CN102607402A - 评估多层结构中层的装置和方法 - Google Patents

评估多层结构中层的装置和方法 Download PDF

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CN102607402A
CN102607402A CN2011104379634A CN201110437963A CN102607402A CN 102607402 A CN102607402 A CN 102607402A CN 2011104379634 A CN2011104379634 A CN 2011104379634A CN 201110437963 A CN201110437963 A CN 201110437963A CN 102607402 A CN102607402 A CN 102607402A
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J·R·林
J·G·汤姆逊
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Abstract

一种用于评估多层结构中的层的装置,所述层包括层间间隙;多层结构具有横跨轴线大致对齐的多个边缘;该装置包括:(a)用来感测至少一个参数的感测单元;(b)与该感测单元联接的定位单元;定位单元被配置为大致沿该轴线实现对感测单元的移动;和(c)与定位单元和感测单元中的至少一个联接的控制单元。控制单元提供电信号至感测单元。在可替代配置中,控制单元可在感测单元的移动过程中向其提供电信号。随着感测单元移动经过多个边缘,控制单元监控至少一个参数中的变化。控制单元利用至少一个参数中的变化来实现评估。

Description

评估多层结构中层的装置和方法
技术领域
本发明针对材料检测装置和方法,并且特别针对评估多层结构中包括层间间隙的层的装置和方法。
背景技术
在评估多层材料中,可能需要了解关于结构层的信息,所述信息包括结构层之间的任何间隙的大小。以举例方式并且不以限定方式,可能需要了解间隙的尺寸从而分析层之间是否存在过大的压力。测量或评估多层结构中的层可从多层结构的边缘处实施,在此可出现不同层的边缘。可替代地,边缘的评估和测量可在横穿该结构或者横穿该结构的至少一些层的孔内实施。这种孔可被生产而专门用于测试孔的目的或者存在的紧固孔可用来测量或评估。
如果不了解结构中各种层的厚度,则多层结构中的测量或其他评估不易实施。至多层结构的自由边缘的通道可使得评估或测量过程更简单。
然而,在不知道多层结构中的各种层的厚度并且特别是结构中不存在自由边缘的情况中,需要一种装置、系统和方法来测量或评估多层结构的层。
对于评估多层结构的层间间隙的装置、系统和方法存在一种需要。
发明内容
一种用于评估多层结构中包括中间出呢个间隙的层的装置;多层结构具有大致横跨轴线对齐的多个边缘;该装置包括:(a)用来感测至少一个参数的感测单元;(b)与该感测单元联接的定位单元;定位单元被配置为大致沿该轴线实现对感测单元的移动;和(c)与定位单元和感测单元中的至少一个联接的控制单元。控制单元提供电信号至感测单元。在可替代配置中,控制单元可在感测单元的移动过程中向其提供电信号。随着感测单元移动经过多个边缘,控制单元监控至少一个参数中的变化。控制单元使用至少一个参数中的变化来实现评估。
一种的用来确定多层结构中大致沿轴线的不同材料层的厚度的系统;厚度由多个边缘限定,这些边缘相对轴线基本并列地跨越排列。为本公开的目的,数据“跨越”可被理解为边缘不与轴线一致或者不平行于轴线。系统包括:(a)被配置为感测至少一个电磁参数的电磁传感器单元;(b)与传感器单元联接的定位单元;定位单元实现对传感器单元大致沿轴线的移动;和(c)与传感器单元和定位单元中的至少一个联接的监控单元。监控单元提供电输入信号至传感器单元并且随着传感器单元沿轴线移动经过多个边缘时,接收自传感器单元的至少一个电磁参数变化的指示。监控单元使用至少一个电磁参数的变化来实现确定。
一种用来评估多层结构中包括中间间隙的层以产生表示评估的映射图的方法;多层结构具有多个大致横跨轴线对齐的边缘;该方法包括:(a)没有特定的顺序:(1)提供被配置为感测至少一个参数的感测单元;(2)提供与感测单元联接的定位单元;单位单元被配置为实现感测单元大致平行于轴线的移动;以及(3)提供与定位单元和感测元件中的至少一个联接的控制单元;(b)随着感测单元移动经过多个边缘,操作控制单元监控至少一个参数的变化;(d)操作控制单元使用至少一个参数的变化来实现评估;以及(e)使用评估来产生映射图。
因此,本公开的一个特征是提供了用来测量或评估多层结构中的层的装置、系统和方法。
本公开的另一特征时提供用来评估多层结构中层间间隙的装置、系统和方法。
本公开的其他目的和特征将在结合说明本公开的优选实施例的附图说明参考时从以下说明中变得明显,其中在不同附图中,相同的元件使用相同的参考符号标注。
附图说明
图1是根据本公开的教示用来评估多层结构的层的示例性装置和系统的局部截面图。
图2是图示使用说明本公开来评估多层结构的层的示意图。
图3是在围绕孔的不同时钟位置图示说明使用本公开来评估多层结构的层的示意图。
图4是图示说明本公开的方法的流程图。
具体实施方式
术语“联接”和“连接”,以及它们的变体可在本文中使用。应理解这些术语并不是同义词。在具体的实施例中,“连接”可用于指示两个或更多个元件以直接的物理或电学方式彼此接触。“联接”则用来指示两个或更多两个元件以或直接或间接(通过它们之间的其他干预元件)的物理或电学方式接触,或者两个或更多个元件彼此协作或者相互作用(即,如在因果关系的)。
图1是根据本公开的教示用来评估多层结构中的层的示例性装置和系统的局部平面图。如在本文中使用的,术语“示例性”指示一个示例并且不必须是理想的。在图1中,用来评估多层结构中的层间间隙的装置10可包括感测单元12、定位单元14和控制单元16。
定位单元14可包括定位框架20(在图1中的截面中示出的)和移动单元22。定位框架20可具有与井26连通的孔24。孔24和井26可大致关于轴线27对称地取向。
感测单元12可包括安装有传感器承载体32的传感器单元30。传感器承载体32可滑动地被接收在孔24内并且抵靠移动单元22。支撑元件34可提供移动单元22和传感器承载体32之间的基本完全的接触。以示例方式并且不以限制方式,支撑元件34可被实施为球形支撑,该球形支撑被嵌入地接合移动单元22和传感器承载体32中的一个,或者支撑元件34可被实施为从移动单元22和传感器承载体32中的一个延伸而被整体地形成。传感器单元30可与控制单元16联接,例如以示例方式并且不以限定方式经由电连接导线36与控制单元16联接。控制单元16还可与移动单元22联接,例如以示例方式并且不以限定方式,经由电子连接导线37与移动单元22联接。控制单元16可提供电信号至传感器单元30。在可替代配置中,控制单元16可在移动单元22的移动过程中向传感器单元30提供电信号。电信号可以是涡流。传感器单元30可被实施为涡流线圈单元。这种涡流线圈单元对于传感器单元设计领域的技术人员是已知的并且因此不在图1中详细说明。
偏置构件38可位于传感器承载体32的肩部33和与定位框架20关联的阻件35之间。阻件35可以,以示例方式并且不以限定方式,被整体地形成在井26内,固定在井26内或者基本不可移动地定位以提供用于偏置构件38的阻件。偏置构件38可被取向为促使传感器承载体32趋向静止的方向。在图1中图示说明的示例性实施例中,偏置构件38被理解为可被实施为螺旋压缩弹簧,其促使图1中传感器承载体32向上运动,从而由传感器单元30减少超过定位框架20的延伸“e”。
移动单元22可,以示例方式并且不以限定方式,被实施为深度计或测微计。移动单元22可在井26中反向于由偏置单元38提供的片直立而被推进井26内,这样以通过传感器单元30升高延伸“e”的方式实现基本沿轴线27推进传感器承载体32。关于定位单元、传感器单元30和多层结构之间的相互作用的细节关联图2更细节地描述。
图2是图示说明使用本公开来评估多层结构的层的示意图。在图2中,一般关联图1被描述的装置10以安装方向来评估多层结构的方式被图示说明。
多层结构40可包括从顶表面41延伸深度d1的第一层42。第二层44可在自顶表面41的距离d2和距离d3之间延伸。第三层46可从顶表面41的距离d4和距离d5之间延伸。第三层46可在从顶表面41的距离d4和d5之间延伸。第四层48可在从顶表面41的距离d6和距离d7之间延伸。
层42、44可在自顶表面41的距离d1和d2之间产生间隙43。层44、46可在自顶表面41的距离d3和d4之间产生间隙层间45。层46、48可在自顶表面41的距离d5和d6之间产生间隙层间47。层间45、47可被实施为不用于邻接层44、46、48的材料。层间45、47和层44、46、48均可被实施为不同的材料。
多层结构40可具有基本围绕轴线52取向的孔50。因此,层44、46、48可具有大致横跨轴线52对齐的多个边缘。多个边缘可相对轴线52基本对准地跨越地设置。
为了对多层结构40实施评估,使用者可推进装置10关联的移动单元(在图2中不可见;参见图1中移动单元22),从而在由箭头56指示的方向上大致沿轴线52移动传感器单元54,进而改变从层42的延伸量e。
传感器单元54可被移动至横穿多层结构40,传感器单元54可被取向为邻接展示不同特征的不同材料,这些特征由传感器单元54感测。以示例方式并且不以限定方式,传感器单元54可被配置为与控制单元(在图2中不可见;参见图1中的控制单元16)协作,从而测量阻抗的差值。这种装置可通过配置传感器单元54基本为惠斯通电桥类型被实现,并且其中该惠斯通电桥的指至少一部分邻接被评估的材料。惠斯通电桥可被用来通过平衡电桥电路的两个部分或支路来测量位置电阻或阻抗,其中一部分包括位置阻抗。这种惠斯通电桥的细节在此不再描述但是它们在传感器设计领域的技术人员的理解范围内。
随着传感器54经由孔50横穿多层结构,可通过传感器单元感测其通过每个层42、44、46、48、间隙43和层间45、47时阻抗的变化。通过标记装置10的传感器单元54延伸到孔50的深度,随着有传感器单元54感测的阻抗的变化,可确定每个层42、44、46、48、间隙43和每个层间45、47的厚度。
传感器单元54可被配置为感测除阻抗外的另一参数,进一步以距离方式并且不以限定方式,例如磁通量或电容。尺寸例如,以示例方式并且不以限定方式,传感器单元54沿基本平行于轴线52的平面截取的横截面可影响可由传感器单元54确定的变化的分辨率。可能的是更加小的横截面允许位置的更细的分辨力,其中可发生测量的参数变化,例如从层44的材料至距顶表面41距离d1处的空气间隙43。
传感器设计领域的技术人员还可理解装置10可在这样的情况下基本如关联图2中描述的进行操作,在该情况中存在多层结构40的暴露边缘而不是在围绕横穿多层结构40的孔的边缘的内部。
图3是图示说明使用本公开在围绕孔的不同时针位置处评估多层结构的层的示意图。在图3中,多层结构60可包括由空气间隙63分离的材料层62、64。基本围绕轴线72对称的孔71可横穿多层结构60。
被配置为与装置10(在图3中未示出;参见图1和图2)相似的装置被以相似于在图2中相对孔50图示说明的安装方式安装在孔71中。大致如关联图2描述的,可通过插入的装置10所述一系列的评估。然而,可实施多于一系列的评估,以便获得空气间隙62的更全面的评估。这种更全面的评估通过在围绕孔71的周长的几个位置处实施一系列电子参数的评估读数而被实施,所述读数例如阻抗。以举例方式并且不以限定方式,可在12点的位置72实施一系列评估读数。在完成12点的位置72的评估之后,装置10可被旋转以允许在另一时钟位置例如3点的位置实施一系列评估读数。可替代地,装置10的一部分例如移动单元或感测单元12可被旋转一允许在3点中的位置74评估。在完成在3点钟的位置74的评估之后,装置10可被旋转至另一时钟位置,例如8点钟位置76实施一系列的评估读数。在围绕孔71的不同时钟位置处实施这种一系列评估可允许确定自层62、64的空气间隙63的分离是否关于孔71均匀,如在图3中图示说明的情况。
图4是图示说明本公开的方法的流程图。在图4中,用来评估多层结构中的层间间隙以产生表示所述评估的映射图的方法100在开始椭圆102处开始。多层结构具有大致横跨轴线对齐的多个边缘。
方法100以以下不固定的顺序继续:(1)提供被配置为感测至少一个参数的感测单元,如由方块104;(2)提供与感测单元联接的定位单元,如由方块106指示的;定位单元被配置为实现大致平行于轴线移动感测单元;以及(3)提供与定位单元和感测单元中的至少一个联接的控制单元,如由方块108指示的。
方法100继续,操作控制单元从而提供电信号至感测单元,如由方块110指示的。可替代地,电信号可在感测单元的移动过程中被提供至感测单元。
方法100继续,操作控制单元从而随着感测单元移动经过多个边缘而监控所述至少一个参数的变化,如由方块112指示的。
方法100继续,操作控制单元使用所述至少一个参数的变化来实现评估,如由方块114指示的。
方法100继续,使用评估来产生映射图,如由方块116指示的。映射图可以是对于使用者有益的绘图显示形式、柱状示图绘图显示或其他格式形式的。映射图可被存储在存储器单元中以用于日后使用和评估。
方法100在结束椭圆118处终止。
将理解,当已经给出了本公开的优选实施例的细节附图和具体示例,但是它们仅为说明目的,本公开的装置和方法不先于所公开的精确细节和情况并且可在不偏离本公开的精神下做出各种改变,本公开的精神由权利要求限定。

Claims (20)

1.一种用于评估多层结构中层间间隙的装置;所述多层结构具有横跨轴线大致对齐的多个边缘;所述装置包括:
(a)用来感测至少一个参数的感测单元;
(b)与所述感测单元联接的定位单元;所述定位单元被配置为实现所述感测单元大致沿所述轴线的移动;和
(c)与所述定位单元和所述感测单元中的至少一个联接的控制单元;
所述控制单元提供电信号至所述感测单元;随着所述感测单元移动经过所述多个边缘,所述控制单元监控所述至少一个参数中的变化;所述控制单元使用所述至少一个参数中的变化来实现所述评估。
2.如权利要求1所述的用于评估多层结构中层间间隙的装置,其中所述多个边缘基本围绕大致平行于所述轴线横穿所述多层结构的至少一部分的孔。
3.如权利要求1所述的用于评估多层结构中层间间隙的装置,其中所述定位单元被配置为指示由所述定位单元造成的所述感测单元的位移;所述位移被所述控制单元用于所述评估中。
4.如权利要求1所述的用于评估多层结构中层间间隙的装置,其中所述定位单元被设置在测微计单元内。
5.如权利要求1所述的用于评估多层结构中层间间隙的装置,其中所述感测单元包括涡流线圈单元。
6.如权利要求5所述的用于评估多层结构中层间间隙的装置,其中所述至少一个参数是所述涡流线圈单元受到的阻抗。
7.如权利要求2所述的用于评估多层结构中层间间隙的装置,其中所述定位单元被配置为指示由所述定位单元造成的所述感测单元的位移;所述位移被所述控制单元用于所述评估中。
8.如权利要求7所述的用于评估多层结构中层间间隙的装置,其中所述感测单元包括涡流线圈单元。
9.如权利要求8所述的用于评估多层结构中层间间隙的装置,其中所述至少一个参数是由所述涡流线圈单元受到的阻抗。
10.一种大致沿多层结构的轴线确定不同材料层的厚度的系统;所述厚度由多个边缘限定,所述多个边缘相对所述轴线跨越地基本对准地设置;所述系统包括:
(a)被配置为感测至少一个电磁参数的电磁传感器单元;
(b)与所述传感器单元联接的定位单元;所述定位单元实现对传感器单元大致沿轴线的移动;和
(c)与所述传感器单元和所述定位单元中的至少一个联接的监控单元;所述监控单元提供电输入信号至所述传感器单元并且随着所述传感器单元沿所述轴线移动经过所述多个边缘时,接收自所述传感器单元的所述至少一个电磁参数变化的指示;所述监控单元采用所述至少一个电磁参数的变化来实现所述确定。
11.如权利要求10所述的大致沿多层结构的轴线确定不同材料层的厚度的系统,其中所述多个边缘基本围绕大致平行于所述轴线横穿所述多层结构的至少一部分的孔。
12.如权利要求11所述的大致沿多层结构的轴线确定不同材料层的厚度的系统,其中所述定位单元被配置为指示由所述定位单元造成的所述传感器单元的位移;所述位移被所述控制单元用于所述确定中。
13.如权利要求12所述的大致沿多层结构的轴线确定不同材料层的厚度的系统,其中所述定位单元被设置在测微计单元内。
14.如权利要求13所述的大致沿多层结构的轴线确定不同材料层的厚度的系统,其中所述传感器单元包括涡流线圈单元。
15.如权利要求14所述的大致沿多层结构的轴线确定不同材料层的厚度的系统,其中所述至少一个电磁参数是所述涡流线圈单元受到的阻抗。
16.一种评估多层结构的层间间隙以产生表示所述评估的映射图的方法;所述多层结构具有横跨轴线大致对齐的多个边缘;所述方法包括:
(a)没有特定顺序:
(1)提供被配置为感测至少一个参数的感测单元;
(2)提供与所述感测单元联接的定位单元;所述定位单元被配置为使所述感测单元大致平行于所述轴线移动;以及
(3)提供与所述定位单元和所述感测单元中的至少一个联接的控制单元;
(b)操作所述控制单元从而提供电信号至所述感测单元;
(c)操作所述控制单元从而随着所述感测单元移动经过所述多个边缘而监控所述至少一个参数的变化;
(d)操作所述控制单元使用所述至少一个参数的变化来实现所述评估;
(e)使用所述评估来产生所述映射图。
17.如权利要求16所述的评估多层结构的层间间隙的方法,其中所述多个边缘基本围绕大致平行于所述轴线横穿所述多层结构的至少一部分的孔。
18.如权利要求17所述的评估多层结构的层间间隙的方法,其中所述定位单元是测微计单元,其中所述测微计单元被设置为指示由所述定位单元造成的所述感测单元的位移;所述位移被所述控制单元用于所述评估中。
19.如权利要求18所述的评估多层结构的层间间隙的方法,其中所述感测单元包括涡流线圈单元。
20.如权利要求19所述的评估多层结构的层间间隙的方法,其中所述至少一个参数是由所述涡流线圈单元受到的阻抗。
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