CN102276156A - Method for manufacturing toughening low-emission (LOW-E) coated glass - Google Patents

Method for manufacturing toughening low-emission (LOW-E) coated glass Download PDF

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Publication number
CN102276156A
CN102276156A CN2011101501244A CN201110150124A CN102276156A CN 102276156 A CN102276156 A CN 102276156A CN 2011101501244 A CN2011101501244 A CN 2011101501244A CN 201110150124 A CN201110150124 A CN 201110150124A CN 102276156 A CN102276156 A CN 102276156A
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China
Prior art keywords
target
low
coated glass
glass
manufacture method
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Pending
Application number
CN2011101501244A
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Chinese (zh)
Inventor
阮洪良
阮泽云
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SHANGHAI FLAT GLASS CO Ltd
FULAITE PV GLASS GROUP Co Ltd
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SHANGHAI FLAT GLASS CO Ltd
FULAITE PV GLASS GROUP Co Ltd
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Application filed by SHANGHAI FLAT GLASS CO Ltd, FULAITE PV GLASS GROUP Co Ltd filed Critical SHANGHAI FLAT GLASS CO Ltd
Priority to CN2011101501244A priority Critical patent/CN102276156A/en
Publication of CN102276156A publication Critical patent/CN102276156A/en
Pending legal-status Critical Current

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Abstract

The invention relates to a method for manufacturing LOW-E coated glass, in particular to a method for manufacturing a toughening LOW-E coated glass. The coating of a substrate is performed by an off-line vacuum sputtering process. The method is characterized: non-metal combustible high carbon is used in a coating target material; and the high-carbon target is used in the last working procedure in a vacuum working chamber. The method mainly solves the technical problem that the strength and safety of the conventional LOW-E glass produced by the offline vacuum sputtering process cannot be improved by performing direct toughening treatment due to low coating strength; and when the method is used, the LOW-E glass can be subjected direct toughening operation.

Description

But the manufacture method of tempering LOW-E coated glass
Technical field
The present invention relates to the manufacture method of LOW-E glass, but particularly a kind of manufacture method of tempering LOW-E coated glass.
Background technology
LOW-E glass claims low emissivity glass again, is that to plate the film that multiple layer metal or other compounds form at glass surface be product.Its coatings has and sees through and the characteristic of the high reflection of centering far infrared rays visible light is high, and it is compared with simple glass and traditional coated glass for building, has an excellent effect of heat insulation and good light transmittance.
The plated film production method of present LOW-E glass mainly contains two kinds of online high temperature pyrolysis sedimentation and off-line vacuum sputterings.Wherein use the most general with the off-line vacuum sputtering again.
Different with the high temperature pyrolysis sedimentation, sputtering method is an off-line.And the difference according to the glass transmission location has level and vertical branch.Need one deck fine silver film as functional membrane in the off-line vacuum sputtering.The fine silver film is between two layers of metal oxide film.Metal oxide film provides protection to the fine silver film, and increases the purity and the luminous transparency of color as the middle layer between the rete.
Such as: in the rectilinear production technique, glass substrate is vertical to be placed on the top of the shelf, sends into 10 -1In the vacuum environment of the handkerchief order of magnitude, feed an amount of process gas (rare gas element Ar or reactant gases O 2, N 2), and keep vacustat.Target Ag, Si etc. are embedded negative electrode, thereby and inserting magnetic field formation magnetic controlling target with the vertical horizontal direction of negative electrode.With the magnetic controlling target is negative electrode, adds direct current or AC power, and under high-tension effect, process gas generation ionization forms plasma body.Wherein, electronics carries out the high-speed screw motion under the acting in conjunction in electric field and magnetic field, and the collision gas molecule produces more positive ion and electronics; Positive ion clashes into cathode targets after reaching certain energy under effect of electric field, the target that is sputtered is deposited on and forms film on the glass substrate.In order to form the rete of uniformity, the negative electrode target moves around near glass surface.In order to obtain multilayer film, must use a plurality of negative electrodes, each negative electrode all is to move around at glass surface, forms certain thickness.
Horizontal method is similar with normal beam technique to a great extent.The key distinction is in the placement of glass, and glass is by horizontal wheel transmission, and by negative electrode, glass is decided after the valve by a series of pins, and vacuum tightness also changes thereupon.When glass arrived main sputtering chamber, plated film pressure reached, and metal cathode target is fixed, and glass moves.By in the cathodic process, rete forms at glass.
But, above-mentioned existing off-line vacuum sputtering and products thereof but has following defective: because film strength is relatively poor, making LOW-E glass can not implement direct tempering handles and improves glass intensity and safety performance, and, the plated film heat-proof quality of LOW-E glass is good, therefore is difficult in steel process thermal radiation in glass.Therefore, generally all can only make double glazing uses.
Summary of the invention
But the object of the present invention is to provide a kind of manufacture method of tempering LOW-E coated glass, mainly solve the LOW-E glassy product that existing off-line vacuum sputtering is produced, because film strength is relatively poor, make LOW-E glass can not implement direct tempering and handle the technical problem that improves glass intensity and safety performance, the LOW-E coated glass can be carried out direct tempering operation by the inventive method.
For achieving the above object, the present invention realizes like this.
But a kind of manufacture method of tempering LOW-E coated glass, its substrate coating adopts off-line vacuum sputtering, it is characterized in that: use nonmetal flammable high-content charcoal in the plated film target, and high-content charcoal target is made as finishing operation in that vacuum work is indoor.
But the manufacture method of described tempering LOW-E coated glass is characterized in that: the carbon content of described nonmetal flammable high-content charcoal 〉=99%, the thickness of described nonmetal flammable high-content carbon membrane are 20-35um.
But the manufacture method of described tempering LOW-E coated glass is characterized in that: glass substrate is put on the top of the shelf in the described off-line vacuum sputtering, and sends into 10 -1In the vacuum environment of the handkerchief order of magnitude, feed an amount of process gas as rare gas element Ar or reactant gases O 2, N 2, and keep vacustat; Target is embedded negative electrode successively, and wherein nonmetal flammable high-content charcoal embeds at last, thereby and constitute magnetic controlling target inserting magnetic field with the vertical horizontal direction of negative electrode; With the magnetic controlling target is negative electrode, adds direct current or AC power, under high-tension effect, and process gas generation ionization, form plasma body, wherein, electronics is under the acting in conjunction in electric field and magnetic field, carry out the high-speed screw motion, the collision gas molecule produces more positive ion and electronics; Positive ion clashes into cathode targets after reaching certain energy under effect of electric field, the target that is sputtered is deposited on and forms film on the glass substrate.
But the manufacture method of described tempering LOW-E coated glass is characterized in that: in order to form the rete of uniformity, the negative electrode target moves around near glass substrate surface.
But the manufacture method of described tempering LOW-E coated glass is characterized in that: comprise the film system that silver, copper or tin metal or its compound are formed in the described target.
The major advantage of system of the present invention is.
1, added nonmetal flammable high-content charcoal in the inventive method in the coating process, therefore, the LOW-E coated glass can directly enter the tempering operation.Enter fully burning of high-content charcoal [C] in 600-750 ℃ behind the annealing furnace, the electric heating in the annealing furnace is fully absorbed the glass space of a whole page of transmission by the high heat absorption capacity of charcoal [C].
2, the LOW-E coated glass of the inventive method production, its coatings has the high characteristic that reaches the high reflection of centering far infrared rays that sees through of visible light, it is compared with simple glass and traditional coated glass for building, have an excellent effect of heat insulation and good light transmittance.
Embodiment
But the invention discloses a kind of manufacture method of tempering LOW-E coated glass, its substrate coating adopts the off-line vacuum sputtering.Use nonmetal flammable high-content charcoal in the plated film target, and high-content charcoal target is made as finishing operation in that vacuum work is indoor.
Carbon content 〉=the 99%(of described nonmetal flammable high-content charcoal is as pure charcoal [C], graphite-like etc.), the thickness of described nonmetal flammable high-content carbon membrane is 20-35um.
The concrete steps of the off-line vacuum sputtering among the present invention are: glass substrate is put on the top of the shelf, and sends into 10 -1In the vacuum environment of the handkerchief order of magnitude, feed an amount of process gas as rare gas element Ar or reactant gases O 2, N 2, and keep vacustat; Target (can comprise the film system that silver, copper or tin metal or its compound are formed in the target) is embedded negative electrode successively, and wherein nonmetal flammable high-content charcoal embeds at last, thereby and constitute magnetic controlling target inserting magnetic field with the vertical horizontal direction of negative electrode; With the magnetic controlling target is negative electrode, adds direct current or AC power, under high-tension effect, and process gas generation ionization, form plasma body, wherein, electronics is under the acting in conjunction in electric field and magnetic field, carry out the high-speed screw motion, the collision gas molecule produces more positive ion and electronics; Positive ion clashes into cathode targets after reaching certain energy under effect of electric field, the target that is sputtered is deposited on and forms film on the glass substrate.
In the aforesaid method, in order to form the rete of uniformity, the negative electrode target moves around near glass substrate surface.
The LOW-E coated glass that makes by the inventive method can directly enter the tempering operation.Enter fully burning of high-content charcoal [C] in 600-750 ℃ behind the annealing furnace, the electric heating in the annealing furnace is fully absorbed the glass space of a whole page of transmission by the high heat absorption capacity of charcoal [C].Glass must clean after handling through tempering, removes dustiness.
In sum, be preferred embodiment of the present invention only, be not to be used for limiting practical range of the present invention, promptly all equivalences of doing according to the content of the present patent application claim change and modify, and all should be technology category of the present invention.

Claims (5)

1. but the manufacture method of a tempering LOW-E coated glass, its substrate coating adopts off-line vacuum sputtering, it is characterized in that: use nonmetal flammable high-content charcoal in the plated film target, and high-content charcoal target is made as finishing operation in that vacuum work is indoor.
2. but the manufacture method of tempering LOW-E coated glass according to claim 1 is characterized in that: the carbon content of described nonmetal flammable high-content charcoal 〉=99%, the thickness of described nonmetal flammable high-content carbon membrane are 20-35um.
3. but the manufacture method of tempering LOW-E coated glass according to claim 1 and 2 is characterized in that: glass substrate is put on the top of the shelf in the described off-line vacuum sputtering, and sends into 10 -1In the vacuum environment of the handkerchief order of magnitude, feed an amount of process gas as rare gas element Ar or reactant gases O 2, N 2, and keep vacustat; Target is embedded negative electrode successively, and wherein nonmetal flammable high-content charcoal embeds at last, thereby and constitute magnetic controlling target inserting magnetic field with the vertical horizontal direction of negative electrode; With the magnetic controlling target is negative electrode, adds direct current or AC power, under high-tension effect, and process gas generation ionization, form plasma body, wherein, electronics is under the acting in conjunction in electric field and magnetic field, carry out the high-speed screw motion, the collision gas molecule produces more positive ion and electronics; Positive ion clashes into cathode targets after reaching certain energy under effect of electric field, the target that is sputtered is deposited on and forms film on the glass substrate.
4. but the manufacture method of tempering LOW-E coated glass according to claim 3 is characterized in that: in order to form the rete of uniformity, the negative electrode target moves around near glass substrate surface.
5. but the manufacture method of tempering LOW-E coated glass according to claim 3 is characterized in that: comprise the film system that silver, copper or tin metal or its compound are formed in the described target.
CN2011101501244A 2011-06-07 2011-06-07 Method for manufacturing toughening low-emission (LOW-E) coated glass Pending CN102276156A (en)

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CN2011101501244A CN102276156A (en) 2011-06-07 2011-06-07 Method for manufacturing toughening low-emission (LOW-E) coated glass

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Application Number Priority Date Filing Date Title
CN2011101501244A CN102276156A (en) 2011-06-07 2011-06-07 Method for manufacturing toughening low-emission (LOW-E) coated glass

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107555806A (en) * 2017-09-12 2018-01-09 成都新柯力化工科技有限公司 A kind of heat-insulated Low E glass of individual layer durability building heat preservation and preparation method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030155065A1 (en) * 2002-02-13 2003-08-21 Thomsen Scott V. Method of making window unit
CN101602273A (en) * 2009-07-22 2009-12-16 天津南玻节能玻璃有限公司 A kind of diamond-like carbon film-coating glass and preparation method thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030155065A1 (en) * 2002-02-13 2003-08-21 Thomsen Scott V. Method of making window unit
CN101602273A (en) * 2009-07-22 2009-12-16 天津南玻节能玻璃有限公司 A kind of diamond-like carbon film-coating glass and preparation method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107555806A (en) * 2017-09-12 2018-01-09 成都新柯力化工科技有限公司 A kind of heat-insulated Low E glass of individual layer durability building heat preservation and preparation method

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Application publication date: 20111214