CN203407057U - Dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator - Google Patents
Dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator Download PDFInfo
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- CN203407057U CN203407057U CN201320397627.6U CN201320397627U CN203407057U CN 203407057 U CN203407057 U CN 203407057U CN 201320397627 U CN201320397627 U CN 201320397627U CN 203407057 U CN203407057 U CN 203407057U
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Abstract
The utility model provides a dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator which structurally comprises a gas discharge cavity prepared from insulation materials, a pair of dielectric barrier discharge panel electrodes and two first types of glow discharge electrodes, wherein the pair of dielectric barrier discharge panel electrodes are adhered to the upper side wall and the lower side wall of the gas discharge cavity; the two first types of glow discharge electrodes are arranged on the left end wall and the right end wall of the gas discharge cavity; the gas discharge cavity is provided with an operation gas inlet and a plasma outlet; the part, close to the plasma outlet, in the gas discharge cavity, is of a narrow slit structure; the plasma outlet is of a narrow slit shape; the cavity part of the narrow slit structure between the two first types of glow discharge electrodes is also provided with at least one second type of glow discharge electrode; glow discharge electrode pairs are formed between each two adjacent glow discharge electrodes. Compared with the prior art, the dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator has the advantages that a plasma brush with a large volume can be generated at low breakdown voltage and total energy consumption, and objects with large areas are treated rapidly and effectively.
Description
Technical field
The utility model belongs to plasma producing apparatus field, particularly a kind of dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma brush array generating means.
Background technology
Chinese patent ZL201120020842.5 discloses a kind of atmos low-temperature plasma brush generator and array combination, comprises gas discharge chamber, a pair of glow-discharge electrode, current-limiting resistance, power supply and mass flow controller.Gas discharge chamber is made by the polymer of ceramic material or polytetrafluoroethylene one class, has air inlet port and the port of giving vent to anger, and the port of giving vent to anger is narrow slit shape, and the indoor part near the port of giving vent to anger of gas discharge chamber forms narrow slit cavity.The discharge end of two glow-discharge electrode is positioned at narrow slit cavity place, be connected on the two ends of power supply together with current-limiting resistance, power supply is used for providing voltage, and current-limiting resistance, for limiting two size of current between glow-discharge electrode, avoids glow discharge to change arc discharge into.This apparatus structure is simple, handling safety, but the Joule heat of its energy consumption, puncture voltage and generation is all higher.
For the deficiency to said apparatus is improved, application number is that 201210006023.4 Chinese patent application discloses a kind of dielectric barrier discharge enhanced-type low-temperature plasma brush generation device, between air inlet port and glow discharge sparking electrode, increase a pair of dielectric barrier discharge plate electrode working gas has been carried out to preionization, adopted AC power to provide discharge voltage for plate electrode.During work, working gas is from air inlet port inflow gas electric discharge chamber, while flowing through the corresponding region of plate electrode, the voltage preionization being applied by dielectric barrier discharge plate electrode, then the narrow slit cavity of flowing through again, the voltage applying in two glow-discharge electrode excites the working gas of preionization again, forms stable glow discharge, working gas plasma.Plasma flow from the port of export ejection of gas discharge chamber, stretches out into the stable low-temperature plasma jet of brush shape fast, forms atmos low-temperature plasma brush.Although the starting voltage that the preliminary treatment of dielectric barrier discharge plate electrode makes this improved temperature plasma brush generation device produce plasma than the device described in Chinese patent ZL201120020842.5 is lower; during normal glow discharge, rated operational voltage and electric current are less, and the total energy consumption that produces same volume plasma is only 25% of original device.But for large area object is processed fast and effectively, can only increase distance between glow-discharge electrode to obtain the plasma of more volume, when between glow-discharge electrode, spacing increases, puncture voltage between glow-discharge electrode and the discharge power of plasma all can increase, so not only need to consume more energy, also power-supply device is had higher requirement.
Utility model content
The purpose of this utility model is to overcome the deficiencies in the prior art, provide a kind of dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma to brush hair generating apparatus, to realize the plasma brush that produces more volume under compared with low breakdown voltage and lower total power consumption, large area object is carried out effectively processing fast.
For the purpose of this utility model, the dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma brush array generating means that the utility model provides, comprise the gas discharge chamber of being prepared by insulating material, a pair ofly be attached to dielectric barrier discharge plate electrode on the upper and lower two side of gas discharge chamber and two and be positioned at dielectric barrier discharge plate electrode downstream and be arranged on the first kind glow-discharge electrode in the end walls of gas discharge chamber left and right, described gas discharge chamber has working gas import and plasma outlet, the indoor part near plasma outlet of gas discharge chamber is narrow slit structure, plasma outlet is narrow slot, between described two first kind glow-discharge electrode in the end walls of gas discharge chamber left and right, the cavity place of narrow slit structure is also provided with at least one Equations of The Second Kind glow-discharge electrode, between every two adjacent glow-discharge electrode, form glow-discharge electrode pair, form glow discharge electric field.
In said apparatus, distance between adjacent two glow-discharge electrode is limited can guarantee the breakdown formation glow discharge of working gas between glow-discharge electrode, and puncture, working gas forms the voltage of glow discharge and the kind of working gas, the temperature of working gas, working gas is relevant by the factors such as distance between the situation of plate electrode preionization and adjacent two glow-discharge electrode.
In said apparatus, described glow-discharge electrode is evenly distributed in narrow slit structural cavity body place, each glow-discharge electrode can be distributed on same straight line, also can not be distributed on same straight line, preferably along the direction perpendicular to working gas flow direction, be evenly distributed in narrow slit structural cavity body place; During work, adjacent glow-discharge electrode is connected on the different outputs of power supply, to guarantee having equal-sized voltage difference between every two adjacent glow-discharge electrode, thereby produces the plasma brush that intensity is equal.
In said apparatus, on the glow discharge loop that glow-discharge electrode and power supply form, be preferably in series with current-limiting resistance, to prevent that glow discharge from changing arc discharge into.
In said apparatus, the discharge end of described glow-discharge electrode can be plane, also can needle-like or other present situation.The described Equations of The Second Kind glow-discharge electrode that is arranged on narrow slit structural cavity body place preferably adopts take the thin slice glow-discharge electrode that plane is discharge end, its thickness is at 0.001 ~ 10mm, best results while being no more than 0.1mm, so that the plasma that adjacent two electric fields produce flows out and is merged into a complete plasma brush from the outlet of gas discharge chamber plasma.
In said apparatus, described dielectric barrier discharge plate electrode and glow-discharge electrode can be prepared from by copper, iron, aluminium, tungsten, platinum or its alloy etc.Preferably, the glow-discharge electrode connected with power supply low-pressure end prepared by identical material by identical material preparation, the glow-discharge electrode being connected with power supply high-pressure side, to guarantee that the electric field strength between every two adjacent glow-discharge electrode all equates, thereby produce the equal plasma of intensity; Described gas discharge chamber can be prepared from by insulating ceramics, polytetrafluoroethylene, or is prepared from by the mixture of insulating ceramics and polytetrafluoroethylene.
In said apparatus, be positioned at the glow-discharge electrode in described dielectric barrier discharge plate electrode downstream along working gas flow direction, its position is generally not less than 0.01mm apart from the distance of dielectric barrier discharge plate electrode, is preferably in 1 ~ 10cm.
In said apparatus, the shape of described gas discharge chamber can be to be to be tending towards gradually flat chamber shape from working gas import to plasma narrow slit Way out, also can be the chamber that whole gas discharge chamber is narrow slit structure, the width of described plasma narrow slit outlet be 5 ~ 200:1 with the ratio of height.
In said apparatus, described gas discharge chamber preferably integral body is the narrow slit structural lumen of cuboid, dielectric barrier discharge plate electrode is close to two lateral walls up and down of narrow slit structural cavity body, and parallel with the broadside of plasma outlet, the working gas that enters gas discharge chamber with assurance can be by preionization equably, and narrow slit structural cavity body wall is as the dielectric of the electric discharge end face of described dielectric impedance plate electrode.
If dielectric barrier discharge plate electrode is placed in to the inside of described narrow slit cavity, can cause manufacture craft more complicated, and the theoretical analysis and practical proof, it is substantially suitable with the inner preionization effect producing that dielectric barrier discharge plate electrode is placed in the outside of described narrow slit cavity.
Entering the working gas that above-mentioned plasma brushes hair generating apparatus gas discharge chamber, can be that plasma maintains gas above, can be also active gases, or plasma maintains the mist of gas and active gases.Described plasma maintain gas can be inert gas, nitrogen, oxygen, airborne at least one; Described active gases is at least one in fluorocarbon, carbon oxyfluoride, halogen isoreactivity gas; The flow of working gas generally can be controlled in 0.1～200L/min.
For described dielectric barrier discharge plate electrode provides the power supply of discharge voltage, be AC power, the frequency of described AC power is from adjustable in the radio-frequency region of power frequency to 13.56 MHz; Electric source modes can be continuously or pulse mode; Dielectric barrier discharge power is not more than 1W.
Compared with prior art, the utlity model has following useful remarkable result:
1, the Chinese patent application that device described in the utility model is 201210006023.4 with application number is compared; produce the needed puncture voltage of plasma of same volume and maintain voltage lower; during normal glow discharge, rated operational voltage is less; working gas puncture energy and plasma to maintain energy all less; not only can reduce energy consumption, and also can significantly reduce the requirement of power-supply device.
2, device described in the utility model has lower puncture voltage and maintains voltage, make device lower to the requirement of glow discharge power supply, thereby adopt same power-supply device can produce the plasma brush that volume is larger, be conducive to this device and develop into portable large-area treatment equipment.
3, the plasma that in device described in the utility model, adjacent glow discharge electric field produces can be merged into a complete plasma brush under the drive of working gas flow velocity, compare with array combination described in ZL201120020842.5, shortened the spacing between the plasma that adjacent electric field produces, more easily realized large area object is carried out to uniform treatment.
Accompanying drawing explanation
Fig. 1 is the plasma export structure schematic diagram that the utility model is provided with the plasma brush array generating means of 1 Equations of The Second Kind glow-discharge electrode;
Fig. 2 is the perspective view that the utility model is provided with the plasma brush array generating means of 1 Equations of The Second Kind glow-discharge electrode;
Fig. 3 is the operation principle schematic diagram that the utility model is provided with the plasma brush array generating means of 1 Equations of The Second Kind glow-discharge electrode;
Fig. 4 is that the dielectric barrier discharge plate electrode that the utility model is provided with the plasma brush array generating means of 1 Equations of The Second Kind glow-discharge electrode carries out immediate current and voltage (conduction current) oscillogram of preionization to working gas;
Fig. 5 be the utility model be provided with 1 Equations of The Second Kind glow-discharge electrode with the electric current in plasma brush array generating means glow discharge loop that the second brightness class light sparking electrode is not set with the variation relation correlation curve of voltage;
Fig. 6 is the connection diagram in the utility model glow discharge loop while being provided with 3 Equations of The Second Kind glow-discharge electrode.
In above-mentioned accompanying drawing, the object of each shown by reference numeral sign is respectively: the agent structure part of 10-plasma brush array generating means; 12-gas discharge chamber; The import of 14-working gas; The outlet of 16-plasma; 17,18-dielectric barrier discharge plate electrode; 20,21-first kind glow-discharge electrode; 22, the 23,24-the second brightness class light sparking electrode; 25-plasma brush jet; 28-current-limiting resistance; 30-glow discharge power supply; 32-second amount controller; 34-first flow controller; 38-tee pipe coupling; 40-dielectric barrier discharge power supply.
Embodiment
Below in conjunction with accompanying drawing explanation, provide embodiment, by embodiment, structure and the course of work of dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma brush array generating means described in the utility model are described further.
Embodiment 1-apparatus structure
The structure of the dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma brush array generating means of the present embodiment as shown in Figure 1, Figure 2 and Figure 3.The agent structure part 10 of device comprises the gas discharge chamber 12 of being prepared by insulating ceramics, a pair of being attached on the upper and lower two side of gas discharge chamber for working gas being carried out to the dielectric barrier discharge plate electrode 17 of preionization, 18, and two be positioned at dielectric barrier discharge plate electrode downstream and be arranged on the first kind glow-discharge electrode 20 in the end walls of gas discharge chamber left and right, 21, described gas discharge chamber has working gas import 14 and plasma outlet 16, gas discharge chamber integral body is the narrow slit structural cavity body of cuboid, dielectric barrier discharge plate electrode is close to two lateral walls up and down of narrow slit structural cavity body, and parallel with the broadside of plasma outlet, narrow slit structural cavity body wall is as the dielectric of the electric discharge end face of described dielectric impedance plate electrode, narrow slit structural cavity body place between described two first kind glow-discharge electrode in the end walls of gas discharge chamber left and right is also provided with an Equations of The Second Kind glow-discharge electrode 22, and between two adjacent glow-discharge electrode, form glow-discharge electrode pair, form glow discharge electric field.
In the present embodiment, the width of described plasma outlet is 28 mm, is highly 1 mm, and each glow-discharge electrode is distributed on same straight line, and the distance between Equations of The Second Kind glow-discharge electrode 22 and two first kind glow- discharge electrode 20,21 is 14 mm; Two first kind glow-discharge electrode are all that diameter is the cylindrical stainless steel of 0.9 mm, and Equations of The Second Kind glow-discharge electrode is that thickness is the rectangle platinum plate electrode of 0.1 mm, and the width of platinum plate electrode is 1.5 mm.
In the present embodiment, described dielectric barrier discharge plate electrode 17,18 is the strip copper sheet of thick 1mm, wide 3mm, long 30mm, and the distance between described dielectric barrier discharge plate electrode and glow-discharge electrode is 3mm.
Fig. 3 is the operation principle schematic diagram that is provided with the plasma brush array generating means of 1 Equations of The Second Kind glow-discharge electrode described in the utility model, dielectric barrier discharge plate electrode 17,18 and dielectric barrier discharge power supply 40 form dielectric barrier discharge loop, for working gas is carried out to preionization; Described first kind glow- discharge electrode 20,21, Equations of The Second Kind glow-discharge electrode 22 is connected with current-limiting resistance 28 and is formed glow discharge loop with glow discharge power supply 30, current-limiting resistance 28 can limit the size of current between glow-discharge electrode and suppress the electric field fluctuation of cathode zone, prevents that the glow discharge between glow-discharge electrode is transformed into arc discharge.During this device work, working gas argon gas by first flow controller 34 with the flow of 8L/min constantly by working gas import 14 inflow gas electric discharge chambers 12, after working gas inflow gas electric discharge chamber 12, first flow through dielectric barrier discharge plate electrode 17 and 18 corresponding region of discharge generation preionization, working gas after preionization flows into the corresponding region of discharge of glow-discharge electrode, by Equations of The Second Kind glow-discharge electrode 22 mean allocation, arrived two of left and right electric field, by the working gas of preionization, again punctured, form plasma, plasma forms stable plasma brush jet 25 by plasma outlet ejection under the drive of working gas flow velocity.Formed plasma brush jet 25 is touched to the surface of processed object, and suitably contact and move around with it, can realize the whole surface of object is processed uniformly.
If entering the working gas of gas discharge chamber is the mist that plasma maintains gas and active gases, plasma maintains gas under first flow controller 34 is controlled and active gases is mixed to form working gas via tee pipe coupling 38 under second amount controller 32 is controlled, then via the working gas import 14 inflow gas electric discharge chambers of gas discharge chamber 12.
Embodiment 2-apparatus structure
The structure of the dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma brush array generating means of the present embodiment as shown in Figure 6.Apparatus structure in the present embodiment device and embodiment 1 is basic identical, and difference place is that the device of the present embodiment is provided with 3 Equations of The Second Kind glow-discharge electrode.First kind glow- discharge electrode 20,21 and Equations of The Second Kind glow- discharge electrode 22,23,24 are evenly distributed on narrow slit structural cavity body place, adjacent glow-discharge electrode is connected on the different outputs of glow discharge power supply, so that the electric field strength between every two adjacent glow-discharge electrode is equal, thereby produce the identical plasma of intensity.
The utility model provides dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma brush array generating means, can be according to a plurality of Equations of The Second Kind glow-discharge electrode of need to arranging of practical application to expand the size of plasma brush.For being of a size of the gas discharge chamber of a certain particular value, the number of set Equations of The Second Kind glow-discharge electrode is more, distance between high-voltage glow-discharge electrode and low pressure glow discharge electrode is nearlyer (but distance had better not be less than 2mm) between adjacent two glow-discharge electrode just, and the needed puncture voltage of working gas puncturing between each glow-discharge electrode will be lower.
Embodiment 3-contrast experiment
Below confirm by experiment that plasma of the present utility model brushes hair puncture voltage and energy consumption that generating apparatus can significantly reduce glow discharge part.Under normal pressure, adopt described in embodiment 1 device and carry out contrast experiment with original device (installing described in Chinese patent ZL201210006023.4).
Described in original device and embodiment 1, the difference of device is that device has increased by 1 Equations of The Second Kind glow-discharge electrode on the basis of original device described in embodiment 1, and an original glow discharge breakdown electric field is divided into two glow discharge breakdown electric fields.Two glow-discharge electrode of original device are positioned in the gas discharge chamber left and right end walls in dielectric barrier discharge plate electrode downstream, and the distance between two glow-discharge electrode is 28 mm.
Original device partly remains under identical voltage and electric current and works with the dielectric barrier discharge of device described in embodiment 1, working gas is argon gas, the flow of working gas is 8 L/min, Fig. 4 is that the dielectric barrier discharge plate electrode that is provided with the plasma brush array generating means of 1 Equations of The Second Kind glow-discharge electrode described in the utility model carries out immediate current and voltage (conduction current) oscillogram of preionization to working gas, as shown in Figure 4, now discharge voltage peak value is about 2.5 KV, outside in alive half period, only there is a pulse peak, current amplitude is about 10 mA, dielectric barrier discharge power P
dBD=17 mW.
Fig. 5 is that device and original device busy gas obtain in the situation of identical preionization effect described in embodiment 1, the electric current in the two glow discharge loop is with the variation relation correlation curve of voltage, as shown in Figure 5, the discharge voltage in the two glow discharge loop all first reduces rear increase along with the increase of electric current, and they are basically identical with the tendency of curent change; The puncture voltage of original device is 1.15 KV, and device puncture voltage described in the utility model is 0.8 KV, is only 2/3 of original device, and along with the increase of electric current, maintaining voltage is only 1/2 of original device.
From this embodiment, device described in the utility model increases Equations of The Second Kind glow-discharge electrode on the basis of original device, can effectively reduce the puncture voltage of the working gas of glow discharge part, reduces plasma discharge power; And device described in the utility model can produce the plasma that volume is larger under the condition of identical dielectric barrier discharge power supply and glow discharge power supply, the plasma producing in adjacent electric field can be merged into a complete plasma brush, thereby device described in the utility model has huge potential using value in the field of material surface cleaning, material character improvement, sterilization and the depollution of environment.
The utility model is not limited to above-described embodiment, can root practical application need the dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma brush array generating means of the various structures that Design and manufacture claim limits.
Claims (9)
1. a dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma is brushed array generating means, comprise the gas discharge chamber of being prepared by insulating material, a pair ofly be attached to dielectric barrier discharge plate electrode on the upper and lower two side of gas discharge chamber and two and be positioned at dielectric barrier discharge plate electrode downstream and be arranged on the first kind glow-discharge electrode in the end walls of gas discharge chamber left and right, described gas discharge chamber has working gas import and plasma outlet, the indoor part near plasma outlet of gas discharge chamber is narrow slit structure, plasma outlet is narrow slot, it is characterized in that: between described two first kind glow-discharge electrode in the end walls of gas discharge chamber left and right, the cavity place of narrow slit structure is provided with at least one Equations of The Second Kind glow-discharge electrode, between every two adjacent glow-discharge electrode, form glow-discharge electrode pair, form glow discharge electric field.
2. dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma is brushed array generating means according to claim 1, it is characterized in that the distance between adjacent two glow-discharge electrode is limited can guarantee the breakdown formation glow discharge of working gas between glow-discharge electrode.
3. dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma is brushed array generating means according to claim 2, it is characterized in that described glow-discharge electrode is evenly distributed in narrow slit structural cavity body place along the direction perpendicular to working gas flow direction.
4. dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma is brushed array generating means according to claim 3, and the discharge end that it is characterized in that described glow-discharge electrode is plane or needle-like.
5. dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma is brushed array generating means according to claim 4, it is characterized in that described Equations of The Second Kind glow-discharge electrode is to take the thin slice glow-discharge electrode that plane is discharge end, its thickness is between 0.001～10mm.
6. according to dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma brush array generating means described in arbitrary claim in claim 1 to 5, it is characterized in that being in series with current-limiting resistance on the glow discharge loop of glow-discharge electrode and power supply formation.
7. according to dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma brush array generating means described in arbitrary claim in claim 1 to 5, it is characterized in that distance between described dielectric barrier discharge plate electrode and glow-discharge electrode is between 0.01mm～10cm.
8. according to dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma brush array generating means described in arbitrary claim in claim 1 to 5, the shape that it is characterized in that described gas discharge chamber is tending towards flat gradually from working gas import to plasma Way out, or whole gas discharge chamber is narrow slit structural cavity body, the width of described plasma outlet is 5～200:1 with the ratio of height.
9. dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma is brushed array generating means according to claim 8, it is characterized in that described gas discharge chamber integral body is the narrow slit structural cavity body of cuboid, dielectric barrier discharge plate electrode is close to two lateral walls up and down of narrow slit structural cavity body, and parallel with the broadside of plasma outlet, narrow slit structural cavity body wall is as the dielectric of the electric discharge end face of described dielectric impedance plate electrode.
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| CN201320397627.6U CN203407057U (en) | 2013-07-05 | 2013-07-05 | Dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator |
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| CN201320397627.6U CN203407057U (en) | 2013-07-05 | 2013-07-05 | Dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103327722A (en) * | 2013-07-05 | 2013-09-25 | 四川大学 | Dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator |
| CN104994673A (en) * | 2015-06-29 | 2015-10-21 | 河北大学 | Device and method for generating uniform plasma brush under atmospheric pressure in air environment |
| CN106465526A (en) * | 2014-03-31 | 2017-02-22 | 康宁公司 | Methods and apparatus for material processing using plasma thermal source |
| CN108811292A (en) * | 2018-06-12 | 2018-11-13 | 厦门大学 | A kind of plasma synthesis jet stream combination of stimulation device |
| CN109951945A (en) * | 2019-03-14 | 2019-06-28 | 中国科学院合肥物质科学研究院 | A kind of platypelloid type large-area high-density DC arc discharge plasma source |
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2013
- 2013-07-05 CN CN201320397627.6U patent/CN203407057U/en not_active Expired - Lifetime
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103327722A (en) * | 2013-07-05 | 2013-09-25 | 四川大学 | Dielectric-barrier-enhancement-type multi-electrode glow discharge low-temperature plasma brush array generator |
| CN103327722B (en) * | 2013-07-05 | 2016-04-13 | 四川大学 | Dielectric impedance enhancement mode multi-electrode glow discharge low-temp plasma brush array generating means |
| CN106465526A (en) * | 2014-03-31 | 2017-02-22 | 康宁公司 | Methods and apparatus for material processing using plasma thermal source |
| CN104994673A (en) * | 2015-06-29 | 2015-10-21 | 河北大学 | Device and method for generating uniform plasma brush under atmospheric pressure in air environment |
| CN104994673B (en) * | 2015-06-29 | 2018-04-17 | 河北大学 | In a kind of generation air ambient under atmospheric pressure homogeneous plasma brush apparatus and method |
| CN108811292A (en) * | 2018-06-12 | 2018-11-13 | 厦门大学 | A kind of plasma synthesis jet stream combination of stimulation device |
| CN109951945A (en) * | 2019-03-14 | 2019-06-28 | 中国科学院合肥物质科学研究院 | A kind of platypelloid type large-area high-density DC arc discharge plasma source |
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