CN102137827A - 制造陶瓷元件的方法 - Google Patents

制造陶瓷元件的方法 Download PDF

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Publication number
CN102137827A
CN102137827A CN2009801294353A CN200980129435A CN102137827A CN 102137827 A CN102137827 A CN 102137827A CN 2009801294353 A CN2009801294353 A CN 2009801294353A CN 200980129435 A CN200980129435 A CN 200980129435A CN 102137827 A CN102137827 A CN 102137827A
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ceramic component
temperature
sand
described ceramic
presintering
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CN2009801294353A
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CN102137827B (zh
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赫尔穆特·D·林克
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Waldemar link Limited Partnership On shares
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Deru GmbH
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Priority claimed from PCT/EP2008/006524 external-priority patent/WO2009036845A2/de
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Priority claimed from PCT/EP2009/005746 external-priority patent/WO2010015414A1/de
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    • C04B2235/963—Surface properties, e.g. surface roughness

Abstract

本发明涉及一种制造一陶瓷元件的方法。实施所述方法时，提供一粉末状陶瓷原料和一可为所述陶瓷元件定型的模具。将所述陶瓷原料送入所述模具。在一介于880℃与980℃之间的温度下对所述陶瓷元件进行预烧结处理，然后从所述模具中取出所述陶瓷元件。用一喷砂材料处理所述陶瓷元件的表面，在一温度下烧结所述陶瓷元件，所述温度高于所述预烧结处理的温度。通过本发明的方法可以制造表面粗糙度更大的陶瓷元件。更大的表面粗糙度更便于在所述陶瓷元件上牢固地施覆一涂层。

Description

制造陶瓷元件的方法
技术领域
本发明涉及一种制造陶瓷元件的方法。实施该方法时，提供一种粉末状陶瓷原料并将其送入可为所述陶瓷元件定型的模具内。对所述陶瓷元件进行预烧结处理，从所述模具中取出所述陶瓷元件，随后在一温度下烧结所述陶瓷元件，所述温度高于所述预烧结处理的温度。
背景技术
陶瓷元件的这种制造方法例如公开自EP 0 421 085。事实表明，通过这种方法制成的陶瓷元件表面粗糙度很小，因而很难在该陶瓷元件上牢固地施覆涂层。
发明内容
本发明的目的在于提供一种制造陶瓷元件的方法，按本发明制成的陶瓷元件有相对更好的基础条件来施覆涂层。从上述现有技术出发，本发明用来达成此目的的解决方案是独立权利要求的特征。从属权利要求为有利的实施方式。本发明为预烧结步骤选用的温度介于880℃与980℃之间。在预烧结处理之后，烧结处理之前，用喷砂材料处理所述陶瓷元件的表面。
制造陶瓷元件时，先将粉末状陶瓷原料填入可为所述陶瓷元件定型的模具内。由于该陶瓷元件经过后续加工步骤后体积会减小，因此，这个模具的尺寸比成品陶瓷元件的尺寸大。通过后续烧结处理使所述陶瓷元件具有稳定的内部结构。通过烧结处理，所述粉末的颗粒之间会牢固相连。
所述烧结处理分多个步骤进行。第一步是在相对较低的温度下对所述陶瓷元件进行预烧结，使得粉末颗粒之间仅产生狭小的桥形结构。对于本发明的方法而言，上述狭小桥形结构的稳定性应满足以下条件：用喷砂材料处理表面可以提高表面粗糙度。桥形结构的稳定性过低，陶瓷元件就会碎裂成若干部分，桥形结构的稳定性过高，使用喷砂材料实施的处理就不足以改变陶瓷元件的表面结构。试验结果表明，如果预烧结采用介于880℃与980℃之间的温度，就可通过喷砂材料来按需要地改变表面结构。在此情况下，所述陶瓷元件的内部结构应满足以下条件：用喷砂材料处理时，所述元件上会有期望大小的碎块脱落。
一般而言，如果提高预烧结温度，粉末材料的颗粒之间的连接强度就会增大。当预烧结温度高于900℃，低于950℃时，通过本发明的方法可以取得较佳结果。
表面粗糙度Ra应大于2.5μm(WO 2009/036845)，以便为所述陶瓷元件涂覆钛合金。本发明范围内所提供的粗糙度数据均参照DIN EN ISO 4288和DIN EN ISO 3274等标准的平均粗糙度Ra，且与经烧结处理后的成品陶瓷元件有关。通过本发明方法所实现的表面粗糙度与用喷砂材料处理时所选择的参数有关，例如喷砂材料的粒度和颗粒撞击陶瓷元件时的速度。实施本发明的方法时，优选将这些参数设定成可以使成品陶瓷元件的表面粗糙度Ra大于2.5μm。成品陶瓷元件的表面粗糙度Ra不应超过7μm，以便一步到位地将所述涂层施覆到陶瓷元件表面。
在本发明范围内，所述陶瓷元件的整个表面都可用喷砂材料处理。在需要为所述陶瓷元件的整个表面施覆涂层的情况下，这一点十分有利。但一般情况下只需对部分表面进行涂层处理，另一部分表面则保持无涂层状态。这一点例如适用于内置假体组件，内置假体组件的一部分表面需要用来与骨质建立连接，另一部分表面需要作为滑动面来与另一假体组件共同作用。滑动面不需要高的表面粗糙度。因此，本发明的方法可以这样设计：只用喷砂材料处理所述陶瓷元件的一部分表面，用喷砂材料处理时留出另一部分表面不作处理。在本发明范围内，陶瓷元件的表面处理既包括整个表面，也包括部分表面。
所述喷砂材料的粒度优选与所述陶瓷原料的粒度为同一数量级。这样的喷砂材料将会特别有效地作用于所述陶瓷元件。但是使用这类喷砂材料时，喷砂材料的颗粒可能会进入陶瓷材料内因碎块脱落而形成的空隙中。这部分颗粒就此成为陶瓷材料的杂质。如果采用与所述陶瓷原料的粉末相一致的粉末作为喷砂材料，就不会产生这类杂质。即使该材料的颗粒粘附于所述陶瓷元件内部，这部分颗粒也不会改变陶瓷材料的均匀组成。
施覆在所述陶瓷元件表面的涂层可由钛合金或纯钛构成。涂层方法可以采用等离子喷涂。等离子喷涂是一种用电弧导引气体从而将气体电离的方法。将涂层材料以粉末状态送入电离气体，再由气流将其运送到需要涂层的工件上。
事实表明，氧化锆、氧化铝及其混合物是适用于本发明方法的陶瓷材料。
下面联系附图并借助有利实施方式对本发明进行示范性说明。
附图说明
图1为椎间盘假体剖面图；
图2为图1所示椎间盘假体的局部放大图；
图3为陶瓷元件在初始状态下的内部结构图；
图4为图3所示内容经预烧结处理后的视图；以及
图5为图3所示内容经烧结处理后的视图。
具体实施方式
下面通过具体实施例进一步描述本发明的技术方案。应理解，这些实施例仅用于说明本发明而不用于限制本发明的范围。
如图1所示，一个设计为椎间盘假体的内置假体镶嵌在两椎体6、7之间的椎间隙内。该椎间盘假体包括第一接触板1和第二接触板2。第一接触板1是用于连接第一椎体6的内置假体组件，第二接触板2是用于连接第二椎体7的内置假体组件。
第一接触板1和第二接触板2通过相配的滑动面3彼此紧靠在一起。滑动面3构成位于上部的第一接触板1和位于下部的第二接触板2之间的移动的铰链。
接触板1、2通过其表面区域13紧靠在椎体6、7的骨质上，这些区域13内形成有多个突起12。突起12沿接触板1、2插入椎间隙时的插入方向的侧壁较为平直，相反方向上的侧壁相对较陡。相对较陡的侧壁可以方便接触板1、2插入椎间隙。突起12刺入椎体6、7的骨质后，相对较陡的侧壁将接触板1、2予以固定。这些相对较陡的侧壁可以防止接触板1、2沿相反方向从椎间隙中脱落。
接触板1、2的凸缘4、5可以紧靠在椎体6、7的腹侧。由于凸缘4、5的存在，接触板1、2在背向上不会在期望位置以外的位置上插入椎间隙。
接触板1和接触板2由陶瓷材料9构成。接触板1、2上的滑动面3形成在陶瓷材料9的表面。用于与骨质建立连接的区域13上覆有一个由钛合金构成的涂层10。
图2为接触板1、2的局部放大图，显示了陶瓷材料9和涂层10之间的分界面8。陶瓷材料9在其与涂层10之间的分界面8上具有一个至少为2.5μm的粗糙度Ra。分界面8上的这个粗糙度足以用来稳定地连接涂层10，但是若要与骨质建立稳定连接，这个粗糙度还不够。涂层10的粗糙度和孔隙度都比陶瓷材料9大，因而可与骨质建立稳定连接。
为了制造内置假体组件形状的陶瓷元件，同时使其部分表面具有符合要求的粗糙度，首先需要将粉末状原料送入一个形状与待制陶瓷元件一致的模具内。由于该陶瓷元件经过后续处理步骤后体积会减小，因此，这个模具的尺寸比成品陶瓷元件的尺寸大。在该模具内例如通过振动和加压方式对所述粉末进行机械压缩处理，在此之后，该粉末的颗粒14就会如图3所示并排排列。以920℃的温度进行预烧结后，颗粒14之间会形成如图4所示的桥形结构。至此，材料的内部结构已经达到可以从模具中取出陶瓷元件的稳定程度。
桥形结构15使得所述陶瓷材料的结构稳定性高于采用如钻孔或铣削等机械加工方式所能实现的结构稳定性。经调节所产生的结构稳定性应满足以下条件：用与所述原料相符的粉末进行喷射处理时，经预烧结处理的陶瓷材料上会有碎块脱落。这些碎块的大小应满足以下条件：经烧结处理后的成品陶瓷元件具有符合要求的表面粗糙度。
实现所需要的表面结构并完成机械加工后，以一个高于预烧结温度的温度对所述陶瓷元件进行烧结处理。在此之前仅通过桥形结构15相连的颗粒之间的分界面上形成平面连接结构16。由于内部空隙消失，所述陶瓷元件的体积进一步缩小。所述表面用喷砂材料处理过的部分的粗糙度Ra约为4μm。施覆在这部分表面的钛合金涂层会牢固地附着在表面。

Claims (9)

1.一种制造陶瓷元件的方法，所述方法包括如下步骤：
a.提供粉末状陶瓷原料；
b.提供可为所述陶瓷元件定型的模具；
c.将所述陶瓷原料送入所述模具中；
d.在一介于880℃与980℃之间的温度下，对所述陶瓷元件进行预烧结处理；
e.从所述模具中取出所述陶瓷元件；
f.用喷砂材料处理所述陶瓷元件的表面；
g.在一温度条件下烧结所述陶瓷元件，所述温度高于所述预烧结处理的温度。
2.如权利要求1中所述的方法，其特征在于，所述预烧结处理的温度高于900℃。
3.如权利要求1或2所述的方法，其特征在于，所述预烧结处理的温度低于950℃。
4.如权利要求1至3中任一权利要求所述的方法，其特征在于，所述陶瓷元件一部分表面的粗糙度Ra大于2.5μm。
5.如权利要求1至4中任一权利要求所述的方法，其特征在于，使用一粒度与所述陶瓷原料的粒度相一致的喷砂材料。
6.如权利要求1至5中任一权利要求所述的方法，其特征在于，采用一与所述陶瓷原料相一致的材料作为所述喷砂材料。
7.如权利要求1至6中任一权利要求所述的方法，其特征在于，在所述陶瓷元件的表面施覆一由钛合金构成的涂层。
8.如权利要求1至7中任一权利要求所述的方法，其特征在于，用所述喷砂材料处理所述陶瓷元件的整个表面。
9.如权利要求1至7中任一权利要求所述的方法，其特征在于，用所述喷砂材料处理时，留出所述陶瓷元件的一部分表面不作喷砂处理。
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