JP2015103662A5 - - Google Patents
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- JP2015103662A5 JP2015103662A5 JP2013243124A JP2013243124A JP2015103662A5 JP 2015103662 A5 JP2015103662 A5 JP 2015103662A5 JP 2013243124 A JP2013243124 A JP 2013243124A JP 2013243124 A JP2013243124 A JP 2013243124A JP 2015103662 A5 JP2015103662 A5 JP 2015103662A5
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- JP
- Japan
- Prior art keywords
- tank
- liquid
- filter
- circulation line
- flushing liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000007788 liquid Substances 0.000 claims description 64
- 238000011010 flushing procedure Methods 0.000 claims description 42
- 238000004140 cleaning Methods 0.000 claims 11
- 238000007599 discharging Methods 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 3
- 238000004590 computer program Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000002245 particle Substances 0.000 description 3
- 239000000470 constituent Substances 0.000 description 1
Description
液処理装置は、タンク102に、処理液または処理液構成成分を補充するタンク液補充部116を有している。タンク102には、タンク102内の処理液を廃棄するためのドレンライン118が設けられている。 The liquid processing apparatus includes a tank liquid replenishing unit 116 that replenishes the tank 102 with a processing liquid or a processing liquid constituent component. The tank 102 is provided with a drain line 118 for discarding the processing liquid in the tank 102.
図3の実施形態では、図1及び図2の実施形態と比較すると、第1フラッシング液充填工程においてパーティクルが拡散する範囲が広くなる。それでも、排液ライン120の接続点よりも下流側の循環ライン104と、タンクの上部領域がパーティクルにより汚染されずに済む。このため、フィルタ108の交換後直ちにフラッシング液をタンク102及び循環ライン104を含む循環系に循環させた場合と比較すれば、パーティクルレベルを許容範囲内に低減するために必要な時間を短縮することができる。 In the embodiment of FIG. 3, compared with the embodiment of FIGS. 1 and 2, the range in which particles diffuse in the first flushing liquid filling step is widened. Nevertheless, a circulation line 104 downstream of the connection point of the drain line 120, the upper region of the tank need not be contaminated by particles. Therefore, as compared with the case where the flushing liquid is circulated through the circulation system including the tank 102 and the circulation line 104 immediately after the replacement of the filter 108, the time required for reducing the particle level within the allowable range can be shortened. Can do.
16 処理ユニット(処理部)
102 タンク
104 循環ライン
106 ポンプ
108 フィルタ
118 ドレンライン
120 排液ライン
16 processing units ( processing section )
102 Tank 104 Circulation line 106 Pump 108 Filter 118 Drain line 120 Drain line
Claims (7)
前記循環ラインの前記一部及び前記タンクに供給された前記フラッシング液を、前記循環ラインの前記一部または前記タンクに接続されたドレンラインから排出することにより、前記フィルタから前記フラッシング液を抜くフラッシング液排出工程と、
を備えたフィルタ洗浄方法。 A tank for storing processing liquid; a circulation line connected to the tank; a pump for forming a flow of processing liquid from the tank to the tank and returning to the tank; and a filter interposed in the circulation line And a processing unit that performs liquid processing on the substrate using the processing liquid flowing through the circulation line. In the filter cleaning method for cleaning the filter, the filter is installed at a predetermined position of the circulation line. In this state, a flushing liquid filling step of filling the inside of the filter with the flushing liquid by supplying only a part of the circulation line and the flushing liquid to the tank,
Flushing for removing the flushing liquid from the filter by discharging the part of the circulation line and the flushing liquid supplied to the tank from the part of the circulation line or a drain line connected to the tank. A liquid discharge process;
A filter cleaning method.
その後、前記フラッシング液の循環を停止するとともに前記ドレンラインから前記フラッシング液を排出する工程と、
その後、前記循環ラインの一部のみ、及び前記タンクに別のフラッシング液を供給することにより、前記フィルタの内部を前記別のフラッシング液で満たす第2フラッシング液充填工程と、
その後、前記循環ラインの前記一部及び前記タンクに供給された前記別のフラッシング液を、前記循環ラインの前記一部または前記タンクに接続されたドレンラインから排出することにより、前記フィルタから前記別のフラッシング液を抜く第2フラッシング液排出工程と、
を更に備えた、請求項1から4のうちのいずれか一項に記載のフィルタ洗浄方法。 After performing the flushing liquid filling step and the flushing liquid discharge step at least once, storing the flushing liquid in the tank and operating the pump to circulate the flushing liquid in the circulation line;
Thereafter, stopping the circulation of the flushing liquid and discharging the flushing liquid from the drain line;
Then, a second flushing liquid filling step of filling the inside of the filter with the other flushing liquid by supplying only another flushing liquid to the tank and the tank, and
Thereafter, the separate flushing liquid supplied to the part of the circulation line and the tank is discharged from the filter by discharging the part of the circulation line or the drain line connected to the tank. A second flushing liquid discharging step of removing the flushing liquid of
The filter cleaning method according to any one of claims 1 to 4, further comprising:
前記タンクに接続された循環ラインと、
前記循環ラインに前記タンクから出てタンクに戻る処理液の流れを形成するポンプと、 前記循環ラインに介設されたフィルタと、
前記循環ラインを流れる処理液を用いて基板に液処理を施す処理部と、
を備えた液処理装置であって、
前記液処理装置の動作を制御する制御装置をさらに備え、
前記制御装置は、
前記フィルタを前記循環ラインの所定位置に設置した状態で、前記循環ラインの一部のみ、及び前記タンクにフラッシング液を供給することにより、前記フィルタの内部を前記フラッシング液で満たすフラッシング液充填工程と、
前記循環ラインの前記一部及び前記タンクに供給された前記フラッシング液を、前記循環ラインの前記一部または前記タンクに接続されたドレンラインから排出することにより、前記フィルタから前記フラッシング液を抜くフラッシング液排出工程と
を備えたフィルタ洗浄方法を実施するためのプログラムを格納する記憶部を有し、前記制御装置が前記プログラムを実行することにより前記フィルタ洗浄方法が実施されることを特徴とする、液処理装置。 A tank for storing the processing liquid;
A circulation line connected to the tank;
A pump for forming a flow of processing liquid that exits the tank and returns to the tank in the circulation line; a filter interposed in the circulation line;
A processing unit for performing liquid processing on the substrate using the processing liquid flowing through the circulation line;
A liquid processing apparatus comprising:
A control device for controlling the operation of the liquid processing apparatus;
The controller is
A flushing liquid filling step of filling the inside of the filter with the flushing liquid by supplying the flushing liquid to only a part of the circulation line and the tank while the filter is installed at a predetermined position of the circulation line; ,
Flushing for removing the flushing liquid from the filter by discharging the part of the circulation line and the flushing liquid supplied to the tank from the part of the circulation line or a drain line connected to the tank. A storage unit that stores a program for performing the filter cleaning method including a liquid discharge step, and the filter cleaning method is performed by the controller executing the program. Liquid processing equipment.
前記フィルタ洗浄方法が、
前記フィルタを前記循環ラインの所定位置に設置した状態で、前記循環ラインの一部のみ、及び前記タンクにフラッシング液を供給することにより、前記フィルタの内部を前記フラッシング液で満たすフラッシング液充填工程と、
前記循環ラインの前記一部及び前記タンクに供給された前記フラッシング液を、前記循環ラインの前記一部または前記タンクに接続されたドレンラインから排出することにより、前記フィルタから前記フラッシング液を抜くフラッシング液排出工程と
を備えていることを特徴とする、記憶媒体。 A tank for storing processing liquid; a circulation line connected to the tank; a pump for forming a flow of processing liquid from the tank to the tank and returning to the tank; and a filter interposed in the circulation line A storage medium storing a computer program for causing a liquid processing apparatus to perform a filter cleaning method with a processing unit that performs liquid processing on a substrate using processing liquid flowing in the circulation line,
The filter cleaning method comprises:
A flushing liquid filling step of filling the inside of the filter with the flushing liquid by supplying the flushing liquid to only a part of the circulation line and the tank while the filter is installed at a predetermined position of the circulation line; ,
Flushing for removing the flushing liquid from the filter by discharging the part of the circulation line and the flushing liquid supplied to the tank from the part of the circulation line or a drain line connected to the tank. A storage medium comprising a liquid discharge step.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013243124A JP6159651B2 (en) | 2013-11-25 | 2013-11-25 | Filter cleaning method, liquid processing apparatus, and storage medium |
TW103139780A TWI568485B (en) | 2013-11-25 | 2014-11-17 | Filter cleaning method, liquid treatment device and memory media |
KR1020140162505A KR102314052B1 (en) | 2013-11-25 | 2014-11-20 | Filter cleaning method, liquid processing apparatus and storage medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013243124A JP6159651B2 (en) | 2013-11-25 | 2013-11-25 | Filter cleaning method, liquid processing apparatus, and storage medium |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2015103662A JP2015103662A (en) | 2015-06-04 |
JP2015103662A5 true JP2015103662A5 (en) | 2015-12-24 |
JP6159651B2 JP6159651B2 (en) | 2017-07-05 |
Family
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Family Applications (1)
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JP2013243124A Active JP6159651B2 (en) | 2013-11-25 | 2013-11-25 | Filter cleaning method, liquid processing apparatus, and storage medium |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6159651B2 (en) |
KR (1) | KR102314052B1 (en) |
TW (1) | TWI568485B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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TW202135914A (en) * | 2020-02-05 | 2021-10-01 | 日商東京威力科創股份有限公司 | Filter cleaning system and filter cleaning method |
KR102583556B1 (en) * | 2021-01-07 | 2023-10-10 | 세메스 주식회사 | Apparatus for supplying treating liquid and method for rmoving solid |
KR102504552B1 (en) | 2021-09-10 | 2023-03-02 | (주)디바이스이엔지 | Flushing condition setting apparatus and flushing condition setting method of semiconductor manufacturing parts |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04162627A (en) * | 1990-10-26 | 1992-06-08 | Matsushita Electric Ind Co Ltd | Treatment apparatus by chemical liquid |
JPH0516114U (en) * | 1991-08-14 | 1993-03-02 | 三菱重工業株式会社 | Lubricating oil tank and line filter flushing circuit |
KR960025332U (en) * | 1994-12-26 | 1996-07-22 | Filtration filter for chemical treatment tank | |
US5753135A (en) * | 1995-10-23 | 1998-05-19 | Jablonsky; Julius James | Apparatus and method for recovering photoresist developers and strippers |
JP4692997B2 (en) * | 1998-07-07 | 2011-06-01 | 東京エレクトロン株式会社 | Processing apparatus and processing method |
TW514561B (en) * | 2000-08-28 | 2002-12-21 | Henkel Corp | Antiplugging method and apparatus for separating multivalent metal ions from autodeposition compositions, and for regenerating ion exchange resins useful therewith |
JP2003251290A (en) * | 2002-03-05 | 2003-09-09 | Dainippon Screen Mfg Co Ltd | Cleaning device and substrate processor provided with the same |
JP5503602B2 (en) * | 2011-07-29 | 2014-05-28 | 東京エレクトロン株式会社 | Processing liquid supply apparatus, processing liquid supply method, program, and computer storage medium |
-
2013
- 2013-11-25 JP JP2013243124A patent/JP6159651B2/en active Active
-
2014
- 2014-11-17 TW TW103139780A patent/TWI568485B/en active
- 2014-11-20 KR KR1020140162505A patent/KR102314052B1/en active IP Right Grant
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