CN102234783B - A target material pedestal and a film plating apparatus employing the target material pedestal - Google Patents
A target material pedestal and a film plating apparatus employing the target material pedestal Download PDFInfo
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- CN102234783B CN102234783B CN201010158840.2A CN201010158840A CN102234783B CN 102234783 B CN102234783 B CN 102234783B CN 201010158840 A CN201010158840 A CN 201010158840A CN 102234783 B CN102234783 B CN 102234783B
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- Prior art keywords
- target
- microscope carrier
- accommodation space
- rotation
- pedestal
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Abstract
The invention provides a target material pedestal used in a film plating apparatus. The target material pedestal comprises the following parts: a base which is fixed in the film plating apparatus; a rotation carrying platform which is arranged on the base and can rotate relatively to the base; a plurality of target stands which are arranged around the rotation carrying platform in a circle, wherein each side of the target stands facing the rotation carrying platform is provided with receiving space; and a plurality of target material parts which are arranged on the target stands through a rotating shaft, wherein the rotating shaft is connected with a rotation motor and both of them are accepted in the receiving space, and the rotation motor is used for controlling the rotating shaft to drive the target material parts to retract into the receiving space or extend out of the receiving space. The target material pedestal can control the rotating shaft to drive the target material parts to retract into the receiving space or extend out of the receiving space in a process of film plating, thus pollution of target material is avoided and work efficiency is raised. The invention also provides a film plating apparatus employing the target material pedestal.
Description
Technical field
The present invention relates to a kind of target pedestal and adopt the film coating apparatus of this target pedestal.
Background technology
Existing vacuum coating technology is generally to launch Ar+ particle by high voltage electrode, and Ar+ particle, at vacuum chamber inner impact target, makes target isolate atoms metal, and atoms metal is got on the surface of plated object and formed rete.Yet, because target atom is to multiple directions sputter, if the target of a plurality of differing materials is set in same vacuum chamber, will makes target mutually pollute, thereby affect coating quality.For fear of the pollution between target, a kind of target is only set in same vacuum chamber conventionally.Yet, during plating multilayer film, need to open vacuum chamber at every turn and change target, inefficiency, and easily make target oxidation by air.
Summary of the invention
In view of this, be necessary to provide a kind of film coating apparatus that can avoid the contaminated target pedestal of target and adopt this target pedestal.
A target pedestal, for a film coating apparatus.This target pedestal comprises: base station, is fixed in this film coating apparatus; Rotation microscope carrier, is arranged on base station and can rotates relative to this base station; A plurality of target stands, ring is located at around this rotation microscope carrier, and each target stand offers an accommodation space towards the one side of this rotation microscope carrier; And a plurality of target parts, it is arranged on a plurality of target stands by a turning axle correspondence respectively, described turning axle is connected with a rotation motor and is all housed in accommodation space, and described rotation motor is used for controlling this turning axle and drives these target parts be housed in accommodation space or stretch out from accommodation space.
A film coating apparatus, it comprises: shielding case, is formed with a vacuum cavity in it; And target pedestal, it is arranged in this vacuum cavity.This target pedestal comprises: base station, is fixed in this vacuum cavity; Rotation microscope carrier, is arranged on base station and can rotates relative to this base station; A plurality of target stands, ring is located at around this rotation microscope carrier, and each target stand offers an accommodation space towards the one side of this rotation microscope carrier; And a plurality of target parts, it is arranged on a plurality of target stands by a turning axle correspondence respectively, described turning axle is connected with a rotation motor and is all housed in accommodation space, and described rotation motor is used for controlling this turning axle and drives these target parts be housed in accommodation space or stretch out from accommodation space.
Compared with prior art, target pedestal of the present invention and the film coating apparatus that uses this target pedestal, by offer accommodation space on target pedestal, and target is movably connected on target pedestal, thereby can control target, when plated film, from accommodation space, stretch out to carry out plated film, and be again housed in accommodation space after plated film finishes.When plating multilayer film, this target pedestal can be avoided the pollution between target, and owing to can install the target of a plurality of differing materials simultaneously, all needs to open vacuum, thereby can increase work efficiency while avoiding plating different retes.
Accompanying drawing explanation
The three-dimensional exploded view of the target pedestal that Fig. 1 provides for embodiment of the present invention;
Fig. 2 is the three-dimensional assembly diagram of the target pedestal of Fig. 1;
Fig. 3 is the working state figure of the target pedestal of Fig. 1;
Fig. 4 for embodiment of the present invention provide the plane cut-away view of film coating apparatus.
Main element nomenclature
Target pedestal 10
Film coating apparatus 100
Shielding case 101
Diapire 103
Sidewall 105
Cavity 107
Base station 110
Accepting groove 111
Cascaded surface 115
Rotation microscope carrier 120
Rotation microscope carrier 122
Actuation part 124
Target stand 130
Accommodation space 132
Axis hole 134
Target parts 140
Target 141
Target substrate 142
Turning axle 144
Rotation motor 146
Control device 148
Operating switch 148a
Embodiment
Below in conjunction with accompanying drawing, the present invention is described in further detail.
As shown in Figure 1, 2, embodiment of the present invention provides a kind of target pedestal 10, and it refers to Fig. 4 for a film coating apparatus 100().This target pedestal 10 comprises base station 110, rotation microscope carrier 120, a plurality of target stand 130 and a plurality of target parts 140 that are housed in film coating apparatus 100, described rotation microscope carrier 120 and a plurality of target stand 130 are arranged on base station 110, rotation microscope carrier 120 can rotate relative to base station 110 and target stand 130, and a plurality of target parts 140 are separately positioned on a plurality of target stands 130.
Concrete, described film coating apparatus 100 comprises a shielding case 101, described shielding case 101 has a diapire 103 and a plurality of sidewall 105, forms a cavity 107 between described diapire 103 and a plurality of sidewall 105, and described base station 110 is fixed on this diapire 103 and is contained in this cavity 107.
On described base station 110, offer a plurality of accepting grooves 111, the size of the size of described accepting groove 111 and described target stand 130 is roughly the same, and it is for accommodating described target stand 130 and target stand 130 being fixed on to base station 110.
Described rotation microscope carrier 120 is connected with base station 110 by a driven motor (not shown), so that this rotation microscope carrier 120 can rotate relative to base station 110.In present embodiment, described rotation microscope carrier 120 and base station 110 are cylindric, and described rotation microscope carrier 120 is arranged on the central position of described base station 110.The area of described rotation microscope carrier 120 is less than the area of base station 110, makes to be formed with a cascaded surface 115 between described rotation microscope carrier 120 upper surfaces and the upper surface of base station 110.
Described rotation microscope carrier 120 is provided with at least one rotation microscope carrier 122 on the surface away from base station 110, and this rotation microscope carrier 122 is for placing element (not shown) to be plated.When rotation microscope carrier 120 rotates, rotation microscope carrier 122 is 120 rotations of rotation microscope carrier relatively.Concrete, between described rotation microscope carrier 122 and rotation microscope carrier 120, being connected with an actuation part 124, actuation part 124 is for driving rotation microscope carrier 122 around self central shaft rotation.In present embodiment, this actuation part 124 is a rotation motor.In present embodiment, the quantity of described rotation microscope carrier 122 is 3.The quantity that is appreciated that described rotation microscope carrier 122 can be set according to specific needs, for example, be set as 2,4 or more than 4.Because described element to be plated can carry out rotation and revolution (rotating around rotation microscope carrier 120 central shafts) under the drive of rotation microscope carrier 122 and rotation microscope carrier 120, make plated film more even.
Described a plurality of target stand 130 rings are located at around this rotation microscope carrier 120.In present embodiment, the quantity of described a plurality of target stands 130 is four, and it is equidistantly fixedly installed on base station 110.The quantity that is appreciated that described a plurality of target stand 130 can be for two, three or more than four.Described a plurality of target stand 130 is fixed on base station 110 and is wider than on the surface location that rotates microscope carrier 120, and each target stand 130 roughly be arranged in parallel with described cascaded surface 115.In present embodiment, described each target stand 130 be shaped as three-dimensional cylindricality.The shape that is appreciated that described target stand 130 can also be cylindrical, hexagon etc.Each target stand 130 offers an accommodation space 132 towards the one side of this rotation microscope carrier 120, and described accommodation space 132 offers the axis hole 134 being communicated with described accommodation space 132 on interior relative two side.In present embodiment, described accommodation space 132 be shaped as rectangle, described axis hole 134 is for being communicated with the through hole of accommodation space 132 inner side-walls and target stand 130 outer side walls.
Incorporated by reference to Fig. 3, each target parts 140 comprises a target 141 and a target substrate 142, and target 141 is fixed on target substrate 142.In present embodiment, the quantity of described target parts 140 is 4, and each target parts 140 correspondence is arranged on target stand 130 away from one end of base station 110.The material of target 141 has two kinds, and the target 141 on two target substrates 142 that are oppositely arranged is identical.
Described a plurality of target parts 140 respectively activity are housed in accommodation space 132.Concrete, described target parts 140 one end are fixedly installed a turning axle 144, and described turning axle 144 and a rotation motor 146 are in transmission connection.In present embodiment, the end of described turning axle 144 and rotation motor 146 are all housed in this axis hole 134, damage rotation motor 146 when preventing plated film.When rotation motor 146 is driven, described turning axle 144 rotations, described turning axle 144 drives relative accommodation space 132 motions of described target parts 140, makes target parts 140 can be housed in this accommodation space 132 or stretch out from accommodation space 132.When target parts 140 stretch out accommodation space 132, target 141 is towards described universal stage 120.In present embodiment, described target parts 140 are these accommodation space 132 90-degree rotations relatively.
Described rotation motor 146 and a control device 148 are electrically connected, this control device 148 is arranged on outside film coating apparatus 100, and this control device 148 drives these target parts 140 be housed in accommodation space 132 or stretch out from accommodation space 132 for control this rotation motor 146 for user.For example, during plating duplicature, control device 148 is controlled two target parts 140 that are oppositely arranged and is opened, so that target 141 is towards the element to be plated on universal stage 120, plating the first tunic, after having plated the first tunic, control device 148 is controlled two other target parts 140 that are oppositely arranged and is opened, and two target parts 140 originally opening are housed in accommodation space 132, and plating the second tunic, thus can prevent from producing and polluting between different targets.In addition, for handled easily, on described control device 148, be provided with a plurality of operating switch 148a, corresponding sense of rotation and the switching of controlling a rotation motor 146 of each operating switch 148a, makes user can operate respectively the state that this operating switch 148a controls corresponding target parts 140.In present embodiment, the quantity of described operating switch 148a corresponds to 4.
The material that is appreciated that described target 141 can be more than two kinds, and now, the target parts 140 that have different target 141 materials by described control device 148 controls are opened successively, to avoid the pollution between target 141.
While using this target pedestal 10 plated film, by air extractor by cavity 107 vacuum pumpings, then toward the interior transport of reactant gases body of cavity 107.Open described rotation microscope carrier 120 and rotation microscope carrier 122, element to be plated can be revolved round the sun and rotation.Start this control device 148, make to need the target parts 140 that use to stretch out from accommodation space 132, thereby carry out plated film.After plated film finishes, control target parts 140 and be again housed in accommodation space 132, thereby avoid oxidation by air.
Target pedestal 10 of the present invention and the film coating apparatus that uses this target pedestal 10, by offer accommodation space 132 on target pedestal 10, and target parts 140 are movably connected on target pedestal 10, thereby can control target parts 140, when plated film, from accommodation space 132, stretch out to carry out plated film, and be again housed in accommodation space 132 after plated film finishes.When plating multilayer film, this target pedestal 10 can be avoided the pollution between target parts 140, and owing to can install the target parts 140 of a plurality of differing materials simultaneously, all needs to open vacuum, thereby can increase work efficiency while avoiding plating different retes.
In addition, those skilled in the art can do other and change in spirit of the present invention, and still, all variations of doing according to spirit of the present invention, within all should being included in the present invention's scope required for protection.
Claims (10)
1. a target pedestal, for a film coating apparatus, this target pedestal comprises:
Base station, is fixed in this film coating apparatus;
Rotation microscope carrier, is arranged on base station and can rotates relative to this base station;
A plurality of target stands, ring is located at around this rotation microscope carrier, and each target stand offers an accommodation space towards the one side of this rotation microscope carrier; And
A plurality of target parts, it is arranged on a plurality of target stands by a turning axle correspondence respectively, described turning axle is connected with a rotation motor and is all housed in accommodation space, and described rotation motor is used for controlling this turning axle and drives these target parts be housed in accommodation space or stretch out from accommodation space.
2. target pedestal as claimed in claim 1, is characterized in that, on this rotation microscope carrier, is provided with rotation microscope carrier, and this rotation microscope carrier is used for placing element to be plated, and when rotation microscope carrier rotates, rotation microscope carrier rotates microscope carrier rotation relatively.
3. target pedestal as claimed in claim 1, is characterized in that, the area of described rotation microscope carrier is less than the area of base station, and described target stand is arranged on the surface location that base station is wider than rotation microscope carrier.
4. target pedestal as claimed in claim 1, is characterized in that, described accommodation space offers axis hole on relative two side, and the end of described turning axle and described rotation motor are housed in this axis hole.
5. target pedestal as claimed in claim 1, is characterized in that, described target parts comprise target and target substrate, and target is fixed on described target substrate, and when target parts stretch out from accommodation space, target face is to described rotation microscope carrier.
6. target pedestal as claimed in claim 1, it is characterized in that, described rotation motor is connected with a control device, this control device is arranged on outside film coating apparatus, this control device is for controlling at least one target stretch out in this accommodation space when plated film starts for user, and after plated film finishes, controls this target and be housed in this accommodation space.
7. target pedestal as claimed in claim 6, it is characterized in that, on described control device, be provided with a plurality of operating switchs, corresponding sense of rotation and the switching of controlling a rotation motor of each operating switch, for operating respectively for user the state that this operating switch is controlled corresponding target.
8. a film coating apparatus, it comprises:
Shielding case, is formed with a vacuum cavity in it; And
Target pedestal, it is arranged in this vacuum cavity, it is characterized in that, and this target pedestal comprises:
Base station, is fixed in this vacuum cavity;
Rotation microscope carrier, is arranged on base station and can rotates relative to this base station;
A plurality of target stands, ring is located at around this rotation microscope carrier, and each target stand offers an accommodation space towards the one side of this rotation microscope carrier; And
A plurality of target parts, it is arranged on a plurality of target stands by a turning axle correspondence respectively, described turning axle is connected with a rotation motor and is all housed in accommodation space, and described rotation motor is used for controlling this turning axle and drives these target parts be housed in accommodation space or stretch out from accommodation space.
9. film coating apparatus as claimed in claim 8, is characterized in that, described accommodation space offers axis hole on relative two side, and described rotating shaft terminal and described rotation motor are housed in this axis hole.
10. film coating apparatus as claimed in claim 8, it is characterized in that, described rotation motor is connected with a control device, this control device is arranged on outside film coating apparatus, this control device is for controlling at least one target opens when plated film starts for user, and after plated film finishes, controls this target and be housed in this accommodation space.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010158840.2A CN102234783B (en) | 2010-04-28 | 2010-04-28 | A target material pedestal and a film plating apparatus employing the target material pedestal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010158840.2A CN102234783B (en) | 2010-04-28 | 2010-04-28 | A target material pedestal and a film plating apparatus employing the target material pedestal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102234783A CN102234783A (en) | 2011-11-09 |
| CN102234783B true CN102234783B (en) | 2014-08-20 |
Family
ID=44885895
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010158840.2A Expired - Fee Related CN102234783B (en) | 2010-04-28 | 2010-04-28 | A target material pedestal and a film plating apparatus employing the target material pedestal |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102234783B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108411268A (en) * | 2018-05-03 | 2018-08-17 | 广东鼎泰高科精工科技有限公司 | A kind of rotatable target seat structure for changing target |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61227170A (en) * | 1985-03-29 | 1986-10-09 | Fujitsu Ltd | Sputtering device |
| JPS6431967A (en) * | 1987-07-27 | 1989-02-02 | Tokio Nakada | Manufacture of thin film |
| CN2736368Y (en) * | 2004-09-09 | 2005-10-26 | 鸿富锦精密工业（深圳）有限公司 | Optical coating apparatus |
| CN1995444A (en) * | 2006-01-06 | 2007-07-11 | 鸿富锦精密工业（深圳）有限公司 | Rotary disk for film electroplating and film electroplating machine |
| US8192597B2 (en) * | 2006-03-28 | 2012-06-05 | Nv Bekaert Sa | Coating apparatus |
| CN100560789C (en) * | 2006-10-20 | 2009-11-18 | 鸿富锦精密工业（深圳）有限公司 | Plated film with substrate fixture, plated film with rotating disk and coating equipment |
| CN100447292C (en) * | 2006-12-29 | 2008-12-31 | 上海工程技术大学 | Anti-pollution superhigh vacuum magnetron sputtering film-plating device |
-
2010
- 2010-04-28 CN CN201010158840.2A patent/CN102234783B/en not_active Expired - Fee Related
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| Publication number | Publication date |
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| CN102234783A (en) | 2011-11-09 |
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Granted publication date: 20140820 Termination date: 20150428 |
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