CN102276157A - Niobium, LOW-E glass and preparation method thereof - Google Patents
Niobium, LOW-E glass and preparation method thereof Download PDFInfo
- Publication number
- CN102276157A CN102276157A CN201110150123XA CN201110150123A CN102276157A CN 102276157 A CN102276157 A CN 102276157A CN 201110150123X A CN201110150123X A CN 201110150123XA CN 201110150123 A CN201110150123 A CN 201110150123A CN 102276157 A CN102276157 A CN 102276157A
- Authority
- CN
- China
- Prior art keywords
- glass
- niobium
- low
- target
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention relates to low-radiation glass (LOW-E glass), in particular to niobium, LOW-E glass and a preparation method thereof. In the method, super clear float glass is used as a substrate; niobium, zinc oxide, nanometer inorganic silicon and carbon are used as target materials and sputtered on the substrate by adopting an offline vacuum sputtering method to form a coating layer, wherein the thickness of the coating layer is from 10 to 25 mu m. The coating layer has high transmission efficiency above 93% for visible light in sunshine and low reflectance; good daylight property of buildings is ensured; light pollution is avoided; and a soft and comfortable light environment is built.
Description
Technical field
The present invention relates to low emissivity glass (being LOW-E glass), particularly a kind of niobium, LOW-E glass and manufacture method thereof.
Background technology
Along with expanding economy, the usage quantity of glass in building trade constantly increases.Modern age is architectural except considering aesthstic and external appearance characteristic, and what more pay attention to now is how to control heat, indoor refrigeration cost and the comfortable whole machine balancing problem of inner sunlight projection.At present, the energy starved problem more and more highlights, and how to reduce building energy consumption and also become people's question of common concern, and the thermal radiation energy loss of existing outer windowpane is more than 50% of buildings total energy consumption that this is very unfortunate.
For this reason, LOW-E glass just arises at the historic moment.This product is that to plate the film that multiple layer metal or other compound form at glass surface be product.Its coatings has and sees through and the characteristic of the high reflection of centering far infrared rays visible light is high, and it is compared with simple glass and traditional coated glass for building, has an excellent effect of heat insulation and good light transmittance.
Present LOW-E glass production method has two kinds of online high temperature pyrolysis sedimentation and off-line vacuum sputterings.Wherein use the most general with the off-line vacuum sputtering again.
Different with the high temperature pyrolysis sedimentation, sputtering method is an off-line.And the difference according to the glass transmission location has level and vertical branch.Existing sputtering method explained hereafter LOW-E glass needs one deck fine silver film as functional membrane.The fine silver film is between two layers of metal oxide film.Metal oxide film provides protection to the fine silver film, and increases the purity and the luminous transparency of color as the middle layer between the rete.
In the rectilinear production technique, glass is vertical to be placed on the top of the shelf, sends into 10
-1In the vacuum environment of the handkerchief order of magnitude, feed an amount of process gas (rare gas element Ar or reactant gases O
2, N
2), and keep vacustat.Target Ag, Si etc. are embedded negative electrode, thereby and inserting magnetic field formation magnetic controlling target with the vertical horizontal direction of negative electrode.With the magnetic controlling target is negative electrode, adds direct current or AC power, and under high-tension effect, process gas generation ionization forms plasma body.Wherein, electronics carries out the high-speed screw motion under the acting in conjunction in electric field and magnetic field, and the collision gas molecule produces more positive ion and electronics; Positive ion clashes into cathode targets after reaching certain energy under effect of electric field, the target that is sputtered is deposited on and forms film on the glass substrate.In order to form the rete of uniformity, the negative electrode target moves around near glass surface.In order to obtain multilayer film, must use a plurality of negative electrodes, each negative electrode all is to move around at glass surface, forms certain thickness.
Horizontal method is similar with normal beam technique to a great extent.The key distinction is in the placement of glass, and glass is by horizontal wheel transmission, and by negative electrode, glass is decided after the valve by a series of pins, and vacuum tightness also changes thereupon.When glass arrived main sputtering chamber, plated film pressure reached, and metal cathode target is fixed, and glass moves.By in the cathodic process, rete forms at glass.
But the fine silver film of above-mentioned available technology adopting will improve the cost of product greatly, and coated glass can not directly carry out tempering operation, and in the tempering process, coatings is usually destroyed easily, causes the product function disappearance.
Summary of the invention
The object of the present invention is to provide a kind of niobium, LOW-E glass and manufacture method thereof, it mainly solves existing off-line vacuum sputtering and produces the existing defective of LOW-E glass, it can have high efficiency of transmission can reach more than 93% to visible light in the sunlight, reflectivity is then very low, guaranteed the daylighting that buildings is good, avoid light pollution again, built soft, comfortable luminous environment.
The present invention solves the problems of the technologies described above the technical scheme that is adopted.
A kind of niobium, LOW-E glass is characterized in that: it uses the float glass process ultra-clear glasses as substrate, and adopts the off-line vacuum sputtering that niobium, zinc oxide, nano grade inorganic silicon and charcoal are formed coatings as the target sputter to substrate; Wherein, coatings thickness is 10 um--25um.
The manufacture method of a kind of niobium, LOW-E glass is characterized in that: it comprises the steps, float glass process ultra-clear glasses substrate is sent into 10
-1In the vacuum environment of the handkerchief order of magnitude, feed an amount of process gas as rare gas element Ar or reactant gases O
2, N
2, and keep vacustat; Target niobium, zinc oxide, nano grade inorganic silicon and charcoal are embedded negative electrode successively, thereby and constitute magnetic controlling target inserting magnetic field with the vertical direction of negative electrode; With the magnetic controlling target is negative electrode, adds direct current or AC power, under high-tension effect, process gas generation ionization forms plasma body, and electronics is under the acting in conjunction in electric field and magnetic field, carry out the high-speed screw motion, the collision gas molecule produces more positive ion and electronics; Positive ion clashes into cathode targets after reaching certain energy under effect of electric field, the target that is sputtered is deposited on and forms film on the glass substrate.
The manufacture method of described niobium, LOW-E glass is characterized in that: in order to form the rete of uniformity, the negative electrode target moves around near glass substrate surface.
The invention has the beneficial effects as follows.
1) high permeability of LOW-E glass of the present invention with visible light reaches more than 90% and the blocking-up efficient of ultraviolet blocking-up reaches more than 50%.
2) LOW-E glass of the present invention adopts and can obtain specific energy and light transmission rate high coatings niobium, zinc oxide, nano grade inorganic silicon and the charcoal target as the coatings characteristic, compares with the product that adopts the fine silver film, will reduce the cost of product greatly.
3) the plated film target of LOW-E glass of the present invention comprises charcoal, and it has solved the directly technical barrier of tempering of coated glass, and it can utilize the radiation heat transfer of charcoal performance to carry out tempering, and coatings is firm, does not go mouldy in environment and never degenerates, and has security.
Embodiment
The invention discloses a kind of niobium, LOW-E glass and manufacture method thereof.Its manufacture method comprises the steps, float glass process ultra-clear glasses substrate is sent into 10
-1In the vacuum environment of the handkerchief order of magnitude, feed an amount of process gas as rare gas element Ar or reactant gases O
2, N
2, and keep vacustat; Target niobium, zinc oxide, nano grade inorganic silicon and charcoal are embedded negative electrode successively, thereby and constitute magnetic controlling target inserting magnetic field with the vertical direction of negative electrode; With the magnetic controlling target is negative electrode, adds direct current or AC power, under high-tension effect, process gas generation ionization forms plasma body, and electronics is under the acting in conjunction in electric field and magnetic field, carry out the high-speed screw motion, the collision gas molecule produces more positive ion and electronics; Positive ion clashes into cathode targets after reaching certain energy under effect of electric field, the target that is sputtered is deposited on and forms film on the glass substrate.In order to form the rete of uniformity, the negative electrode target moves around near glass substrate surface.
The processing step and the existing processing step basically identical of the off-line vacuum sputtering that the present invention adopts also can comprise level and vertical two kinds of operating method, the selection aspect that its main difference part is exactly a target.
In the inventive method step, require to select high-quality float glass process ultra-clear glasses to make the substrate of Low-E glass, implement the glass deep processing then as requested, the external form of making certain specification requires, enters glass cleaning, baking procedure, operation and provide plated film under the prerequisite that guarantees glass quality.
In the inventive method step, select niobium, zinc oxide, nano grade inorganic silicon and charcoal as coatings, arrange according to certain procedure as target material, but must be charcoal as arrangement project at last.
In the inventive method step, the glass transfer rate (as: horizontal feed) of setting be 5-6 rice/minute and each target penetrate sedimentation effect, thereby decide the thickness of coatings to realize the plated film spectrum effects, its coating film thickness generally is controlled at 10 um--25um.
The inventive method is produced the LOW-E glassy product that obtains, and its sunlight transmitance at 350nm-800 nm can reach more than 85%.Have raw material and easily obtain, low cost of manufacture has certain economic competitiveness.
In sum, be preferred embodiment of the present invention only, be not to be used for limiting practical range of the present invention, promptly all equivalences of doing according to the content of the present patent application claim change and modify, and all should be technology category of the present invention.
Claims (3)
1. a niobium, LOW-E glass, it is characterized in that: its uses float glass process ultra-clear glasses as substrate, and adopts the off-line vacuum sputtering that niobium, zinc oxide, nano grade inorganic silicon and charcoal are formed coatings as the target sputter to substrate; Wherein, coatings thickness is 10 um--25um.
2. the manufacture method of a niobium, LOW-E glass, it is characterized in that: it comprises the steps, float glass process ultra-clear glasses substrate is sent into 10
-1In the vacuum environment of the handkerchief order of magnitude, feed an amount of process gas as rare gas element Ar or reactant gases O
2, N
2, and keep vacustat; Target niobium, zinc oxide, nano grade inorganic silicon and charcoal are embedded negative electrode successively, thereby and constitute magnetic controlling target inserting magnetic field with the vertical direction of negative electrode; With the magnetic controlling target is negative electrode, adds direct current or AC power, under high-tension effect, process gas generation ionization forms plasma body, and electronics is under the acting in conjunction in electric field and magnetic field, carry out the high-speed screw motion, the collision gas molecule produces more positive ion and electronics; Positive ion clashes into cathode targets after reaching certain energy under effect of electric field, the target that is sputtered is deposited on and forms film on the glass substrate.
3. the manufacture method of niobium according to claim 2, LOW-E glass is characterized in that: in order to form the rete of uniformity, the negative electrode target moves around near glass substrate surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110150123XA CN102276157A (en) | 2011-06-07 | 2011-06-07 | Niobium, LOW-E glass and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110150123XA CN102276157A (en) | 2011-06-07 | 2011-06-07 | Niobium, LOW-E glass and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102276157A true CN102276157A (en) | 2011-12-14 |
Family
ID=45101954
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110150123XA Pending CN102276157A (en) | 2011-06-07 | 2011-06-07 | Niobium, LOW-E glass and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102276157A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106957155A (en) * | 2017-03-23 | 2017-07-18 | 合肥协耀玻璃制品有限公司 | A kind of preparation method of low emissivity glass |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030155065A1 (en) * | 2002-02-13 | 2003-08-21 | Thomsen Scott V. | Method of making window unit |
| CN101602273A (en) * | 2009-07-22 | 2009-12-16 | 天津南玻节能玻璃有限公司 | A kind of diamond-like carbon film-coating glass and preparation method thereof |
| CN101898871A (en) * | 2009-05-25 | 2010-12-01 | 天津南玻节能玻璃有限公司 | Low-reflection plating glass and preparation method thereof |
| CN201817409U (en) * | 2010-09-28 | 2011-05-04 | 林嘉宏 | Low-emitting glass capable of being tampered and processed in different places |
-
2011
- 2011-06-07 CN CN201110150123XA patent/CN102276157A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030155065A1 (en) * | 2002-02-13 | 2003-08-21 | Thomsen Scott V. | Method of making window unit |
| CN101898871A (en) * | 2009-05-25 | 2010-12-01 | 天津南玻节能玻璃有限公司 | Low-reflection plating glass and preparation method thereof |
| CN101602273A (en) * | 2009-07-22 | 2009-12-16 | 天津南玻节能玻璃有限公司 | A kind of diamond-like carbon film-coating glass and preparation method thereof |
| CN201817409U (en) * | 2010-09-28 | 2011-05-04 | 林嘉宏 | Low-emitting glass capable of being tampered and processed in different places |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106957155A (en) * | 2017-03-23 | 2017-07-18 | 合肥协耀玻璃制品有限公司 | A kind of preparation method of low emissivity glass |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105130209A (en) | High-transmittance low-cost color-adjustable low-radiation energy-saving glass and preparation method thereof | |
| CN110255922B (en) | Double-silver low-emissivity coated glass and preparation method thereof | |
| CN103864315B (en) | A kind of silver-colored titanium complex functional layer Low emissivity energy-saving glass and preparation method thereof | |
| CN108516699A (en) | A kind of low radiation coated glass | |
| CN106186724B (en) | A kind of high light green color bendable steel Three-silver-layer low-radiation coated glass and preparation method | |
| CN106186723A (en) | Saturating light blue bendable steel Three-silver-layer low-radiation coated glass and preparation technology in one | |
| CN102683433A (en) | Conductive glass with double anti-reflective film surfaces for thin film solar battery and preparation method thereof | |
| CN211078928U (en) | Double-silver low-emissivity coated glass | |
| AU2011317330B2 (en) | Method of coating glass | |
| CN105084781A (en) | Golden low-radiation reflective glass and preparation method therefor | |
| CN102683435B (en) | Thin-film solar cells electro-conductive glass and preparation method thereof | |
| CN102683436A (en) | Conductive glass for thin film solar battery and preparation method thereof | |
| CN102079629A (en) | High-transmittance coated glass coated with compound dielectric layer and compound antireflection layers and production technique thereof | |
| CN105084780A (en) | Sunshade double-silver low-radiation reflective glass and preparation method therefor | |
| CN102744936A (en) | U-shaped coated glass and manufacture method thereof | |
| CN105084779A (en) | Highly-transparent type double-silver low-e reflective glass and preparation method thereof | |
| CN102336529A (en) | High transmittance toughenable low radiation glass and manufacture method thereof | |
| CN104890322A (en) | Scratch-resistant double-sliver low-radiation coated glass capable of being toughened | |
| CN113060942A (en) | Light-gray three-silver low-emissivity coated glass and preparation method thereof | |
| CN102514279A (en) | Four-silver coated glass with low radiation and manufacturing technique thereof | |
| CN102276157A (en) | Niobium, LOW-E glass and preparation method thereof | |
| CN202782021U (en) | U-shaped film coated glass | |
| CN202344954U (en) | Four-silver-layer low-radiation film-coated glass | |
| CN105015107B (en) | Color-adjustable low radiation energy saving glass and preparation method thereof | |
| CN105084776B (en) | A kind of gold solar-control glazing and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20111214 |