CN102210987A - Gas dissolving liquid generation device and generation method therefor - Google Patents
Gas dissolving liquid generation device and generation method therefor Download PDFInfo
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- CN102210987A CN102210987A CN2011100443877A CN201110044387A CN102210987A CN 102210987 A CN102210987 A CN 102210987A CN 2011100443877 A CN2011100443877 A CN 2011100443877A CN 201110044387 A CN201110044387 A CN 201110044387A CN 102210987 A CN102210987 A CN 102210987A
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Abstract
The invention relates to a gas dissolving liquid generation device and a generation method therefor. The device comprises a gas-liquid mixing part (101) for mixing gas with liquid, a micron bubble generation part (104) for accommodating the liquid containing the gas and transforming the gas into micro bubbles, a nano-bubble generation part (105) for accommodating the liquid containing micron bubbles and transforming the micron bubbles into nano bubbles and a circulation mechanism (201).
Description
Technical field
The present invention relates to gas lysate generating apparatus and generation method, for example be applicable to and generate the nano bubble water comprise nano bubble (high electrokinetic potential water: zeta high potential water), it can be used as semiconductor equipment or FPD (flat-panel monitor: the rinse water in manufacturing process Flat Panel Display).
Background technology
In semiconductor and FPD industry, use SC-1 (ammoniacal liquor-aquae hydrogenii dioxidi: Ammonia-hydrogen peroxide) or SC-2 Sulfuric Acid-Hydrogen Peroxide) etc. (sulfuric acid-aquae hydrogenii dioxidi: soup is as cleaning fluid.But, use these soups exist increases environmental pressure when discarding soup problem.Further, the static deterioration that causes taking place in middle operation for the flowing live-wire that prevents because of ultra-pure water (UPW) is used CO
2, this CO
2Also can cause great influence to environmental pressure.
Thereby at present, the cleaning fluid of soup contains the micron bubble water that is called as micron bubble and receives publicity as an alternative.As everyone knows, be present in the micro-bubble in this micron bubble water, have electric charge (electrokinetic potential: zeta potential) on its surface.This electrokinetic potential helps contaminant particle and cleaning object are peeled off, and cleans.
In addition, well-known, the electrokinetic potential that more little this micro-bubble of particle diameter of the micro-bubble in the liquid is had is high more.On the other hand, mixing in the micron bubble water that uses at present has from the littler bubble that is called as nano bubble of size ratio micron bubble, reaches the air pocket of hundreds of μ m to particle diameter, even be called micron bubble water, wherein also contains micron bubble bubble in addition.About micron bubble and nano bubble, though there is not clear and definite definition, but common so-called micron bubble is meant the bubble that particle diameter (diameter) is 1 μ m to about the 100 μ m, and so-called nano bubble is meant the bubble (with reference to patent documentation 1,2) of particle diameter (diameter) less than 1 μ m.Such as, can be by generating nano bubble (patent documentation 2) to micron bubble irradiation ultrasonic wave.
As mentioned above, in micron bubble water, contain the bubble that helps the small particle diameter of cleaning, and to cleaning the bubble that helps little big particle diameter.
In the bubble of above-mentioned big particle diameter, especially count the bubble of the above big particle diameter of μ m, its life period is short, absorption nano bubble and other small bubbles are arranged and becomes the tendency of bigger bubble.The not convection current in liquid of this air pocket, and can near liquid level, break (pressure break).The cavitation that takes place when it breaks can destroy intermediate products or the final products of semiconductor equipment, FPD.For example, because of this cavitation, groove structure on the semiconductor wafer or microchannel may be destroyed.
Thereby, wish to use the cleaning fluid of the cleaning fluid of the bubble that contains small particle diameter as much as possible as semiconductor equipment and FPD, specifically, wish to use the nano bubble that contains high concentration, and removed micron bubble (that is, micron bubble content be'ss few) cleaning fluid as far as possible.
[patent documentation]
[patent documentation 1] Japanese patent of invention discloses the 2008-36585 communique
[patent documentation 2] Japanese patent of invention discloses the 2006-289183 communique
Summary of the invention
The cleaning method that semiconductor equipments such as ultrasonic cleaning process and ozone dissolution method and FPD are arranged as everyone knows.
But, in ultrasonic cleaning process, mixed in together being generated of bubble from micro-bubble to tens of μ m magnitudes, big particle diameter bubble absorption micro-bubble becomes bigger bubble, therefore is difficult to make the particle diameter unanimity of bubble.Further, the cavitation that takes place when breaking because of ultrasonic energy or bubble may cause damage to semiconductor equipment and FPD.
In the ozone dissolution method, ozone is dissolved in the ultra-pure water, the activity of utilization ozone improves cleaning performance.But because the stabilization time of ozone is short, thereby be difficult to make ozone concentration stably to be maintained until matting.In addition, if ultra-pure water because of flowing live-wire phenomenon when charged, might deterioration, destroy the insulating barrier of semiconductor equipment and FPD.In addition, in the ozone dissolution method, before use is dissolved with the ultra-pure water of ozone, also can use SC-1 and SC-2, so itself and soup clean and have no difference.And when using ultra-pure water, microorganisms such as the bacterium that produces in ultra-pure water when device stops also can becoming problem.
The purpose of this invention is to provide a kind of gas lysate generating apparatus and generation method, can generate the nano bubble that contains high concentration, and the poor liquid of micron bubble.
The gas lysate generating apparatus of one aspect of the present invention has: gas-liquid mixed portion, and it mixes gas and liquid; The micron bubble generating unit wherein flows into the described liquid that contains described gas, is micron bubble with the described gas conversion that contains in the described liquid; The nano bubble generating unit wherein flows into the described liquid that contains described micron bubble, and the described micron bubble that contains in the described liquid is transformed to nano bubble; And cycling mechanism, circulate in described gas-liquid mixed portion, described micron bubble generating unit and described nano bubble generating unit by making the described liquid that contains described nano bubble, improve the concentration of ordinary dissolution in the described liquid of gas.
In the present invention's gas lysate generation method on the other hand, at gas-liquid mixed portion mist and liquid; The micron bubble generating unit that contains the described liquid of described gas in inflow is a micron bubble with the described gas conversion that contains in the described liquid; The nano bubble generating unit that contains the described liquid of described micron bubble in inflow is transformed to nano bubble with the described micron bubble that contains in the described liquid; The described liquid that contains described nano bubble is circulated in described gas-liquid mixed portion, described micron bubble generating unit and described nano bubble generating unit, improve the concentration of ordinary dissolution of gas in described liquid.
According to the present invention, a kind of gas lysate generating apparatus and generation method can be provided, it can generate the nano bubble that contains high concentration, and the poor liquid of micron bubble.
Description of drawings
Fig. 1 is the front view of the gas lysate generating apparatus of first embodiment of the invention.
Fig. 2 is for watching the side view of the gas lysate generating apparatus of Fig. 1 from the right side of Fig. 1.
Fig. 3 is the structure diagram of the gas lysate generating apparatus structure of presentation graphs 1.
Fig. 4 generates the chart of the function of number for expression liquid temperature and micron bubble.
Fig. 5 is the chart of the function of the temperature and pressure of express liquid and gas concentration of ordinary dissolution.
Fig. 6 is the side cutaway view of structure of the micron bubble generating unit of detailed presentation graphs 3.
Fig. 7 is the amplification profile of the foaming of detailed presentation graphs 6 with the structure of Venturi tube.
Fig. 8 is the amplification profile of the foaming of detailed presentation graphs 6 with the structure of Venturi tube.
Fig. 9 is the chart of expression by the distribution of the bubble of the micron bubble generating unit generation of Fig. 6.
Figure 10 is the side cutaway view of structure of the nano bubble generating unit of detailed presentation graphs 3.
Figure 11 is generated the distribution graph of bubble by the nano bubble generating unit of Figure 10 for expression.
Figure 12 is the figure that is used to illustrate the structure of existing gas lysate generating apparatus.
Figure 13 is the figure of structure that is used to illustrate the gas lysate generating apparatus of present embodiment.
Symbol description
101 gas-liquid mixed portions, 102 force (forcing) pumps
103 cut off dissolving portion 104 micron bubble generating units
Meter bubble generating unit 111 coolers in 105
121 gas introduction ports, 122 former water inlets
123 generate water out 124 residual gases introducing port again
141 loads of 131 control panels
142 separation of particles portions, 143 particulate filters
151 tanks, 201 cycling mechanisms
211 repeat pipeline 212 return lines
213 regeneration pipelines 214 pipelines that discharge water
215 reclaim line, 301 micron bubble generating unit bodies (foaming chamber)
302 gases dissolving water inlet, 303 foaming Venturi tubes
304 residual gases export 305 residual gas return ducts
306 micron bubble water exports, 401 nano bubble generating unit bodies (reception room)
402 ultrasonic oscillators, 403 micron bubble flow inlets
404 guiding streams, 405 dividing wall pipes
406 micron bubble water are emitted portion 407 and are repeated water export (outlet of first body fluid)
Meter bubble water export (second liquid outlet) in 408
409 dirt separation water outs, 410 dividing plates
411 corrugated parts
The specific embodiment
Below in conjunction with the description of drawings embodiments of the present invention.
Fig. 1 is the front view of the gas lysate generating apparatus of first embodiment of the invention.
Figure 1 illustrates and be used for installing a plurality of gas introduction ports 121 that export-oriented gas-liquid mixed portion 101 imports gases, also show as the former water inlet 122 of the inflow entrance of former water with as the generation water out 123 of the flow export that generates water from this.
Utilize gas-liquid mixed portion 101 that the gas that imports from gas introduction port 121 is mixed with the liquid (water) that flows into from former water inlet 122, become the gas lysate (gas dissolving water) that has dissolved gas.Then, in force (forcing) pump 102, utilize the impeller of rotation that this gas dissolving water is stirred, mixes and exerts pressure, in cutting off dissolving portion 103, impose the dissolution process of cutting off that makes gas execute dissolving by cutting off.
Pass through gas-liquid mixed portion 101, force (forcing) pump 102 and cut off dissolving portion 103 gas dissolving water afterwards and flow into micron bubble generating unit 104.In micron bubble generating unit 104, be micron bubble with the gas conversion that contains in this gas dissolving water.Because this gas dissolving water contains micron bubble, thereby is called micron bubble water.
The gas dissolving water (micron bubble water) of discharging from micron bubble water generating unit 104 then flows into nano bubble generating unit 105.In nano bubble generating unit 105, the micron bubble that contains in this gas dissolving water is transformed to nano bubble.Because this gas dissolving water contains nano bubble, thereby becomes nano bubble water.
In the present embodiment, can make the gas dissolving water (nano bubble water) of discharging from nano bubble generating unit 105 at gas-liquid mixed portion 101, force (forcing) pump 102, cut off circulation dissolving portion 103, micron bubble water generating unit 104 and the nano bubble generating unit 105.In the present embodiment, after this gas dissolving water is circulated repeatedly, be discharged to (for example tank) outside the device in above-mentioned part 101～105 from the generation water out 123 that is arranged at nano bubble generating unit 105.About carrying out the loop structure of above-mentioned circular treatment, will describe in detail in the back.
In Fig. 1, also show and cut off that dissolving portion 103 is connected, the cooler 111 of refrigerating gas dissolving water.About cooler 111, will describe in detail in the back.
Fig. 2 is for watching the side view of the gas lysate generating apparatus of Fig. 1 from the right side of Fig. 1.
In Fig. 2, except above-mentioned gas-liquid mixed portion 101, force (forcing) pump 102, cut off dissolving portion 103, micron bubble generating unit 104, nano bubble generating unit 105, also show the control panel 131 that is used to control this device.
Fig. 3 is the structure diagram of the gas lysate generating apparatus structure of presentation graphs 1.
In Fig. 3, represent from the gas of gas introduction port 121 importings with symbol A; Represent from the water of former water inlet 122 inflows with symbol B.Utilize gas-liquid mixed portion 101 that above-mentioned gas and water are mixed, become gas dissolving water.
In the present embodiment, utilize cycling mechanism 201 make this gas dissolving water at gas-liquid mixed portion 101, force (forcing) pump 102, cut off circulation repeatedly in dissolving portion 103, micron bubble generating unit 104 and the nano bubble generating unit 105., in micron bubble generating unit 104, generate micron bubble therebetween, in nano bubble generating unit 105, generate nano bubble by the micron bubble in this water by the above-mentioned gas in this water.
Figure 3 illustrates the repetition pipeline 211 that constitutes cycling mechanism 201.Repeating pipeline 211 makes the gas dissolving water (nano bubble water) of discharging from nano bubble generating unit 105 flow into gas-liquid mixed portion 101 once more.
As mentioned above, in the present embodiment, utilize cycling mechanism 201 make gas dissolving water at gas-liquid mixed portion 101, force (forcing) pump 102, cut off repetitive cycling in dissolving portion 103, micron bubble generating unit 104 and the nano bubble generating unit 105.Thus, repeat processing that gas and liquid are mixed and be micron bubble and then the processing that is transformed to nano bubble with this gas conversion.Utilize force (forcing) pump 102 and cut off dissolving portion 103 and further promote the processing that mixes and dissolve.Thus, present embodiment can improve the gas concentration of ordinary dissolution in the gas dissolving water.In the present embodiment, utilize aforesaid cycling mechanism 201 can control gas concentration of ordinary dissolution in the gas dissolving water.
Further, repeat to utilize micron bubble generating unit 104 that the gas conversion that gas dissolves in the water is micron bubble in the present embodiment, utilize nano bubble generating unit 105 this micron bubble further to be transformed to the processing (two phase process) of nano bubble again.Thus, make the residual micron bubble and the gas that in 1 circular treatment, are not transformed to nano bubble, handle being transformed to nano bubble by repetitive cycling.Consequently, the purity of the nano bubble in the water is improved, then reduced the ratio of micron bubble on the other hand.Thereby, can generate nano bubble and the poor gas dissolving of the micron bubble water that contains high concentration according to present embodiment.
For example, above-mentioned gas dissolving water is suitable for being used as rinse water in the manufacturing process of semiconductor equipment and FPD.Its reason is, what contain high concentration in this gas dissolving water helps the nano bubble that cleans very much, and not have to help to cleaning, also may cause the content of micron bubble of damage little to semiconductor equipment or FPD because of pressure break.Utilize this rinse water, can suppress semiconductor equipment or FPD are caused damage, boost productivity.
And the size of gas concentration of ordinary dissolution, nano bubble content, nano bubble concentration, nano bubble purity and gas lysate generating apparatus that can be as required etc. at random changes the time and the number of times of gas dissolving water circulation.The circulation timei of gas dissolving water can for a few minutes to dozens of minutes, for example, can be 30 minutes.
In addition, the gas lysate generating apparatus of present embodiment also has following advantage.
(1) cooling of gas dissolving water
As mentioned above, make gas dissolving water circulation time, the temperature of the gas dissolving water (recirculated water) of circulation can rise because of the frictional heat of reaction heat when making micron bubble be transformed to nano bubble and recirculated water.On the other hand, the formation efficiency of micron bubble and the gas solubility in water can be because temperature rises descend (with reference to Fig. 4, Fig. 5).
Fig. 4 generates the chart of the function of number for expression liquid temperature and micron bubble.The transverse axis of Fig. 4 represent water temperature (℃), the longitudinal axis represent diameter be the following micron bubble of 50 μ m the generation number (individual/mg).About Fig. 4, see also the catalogue data of new field (NITTA MOORE) company's product " gas-liquid is cut off mode micron bubble generator: steep many youths (CATA-10070A-01) ".The experimental result of Fig. 4 shows that micron bubble generates number to be reduced because of water temperature rises.
Fig. 5 is the chart of the function of the temperature and pressure of express liquid and gas concentration of ordinary dissolution.The transverse axis of Fig. 5 is represented hydraulic pressure (10
-5* Pa), the longitudinal axis is represented the gas concentration of ordinary dissolution (mg/L) of air.About Fig. 5, see also raised path between farm fields paddy and win hot work " generation of bubble water and utilization (IDEC Review, p.8 (1993)) ".Figure 5 illustrates the measurement result of gas concentration of ordinary dissolution under each water temperature, hence one can see that, and water temperature is low more, and then the solubility of gas in water is high more.
Thereby, in the present embodiment, in gas lysate generating apparatus, be provided with cooler 111, utilize the gas dissolving water of 111 pairs of circulations under cycling mechanism 201 effects of cooler to cool off (Fig. 3).Can prevent that thus the temperature of recirculated water is because of risings such as reaction heat and frictional heats.In the present embodiment, can utilize cooler 111 to guarantee that the temperature of recirculated water is optimum temperature (for example 4 ℃).
In the present embodiment, cooler 111 is connected to the dissolving portion 103 of cutting off.Can improve the solubility of cutting off the recirculated water when handling thus.In addition, in cycling mechanism 201, be provided with temperature sensor T respectively at the upstream and downstream place of cutting off dissolving portion 103 this moment as shown in Figure 3
1And T
2Thereby utilize said temperature sensor T
1And T
2Monitor water temperature (or temperature of gas),, make cooler 111 work as required according to the temperature that detects.For example, according to temperature sensor T
1Detected temperature and temperature sensor T
2Whether detected temperature, control make cooler 111 work, or make cooler 111 with what kind of power work.
In addition, in the present embodiment, also cooler 111 can be connected in the part of cutting off beyond the dissolving portion 103, or with it as the apolegamy parts.Under above-mentioned any situation, cooler 111 all with the present invention in cooling unit suitable.
(2) gas dissolving water pressurization
As everyone knows, the solubility of gas in water not only improves because of gas dissolving water is cooled off, also because of pressurization improves (with reference to Fig. 5) to gas dissolving water.In the present embodiment, exert pressure, can improve the solubility of the gas dissolving water in the mixed process by utilizing 102 pairs of gas dissolvings of force (forcing) pump water.In the present embodiment, other presser unit except that force (forcing) pump 102 can also be set in gas lysate generating apparatus.
(3) gas introduction port
In the gas lysate generating apparatus of present embodiment, be provided with a plurality of gas introduction ports 121 that are used for gas is imported to gas mixing portion 101 outside installing.When using this device to generate rinse water, can switch gas with various to each cleaning object.For example, when generating the rinse water that certain cleaning object uses, preferably use hydrogen, and preferably use oxygen when generating the rinse water that other cleaning objects use.
Under the said circumstances, utilize a plurality of gas introduction ports 121 in the present embodiment, just can easily switch gas.In addition,, can easily generate the gas dissolving water that contains multiple gases, generate the gas dissolving water that contains pure gas and be not only according to the present invention.
In addition, when using multiple gases or multiple body fluid to generate the gas lysate, preferably cut off the structure that dissolving portion 103 uses as being put down in writing in No. 4094633 communiques of Japan Patent or No. 3762206 communiques of Japan Patent.
(4) residual gas introducing port again
As shown in Figure 3, in the gas lysate generating apparatus of present embodiment, also be provided with residual gas introducing port 124 again, it is used for importing the residual gas that takes place from gas dissolving water once more to gas-liquid mixed portion 101.Thus, in the present embodiment, can utilize again, can not make the residual gas waste, improve the feature of environmental protection (エ コ ロ ジ one) of device residual gas.
In the present embodiment, the residual gas that in micron bubble sending part 104, takes place, from this residual gas again introducing port 124 imported once more.Illustrated among Fig. 3 be used for residual gas from micron bubble generating unit 104 through residual gas again introducing port 124 import to the return line 212 of gas-liquid mixed portion 101 once more.
(5) regeneration pipeline
The generation water (nano bubble water) that utilizes present embodiment to generate is discharged to outside the device from generating water out 123, is used for the cleaning of semiconductor equipment for example or FPD.In Fig. 3, with 141 these cleaning objects of expression of loading.By using above-mentioned generation water to clean load 141, particulate is peeled off from cleaning object.
In the present embodiment, for example, can also regeneration pipeline 213 be installed alternatively in gas lysate generating apparatus, it comprises separation of particles portion 142 and particulate filter 143.In separation of particles portion 142, after cleaning, particulate is separated from cleaning object, in particulate filter 143, the rinse water behind the separating particles is filtered, remove the particulate in the rinse water.
Flow through the water of regeneration behind the pipeline 213, can utilize the pipeline 214 that discharges water to discharge water, also can utilize reclaim line 215 to flow into former water inlet 212 once more.The former can avoid the water that is polluted is emitted, and the latter then can further carry out water reuse, improves the feature of environmental protection of device.
(6) gas, liquid, cleaning object, the concrete example of cleaning treatment
The employed gas of gas lysate generating apparatus of the present invention can have hydrogen (H
2), oxygen (O
2), nitrogen (N
2), ammonia (NH
3) etc., employed liquid can be ultra-pure water, alkali ion water, seawater etc.
Cleaning object can be semiconductor wafer, ceramic wafers, disk with substrate, the glass substrate that glass is basic, plasma scope is used that CD is used with substrate, photomask, glass substrate that liquid crystal indicator is used and other various substrates etc.In addition, cleaning treatment can be used to remove metal impurities or organic pollution etc.
Below, describe the micron bubble generating unit 104 of Fig. 3 and the structure of nano bubble generating unit 105 in detail.
(micron bubble generating unit)
Fig. 6 is the side cutaway view of structure of the micron bubble generating unit 104 of detailed presentation graphs 3.
As shown in Figure 6, micron bubble generating unit 104 has: micron bubble generating unit main body (foaming chamber) 301, gas dissolving flow inlet 302, foaming Venturi tube 303, residual gas export mouth 304, residual gas return duct 305 and micron bubble water export 306.
In micron bubble generating unit 104, gas dissolving water flow into micron bubble generating unit main body 301 through foaming with Venturi tube 303 from gas dissolving flow inlet 302.Micron bubble generating unit main body 301 is for holding the foaming chamber of gas dissolving water.Micron bubble takes place with Venturi tube 303 gas jet dissolving water in this foaming chamber 301 in each foaming in foaming chamber 301.
In the micron bubble generating unit 104 of present embodiment, be provided with a plurality of small-sized and foaming that foaming capacity is little with Venturi tube 303, can access required foaming capacity with the quantity of Venturi tube 303 by increasing foaming.In the present embodiment, the gas release of each Venturi tube is little, realizes required gas release by the quantity that increases Venturi tube, can generate the little micron bubble of particle diameter deviation equably thus.In addition, by using small-sized and little each Venturi tube of foaming capacity, can generate small and stable micron bubble.
In the present embodiment, foaming chamber 301 has in the long shape of above-below direction, and foaming is arranged on the bottom of foaming chamber 301 with Venturi tube 303 and towards the top, to dissolve water to the top (top) of foaming chamber 301 gas jet.Figure 6 illustrates in foaming chamber 301, be positioned at the whole bubble zone and the gas-liquid mixed zone that be formed on whole bubble regional top of foaming with Venturi tube 303 tops.Gas dissolving water is transformed to the bubble stream of micron bubble particle diameter by foaming with Venturi tube 303, and becomes the foaming stream towards whole bubble zone.The situation of foaming stream circulation in foaming chamber 301 has been shown among Fig. 6.
Below, the structure and the advantage of detailed description foaming chamber 301.
Usually, generate micron bubble by gas jet dissolving water in tank etc.But there is the big shortcoming of fluctuation that produces bubble diameter in this method.For this reason, in the device of present embodiment, be provided with the foaming chamber 301 that is located away from the outer tank of device separately, and in this foaming chamber 301, generate micron bubble.Thus, can prevent micron bubble diffusion and the irregular problem of generation bubble diameter that causes thus in the present embodiment.
Especially the whole bubble zone of foaming chamber 301 helps to realize above-mentioned effect.In the present embodiment, the foaming in foaming chamber 301 is provided with the whole bubble zone with a constant volume with the top of Venturi tube 303.If this zone is not set, the bubble meeting freely-movable that then generates, it is big that bubble diameter becomes.In the present embodiment, regional by with the top of Venturi tube 303 whole bubble being set in foaming, and it is irregular to suppress the gassing particle diameter.
Figure 6 illustrates the end face S of foaming chamber 301
1And the side S of foaming chamber 301
2In the present embodiment, at the end face S of foaming chamber 301
1Be provided with residual gas outlet 304, at the side of foaming chamber 301 S
2Be provided with micron bubble water export 306.
In foaming chamber 301, form the gas-liquid mixed zone on the top in whole bubble zone because of forming the residual gas that takes place from gas dissolving water.Thereby, in the present embodiment, at the end face S of foaming chamber 301
1On residual gas outlet 304 is set, and discharge residual gases from this residual gas outlet 304.By residual gas outlet 304 being arranged on the end face S of foaming chamber 301
1Go up rather than be arranged on side S
2On, thereby can export 304 residual gases of only discharging residual gas and the gas dissolving water from this residual gas.
Residual gas outlet 304 by residual gas return duct 305 and return line 212 shown in Figure 3 and residual gas again introducing port 124 be connected.Thereby the residual gas of discharging from residual gas outlet 304 is imported to gas-liquid mixed portion 101 once more.Thus, can utilize again, can not make the residual gas waste, improve the feature of environmental protection of device residual gas.
On the other hand, the micron bubble group who is generated discharges from micron bubble water export 306 with the form of the micron bubble water that contains the micron bubble group.Micron bubble water export 306 is arranged on the substantial middle of the most stable foaming chamber 301 of micron bubble group and partly locates.The micron bubble water of discharging from micron bubble water export 306 flow into nano bubble generating unit 105.Micron bubble water export 306 is equivalent to the concrete example of liquid outlet of the present invention.
In the present embodiment, be provided with the micron bubble group's of generation residence time (Xu Raising Network イ system), so that stable micron bubble group is flowed to nano bubble generating unit 105.And known diameter is about the above micron bubble of 65 μ m can not become nano bubble.Therefore, in the present embodiment, make micron bubble generating unit 104 can generate the roughly following micron bubble of 65 μ m of diameter morely.
Describe the structure of foaming below in detail with Venturi tube 303.
Fig. 7 and Fig. 8 are the amplification profile of the foaming of detailed presentation graphs 6 with the structure of Venturi tube 303.
As shown in Figure 7, foaming is shaped as with the internal face of Venturi tube 303, opens once more after midway becoming of jet direction is narrow from gas dissolving flow inlet 302, and has utilized Bernoulli's theorem.
Figure 7 illustrates the internal face S of foaming with the jet of Venturi tube 303
3And the injection direction D of water is dissolved in foaming with Venturi tube 303 gas jet.Fig. 8 at length shows the jet internal face S of foaming with Venturi tube 303
3Shape.In the present embodiment, the foaming internal face S of the jet of Venturi tube 303
3Open with the angle of 5 degree～10 degree to injection direction D.Thus, can make foaming flow to all directions circulation, and make the generation bubble stabilizes.
And, in the present embodiment, except that Venturi tube 303 is used in foaming, also other foamed cell can be set in micron bubble generating unit 104.For example, in micron bubble generating unit 104, except that Venturi tube 303 is used in foaming, a plurality of aperture formula effervescent nozzles can also be set.
As mentioned above, according to the micron bubble generating unit 104 of present embodiment, can generate small, stable and uniform micron bubble.Fig. 9 is the chart of expression by the distribution of the bubble of micron bubble generating unit 104 generations of Fig. 6.As shown in the figure, the generation bubble in the present embodiment be distributed as uniform chevron, be that gonorrhoea distributes.Especially in this distributed, the micron bubble quantity more than the diameter 65 μ m seldom.
(nano bubble generating unit)
Figure 10 is the side cutaway view of structure of the nano bubble generating unit 105 of detailed presentation graphs 3.
As shown in figure 10, nano bubble generating unit 105 has nano bubble generating unit main body (reception room) 401, ultrasonic oscillator 402, micron bubble flow inlet 403, guides stream 404, dividing wall pipe 405, micron bubble water to emit portion 406, repeats water export 407, nano bubble water export 408, dirt separation water out 409, dividing plate 410 and corrugated part 411.
The micron bubble water (gas dissolving water) that is generated by micron bubble generating unit 104 imports to nano bubble generating unit main body 401 from micron bubble flow inlet 403 through guiding stream 404.Nano bubble generating unit main body 401 becomes the reception room that can hold micron bubble water.In addition, guiding stream 404 has near the open end P the bottom surface that is arranged on this reception room 401, and open end P is arranged at reception room 401 bottom surface S downwards
6Near.Thereby, import to open end P from the micron bubble water of micron bubble generating unit 104 through guiding stream 404, and be released to reception room 401 bottoms.
As everyone knows, by make micron bubble break naturally or forcibly (pressure break) make it become nano bubble.Claim the former to be pressure break voluntarily, the latter is for forcing pressure break.One of known method that makes micron bubble pressure pressure break is for utilizing the fracturing process of hyperacoustic vibrational energy.The micron bubble water irradiation ultrasonic wave of the ultrasonic oscillator 402 of present embodiment in reception room 401 makes the micron bubble pressure break become nano bubble.Thus, in the present embodiment, need not spend the pressure break phenomenon that micron bubble can take place in moment for a long time.The ultrasonic wave W that is taken place by ultrasonic oscillator has been shown among Figure 10.
Describe the structure of the ultrasonic oscillator 402 of present embodiment below in detail.
Be provided with all different a plurality of ultrasonic oscillators 402 of vibration frequency in the nano bubble generating unit 105 of present embodiment, these ultrasonic oscillators 402 are respectively with different frequency vibrations.Because of the particle diameter difference of micron bubble, and the ultrasonic frequency of carrying out pressure break easily is also different.In the present embodiment, by the ultrasonic wave of a plurality of frequencies takes place in reception room 401 simultaneously or sequentially, react thereby can implement corresponding pressure break according to the micron bubble different-grain diameter.
Thereby, according to present embodiment, can be successfully the micron bubble pressure break of various particle diameters be become nano bubble, can make nano bubble evenly and stable.In addition,,, can control the particle diameter and the number of the nano bubble that is generated, generate small nano bubble in a large number by the vibration frequency and the power of selected ultrasonic oscillator 402 according to present embodiment.
Therefore ultrasonic oscillator 402 is small-sized and cheap relatively element, disposes a plurality of ultrasonic oscillators 402 and does not also need very large space even have, and can not increase the advantage of cost.For example, do not change ultrasonic frequency and then have gas and the liquid that pressure break does not take place smoothly, in the case, if have the different a plurality of ultrasonic oscillators 402 of vibration frequency, then can realize (known easily, micron bubble is under the influence of Pi Yeke Nice power (bjerknes force), even there is the situation that the irradiation ultrasonic wave can pressure break yet).The vibration frequency of ultrasonic oscillator 402 can have been enumerated 430kHz, 850kHz, 28kHz, 1MHz etc.
And in the nano bubble generating unit 105 of present embodiment, the ultrasonic vibration unit is provided with a plurality of ultrasonic oscillators 402, but also 1 ultrasonic oscillator 402 can only be set.
The following describes the configuration of ultrasonic oscillator 402 grades of present embodiment.
In the present embodiment, ultrasonic oscillator 402 is arranged on the bottom of reception room 401, to the top of reception room 401 irradiation ultrasonic wave.In addition, reception room 401 has the above-below direction long shape identical with the foaming chamber 301 of micron bubble generating unit 104.
On the other hand, at the bottom surface of reception room 401 S
6Near, be provided with the open end P that guides stream 404 as mentioned above.In the present embodiment, also be provided with dividing wall pipe 405 in the bottom of reception room 401, this dividing wall pipe 405 is every between the open end P and ultrasonic oscillator 402 of guiding stream 404, from bottom surface S
6Extend upward and be provided with.Thus, in the present embodiment, not to the micron bubble water effect ultrasonic wave of the bottom that just imports to reception room 401.Dividing wall (dividing wall pipe) 405 is the shape of tubulose in the present embodiment, but also can be shape in addition.
The bottom micron bubble liter waterborne that utilizes dividing wall pipe 405 to make to import to reception room 401, and it is flowed to transverse direction so that its can not flow to ultrasonic oscillator 402 directly over.
The zone that micron bubble group in the micron bubble water assembles at an upper portion thereof by dividing wall pipe 405.In Figure 10, be the ultrasonic irradiation zone with this region representation.Propagate on the lateral of dividing wall pipe 405 by the ultrasonic wave that ultrasonic oscillator 402 takes place, and in this ultrasonic irradiation zone, be radiated on the micron bubble group.Make these micron bubbles group pressure break by illuminated ultrasonic wave, be transformed to nano bubble.In the present embodiment, by above-mentioned ultrasonic irradiation zone is set, can shine ultrasonic wave to the micron bubble group efficiently.
In the present embodiment, in the bottom of reception room 401 micron bubble water is set and emits portion 406, and this micron bubble water is emitted portion 406 by 405 encirclements of dividing wall pipe.Under situations such as cycling mechanism shown in Figure 3 201 taking-up micron bubble water, can use micron bubble water to emit portion 406 in desire.Emit portion 406 by opening micron bubble water, the micron bubble water that imports to reception room 401 bottoms directly is released to outside the reception room 401.
Describe the structure of reception room 401 below in detail.
Figure 10 illustrates the end face S of reception room 401
4And the side S of reception room 401
5In the present embodiment, at the side of reception room 401 S
5Be provided with repetition water export 407, nano bubble water export 408; At the side of reception room 401 S
5On, proportion rehydration flow export 407 and nano bubble water export 408 are provided with dirt separation water out 409 by the place, top.
The nano bubble group who is generated with the form of the nano bubble water that contains the nano bubble group from repeating water export 407 and nano bubble water export 408 is discharged.
Nano bubble water is discharged in the cycling mechanism shown in Figure 3 201 from repeating water export 407.Flow into gas-liquid mixed portion 101 from the nano bubble water that repeats water export 407 discharges through repeating pipeline 211.Nano bubble water is circulated in cycling mechanism 201.Thereby improve the gas concentration of ordinary dissolution in the nano bubble water.Further, the purity of the nano bubble in the nano bubble water improves, and the ratio of the micron bubble in the nano bubble water reduces on the contrary.Repeat the concrete example that water export 407 is equivalent to first body fluid outlet among the present invention.
On the other hand, nano bubble water is not discharged to cycling mechanism shown in Figure 3 201 from nano bubble water export 408.The nano bubble water of discharging from nano bubble water export 408 for example is discharged to the tank outside the device.In the present embodiment, nano bubble water after the repetitive cycling, is discharged in cycling mechanism 201 from nano bubble water export 408.Can provide the nano bubble that contains high concentration thus, and the poor nano bubble water of micron bubble.Nano bubble water export 408 is equivalent to the concrete example of second liquid flowing outlet of the present invention.And, in Fig. 3, represent nano bubble water exports 408 to generate water out 123.
In addition, in the present embodiment, repeat the side direction that water export 407 and nano bubble water export 408 are configured in dividing wall pipe 405, be positioned at the position of leaning on the below than the upper end of dividing wall pipe 405.Thereby flow to above-mentioned flow export 407,408 mobile nano bubble water, reach these flow exports 407,408 through the outside of dividing wall pipe 405.
For the nano bubble water that flows to above-mentioned flow export 407,408, in the process that reaches flow export 407,408, can not mix, therefore discharge the poor nano bubble water of micron bubble from above-mentioned flow export 407,408 with the micron bubble water of dividing wall pipe 405 inboards.
In addition, for the nano bubble water that flows to flow export 407,408, after most micron bubbles are become nano bubble by pressure break in the ultrasonic irradiation zone, through near the ultrasonic oscillator 402, and reaching flow export 407,408, majority is become nano bubble by pressure break in the therefore residual micron bubble.Thereby from the nano bubble water that flow export 407,408 is discharged not seldom by the micron bubble of pressure break.
And, preferred ultrasonic oscillator 402 be configured in flow export 407,408 near, with reduce omit not by the micron bubble of pressure break.
At the side of reception room 401 S
5On also be provided with dirt separation water out 409.The dirt X such as impurity, particulate that in Figure 10, represented in reception room 401 come-up.When containing above-mentioned dirt in the nano bubble water,, be the electrokinetic potential main reasons for decrease with the charge reaction on nano bubble surface.Dirt in the nano bubble water makes nano bubble water is caused harmful effect.
Thereby, in the present embodiment, at the side of reception room 401 S
5On be provided with dirt separation water out 409, the nano bubble water by will containing the dirt that floats is discharged from this dirt separation water out 409 thus, can with dirt and remaining nano bubble moisture from.Preferred dirt separation water out 409 is arranged on the end face S of reception room 401
4Near, to be easy to remove the dirt of come-up.
And, to micron bubble irradiation ultrasonic wave the time, the pressure break phenomenon takes place usually, but by frequency of ultrasonic and power that control is shone, can make micron bubble not by pressure break and (with reference to patent documentation 1) closer to each other.Utilize this character,, make micron bubble and dirt approaching, can make dirt be adsorbed in micron bubble absorption by micron bubble is shone the ultrasonic wave that the pressure break phenomenon does not take place.Thereby can apply buoyancy to dirt, make the dirt come-up.
Therefore, in the present embodiment, preferably be provided with the hyperacoustic ultrasonic oscillator 402 that is used to take place can not produce the frequency of pressure break phenomenon in nano bubble generating unit 105.Thus, can utilize this ultrasonic wave to make the dirt come-up, consequently can easily remove crude removal from dirt separation water out 409.
Describe dividing plate 410 and corrugated part 411 below in detail.
Dividing plate 410 for example is made of the wire netting of fine mesh.As shown in figure 10, dividing plate 410 is configured in to approximate horizontal the end face S apart from reception room 401 in reception room 401
4The below distance H
1The position.At this, distance H
1Be end face S from reception room
4To bottom surface S
6Distance H roughly 1/4.Dividing plate 410 also can be formed by the mesh-shape parts beyond the wire netting.
Micron bubble rises in the ultrasonic irradiation zone, and collides with dividing plate 410, has promoted its pressure break voluntarily thus.As mentioned above, utilize dividing plate 410, promote the pressure break voluntarily of micron bubble, reduce not by the micron bubble of pressure break.
On the other hand, exist micron bubble when collision dividing plate 410, the situation of pressure break voluntarily not to take place, but this moment, micron bubble was rebounded mussily by dividing plate 410.That is, micron bubble is rebounded to all directions from dividing plate 410.Thus, improved and be positioned at the micron bubble that is difficult to shine hyperacoustic position, reached the possibility that shines hyperacoustic position easily, consequently improved ultrasonic irradiation efficient, reduced not by the micron bubble of pressure break because of rebounding mussily.
In addition, as shown in figure 10, at the end face S of reception room 401
4On be formed with corrugated part 411.Thereby, the end face S of reception room 401
4Be not smooth, but form undulatory male and fomale(M﹠F).Consequently, in reception room 401 towards end face S
4The ultrasonic wave of advancing is at end face S
4Last generation diffuse reflection.Thus, ultrasonic wave acts on micron bubble in the reception room 401 from all directions, improves ultrasonic irradiation efficient, reduces not by the micron bubble of pressure break.
As mentioned above, dividing plate 410 and corrugated part 411 have minimizing not by the effect of the micron bubble of pressure break.
Describe the parts that form reception room 401 and guiding stream 404 below in detail.
In Figure 10, represented, apart from the end face S of reception room 401
4The below distance H
1Position P
1With apart from the bottom surface S of reception room 401
6The top distance H
2Position P
2Distance H
1And H
2Be end face S at this from reception room
4To bottom surface S
6Distance H 1/4.
In Figure 10, also represented the side S of reception room 401
5Go up from P
1To P
2Region R.
In the present embodiment, region R is the transparent component zone (transparent pipe) that is formed by transparent components such as quartz glass.Thus can be from outside visual reception room 401 inside of reception room 401.Have and to monitor the advantage that generates nano bubble by micron bubble.
And the transparent component region R is at the side of reception room 401 S
5On be arranged on different position shown in Figure 10 on.Preferably clear component area R is arranged on the position that can be visually observed the ultrasonic irradiation zone, so that monitor nano bubble.
In addition, in the present embodiment, all or part of of stream 404 formed by transparent components such as quartz glass in guiding.Thus, can pass through the inside of transparent component region R guidance by sight stream 404 from the outside of reception room 401.Advantage with the micron bubble that can monitor inflow.
And, when forming guiding stream 404 a part of by transparent component, in the order guiding stream 404 can from the transparent component region R visual to part form by transparent component.For example, order guides the part that only is positioned at reception room 401 inside in the stream 404 to be formed by transparent component.At this moment, the part that is positioned at reception room 401 inside is all formed by transparent component, also can be that only its part is formed by transparent component.
According to above-mentioned reception room 401 and guiding stream 404, has the advantage that to discover the unfavorable condition that takes place in the reception room 401 fast.In addition, not only use visually, also can take situation in the reception room 401, thereby can take and write down the situation in the reception room 401 with video camera.Usually, micron bubble water is the gonorrhoea shape, and nano bubble water then is transparent, therefore from the internal state of the visual reception room 401 of transparent component region R the time, and can be with micron bubble water in the visual difference guiding stream 404 and the nano bubble water in the reception room 401.
And the ultrasonic oscillator 402 of nano bubble generating unit 105 also can be used for generating air pocket at nano bubble water, or deaeration.
In addition, the nano bubble generating unit 105 of present embodiment not only can be used for generating rinse water, can also be used to generate the sterilization water (gas of this moment is ozone) or the photochemical catalyst reaction (phonochemistry principle (sonochemistry)) of high ability.Under said circumstances, present embodiment can improve the concentration of the nano bubble in the nano bubble water by having cycling mechanism 201, reduces the content of micron bubble.
As mentioned above, can generate according to the nano bubble generating unit 105 of present embodiment small and even, the nano bubble with continuation.Figure 11 is generated the distribution graph of bubble by the nano bubble generating unit 105 of Figure 10 for expression.Please note that in this distribution, the number of the nano bubble of diameter 100nm is far longer than the quantity of the nano bubble of diameter 200nm and 400nm.
(cleaning performance of nano bubble water)
The following describes the cleaning performance of nano bubble water, and explanation is by the cleaning performance of the excellence of the nano bubble water of present embodiment generation.
It is the electrokinetic potential that nano bubble has that the nano bubble glassware for drinking water has the first cause of cleaning performance.
As mentioned above, the surface of the micro-bubble in the liquid has electric charge (electrokinetic potential).In liquid, this electrokinetic potential is peeled off particulate from cleaning object, and helps to clean.And known, the particle diameter of the micro-bubble in the liquid is more little, and the electrokinetic potential that is had is high more.
Thereby the nano bubble littler than micron bubble particle diameter is highly suitable for cleaning.Therefore the nano bubble water that generates according to present embodiment be applicable to rinse water owing to contain the nano bubble of high concentration.The nano bubble water that is generated by present embodiment is high electrokinetic potential water, and it contains the high nano bubble of electrokinetic potential of high concentration.
And, consider that from the viewpoint of the cleaning performance of electrokinetic potential the particle diameter (diameter) of preferred nano bubble is 50～100nm.As shown in figure 11 as can be known, can generate the nano bubble water of the nano bubble of the particle diameter as mentioned above that contains high concentration according to present embodiment.
The nano bubble glassware for drinking water has second reason of cleaning performance to be the free radical that contains in the nano bubble.
When micron bubble was become nano bubble by pressure break, a part was decomposed in the hydrone on every side, temporarily generates H free radical and OH free radical.These free radicals and are removed particulate with inactivation has cut off the combination of particulate molecule attached to the molecule generation redox reaction of the particulate on the cleaning object from cleaning object.Above-mentioned is the free radical cleaning principle.The cleansing power that free radical cleans is based on 100～1000 times that hyperacoustic air pocket cleans.
Adopt two phase process to generate nano bubble in the present embodiment, the gas conversion that is about in the gas dissolving water is a micron bubble, again this micron bubble is transformed to nano bubble.When generating this nano bubble, make the micron bubble pressure break, therefore contain free radical in the nano bubble water according to the present embodiment generation.Thereby from this viewpoint, the nano bubble water that generates according to present embodiment is applicable to rinse water.
And from the viewpoint that free radical cleans, preferred employed gas is hydrogen (H
2).Its reason is to utilize OH free radical and H
2Reaction, make the free radical sum reach 2 times, the cleansing power of nano bubble water also is 2 times.
In addition, carrying out free radical when cleaning, also can be with the reception room 401 of nano bubble generating unit 105 as the purge chamber, wherein hold cleaning object and clean.Thus, can before eliminating, clean the interim free radical that takes place.
As mentioned above, electrokinetic potential is helpful to the cleaning performance of nano bubble water, and but then, when semiconductor equipment or FPD were cleaned, the micron bubble that contains in the nano bubble water can play a part bad.Reason is, during the micron bubble pressure break, has the danger that semiconductor equipment or FPD are damaged.
To this, the nano bubble water that generates according to present embodiment wherein contains the nano bubble of high concentration, and the content of micron bubble is few, and therefore, from this viewpoint, the nano bubble water that generates according to present embodiment can be applicable to rinse water.
(comparison of present embodiment and existing gas lysate generating apparatus)
Below, the structure of present embodiment and existing gas lysate generating apparatus is compared.
Figure 12 is the figure that is used to illustrate the structure of existing gas lysate generating apparatus.
In existing gas lysate generating apparatus, for example shown in Figure 12, effervescent nozzle directly is installed on the side of tank (aqua storage tank), to tank ejection gas dissolving water, micron bubble takes place in tank thus.And, utilize the ultrasonic oscillator that is installed on the tank that these micron bubble pressure breaks are become nano bubble.
As above device exists the distribution of micron bubble and the distribution and the even problem of density unevenness of concentration and nano bubble.The micron bubble of this moment and the distribution of nano bubble and concentration is because of the distance of volume, the water surface and the bottom surface of tank, the condition of tanks such as distance between wall, i.e. the situation of the injection target of nozzle (use target) and changing, and the particle diameter that generates bubble disperses.In addition, because the diffusion zone of micron bubble enlarges, therefore hyperacoustic illumination efficiency is poor.
Relative therewith, there is following advantage in the gas lysate generating apparatus of present embodiment.Figure 13 is the figure of structure that is used to illustrate the gas lysate generating apparatus of present embodiment.
At first, in the present embodiment, in gas lysate generating apparatus, be located away from tank 151 micron bubble generating unit 104 is set in addition, wherein have whole bubble zone.And, in the present embodiment, not in tank 151, but in the whole bubble zone in micron bubble generating unit 104 micron bubble takes place.Thus, can make the distribution of micron bubble and concentration even.
In addition, in the present embodiment, not in tank 151, neither be in micron bubble generating unit 104, but be located away from them, in the nano bubble generating unit 105 that is provided with in addition, generating nano bubble by the micron bubble pressure break.Thus, can make the distribution of nano bubble and concentration even.In addition, according to present embodiment, owing to can limit the diffusion zone of micron bubble, therefore hyperacoustic illumination efficiency height can be realized energy-conservation device.
In addition, when in tank 151, micron bubble being transformed to nano bubble, kind according to the gas lysate, the infringement of air pocket, environmental protection aspect may take place, but according to present embodiment, by nano bubble takes place in the nano bubble generating unit 105 that is provided with in addition being located away from tank 151, therefore can suppress this problem.
And, in the present embodiment, utilize cycling mechanism 201 that gas dissolving water is circulated repeatedly through gas mixing portion 101, micron bubble generating unit 104 and nano bubble generating unit 105 etc., improve the gas concentration of ordinary dissolution in the gas dissolving water.Thus, in the present embodiment, can generate the nano bubble that contains high concentration, and the poor gas dissolving of micron bubble water.
(effect of the gas lysate generating apparatus of present embodiment)
The effect of the gas lysate generating apparatus of present embodiment is described at last.
As mentioned above, in the present embodiment, utilize cycling mechanism 201 to make gas dissolving water through gas mixing portion 101,, force (forcing) pump 102, cut off dissolving portion 103, micron bubble generating unit 104 and nano bubble generating unit 105 and circulate repeatedly, and the processing that repeats gas and liquid are mixed, be micron bubble and the processing that further is transformed to nano bubble with this gas conversion.And then utilize force (forcing) pump 102 and cut off dissolving portion 103 further promotion mixing and dissolving.Thus, can improve gas concentration of ordinary dissolution in the gas dissolving water in the present embodiment.
Repeat two phase process in the present embodiment, the gas conversion that promptly repeats in micron bubble generating unit 104 gas to be dissolved in the water is a micron bubble, in nano bubble generating unit 105 this micron bubble further is transformed to nano bubble again.Thus, be not transformed to nano bubble and residual nano bubble and gas in 1 circular treatment, also the repetition by circular treatment is transformed to nano bubble.Thereby, can generate the nano bubble that contains high concentration according to present embodiment, and the little gas dissolving water of micron bubble content.
For example, aforesaid gas dissolving water is suitable for being used as rinse water in the manufacture process of semiconductor equipment or FPD.Its reason is, what this gas dissolving water contained high concentration helps the nano bubble that cleans very much, and not have to help to cleaning, also may cause the content of micron bubble of damage few to semiconductor equipment or FPD because of pressure break.Utilize this rinse water can suppress semiconductor equipment or FPD are caused damage, boost productivity.
In the present embodiment, utilize micron bubble generating unit 104 shown in Figure 6, can generate small, stable and uniform micron bubble.And then, utilize nano bubble generating unit 105 shown in Figure 10, can generate nano bubble small, even and that have continuation.Thereby, can generate the nano bubble that contains the small, even of high concentration and have continuation according to the present invention, be applicable to the gas dissolving water (high electrokinetic potential water) of rinse water.
More than, utilize the specific embodiment of the present invention that a concrete example of the present invention is illustrated, but the present invention is not limited to above-mentioned embodiment.
Claims (20)
1. gas lysate generating apparatus is characterized in that having:
Gas-liquid mixed portion, it mixes gas and liquid;
The micron bubble generating unit wherein flows into the described liquid that contains described gas, is micron bubble with the described gas conversion that contains in the described liquid;
The nano bubble generating unit wherein flows into the described liquid that contains described micron bubble, and the described micron bubble that contains in the described liquid is transformed to nano bubble; With
Cycling mechanism circulates in described gas-liquid mixed portion, described micron bubble generating unit and described nano bubble generating unit by making the described liquid that contains described nano bubble, improves the gas concentration of ordinary dissolution in the described liquid.
2. gas lysate generating apparatus as claimed in claim 1 is characterized in that:
Described nano bubble generating unit has:
The reception room that can hold described liquid; With
Described liquid irradiation ultrasonic wave in described reception room makes described micron bubble change the ultrasonic vibration unit of described nano bubble into.
3. gas lysate generating apparatus as claimed in claim 2 is characterized in that:
Described ultrasonic vibration unit has the different a plurality of ultrasonic oscillators of vibration frequency.
4. gas lysate generating apparatus as claimed in claim 2 is characterized in that:
Described ultrasonic vibration unit is arranged at the bottom of described reception room, shines described ultrasonic wave towards the top of described reception room.
5. gas lysate generating apparatus as claimed in claim 4 is characterized in that:
Described nano bubble generating unit also has:
The guiding stream, it has the open end that is arranged at described reception room bottom, and described liquid is directed into described open end; With
Dividing wall, it is arranged between the described open end and described ultrasonic wave generating unit of described guiding stream, extends setting upward from the bottom surface of described reception room.
6. gas lysate generating apparatus as claimed in claim 2 is characterized in that:
Described nano bubble generating unit also has:
First liquid outlet, it is arranged on the side of described reception room, and the described liquid that will contain described nano bubble is discharged in the described cycling mechanism;
Second liquid outlet, it is arranged on the side of described reception room, and the described body fluid that will contain described nano bubble is discharged to outside the described cycling mechanism; With
Dirt separation liquid outlet, its in the side of described reception room than described first and described second liquid outlet be provided with above leaning on, discharge the described liquid of the dirt that contains come-up.
7. gas lysate generating apparatus as claimed in claim 2 is characterized in that:
Described nano bubble generating unit also has the dividing plate that is formed by mesh members, and it is arranged in the described reception room apart from the end face of described reception room predetermined distance place downwards.
8. gas lysate generating apparatus as claimed in claim 2 is characterized in that: the end face of described reception room is formed with and makes the irreflexive male and female face of described ultrasonic wave.
9. gas lysate generating apparatus as claimed in claim 2 is characterized in that:
End face at described reception room is provided with the transparent component zone that is formed by transparent component.
10. gas lysate generating apparatus as claimed in claim 5 is characterized in that:
The all or part of of described guiding stream formed by transparent component.
11. gas lysate generating apparatus as claimed in claim 1 is characterized in that:
Also have cooling unit, it cools off the described liquid by described cycling mechanism circulation.
12. gas lysate generating apparatus as claimed in claim 1 is characterized in that:
Also have presser unit, it is to the described liquid pressurization by described cycling mechanism circulation.
13. gas lysate generating apparatus as claimed in claim 1 is characterized in that: have
A plurality of gas introduction ports, it is used for importing described gas from the described gas-liquid mixed of described gas lysate generating apparatus extroversion portion; With
Residual gas is introducing port again, and its residual gas that will be in described gas lysate generating apparatus produces from described liquid imports to described gas-liquid mixed portion once more.
14. gas lysate generating apparatus as claimed in claim 13 is characterized in that:
From described residual gas again introducing port import the described residual gas in described micron bubble generating unit, produce.
15. gas lysate generating apparatus as claimed in claim 1 is characterized in that:
Described micron bubble generating unit has:
The foaming chamber that can hold described liquid; With
Spray described liquid to described foaming chamber, in described foaming chamber, produce the foamed cell of described micron bubble.
16. gas lysate generating apparatus as claimed in claim 15 is characterized in that:
Described foamed cell has a plurality of effervescent nozzles that produce described micron bubble separately individually in described foaming chamber.
17. gas lysate generating apparatus as claimed in claim 16 is characterized in that:
The internal face of the jet of described effervescent nozzle is with respect to the angle of described injection direction expansion 5 degree～10 degree.
18. gas lysate generating apparatus as claimed in claim 15 is characterized in that:
Described foamed cell is set at the bottom of described foaming chamber, sprays described liquid to the top of described foaming chamber.
19. gas lysate generating apparatus as claimed in claim 15 is characterized in that:
Described micron bubble generating unit also has:
Liquid outlet, it is arranged at the side of described foaming chamber, discharges the described liquid that contains described micron bubble; With
The residual gas outlet, it is arranged at the end face of described foaming chamber, discharges the residual gas that produces from described liquid.
20. a gas lysate generation method is characterized in that:
At gas-liquid mixed portion mist and liquid;
The micron bubble generating unit that contains the described liquid of described gas in inflow is a micron bubble with the described gas conversion that contains in the described liquid;
The nano bubble generating unit that contains the described liquid of described micron bubble in inflow is transformed to nano bubble with the described micron bubble that contains in the described liquid;
The described liquid that contains described nano bubble is circulated in described gas-liquid mixed portion, described micron bubble generating unit and described nano bubble generating unit, improve the concentration of ordinary dissolution of gas in described liquid.
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|---|---|---|---|
| JP2010-091474 | 2010-04-12 | ||
| JP2010091474A JP2011218308A (en) | 2010-04-12 | 2010-04-12 | Gas-dissolved liquid generating apparatus and method for generation |
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| Publication Number | Publication Date |
|---|---|
| CN102210987A true CN102210987A (en) | 2011-10-12 |
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|---|---|---|---|
| CN2011100443877A Pending CN102210987A (en) | 2010-04-12 | 2011-02-24 | Gas dissolving liquid generation device and generation method therefor |
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| CN (1) | CN102210987A (en) |
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