CN102808157A - 溅射靶材维护用管道系统 - Google Patents
溅射靶材维护用管道系统 Download PDFInfo
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- CN102808157A CN102808157A CN2011101435670A CN201110143567A CN102808157A CN 102808157 A CN102808157 A CN 102808157A CN 2011101435670 A CN2011101435670 A CN 2011101435670A CN 201110143567 A CN201110143567 A CN 201110143567A CN 102808157 A CN102808157 A CN 102808157A
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN2011101435670A CN102808157A (zh) | 2011-05-31 | 2011-05-31 | 溅射靶材维护用管道系统 |
Applications Claiming Priority (1)
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CN2011101435670A CN102808157A (zh) | 2011-05-31 | 2011-05-31 | 溅射靶材维护用管道系统 |
Publications (1)
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CN102808157A true CN102808157A (zh) | 2012-12-05 |
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CN2011101435670A Pending CN102808157A (zh) | 2011-05-31 | 2011-05-31 | 溅射靶材维护用管道系统 |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09198724A (ja) * | 1996-01-17 | 1997-07-31 | Toray Ind Inc | 光記録媒体の製造方法および製造装置 |
CN2829974Y (zh) * | 2005-10-31 | 2006-10-25 | 普慧企业股份有限公司 | 水气可回收的气雾冷却装置 |
CN101070590A (zh) * | 2006-02-22 | 2007-11-14 | 应用材料有限责任与两合公司 | 具有冷却靶的溅射 |
JP2009127090A (ja) * | 2007-11-22 | 2009-06-11 | Sharp Corp | スパッタリング装置 |
CN201459233U (zh) * | 2009-07-27 | 2010-05-12 | 昆山新莱洁净应用材料股份有限公司 | 一种溅射靶材的冷却装置 |
CN201530858U (zh) * | 2009-10-29 | 2010-07-21 | 吉林庆达新能源电力股份有限公司 | 一种磁控溅射设备的阴极冷却装置 |
-
2011
- 2011-05-31 CN CN2011101435670A patent/CN102808157A/zh active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09198724A (ja) * | 1996-01-17 | 1997-07-31 | Toray Ind Inc | 光記録媒体の製造方法および製造装置 |
CN2829974Y (zh) * | 2005-10-31 | 2006-10-25 | 普慧企业股份有限公司 | 水气可回收的气雾冷却装置 |
CN101070590A (zh) * | 2006-02-22 | 2007-11-14 | 应用材料有限责任与两合公司 | 具有冷却靶的溅射 |
JP2009127090A (ja) * | 2007-11-22 | 2009-06-11 | Sharp Corp | スパッタリング装置 |
CN201459233U (zh) * | 2009-07-27 | 2010-05-12 | 昆山新莱洁净应用材料股份有限公司 | 一种溅射靶材的冷却装置 |
CN201530858U (zh) * | 2009-10-29 | 2010-07-21 | 吉林庆达新能源电力股份有限公司 | 一种磁控溅射设备的阴极冷却装置 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: WUXI HUARUN SHANGHUA TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: WUXI CSMC SEMICONDUCTOR CO., LTD. Effective date: 20140519 Free format text: FORMER OWNER: WUXI HUARUN SHANGHUA TECHNOLOGY CO., LTD. Effective date: 20140519 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20140519 Address after: 214028 Xinzhou Road, Wuxi national hi tech Industrial Development Zone, Jiangsu, China, No. 8 Applicant after: Wuxi Huarun Shanghua Technology Co., Ltd. Address before: 214028 Wuxi provincial high tech Industrial Development Zone, Hanjiang Road, No. 5, Jiangsu, China Applicant before: Wuxi CSMC Semiconductor Co., Ltd. Applicant before: Wuxi Huarun Shanghua Technology Co., Ltd. |
|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20121205 |