CN103226059A - Wavefront measuring device and measuring method for optical system - Google Patents
Wavefront measuring device and measuring method for optical system Download PDFInfo
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- CN103226059A CN103226059A CN2013101221168A CN201310122116A CN103226059A CN 103226059 A CN103226059 A CN 103226059A CN 2013101221168 A CN2013101221168 A CN 2013101221168A CN 201310122116 A CN201310122116 A CN 201310122116A CN 103226059 A CN103226059 A CN 103226059A
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Abstract
The invention relates to a wavefront measuring device and a measuring method for an optical system. The wavefront measuring device for the optical system comprises a laser, a small lens array, an imaging lens array, a CCD (Charge Coupled Device) array and an acquisition control computer, wherein the small lens array, the imaging lens array and the CCD array are arranged on an emergent light path of the laser sequentially, and the CCD array is electrically connected with the acquisition control computer. The wavefront measuring device and the measuring method for the optical system can quickly measure system wavefront of the heavy-caliber optical system without a heavy-caliber optical element.
Description
Technical field
The invention belongs to the optical detection field, relate to a kind of optical system Wavefront measuring apparatus and measuring method, relate in particular to a kind of heavy-caliber optical system Wavefront measuring apparatus.
Background technology
The wavefront of optical system is an important technology index after its system is debug, and its quality directly affects the image quality or the transmission performance of system.Along with the continuous development in China's aerospace industry, military project target range, the utilization of heavy-caliber optical system is more and more, and following, the difficulty of test of wavefront is also more and more higher.
Existing method of testing comprises following several:
1) adopt laser interferometer that the wavefront of optical system is tested, but the restriction of bore of Stimulated Light interferometer (interferometer of China's bore maximum is Ф 800mm at present) or standard reflection aperture of mirror, the wavefront measurement bore is also limited thereupon.Simultaneously, development large-caliber laser interferometer, used optical elements of large caliber difficulty of processing is big in the system, and cost is very expensive, and is less economical.
2) adopt small-bore laser interferometer scanning survey, it is bigger that this method is influenced by wavefront splicing precision, and when simultaneously heavy-caliber optical system being tested, system adjusts relative complex, and Measuring Time is longer.
3) adopt Hartmann's wavefront measurement system that the wavefront of heavy-caliber optical system is tested, the method need be developed a bore the contract beam system suitable with optical system bore to be measured, and expense is also higher relatively.
Summary of the invention
In order to solve the problems referred to above that exist in the background technology, the present invention proposes a kind of optical system Wavefront measuring apparatus and measuring method that does not adopt optical elements of large caliber to measure system's wavefront of heavy-caliber optical system fast.
Technical solution of the present invention is: the invention provides a kind of optical system Wavefront measuring apparatus, its special character is: described optical system Wavefront measuring apparatus comprises laser instrument, lenslet array, imaging len array, ccd array and acquisition controlling computing machine; Described lenslet array, imaging len array and ccd array are successively set on the emitting light path of laser instrument; Described CCD and acquisition controlling computing machine are electrical connected.
The imaging object plane of above-mentioned imaging len array is the focal plane of lenslet array.
Above-mentioned lenslet array comprises four lenslets at least; Described imaging len array comprises at least one imaging len; The imaging object plane of described imaging len array is the focal plane of the lenslet in the lenslet array.
Above-mentioned ccd array is arranged on the imaging surface place of imaging len array.
Above-mentioned ccd array comprise with the imaging len array in the corresponding to CCD of number of imaging len.
Above-mentioned laser instrument comprises optical fiber pigtail, and the fibre core of described optical fiber pigtail is less than the diffraction-limited of optical system to be measured.
The fibre core of above-mentioned optical fiber pigtail is less than one times of diffraction-limited of optical system to be measured.
A kind of measuring method that is used for the optical system Wavefront measuring apparatus, its special character is: described measuring method may further comprise the steps:
1) opens laser instrument and produce laser;
2) the resulting laser of step 1) is injected optical system to be measured and forms plane wave;
3) by lenslet array to step 2) formed plane wave carries out light beam and focuses on, and forms the array focal spot;
4) by the imaging len array the formed array focal spot of step 3) is carried out imaging, form light spot image;
5) by the ccd array synchronous acquisition by the formed light spot image of step 4);
6) by the acquisition controlling computing machine interpretation is carried out in the position of the light spot image after gathering, and calculate the wavefront slope that ccd array collects;
7) wavefront for the treatment of the photometry system restores.
Advantage of the present invention is:
1, adopt measurement mechanism provided by the present invention, can carry out the wavefront test of heavy-caliber optical system, be particularly useful for the system wavefront test of bore greater than the optical system of 1m, the system development cost is relatively low;
2, adopt wavefront slope that wavefront is restored, have the advantage that Hartmann wave front sensor is measured, but the wavefront of real time dynamic measurement heavy-caliber optical system, the measuring accuracy height;
3, according to the size and the beam sampling requirement of measuring bore, can have at design lenslet array and imaging len array, avoid using in the test macro optical elements of large caliber.
Description of drawings
Fig. 1 is the structural representation of optical system Wavefront measuring apparatus provided by the present invention;
Wherein:
The 1-laser instrument; 2-optical system to be measured; The 3-lenslet array; 4-imaging len array; The 5-CCD array; 6-acquisition controlling computing machine.
Embodiment
The present invention comprises laser instrument 1, optical system to be measured 2, lenslet array 3, imaging len array 4, ccd array 5, acquisition controlling computing machine 6 as shown in Figure 1, is provided with wave front restoration software in the acquisition controlling computing machine 6.Lenslet array 3, imaging len array 4 and ccd array 5 are successively set on the emitting light path of laser instrument 1; Optical system 2 to be measured places between laser instrument 1 and the lenslet array 3; Ccd array 5 is electrical connected with acquisition controlling computing machine 6.
The imaging object plane of imaging len array 4 is focal planes of lenslet array 3; Lenslet array 3 comprises four lenslets at least; Imaging len array 4 comprises at least one imaging len; The imaging object plane of imaging len array 4 is focal planes of the lenslet in the lenslet array 3.
Ccd array 5 is arranged on the imaging surface place of imaging len array 4; Ccd array 5 comprise with the imaging len array in the corresponding to CCD of number of 4 imaging len.
The present invention is when concrete work, its working method is: open laser instrument 1, laser is exported by optical fiber pigtail, the fibre core of optical fiber is less than one times of diffraction-limited of optical system 2 to be measured, laser is injected optical system 2 to be measured, form plane wave, focus on by 3 pairs of light beams behind optical system 2 collimations to be measured of lenslet array, form the array focal spot, by imaging len array 4 to the array focal spot imaging in its corresponding visual field, by ccd array 5 synchronous acquisition light spot images, the facula position of each subimage after gathering is carried out interpretation, treat the wavefront of photometry system and restore by calculating wavefront slope that ccd array 5 collects.
Claims (8)
1. optical system Wavefront measuring apparatus, it is characterized in that: described optical system Wavefront measuring apparatus comprises laser instrument, lenslet array, imaging len array, ccd array and acquisition controlling computing machine; Described lenslet array, imaging len array and ccd array are successively set on the emitting light path of laser instrument; Described ccd array and acquisition controlling computing machine are electrical connected.
2. optical system Wavefront measuring apparatus according to claim 1 is characterized in that: the imaging surface of described imaging len array is the focal plane of lenslet array.
3. optical system Wavefront measuring apparatus according to claim 2 is characterized in that: described lenslet array comprises four lenslets at least; Described imaging len array comprises at least one imaging len; The imaging object plane of described imaging len array is the focal plane of the lenslet in the lenslet array.
4. optical system Wavefront measuring apparatus according to claim 3 is characterized in that: described ccd array is arranged on the imaging surface place of imaging len array.
5. optical system Wavefront measuring apparatus according to claim 4 is characterized in that: described ccd array comprise with the imaging len array in the corresponding to CCD of number of imaging len.
6. according to the described optical system Wavefront measuring apparatus of the arbitrary claim of claim 1-5, it is characterized in that: described laser instrument comprises optical fiber pigtail, and the fibre core of described optical fiber pigtail is less than the diffraction-limited of optical system to be measured.
7. optical system Wavefront measuring apparatus according to claim 6 is characterized in that: the fibre core of described optical fiber pigtail is less than one times of diffraction-limited of optical system to be measured.
8. measuring method that is used for the described optical system Wavefront measuring apparatus of the arbitrary claim of claim 1-7, it is characterized in that: described measuring method may further comprise the steps:
1) opens laser instrument and produce laser;
2) the resulting laser of step 1) is injected optical system to be measured and forms plane wave;
3) by lenslet array to step 2) formed plane wave carries out light beam and focuses on, and forms the array focal spot;
4) by the imaging len array the formed array focal spot of step 3) is carried out imaging, form light spot image;
5) by the ccd array synchronous acquisition by the formed light spot image of step 4);
6) by the acquisition controlling computing machine interpretation is carried out in the position of the light spot image after gathering, and calculate the wavefront slope that ccd array collects;
7) wavefront for the treatment of the photometry system restores.
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104075882A (en) * | 2014-07-01 | 2014-10-01 | 中国科学院长春光学精密机械与物理研究所 | Wave-front optical dither analyzing method suitable for large-caliber photoelectric detecting system |
| CN104089583A (en) * | 2014-06-24 | 2014-10-08 | 北京空间机电研究所 | Wavefront subaperture inversion method of optical system |
| CN104535300A (en) * | 2014-12-20 | 2015-04-22 | 中国科学院西安光学精密机械研究所 | Large-diameter parallel light pipe wavefront and image surface position calibration device and method |
| CN104075882B (en) * | 2014-07-01 | 2016-11-30 | 中国科学院长春光学精密机械与物理研究所 | It is applicable to the wavefront optics jitter analysis method of heavy caliber Photodetection system |
| CN110476043A (en) * | 2017-02-03 | 2019-11-19 | 伍普提克斯股份有限公司 | For acquiring the method and optical system of the tomographic imaging distribution of the wavefront of electromagnetic field |
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| US5629765A (en) * | 1995-12-15 | 1997-05-13 | Adaptive Optics Associates, Inc. | Wavefront measuring system with integral geometric reference (IGR) |
| CN1607379A (en) * | 2003-10-15 | 2005-04-20 | 中国科学院光电技术研究所 | Hartmann wavefront sensor based on micro-prism array for pulse light beam quality detection |
| CN102252833A (en) * | 2011-06-24 | 2011-11-23 | 北京理工大学 | Large-diameter wide-dynamic range collimating system wavefront quality detection device |
| CN102879109A (en) * | 2012-09-12 | 2013-01-16 | 中国科学院西安光学精密机械研究所 | Dynamic wave-front testing device |
| CN203216704U (en) * | 2013-04-09 | 2013-09-25 | 中国科学院西安光学精密机械研究所 | Optical system wavefront measurement apparatus |
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Patent Citations (6)
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| US4967063A (en) * | 1988-06-16 | 1990-10-30 | The Aerospace Corporation | Charge controlled adaptive-optics system |
| US5629765A (en) * | 1995-12-15 | 1997-05-13 | Adaptive Optics Associates, Inc. | Wavefront measuring system with integral geometric reference (IGR) |
| CN1607379A (en) * | 2003-10-15 | 2005-04-20 | 中国科学院光电技术研究所 | Hartmann wavefront sensor based on micro-prism array for pulse light beam quality detection |
| CN102252833A (en) * | 2011-06-24 | 2011-11-23 | 北京理工大学 | Large-diameter wide-dynamic range collimating system wavefront quality detection device |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104089583A (en) * | 2014-06-24 | 2014-10-08 | 北京空间机电研究所 | Wavefront subaperture inversion method of optical system |
| CN104089583B (en) * | 2014-06-24 | 2016-08-24 | 北京空间机电研究所 | A kind of sub-aperture inversion method of optical system wavefront |
| CN104075882A (en) * | 2014-07-01 | 2014-10-01 | 中国科学院长春光学精密机械与物理研究所 | Wave-front optical dither analyzing method suitable for large-caliber photoelectric detecting system |
| CN104075882B (en) * | 2014-07-01 | 2016-11-30 | 中国科学院长春光学精密机械与物理研究所 | It is applicable to the wavefront optics jitter analysis method of heavy caliber Photodetection system |
| CN104535300A (en) * | 2014-12-20 | 2015-04-22 | 中国科学院西安光学精密机械研究所 | Large-diameter parallel light pipe wavefront and image surface position calibration device and method |
| CN110476043A (en) * | 2017-02-03 | 2019-11-19 | 伍普提克斯股份有限公司 | For acquiring the method and optical system of the tomographic imaging distribution of the wavefront of electromagnetic field |
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Application publication date: 20130731 |