JP2005000811A - Gas absorption apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a gas absorption apparatus capable of producing a high-concentration gas-absorbed solution stably at a specified temperature. <P>SOLUTION: The apparatus has a static mixer 2 stirring and mixing a raw liquid and a raw gas together and a heating/cooling circuit 31 adjusting the temperature of the gas-absorbed solution formed by the mixer 2. The mixer 2 has two or more resistors arranged within the passage in a cylindrical casing, and the resistors are protruded from the internal peripheral surface toward the center in the form of a plate and arranged axially at specified intervals so that they are inclined downstream, do not come in contact with each other and are shifted circumferentially in sequence at a specified angle. Specially, the apparatus has a treatment tank 3 allowing the introduced raw liquid to stay for a specified time. The gas-absorbed solution is circulated between the mixer 2 and the tank 3, while the raw gas is injected on the upstream side from the mixer 2. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a gas absorber that dissolves a raw material gas component in a raw material liquid to generate a gas absorbing liquid having a required concentration.
[0002]
[Prior art]
Ozone water is widely used for cleaning and sterilization of machinery in food factories and water sterilization. In the production of ozone water, air diffusers and ejectors are used to absorb and dissolve ozone gas in water. However, in order to increase the gas-liquid contact efficiency and simplify the device configuration, the ozone water production device is configured to promote the dissolution of ozone gas by stirring and mixing ozone gas and water with a static mixer. Is known (see Patent Document 1).
[0003]
[Patent Document 1]
Japanese Patent Laid-Open No. 10-192867
[Problems to be solved by the invention]
However, in the conventional ozone water production apparatus as described above, there is a limit to the gas-liquid contact efficiency between ozone gas and water. Especially in applications where ozone water is used at a temperature higher than room temperature, highly concentrated ozone water is not used. There was an inconvenience that it could not be obtained stably.
[0005]
The present invention has been devised to solve such problems of the prior art, and its main purpose is to be able to stably generate a high-concentration gas absorbing liquid at a required temperature. It is in providing the gas absorption apparatus comprised in this.
[0006]
[Means for Solving the Problems]
In order to achieve such an object, in the present invention, as shown in claim 1, a static mixer for stirring and mixing the raw material liquid and the raw material gas, and a temperature for adjusting the temperature of the gas absorbing liquid generated thereby. The static mixer includes a plurality of resistors disposed in a flow path inside a cylindrical casing, and the plurality of resistors are both arranged from the inner peripheral surface side to the center portion. It is projected in a plate shape toward the downstream side, and is provided at predetermined intervals in the axial direction and sequentially shifted by a predetermined angle in the circumferential direction so as not to contact each other in a state of being inclined toward the downstream side.
[0007]
According to this, in the static mixer, by introducing the raw material liquid and raw material gas into the static mixer at the required pressure and flow rate, a strong turbulent flow is generated inside and the gas-liquid mixture is vigorously stirred. Therefore, the bubbles of the raw material gas are finely crushed and fine bubbles are generated at a high density, and the gas-liquid contact efficiency is greatly enhanced. For this reason, it is possible to stably generate a high-concentration gas absorbing liquid even under relatively high temperature conditions where it has been difficult to absorb a large amount of gas. For example, in the production of ozone water, a high-concentration gas absorbing liquid can be generated under any temperature condition that is higher than normal temperature and is up to 60 ° C., which is the solubility limit of ozone gas in water.
[0008]
In the gas absorption device, as shown in claim 2, the gas absorption device has a treatment tank in which a raw material liquid is introduced and retained for a required time, and the stationary gas is injected while injecting the raw material gas upstream of the static mixer. A configuration in which the liquid is circulated between the mold mixer and the treatment tank can be employed. According to this, fine bubbles generated in a large amount in the liquid by the static mixer are maintained in the treatment tank, and the dissolution of the raw material gas components in the liquid proceeds here, so that a high concentration gas absorbing liquid is generated. be able to.
[0009]
In the gas absorbing device, as shown in claim 3, the static mixer can have a configuration in which a jacket capable of circulating a heat medium is provided on the outer periphery of the casing. According to this, the liquid can be heated and cooled in the process of flowing through the static mixer, and the efficiency of temperature adjustment can be increased.
[0010]
In the static mixer, in particular, the pair of resistors are protruded in a tongue shape from the inner peripheral surfaces facing each other so as to form a generally C shape, and one of the resistors is formed of the cylindrical body. A resistor element is formed so as to be longer than the other so as to intersect the center line.A plurality of resistor elements are arranged in the axial direction while being sequentially shifted by a predetermined angle in the circumferential direction. It is good to have a configuration.
[0011]
According to this, since the resistor has a tongue shape, the flow that collided with the resistor is distributed in multiple directions around the resistor, and a vortex (wake) due to entrainment occurs on the back side of the resistor, and this resistance By repeating the collision, dispersion and entrainment of the circulating fluid by the body one after another, a strong turbulent flow is generated and the circulating fluid is vigorously stirred. Furthermore, by arranging the resistor elements while shifting by a predetermined angle in the circumferential direction along the flow direction, the resistor formed in a long shape so as to intersect the center line of the cylindrical body is arranged in a spiral shape as a whole As a result, a swirling flow around the center line of the cylindrical body is generated in the circulating fluid, and stirring is continuously performed in the downstream portion.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below in detail with reference to the accompanying drawings.
[0013]
FIG. 1 is a schematic diagram showing a schematic configuration of a gas absorption apparatus according to the present invention. This gas absorption device generates ozone water by dissolving ozone in raw water (equivalent to pure water). It is generated by an ozone generator (gas supply means) 1 that generates ozone gas and the ozone generator 1. A stationary mixer 2 that stirs and mixes the ozone gas and water, and a treatment tank 3 that retains the gas-liquid mixture flowing through the stationary mixer 2 and advances the dissolution of ozone into the liquid. Yes.
[0014]
A raw water introduction part 5 for introducing raw water into the treatment tank 3 is provided in the upper part of the treatment tank 3, and an ozone water recovery part for extracting the generated ozone water is provided in the middle part of the treatment tank 3. 6 is provided. Further, an exhaust gas recovery unit 7 for recovering ozone gas diffused in the gas phase of the processing tank 3 is provided at the upper part of the processing tank 3, and the exhaust gas recovered from the exhaust gas passes through the exhaust gas treatment device 8. Released into the atmosphere.
[0015]
In the lower part of the treatment tank 3, there are an outlet part 11 for drawing out the water in the treatment tank 3 and guiding it to the static mixer 2, and an inlet part for returning the water circulated through the static mixer 2 to the treatment tank 3. 12 and a pump for circulating and feeding water between the treatment tank 3 and the static mixer 2 in the middle of the pipe connecting the outlet 11 of the treatment tank 3 and the static mixer 2. 13 is provided.
[0016]
The ozone gas generated by the ozone generator 1 is injected into the water upstream of the static mixer 2. In particular, the ozone generator 1 can generate ozone gas at a pressure (for example, 30 Pa) higher than the discharge pressure of the pump 13. The ozone gas is injected downstream of the pump 13. In addition, when the ozone gas of the ozone generator is relatively low pressure, the configuration is such that the ozone gas is injected into the water upstream of the pump. In this case, even if the gas intake amount is increased, the inhalation is not caused. It is better to use the pump. Moreover, you may make it use the pump of the structure which introduce | transduces gas directly in a casing.
[0017]
The treatment tank 3 is provided with a concentration sensor 16 for detecting the ozone concentration of ozone water, and an output signal of the concentration sensor 16 is input to a control panel (control means) 18 via an ozone concentration meter 17. In the control panel 18, the operations of the ozone generator 1 and the pump 13 are controlled based on the detection result of the ozone concentration meter 17, and the ozone water in the treatment tank 3 is brought into a required range centering on the target concentration. It comes to hold.
[0018]
An absorber tank (buffer container) 21 is provided in the middle of the piping for guiding the ozone gas generated by the ozone generator 1 to the upstream side of the static mixer 2 in order to prevent the ozone gas from flowing back to the ozone generator 1. ing. The upstream pipe L1 of the absorber tank 21 is provided with a first valve V1, and the downstream pipe L2 is provided with a second valve V2. Further, the absorber tank 21 is connected to a pipe L3 that guides ozone gas to the exhaust gas recovery section 7 of the processing tank 3, and a third valve V3 is provided in the pipe L3. Each of the first, second, and third valves V1, V2, and V3 includes an electric valve or an electromagnetic valve, and is controlled to be opened and closed by the control panel 18.
[0019]
The treatment tank 3 is provided with a level switch (water level detecting means) 27 for detecting the water level of the ozone water inside, and an output signal of the level switch 27 is input to the control panel 18. Is configured to maintain the water level of the ozone water in the processing tank 3 within a predetermined range based on the detection result of the level switch 27. The water level in the treatment tank 3 is adjusted by a fourth valve V4 provided in a pipe L5 connected to the raw water introduction part 5 of the treatment tank 3, and the fourth valve V4 is composed of an electric valve or an electromagnetic valve. The control panel 18 controls the opening and closing.
[0020]
This gas absorption device is further provided with a heating / cooling circuit (temperature adjusting means) 31 for adjusting ozone water to a required temperature by heat exchange of a heat medium (water, etc.). Here, heating / cooling is performed. The heat medium heated or cooled to a predetermined temperature by the apparatus 32 flows through the heat transfer pipe 33 provided in the processing tank 3 to heat or cool the ozone water in the processing tank 3. A pipe L7 connecting the outlet 11 of the treatment tank 3 and the static mixer 2 and a pipe L8 connecting the static mixer 2 and the inlet 12 of the treatment tank 3 are each a heat medium that circulates in the outer pipe. It has a double pipe structure that heats and cools the water flowing through the inner pipe. Furthermore, the static mixer 2 is provided with a jacket 35 through which a heat medium flows. Note that the pipes L7 and L8 and the jacket 35 of the static mixer 2 are provided with lagging for heat insulation and cold insulation.
[0021]
In the gas absorption apparatus configured in this way, the ozone generator 1 and the pump 13 are started, and both the first and second valves V1 and V2 are opened, so that the static mixer 2 and the treatment tank 3 are opened. When the gas absorption process starts and the ozone concentration in the treatment tank 3 reaches a predetermined value, the gas absorption process is stopped.
[0022]
When the ozone water is appropriately extracted from the ozone water recovery unit 6 of the treatment tank 3 and the level switch 27 detects that the water level of the ozone water in the treatment tank 3 has reached the lower limit, the fourth valve V4 is opened to open the raw material. When the level switch 27 detects that the water has been replenished into the treatment tank 3 and the water level in the treatment tank 3 has risen to reach the upper limit, the fourth valve V4 is closed to stop the replenishment of the raw material water. On the other hand, when the concentration of ozone water decreases as the raw material water is introduced into the treatment tank 3, and this is detected by the ozone concentration meter 17, the gas absorption process is resumed.
[0023]
When the ozone concentration reaches a predetermined value and the gas absorption process is stopped, the exhaust process of the residual gas in the pipe is performed according to the following procedure. That is, after the main part of the ozone generator 1 is stopped together with the pump 13, the compressor in the ozone generator 1 is continuously operated for a predetermined time (for example, 5 to 10 seconds), and during this time, the first valve V1 is first opened. In this state, the second valve V2 is closed and the third valve V3 is opened to guide the residual gas to the exhaust gas recovery unit 7 of the treatment tank 3. When the exhaust is completed, the first valve V1 is closed.
[0024]
On the other hand, when the gas concentration is started when the ozone concentration falls below a predetermined value, the pump 13 and the ozone generator 1 are started, and after a predetermined time (for example, 10 seconds) has elapsed, the third valve V3 is closed and the second valve V3 is closed. 1 valve V1 is opened, and then the second valve V2 is opened after the absorber tank 21 is filled with ozone gas.
[0025]
Further, while the gas absorption process is performed in this manner, the ozone water is adjusted to a required temperature by the heating / cooling circuit 31. The heating / cooling device 32 is automatically operated so as to maintain the heat medium at a predetermined temperature, and the heat medium sent out from the heating / cooling device 32 is the heat transfer pipe 33 in the processing tank 3 and the outer pipe of the pipe L7. Then, the jacket 35 of the static mixer 2 and the outer pipe of the pipe L8 are sequentially circulated, and the ozone water staying in the treatment tank 3 and the water flowing through the pipes L7 and L8 and the static mixer 2 are heated and cooled. Is done.
[0026]
FIG. 2 is a side view showing the static mixer shown in FIG. The static mixer 2 is provided with a jacket 35 on the outer periphery of the casing 40 through which a heat medium can flow. In the jacket 35, an outer cylinder 52 into which a heat medium is introduced is disposed on the outer periphery of the casing 40, and the casing 40 and the resistor element 41 described in detail later are heated and cooled by heat transfer from the heat medium. The In this configuration, fins may be provided inside in order to improve heat exchange characteristics.
[0027]
FIG. 3 is a perspective view showing a main part of the static mixer shown in FIG. This static mixer has a large number of resistor elements 41 inserted in a cylindrical casing 40. The resistor element 41 is formed by a first and second pair of resistor bodies 43 and 44 projecting in a tongue shape from the inner peripheral surfaces of a cylindrical body 42 having a circular cross section facing each other toward the center. The cylindrical body 42 continuously forms a flow path.
[0028]
The resistors 43 and 44 are both arranged in a C shape while being inclined toward the downstream side, and are offset in the axial direction so as to ensure a required interval between the resistors 43 and 44. ing. As shown in FIGS. 4 and 5, the upstream first resistor 43 is short so as not to intersect the center line of the cylindrical body 42, and the downstream second resistor 44 is a cylindrical body. It is formed in a long shape so as to intersect the center line of 42.
[0029]
Concavities and convexities are formed at the end of the cylindrical body 42 in the axial direction so as to be coupled with each other by shifting by 45 degrees with respect to adjacent ones. Moreover, it can divide | segment into the two division bodies 42a and 42b in which a pair of resistor 43 * 44 was each formed by the division line along an axial direction. As a result, manufacturing can be facilitated and obstacles attached to the surface can be easily removed.
[0030]
When the resistor element 41 thus formed is inserted into the casing 40, the resistor element 41 is arranged by being shifted by 45 degrees in the circumferential direction with respect to the resistor element 41 immediately before indicated by an imaginary line in FIG. In the following, the subsequent resistor elements 41 are also arranged so as to be shifted in the same direction by 45 degrees with respect to the immediately preceding one, and for the first resistor element 41, 45 degrees, 90 degrees, 135 in the circumferential direction, respectively. The angular position is such as 180 degrees or 180 degrees. Therefore, when viewed as a whole, the resistors 43 and 44 that form a pair of C-shapes are arranged so as to draw a spiral with a lead angle corresponding to the shift angle of the resistor element 41.
[0031]
For this reason, when the fluid is introduced into the inside, the flow of the first resistor element 41 facing the resistors 43 and 44 collides with the resistors 43 and 44 and is distributed to the surroundings. The flow not opposed to 44 collides with any of the resistors 43 and 44 of the downstream resistor element 41 without causing a short path and is dispersed in multiple directions, and a strong turbulent flow is generated inside.
[0032]
In this way, a vigorous turbulent flow is generated in the gas-liquid mixture of ozone and water introduced into the static mixer 2, and fine bubbles of ozone gas are generated at a high density by the stirring action of this turbulent flow. Bubbles persist without becoming coarse. For this reason, the gas-liquid contact efficiency between water and ozone gas in the treatment tank 3 is greatly increased, and further, the dissolution of ozone into the water proceeds due to the fine bubbles that continue in the pipe, thereby obtaining high-concentration ozone water. Can do.
[0033]
In the present embodiment, ozone water is generated by dissolving ozone in water, but the raw material liquid in the gas absorption device according to the present invention is not limited to water, and the raw material gas is also limited to ozone. Is not to be done. For example, gas absorption using hydrogen gas as a raw material gas in order to generate a liquid having a reducing action by OH radicals may be employed.
[0034]
【Example】
In the gas absorption apparatus configured as described above, high-concentration ozone water can be generated under any temperature condition up to 60 ° C., which is the solubility limit of ozone gas in water. For example, ozone water is used at room temperature in applications such as cleaning and sterilization of machinery in food factories and water sterilization, and cleaning and removal of organic substances attached to the substrate in the IC substrate manufacturing process. Under such temperature conditions, An ozone concentration of 20-40 ppm can be achieved. Also, in the application of washing and sterilization of eggs, it is necessary to keep the temperature of ozone water strictly around 40 ° C. in order to avoid the temperature change of eggshell membranes and the intrusion of water due to the pressure drop in the eggshell. Then, an ozone concentration of 3 to 5 ppm can be achieved. When the eggs were washed and sterilized using the actually obtained ozone water, coliforms were not detected in the washing waste water, and it was confirmed that the effluent had a sufficient washing and sterilizing effect.
[0035]
【The invention's effect】
As described above, according to the present invention, in the static mixer, the bubbles of the raw material gas are finely crushed and fine bubbles are generated at a high density, and the gas-liquid contact efficiency is greatly improved. Even under relatively high temperature conditions, it is possible to stably generate a high-concentration gas absorption liquid, which is very effective in improving the efficiency of required processes such as oxidation / reduction treatment using the gas absorption liquid. In addition, since the structure can be made relatively simple, a remarkable effect can be obtained in reducing the initial cost and the running cost.
[Brief description of the drawings]
FIG. 1 is a schematic diagram showing a schematic configuration of a gas absorption apparatus according to the present invention. FIG. 2 is a side view showing a static mixer shown in FIG. 1. FIG. 3 is a schematic diagram of a main part of the static mixer shown in FIG. FIG.
4 is a cross-sectional view showing the resistor element shown in FIG. 3. FIG.
FIG. 5 is a front view of the resistor element shown in FIG. 3 as viewed from the upstream side.
6 is a front view similar to FIG. 5 for explaining the arrangement state of the resistor elements shown in FIG. 3;
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Ozone generator 2 Static mixer 3 Processing tank 13 Pump 31 Heating / cooling circuit 32 Heating / cooling device 33 Heat transfer tube 35 Jacket 40 Casing 43/44 Resistor

Claims (3)

A static mixer for stirring and mixing the raw material liquid and the raw material gas, and a temperature adjusting means for adjusting the temperature of the gas absorbing liquid generated thereby,
In the static mixer, a plurality of resistors are disposed in a flow path inside a cylindrical casing, and the plurality of resistors are projected in a plate shape from the inner peripheral surface side toward the center. A gas absorption device characterized in that it is provided at predetermined intervals in the axial direction so as not to contact each other in a state of being inclined toward the downstream side, and sequentially shifted by a predetermined angle in the circumferential direction. It has a treatment tank that introduces a raw material liquid and retains it for a required time, and circulates the liquid between the static mixer and the treatment tank while injecting a raw material gas upstream of the static mixer. The gas absorption device according to claim 1, wherein the gas absorption device is made to be. 3. The gas absorption device according to claim 1, wherein the static mixer is provided with a jacket through which a heat medium can flow on an outer periphery of the casing.

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