CN102413628A - Column-plate winding-pathway low-temperature plasma gas generator - Google Patents
Column-plate winding-pathway low-temperature plasma gas generator Download PDFInfo
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- CN102413628A CN102413628A CN2011103450957A CN201110345095A CN102413628A CN 102413628 A CN102413628 A CN 102413628A CN 2011103450957 A CN2011103450957 A CN 2011103450957A CN 201110345095 A CN201110345095 A CN 201110345095A CN 102413628 A CN102413628 A CN 102413628A
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Abstract
The invention discloses a column-plate winding-pathway low-temperature plasma gas generator. One side of the plasma gas generator is connected with a power supply (1). A central section of the side which is connected with the power supply (1) is provided with an air inlet (2) and the central section of the other side is provided with an air outlet (3). The plasma gas generator uses two rows of needle electrodes as discharge electrodes. Pole groups of anodes (4) and cathodes (5) have an interval which is 30-50mm. The each needle pole column in the pole groups is arranged with the same interval, wherein the interval is 2-10mm. One separating column plate (6) is arranged every 2-5 needle electrode columns. A glass cement is used to seal space between the separating column plate (6) and a shell (7). In the invention, production is simple and costs are low. The uniform plasma gas with a high density can be generated.
Description
Technical field
The present invention relates to a kind of atmospheric low-temperature plasma gas generator,, form tortuous gas passage simultaneously, make higher, the more even distribution of working gas ionic medium volume density by stopping that column plate is divided into the arc chamber of a plurality of series connection with region of discharge.
Background technology
Plasma is called as the 4th attitude of material, is made up of a large amount of energetic ions, electronic molecules, neutral atom, excited atom, photon and free radical.Because its positive and negative charge number equates, so on macroscopic view, be electric neutrality.Along with the high speed development of modern technologies, plasma technology is widely used.Wherein, in the low-temperature plasma system, during up to 1000-2500K, other particle temperatures have only 300-500K in the temperature of electronics, and whole system still is in low-temperature condition.Non-thermal plasma trap is widely used at aspects such as material surface processing, catalysis, sewage and waste gas purifications.
The discharge type of low-temperature plasma can be divided into glow discharge, microwave discharge, corona discharge, dielectric barrier discharge, radio frequency discharge etc.Wherein, corona discharge device is simple, but discharging current is less, and plasma density is lower; In addition, owing to use needle electrode, strong especially near the regional electric field of electrode, cause plasma density inhomogeneous.Therefore, need to improve input power the density and the uniformity of adjustment working gas ionic medium body through design.For example, patent of invention CN1404349A is an anode with many groups nickel filament, and copper coin is a negative electrode, in reative cell, has produced the high concentration plasma, can be used for industrial treatment waste gas, sewage and water source purifying; The reative cell of utility model patent CN201726583U design then is made up of metallic plate and a plurality of sheet metal group that is arranged in parallel, has sawtooth, and the increase of sparking electrode number obviously improves the density of gas ionic medium body.Except needs improved plasma density, plasma uniformity also was the key factor that the low-temperature plasma generator design demand is considered.Such as, utility model patent CN201618509 has designed special punched-plate at the inlet channel of low-temperature plasma generator, has played reinforcement gas and has mixed, and increases the effect of the stroke of gas, has improved the uniformity of plasma distribution effectively; Utility model patent CN101930889A will contain the gas of plasma through shunt, and the ejection of diverse location in reative cell makes the distribution of plasma in the reative cell be tending towards even.But, up to the present, also do not see and utilize structural design to improve plasma density and inhomogeneity relevant report simultaneously.
Summary of the invention
The object of the invention is to provide a kind of plasma density big, and the low-temperature plasma generator that in working gas, is evenly distributed of plasma.Utilize column plate to separate multicell structure and the tortuous runner that is produced; Implement the discharge of series connection multicell; Prolong the time of staying of working gas in reactor simultaneously, strengthen the dispersion of plasma in working gas, thereby effectively improve the density and the uniformity of working gas ionic medium.If in the arc chamber that column plate is separated, insert the dielectric microballoon, then can realize efficient dielectric barrier discharge.
The present invention is achieved in that
(1) side joint of plasma gas generator has power supply, regulates power output through regulating input voltage, plays the effect of the density of adjustment working gas ionic medium body; The middle side part that the plasma gas generator connects power supply has air inlet, and there is the gas outlet at the opposite side middle part;
(2) plasma generator adopts two row's needle electrodes as sparking electrode, and anodal and negative pole utmost point group is spaced apart 30-50mm; Each needle-like pole equidistance is arranged spacing 2-10mm in the utmost point group;
(3) every separated 2-5 needle electrode pole is provided with a separation column plate; Seal with glass cement between separation column plate and the shell, can flow along separating column plate, form zigzag path to guarantee working gas.Working gas is because of separating the stopping with zigzag channel a plurality of discharged in series zone of flowing through of column plate, thereby improved the density of plasma in working gas; Simultaneously, gas has carried out sufficient mixing in complications in through the process of the region of discharge of a plurality of series connection, thereby makes the more even distribution of plasma in gas.
Characteristics of the present invention: plasma density can be regulated through the voltage of regulating DC high-voltage power supply in (1); (2) a plurality of region of discharges are connected, and have increased the density of working gas ionic medium body; (3) separate the zigzag channel that column plate forms working gas is fully mixed, make more even that plasma distributes in air-flow.
The present invention makes simply, and cost is low, can produce the high and uniform plasma gas of density.
Description of drawings
Accompanying drawing is a column plate type zigzag channel low-temperature plasma gas generator structural representation of the present invention.
Mark among the figure: 1. power supply; 2. air inlet; 3. gas outlet; 4. anodal; 5. negative pole; 6. separation column plate; 7. shell.
Embodiment
Embodiment
Column plate type zigzag channel low-temperature plasma gas generator structure is shown in accompanying drawing.
(1) side joint of plasma gas generator has power supply 1, selects for use neon lamp power source as high-voltage DC power supply 1, its input AC electricity (50Hz) voltage 220V; Output voltage direct current 10kV, output current 30mA; The middle side part that plasma generator connects power supply 1 has air inlet 2, and there is gas outlet 3 at the opposite side middle part;
(2) use AC transformer to regulate the input voltage of neon lamp power source 1, and then regulate the output voltage of neon lamp power source 1;
(3) adopt two row's needle electrodes as sparking electrode in the plasma generator, positive pole 4 is spaced apart 30mm with negative pole 5 utmost point groups; Each needle-like pole equidistance is arranged (spacing 2mm) 40 of pole quantity in the utmost point group;
(4) be provided with 10 in the column plate type plasma generator and separate column plate 6, the spacing between the column plate is 10mm, will separate between column plate 6 and the shell 7 to seal with glass cement, can flow along separating column plate 6 to guarantee working gas, forms zigzag path;
Utilize air pump or gas cylinder that working gas is sent into column plate type plasma gas generator arc chamber, the flow of gas is measured through flowmeter, controls with air valve.After applying voltage, by separating each region of discharge evenly discharge simultaneously that column plate 6 separates, the discharge of series connection multicell makes the density of working gas ionic medium body; Simultaneously, tortuous gas passage is fully mixed working gas, the more even distribution of plasma in gas.
Claims (1)
1. plasma gas generator is characterized in that:
(1) side joint of plasma gas generator has power supply (1), with middle part, power supply (1) the same side air inlet (2) is arranged, and there is gas outlet (3) at the opposite side middle part;
(2) the plasma gas generator adopts two row's needle electrodes as sparking electrode, and anodal (4) and negative pole (5) utmost point group are spaced apart 30-50mm; Each needle-like pole equidistance is arranged spacing 2-10mm in the utmost point group;
(3) every separated 2-5 needle electrode pole is provided with a separation column plate (6); Separate between column plate (6) and the shell (7) and seal with glass cement.
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CN2011103450957A CN102413628A (en) | 2011-11-02 | 2011-11-02 | Column-plate winding-pathway low-temperature plasma gas generator |
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CN2011103450957A CN102413628A (en) | 2011-11-02 | 2011-11-02 | Column-plate winding-pathway low-temperature plasma gas generator |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111900069A (en) * | 2020-06-09 | 2020-11-06 | 哈尔滨工业大学 | Ion source magnetic conduction anode gas supply device integrated structure |
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US6193832B1 (en) * | 1997-07-25 | 2001-02-27 | International Business Machines Corporation | Method of making dielectric catalyst structures |
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CN1558708A (en) * | 2004-01-30 | 2004-12-29 | 周卫东 | Pinhole type multi-plate plasma generator for air cleaning |
CN101011593A (en) * | 2007-02-02 | 2007-08-08 | 上海福缘电子有限公司 | Air purifier with high concentration negative ions radiation |
US20100006419A1 (en) * | 2006-07-14 | 2010-01-14 | Drexel University | Device for generation of pulsed corona discharge |
CN101745301A (en) * | 2009-12-25 | 2010-06-23 | 赵岳虎 | Plasma generating device |
CN101912761A (en) * | 2010-07-05 | 2010-12-15 | 洪昆喨 | Dielectric discharge reactor of uniform electric field |
CN202269086U (en) * | 2011-11-02 | 2012-06-06 | 桂林理工大学 | Plasma gas generator |
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2011
- 2011-11-02 CN CN2011103450957A patent/CN102413628A/en active Pending
Patent Citations (9)
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US5603893A (en) * | 1995-08-08 | 1997-02-18 | University Of Southern California | Pollution treatment cells energized by short pulses |
US6193832B1 (en) * | 1997-07-25 | 2001-02-27 | International Business Machines Corporation | Method of making dielectric catalyst structures |
CN2622600Y (en) * | 2003-06-03 | 2004-06-30 | 何冠东 | Combined air cleaner of central air conditioner |
CN1558708A (en) * | 2004-01-30 | 2004-12-29 | 周卫东 | Pinhole type multi-plate plasma generator for air cleaning |
US20100006419A1 (en) * | 2006-07-14 | 2010-01-14 | Drexel University | Device for generation of pulsed corona discharge |
CN101011593A (en) * | 2007-02-02 | 2007-08-08 | 上海福缘电子有限公司 | Air purifier with high concentration negative ions radiation |
CN101745301A (en) * | 2009-12-25 | 2010-06-23 | 赵岳虎 | Plasma generating device |
CN101912761A (en) * | 2010-07-05 | 2010-12-15 | 洪昆喨 | Dielectric discharge reactor of uniform electric field |
CN202269086U (en) * | 2011-11-02 | 2012-06-06 | 桂林理工大学 | Plasma gas generator |
Non-Patent Citations (1)
Title |
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杨加元 等: "多针电极双极电晕放电电极间距优化", 《高电压技术》, vol. 34, no. 1, 31 January 2008 (2008-01-31), pages 95 - 98 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111900069A (en) * | 2020-06-09 | 2020-11-06 | 哈尔滨工业大学 | Ion source magnetic conduction anode gas supply device integrated structure |
CN111900069B (en) * | 2020-06-09 | 2023-01-31 | 哈尔滨工业大学 | Ion source magnetic conduction anode gas supply device integrated structure |
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Application publication date: 20120411 |