CN103220874A

CN103220874A - Plasma array based on dielectric barrier discharging

Info

Publication number: CN103220874A
Application number: CN2012104181327A
Authority: CN
Inventors: 王瑞雪; 朱卫东; 张珏; 方竞
Original assignee: Peking University
Current assignee: Peking University
Priority date: 2012-10-29
Filing date: 2012-10-29
Publication date: 2013-07-24

Abstract

The invention relates to a plasma array based on dielectric barrier discharging and aims at generating plasmas in different dimensionalities through a disassembling-and-assembling mode. The plasmas can be generated on a plane or three dimensions, for example, plasma rods and plasma brushes and the like are generated. The generated plasmas are stable and free of arc discharging, the temperature is close to the room temperature, the strength is adjustable, the plasmas are rich in active ingredients, a dual-electrode structure enables discharging to be safe, and the plasmas can be incited in a plurality of gaseous environments, such as air, helium and argon. The plasma array can control the plasmas to produce areas and dimensionalities and greatly increases application scopes of devices.

Description

A kind of plasma array based on dielectric barrier discharge

Technical field

The invention belongs to plasma producing apparatus, be specifically related to a kind of dielectric barrier discharge plasma array.

Background technology

Plasma is material the 4th attitude after solid-state, liquid, gaseous state, and when applied voltage reached the firing voltage of gas, gas molecule was breakdown, produces the mixture that comprises electronics, various ion, atom and free radical.Plasma can be divided into different classifications: by the thermodynamical equilibrium classification, plasma can be divided into heat balance plasma and nonthermal plasma; Press the system temperature classification, plasma is divided into low temperature plasma and high-temperature plasma; Press the plasma gas source classification, plasma can be divided into low pressure plasma and atmospheric pressure plasma.The temperature of all particles is all the same in the heat balance plasma, shows as high-temperature plasma on the macroscopic view.In nonthermal plasma, the temperature of electronics can be up to tens thousand of degree, and the temperature of ion and neutral particle is much smaller than electron temperature, and whole system presents low-temperature condition, so be also referred to as low temperature plasma.Low temperature plasma exists a large amount of, miscellaneous active particle, so nonthermal plasma can be used as the high activity reagent utilization in multiple practical applications.The seventies and eighties in 20th century rises, and plasma begins flourish in the application study to numerous areas such as metal, microelectronics, polymer, Biofunctional materials, low temperature sterilization and pollution controls, forms the research direction to multidisciplinary intersection.

The low temperature plasma generation technique mainly contains: direct current glow discharge, low-frequency ac discharge plasma, high-frequency discharge plasma, non-equilibrium atmosphere pressure discharging, dielectric barrier discharge.Based on these generation techniques, the device of existing generation low temperature plasma mainly contains four kinds, is respectively to exchange low temperature plasma generating means, radio frequency low temperature plasma generating means, microwave low temperature plasma generating means, DC pulse plasma generator.

But existing apparatus all exists some shortcomings, and is short as the plasma jet length that produces, temperature is high; Processing area is little; The device shape is restricted, is difficult to handle large tracts of land or material surface in irregular shape.These factors have all limited the extensive use of existing plasma device greatly.

Summary of the invention

The invention provides a kind of dielectric barrier discharge plasma array, purpose is to make up according to different demands and produces different area and difform low temperature plasma.Mode by dismounting, assembling can produce low temperature plasma on different dimensions.Plasma can produce on a face, also can produce on three-dimensional.Both can be the plasma rod, also can be the plasma hairbrush.The plasma stability that generates arc discharge can not occur, and temperature is near room temperature, and intensity is adjustable, is rich in active component, bipolar electrode structure discharge safety, can be in multiple gases environment such as air, helium, argon gas activated plasma.

Described dielectric barrier discharge plasma array comprises gas source, flow controller, working power, electrode, female medium tube, sub-medium tube.It is characterized in that: described female medium tube and sub-medium tube are hollow pipe, and female medium tube communicates with gas source; Described electrode is placed in outside the tube wall of female medium tube, is connected with the both positive and negative polarity of power supply respectively; Have aperture on described female medium tube, empty diameter is identical with the external diameter of sub-medium tube, can insert sub-medium tube in the aperture.Aperture all can be regulated by position and what of aperture on female medium tube as required.

Described dielectric barrier discharge plasma array, power supply can be alternating current, pulse dc power or radio-frequency power supply.

Described dielectric barrier discharge plasma array adopts the bipolar electrode structure, makes discharge safer, between two electrodes certain distance is arranged, and can avoid taking place arc discharge.

Described dielectric barrier discharge plasma array working gas can be elementary gass such as helium, argon gas, nitrogen, oxygen or the mist that is mixed with other gases, also can be air, gaseous compound or gaseous organic substance etc.

Described dielectric barrier discharge plasma array, can change little hole number and position on female medium tube according to demand, the sub-medium tube of alternative insertion, can produce linear plasma rod or three-dimensional plasma hairbrush, the kind of the active material composition that wherein contains and quantity also can be selected according to concrete application.Therefore can be very easily at normal temperatures and pressures to article or various special-shaped article carry out processing such as etching, plated film, surface modification and sterilizing, widened the range of application of plasma, improved its effect.

Description of drawings

Fig. 1 is the first embodiment of the invention structural representation;

Fig. 2 is Fig. 1 medium pipe vertical view;

Fig. 3 is the second embodiment of the invention structural representation;

Fig. 4 is Fig. 3 medium pipe vertical view;

Fig. 5 is the third embodiment of the invention structural representation;

Fig. 6 is Fig. 4 medium pipe vertical view;

Fig. 7 is the four embodiment of the invention structural representation;

Fig. 8 is Fig. 7 medium pipe vertical view;

Embodiment

Below the present invention is described in detail with reference to the accompanying drawings.

As shown in Figure 1, first embodiment of the present invention comprises gas source 1, gas flow controller 2, working gas 3, female medium tube 4, high-field electrode 5, grounding electrode 6, aperture 7, working power 8, plasma flame 9, female medium tube 4 is the single hole hollow pipe, the radial section in hole is circular, high-field electrode 5 all is placed on female medium tube tube wall with grounding electrode 6, and the both positive and negative polarity with working power 8 is connected respectively.Female medium tube 4 is communicated with gas source 1, by the flow of gas flow-control working gas 3.Three apertures 7 are embarked on journey and are evenly arranged between high-field electrode 5 and grounding electrode 6, and the plasma flame 9 of generation is ejected in the air by aperture 7.

Working gas 3 can be elementary gass such as helium, fluorine gas, nitrogen, oxygen or the mist that is mixed with other gases, also can be air, gaseous compound or gaseous organic substance etc.

High-field electrode 5 and grounding electrode 6 be conductive materials such as Copper Foil, aluminium foil.

Female medium tube 4 is insulating properties materials such as Teflon, polytetrafluoroethylene, and its size and length can be regulated as required.

The position of aperture 7 and diameter can change as required within the specific limits.

Figure 2 shows that the vertical view of female medium tube, three apertures are equidistantly arranged on female medium tube.

With the simple substance helium is example, and adjustments of gas flow controller 2 feeds working gas 3 with 2 liters/minute flows in female medium tube 4, and arrow is depicted as its flow direction among the figure.High-field electrode 5 is connected with the both positive and negative polarity of power supply 8 respectively with grounding electrode 6, and selecting AC power is the device driving power.Regulate power supply and apply width of cloth voltage to 15 kilovolt, frequency 28 KHz.Produce plasma jet 9 by dielectric barrier discharge, plasma jet 9 is the longest to reach 30 millimeters, and temperature is near room temperature, and the hand of human body can directly contact.

Input gas flow can be the 0.1-100 liter/minute, apply 5 kilovolts-30 kilovolts of alternating voltage amplitudes, frequency 10 KHz-20 megahertz.

Fig. 3 is the second embodiment of the invention structural representation: be to be inserted with on the aperture 7 sub-medium tube 10 with first embodiment difference of Fig. 1, sub-medium tube 10 is an absolute construction, and other mark is same as shown in Figure 1.

Fig. 4 is Fig. 3 medium pipe vertical view, and three apertures 7 are occupied by three sub-medium tube 10 on female medium tube 4.

Figure 5 shows that the third embodiment of the invention structural representation: and first embodiment difference of Fig. 1 is that respectively there are three apertures 7 on the right side of high-field electrode 5 and grounding electrode 6, is inserted with sub-medium tube 10 on the aperture 7.Other mark is same as shown in Figure 1.

Fig. 6 is Fig. 5 medium pipe vertical view, and high-field electrode 5 respectively has three apertures 7 with the right side of grounding electrode 6 on female medium tube 4, the arrangement of on female medium tube 4, embarking on journey, and aperture 7 quilt medium tube 10 occupy.

Figure 7 shows that the four embodiment of the invention structural representation: be that with first embodiment difference of Fig. 1 respectively there are four apertures 7 on high-field electrode 5 and grounding electrode 6 right sides, aperture 7 is positioned on the same concentric circles, is inserted with sub-medium tube 10 on the aperture 7.Other mark is same as shown in Figure 1.

Fig. 8 is Fig. 7 medium pipe vertical view, and high-field electrode 5 respectively has 7, four apertures 7 of four apertures to be positioned on the same concentric circles with the right side of earthed voltage 6 on female medium tube 4 tube walls.

Claims

1. a dielectric barrier discharge plasma array comprises gas source, flow controller, working power, electrode, female medium tube, sub-medium tube.It is characterized in that: described female medium tube and sub-medium tube are hollow pipe, and female medium tube communicates with gas source; Described electrode is placed in outside the tube wall of female medium tube, is connected with the both positive and negative polarity of power supply respectively; Have aperture on described female medium tube, empty diameter is identical with the external diameter of sub-medium tube, can insert sub-medium tube in the aperture.Aperture all can be regulated by position and what of aperture on female medium tube as required.

2. dielectric barrier discharge plasma array as claimed in claim 1 is characterized in that: have circular aperture on female medium tube, the quantity of aperture and position can be regulated as required.

3. dielectric barrier discharge plasma array as claimed in claim 1 is characterized in that: the sub-medium tube of alternative insertion in the aperture, the position of the sub-medium tube of insertion and quantity can be regulated as required.

4. dielectric barrier discharge plasma array as claimed in claim 1 is characterized in that: described power supply is AC power, pulse dc power or radio-frequency power supply.