CN102677000B - 蒸镀用舟皿和使用该蒸镀用舟皿的成膜方法 - Google Patents

蒸镀用舟皿和使用该蒸镀用舟皿的成膜方法 Download PDF

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Publication number
CN102677000B
CN102677000B CN201210073590.1A CN201210073590A CN102677000B CN 102677000 B CN102677000 B CN 102677000B CN 201210073590 A CN201210073590 A CN 201210073590A CN 102677000 B CN102677000 B CN 102677000B
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China
Prior art keywords
evaporation
sectional area
rake
supply unit
boat
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Expired - Fee Related
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CN201210073590.1A
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English (en)
Chinese (zh)
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CN102677000A (zh
Inventor
竹泽昌宏
山本昌裕
上口洋辉
大岛章义
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Panasonic Intellectual Property Management Co Ltd
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Matsushita Electric Industrial Co Ltd
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  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
CN201210073590.1A 2011-03-10 2012-03-09 蒸镀用舟皿和使用该蒸镀用舟皿的成膜方法 Expired - Fee Related CN102677000B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011-052268 2011-03-10
JP2011052268A JP5611086B2 (ja) 2011-03-10 2011-03-10 蒸着用ボートとこれを使用した成膜方法

Publications (2)

Publication Number Publication Date
CN102677000A CN102677000A (zh) 2012-09-19
CN102677000B true CN102677000B (zh) 2015-11-25

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ID=46809536

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CN201210073590.1A Expired - Fee Related CN102677000B (zh) 2011-03-10 2012-03-09 蒸镀用舟皿和使用该蒸镀用舟皿的成膜方法

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JP (1) JP5611086B2 (ja)
CN (1) CN102677000B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2887416B1 (en) * 2013-12-23 2018-02-21 Novaled GmbH N-doped semiconducting material comprising phosphine oxide matrix and metal dopant
EP3767004B1 (en) * 2019-07-17 2023-09-27 3M Innovative Properties Company Evaporation boat for evaporation of metals

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100589937B1 (ko) * 2004-02-20 2006-06-19 엘지전자 주식회사 금속 박막 형성용 증발원
EP1967604A1 (en) * 2007-03-08 2008-09-10 Applied Materials, Inc. Evaporation crucible and evaporation apparatus with directional evaporation

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5943873A (ja) * 1982-09-04 1984-03-12 Konishiroku Photo Ind Co Ltd 蒸発材料収容器
DE4139792A1 (de) * 1991-12-03 1993-06-09 Leybold Ag, 6450 Hanau, De Verdampferschiffchen fuer eine vorrichtung zur beschichtung von substraten
JPH07207434A (ja) * 1994-01-18 1995-08-08 Shin Etsu Chem Co Ltd 蒸着用ボート
ATE392492T1 (de) * 2005-08-03 2008-05-15 Applied Materials Gmbh & Co Kg Verdampfervorrichtung zum beschichten von substraten

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100589937B1 (ko) * 2004-02-20 2006-06-19 엘지전자 주식회사 금속 박막 형성용 증발원
EP1967604A1 (en) * 2007-03-08 2008-09-10 Applied Materials, Inc. Evaporation crucible and evaporation apparatus with directional evaporation

Also Published As

Publication number Publication date
JP2012188692A (ja) 2012-10-04
CN102677000A (zh) 2012-09-19
JP5611086B2 (ja) 2014-10-22

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Effective date of registration: 20160121

Address after: Osaka Japan

Patentee after: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT Co.,Ltd.

Address before: Osaka Japan

Patentee before: Matsushita Electric Industrial Co.,Ltd.

CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20151125

Termination date: 20180309

CF01 Termination of patent right due to non-payment of annual fee