CN102236260A - Wave aberration correction system and method - Google Patents
Wave aberration correction system and method Download PDFInfo
- Publication number
- CN102236260A CN102236260A CN2010101558197A CN201010155819A CN102236260A CN 102236260 A CN102236260 A CN 102236260A CN 2010101558197 A CN2010101558197 A CN 2010101558197A CN 201010155819 A CN201010155819 A CN 201010155819A CN 102236260 A CN102236260 A CN 102236260A
- Authority
- CN
- China
- Prior art keywords
- wave aberration
- projection objective
- wave
- signal processing
- measuring system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Testing Of Optical Devices Or Fibers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention provides a wave aberration correction system and a method for correcting wave aberration by using the system. The system comprises a projection objective and a wave aberration corrector combined with the projection objective, wherein the projection objective comprises a plurality of refractors and a plurality of reflectors; one or more of the reflectors is/are deformed reflector(s); the wave aberration corrector comprises a wave aberration measuring system, a signal processing system and one or more driving units; the projection objective images a wave aberration measuring image positioned at an object plane; the wave aberration measuring system measures the wave aberration of the projection objective at the object plane; the signal processing system processes the wave aberration measured by the wave aberration measuring system and generates a control signal; the one or more driving unit(s) is/are combined with the one or more deformed reflector(s) in the project objective, and drives/drive different points of the reflectors according to the control signal to produce different displacements; the wave aberration measuring system, the signal processing system, the driving unit and the projection objective form a closed loop; and the real-time correction for the wave aberration of the projection objective is realized.
Description
Technical field
The present invention relates to be used for the corrective system and the method for the projection objective wave aberration of photoetching.
Background technology
Projection objective wave aberration is the key factor that influences litho machine alignment precision and photoetching resolution.Along with the continuous reduction of lithographic feature size, wave aberration is more and more outstanding to the influence of optical patterning quality.Therefore, the detection of wave aberration of photo-etching machine projection objective has become the important means that guarantees the optical patterning quality with correction.
Projection objective wave aberration is proofreaied and correct the following method that adopts usually: at first utilize exposure method to detect and obtain projection objective wave aberration, proofread and correct according to the correcting value of the wave aberration calculating projection objective movable lens that records afterwards, and then the correction result of the checking projection objective wave aberration that exposes.This bearing calibration is proofreaied and correct the result owing to can't detect projection objective wave aberration in real time, thereby makes calibration cycle long, and correction accuracy is not high.
Summary of the invention
The object of the present invention is to provide a kind of projection objective wave aberration corrective system and method, projection objective wave aberration is proofreaied and correct in real time.
The wave aberration means for correcting that wave aberration corrective system of the present invention comprises projection objective and combines with projection objective, wherein, projection objective has a plurality of refracting telescopes and a plurality of catoptron, have one or more deformation reflection mirrors in these a plurality of catoptrons, the wave aberration means for correcting has the wave aberration measuring system, signal processing system and one or more driver element, projection objective carries out imaging to the wave aberration measurement pattern that is positioned at the object plane place, the wave aberration measuring system is measured the wave aberration of projection objective at the image planes place, the wave aberration that signal processing system records the wave aberration measuring system is handled and can be produced control signal, described one or more driver element combines with one or more deformation reflection mirrors in the projection objective and produces different displacements according to the difference that control signal drives deformation reflection mirror, described wave aberration measuring system, signal processing system, driver element and projection objective form closed loop, realize the real-time correction to projection objective wave aberration.
Wherein, driver element is a piezoelectric ceramics.
Wherein, the wave aberration measuring system is a shearing interferometer.
Wherein, the wave aberration measurement pattern that is positioned at object plane is a grating.
Wherein, the wave aberration measuring system is the Ha Deman sensor.
Wherein, the wave aberration measurement pattern that is positioned at object plane is an aperture, and its size is about 8 times of resolving power of lens.
The method of correction wave aberration of the present invention has been utilized aforementioned waves aberration correction system, has following steps:
(a) projection objective carries out imaging to the wave aberration measurement pattern that is positioned at the object plane place;
(b) the wave aberration measuring system is measured the wave aberration of projection objective at the image planes place, and itself and desired wave aberration size are compared, and proofreaies and correct if meet the demands then finish, and obtains wavefront error and is sent to signal processing system otherwise wave aberration is carried out match;
(c) signal processing system is handled the wavefront error signal that receives, and is converted into the distortion inaccuracy of deformation reflection mirror each point, and produces drive control signal according to the size of distortion inaccuracy;
(d) control signal sent according to signal processing system of driver element drives the difference generation displacement of the catoptron that combines with it, and the surface configuration of catoptron is changed;
(e) repeating step (a)～(d) meets the demands until the wave aberration size.
Compared with prior art, the present invention has following advantage:
1,, makes the imaging wavefront be tending towards desirable, thereby improve the image quality of projection objective by deformation before the reflecting mirror surface shape indemnity mirror wave;
2, utilize close loop control circuit, carry out the object lens wave aberration in real time and proofread and correct and checking, improve the object lens wave aberration and proofread and correct efficient and shorten the wave aberration calibration cycle.
3, adopt high precision wave aberration sensor and reflecting mirror surface shape real-Time Compensation projection objective wave front aberration, improve the wave aberration correction accuracy.
Description of drawings
By the embodiment of the invention and in conjunction with the description of its accompanying drawing, can further understand purpose, specific structural features and the advantage of its invention.Wherein, accompanying drawing is:
Figure 1 shows that the structure of projection objective of the present invention;
Figure 2 shows that the structure of wave aberration corrective system according to an embodiment of the invention;
Figure 3 shows that according to wave aberration correcting process of the present invention;
Figure 4 shows that the example of the projection objective wave aberration that the wave aberration measuring system records;
Figure 5 shows that the wavefront error that the wave aberration match that records obtains;
Figure 6 shows that the deformation error of deformation reflection mirror;
Figure 7 shows that the structure of wave aberration corrective system according to another embodiment of the invention.
Embodiment
Below, describe in detail according to a preferred embodiment of the invention in conjunction with the accompanying drawings.For convenience of description and highlight the present invention, omitted existing associated components in the prior art in the accompanying drawing, and will omit description these well-known components.
First embodiment
The projection objective structure that the present invention adopts as shown in Figure 1, projection objective 100 is by refracting telescope 102,108 and 105 and catoptron 103,109,107 and 104 constitute, reflex to catoptron 109 via refracting telescope 102 refraction backs by catoptron 103 from the light of object plane 101 incidents, arrive catoptron 107 by refracting telescope 108 then, the mirror 107 that is reflected again reflexes to catoptron 104, pass through refracting telescope 105 outgoing then to image planes 106, wherein catoptron 103 is a deformation reflection mirror.
The structure of projection objective wave aberration corrective system of the present invention wherein, except that projection objective 100, also comprises the wave aberration measuring system 201, signal processing system 202 and the driver element 203 that combine with projection objective 100 as shown in Figure 2.Wherein, wave aberration measuring system 201 is that Wavefront sensor 201 can adopt shearing interferometer, and driver element 203 can adopt piezoelectric ceramics.The wavefront signals that measures by shearing interferometer 201, but the treatment conversion through signal processing unit is the control signal of drive pressure electroceramics, piezoelectric ceramics 203 produces different displacements according to the difference that control signal drives catoptron 103, thereby correction projection objective wave aberration, make the imaging wavefront of projection objective be tending towards desirable, improve the projection objective image quality.In the present embodiment, when adopting shearing interferometer, the measurement pattern that matches is a grating.
Carry out flow process that wave aberration proofreaies and correct as shown in Figure 3 according to of the present invention.Place raster graphic at object plane 101 places, raster graphic is imaged on the image planes 106 through projection objective 100.Shearing interferometer 201 is measured projection objective wave aberration, and wave aberration and the desired wave aberration that records compared, if wave aberration meets the demands, then needn't proofread and correct.If wave aberration does not meet the demands, then begin to carry out wave aberration and proofread and correct.
A kind of projection objective wave aberration that employing shearing interferometer 201 measures as shown in Figure 4.
Match obtains the projection objective wavefront error according to projection objective wave aberration, as shown in Figure 5.The projection objective wavefront error is sent to signal processing system 202, signal processing system 202 is deformed into the wavefront error conversion distortion inaccuracy of catoptron each point, promptly the spot center that incides deformation reflection mirror with the projection objective wavefront is the center, the projection objective wavefront is corresponding with wavefront each point on inciding catoptron, then promptly this puts corresponding wavefront error size (wavefront error of representing with light path) to the deformation size of deformation reflection mirror point, and the deformation direction is put the opposite direction of corresponding wavefront error for this.
The deformation reflection mirror deformation error of projection objective wavefront error correspondence shown in Figure 5 as shown in Figure 6.Produce drive control signal according to the distortion inaccuracy size at last.The control signal control drive unit 203 that signal processing system 202 is sent, drive the difference generation displacement as shown in Figure 6 of catoptron 103, the surface configuration of catoptron 103 is changed, promptly, make catoptron 103 be out of shape the shape that forms with shape complementarity shown in Figure 6, thereby replenish the wavefront error of projection objective.
After projection objective wave front aberration compensation finishes, use wave aberration measuring system 201 to detect the wave aberration of projection objective once more, and with measurement result with require the wave aberration size to compare, finish to proofread and correct until the wave aberration of the projection objective back that meets the demands.
Second embodiment
Projection objective that is adopted in the present embodiment and wave aberration corrective system and first embodiment are basic identical, and wave aberration measuring system 201 wherein can adopt the Ha Deman Wavefront sensor.In the present embodiment, because employing is the Ha Deman sensor, the measurement pattern that matches is selected as aperture, and its size is about 8 times of resolving power of lens.
Wave aberration correcting process according to present embodiment is as follows:
Little hole pattern is placed at 101 places at object plane, and aperture is imaged on the image planes 106 through projection objective 100.
Ha Deman sensor 201 is measured projection objective wave aberrations, and with the wave aberration that records with require wave aberration to compare, if wave aberration meets the demands, then needn't proofread and correct; If wave aberration does not meet the demands, then begin to carry out wave aberration and proofread and correct.
Match obtains the projection objective wavefront error according to projection objective wave aberration.
The projection objective wavefront error is sent to signal processing system 202, and signal processing system 202 is changed the distortion inaccuracy of deformation reflection mirror each point with wavefront error, and produces drive control signal according to the distortion inaccuracy size.
The control signal control drive unit 203 that signal processing system 202 is sent drives catoptron 103 differences and produces displacement, and the surface configuration of catoptron 103 is changed, thus the wavefront error of compensation projection objective.
After the compensation of projection objective wave front aberration finished, use wave aberration measuring system 201 detected the wave aberration of projection objective once more, and measurement result and desired wave aberration size are compared, and finished to proofread and correct after the wave aberration of projection objective meets the demands.
As shown in Figure 7, both can adopt in the object lens some specific catoptrons among the present invention, and also can all use or only use wherein several as the deformation reflection mirror in the wave aberration corrective system as 103 deformation reflection mirrors that are used as in the wave aberration corrective system.
Described in this instructions is several preferred embodiment of the present invention, and above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (7)
1. wave aberration corrective system, the wave aberration means for correcting that this system comprises projection objective and combines with projection objective, it is characterized in that, projection objective has a plurality of refracting telescopes and a plurality of catoptron, have one or more deformation reflection mirrors in these a plurality of catoptrons, the wave aberration means for correcting has the wave aberration measuring system, signal processing system and one or more driver element, projection objective carries out imaging to the wave aberration measurement pattern that is positioned at the object plane place, the wave aberration measuring system is measured the wave aberration of projection objective at the image planes place, the wave aberration that signal processing system records the wave aberration measuring system is handled and can be produced control signal, described one or more driver element combines with one or more deformation reflection mirrors in the projection objective and produces different displacements according to the difference that control signal drives deformation reflection mirror, described wave aberration measuring system, signal processing system, driver element and projection objective form closed loop, realize the real-time correction to projection objective wave aberration.
2. wave aberration corrective system according to claim 1 is characterized in that driver element is a piezoelectric ceramics.
3. wave aberration corrective system according to claim 1 and 2 is characterized in that the wave aberration measuring system is a shearing interferometer.
4. wave aberration corrective system according to claim 3 is characterized in that, the wave aberration measurement pattern that is positioned at object plane is a grating.
5. wave aberration corrective system according to claim 1 and 2 is characterized in that, the wave aberration measuring system is the Ha Deman sensor.
6. wave aberration corrective system according to claim 5 is characterized in that, the wave aberration measurement pattern that is positioned at object plane is an aperture, and its size is about 8 times of resolving power of lens.
7. a method of utilizing the wave aberration corrective system correction wave aberration of one of aforementioned claim 1-6 comprises the steps:
(a) projection objective carries out imaging to the wave aberration measurement pattern that is positioned at the object plane place;
(b) the wave aberration measuring system is measured the wave aberration of projection objective at the image planes place, and itself and desired wave aberration size are compared, and proofreaies and correct if meet the demands then finish, and obtains wavefront error and is sent to signal processing system otherwise wave aberration is carried out match;
(c) signal processing system is handled the wavefront error signal that receives, and is converted into the distortion inaccuracy of deformation reflection mirror each point, and produces drive control signal according to the size of distortion inaccuracy;
(d) control signal sent according to signal processing system of driver element drives the difference generation displacement of the catoptron that combines with it, and the surface configuration of catoptron is changed;
(e) repeating step (a)～(d) meets the demands until the wave aberration size.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010155819 CN102236260B (en) | 2010-04-27 | 2010-04-27 | Wave aberration correction system and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010155819 CN102236260B (en) | 2010-04-27 | 2010-04-27 | Wave aberration correction system and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102236260A true CN102236260A (en) | 2011-11-09 |
| CN102236260B CN102236260B (en) | 2013-05-22 |
Family
ID=44887043
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201010155819 Active CN102236260B (en) | 2010-04-27 | 2010-04-27 | Wave aberration correction system and method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102236260B (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102368114A (en) * | 2011-11-15 | 2012-03-07 | 中国科学院西安光学精密机械研究所 | Adjusting method of surface shape compensation of optical system based on wave aberration detection |
| CN103322942A (en) * | 2013-07-15 | 2013-09-25 | 中国科学院光电技术研究所 | Facial form detection method of each optical element of optical system based on wave aberration |
| CN105022232A (en) * | 2014-04-15 | 2015-11-04 | 上海微电子装备有限公司 | Error calibration method of wavefront aberration measurement apparatus |
| CN108333879A (en) * | 2017-01-17 | 2018-07-27 | 上海微电子装备（集团）股份有限公司 | A kind of projection objective aberration correcting mechanism and method |
| CN109407469A (en) * | 2017-08-18 | 2019-03-01 | 上海微电子装备（集团）股份有限公司 | Aberration compensation device and method, photoetching projection objective lens and its aberration compensating method |
| CN116819912A (en) * | 2023-08-31 | 2023-09-29 | 光科芯图(北京)科技有限公司 | Adaptive optics system, exposure system, wave aberration adjusting method and apparatus |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1491427A (en) * | 2001-02-06 | 2004-04-21 | ������������ʽ���� | Exposure system, and exposure method, and device production method |
| CN101082776A (en) * | 2007-07-10 | 2007-12-05 | 上海微电子装备有限公司 | Interferometer |
| CN101109909A (en) * | 2006-07-18 | 2008-01-23 | Asml荷兰有限公司 | Lithographic apparatus, aberration correction device and device manufacturing method |
| CN101236362A (en) * | 2008-01-29 | 2008-08-06 | 北京理工大学 | Photo-etching machine projection objective wave aberration on-line detection method |
| CN101464637A (en) * | 2008-12-30 | 2009-06-24 | 上海微电子装备有限公司 | Measurement apparatus and method for wave aberration of photo-etching machine projection objective |
-
2010
- 2010-04-27 CN CN 201010155819 patent/CN102236260B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1491427A (en) * | 2001-02-06 | 2004-04-21 | ������������ʽ���� | Exposure system, and exposure method, and device production method |
| CN101109909A (en) * | 2006-07-18 | 2008-01-23 | Asml荷兰有限公司 | Lithographic apparatus, aberration correction device and device manufacturing method |
| CN101082776A (en) * | 2007-07-10 | 2007-12-05 | 上海微电子装备有限公司 | Interferometer |
| CN101236362A (en) * | 2008-01-29 | 2008-08-06 | 北京理工大学 | Photo-etching machine projection objective wave aberration on-line detection method |
| CN101464637A (en) * | 2008-12-30 | 2009-06-24 | 上海微电子装备有限公司 | Measurement apparatus and method for wave aberration of photo-etching machine projection objective |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102368114A (en) * | 2011-11-15 | 2012-03-07 | 中国科学院西安光学精密机械研究所 | Adjusting method of surface shape compensation of optical system based on wave aberration detection |
| CN103322942A (en) * | 2013-07-15 | 2013-09-25 | 中国科学院光电技术研究所 | Facial form detection method of each optical element of optical system based on wave aberration |
| CN105022232A (en) * | 2014-04-15 | 2015-11-04 | 上海微电子装备有限公司 | Error calibration method of wavefront aberration measurement apparatus |
| CN108333879A (en) * | 2017-01-17 | 2018-07-27 | 上海微电子装备（集团）股份有限公司 | A kind of projection objective aberration correcting mechanism and method |
| CN109407469A (en) * | 2017-08-18 | 2019-03-01 | 上海微电子装备（集团）股份有限公司 | Aberration compensation device and method, photoetching projection objective lens and its aberration compensating method |
| CN109407469B (en) * | 2017-08-18 | 2020-11-20 | 上海微电子装备（集团）股份有限公司 | Aberration compensation device and method, photoetching projection objective lens and aberration compensation method thereof |
| CN116819912A (en) * | 2023-08-31 | 2023-09-29 | 光科芯图(北京)科技有限公司 | Adaptive optics system, exposure system, wave aberration adjusting method and apparatus |
| CN116819912B (en) * | 2023-08-31 | 2023-11-21 | 光科芯图(北京)科技有限公司 | Adaptive optics system, exposure system, wave aberration adjusting method and apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102236260B (en) | 2013-05-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102236260B (en) | Wave aberration correction system and method | |
| US6765683B2 (en) | Interferometer system and method of manufacturing projection optical system using same | |
| CN104101487B (en) | Wave aberration measuring device and measuring method of optical system | |
| US10502545B2 (en) | Measuring method and measuring arrangement for an imaging optical system | |
| CN109416507B (en) | Optical system and method for correcting mask defect using the same | |
| CN106646867B (en) | A kind of confocal alignment device of deep ultraviolet optical system and method | |
| CN106441816B (en) | Calculate detection device and detection method that holography method measures long-focus lens transmission wavefront | |
| CN101609266B (en) | Field measurement device of wave aberration of projection objective in photo-etching machine | |
| CN102564731A (en) | Device for measuring focal length and wavefront distortion of lens | |
| CN101464637B (en) | Measurement apparatus and method for wave aberration of photo-etching machine projection objective | |
| CN109029288B (en) | Reflective large-gradient aspheric surface and free-form surface detection device and method based on DMD wave-front sensing technology | |
| CN100405003C (en) | Method and apparatus for correcting conversion coefficient of stripe gauging device and stripe gauging device | |
| US20020057495A1 (en) | Measuring system for performance of imaging optical system | |
| CN101339367B (en) | Projection exposure device and method and device for calibrating illumination light beam dynamic positional error | |
| CN103134443B (en) | A kind of large-caliber large-caliber-thicknreflector reflector surface shape auto-collimation detection device and method | |
| CN103226240B (en) | Multi-channel normal incidence imaging system and installation and adjustment method thereof | |
| CN113687521A (en) | Low-aberration high-precision two-dimensional photoelectric auto-collimation method and device based on wavefront correction | |
| CN101285713A (en) | Continuous zooming Hartmann sensor utilizing parallel light source for calibration | |
| CN102163008B (en) | Online detection method of wave aberration of projection objective of lithography machine for self-calibrating system error | |
| CN102193338B (en) | Device and method for carrying out field measurement on wave aberration of projection objective of photoetching machine adopting extended light sources | |
| CN101608883B (en) | Digitized detection system of full-spectrum aiming device | |
| Choi et al. | Novel Telecentric Collimator Design for Mobile Optical Inspection Instruments | |
| JP6539028B2 (en) | Telescope with active mirror and internal means for monitoring the active mirror | |
| JP3590142B2 (en) | Interferometer device | |
| CN201514315U (en) | Full spectrum collimating sight digital detecting device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201203 1525 Zhang Dong Road, Zhangjiang hi tech park, Pudong District, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 1525 Zhang Dong Road, Zhangjiang hi tech park, Pudong District, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |