CN102565108B - 衍射仪 - Google Patents

衍射仪 Download PDF

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Publication number
CN102565108B
CN102565108B CN201110368861.1A CN201110368861A CN102565108B CN 102565108 B CN102565108 B CN 102565108B CN 201110368861 A CN201110368861 A CN 201110368861A CN 102565108 B CN102565108 B CN 102565108B
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CN
China
Prior art keywords
sample
ray
crystal
diffraction
sample stage
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CN201110368861.1A
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English (en)
Chinese (zh)
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CN102565108A (zh
Inventor
P·菲维斯特
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Marvin Panna C Co
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Panalytical BV
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN201110368861.1A 2010-11-18 2011-11-18 衍射仪 Active CN102565108B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/949,539 US8488740B2 (en) 2010-11-18 2010-11-18 Diffractometer
US12/949,539 2010-11-18

Publications (2)

Publication Number Publication Date
CN102565108A CN102565108A (zh) 2012-07-11
CN102565108B true CN102565108B (zh) 2016-02-24

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ID=44925381

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201110368861.1A Active CN102565108B (zh) 2010-11-18 2011-11-18 衍射仪

Country Status (4)

Country Link
US (1) US8488740B2 (https=)
EP (1) EP2455747B1 (https=)
JP (1) JP6009156B2 (https=)
CN (1) CN102565108B (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105758880B (zh) * 2016-04-11 2019-02-05 西北核技术研究所 基于闪光x光机的超快x射线衍射成像方法及系统
PL3469352T3 (pl) 2017-12-15 2020-06-01 Tankbots, Inc. Sposoby realizacji zadań w zbiorniku zawierającym substancje niebezpieczne
US11614414B2 (en) * 2018-10-19 2023-03-28 Commonwealth Scientific And Industrial Research Organisation Energy-dispersive X-ray diffraction analyser comprising a substantially X-ray transparent member having an improved reflection geometry
CN109374660B (zh) * 2018-11-22 2024-09-06 北京科技大学 用于排笔光束的高通量粉末衍射的装置
CA3136306C (en) 2019-02-20 2023-10-03 Tankbots, Inc. Methods for performing tasks inherently safely in a tank containing hazardous substances
CA3191201A1 (en) 2022-02-25 2023-08-25 Proto Manufacturing Ltd. Transmission x-ray diffraction apparatus and related method

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE322066B (https=) * 1968-01-25 1970-03-23 Incentive Res & Dev Ab
JPS58165045A (ja) * 1982-03-26 1983-09-30 Hitachi Ltd 結晶方位迅速測定装置
JPH02107952A (ja) 1988-10-15 1990-04-19 Sumitomo Metal Ind Ltd 粉末のｘ線回析測定方法
US4928294A (en) 1989-03-24 1990-05-22 U.S. Government As Represented By The Director, National Security Agency Method and apparatus for line-modified asymmetric crystal topography
EP0553911A1 (en) * 1992-01-27 1993-08-04 Koninklijke Philips Electronics N.V. Position-sensitive X-ray analysis
JPH06194498A (ja) * 1992-08-31 1994-07-15 Hitachi Ltd マイクロｘ線回折装置
US5923720A (en) * 1997-06-17 1999-07-13 Molecular Metrology, Inc. Angle dispersive x-ray spectrometer
DE29716107U1 (de) 1997-09-08 1997-10-30 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 80539 München Strahlführungssystem für Neutronen zur Grenzflächenuntersuchung
JP3734366B2 (ja) * 1998-03-20 2006-01-11 株式会社リガク Ｘ線分析装置
EP1049927A2 (en) * 1998-11-25 2000-11-08 PANalytical B.V. X-ray analysis apparatus including a parabolic x-ray mirror and a crystal monochromator
EP1468428B1 (fr) * 2002-06-19 2006-09-27 Xenocs Ensemble optique et procede associe
JP4178399B2 (ja) * 2003-09-25 2008-11-12 株式会社島津製作所 Ｘ線ｃｔ装置
JP4498089B2 (ja) * 2004-06-21 2010-07-07 株式会社リコー 静電荷現像用トナー評価方法及び静電荷現像用トナー
EP1720006A1 (en) * 2005-05-02 2006-11-08 F. Hoffmann-La Roche Ag Method and apparatus for x-ray diffraction analysis
JP4685877B2 (ja) 2005-11-02 2011-05-18 株式会社リガク 微結晶粒の方位分布測定方法及びその装置
JP4278108B2 (ja) * 2006-07-07 2009-06-10 株式会社リガク 超小角ｘ線散乱測定装置
JP2009109447A (ja) * 2007-11-01 2009-05-21 Rigaku Corp Ｘ線検査装置およびｘ線検査方法
US8080791B2 (en) * 2008-12-12 2011-12-20 Fei Company X-ray detector for electron microscope
JP4971383B2 (ja) * 2009-03-25 2012-07-11 株式会社リガク Ｘ線回折方法及びｘ線回折装置

Also Published As

Publication number Publication date
US8488740B2 (en) 2013-07-16
US20120128128A1 (en) 2012-05-24
JP2012108126A (ja) 2012-06-07
EP2455747B1 (en) 2016-01-20
EP2455747A1 (en) 2012-05-23
JP6009156B2 (ja) 2016-10-19
CN102565108A (zh) 2012-07-11

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GR01 Patent grant
CP01 Change in the name or title of a patent holder

Address after: Holland Al Merl Lo

Patentee after: Marvin Panna C company

Address before: Holland Al Merl Lo

Patentee before: Panalytical B. V.

CP01 Change in the name or title of a patent holder