CN102870031B - 折反射光学系统及具有该系统的图像拾取装置 - Google Patents

折反射光学系统及具有该系统的图像拾取装置 Download PDF

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Publication number
CN102870031B
CN102870031B CN201180020384.8A CN201180020384A CN102870031B CN 102870031 B CN102870031 B CN 102870031B CN 201180020384 A CN201180020384 A CN 201180020384A CN 102870031 B CN102870031 B CN 102870031B
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China
Prior art keywords
optical element
image
catadioptric
optical
optical system
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Expired - Fee Related
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CN201180020384.8A
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English (en)
Chinese (zh)
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CN102870031A (zh
Inventor
梶山和彦
铃木雅之
片芝悠二
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Canon Inc
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Canon Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
CN201180020384.8A 2010-04-28 2011-04-20 折反射光学系统及具有该系统的图像拾取装置 Expired - Fee Related CN102870031B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2010103612A JP5479206B2 (ja) 2010-04-28 2010-04-28 反射屈折光学系及びそれを有する撮像装置
JP2010-103612 2010-04-28
PCT/JP2011/060197 WO2011136240A1 (en) 2010-04-28 2011-04-20 Catadioptric optical system and image-pickup apparatus having the same

Publications (2)

Publication Number Publication Date
CN102870031A CN102870031A (zh) 2013-01-09
CN102870031B true CN102870031B (zh) 2015-05-20

Family

ID=44861538

Family Applications (1)

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CN201180020384.8A Expired - Fee Related CN102870031B (zh) 2010-04-28 2011-04-20 折反射光学系统及具有该系统的图像拾取装置

Country Status (5)

Country Link
US (1) US9110274B2 (enExample)
EP (1) EP2564256A1 (enExample)
JP (1) JP5479206B2 (enExample)
CN (1) CN102870031B (enExample)
WO (1) WO2011136240A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8908294B2 (en) * 2012-05-18 2014-12-09 Canon Kabushiki Kaisha Catadioptric optical system with high numerical aperture
JP2015036706A (ja) * 2013-08-12 2015-02-23 キヤノン株式会社 撮像装置
CN105549190A (zh) * 2016-01-15 2016-05-04 青岛农业大学 一种智能的折返射投射物镜
JP6756498B2 (ja) * 2016-03-22 2020-09-16 株式会社トプコン 眼科撮影装置
CN108873289B (zh) * 2018-09-04 2024-02-09 中国科学院长春光学精密机械与物理研究所 显微物镜光学系统及光学设备
CN112630948A (zh) * 2020-12-24 2021-04-09 苏州大学 一种基于两曼金镜的折反光学镜头
WO2022133964A1 (zh) * 2020-12-24 2022-06-30 苏州大学 一种基于两曼金镜的折反光学镜头
CN115598819B (zh) * 2022-10-17 2023-06-16 佛山迈奥光学科技有限公司 一种高分辨率大视场浸液显微物镜

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000039623A1 (en) * 1998-12-25 2000-07-06 Nikon Corporation Reflection refraction image-forming optical system and projection exposure apparatus comprising the optical system
US20010038446A1 (en) * 2000-01-13 2001-11-08 Tetsuo Takahashi Projection exposure apparatus and exposure methods
US20040240047A1 (en) * 2003-02-21 2004-12-02 Shafer David R. Catadioptric imaging system for broad band microscopy
JP2006518876A (ja) * 2003-02-21 2006-08-17 ケーエルエー・テンコール・テクノロジーズ・コーポレーション 高性能カタディオプトリックイメージングシステム
JP6034737B2 (ja) * 2012-04-13 2016-11-30 ゼロックス コーポレイションＸｅｒｏｘ Ｃｏｒｐｏｒａｔｉｏｎ 表面官能化ナノ結晶セルロースを含む強化含フッ素ポリマー複合体を調製するための方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6034737B2 (ja) 1977-03-14 1985-08-10 オリンパス光学工業株式会社 顕微鏡対物レンズ
US4971428A (en) * 1989-03-27 1990-11-20 Lenzar Optics Corporation Catadioptric zoom lens
JP2002118058A (ja) * 2000-01-13 2002-04-19 Nikon Corp 投影露光装置及び方法
EP1912098B1 (en) * 2006-10-12 2012-04-25 Carl Zeiss SMT GmbH Unit magnification projection objective

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000039623A1 (en) * 1998-12-25 2000-07-06 Nikon Corporation Reflection refraction image-forming optical system and projection exposure apparatus comprising the optical system
US20010038446A1 (en) * 2000-01-13 2001-11-08 Tetsuo Takahashi Projection exposure apparatus and exposure methods
US20040240047A1 (en) * 2003-02-21 2004-12-02 Shafer David R. Catadioptric imaging system for broad band microscopy
JP2006518876A (ja) * 2003-02-21 2006-08-17 ケーエルエー・テンコール・テクノロジーズ・コーポレーション 高性能カタディオプトリックイメージングシステム
WO2005022204A2 (en) * 2003-08-22 2005-03-10 Kla-Tencor Technologies Corporation Catadioptric imaging system for broad band microscopy
JP6034737B2 (ja) * 2012-04-13 2016-11-30 ゼロックス コーポレイションＸｅｒｏｘ Ｃｏｒｐｏｒａｔｉｏｎ 表面官能化ナノ結晶セルロースを含む強化含フッ素ポリマー複合体を調製するための方法

Also Published As

Publication number Publication date
CN102870031A (zh) 2013-01-09
WO2011136240A1 (en) 2011-11-03
US20120314052A1 (en) 2012-12-13
JP2011232610A (ja) 2011-11-17
JP5479206B2 (ja) 2014-04-23
EP2564256A1 (en) 2013-03-06
US9110274B2 (en) 2015-08-18

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