CN102236260B - Wave aberration correction system and method - Google Patents
Wave aberration correction system and method Download PDFInfo
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- CN102236260B CN102236260B CN 201010155819 CN201010155819A CN102236260B CN 102236260 B CN102236260 B CN 102236260B CN 201010155819 CN201010155819 CN 201010155819 CN 201010155819 A CN201010155819 A CN 201010155819A CN 102236260 B CN102236260 B CN 102236260B
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Abstract
The invention provides a wave aberration correction system and a method for correcting wave aberration by using the system. The system comprises a projection objective and a wave aberration corrector combined with the projection objective, wherein the projection objective comprises a plurality of refractors and a plurality of reflectors; one or more of the reflectors is/are deformed reflector(s); the wave aberration corrector comprises a wave aberration measuring system, a signal processing system and one or more driving units; the projection objective images a wave aberration measuring image positioned at an object plane; the wave aberration measuring system measures the wave aberration of the projection objective at the object plane; the signal processing system processes the wave aberration measured by the wave aberration measuring system and generates a control signal; the one or more driving unit(s) is/are combined with the one or more deformed reflector(s) in the project objective, and drives/drive different points of the reflectors according to the control signal to produce different displacements; the wave aberration measuring system, the signal processing system, the driving unit and the projection objective form a closed loop; and the real-time correction for the wave aberration of the projection objective is realized.
Description
Technical field
The present invention relates to corrective system and method for the projection objective wave aberration of photoetching.
Background technology
Projection objective wave aberration is the key factor that affects litho machine alignment precision and photoetching resolution.Along with the continuous reduction of lithographic feature size, wave aberration is more and more outstanding on the impact of optical patterning quality.Therefore, the detection of wave aberration of photo-etching machine projection objective has become with correction the important means that guarantees the optical patterning quality.
Projection objective wave aberration is proofreaied and correct the following method that usually adopts: at first utilize exposure method to detect and obtain projection objective wave aberration, proofread and correct according to the correcting value of the wave aberration calculating projection objective movable lens that records afterwards, and then the correction result of the checking projection objective wave aberration that exposes.This bearing calibration is proofreaied and correct result owing to can't detecting in real time projection objective wave aberration, thereby makes calibration cycle long, and correction accuracy is not high.
Summary of the invention
The object of the present invention is to provide a kind of projection objective wave aberration corrective system and method, projection objective wave aberration is carried out real time correction.
the wave aberration means for correcting that wave aberration correction system of the present invention comprises projection objective and combines with projection objective, wherein, projection objective has a plurality of refracting telescopes and a plurality of catoptron, have one or more deformation reflection mirrors in these a plurality of catoptrons, the wave aberration means for correcting has the wave aberration measuring system, signal processing system and one or more driver element, projection objective carries out imaging to the wave aberration measurement pattern that is positioned at the object plane place, the wave aberration measuring system is in the wave aberration of image planes place's measurement projection objective, the wave aberration that signal processing system records the wave aberration measuring system is processed and can be produced control signal, described one or more driver element combines from one or more deformation reflection mirrors in projection objective and produces different displacements according to the difference that control signal drives deformation reflection mirror, described wave aberration measuring system, signal processing system, driver element and projection objective form closed loop, the real time correction of realization to projection objective wave aberration.
Wherein, driver element is piezoelectric ceramics.
Wherein, the wave aberration measuring system is shearing interferometer.
Wherein, the wave aberration measurement pattern that is positioned at object plane is grating.
Wherein, the wave aberration measuring system is the Ha Deman sensor.
Wherein, the wave aberration measurement pattern that is positioned at object plane is aperture, and its size is about 8 times of resolving power of lens.
The method of correction wave aberration of the present invention has been utilized aforementioned wave aberration correction system, has following steps:
(a) projection objective carries out imaging to the wave aberration measurement pattern that is positioned at the object plane place;
(b) the wave aberration measuring system in the wave aberration of image planes place's measurement projection objective, compares itself and desired wave aberration size, proofreaies and correct if meet the demands finish, and obtains wavefront error and is sent to signal processing system otherwise wave aberration is carried out match;
(c) signal processing system is processed the wavefront error signal that receives, and is converted into the distortion inaccuracy of deformation reflection mirror each point, and produces drive control signal according to the size of distortion inaccuracy;
(d) difference that drives with the catoptron of its combination of the control signal sent according to signal processing system of driver element produces displacement, and the surface configuration of catoptron is changed;
(e) repeating step (a)～(d) until the wave aberration size meet the demands.
Compared with prior art, the present invention has following advantage:
1, by deformation before reflecting mirror surface shape indemnity mirror wave, make the imaging wavefront be tending towards desirable, thereby improve the image quality of projection objective;
2, utilize close loop control circuit, carry out in real time the object lens wave aberration and proofread and correct and checking, improve the object lens wave aberration and proofread and correct efficient and shorten the wave aberration calibration cycle.
3, adopt high precision wave aberration sensor and reflecting mirror surface shape real-Time Compensation projection objective wave front aberration, improve the wave aberration correction accuracy.
Description of drawings
By the embodiment of the present invention and in conjunction with the description of its accompanying drawing, can further understand purpose, specific structural features and the advantage of its invention.Wherein, accompanying drawing is:
Figure 1 shows that the structure of projection objective of the present invention;
Figure 2 shows that the structure of wave aberration correction system according to an embodiment of the invention;
Figure 3 shows that according to wave aberration correcting process of the present invention;
Figure 4 shows that the example of the projection objective wave aberration that the wave aberration measuring system records;
Figure 5 shows that the wavefront error that the wave aberration match that records obtains;
Figure 6 shows that the deformation error of deformation reflection mirror;
Figure 7 shows that the structure of wave aberration correction system according to another embodiment of the invention.
Embodiment
Below, describe in detail according to a preferred embodiment of the invention by reference to the accompanying drawings.For convenience of description and highlight the present invention, omitted existing associated components in prior art in accompanying drawing, and will omit the description to these well-known components.
The first embodiment
The projection objective structure that the present invention adopts as shown in Figure 1, projection objective 100 is by refracting telescope 102,108 and 105, and catoptron 103,109,107 and 104 consist of, reflex to catoptron 109 by catoptron 103 from the light of object plane 101 incidents after via refracting telescope 102 refractions, then arrive catoptrons 107 by refracting telescope 108, then be reflected mirror 107 and reflex to catoptron 104, then pass through refracting telescope 105 outgoing to image planes 106, wherein catoptron 103 is deformation reflection mirror.
The structure of projection objective wave aberration corrective system of the present invention wherein, except projection objective 100, also comprises the wave aberration measuring system 201, signal processing system 202 and the driver element 203 that combine with projection objective 100 as shown in Figure 2.Wherein, wave aberration measuring system 201 is that Wavefront sensor 201 can adopt shearing interferometer, and driver element 203 can adopt piezoelectric ceramics.The wavefront signals that measures by shearing interferometer 201, processing through signal processing unit is converted to the control signal that can drive piezoelectric ceramics, piezoelectric ceramics 203 produces different displacements according to the difference that control signal drives catoptron 103, thereby correction projection objective wave aberration, make the imaging wavefront of projection objective be tending towards desirable, improve the projection objective image quality.In the present embodiment, when adopting shearing interferometer, the measurement pattern that matches is grating.
Carry out flow process that wave aberration proofreaies and correct as shown in Figure 3 according to of the present invention.Raster graphic is placed at 101 places at object plane, and raster graphic is imaged on image planes 106 through projection objective 100.Shearing interferometer 201 is measured projection objective wave aberration, and wave aberration and the desired wave aberration that records compared, if wave aberration meets the demands, needn't proofread and correct.If wave aberration does not meet the demands, begin to carry out wave aberration and proofread and correct.
A kind of projection objective wave aberration that employing shearing interferometer 201 measures as shown in Figure 4.
Match obtains the projection objective wavefront error according to projection objective wave aberration, as shown in Figure 5.The projection objective wavefront error is sent to signal processing system 202, signal processing system 202 is deformed into the wavefront error conversion distortion inaccuracy of catoptron each point, namely centered by the projection objective wavefront incides the spot center of deformation reflection mirror, the projection objective wavefront is corresponding with wavefront each point on inciding catoptron, the i.e. corresponding wavefront error of this some size (wavefront error that represents with light path) of the deformation size of deformation reflection mirror point, the deformation direction is put opposite direction of corresponding wavefront error for this.
Deformation reflection mirror deformation error corresponding to projection objective wavefront error shown in Figure 5 as shown in Figure 6.Produce drive control signal according to the distortion inaccuracy size at last.The control signal that signal processing system 202 is sent is controlled driver element 203, drive the difference generation displacement as shown in Figure 6 of catoptron 103, the surface configuration of catoptron 103 is changed, namely, make catoptron 103 be out of shape the shape that forms with shape complementarity shown in Figure 6, thereby replenish the wavefront error of projection objective.
After projection objective wave front aberration compensation is complete, use wave aberration measuring system 201 again to detect the wave aberration of projection objective, and with measurement result with require the wave aberration size to compare, rear end is proofreaied and correct until the wave aberration of projection objective meets the demands.
The second embodiment
The projection objective that adopts in the present embodiment and wave aberration correction system and the first embodiment are basic identical, and wave aberration measuring system 201 wherein can adopt the Ha Deman Wavefront sensor.In the present embodiment, be the Ha Deman sensor due to what adopt, the measurement pattern that matches is selected as aperture, and its size is 8 times of left and right of resolving power of lens.
As follows according to the wave aberration correcting process of the present embodiment:
Little hole pattern is placed at 101 places at object plane, and aperture is imaged on image planes 106 through projection objective 100.
Ha Deman sensor 201 is measured projection objective wave aberrations, and with the wave aberration that records with require wave aberration to compare, if wave aberration meets the demands, needn't proofread and correct; If wave aberration does not meet the demands, begin to carry out wave aberration and proofread and correct.
Match obtains the projection objective wavefront error according to projection objective wave aberration.
The projection objective wavefront error is sent to signal processing system 202, and signal processing system 202 is changed wavefront error the distortion inaccuracy of deformation reflection mirror each point, and produces drive control signal according to the distortion inaccuracy size.
The control signal that signal processing system 202 is sent is controlled driver element 203, drives catoptron 103 differences and produces displacement, and the surface configuration of catoptron 103 is changed, thus the wavefront error of compensation projection objective.
After the compensation of projection objective wave front aberration is complete, uses wave aberration measuring system 201 again to detect the wave aberration of projection objective, and measurement result and desired wave aberration size are compared, rear end is proofreaied and correct until the wave aberration of projection objective meets the demands.
As shown in Figure 7, both can adopt in object lens some specific catoptrons as 103 deformation reflection mirrors that are used as in wave aberration correction system in the present invention, and also can all use or only use wherein several as the deformation reflection mirror in wave aberration correction system.
Described in this instructions is several preferred embodiment of the present invention, and above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (7)
1. wave aberration correction system, the wave aberration means for correcting that this system comprises projection objective and combines with projection objective, it is characterized in that, projection objective has a plurality of refracting telescopes and a plurality of catoptron, have one or more deformation reflection mirrors in these a plurality of catoptrons, the wave aberration means for correcting has the wave aberration measuring system, signal processing system and one or more driver element, projection objective carries out imaging to the wave aberration measurement pattern that is positioned at the object plane place, the wave aberration measuring system is in the wave aberration of image planes place's measurement projection objective, the wave aberration that signal processing system records the wave aberration measuring system is processed and can be produced control signal, be that signal processing system is converted to wave aberration the deformation error of each point on described one or more deformation reflection mirror, also namely centered by the projection objective wavefront incides the spot center of described one or more deformation reflection mirrors, the projection objective wavefront is corresponding with wavefront each point on inciding deformation reflection mirror, described one or more driver element combines from one or more deformation reflection mirrors in projection objective and produces different displacements according to the difference that control signal drives deformation reflection mirror, the surface configuration of deformation reflection mirror is changed, and displacement size is the size of the wavefront error that represents with light path corresponding to the wavefront each point on deformation reflection mirror, sense of displacement is the opposite direction of wavefront error corresponding to the wavefront each point on deformation reflection mirror, described wave aberration measuring system, signal processing system, driver element and projection objective form closed loop, the real time correction of realization to projection objective wave aberration.
2. wave aberration correction system according to claim 1, is characterized in that, driver element is piezoelectric ceramics.
3. wave aberration correction system according to claim 1 and 2, is characterized in that, the wave aberration measuring system is shearing interferometer.
4. wave aberration correction system according to claim 3, is characterized in that, the wave aberration measurement pattern that is positioned at object plane is grating.
5. wave aberration correction system according to claim 1 and 2, is characterized in that, the wave aberration measuring system is the Ha Deman sensor.
6. wave aberration correction system according to claim 5, is characterized in that, the wave aberration measurement pattern that is positioned at object plane is aperture, and its size is about 8 times of resolving power of lens.
7. a method of utilizing the wave aberration correction system correction wave aberration of one of aforementioned claim 1-6, comprise the steps:
(a) projection objective carries out imaging to the wave aberration measurement pattern that is positioned at the object plane place;
(b) the wave aberration measuring system in the wave aberration of image planes place's measurement projection objective, compares itself and desired wave aberration size, proofreaies and correct if meet the demands finish, and obtains wavefront error and is sent to signal processing system otherwise wave aberration is carried out match;
(c) signal processing system is processed the wavefront error signal that receives, be converted into the distortion inaccuracy of deformation reflection mirror each point, also namely centered by the projection objective wavefront incides the spot center of deformation reflection mirror, the projection objective wavefront is corresponding with wavefront each point on inciding deformation reflection mirror, and produce drive control signal according to the size of distortion inaccuracy;
(d) difference that drives with the catoptron of its combination of the control signal sent according to signal processing system of driver element produces displacement, the surface configuration of catoptron is changed, and displacement size is the size of the wavefront error that represents with light path corresponding to the wavefront each point on deformation reflection mirror, and sense of displacement is the opposite direction of wavefront error corresponding to the wavefront each point on deformation reflection mirror;
(e) repeating step (a)～(d) until the wave aberration size meet the demands.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102368114A (en) * | 2011-11-15 | 2012-03-07 | 中国科学院西安光学精密机械研究所 | Adjusting method of surface shape compensation of optical system based on wave aberration detection |
| CN103322942A (en) * | 2013-07-15 | 2013-09-25 | 中国科学院光电技术研究所 | Facial form detection method of each optical element of optical system based on wave aberration |
| CN105022232B (en) * | 2014-04-15 | 2017-12-29 | 上海微电子装备（集团）股份有限公司 | The error calibrating method of wave aberration measurement apparatus |
| CN108333879B (en) * | 2017-01-17 | 2020-07-14 | 上海微电子装备（集团）股份有限公司 | Mechanism and method for correcting aberration of projection objective |
| CN109407469B (en) * | 2017-08-18 | 2020-11-20 | 上海微电子装备（集团）股份有限公司 | Aberration compensation device and method, photoetching projection objective lens and aberration compensation method thereof |
| CN116819912B (en) * | 2023-08-31 | 2023-11-21 | 光科芯图(北京)科技有限公司 | Adaptive optics system, exposure system, wave aberration adjusting method and apparatus |
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| CN101082776A (en) * | 2007-07-10 | 2007-12-05 | 上海微电子装备有限公司 | Interferometer |
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Address after: 201203 1525 Zhang Dong Road, Zhangjiang hi tech park, Pudong District, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 1525 Zhang Dong Road, Zhangjiang hi tech park, Pudong District, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |