CN102879109B - Dynamic wavefront testing device - Google Patents
Dynamic wavefront testing device Download PDFInfo
- Publication number
- CN102879109B CN102879109B CN201210337035.5A CN201210337035A CN102879109B CN 102879109 B CN102879109 B CN 102879109B CN 201210337035 A CN201210337035 A CN 201210337035A CN 102879109 B CN102879109 B CN 102879109B
- Authority
- CN
- China
- Prior art keywords
- light
- light source
- measured
- passive
- proving installation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000012360 testing method Methods 0.000 title abstract description 28
- 230000003287 optical effect Effects 0.000 claims abstract description 94
- 230000005540 biological transmission Effects 0.000 claims abstract description 15
- 238000009434 installation Methods 0.000 claims description 26
- 230000004075 alteration Effects 0.000 description 12
- 238000005516 engineering process Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000010363 phase shift Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000005375 photometry Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Images
Landscapes
- Testing Of Optical Devices Or Fibers (AREA)
Abstract
The invention relates to a dynamic wavefront testing device, which comprises an active light source, a passive light source, a spectroscope, a calibration mirror, a standard lens, a micro-lens array and a CCD detector, wherein the active light source is arranged on the surface of the active light source; the spectroscope is arranged on the incident light path of the active light source and the passive light source; the spectroscope divides incident light of the active light source into active reflected light and active transmitted light; the spectroscope divides the incident light of the passive light source into passive transmitted light and passive reflected light; the calibration mirror and the standard lens are arranged on a light path between the spectroscope and the optical element to be measured; the micro lens array is arranged on the optical path of the passive transmission light; the CCD detector is arranged on a light path of emergent light passing through the micro-lens array. The invention provides a dynamic wavefront testing device which is not influenced by the external environment and can ensure the testing precision.
Description
Technical field
The invention belongs to optical testing technology field, relate to the front proving installation of a kind of dynamic wave, relate in particular to the front proving installation of a kind of capable of dynamic dynamic wave active and passive type measuring optical component side shape or optical system wavefront aberration.
Background technology
Along with the development of Chinese Space science and technology and the construction of God Light III host apparatus, all kinds of optical elements of heavy caliber, long-focus and optical system are used and day by day increase.Owing to being subject to the impact of air draught disturbance and vibration, the static phase-shift type interferometer of Piezoelectric Ceramic cannot carry out real time dynamic measurement to face shape and the wave aberration of long burnt system.The domestic dynamic phase shifting interferometer that the measurement of optical elements of large caliber face shape and optical system wavefront aberration is mainly depended on to external development at present, the dynamic interferometer of developing take dynamic interferometer and the ESDI company of the development of 4D company of the U.S. is as representative.The dynamic phase shifting interferometer of 4D company development adopts Twyman-Green type, realize four-step phase-shifting, but single CCD receives 4 width interferograms based on pixel-phase template, decrease resolution 1/2, and be similar to by vicinity points, measuring accuracy is limited, and expensive, cost is high, less economical.The dynamic phase shifting interferometer of ESDI company development adopts Fizeau type, realizes phase shift based on polarized light, then utilizes three CCD to gather respectively the interference image of phase shift, synthetic calculating, precision can be guaranteed, but due to test beams and reference beam light path altogether, realizes polarization interference more difficult, its response coherence request to three CCD is higher, and computing velocity is slow, overall volume is larger, and testing efficiency is not high, and expensive, less economical.In addition, the service band of these two kinds of dynamic interferometers is all 632.8nm.For the optical system of specific band work, if the service band of God Light III host apparatus is 1053nm, 351nm, adopt general interferometer just can not evaluate its optical system.For broadband heavy caliber, long-focus telescopic system, due to impacts such as aberration, adopt single wavelength to evaluate camera, before the operating wave can not truly reflect the actual use of camera lens time.Adopt conventional interference instrument all cannot realize optical wavefront test and the test of white light wavefront of external light source.
Summary of the invention
In order to solve the above-mentioned technical matters existing in background technology, the present invention proposes and a kind ofly realize optical component surface shape or the dynamic active test of optical system wavefront aberration or utilize external LASER Light Source and white light source is realized proving installation before the dynamic wave of measuring accuracy is tested, is not affected by the external environment, can guarantees to the dynamic passive type of optical system wavefront aberration.
Technical solution of the present invention is: the invention provides the front proving installation of a kind of dynamic wave, its special character is: before described dynamic wave, proving installation comprises active light source, passive light source, spectroscope, calibration mirror, standard lens, microlens array, ccd detector and computing machine; Described spectroscope is arranged in the input path of active light source and passive light source; The incident light of active light source is divided into initiatively reflected light and initiatively transmitted light by described spectroscope; The incident light of passive light source is divided into passive transmitted light and passive reflected light by described spectroscope; Optical element to be measured is arranged in the catoptrical light path of active or is arranged on the emitting light path of passive light source; Described calibration mirror and standard lens are arranged in the light path between spectroscope and optical element to be measured; Described microlens array is arranged in the light path of passive transmitted light, or is arranged in the light path of the transmitted light that initiatively reflected light forms after standard lens transmission and optical element to be measured reflection after standard lens is incident to beam splitter again; Described ccd detector is arranged in the light path of the emergent light after microlens array; Described computing machine and ccd detector are electrical connected.
Above-mentioned active light source comprises laser instrument and beam expanding lens; Described beam expanding lens and spectroscope are successively set on the emitting light path of laser instrument.
Above-mentioned optical element to be measured is optical spherical surface mirror, optical aspherical surface mirror or optical system.
When above-mentioned optical element to be measured is optical aspherical surface mirror, before described dynamic wave, proving installation also comprises auxiliary mirror; Auxiliary mirror is arranged in the light path between standard lens and optical aspherical surface mirror to be measured.
When above-mentioned optical element to be measured is optical system, before described dynamic wave, proving installation also comprises auxiliary criteria level crossing; Described auxiliary criteria level crossing is arranged on the emitting light path of active reflected light after standard lens and optical system transmission to be measured.
Above-mentioned passive light source comprise light source and be arranged on light source emitting light path from axle Zigzag type parallel light tube; Described light source through being incident in optical system to be measured after axle Zigzag type parallel light tube.
Above-mentionedly comprise level crossing and off axis paraboloidal mirror from axle Zigzag type parallel light tube; Described light source is incident to optical system to be measured successively after level crossing and off axis paraboloidal mirror.
The above-mentioned bore from axle Zigzag type parallel light tube is greater than the bore of optical system to be measured.
Above-mentioned light source is different-waveband LASER Light Source or white light source.
Advantage of the present invention is:
The present invention utilizes laser instrument, beam expanding lens, spectroscope, calibration mirror, standard lens, microlens array, ccd detector and computing machine, realizes the active optical test to optical component surface shape and optical system wavefront aberration; Utilize external standard sources realization to treat the passive optical test of photometry system wave aberration.Adopt this device, can realize the wavefront test of multiple service bands, and can realize the test of white light wavefront.Adopt this device, can realize the test of optical component surface shape and the optical system wavefront aberration of different bores, measurement range is large.Adopt this device, can realize the test of dynamic optical elements face shape and optical system wavefront aberration, be not subject to the impact of external environment (air turbulence, vibration etc.); Adopt this device, artificial link is few, and unmanned is subjective error, measures efficiency high; Adopt this device, stability is high, reproducible, and measurement result degree of confidence is high; Adopt this device, good economy performance, precision is high, is more suitable for debuging, checking in optical workshop.
Accompanying drawing explanation
Fig. 1 is the structural representation of proving installation before dynamic wave provided by the present invention;
Wherein:
1-laser instrument, 2-beam expanding lens, 3-spectroscope, 4-microlens array, 5-CCD detector, 6-computing machine, 7-calibration mirror, 8-standard lens, 9-optical spherical surface mirror to be measured, 10-optical aspherical surface mirror to be measured, 11-auxiliary mirror, 12-optical system to be measured, 13-auxiliary plane mirror, 14-are from axle Zigzag type parallel light tube, 15-off axis paraboloidal mirror, 16-level crossing, 17-light source.
Embodiment
The invention provides the front proving installation of a kind of dynamic wave, before this dynamic wave, proving installation comprises active light source, passive light source, spectroscope, calibration mirror, standard lens, microlens array, ccd detector and computing machine; Spectroscope is arranged in the input path of active light source and passive light source; The incident light of active light source is divided into initiatively reflected light and initiatively transmitted light by spectroscope; The incident light of passive light source is divided into passive transmitted light and passive reflected light by spectroscope; Optical element to be measured is arranged in the catoptrical light path of active or is arranged on the emitting light path of passive light source; Calibration mirror and standard lens are arranged in the light path between spectroscope and optical element to be measured; Microlens array is arranged in the light path of passive transmitted light or is arranged on initiatively reflected light after standard lens transmission and optical element to be measured reflection, then in the light path of the transmitted light forming after standard lens is incident to beam splitter; Ccd detector is arranged in the light path of the emergent light after microlens array; Computing machine and ccd detector are electrical connected.
Active light source comprises laser instrument and beam expanding lens; Beam expanding lens and spectroscope are successively set on the emitting light path of laser instrument.
Optical element to be measured is optical spherical surface mirror or optical aspherical surface mirror or optical system.In the time that optical element to be measured is optical aspherical surface mirror, before dynamic wave, proving installation also comprises auxiliary mirror; Auxiliary mirror is arranged in the light path between standard lens and optical aspherical surface mirror to be measured.In the time that optical element to be measured is optical system, before dynamic wave, proving installation also comprises auxiliary criteria level crossing; Auxiliary criteria level crossing is arranged on the emitting light path of active reflected light after standard lens and optical system transmission to be measured.
Passive light source comprise light source and be arranged on light source emitting light path from axle Zigzag type parallel light tube; Light source through being incident in optical system to be measured after axle Zigzag type parallel light tube.
Comprise level crossing and off axis paraboloidal mirror from axle Zigzag type parallel light tube; Light source is incident in optical system to be measured successively after level crossing and off axis paraboloidal mirror.
Be greater than the bore of optical system to be measured from the bore of axle Zigzag type parallel light tube.
Light source is different-waveband LASER Light Source or white light source.
As shown in Figure 1, the present invention includes laser instrument 1, beam expanding lens 2, spectroscope 3, microlens array 4, ccd detector 5, computing machine 6, calibration mirror 7, standard lens 8, optical spherical surface mirror 9 to be measured, optical aspherical surface mirror 10 to be measured, auxiliary mirror 11, optical system to be measured 12, auxiliary plane mirror 13, form from axle Zigzag type parallel light tube 14.From axle Zigzag type parallel light tube 14, by off axis paraboloidal mirror 15, level crossing 16 and light source 17 form.
In figure, black solid line is stationary installation, and dotted line is changing device.Laser instrument 1 requires power stable in a short time, and wavelength can customize according to the actual requirements; Select bore be greater than optical system 12 bores to be measured from axle Zigzag type parallel light tube 14; Light source 17 can be selected different-waveband LASER Light Source and white light source.
The present invention is in the time of specific works, and its working method is:
(1) active optical test
To calibrate in mirror 7 built-in test light paths, laser instrument 1 is exported collimated light beam, expand through beam expanding lens 2, then by spectroscope 3, a part of transmission, part reflection, the collimation laser of reflection reflects by calibration mirror 7, through spectroscope 3 transmissions, incide on microlens array 4 again, on ccd detector 5 focal planes, obtain the hot spot image of multiple sub-apertures perhaps.Utilize computing machine 6 to calculate distorted wavefront in every sub-aperture to compare the facula mass center skew of reference wavefront, and calculate the average gradient of wavefront in the sub-pore diameter range cut apart by microlens array, then try to achieve distorted wavefront according to shouthwell model, it is system background W
system background.
Take out calibration mirror 7, by standard lens 8 and optical spherical surface mirror to be measured 9 built-in test light paths, guarantee that the focus of standard lens 8 and the centre of sphere of tested spherical mirror 9 overlap.Laser instrument 1 is exported collimated light beam, expand through beam expanding lens 2, then by a part of transmission of spectroscope 3, part reflection, the collimation laser of reflection focuses to the centre of sphere place of optical spherical surface mirror 9 to be measured by standard lens 8, then reflect by optical spherical surface mirror 9 to be measured, be directional light by standard lens 8 collimations again, through spectroscope 3 transmissions, by microlens array 4, gathered by ccd detector 5 and computing machine 6 that to calculate the test wavefront of deducting system background be W
measure, spherical mirror surface shape to be measured is:
By in optical aspherical surface mirror 10 to be measured and auxiliary mirror 11 built-in test light paths.Laser instrument 1 is exported collimated light beam, expand through beam expanding lens 2, then by a part of transmission of spectroscope 3, part reflection, the collimation laser of reflection is by standard lens 8 and auxiliary mirror 11, be incident on optical aspherical surface mirror 10 to be measured along normal direction, Bing Anyuan returns on road, by auxiliary mirror 11, be directional light by standard lens 8 collimations, through spectroscope 3 transmissions, by microlens array 4, gathered by ccd detector 5 and computing machine 6 that to calculate the test wavefront of deducting system background be W
measure, aspherical mirror shape to be measured is:
By in optical system 12 to be measured and auxiliary criteria level crossing 13 built-in test light paths, standard of replacement camera lens 8, standard lens F# is less than optical system F# to be measured.Laser instrument 1 is exported collimated light beam, expands, then by spectroscope 3 through beam expanding lens 2, part transmission, part reflection, the collimation laser of reflection focuses to the focus place of optical system 12 to be measured by standard lens 8, be directional light by optical system 12 collimations to be measured, reflect through auxiliary criteria level crossing 13, again by optical system 12 to be measured, standard lens 8, spectroscope 3, microlens array 4, is gathered by ccd detector 5 and computing machine 6 that to calculate the test wavefront of deducting system background be W
measure, optical system wavefront aberration to be measured is:
(2) passive optical test
Close laser instrument 1, open light source 17, its output beam reflects through level crossing 16, then is directional light by off axis paraboloidal mirror 15 collimations, through spectroscope 3 transmissions, by microlens array 4, collects background test wavefront W by ccd detector 5 and computing machine 6
background.
By in standard lens 8 and optical system to be measured 12 built-in test light paths, standard lens F# is less than optical system F# to be measured.Export directional light from axle refraction-reflection type parallel light tube 12 and focus on its focus place through optical system 12 to be measured, the focus that guarantees optical system 12 to be measured overlaps with the focus of standard lens 8, focused beam is directional light by standard lens 8 collimations, through spectroscope 3 transmissions, by microlens array 4, gathered by ccd detector 5 and computing machine 6 that to calculate the test wavefront of deducting background be W
measure, optical system wavefront aberration is:
Claims (9)
1. a proving installation before dynamic wave, is characterized in that: before described dynamic wave, proving installation comprises active light source, passive light source, spectroscope, calibration mirror, standard lens, microlens array, ccd detector and computing machine; Described spectroscope is arranged in the input path of active light source and passive light source; The incident light of active light source is divided into initiatively reflected light and initiatively transmitted light by described spectroscope; The incident light of passive light source is divided into passive transmitted light and passive reflected light by described spectroscope; Optical element to be measured is arranged in the catoptrical light path of active or is arranged on the emitting light path of passive light source; Described calibration mirror and standard lens are arranged in the light path between spectroscope and optical element to be measured; Described microlens array is arranged in the light path of passive transmitted light, or is arranged in the light path of the transmitted light that initiatively reflected light forms after standard lens transmission and optical element to be measured reflection after standard lens is incident to beam splitter again; Described ccd detector is arranged in the light path of the emergent light after microlens array; Described computing machine and ccd detector are electrical connected.
2. proving installation before dynamic wave according to claim 1, is characterized in that: described active light source comprises laser instrument and beam expanding lens; Described beam expanding lens and spectroscope are successively set on the emitting light path of laser instrument.
3. proving installation before dynamic wave according to claim 2, is characterized in that: described optical element to be measured is optical spherical surface mirror, optical aspherical surface mirror or optical system.
4. proving installation before dynamic wave according to claim 3, is characterized in that: when described optical element to be measured is optical aspherical surface mirror, before described dynamic wave, proving installation also comprises auxiliary mirror; Described auxiliary mirror is arranged in the light path between standard lens and optical aspherical surface mirror to be measured.
5. proving installation before dynamic wave according to claim 3, is characterized in that: when described optical element to be measured is optical system, before described dynamic wave, proving installation also comprises auxiliary criteria level crossing; Described auxiliary criteria level crossing is arranged on the emitting light path of active reflected light after optical system to be measured.
6. proving installation before dynamic wave according to claim 5, is characterized in that: described passive light source comprise light source and be arranged on light source emitting light path from axle Zigzag type parallel light tube; Described light source through being incident in optical system to be measured after axle Zigzag type parallel light tube.
7. proving installation before dynamic wave according to claim 6, is characterized in that: describedly comprise level crossing and off axis paraboloidal mirror from axle Zigzag type parallel light tube; Described light source is incident in optical system to be measured successively after level crossing and off axis paraboloidal mirror.
8. proving installation before dynamic wave according to claim 7, is characterized in that: the described bore from axle Zigzag type parallel light tube is greater than the bore of optical system to be measured.
9. proving installation before dynamic wave according to claim 6, is characterized in that: described light source is different-waveband LASER Light Source or white light source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210337035.5A CN102879109B (en) | 2012-09-12 | 2012-09-12 | Dynamic wavefront testing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210337035.5A CN102879109B (en) | 2012-09-12 | 2012-09-12 | Dynamic wavefront testing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102879109A CN102879109A (en) | 2013-01-16 |
| CN102879109B true CN102879109B (en) | 2014-05-21 |
Family
ID=47480521
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210337035.5A Expired - Fee Related CN102879109B (en) | 2012-09-12 | 2012-09-12 | Dynamic wavefront testing device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102879109B (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103226059A (en) * | 2013-04-09 | 2013-07-31 | 中国科学院西安光学精密机械研究所 | Wavefront measuring device and method for optical system |
| CN103344345A (en) * | 2013-06-27 | 2013-10-09 | 中国科学院西安光学精密机械研究所 | Active white light wave front testing device and method thereof |
| CN104764477B (en) * | 2014-01-08 | 2018-01-12 | 致茂电子(苏州)有限公司 | Optical detection apparatus with on-line correction function |
| CN105675262B (en) * | 2016-01-14 | 2018-12-25 | 中国科学院上海光学精密机械研究所 | The high depth of parallelism wavefront of optical components detection device of heavy caliber |
| CN108680188B (en) * | 2018-06-21 | 2023-09-01 | 中国科学院西安光学精密机械研究所 | PST test and extremely weak target simulation system and PST and detection capability test method |
| CN110319793B (en) * | 2019-08-06 | 2024-03-22 | 清华大学深圳研究生院 | Transmission rotation symmetry aspheric surface detection system and method |
| CN110320011B (en) * | 2019-08-06 | 2024-04-19 | 清华大学深圳研究生院 | Transmission wavefront detection system and method |
| CN111649915B (en) * | 2020-05-20 | 2022-02-18 | 中国科学院西安光学精密机械研究所 | Collimator defocusing aberration calibration device |
| CN113340424B (en) * | 2021-06-18 | 2022-09-27 | 上海国科航星量子科技有限公司 | Device and method for detecting performance of polarized light |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101922974A (en) * | 2010-08-31 | 2010-12-22 | 中国科学院西安光学精密机械研究所 | Automatic calibration device and method for laser parameter performance test |
| CN202393356U (en) * | 2011-12-27 | 2012-08-22 | 合肥工业大学 | Normal displacement and angle sensing optical measuring head |
| CN202836771U (en) * | 2012-09-12 | 2013-03-27 | 中国科学院西安光学精密机械研究所 | Dynamic wavefront testing device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006250858A (en) * | 2005-03-14 | 2006-09-21 | Nikon Corp | Surface accuracy measuring method, interferometer, surface accuracy measuring instrument, and projection optical system manufacturing method |
| WO2012001929A1 (en) * | 2010-07-01 | 2012-01-05 | パナソニック株式会社 | Wavefront aberration measuring apparatus and wavefront aberration measuring method |
-
2012
- 2012-09-12 CN CN201210337035.5A patent/CN102879109B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101922974A (en) * | 2010-08-31 | 2010-12-22 | 中国科学院西安光学精密机械研究所 | Automatic calibration device and method for laser parameter performance test |
| CN202393356U (en) * | 2011-12-27 | 2012-08-22 | 合肥工业大学 | Normal displacement and angle sensing optical measuring head |
| CN202836771U (en) * | 2012-09-12 | 2013-03-27 | 中国科学院西安光学精密机械研究所 | Dynamic wavefront testing device |
Non-Patent Citations (2)
| Title |
|---|
| 便携式泰曼格林型干涉仪装调方法研究;申邵萌等;《应用光学》;20111130;第32卷(第6期);全文 * |
| 申邵萌等.便携式泰曼格林型干涉仪装调方法研究.《应用光学》.2011,第32卷(第6期),全文. |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102879109A (en) | 2013-01-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102879109B (en) | Dynamic wavefront testing device | |
| CN107764203B (en) | Dual wavelength phase shift interference non-spherical measuring method and device based on part penalty method | |
| CN202133379U (en) | Self-calibration type device for measuring parallelism of laser receiving and transmitting optical axis | |
| CN105806479B (en) | Laser far-field focal spot high-precision dynamic diagnosis device and method | |
| CN101469976B (en) | Light wave interferometer apparatus | |
| CN111751012B (en) | Dynamic high-resolution optical wavefront phase measurement method | |
| CN102230788A (en) | Self-calibration device and method for measuring parallelism of laser receiving and transmitting optical axes | |
| US7375824B2 (en) | Interferometer for measurement of dome-like objects | |
| CN102607461B (en) | Method and device for measuring surface shape error of optical element at high precision | |
| CN104198159A (en) | Detection device and method for wave aberration of high-numerical aperture objective lens | |
| CN109253707B (en) | Hundred-micrometer range transmission type interference testing device | |
| CN109997011B (en) | Optical pen for interferometric measuring machine | |
| JP2002071513A (en) | Interferometer for immersion microscope objective and evaluation method of the immersion microscope objective | |
| JP6648272B2 (en) | Interferometer with Fizeau interferometer objective using tilted object wave | |
| CN116379961B (en) | Phase measurement system and method | |
| CN207456742U (en) | GRIN Lens transmission wavefront measuring device | |
| CN110631510B (en) | High-precision angle measuring device and method based on Michelson structure | |
| CN202836771U (en) | Dynamic wavefront testing device | |
| CN203364981U (en) | Active white light wave front testing device | |
| CN106352985A (en) | Asymmetric spatial heterodyne spectrometer structure | |
| CN109458944A (en) | The absolute verifying attachment of plane and its detection method based on synchronous conjugation differential interferometry | |
| CN103344345A (en) | Active white light wave front testing device and method thereof | |
| CN112504164A (en) | Measuring device and method capable of dynamically measuring surface shape of planar optical element | |
| CN103954235B (en) | Detection device and method for optical convex spherical surface shape | |
| CN102175303B (en) | Three-dimensional vibration interferometry device based on spherical surface cooperation target |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140521 Termination date: 20170912 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |