CN102866413B - 用于在带电粒子设备中使用的检测器 - Google Patents

用于在带电粒子设备中使用的检测器 Download PDF

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Publication number
CN102866413B
CN102866413B CN201210233116.0A CN201210233116A CN102866413B CN 102866413 B CN102866413 B CN 102866413B CN 201210233116 A CN201210233116 A CN 201210233116A CN 102866413 B CN102866413 B CN 102866413B
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China
Prior art keywords
detector
diode
active volume
anode
electron
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Chinese (zh)
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CN102866413A (zh
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C.S.库伊曼
G.N.A.范维恩
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FEI Co
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FEI Co
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01TMEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16Measuring radiation intensity
    • G01T1/24Measuring radiation intensity with semiconductor detectors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01TMEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/29Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation
    • G01T1/2914Measurement of spatial distribution of radiation
    • G01T1/2921Static instruments for imaging the distribution of radioactivity in one or two dimensions; Radio-isotope cameras
    • G01T1/2928Static instruments for imaging the distribution of radioactivity in one or two dimensions; Radio-isotope cameras using solid state detectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/244Detectors; Associated components or circuits therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261Details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/29Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to radiation having very short wavelengths, e.g. X-rays, gamma-rays or corpuscular radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244Detection characterized by the detecting means
    • H01J2237/2441Semiconductor detectors, e.g. diodes
    • H01J2237/24415X-ray
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244Detection characterized by the detecting means
    • H01J2237/2448Secondary particle detectors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Measurement Of Radiation (AREA)
CN201210233116.0A 2011-07-07 2012-07-06 用于在带电粒子设备中使用的检测器 Active CN102866413B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP11172955A EP2544025A1 (en) 2011-07-07 2011-07-07 Silicon Drift Detector for use in a charged particle apparatus
EP11172955.4 2011-07-07

Publications (2)

Publication Number Publication Date
CN102866413A CN102866413A (zh) 2013-01-09
CN102866413B true CN102866413B (zh) 2016-12-28

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CN201210233116.0A Active CN102866413B (zh) 2011-07-07 2012-07-06 用于在带电粒子设备中使用的检测器

Country Status (4)

Country Link
US (1) US8941072B2 (enExample)
EP (2) EP2544025A1 (enExample)
JP (1) JP5995562B2 (enExample)
CN (1) CN102866413B (enExample)

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US10460905B2 (en) * 2015-09-23 2019-10-29 Kla-Tencor Corporation Backscattered electrons (BSE) imaging using multi-beam tools
ITUB20159390A1 (it) * 2015-12-24 2017-06-24 Fond Bruno Kessler Rivelatore a semiconduttore, rivelatore di radiazione e apparecchiatura di rivelazione di radiazione.
KR101749920B1 (ko) * 2016-03-02 2017-06-22 한국과학기술원 실리콘 드리프트 디텍터를 이용한 엑스선 검출용 방사선 검출기
CN105842727B (zh) * 2016-06-03 2018-07-03 中国工程物理研究院激光聚变研究中心 一种透射式平响应软x射线辐射流测量装置
ES2653767B1 (es) 2016-07-07 2019-03-28 Consejo Superior Investigacion Sensor de electrones para microscopia electronica
EP3532873B1 (en) * 2016-10-27 2021-06-23 Shenzhen Xpectvision Technology Co., Ltd. Dark noise compensation in a radiation detector
CN106525028B (zh) * 2016-10-28 2019-05-24 北京控制工程研究所 用于x射线脉冲星导航敏感器的硅漂移探测器处理电路
EP3385756A1 (en) * 2017-04-06 2018-10-10 Koninklijke Philips N.V. Pulse shaper
DE102018204683B3 (de) 2018-03-27 2019-08-08 Carl Zeiss Microscopy Gmbh Elektronenstrahlmikroskop
KR102484833B1 (ko) * 2018-07-31 2023-01-06 한국원자력연구원 방사성 핵종 분석 시스템
DE102019104710B4 (de) * 2019-02-25 2023-04-27 Ketek Gmbh Verfahren zum Betreiben eines Strahlungsdetektionssystems und Strahlungsdetektionssystem
EP3842838A1 (en) * 2019-12-23 2021-06-30 Koninklijke Philips N.V. Radiological instrument with a pulse shaper circuit
CN111584656B (zh) * 2020-06-15 2021-11-09 中国科学院微电子研究所 漂移探测器及其加工方法
CN114300570B (zh) * 2021-12-29 2024-05-17 上海集成电路研发中心有限公司 探测器及制造方法

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Also Published As

Publication number Publication date
CN102866413A (zh) 2013-01-09
US20130099114A1 (en) 2013-04-25
EP2544026B1 (en) 2013-12-11
EP2544025A1 (en) 2013-01-09
JP2013019897A (ja) 2013-01-31
JP5995562B2 (ja) 2016-09-21
EP2544026A1 (en) 2013-01-09
US8941072B2 (en) 2015-01-27

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