CN203216704U - Wavefront measuring device of optical system - Google Patents

Wavefront measuring device of optical system Download PDF

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Publication number
CN203216704U
CN203216704U CN 201320175929 CN201320175929U CN203216704U CN 203216704 U CN203216704 U CN 203216704U CN 201320175929 CN201320175929 CN 201320175929 CN 201320175929 U CN201320175929 U CN 201320175929U CN 203216704 U CN203216704 U CN 203216704U
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CN
China
Prior art keywords
array
optical system
imaging len
wavefront measuring
measuring apparatus
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Expired - Fee Related
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CN 201320175929
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Chinese (zh)
Inventor
陈永权
段亚轩
李坤
赵建科
胡丹丹
赛建刚
龙江波
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XiAn Institute of Optics and Precision Mechanics of CAS
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XiAn Institute of Optics and Precision Mechanics of CAS
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Priority to CN 201320175929 priority Critical patent/CN203216704U/en
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Abstract

The utility model relates to an optical system wavefront measuring device, which comprises a laser, a small lens array, an imaging lens array, a CCD array and an acquisition control computer; the small lens array, the imaging lens array and the CCD array are sequentially arranged on an emergent light path of the laser; the CCD is electrically connected with the acquisition control computer. The utility model provides an optical system wavefront measuring device that can carry out the measurement to large-diameter optical system's system wavefront fast does not adopt large-diameter optical element.

Description

The optical system Wavefront measuring apparatus
Technical field
The utility model belongs to the optical detection field, relates to a kind of optical system Wavefront measuring apparatus, relates in particular to a kind of heavy-caliber optical system Wavefront measuring apparatus.
Background technology
The wavefront of optical system is an important technology index after its system is debug, and its quality directly affects image quality or the transmission performance of system.Along with the continuous development in China's aerospace industry, military project target range, the utilization of heavy-caliber optical system is more and more, and following, the difficulty of test of wavefront is also more and more higher.
Existing method of testing comprises following several:
1) adopt laser interferometer that the wavefront of optical system is tested, but the restriction of the bore of Stimulated Light interferometer (interferometer of China's bore maximum is Ф 800mm at present) or standard reflection aperture of mirror, the wavefront measurement bore is also limited thereupon.Simultaneously, development large-caliber laser interferometer, used optical elements of large caliber difficulty of processing is big in the system, and cost is very expensive, and is less economical.
2) adopt small-bore laser interferometer scanning survey, it is bigger that this method is influenced by wavefront splicing precision, and when simultaneously heavy-caliber optical system being tested, system adjusts relative complex, and Measuring Time is longer.
3) adopt Hartmann's wavefront measurement system that the wavefront of heavy-caliber optical system is tested, the method need be developed the bore contracting beam system suitable with optical system bore to be measured, and expense is also higher relatively.
The utility model content
In order to solve the problems referred to above that exist in the background technology, the utility model proposes a kind of optical system Wavefront measuring apparatus that does not adopt optical elements of large caliber to measure system's wavefront of heavy-caliber optical system fast.
Technical solution of the present utility model is: the utility model provides a kind of optical system Wavefront measuring apparatus, and its special character is: described optical system Wavefront measuring apparatus comprises laser instrument, lenslet array, imaging len array, ccd array and gathers the control computing machine; Described lenslet array, imaging len array and ccd array are successively set on the emitting light path of laser instrument; Described CCD is electrical connected with collection control computing machine.
The imaging object plane of above-mentioned imaging len array is the focal plane of lenslet array.
Above-mentioned lenslet array comprises four lenslets at least; Described imaging len array comprises at least one imaging len; The imaging object plane of described imaging len array is the focal plane of the lenslet in the lenslet array.
Above-mentioned ccd array is arranged on the imaging surface place of imaging len array.
Above-mentioned ccd array comprises the CCD consistent with the number of imaging len in the imaging len array.
Above-mentioned laser instrument comprises optical fiber pigtail, and the fibre core of described optical fiber pigtail is less than the diffraction-limited of optical system to be measured.
The fibre core of above-mentioned optical fiber pigtail is less than one times of diffraction-limited of optical system to be measured.
The utility model has the advantages that:
1, adopt measurement mechanism provided by the utility model, can carry out the wavefront test of heavy-caliber optical system, be particularly useful for bore greater than system's wavefront test of the optical system of 1m, the system development cost is relatively low;
2, adopt wavefront slope that wavefront is restored, have the advantage that Hartmann wave front sensor is measured, but the wavefront of real time dynamic measurement heavy-caliber optical system, the measuring accuracy height;
3, according to size and the beam sampling requirement of measuring bore, can have at design lenslet array and imaging len array, avoid using in the test macro optical elements of large caliber.
Description of drawings
Fig. 1 is the structural representation of optical system Wavefront measuring apparatus provided by the utility model;
Wherein:
The 1-laser instrument; 2-optical system to be measured; The 3-lenslet array; 4-imaging len array; The 5-CCD array; 6-gathers the control computing machine.
Embodiment
The utility model comprises laser instrument 1, optical system to be measured 2, lenslet array 3, imaging len array 4, ccd array 5, gathers control computing machine 6 as shown in Figure 1, gathers in the control computing machine 6 and is provided with wave front restoration software.Lenslet array 3, imaging len array 4 and ccd array 5 are successively set on the emitting light path of laser instrument 1; Optical system 2 to be measured places between laser instrument 1 and the lenslet array 3; Ccd array 5 is electrical connected with collection control computing machine 6.
The imaging object plane of imaging len array 4 is focal planes of lenslet array 3; Lenslet array 3 comprises four lenslets at least; Imaging len array 4 comprises at least one imaging len; The imaging object plane of imaging len array 4 is focal planes of the lenslet in the lenslet array 3.
Ccd array 5 is arranged on the imaging surface place of imaging len array 4; Ccd array 5 comprises the CCD consistent with the number of 4 imaging len in the imaging len array.
Laser instrument 1 comprises optical fiber pigtail, and the fibre core of optical fiber pigtail is less than the diffraction-limited of optical system to be measured, especially less than one times of diffraction-limited of optical system to be measured.
The utility model is when concrete work, its working method is: open laser instrument 1, laser is exported by optical fiber pigtail, the fibre core of optical fiber is less than one times of diffraction-limited of optical system 2 to be measured, laser is injected optical system 2 to be measured, form plane wave, focused on by 3 pairs of light beams behind optical system 2 collimations to be measured of lenslet array, form the array focal spot, by imaging len array 4 to the array focal spot imaging in its corresponding visual field, gather light spot images synchronously by ccd array 5, the facula position of each subimage after gathering is carried out interpretation, treat the wavefront of photometry system and restore by calculating wavefront slope that ccd array 5 collects.

Claims (7)

1. optical system Wavefront measuring apparatus is characterized in that: described optical system Wavefront measuring apparatus comprises laser instrument, lenslet array, imaging len array, ccd array and gathers the control computing machine; Described lenslet array, imaging len array and ccd array are successively set on the emitting light path of laser instrument; Described ccd array is electrical connected with collection control computing machine.
2. optical system Wavefront measuring apparatus according to claim 1, it is characterized in that: the imaging surface of described imaging len array is the focal plane of lenslet array.
3. optical system Wavefront measuring apparatus according to claim 2, it is characterized in that: described lenslet array comprises four lenslets at least; Described imaging len array comprises at least one imaging len; The imaging object plane of described imaging len array is the focal plane of the lenslet in the lenslet array.
4. optical system Wavefront measuring apparatus according to claim 3, it is characterized in that: described ccd array is arranged on the imaging surface place of imaging len array.
5. optical system Wavefront measuring apparatus according to claim 4 is characterized in that: described ccd array comprises the CCD consistent with the number of imaging len in the imaging len array.
6. according to the described optical system Wavefront measuring apparatus of the arbitrary claim of claim 1-5, it is characterized in that: described laser instrument comprises optical fiber pigtail, and the fibre core of described optical fiber pigtail is less than the diffraction-limited of optical system to be measured.
7. optical system Wavefront measuring apparatus according to claim 6, it is characterized in that: the fibre core of described optical fiber pigtail is less than one times of diffraction-limited of optical system to be measured.
CN 201320175929 2013-04-09 2013-04-09 Wavefront measuring device of optical system Expired - Fee Related CN203216704U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201320175929 CN203216704U (en) 2013-04-09 2013-04-09 Wavefront measuring device of optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201320175929 CN203216704U (en) 2013-04-09 2013-04-09 Wavefront measuring device of optical system

Publications (1)

Publication Number Publication Date
CN203216704U true CN203216704U (en) 2013-09-25

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CN 201320175929 Expired - Fee Related CN203216704U (en) 2013-04-09 2013-04-09 Wavefront measuring device of optical system

Country Status (1)

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CN (1) CN203216704U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103226059A (en) * 2013-04-09 2013-07-31 中国科学院西安光学精密机械研究所 Wavefront measuring device and method for optical system
CN109855842A (en) * 2017-11-30 2019-06-07 上海微电子装备(集团)股份有限公司 A kind of wave aberration detection system and measurement method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103226059A (en) * 2013-04-09 2013-07-31 中国科学院西安光学精密机械研究所 Wavefront measuring device and method for optical system
CN109855842A (en) * 2017-11-30 2019-06-07 上海微电子装备(集团)股份有限公司 A kind of wave aberration detection system and measurement method

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CF01 Termination of patent right due to non-payment of annual fee
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Granted publication date: 20130925

Termination date: 20160409