CN102656514A - 光学成像写入系统 - Google Patents
光学成像写入系统 Download PDFInfo
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- CN102656514A CN102656514A CN2010800566870A CN201080056687A CN102656514A CN 102656514 A CN102656514 A CN 102656514A CN 2010800566870 A CN2010800566870 A CN 2010800566870A CN 201080056687 A CN201080056687 A CN 201080056687A CN 102656514 A CN102656514 A CN 102656514A
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Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (20)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US28634209P | 2009-12-14 | 2009-12-14 | |
US61/286,342 | 2009-12-14 | ||
US12/960,533 US8395752B2 (en) | 2008-09-23 | 2010-12-05 | Optical imaging writer system |
US12/960,533 | 2010-12-05 | ||
PCT/US2010/059667 WO2011075385A1 (en) | 2009-12-14 | 2010-12-09 | An optical imaging writer system |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102656514A true CN102656514A (zh) | 2012-09-05 |
CN102656514B CN102656514B (zh) | 2016-01-13 |
Family
ID=44167661
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201080056687.0A Active CN102656514B (zh) | 2009-12-14 | 2010-12-09 | 光学成像写入系统 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8395752B2 (zh) |
CN (1) | CN102656514B (zh) |
WO (1) | WO2011075385A1 (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102914949A (zh) * | 2012-09-17 | 2013-02-06 | 天津芯硕精密机械有限公司 | 一种用于扫描式无掩膜光刻机倾斜slm曝光的数据处理方法 |
CN106062752A (zh) * | 2014-03-10 | 2016-10-26 | 应用材料公司 | 用于多带电粒子束平板印刷术的像素融合 |
CN109752905A (zh) * | 2017-11-08 | 2019-05-14 | 三星电子株式会社 | 包括元透镜在内的投影仪 |
CN114556220A (zh) * | 2019-08-30 | 2022-05-27 | 应用材料公司 | 用于无掩模光刻的多色调方案 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9025136B2 (en) * | 2008-09-23 | 2015-05-05 | Applied Materials, Inc. | System and method for manufacturing three dimensional integrated circuits |
US9405203B2 (en) | 2008-09-23 | 2016-08-02 | Applied Materials, Inc. | Pixel blending for multiple charged-particle beam lithography |
US8670106B2 (en) | 2008-09-23 | 2014-03-11 | Pinebrook Imaging, Inc. | Optical imaging writer system |
US8253923B1 (en) | 2008-09-23 | 2012-08-28 | Pinebrook Imaging Technology, Ltd. | Optical imaging writer system |
US9507271B1 (en) * | 2008-12-17 | 2016-11-29 | Applied Materials, Inc. | System and method for manufacturing multiple light emitting diodes in parallel |
JP5703069B2 (ja) * | 2010-09-30 | 2015-04-15 | 株式会社Screenホールディングス | 描画装置および描画方法 |
US8584057B2 (en) * | 2012-03-01 | 2013-11-12 | Taiwan Semiconductor Manufacturing Copmany, Ltd. | Non-directional dithering methods |
CN103676426B (zh) * | 2012-09-13 | 2017-04-12 | 扬明光学股份有限公司 | 减少杂散光的投影装置及方法 |
US9927723B2 (en) | 2015-03-24 | 2018-03-27 | Applied Materials, Inc. | Apparatus and methods for on-the-fly digital exposure image data modification |
US10331038B2 (en) * | 2015-03-24 | 2019-06-25 | Applied Materials, Inc. | Real time software and array control |
KR101750521B1 (ko) * | 2015-07-27 | 2017-07-03 | 주식회사 고영테크놀러지 | 기판 검사 장치 및 방법 |
KR102318906B1 (ko) * | 2016-07-19 | 2021-10-27 | 어플라이드 머티어리얼스, 인코포레이티드 | 구분적 정렬 모델링 방법 |
US10459341B2 (en) | 2018-01-30 | 2019-10-29 | Applied Materials, Inc. | Multi-configuration digital lithography system |
KR20220015396A (ko) * | 2019-05-29 | 2022-02-08 | 에이에스엠엘 네델란즈 비.브이. | 기판에 방사선을 제공하기 위한 장치 및 방법 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6312134B1 (en) * | 1996-07-25 | 2001-11-06 | Anvik Corporation | Seamless, maskless lithography system using spatial light modulator |
US20070030472A1 (en) * | 2004-12-28 | 2007-02-08 | Asml Netherlands B.V. | System and method for determining maximum operational parameters used in maskless applications |
US20070030471A1 (en) * | 2004-06-08 | 2007-02-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using dose control |
CN101218544A (zh) * | 2005-06-24 | 2008-07-09 | 富士胶片株式会社 | 曝光方法和设备 |
CN101276156A (zh) * | 2007-03-28 | 2008-10-01 | 株式会社Orc制作所 | 曝光绘图装置 |
CN101364050A (zh) * | 2007-08-10 | 2009-02-11 | 株式会社Orc制作所 | 光刻系统 |
Family Cites Families (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5416616A (en) | 1990-04-06 | 1995-05-16 | University Of Southern California | Incoherent/coherent readout of double angularly multiplexed volume holographic optical elements |
EP0527166B1 (de) | 1990-05-02 | 1995-06-14 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Belichtungsvorrichtung |
DE59105477D1 (de) | 1991-10-30 | 1995-06-14 | Fraunhofer Ges Forschung | Belichtungsvorrichtung. |
JPH0770469B2 (ja) | 1991-10-30 | 1995-07-31 | フラウンホファー・ゲゼルシャフト・ツール・フォルデルング・デル・アンゲバンテン・フォルシュング・アインゲトラーゲネル・フェライン | 照明装置 |
WO1994017493A1 (en) | 1993-01-29 | 1994-08-04 | Q-Dot Photonics, Inc. | Methods and apparatus for image processing |
US5850218A (en) | 1997-02-19 | 1998-12-15 | Time Warner Entertainment Company L.P. | Inter-active program guide with default selection control |
US6453452B1 (en) | 1997-12-12 | 2002-09-17 | Numerical Technologies, Inc. | Method and apparatus for data hierarchy maintenance in a system for mask description |
SE9800665D0 (sv) | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
US6251550B1 (en) | 1998-07-10 | 2001-06-26 | Ball Semiconductor, Inc. | Maskless photolithography system that digitally shifts mask data responsive to alignment data |
US6204875B1 (en) | 1998-10-07 | 2001-03-20 | Barco Graphics, Nv | Method and apparatus for light modulation and exposure at high exposure levels with high resolution |
US20060188511A1 (en) | 1998-11-05 | 2006-08-24 | Foung Steven K | Prevention and treatment of HCV infection employing antibodies directed against conformational and linear epitopes |
SE518170C2 (sv) | 2000-06-27 | 2002-09-03 | Micronic Laser Systems Ab | Flerstrålemönstergenerator och metod för skannande |
US6733929B2 (en) | 2000-07-05 | 2004-05-11 | Numerical Technologies, Inc. | Phase shift masking for complex patterns with proximity adjustments |
US6473237B2 (en) | 2000-11-14 | 2002-10-29 | Ball Semiconductor, Inc. | Point array maskless lithography |
TW556044B (en) | 2001-02-15 | 2003-10-01 | Sipix Imaging Inc | Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web |
US6618185B2 (en) | 2001-11-28 | 2003-09-09 | Micronic Laser Systems Ab | Defective pixel compensation method |
SE0200547D0 (sv) | 2002-02-25 | 2002-02-25 | Micronic Laser Systems Ab | An image forming method and apparatus |
US6919952B2 (en) | 2002-03-19 | 2005-07-19 | Mapper Lithography Ip B.V. | Direct write lithography system |
US6717650B2 (en) | 2002-05-01 | 2004-04-06 | Anvik Corporation | Maskless lithography with sub-pixel resolution |
WO2004019079A2 (en) | 2002-08-24 | 2004-03-04 | William Daniel Meisburger | Continuous direct-write optical lithography |
US7072723B2 (en) | 2002-10-23 | 2006-07-04 | Clearsight Systems Inc. | Method and system for optimization of general problems |
KR101060567B1 (ko) | 2002-10-25 | 2011-08-31 | 마퍼 리쏘그라피 아이피 비.브이. | 리소그라피 시스템 |
DE60321525D1 (de) | 2002-10-28 | 2008-07-24 | Asml Netherlands Bv | Verfahren, Inspektionssystem, Rechnerprogramm und Referenzsubstrat zum Erkennen von Maskenfehlern |
US6897458B2 (en) | 2002-10-30 | 2005-05-24 | Mapper Lithography Ip B.V. | Electron beam exposure system |
TWI297045B (en) | 2003-05-07 | 2008-05-21 | Microfabrica Inc | Methods and apparatus for forming multi-layer structures using adhered masks |
US7285365B2 (en) | 2004-02-13 | 2007-10-23 | Micronic Laser Systems Ab | Image enhancement for multiple exposure beams |
US20050285926A1 (en) | 2004-06-29 | 2005-12-29 | Fuji Photo Film Co., Ltd. | Light source assembly, method of producing light source assembly, and color thermal printer |
US7713667B2 (en) | 2004-11-30 | 2010-05-11 | Asml Holding N.V. | System and method for generating pattern data used to control a pattern generator |
JP4858439B2 (ja) * | 2005-01-25 | 2012-01-18 | 株式会社ニコン | 露光装置及び露光方法並びにマイクロデバイスの製造方法 |
US20060216869A1 (en) | 2005-03-22 | 2006-09-28 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, code reading device and substrate |
JP4553313B2 (ja) * | 2005-10-31 | 2010-09-29 | 大日本スクリーン製造株式会社 | 画像記録装置 |
US7936445B2 (en) | 2006-06-19 | 2011-05-03 | Asml Netherlands B.V. | Altering pattern data based on measured optical element characteristics |
JP4867625B2 (ja) | 2006-11-30 | 2012-02-01 | ブラザー工業株式会社 | 縫製データ作成装置、縫製データ作成プログラム及び縫製データ作成プログラムを記録した記録媒体 |
US7847938B2 (en) | 2007-10-01 | 2010-12-07 | Maskless Lithography, Inc. | Alignment system for optical lithography |
-
2010
- 2010-12-05 US US12/960,533 patent/US8395752B2/en active Active
- 2010-12-09 WO PCT/US2010/059667 patent/WO2011075385A1/en active Application Filing
- 2010-12-09 CN CN201080056687.0A patent/CN102656514B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6312134B1 (en) * | 1996-07-25 | 2001-11-06 | Anvik Corporation | Seamless, maskless lithography system using spatial light modulator |
US20070030471A1 (en) * | 2004-06-08 | 2007-02-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method using dose control |
US20070030472A1 (en) * | 2004-12-28 | 2007-02-08 | Asml Netherlands B.V. | System and method for determining maximum operational parameters used in maskless applications |
CN101218544A (zh) * | 2005-06-24 | 2008-07-09 | 富士胶片株式会社 | 曝光方法和设备 |
CN101276156A (zh) * | 2007-03-28 | 2008-10-01 | 株式会社Orc制作所 | 曝光绘图装置 |
CN101364050A (zh) * | 2007-08-10 | 2009-02-11 | 株式会社Orc制作所 | 光刻系统 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102914949A (zh) * | 2012-09-17 | 2013-02-06 | 天津芯硕精密机械有限公司 | 一种用于扫描式无掩膜光刻机倾斜slm曝光的数据处理方法 |
CN102914949B (zh) * | 2012-09-17 | 2015-12-09 | 天津芯硕精密机械有限公司 | 一种用于扫描式无掩膜光刻机倾斜slm曝光的数据处理方法 |
CN106062752A (zh) * | 2014-03-10 | 2016-10-26 | 应用材料公司 | 用于多带电粒子束平板印刷术的像素融合 |
CN106062752B (zh) * | 2014-03-10 | 2020-03-17 | 应用材料公司 | 用于多带电粒子束平板印刷术的像素融合 |
CN109752905A (zh) * | 2017-11-08 | 2019-05-14 | 三星电子株式会社 | 包括元透镜在内的投影仪 |
CN109752905B (zh) * | 2017-11-08 | 2022-05-24 | 三星电子株式会社 | 包括元透镜在内的投影仪 |
CN114556220A (zh) * | 2019-08-30 | 2022-05-27 | 应用材料公司 | 用于无掩模光刻的多色调方案 |
Also Published As
Publication number | Publication date |
---|---|
US20130003029A1 (en) | 2013-01-03 |
WO2011075385A1 (en) | 2011-06-23 |
CN102656514B (zh) | 2016-01-13 |
US8395752B2 (en) | 2013-03-12 |
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