CN102163008B - Online detection method of wave aberration of projection objective of lithography machine for self-calibrating system error - Google Patents
Online detection method of wave aberration of projection objective of lithography machine for self-calibrating system error Download PDFInfo
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Abstract
The invention provides an online detection method of wave aberration of a projection objective of a lithography machine for self-calibrating system error. The method comprises the following steps of: adopting an object space mask plate which is provided with square pinhole arrays; and adopting the square pinhole arrays to generate ideal spherical waves so as to eliminate the influences of an illuminating system on detection of the wave aberration of the projection objective of the lithography machine. By the system error self-calibration filtered by the pinhole arrays, square holes are arranged on object surface of the projection objective of the lithography machine, and the pinhole arrays are arranged on the image surface so that the use ratio of exposure light source is guaranteed; the spatial filtering is performed to residual aberration of the to-be-detected illuminating system and the wave aberration of the projection objective; and by the method in the invention, the wave aberration of the projection objective is rapidly separated from the system error of an online detection apparatus with high accuracy.
Description
Technical field
The invention belongs to the optical detective technology field, be specifically related to a kind of online test method of wave aberration of photo-etching machine projection objective of system error self-calibration.
Background technology
Along with the raising of photolithography resolution, require the residual wave aberration of projection lens of lithography machine also more and more less.ASML, Canon and Nikon three major companies are when processing, integrated projection lens of lithography machine, directly utilize high precision position phase stellar interferometer (Phase Measurement Interferometer, be called for short PMI), as Twyman-Green interference instrument, Feisuo interferometer, the residual wave aberration of projection lens of lithography machine is detected.But in reality, due to the impact of the factors such as transportation, assembling, wave aberration of photo-etching machine projection objective will change and exceed residual wave aberration value, and this moment, wave aberration of photo-etching machine projection objective made a big impact to photolithography resolution.Due to the PMI complicated structure, be difficult to be integrated in litho machine, therefore, exploitation high precision, high-speed photo-etching machine objective lens wave aberration online measuring technique are very necessary.Wave aberration by each visual field of online detection projection lens of lithography machine, and utilize the sensitivity matrix computational analysis to go out the misalignment rate of corresponding each visual field wave aberration, then adjust projection lens of lithography machine, make the wave aberration measured value of projection lens of lithography machine each visual field reach the tolerance-level that PMI detects, guarantee best photolithography resolution imaging.Since 2007, three large photoetching companies have successively released the litho machine that photoetching resolution reaches 45nm, the numerical aperture of its immersion projection objective reach 1.35 and the residual wave aberration of projection objective all reach below 6m λ, this has proposed higher challenge and performance requirement to the online measuring technique of realizing wave aberration of photo-etching machine projection objective.
The online technology that detects of the wave aberration of photo-etching machine projection objective of main flow is mainly based on the detection technique of interference of light principle and based on Shack-Hartmann's wavefront sensing technology now.Wherein mainly represent that technology has ILIAS (the Integrated Lens Interferometer At Scanner) technology of ASML company and iPMI (the in-situ Phase Measurement Interferometer) technology of Canon company based on what interference of light principle detected; The ILIAS technology of ASML company is utilized the one-dimensional grating shearing interferometer, need to be at x, detect on the y both direction, and can't realize the accurate detection to astigmatism.The iPMI technology of Canon company is based on line diffraction interferometer principle, needs slit on the object space mask plate and window and accurately aims at as the window on square mask plate and slit, and this aims on the detection speed impact significantly.Based on Shack-Hartmann's wavefront sensing technology is mainly P-PMI (the Portable phase measuring interferometer) technology of Nikon company, detect the ability in sampling of wavefront because microlens array in Shack-Hartmann's technology has limited, thereby limited accuracy of detection.
The deficiency that the detection technique of developing for aforementioned three large lithographic equipment suppliers exists.The application number that the inventor proposed on May 13rd, 2010 is: " a kind of lithographic objective on-line detection device of wave aberration and method " patented claim of 201010175495.3, it has following beneficial effect: at first, this detection method is by regulating the spacing of shear and photodetector, can realize shearing the adjustable continuously of ratio, thereby when detecting online under different conditions for different object lens to be measured and same object lens to be measured, corresponding shearing ratio be can obtain, thereby sensitivity and the measuring accuracy measured improved; Secondly, the method utilizes square hole expansion light source (mainly being formed by diffuser and square hole mask plate) to improve the utilization factor of exposure light source light intensity, make up projection objective time shutter length and the low deficiency of interference fringe contrast when adopting pointolite, thereby improved measuring speed and measuring accuracy; And the method utilization moves axially as the square hole mask plate and realizes calibration to systematic error.But, because the method adopts the square hole expansion light source, thereby can't eliminate the residual aberration of illuminator, and by moving axially picture side's square hole mask plate calibration system error, limit the shaft orientation moving range of picture side's square hole mask plate due to collimator objective object space operating distance, limited the spatial filtering effect of picture side's square hole mask plate to the residual aberration of wave aberration of photoetching projection objective and illuminator.Due to aforementioned 2 deficiencies, limited to a certain extent and adopted the method to detect the accuracy of detection of projection objective wave aberration.
Summary of the invention
The objective of the invention is to propose a kind of photo-etching machine projection objective wave aberration on-line detection method of system error self-calibration, to realize each visual field point wave aberration high speed of projection lens of lithography machine, high-precision detection.
For achieving the above object, the technical solution adopted in the present invention is as follows:
A kind of photo-etching machine projection objective wave aberration on-line detection method of system error self-calibration, concrete steps are:
Step 1, square pinhole array A and square hole A are set, the pinhole diameter r on square pinhole array A on the object space mask plate
1Less than the object space diffraction limit size of projection lens of lithography machine, and in square pinhole array A, the distance of center circle of first pin hole of every row and last pin hole is l
1=a
1-r
1, a
1Be the length of side of square hole A, described square pinhole array A goes up between every adjacent two pin holes apart from d
1＞1.5r
1
Step 2, square hole B and square pinhole array B are set, the pinhole diameter r on square pinhole array B on as square mask plate
2Less than picture side's diffraction limit size of projection lens of lithography machine, and in square pinhole array B, the distance of center circle of first pin hole of every row and last pin hole is l
2=a
2-r
2, a
2Be the length of side of square hole B, described square pinhole array B goes up between every adjacent two pin holes apart from d
2＞1.5r
2
The coherence factor σ of step 3, adjusting illuminator 〉=1;
Step 4, mobile object space mask plate make on the visual field point K that is centered close to projection lens of lithography machine of square pinhole array A, and be mobile as square mask plate, and the picture on the image planes of projection lens of lithography machine overlaps with square pinhole array A to make square hole B; With the interferogram P that obtains in photodetector this moment
KBe stored in storer;
Step 5, mobile object space mask plate make on the visual field point K that is centered close to projection lens of lithography machine of square hole A, and be mobile as square mask plate, and the picture on the image planes of projection lens of lithography machine overlaps with square hole A to make square pinhole array B; With the interferogram Q that obtains in photodetector this moment
KBe stored in storer;
Step 6, utilize Fourier pair interferogram P
KAnd Q
KProcess, obtain wave aberration
With
Described
Contain projection objective visual field point K wave aberration
Systematic error with on-line measuring device
Described
The systematic error that contains on-line measuring device
With wave aberration
Deduct wave aberration
And then the wave aberration of acquisition projection objective visual field point K
The length of side a of square hole A of the present invention
1≤ pf/4zm
*, the length of side a of square hole B
2=a
1M
*≤ pf/4z, wherein, p is the cycle of shear in litho machine, f is that focal length, the z of collimator objective in litho machine is the spacing between shear and photodetector.
The wave aberration of obtaining of the present invention
With
For: utilize the polynomial wavefront reconstruction algorithm of difference Ze Nike zernike to obtain wave aberration
With
The polynomial wavefront reconstruction algorithm of difference Ze Nike zernike that utilizes of the present invention obtains wave aberration
With
Concrete steps be:
Step 501, from P
KAnd Q
KObtain respectively the effective coverage, and continuation is square effective interferogram P '
KAnd Q '
K
Step 502, the effective interferogram P ' of square shaped
KAnd Q '
KCarry out Fourier transform, obtain P '
KAnd Q '
KSpectrum distribution; And further from P '
KSpectrum distribution in extract x, y direction+1 grade of frequency spectrum
With
From Q '
KSpectrum distribution in extract x, y direction+1 grade of frequency spectrum
With
Step 503, right respectively
And
Carry out inverse Fourier transform and phase unwrapping, obtain the difference wavefront information of x, y direction;
Step 504, utilize based on the polynomial wavefront reconstruction algorithm of difference zernike P '
KCorresponding difference wavefront information is reconstructed, and then obtains to comprise projection objective visual field point K wave aberration with 37 zernike polynomial repressentations
Systematic error with on-line measuring device
Wave aberration
Utilization based on the polynomial wavefront reconstruction algorithm of difference zernike to Q '
KCorresponding difference wavefront information is reconstructed, and then obtains the systematic error that is included in line detector with 37 zernike polynomial repressentations
Wave aberration
Beneficial effect
The present invention adopts the object space mask plate that is provided with square pinhole array, produces desirable spherical wave by square pinhole array, has eliminated the impact that illuminator detects wave aberration of photo-etching machine projection objective, thereby has further improved accuracy of detection.
Secondly, utilize the system error self-calibration of pinhole array filtering, by place square hole and image planes placement pinhole array at the object plane of projection lens of lithography machine, when guaranteeing the exposure light source utilization factor, realized the spatial filtering to the residual aberration of illuminator to be measured and projection objective wave aberration, can be quick, the wave aberration of high-precision separation projection objective and the systematic error of on-line measuring device.
Again, utilize Fourier Transform Technique the single width interferogram is processed and utilized based on difference zernike Technology of Wave-front Reconstruction x, the difference wavefront of y direction is reconstructed, due to Fourier Transform Technique have advantages of high precision and processing speed fast, therefore can be quick, the wave aberration information of high-precision acquisition projection objective.
Description of drawings
Fig. 1 is the litho machine of the embodiment of the present invention and the schematic diagram of on-line measuring device.
Fig. 2 is the process flow diagram of online test method of the present invention.
Fig. 3 is the structural representation of object space mask plate of the present invention.
Fig. 4 is that the present invention is as the structural representation of square mask plate.
Wherein, 101-exposure light source, 102-illuminator, 103-mask plate, 104-object space work stage, 105-projection objective, 106-silicon chip, 107-picture side work stage; 201-object space mask plate, 202-picture side mask plate, 203-collimator objective, 204-shear, 205-axial-adjustment unit, 206-photodetector, 207-storer, 208-arithmetical unit, 209-controller.
Embodiment
Below in conjunction with accompanying drawing, the present invention is described in further detail.
At first set forth the structure composition and working principle of litho machine:
Litho machine comprises exposure light source 101, illuminator 102, mask plate 103, object space work stage 104, projection objective 105, silicon chip 106 and picture side's work stage 107; The light that exposure light source 101 sends is radiated on mask plate 103 through after illuminator 102, and by projection objective 105, in the mode of stepping-scanning, reduced projection realizes the transfer of pattern on the silicon chip 106 that scribbles photoresist with the pattern on mask plate 103.Exposure light source 101 is about the ArF excimer laser of 193nm or the KrF excimer laser that wavelength is about 248nm for wavelength.Illuminator 102 has extensible beam, regulate that light beam turns to, the optical element of shape, and the optical element of adjusting illumination uniformity and adjusting illumination coherence factor, illumination has comparatively ideal homogeneity at the light beam on mask plate 103 in projection objective 105 field ranges like this.The mask plate 103 that is carved with pattern to be transferred is supported and is driven by object space work stage 104; The silicon chip 106 that scribbles photoresist is supported and is driven by picture side's work stage 107.Mask plate 103 and silicon chip 106 are positioned on the optical conjugate face of projection objective 105.Object space work stage 104 and being synchronized with the movement with different speed as square work stage 107, in the mode of stepping-scanning with the pattern on mask plate 103, by projection objective 105 accurately projection transfer on the silicon chip 106 that scribbles photoresist.
The present invention realizes the online detection to 105 each visual field point wave aberrations of projection objective in litho machine by the projection objective wave aberration on-line detection method of integrated a kind of system error self-calibration on litho machine.As shown in Figure 1, the device that uses of described online test method comprises: object space mask plate 201, as square mask plate 202, collimator objective 203, shear 204, axial-adjustment unit 205, photodetector 206, storer 207, arithmetical unit 208, controller 209;
concrete annexation is: object space mask plate 201 is arranged on the object space worktable 104 of litho machine projection objective 105, support and drive by object space worktable in litho machine 104, be arranged in as square mask plate 202 on picture side's worktable 107 of litho machine projection objective 105, support and drive by picture side's worktable in litho machine 107, after collimator objective 203 is positioned at the image planes of projection objective 105, and the object space focal plane of collimator objective 203 overlaps with the image planes of projection objective 105, photodetector 206 is positioned at projection objective 105 emergent pupil conjugate plane places, shear 204 is between projection objective 105 and photodetector 206, and by axial-adjustment unit 205 fixed supports, storer 207 respectively with photodetector 206, arithmetical unit 208 and controller 209 are connected, controller 209 is respectively with the object space worktable in litho machine, picture side's worktable, illuminator and axial-adjustment unit 205 etc. are connected.
As shown in Figure 2, the concrete steps of online test method of the present invention are:
Step 1, as shown in Figure 3 arranges square pinhole array A and square hole A on object space mask plate 201, the pinhole diameter r1 on square pinhole array A is less than the object space diffraction limit size of projection lens of lithography machine 105, as formula (1)
r
1＜0.61λm
×/NA
i (1)
Wherein, λ is the wavelength that exposure light source 101 sends light wave, NA
iBe the picture number formulary value aperture of projection objective 105, m
*Reduction magnification for projection objective 105.
In square pinhole array A, the distance of center circle of first pin hole of every row and last pin hole is l
1=a
1-r
1, a
1Be the length of side of square hole A, as formula (2)
a
1≤pf/4zm
× (2)
Wherein p is the cycle of shear 204, and f is that focal length, the z of collimator objective 203 is the spacing between shear 204 and photodetector 206.Square pinhole array A goes up between every adjacent two pin holes apart from d
1＞1.5r
1, the better d that chooses
1=2r
1
Step 2, as shown in Figure 4 arranges square hole B and square pinhole array B, the pinhole diameter r on square pinhole array B on as square mask plate 202
2Less than picture side's diffraction limit size of projection lens of lithography machine 105, as formula (3)
r
2＜0.61λ/NA
i (3)
In square pinhole array B, the distance of center circle of first pin hole of every row and last pin hole is l
2=a
2-r
2, a
2Be the length of side of square hole B, as formula (4)
a
2＝a
1·m
×≤pf/4z (4)
Described square pinhole array B goes up between every adjacent two pin holes apart from d
2＞1.5r
2, the better d that chooses
2=2r
2
The coherence factor σ of step 3, adjusting illuminator 102 〉=1.If the coherence factor 0≤σ of illuminator 102＜1, light that exposure light source 101 sends is through after illuminator 102, can interferes between the ideal ball ground roll that is produced by upper each pin hole of square pinhole array A, and then affect measurement result; Thereby in order to make light beam that exposure light source 101 sends through after illuminator 102, the object plane of incoherent Uniform Illumination projection objective 105 in projection objective 105 true field scopes is regulated the coherence factor σ of illuminator 102 〉=1.
Step 4, utilize controller 209 to drive object space work stage 104, the center of square pinhole array A on object space mask plate 201 is moved on the visual field point K of projection objective 105 in litho machine, simultaneously, utilize controller 209 to drive as square work stage 107, looking like on the image planes of projection objective 105 overlaps with square pinhole array A to make square hole B on picture side mask plate 202.Due to the diameter of each pin hole in square pinhole array A all less than the object space diffraction limit size of projection objective 105, so each pin hole in square pinhole array A all can be diffracted into desirable spherical wave with the incident light wave that contains illuminator 102 residual aberrations, thereby has eliminated the residual aberration of illuminator 102.After inciding square hole B from the light wave of square pinhole array A through projection objective 105 this moment, through collimator objective 203 and shear 204, form interferogram P in photodetector 206
K, with P
KBe stored in storer 207.
Step 5, utilize controller 209 to drive object space work stage 104, the center of square hole A on object space mask plate 201 is moved on the visual field point K of projection objective 105 in litho machine, simultaneously, utilize controller 209 to drive as square work stage 107, looking like on the image planes of projection objective 105 overlaps with square hole A to make square pinhole array B on picture side mask plate 202.due to each pinhole diameter in square pinhole array B all less than picture side's diffraction limit size of projection objective 105, after inciding square pinhole array B from the light wave that includes photo-etching machine illumination system 102 residual aberrations of square hole A through projection objective 105, in square pinhole array B, each pin hole all can be diffracted into desirable spherical wave with containing the residual aberration of illuminator 102 and the incident light wave of projection objective 105 visual field point K wave aberrations, thereby eliminated the wave aberration of residual aberration and the projection objective 105 visual field point K of illuminator 102, be that policy hole array B realizes good spatial filtering effect to the residual aberration of illuminator 102 and the wave aberration of projection objective 105 visual field point K.After ideal ball ground roll process collimator objective 203 and shear 204 that in aforementioned square pinhole array B, each pin hole diffraction produces, form interferogram Q in photodetector 206
K, with Q
KBe stored in storer 207.
Step 6, utilize Fourier pair interferogram P
KProcess, and utilize the polynomial wavefront reconstruction algorithm of difference zernike to obtain to comprise projection objective 105 visual field point K wave aberrations
Systematic error with on-line measuring device
Wave aberration
Utilize Fourier pair interferogram Q
KProcess, and utilize the polynomial wavefront reconstruction algorithm of difference zernike to obtain the systematic error that is included in line detector
Wave aberration
With wave aberration
Deduct wave aberration
And then the wave aberration of acquisition projection objective 105 visual field point K
Fourier Transform Technique is the important technology of processing the single width interferogram, and this technology has advantages of that precision is high, processing speed is fast.Due to the self property of Fourier transform, the effective coverage that requires Fourier transform to process interferogram is square region, otherwise will introduce larger process errors.Utilize Fourier Transform Technique in the present embodiment and utilize based on the polynomial wavefront reconstruction algorithm of difference Ze Nike (zernike), interferogram to be processed and obtain wave aberration, being not limited in but the present invention obtains the method for wave aberration the method for taking in the present embodiment.
The concrete steps of obtaining the method for wave aberration in the present embodiment are:
Step 501, from P
KAnd Q
KObtain respectively the effective coverage, and continuation is square effective interferogram P '
KAnd Q '
K
Step 502, the effective interferogram P ' of square shaped
KAnd Q '
KCarry out Fourier transform, obtain P '
KAnd Q '
KSpectrum distribution, and further from P '
KSpectrum distribution in extract x, y direction+1 grade of frequency spectrum
With
From Q '
KSpectrum distribution in extract x, y direction+1 grade of frequency spectrum
With
Step 503, right respectively
And
Carry out inverse Fourier transform and phase unwrapping, obtain the difference wavefront information of x, y direction;
Step 504, utilize based on the polynomial wavefront reconstruction algorithm of difference Ze Nike (zernike) P '
KCorresponding difference wavefront information is reconstructed, and then obtains to comprise projection objective 105 visual field point K wave aberrations with 37 zernike polynomial repressentations
Systematic error with on-line measuring device
Wave aberration
Utilization based on the polynomial wavefront reconstruction algorithm of difference zernike to Q '
KCorresponding difference wavefront information is reconstructed, and then obtains the systematic error that is included in line detector with 37 zernike polynomial repressentations
Wave aberration
Described the specific embodiment of the present invention although combine accompanying drawing, to those skilled in the art, under the prerequisite that does not break away from the principle of the invention, can also make some distortion and improvement, these also should be considered as belonging to protection scope of the present invention.
Claims (3)
1. the photo-etching machine projection objective wave aberration on-line detection method of a system error self-calibration, is characterized in that, concrete steps are:
Step 1, square pinhole array A and square hole A are set, the pinhole diameter r on square pinhole array A on the object space mask plate
1Less than the object space diffraction limit size of projection lens of lithography machine, and in square pinhole array A, the distance of center circle of first pin hole of every row and last pin hole is l
1=a
1-r
1, a
1Be the length of side of square hole A, described square pinhole array A goes up between every adjacent two pin holes apart from d
1＞1.5r
1
Step 2, square hole B and square pinhole array B are set, the pinhole diameter r on square pinhole array B on as square mask plate
2Less than picture side's diffraction limit size of projection lens of lithography machine, and in square pinhole array B, the distance of center circle of first pin hole of every row and last pin hole is l
2=a
2-r
2, a
2Be the length of side of square hole B, described square pinhole array B goes up between every adjacent two pin holes apart from d
2＞1.5r
2
The coherence factor σ of step 3, adjusting illuminator 〉=1;
Step 4, mobile object space mask plate make on the visual field point K that is centered close to projection lens of lithography machine of square pinhole array A, and be mobile as square mask plate, and the picture on the image planes of projection lens of lithography machine overlaps with square pinhole array A to make square hole B; With the interferogram P that obtains in photodetector this moment
KBe stored in storer;
Step 5, mobile object space mask plate make on the visual field point K that is centered close to projection lens of lithography machine of square hole A, and be mobile as square mask plate, and the picture on the image planes of projection lens of lithography machine overlaps with square hole A to make square pinhole array B; With the interferogram Q that obtains in photodetector this moment
KBe stored in storer;
Step 6, utilize Fourier pair interferogram P
KAnd Q
KProcess, and utilize the polynomial wavefront reconstruction algorithm of difference Ze Nike zernike to obtain wave aberration
With
Described
Contain projection objective visual field point K wave aberration
Systematic error with on-line measuring device
Described
The systematic error that contains on-line measuring device
With wave aberration
Deduct wave aberration
And then the wave aberration of acquisition projection objective visual field point K
2. the photo-etching machine projection objective wave aberration on-line detection method of system error self-calibration according to claim 1, is characterized in that, the length of side a of described square hole A
1≤ pf/4zm
*, the length of side a of square hole B
2=a
1M
*≤ pf/4z, wherein, p is the cycle of shear in litho machine, f is that focal length, the z of collimator objective in litho machine is the spacing between shear and photodetector, m
*Reduction magnification for projection objective.
3. the photo-etching machine projection objective wave aberration on-line detection method of system error self-calibration according to claim 1, is characterized in that, the described polynomial wavefront reconstruction algorithm of difference Ze Nike zernike that utilizes obtains wave aberration
With
Concrete steps be:
Step 501, from P
KAnd Q
KObtain respectively the effective coverage, and continuation is square effective interferogram
With
Step 502, the effective interferogram of square shaped
With
Carry out Fourier transform, obtain
With
Spectrum distribution; And further from
Spectrum distribution in extract x, y direction+1 grade of frequency spectrum
With
From
Spectrum distribution in extract x, y direction+1 grade of frequency spectrum
With
Step 503, right respectively
And
Carry out inverse Fourier transform and phase unwrapping, obtain the difference wavefront information of x, y direction;
Step 504, utilize based on the polynomial wavefront reconstruction algorithm of difference zernike pair
Corresponding difference wavefront information is reconstructed, and then obtains to comprise projection objective visual field point K wave aberration with 37 zernike polynomial repressentations
Systematic error with on-line measuring device
Wave aberration
Utilization is based on the polynomial wavefront reconstruction algorithm of difference zernike pair
Corresponding difference wavefront information is reconstructed, and then obtains the systematic error that is included in line detector with 37 zernike polynomial repressentations
Wave aberration
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| KR102148198B1 (en) * | 2012-05-30 | 2020-08-26 | 가부시키가이샤 니콘 | Method and device for measuring wavefront, and exposure method and device |
| CN104777717B (en) * | 2014-01-10 | 2017-04-12 | 上海微电子装备有限公司 | Image quality compensation mechanism used for photoetching equipment projection objective |
| CN105022232B (en) * | 2014-04-15 | 2017-12-29 | 上海微电子装备（集团）股份有限公司 | The error calibrating method of wave aberration measurement apparatus |
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