CN108333879A - A kind of projection objective aberration correcting mechanism and method - Google Patents
A kind of projection objective aberration correcting mechanism and method Download PDFInfo
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- CN108333879A CN108333879A CN201710035870.6A CN201710035870A CN108333879A CN 108333879 A CN108333879 A CN 108333879A CN 201710035870 A CN201710035870 A CN 201710035870A CN 108333879 A CN108333879 A CN 108333879A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
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- General Physics & Mathematics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a kind of projection objective aberration correcting mechanism and methods, array reflecting mirror, mechanism for testing, controller and the adjustment mechanism formed including projection objective, in the projection objective light path and by several mutually independent discrete distorting lens, the image quality data of projection objective under the mechanism for testing detection specific wavelength, the controller obtains the adjustment amount of each discrete distorting lens on array reflecting mirror according to obtained image quality data are measured, and the adjustment mechanism carries out vertical adjustment according to the adjustment amount to each discrete distorting lens.The adjustment amount of each discrete distorting lens in reflection mirror array is obtained according to the image quality data of projection objective, vertical adjustment is carried out to it according to the adjustment amount of each discrete distorting lens by adjusting mechanism, to obtain required face type, the present invention can generate any reflector type and crosstalk is not present, complicated face type need not be processed, processing cost is reduced, compensation range is big, and control accuracy is high.
Description
Technical field
The present invention relates to technical field of lithography, and in particular to a kind of projection objective aberration correcting mechanism and method.
Background technology
In semiconductor packaging, there is high-resolution, big for manufacturing the lithographic objective of IC chip usually
Depth of focus is to realize the preparation of highly integrated chip.Meanwhile also requiring the optical imaging system of projection exposure that there is good picture
Matter compensation ability, to meet the image quality requirement of exposure area when prepared by chip.As lithographic imaging technique is continuously improved, chip
Characteristic size is more harsh to the aberration requirement generated in optical system while continuous reduce.Therefore, improve optics at
It is the key factor for preparing the good chip of comprehensive performance as system image quality quality.
The resetting difficulty of current preceding road photoetching projection objective lens is big, and under exposure status the thermal deformation of photoetching projection objective lens and
Aberration is big caused by heat is sold off, and is difficult compensation.Photoetching projection objective lens image quality compensation situation is mainly the following：
When using selection compensator, i.e., by select movable lens fuel factor is compensated, but movable lens for
The compensation ability of asymmetry aberration is poor, can compensate for item and more limits to, and cannot be satisfied the ability for compensating all aberrations.
Second is that increasing thermal resistance mechanism in lens edge, make high heat position that there is high thermal conductivity, position low in calories has
Low thermal conductivity, to become with symmetrical thermal deformation and heat refraction, is drawn simultaneously to which lens surface has symmetrical heat distribution
Symmetrical aberration profile is played, but since the control temperature difference is larger, causes control difficulty big.
Third, arranging conducting wire on lens, changes eyeglass face type by way of resistive heater and reach aberration compensation mesh.
In order to not influence image quality quality, the diameter of resistance wire needs to be less than 1 micron.The technology is used in 1.35NA optical systems, is used for
Improve asymmetrical heat distribution of the asymmetrical light illumination mode near the pupil on eyeglass.But how conducting wire is integrated into eyeglass to work as
In, while it is larger by difficulty not influence incident light；Also there is larger difficulty in terms of controller and driver simultaneously.
Fourth, installing film piezo-electric unit on the mirror, change eyeglass face type by way of reinforcing.Mirror shape
Control is detected by Mechanical Driven (Piezoelectric Driving) and Real time position sensors, to accurately and quickly react aberration control
System.The technology is used in 1.35NA optical systems.But aberration is corrected to change face type by film piezo-electric unit, need to be increased very much
Cooling device, temperature control equipment and temperature-detecting device cause the structure of whole device more complicated.
Fuel factor is compensated fifth, generating different face types by the angle of rotation thermal compensation group and flat sheet combination, but
The special lens face type processing of thermal compensation group and detection difficulty are high.
It is deformed upon sixth, generating outer power drive eyeglass by active variant mechanism (ALE), changes eyeglass face type, realize heat
Effect compensating, but can compensate for item and more limit to.
Invention content
The present invention provides a kind of projection objective aberration correcting mechanism and methods, to solve compensation existing in the prior art
Energy force difference, can compensate for item and more limits to, and control difficulty is big and eyeglass face type is processed and the high problem of detection difficulty.
In order to solve the above-mentioned technical problem, the technical scheme is that：A kind of projection objective aberration correcting mechanism, including
Projection objective reflects in the projection objective light path and by the array that several mutually independent discrete distorting lens form
Mirror, mechanism for testing, controller and adjustment mechanism, the mechanism for testing detect the image quality data of projection objective under specific wavelength, institute
The adjustment amount that controller obtains each discrete distorting lens on array reflecting mirror according to the image quality data that measurement obtains is stated, it is described
Adjustment mechanism carries out vertical adjustment according to the adjustment amount to each discrete distorting lens.
Further, the projection objective includes the first speculum arranged in a crossed manner, the second speculum and set on described
The first lens to the 6th lens being arranged in order below first speculum and the second speculum and from top to bottom.
Further, the array reflecting mirror is set to the aperture stop position below the 6th lens.
Further, several discrete distorting lens are arranged in array, and each discrete distorting lens is the length of side
The center spacing of the square of 50um, the two neighboring discrete distorting lens is 75um.
Further, the discrete distorting lens is plane mirror, and the array reflecting mirror is rounded.
Further, the controller is microcontroller, PLC or MCU.
Further, the adjustment mechanism uses piezoelectric ceramic actuator.
The present invention also provides a kind of aberration correcting methods of projection objective, include the following steps：
S1：The image quality of projection objective is detected by mechanism for testing；
S2:Each zernike coefficients are calculated under full filed with visual field according to the image quality data that detection obtains in controller
The constant term of distribution, and it is translated into the adjustment amount of each discrete distorting lens on array reflecting mirror；
S3:Adjustment mechanism drives each discrete distorting lens to be adjusted according to corresponding adjustment amount, to generate new face
Type；
S4：Repeat the above steps S1-S3, until each zernike coefficients become with the constant term that visual field is distributed under full filed
In 0.
Further, it is specially the number for measuring the corresponding zernike coefficients 1 to 37 of the multiple points of image planes in the step S1
Value.
Further, the step S2 includes the following steps：
S21：Go out each zernike coefficients according to the numerical computations of the corresponding zernike coefficients 1 to 37 of the multiple points of image planes
The constant term being distributed with visual field；
S22：By the constant term data divided by test wavelength and negate to obtain the adjustment of the zernike item demands at aperture diaphragm
Amount；
S23：Zernike demand adjustment amounts at above-mentioned aperture diaphragm are corresponding with each discrete distorting lens coordinate
Zernike multiplications are multiplied by test wavelength and obtain the corresponding wavelength adjustment amount of each discrete distorting lens after summation；
Further, further include that the corresponding wavelength adjustment amount of each discrete distorting lens is multiplied by survey in the step S23
Examination wavelength obtains corresponding adjustment of displacement amount as final adjustment amount.
Projection objective aberration correcting mechanism provided by the invention and method, including projection objective, be set to the projection objective
Array reflecting mirror, mechanism for testing, controller and the adjustment formed in light path and by several mutually independent discrete distorting lens
Mechanism, the mechanism for testing detect the image quality data of projection objective under specific wavelength, the picture that the controller is obtained according to measurement
Prime number is according to the adjustment amount for obtaining each discrete distorting lens on array reflecting mirror, and the adjustment mechanism is according to the adjustment amount pair
Each discrete distorting lens carries out vertical adjustment.Each discrete in reflection mirror array is obtained according to the image quality data of projection objective
The adjustment amount of distorting lens carries out vertical adjustment according to the adjustment amount of each discrete distorting lens by adjusting mechanism to it, with
To required face type, the present invention can generate any reflector type and crosstalk is not present, and need not process extremely complex face type,
Processing cost is reduced, can compensate for zernike coefficients in the constant term aberration of Z5 and Z5 or more, compensation range is big, control accuracy
It is high.
Description of the drawings
Fig. 1 is the structural schematic diagram of projection objective aberration correcting mechanism in a specific embodiment of the invention；
Fig. 2 a are the structural schematic diagrams of array reflecting mirror in a specific embodiment of the invention；
Fig. 2 b are the enlarged drawings at A in Fig. 2 a；
Fig. 3 is the light path schematic diagram of projection objective in a specific embodiment of the invention；
Fig. 4 is the corresponding Z5 of the preceding 120 visual fields point of adjustment, the numerical curve figure of Z6 in a specific embodiment of the invention；
Fig. 5 is the corresponding Z7 of the preceding 120 visual fields point of adjustment, the numerical curve figure of Z8 in a specific embodiment of the invention；
Fig. 6 is the numerical curve figure of the corresponding Z9 of the preceding 120 visual fields point of adjustment in a specific embodiment of the invention；
Fig. 7 is the numerical curve figure of the corresponding Z12 of the preceding 120 visual fields point of adjustment in a specific embodiment of the invention；
Fig. 8 is the numerical curve figure of the corresponding Z25 of the preceding 120 visual fields point of adjustment in a specific embodiment of the invention；
Fig. 9 a, 9b are each discrete distorting lens under relative coordinate and actual coordinate in an of the invention specific embodiment respectively
Adjustment amount；
Figure 10 a are the corresponding Z5 of 120 visual field points after being adjusted in a specific embodiment of the invention, the numerical curve figure of Z6；
Figure 10 b are the corresponding Z7 of 120 visual field points after being adjusted in a specific embodiment of the invention, the numerical curve figure of Z8；
Figure 10 c are the numerical curve figures of the corresponding Z9 of 120 visual field points after being adjusted in a specific embodiment of the invention；
Figure 10 d are the numerical curve figures of the corresponding Z12 of 120 visual field points after being adjusted in a specific embodiment of the invention；
Figure 10 e are the numerical curve figures of the corresponding Z25 of 120 visual field points after being adjusted in a specific embodiment of the invention.
As shown in the figure：1, array reflecting mirror；11, discrete distorting lens；2, mechanism for testing；3, controller；4, machine is adjusted
Structure；5, the first speculum；6, the second speculum；The lens of 71~76, first lens~the 6th；8, object space position；9, image space position；
10, projection objective.
Specific implementation mode
The present invention is described in detail below in conjunction with the accompanying drawings：
As shown in Figs. 1-3, it the present invention provides a kind of projection objective aberration correcting mechanism, including projection objective 10, is set to
Array reflecting mirror 1, the test machine being made of several mutually independent discrete distorting lens 11 in 10 light path of the projection objective
Structure 2, controller 3 and adjustment mechanism 4, the mechanism for testing 2 detect the image quality data of projection objective 10 under specific wavelength, the control
Device 3 processed obtains the adjustment amount of each discrete distorting lens 11 on array reflecting mirror 1 according to obtained image quality data are measured, described
Adjustment mechanism 4 carries out vertical adjustment according to the adjustment amount to each discrete distorting lens 11.Specifically, the picture of projection objective 10
Prime number measures the multiple points of image planes according to the process that can be indicated, therefore detected with zernike (Zelnick) multinomials and corresponds to
Zernike coefficients 1 to 37 numerical value, to fitting obtain the constant term of zernike coefficients, finally according to zernike systems
Number and the correspondence of wavelength provide the adjustment amount of each discrete distorting lens 11 in array reflecting mirror 1 to generate indicating panel,
To correct the aberration of projection objective 10.
As shown in figure 3, the projection objective 10 includes the first speculum 5 arranged in a crossed manner, the second speculum 6 and is set to
The first lens to the 6th lens 71~76 first speculum, 5 and second speculum 6 lower section and be from top to bottom arranged in order,
The array reflecting mirror 1 is set to the aperture stop position of 76 lower section of the 6th lens.The emergent light of lighting system irradiates
On object space position 8, pass through the first speculum 5, the first lens 71, the second lens 72, the successively by the light of object space position 8
The array reflecting mirror 1 being radiated at after three lens 73, the 4th lens 74, the 5th lens 75, the 6th lens 76 below aperture diaphragm
On, reflected light passes sequentially through the 6th lens 76, the 5th lens 75, the 4th lens 74, the third lens 73, the second lens 72, first
It is reached at image space position 9 after lens 71, the second speculum 6.Under exposure status in photoetching projection objective lens above-mentioned eyeglass thermal deformation
And heat sells off the face that aberration caused by the alignment error of caused aberration and projection objective 10 passes through change array reflecting mirror 1
Type is compensated and is corrected.
As illustrated in figures 2 a-2b, several discrete distorting lens 11 are arranged in array, each discrete distorting lens
11 be the square of length of side 50um, and the center spacing of the two neighboring discrete distorting lens 11 is 75um；The discrete becomes
Shape mirror 11 is plane mirror, and the array reflecting mirror 1 is rounded, i.e., several discrete distorting lens 11 are spliced to form a circle
The array reflecting mirror 1 of shape.
Preferably, the controller 3 be microcontroller, PLC or MCU, for be fitted zernike coefficients constant term and basis
The correspondence of zernike coefficients and wavelength provides the adjustment amount of each discrete distorting lens 11 in array reflecting mirror 1.
Preferably, the adjustment mechanism 4 uses piezoelectric ceramic actuator, according to each discrete distorting lens being calculated
11 adjustment amount, which drives it to carry out vertical adjustment, makes array reflecting mirror 1 form new face type, to the aberration to projection objective
It is corrected.
Originally it returns and provides a kind of aberration correcting method of projection objective, include the following steps：
S1：The image quality of projection objective 10 is detected by mechanism for testing 2, the image quality data of projection objective 10 can be used
Zernike (Zelnick) multinomials measure the corresponding zernike coefficients of the multiple points of image planes come the process for indicating, therefore detecting
1 to 37 numerical value, wherein zernike coefficients are specific as follows：
Z1=1；
Z2=x；
Z3=y；
Z4=-1+2* (x.^2+y.^2)；
Z5=x.^2-y.^2；
Z6=2*x.*y；
Z7=-2*x+3*x.* (x.^2+y.^2)；
Z8=-2*y+3*y.* (x.^2+y.^2)；
Z9=1-6* (x.^2+y.^2)+6* (x.^2+y.^2) .^2；
Z10=x.^3-3*x.*y.^2；
Z11=3*x.^2.*y-y.^3；
Z12=-3*x.^2+3*y.^2+4*x.^2.* (x.^2+y.^2) -4*y.^2.* (x.^2+y.^2)；
Z13=-6*x.*y+8*x.*y.* (x.^2+y.^2)；
Z14=3*x-12*x.* (x.^2+y.^2)+10*x.* (x.^2+y.^2) .^2；
Z15=3*y-12*y.* (x.^2+y.^2)+10*y.* (x.^2+y.^2) .^2；
Z16=-1+12* (x.^2+y.^2) -30* (x.^2+y.^2) .^2+20* (x.^2+y.^2) .^3；
Z17=x.^4-6*x.^2.*y.^2+y.^4；
Z18=4*x.^3.*y-4*x.*y.^3；
Z19=-4*x.^3+12*x.*y.^2+5*x.^3.* (x.^2+y.^2) .^2-15*x.*y.^2.* (x.^2+y.^
2)；
Z20=-12*x.^2.*y+4*y.^3+15*x.^2.*y.* (x.^2+y.^2) -5*y.^3.* (x.^2+y.^2)；
Z21=6*x.^2-6*y.^2-20*x.^2.* (x.^2+y.^2)+20*y.^2.* (x.^2+y.^2)+15*x.^2.* (x.
^2+y.^2).^2-15*y.^2.*(x.^2+y.^2).^2；
Z22=12*x.*y-40*x.*y.* (x.^2+y.^2)+30*x.*y.* (x.^2+y.^2) .^2；
Z23=-4*x+30*x.* (x.^2+y.^2) -60*x.* (x.^2+y.^2) .^2+35*x.* (x.^2+y.^2) .^3；
Z24=-4*y+30*y.* (x.^2+y.^2) -60*y.* (x.^2+y.^2) .^2+35*y.* (x.^2+y.^2) .^3；
Z25=1-20* (x.^2+y.^2)+90* (x.^2+y.^2) .^2-140* (x.^2+y.^2) .^3+70* (x.^2+y.^2)
.^4；
Z26=x.^5-10*x.^3.*y.^2+5*x.*y.^4；
Z27=5*x.^4.*y-10*x.^2.*y.^3+y.^5；
Z28=-5*x.^4+30*x.^2.*y.^2-5*y.^4+6*x.^4.* (x.^2+y.^2) -36*x.^2.*y.^2.* (x.^2
+y.^2).^2+6*y.^4.*(x.^2+y.^2)；
Z29=-20*x.^3.*y+20*x.*y.^3+24*x.^3.*y.* (x.^2+y.^2) -24*x.*y.^3.* (x.^2+y.^
2)；
Z30=10*x.^3-30*x.*y.^2-30*x.^3.* (x.^2+y.^2)+90*x.*y.^2.* (x.^2+y.^2)+21*
x.^3.*(x.^2+y.^2).^2-63*x.*y.^2.*(x.^2+y.^2).^2；
Z31=30*x.^2.*y-10*y.^3-90*x.^2.*y.* (x.^2+y.^2)+30*y.^3.* (x.^2+y.^2)+63*
x.^2.*y.*(x.^2+y.^2).^2-21*y.^3.*(x.^2+y.^2).^2；
Z32=-10*x.^2+10*y.^2+60*x.^2.* (x.^2+y.^2) -60*y.^2.* (x.^2+y.^2) -105*x.^2.
*(x.^2+y.^2).^2+105*y.^2.*(x.^2+y.^2).^2+56*x.^2.*(x.^2+y.^2).^3-56*
y.^2.*(x.^2+y.^2).^3；
Z33=-20*x.*y+120*x.*y.* (x.^2+y.^2) -210*x.*y.* (x.^2+y.^2) .^2+112*x.*y.* (x
.^2+y.^2).^3；
Z34=5*x-60*x.* (x.^2+y.^2)+210*x.* (x.^2+y.^2) .^2-280*x.* (x.^2+y.^2) .^3+12
6*x.*(x.^2+y.^2).^4；
Z35=5*y-60*y.* (x.^2+y.^2)+210*y.* (x.^2+y.^2) .^2-280*y.* (x.^2+y.^2) .^3+12
6*y.*(x.^2+y.^2).^4；
Z36=-1+30* (x.^2+y.^2) -210* (x.^2+y.^2) .^2+560* (x.^2+y.^2) .^3-630* (x.^2+y.
^2).^4+252*(x.^2+y.^2).^5；
Z37=x.^6-15*x.^4.*y.^2+15*x.^2.*y.^4-y.^6；
Wherein ^ is power operation.
S2:Each zernike coefficients are calculated under full filed with visual field according to the image quality data that detection obtains in controller 3
The constant term of distribution, and it is translated into the adjustment amount of each discrete distorting lens 11 on array reflecting mirror 1；Including following step
Suddenly：
S21：Go out each zernike coefficients according to the numerical computations of the corresponding zernike coefficients 1 to 37 of the multiple points of image planes
The constant term being distributed with visual field；Specifically, the constant term main representative asymmetric aberration of Z5 in zernike coefficients, Z6, Z12,
The constant term main representative processing of Z7, Z8, Z9, Z16, Z25, aberration caused by adjustment, mainly for astigmatism item in the present embodiment
Z5, Z6, Z12；Coma item Z7, Z8；Spherical aberration item Z9, Z25 several is calculated, and 1-120 on minute surface is calculated in the present embodiment and is regarded
The corresponding above-mentioned several numerical value of site, test wavelength 405nm are as shown in Figure 4 the corresponding Z5 of each visual field point, Z6's
Numerical curve figure is as shown in Figure 5 the corresponding Z7 of each visual field point, the numerical curve figure of Z8, is each to regard as shown in Figure 6
The numerical curve figure of the corresponding Z9 of site is as shown in Figure 7 the numerical curve figure of the corresponding Z12 of each visual field point, in Fig. 8
It is shown the numerical curve figure of the corresponding Z25 of each visual field point, through Z5, Z6, Z7, Z8, Z9 can be calculated after over-fitting,
The value of the constant term of Z12, Z25.
S22：It is negated as aperture light by the value divided by 405nm of the zernike constant terms being calculated, and by obtained numerical value
Zernike demand adjustment amounts at door screen, result of calculation are as shown in the table：
1zernike demand adjustment amounts of table
S23：Zernike demand adjustment amounts at above-mentioned aperture diaphragm are corresponding with each 11 coordinate of discrete distorting lens
Zernike multiplications are multiplied by test wavelength and obtain 11 corresponding wavelength adjustment amount of each discrete distorting lens after summation；Certainly
Further include that 11 corresponding wavelength adjustment amount of each discrete distorting lens is multiplied by test wavelength to obtain corresponding adjustment of displacement amount work
For final adjustment amount.
For the zernike term coefficients in upper table, the calculating process of adjustment amount is：
Z5=2*x.*y；
Z6=-2*x+3*x.* (x.^2+y.^2)；
Z7=-2*y+3*y.* (x.^2+y.^2)；
Z8=1-6* (x.^2+y.^2)+6* (x.^2+y.^2) .^2；
Z9=x.^3-3*x.*y.^2；
Z12=-6*x.*y+8*x.*y.* (x.^2+y.^2)；
Z25=x.^5-10*x.^3.*y.^2+5*x.*y.^4；
Aaa=z5* (- 0.31)+z6* (- 0.31)+z7* (- 0.31)+z8* (- 0.31)+z9* (- 0.33)+z12* (-
0.3)+z25*(-0.32)；
Bbb=aaa*405；
Wherein x, y represent the coordinate of discrete distorting lens 11；Z5, z6, z7, z8, z9, z12, z25 represent zernike term systems
Number；Aaa represents wavelength adjustment amount (wavelength) of the discrete distorting lens 11 under opposite visual field；Bbb represents discrete distorting lens 11
In adjustment of displacement amount (nm) under opposite visual field 1, i.e., final adjustment amount；
The coordinate of wherein discrete distorting lens 11 is：Such as the discrete distorting lens 11 under relative coordinate (normalized coordinate)
Coordinate is (0.2, -0.2), (0.1,0.5), (0.3, -0.5), (0.7,0.7), if the radius of array reflecting mirror 1 is
74.5mm, thus corresponding actual coordinate be (14.8, -14.8), (7.4,37), (22.2, -37), (51.8,51.8), therefore
Actual adjustment amount is respectively -83.81nm, 128.71nm, 19.52nm, -329.78nm.
Need to adjust each discrete distorting lens 11 when actually adjusting array reflecting mirror 1, in the present embodiment, relative coordinate
With the adjustment amount under the adjustment amount and actual coordinate of each discrete distorting lens 11 under actual coordinate respectively as shown in Fig. 9 a, 9b.
S3:Adjustment mechanism 4 drives each discrete distorting lens 11 to be adjusted according to corresponding adjustment amount, to generate newly
Face type；In the present embodiment, array reflecting mirror 1 is adjusted according to the adjustment amount being calculated in Fig. 9 a, 9b.
S4：Repeat the above steps S1-S3, until each zernike coefficients become with the constant term that visual field is distributed under full filed
In 0.Continue to test image quality data later having adjusted, in the present embodiment, is measured for 1-120 visual field point in step S21
The numerical value of obtained z5, z6, z7, z8, z9, z12, z25 are as shown in Figure 10 a-10e.By can be seen that in figure, by adjusting at diaphragm
Deformation lens array can correct zernike items all in z5, z6, z7, z8, z9, z12, z25, and effect is fine, can be with
According to actual demand, adjusts in real time, such as need intense adjustment that need to repeat the above steps.
In conclusion projection objective aberration correcting mechanism provided by the invention and method, including projection objective 10, it is set to institute
Array reflecting mirror 1, the test machine stated in 10 light path of projection objective and be made of several mutually independent discrete distorting lens 11
Structure 2, controller 3 and adjustment mechanism 4, the mechanism for testing 2 detect the image quality data of projection objective 10 under specific wavelength, the control
Device 3 processed obtains the adjustment amount of each discrete distorting lens 11 on array reflecting mirror 1 according to obtained image quality data are measured, described
Adjustment mechanism 4 carries out vertical adjustment according to the adjustment amount to each discrete distorting lens 11.According to the image quality of projection objective 10
Data obtain the adjustment amount of each discrete distorting lens 11 in reflection mirror array, are deformed according to each discrete by adjusting mechanism
The adjustment amount of mirror 11 carries out vertical adjustment to it, and to obtain required face type, the present invention can generate any reflector type and not deposit
In crosstalk, and extremely complex face type need not be processed, reduce processing cost, can compensate for zernike coefficients Z5 and Z5 with
On constant term aberration, compensation range is big, and control accuracy is high.
Although embodiments of the present invention are illustrated in specification, these embodiments are intended only as prompting,
It should not limit protection scope of the present invention.It is equal that various omission, substitution, and alteration are carried out without departing from the spirit and scope of the present invention
It should be included within the scope of the present invention.
Claims (11)
1. a kind of projection objective aberration correcting mechanism, which is characterized in that including projection objective, by several mutually independent discretes
Array reflecting mirror, mechanism for testing, controller and the adjustment mechanism of distorting lens composition, the mechanism for testing detect under specific wavelength
The image quality data of projection objective, the controller are each discrete on obtained image quality data acquisition array reflecting mirror according to measuring
The adjustment amount of formula distorting lens, the adjustment mechanism carry out vertical adjustment according to the adjustment amount to each discrete distorting lens.
2. image quality compensation device according to claim 1, which is characterized in that the projection objective includes arranged in a crossed manner
It one speculum, the second speculum and is arranged in order below first speculum and the second speculum and from top to bottom
First lens to the 6th lens.
3. image quality compensation device according to claim 2, which is characterized in that the array reflecting mirror is set to the described 6th
Aperture stop position below lens.
4. projection objective aberration correcting mechanism according to claim 1, which is characterized in that several discrete distorting lens
It is arranged in array, the square that each discrete distorting lens is length of side 50um, the two neighboring discrete distorting lens
Center spacing be 75um.
5. projection objective aberration correcting mechanism according to claim 4, which is characterized in that the discrete distorting lens is flat
Face speculum, the array reflecting mirror are rounded.
6. projection objective aberration correcting mechanism according to claim 1, which is characterized in that the controller be microcontroller,
PLC or MCU.
7. projection objective aberration correcting mechanism according to claim 1, which is characterized in that the adjustment mechanism uses piezoelectricity
Ceramic driver.
8. a kind of aberration correcting method of projection objective, which is characterized in that include the following steps：
S1：The image quality of projection objective is detected by mechanism for testing；
S2:Controller is calculated under full filed each zernike coefficients according to the image quality data that detection obtains and is distributed with visual field
Constant term, and be translated into the adjustment amount of each discrete distorting lens on array reflecting mirror；
S3:Adjustment mechanism drives each discrete distorting lens to be adjusted according to corresponding adjustment amount, to generate new face type；
S4：Repeat the above steps S1-S3, until each zernike coefficients tend to 0 with the constant term that visual field is distributed under full filed.
9. the aberration correcting method of projection objective according to claim 8, which is characterized in that be specially in the step S1
Measure the numerical value of the corresponding zernike coefficients 1 to 37 of the multiple points of image planes.
10. the aberration correcting method of projection objective according to claim 8, which is characterized in that the step S2 include with
Lower step：
S21：According to the numerical computations of the corresponding zernike coefficients 1 to 37 of the multiple points of image planes go out each zernike coefficients with regarding
The constant term of field distribution；
S22：By the constant item data divided by test wavelength and negate to obtain the zernike item demand adjustment amounts at aperture diaphragm；
S23：Zernike demand adjustment amounts at above-mentioned aperture diaphragm are corresponding with each discrete distorting lens coordinate
Zernike multiplications are multiplied by test wavelength and obtain the corresponding wavelength adjustment amount of each discrete distorting lens after summation.
11. the aberration correcting method of projection objective according to claim 10, which is characterized in that in the step S23 also
Corresponding adjustment of displacement amount is obtained as most including the corresponding wavelength adjustment amount of each discrete distorting lens is multiplied by test wavelength
Whole adjustment amount.
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| EP1376192A2 (en) * | 2002-06-20 | 2004-01-02 | Nikon Corporation | Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system |
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| US20120224172A1 (en) * | 2010-12-10 | 2012-09-06 | Nikon Corporation | Optical components for use in measuring projection lens distortion or focus of an optical imaging system that images a substrate |
| WO2015150301A1 (en) * | 2014-04-04 | 2015-10-08 | Carl Zeiss Smt Gmbh | Method for aligning a mirror of a microlithographic projection exposure apparatus |
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|---|---|---|---|---|
| EP1376192A2 (en) * | 2002-06-20 | 2004-01-02 | Nikon Corporation | Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system |
| CN1603961A (en) * | 2003-09-22 | 2005-04-06 | Asml荷兰有限公司 | Lithographic apparatus and device manufacturing method |
| CN102236260A (en) * | 2010-04-27 | 2011-11-09 | 上海微电子装备有限公司 | Wave aberration correction system and method |
| US20120224172A1 (en) * | 2010-12-10 | 2012-09-06 | Nikon Corporation | Optical components for use in measuring projection lens distortion or focus of an optical imaging system that images a substrate |
| WO2015150301A1 (en) * | 2014-04-04 | 2015-10-08 | Carl Zeiss Smt Gmbh | Method for aligning a mirror of a microlithographic projection exposure apparatus |
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