CN102395914A - 激光射线成型装置及具有该类装置的激光装置 - Google Patents
激光射线成型装置及具有该类装置的激光装置 Download PDFInfo
- Publication number
- CN102395914A CN102395914A CN2010800162877A CN201080016287A CN102395914A CN 102395914 A CN102395914 A CN 102395914A CN 2010800162877 A CN2010800162877 A CN 2010800162877A CN 201080016287 A CN201080016287 A CN 201080016287A CN 102395914 A CN102395914 A CN 102395914A
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- China
- Prior art keywords
- ray
- sub
- lens
- unit
- homogenising
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0905—Dividing and/or superposing multiple light beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
- G02B27/0961—Lens arrays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
- G02B27/0966—Cylindrical lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1305—Feedback control systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/005—Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/06821—Stabilising other output parameters than intensity or frequency, e.g. phase, polarisation or far-fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/0683—Stabilisation of laser output parameters by monitoring the optical output parameters
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Laser Beam Processing (AREA)
- Microscoopes, Condenser (AREA)
- Lasers (AREA)
Abstract
Description
Claims (13)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102009021251A DE102009021251A1 (de) | 2009-05-14 | 2009-05-14 | Vorrichtung zur Formung von Laserstrahlung sowie Laservorrichtung mit einer derartigen Vorrichtung |
DE102009021251.5 | 2009-05-14 | ||
PCT/EP2010/002896 WO2010130415A1 (de) | 2009-05-14 | 2010-05-12 | Vorrichtung zur formung von laserstrahlung sowie laservorrichtung mit einer derartigen vorrichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102395914A true CN102395914A (zh) | 2012-03-28 |
CN102395914B CN102395914B (zh) | 2014-06-11 |
Family
ID=42342483
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201080016287.7A Active CN102395914B (zh) | 2009-05-14 | 2010-05-12 | 激光射线成型装置及具有该类装置的激光装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8749888B2 (zh) |
EP (1) | EP2430491B1 (zh) |
JP (1) | JP5571170B2 (zh) |
CN (1) | CN102395914B (zh) |
DE (1) | DE102009021251A1 (zh) |
RU (1) | RU2539680C2 (zh) |
WO (1) | WO2010130415A1 (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014075362A1 (zh) * | 2012-11-13 | 2014-05-22 | 深圳市华星光电技术有限公司 | 聚光装置及修补机 |
CN104396101A (zh) * | 2012-06-26 | 2015-03-04 | 皇家飞利浦有限公司 | 均质线形强度轮廓的激光器模块 |
CN105143962A (zh) * | 2013-03-13 | 2015-12-09 | Limo专利管理有限及两合公司 | 用于均匀化激光辐射的设备 |
CN105189017A (zh) * | 2013-04-05 | 2015-12-23 | Limo专利管理有限及两合公司 | 用于产生具有线状强度分布的激光射线的设备 |
CN111433638A (zh) * | 2017-09-28 | 2020-07-17 | 弗劳恩霍夫应用研究促进协会 | 具有漫射器效应的光学聚光器 |
CN115268094A (zh) * | 2020-08-27 | 2022-11-01 | 西安炬光科技股份有限公司 | 一种光学模组及激光模组 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012205790B4 (de) * | 2012-04-10 | 2015-02-05 | Carl Zeiss Smt Gmbh | Vorrichtung zur Homogenisierung von Laserstrahlung sowie Verfahren zu ihrer Herstellung |
JP2015531895A (ja) * | 2012-09-24 | 2015-11-05 | リモ パテントフェルヴァルトゥング ゲーエムベーハー ウント コー.カーゲーLIMO Patentverwaltung GmbH & Co.KG | 作業面におけるレーザビームの線形強度分布を発生させるための装置 |
FR3012264B1 (fr) | 2013-10-21 | 2017-04-21 | Saint Gobain | Appareil laser modulaire |
DE102013018496B4 (de) | 2013-11-04 | 2016-04-28 | Bruker Daltonik Gmbh | Massenspektrometer mit Laserspotmuster für MALDI |
EP4331768A3 (en) | 2016-07-27 | 2024-04-24 | TRUMPF Laser GmbH | Laser line illumination |
CN111133639B (zh) * | 2017-07-31 | 2023-06-27 | Ipg光子公司 | 光纤激光装置和用于加工工件的方法 |
US11600491B2 (en) * | 2017-07-31 | 2023-03-07 | Ipg Photonics Corporation | Laser apparatus and method of processing thin films |
DE102022108300A1 (de) * | 2022-04-06 | 2023-10-12 | Trumpf Laser- Und Systemtechnik Gmbh | Vorrichtung zum Erzeugen einer definierten Laserlinie auf einer Arbeitsebene |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1574892A2 (en) * | 2004-03-10 | 2005-09-14 | Sumitomo Electric Industries, Ltd. | Superposing diffraction optical element homogenizer optical system |
US20070063226A1 (en) * | 2004-10-29 | 2007-03-22 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus and laser irradiation method |
CN101095067A (zh) * | 2005-01-04 | 2007-12-26 | 翰兹-利索兹切科专利管理有限公司及两合公司 | 分束器设备 |
CN101263422A (zh) * | 2005-09-14 | 2008-09-10 | 松下电器产业株式会社 | 激光图像形成装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5359588A (en) | 1992-02-12 | 1994-10-25 | Mitsubishi Denki Kabushiki Kaisha | Optical recording/reproducing apparatus |
DE19632460C1 (de) | 1996-08-12 | 1997-10-30 | Microlas Lasersystem Gmbh | Optische Vorrichtung zum Homogenisieren von Laserstrahlung und Erzeugen von mehreren Beleuchtungsfeldern |
JP2002176007A (ja) | 2000-12-08 | 2002-06-21 | Mitsubishi Electric Corp | レーザ処理装置のレーザパワーの測定方法と測定装置 |
RU2208822C1 (ru) * | 2001-11-02 | 2003-07-20 | Государственное Унитарное Дочернее Предприятие Государственного Предприятия "Нпо Астрофизика" Особое Конструкторское Бюро "Солнечная И Точная Оптика" | Устройство для создания равномерной освещенности прямоугольной площадки заданных размеров (гомогенизатор) |
JP3987350B2 (ja) * | 2001-11-16 | 2007-10-10 | 株式会社リコー | レーザ照明光学系及びそれを用いた露光装置、レーザ加工装置、投射装置 |
ATE516126T1 (de) | 2002-03-12 | 2011-07-15 | Mitsuboshi Diamond Ind Co Ltd | Verfahren und system zur maschinellen bearbeitung von brüchigem material |
JP2004093837A (ja) | 2002-08-30 | 2004-03-25 | Sumitomo Heavy Ind Ltd | 均一化レーザビーム照射装置 |
US7339737B2 (en) * | 2004-04-23 | 2008-03-04 | Microvision, Inc. | Beam multiplier that can be used as an exit-pupil expander and related system and method |
JP2008524662A (ja) * | 2004-12-22 | 2008-07-10 | カール・ツアイス・レーザー・オプティクス・ゲーエムベーハー | 線ビームを生成するための光学照射系 |
JP5022587B2 (ja) | 2005-10-07 | 2012-09-12 | 富士フイルム株式会社 | 半導体レーザの駆動方法および装置、並びに補正パターンの導出方法および装置 |
TW200741883A (en) * | 2006-04-21 | 2007-11-01 | Zeiss Carl Laser Optics Gmbh | Apparatus for laser annealing of large substrates and method for laser annealing for large substrates |
KR20090029748A (ko) | 2006-07-13 | 2009-03-23 | 리모 파텐트페어발퉁 게엠베하 운트 코. 카게 | 광 균일화 장치 및 가공 면에 선형 강도 분포를 발생시키기위한 레이저 장치 |
WO2008087012A1 (de) | 2007-01-15 | 2008-07-24 | Limo Patentverwaltung Gmbh & Co. Kg | Vorrichtung zur homogenisierung von licht sowie vorrichtung zur erzeugung einer linienförmigen intensitätsverteilung in einer arbeitsebene |
CN101641027A (zh) | 2007-02-16 | 2010-02-03 | 热溶体股份有限公司 | 感应加热的衣物 |
-
2009
- 2009-05-14 DE DE102009021251A patent/DE102009021251A1/de not_active Withdrawn
-
2010
- 2010-05-12 US US13/320,337 patent/US8749888B2/en active Active
- 2010-05-12 RU RU2011150822/28A patent/RU2539680C2/ru not_active IP Right Cessation
- 2010-05-12 WO PCT/EP2010/002896 patent/WO2010130415A1/de active Application Filing
- 2010-05-12 JP JP2012510156A patent/JP5571170B2/ja active Active
- 2010-05-12 CN CN201080016287.7A patent/CN102395914B/zh active Active
- 2010-05-12 EP EP10721689.7A patent/EP2430491B1/de active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1574892A2 (en) * | 2004-03-10 | 2005-09-14 | Sumitomo Electric Industries, Ltd. | Superposing diffraction optical element homogenizer optical system |
US20070063226A1 (en) * | 2004-10-29 | 2007-03-22 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus and laser irradiation method |
CN101095067A (zh) * | 2005-01-04 | 2007-12-26 | 翰兹-利索兹切科专利管理有限公司及两合公司 | 分束器设备 |
CN101263422A (zh) * | 2005-09-14 | 2008-09-10 | 松下电器产业株式会社 | 激光图像形成装置 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104396101A (zh) * | 2012-06-26 | 2015-03-04 | 皇家飞利浦有限公司 | 均质线形强度轮廓的激光器模块 |
CN104396101B (zh) * | 2012-06-26 | 2017-07-11 | 皇家飞利浦有限公司 | 均质线形强度轮廓的激光器模块 |
WO2014075362A1 (zh) * | 2012-11-13 | 2014-05-22 | 深圳市华星光电技术有限公司 | 聚光装置及修补机 |
CN105143962A (zh) * | 2013-03-13 | 2015-12-09 | Limo专利管理有限及两合公司 | 用于均匀化激光辐射的设备 |
CN105189017A (zh) * | 2013-04-05 | 2015-12-23 | Limo专利管理有限及两合公司 | 用于产生具有线状强度分布的激光射线的设备 |
US9547176B2 (en) | 2013-04-05 | 2017-01-17 | Limo Patentverwaltung Gmbh & Co. Kg | Device for generating laser radiation having a linear intensity distribution |
CN105189017B (zh) * | 2013-04-05 | 2018-03-16 | Limo专利管理有限及两合公司 | 用于产生具有线状强度分布的激光射束的设备 |
CN111433638A (zh) * | 2017-09-28 | 2020-07-17 | 弗劳恩霍夫应用研究促进协会 | 具有漫射器效应的光学聚光器 |
CN111433638B (zh) * | 2017-09-28 | 2022-08-09 | 弗劳恩霍夫应用研究促进协会 | 光束形成器 |
CN115268094A (zh) * | 2020-08-27 | 2022-11-01 | 西安炬光科技股份有限公司 | 一种光学模组及激光模组 |
CN115268094B (zh) * | 2020-08-27 | 2023-06-02 | 西安炬光科技股份有限公司 | 一种光学模组及激光模组 |
Also Published As
Publication number | Publication date |
---|---|
DE102009021251A1 (de) | 2010-11-18 |
EP2430491A1 (de) | 2012-03-21 |
US20120127723A1 (en) | 2012-05-24 |
US8749888B2 (en) | 2014-06-10 |
CN102395914B (zh) | 2014-06-11 |
WO2010130415A1 (de) | 2010-11-18 |
EP2430491B1 (de) | 2015-12-16 |
JP5571170B2 (ja) | 2014-08-13 |
JP2012527002A (ja) | 2012-11-01 |
RU2539680C2 (ru) | 2015-01-20 |
RU2011150822A (ru) | 2013-06-20 |
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Address after: Dortmund, Germany Applicant after: LIMO PATENTVERWALTUNG GmbH & Co.KG Address before: German Guy Sten Green Applicant before: LIMO PATENTVERWALTUNG GmbH & Co.KG |
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Address after: Borussia Dortmund Patentee after: LIMO LLC Address before: Borussia Dortmund Patentee before: LIMO Holdings Ltd. |
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Effective date of registration: 20180319 Address after: Borussia Dortmund Patentee after: LIMO Holdings Ltd. Address before: Borussia Dortmund Patentee before: LIMO PATENTVERWALTUNG GmbH & Co.KG |