries out behind the base-plate cleaning passes back into described cleaning unit.
9. each described substrate cleaning apparatus is characterized in that according to claim 1-8, also comprises: be arranged at first heater and the first liquid level sensor in the described cleaning unit, wherein,
Described first heater is used for heating the described cleaning fluid in the described cleaning unit;
Described the first liquid level sensor is for detection of the liquid level of the described cleaning fluid in the described cleaning unit.
10. substrate cleaning apparatus according to claim 9 is characterized in that, also comprises: be arranged at secondary heating mechanism and second liquid level sensor of described fluid infusion unit, wherein,
Described secondary heating mechanism is used for heating the described cleaning fluid in the described fluid infusion unit;
Described the second liquid level sensor is for detection of the liquid level of the described cleaning fluid in the described fluid infusion unit.
11. a basal plate cleaning system is characterized in that, comprises at least two such as the described substrate cleaning apparatus of claim 1-10.
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| CN201210391220.2A CN102896104B (en) | 2012-10-15 | 2012-10-15 | Base plate washing equipment and base plate washing system |
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| CN201210391220.2A CN102896104B (en) | 2012-10-15 | 2012-10-15 | Base plate washing equipment and base plate washing system |
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| CN106950731A (en) * | 2017-04-24 | 2017-07-14 | 武汉华星光电技术有限公司 | A kind of liquid-supplying system |
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