CN102111970A - 电子装置壳体及其制作方法 - Google Patents

电子装置壳体及其制作方法 Download PDF

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CN102111970A
CN102111970A CN2009103124236A CN200910312423A CN102111970A CN 102111970 A CN102111970 A CN 102111970A CN 2009103124236 A CN2009103124236 A CN 2009103124236A CN 200910312423 A CN200910312423 A CN 200910312423A CN 102111970 A CN102111970 A CN 102111970A
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titanium dioxide
dioxide film
electronic device
case
nano titanium
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姜传华
杜琪健
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Shenzhen Futaihong Precision Industry Co Ltd
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Shenzhen Futaihong Precision Industry Co Ltd
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Priority to CN2009103124236A priority Critical patent/CN102111970A/zh
Priority to US12/949,934 priority patent/US8470419B2/en
Publication of CN102111970A publication Critical patent/CN102111970A/zh
Priority to US13/893,584 priority patent/US20130240350A1/en
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    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5025—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with ceramic materials
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    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
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    • H05K5/02—Details
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    • H05K5/0243—Mechanical details of casings for decorative purposes
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Abstract

本发明提供一种电子装置的壳体及其制作方法。该电子装置壳体包括一基体及形成于基体表面的纳米二氧化钛膜，该纳米二氧化钛膜为金红石相晶格结构或金红石相与锐钛矿相的混合晶格结构，其厚度在10-100nm之间。一种电子装置壳体的制作方法，其包括如下步骤：提供一基体；在该基体的表面真空溅镀一纳米二氧化钛膜，该纳米二氧化钛膜为金红石相晶格结构或金红石相与锐钛矿相的混合晶格结构，其厚度在10-100nm之间。

Description

电子装置壳体及其制作方法
技术领域
本发明是关于一种电子装置壳体及其制作方法，尤其是关于一种具有自清洁功能的电子装置壳体及其制作方法。
背景技术
现有电子产品(如手机、PDA等)的壳体常被镀覆一金属层或金属氧化物层而使产品具有金属质感，从而吸引消费者眼球。该金属层通常以不导电电镀的方式形成，因该金属层不导电，从而可避免对信号产生干扰。该不导电的金属层或金属氧化物层通常为透明状，其形成于壳体上之后，与壳体的基材或形成于壳体上的其他油漆层共同使得壳体呈现出多彩的具金属质感的外观。
然而，上述壳体虽然具有美丽的外观，却不具备自清洁功能，实用性欠佳。因为电子产品在使用过程中，其表面会慢慢的积聚很多灰尘，同时人手上的汗渍、或人手上涂抹的护手霜等均很容易残留在电子产品的表面上，这些灰尘，特别是按键周围的灰尘及残留的污染物难以用抹布或其它清洁物彻底的去除。显然，上述壳体亦不能对这些灰尘及残留的污染物自动进行去除，因而实用性不强，不能给消费者带来附加的使用价值，降低了产品的竞争力。
发明内容
鉴于此，有必要提供一种既具有金属质感外观又具有自清洁功能的电子装置壳体。
另外，还有必要提供一种上述电子装置壳体的制作方法。
一种电子装置壳体，其包括一基体及形成于基体表面的纳米二氧化钛膜，该纳米二氧化钛膜为金红石相晶格结构或金红石相与锐钛矿相的混合晶格结构，其厚度在10-100nm之间。
一种电子装置壳体的制作方法，其包括如下步骤：
提供一基体；
在该基体的表面真空溅镀一纳米二氧化钛膜，该纳米二氧化钛膜为金红石相晶格结构或金红石相与锐钛矿相的混合晶格结构，其厚度在10-100nm之间。
相较于现有技术，本发明电子装置壳体通过真空溅镀的方式在基体表面设置一具有上述特征的纳米二氧化钛膜，该纳米二氧化钛膜不仅可使壳体呈现出金属外观(且不干扰电子信号)，且该纳米二氧化钛膜可在可见光或紫外光的照射下分解掉粘附于壳体表面的灰尘或残留的有机污染物，从而对壳体表面起到清洁的作用。同时由于该纳米二氧化钛膜具有较强的亲水性，当有水流流过壳体表面时，该水流还会自动带走壳体上被纳米二氧化钛膜分解之后的残留污染物。如此，消费者在享受到该壳体美丽及高雅的外观的同时又可时刻保持壳体表面的清洁，可消除细菌经由电子装置壳体10传播的可能，保证了人体的健康，大大增强了产品的实用性及竞争力。
附图说明
图1为本发明一较佳实施方式电子装置壳体的剖视示意图。
主要元件符号说明
    电子装置壳体     10
    基体     11
    底漆层     13
    纳米二氧化钛膜     15
具体实施方式
请参阅图1所示，本发明一较佳实施方式的电子装置壳体10包括一基体11、形成于基体11表面的底漆层13以及结合于底漆层13表面的纳米二氧化钛膜15。
基体11可为塑料基体，其可以注塑成型的方式制成。注塑该基体11的塑料可选自为聚碳酸酯(PC)、聚乙烯(PE)、聚甲基丙烯酸甲酯(PMMA)及聚碳酸酯与丙烯腈-苯乙烯-丁二烯共聚合物的混和物(PC+ABS)中的任一种。该基体11亦可为玻璃或陶瓷基体。
底漆层13可由丙烯酸树脂漆、环氧树脂漆、聚氨酯树脂漆或酚醛树脂漆喷涂形成于基体11的表面而形成。该底漆层13可为彩色或无色透明，其起到隔离纳米二氧化钛膜15与基体11的作用，以保护基体11免受纳米二氧化钛膜15的氧化分解作用。该底漆层13的厚度可在1-30μm之间。
纳米二氧化钛膜15可以真空溅镀的方式制成。该纳米二氧化钛膜15为金红石相晶格结构或金红石相与锐钛矿相的混合晶格结构，并具有较强的亲水性。该纳米二氧化钛膜15的厚度在10-100nm之间，在该厚度范围内，所述纳米二氧化钛膜15不会对电子信号的收发产生干扰。该纳米二氧化钛膜15不仅可使壳体10呈现出金属外观，且该纳米二氧化钛膜15可在可见光或紫外光的照射下分解掉粘附于壳体10表面的灰尘或残留的有机污染物，对壳体10起到清洁作用。更由于该纳米二氧化钛膜15具有较强的亲水性，当有水流流过壳体10的表面时，该水流还会自动带走被纳米二氧化钛膜15分解之后的残留污染物。
可以理解的，所述底漆层13可以省略，即纳米二氧化钛膜15直接形成于基体11上。
所述壳体10可以是手机、PDA、笔记本电脑、MP3、MP4、GPS导航仪、蓝牙耳机或数码相机等产品的壳体。
本发明较佳实施方式的制作所述壳体10的方法包括如下步骤：
提供一基体11。该基体11可由塑料、玻璃或陶瓷材料制成。
在该基体11的表面喷涂一底漆层13。喷涂底漆层13所用的油漆可为丙烯酸树脂漆、环氧树脂漆、聚氨酯树脂漆或酚醛树脂漆。该底漆层13的厚度可在1-30μm之间。喷涂所述底漆层13前，可使用离子风枪或超声波清洗的方式对基体11的表面进行清洁处理。
在该底漆层13的表面真空溅镀一纳米二氧化钛膜15。该纳米二氧化钛膜15为金红石相晶格结构或金红石相与锐钛矿相的混合晶格结构，其厚度在10-100nm之间。溅镀该纳米二氧化钛膜15的工艺为：首先将真空室内抽真空至约1×10-3Pa，然后将形成有底漆层13的基体11输送至该真空室内，继续对该真空室抽真空至5×10-4～9×10-4Pa(即本底真空度值)，接着往真空室内通入高纯度(约99.99％)的氧气(O2)及氩气(Ar)，使真空室内的压力维持在0.05～0.29Pa之间，并使氧气的分压在0.01-0.225Pa之间。溅镀时以金属钛作为靶材，在脉冲电源的辉光放电作用下，氩气离子撞击该金属钛靶材的表面，使金属钛的原子被弹出与氧气进行反应，生成纳米二氧化钛而堆积在底漆层13的表面，从而形成纳米二氧化钛膜15。溅镀时，靶材的电源输出功率(即溅镀功率)为3000～4000W，镀膜的速率控制在0.3～0.5nm/S。
真空溅镀前，还可使用离子源对底漆层13的表面进行清洁处理。
可以理解的，所述喷涂底漆层13的步骤可以省略，即将纳米二氧化钛膜15直接溅镀于基体11的表面。
本发明电子装置壳体10通过真空溅镀的方式在基体11表面设置一纳米二氧化钛膜15，该纳米二氧化钛膜15不仅可使电子装置壳体10呈现出金属外观，且该纳米二氧化钛膜15可在可见光或紫外光的照射下分解掉粘附于电子装置壳体10表面的灰尘或残留的有机污染物，从而对电子装置壳体10的表面起到清洁的作用。同时由于该纳米二氧化钛膜15具有较强的亲水性，当有水流流过电子装置壳体10表面时，该水流还会自动带走壳体10上被纳米二氧化钛膜15分解之后的残留污染物。如此，消费者在享受到该电子装置壳体10美丽及高雅的外观的同时又可时刻保持壳体10表面的清洁，可消除细菌经由电子装置壳体10传播的可能，保证了人体的健康，大大增强了产品的实用性及竞争力。

Claims (10)

1.一种电子装置壳体，其包括一基体及形成于基体表面的纳米二氧化钛膜，其特征在于：该纳米二氧化钛膜为金红石相晶格结构或金红石相与锐钛矿相的混合晶格结构，其厚度在10-100nm之间。
2.如权利要求1所述的电子装置壳体，其特征在于：所述基体由塑料、玻璃或陶瓷制成。
3.如权利要求1所述的电子装置壳体，其特征在于：所述纳米二氧化钛膜以真空溅镀的方式形成。
4.如权利要求1所述的电子装置壳体，其特征在于：所述壳体还包括一形成于基体与纳米二氧化钛膜之间的底漆层。
5.如权利要求4所述的电子装置壳体，其特征在于：所述底漆层为丙烯酸树脂漆层，环氧树脂漆层、聚氨酯树脂漆层或酚醛树脂漆层，其厚度在1-30μm之间。
6.一种电子装置壳体的制作方法，其包括如下步骤：
提供一基体；
在该基体的表面真空溅镀一纳米二氧化钛膜，该纳米二氧化钛膜为金红石相晶格结构或金红石相与锐钛矿相的混合晶格结构，其厚度在10-100nm之间。
7.如权利要求6所述的电子装置壳体的制作方法，其特征在于：溅镀该纳米二氧化钛膜的工艺条件为：本底真空度为5×10-4～9×10-4Pa，真空室内的压力为0.05～0.29Pa，真空室内氧气的分压为0.01-0.225Pa。
8.如权利要求6所述的电子装置壳体的制作方法，其特征在于：溅镀纳米二氧化钛膜时以金属钛作为靶材，靶材的电源输出功率为3000～4000W，溅镀二氧化钛膜的速率为0.3～0.5nm/S。
9.如权利要求6所述的电子装置壳体的制作方法，其特征在于：所述方法还包括在溅镀二氧化钛膜前在基体表面喷涂一底漆层的步骤。
10.如权利要求9所述的电子装置壳体的制作方法，其特征在于：所述底漆层为丙烯酸树脂漆层、环氧树脂漆层、聚氨酯树脂漆层或酚醛树脂漆层，该底漆层的厚度在1-30μm之间。
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107761066A (zh) * 2015-06-30 2018-03-06 温州市科泓机器人科技有限公司 涂覆金属复合纳米涂层的制造工艺
CN108617123A (zh) * 2018-04-12 2018-10-02 Oppo广东移动通信有限公司 电子装置及其壳体和壳体的制造方法
WO2021237468A1 (zh) * 2020-05-26 2021-12-02 王晶 一种智能化的环境温度传感器

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102111970A (zh) * 2009-12-28 2011-06-29 深圳富泰宏精密工业有限公司 电子装置壳体及其制作方法
CN103317786A (zh) * 2012-03-22 2013-09-25 中国科学院海洋研究所 一种二氧化钛纳米片/溶菌酶多层复合薄膜及其制备和应用
CN104017489B (zh) * 2014-05-29 2016-04-06 中国石油大学(华东) 一种纳米二氧化钛改性丙烯酸聚氨酯面漆及其制备方法
KR102411372B1 (ko) * 2015-01-30 2022-06-22 삼성전자주식회사 하우징, 하우징 제조 방법 및 그것을 포함하는 전자 장치
US9844160B2 (en) * 2015-09-24 2017-12-12 Cheng Uei Precision Industry Co., Ltd. Electronics housing and manufacturing method of electronics housing
CN109099538A (zh) * 2018-09-14 2018-12-28 天津市蓝碧高端科技有限公司 空气负氧离子发生体及其制作方法及空气负氧离子发生器
CN109231971A (zh) * 2018-11-13 2019-01-18 普施耐（苏州）工业技术有限公司 一种无溶剂型可喷涂的陶瓷纳米颗粒复合耐磨涂层

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6756095B2 (en) * 2001-01-10 2004-06-29 Avery Dennison Corporation Heat-sealable laminate
CN1562842A (zh) * 2004-03-25 2005-01-12 卢秀强 多层膜结构镀膜玻璃及生产方法
CN101054268A (zh) * 2007-05-24 2007-10-17 卢秀强 阳光控制低辐射、紫外线截止、光催化杀菌多功能镀膜玻璃及其制备方法
CN201082884Y (zh) * 2007-05-24 2008-07-09 江苏秀强玻璃工艺有限公司 阳光控制低辐射、紫外线截止、光催化杀菌多功能镀膜玻璃
CN101591769A (zh) * 2009-07-02 2009-12-02 复旦大学 一种C、N含量可调的共掺杂纳米TiO2薄膜的制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1781003A (en) * 1926-12-02 1930-11-11 Frigidaire Corp Refrigerating apparatus
US2792287A (en) * 1956-04-04 1957-05-14 Nat Lead Co Synthetic rutile crystal and method for making same
WO2001042140A1 (en) * 1999-12-13 2001-06-14 Jonathan Sherman Nanoparticulate titanium dioxide coatings, and processes for the production and use thereof
US7225831B2 (en) * 2003-07-25 2007-06-05 Gilmore Valve Co., Ltd. Fluid flow control valve
EP1741681B1 (en) * 2004-04-26 2012-02-29 Koa Glass Co., Ltd. Multicolor development glass vessel and process for producing the same
JP5476581B2 (ja) * 2008-06-30 2014-04-23 独立行政法人産業技術総合研究所 サーモクロミック微粒子、その分散液、その製造方法、ならびに調光性塗料、調光性フィルムおよび調光性インク
US8202820B2 (en) * 2008-08-26 2012-06-19 Northwestern University Non-stoichiometric mixed-phase titania photocatalyst
CN102111969A (zh) * 2009-12-25 2011-06-29 深圳富泰宏精密工业有限公司 电子装置壳体
CN102111970A (zh) * 2009-12-28 2011-06-29 深圳富泰宏精密工业有限公司 电子装置壳体及其制作方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6756095B2 (en) * 2001-01-10 2004-06-29 Avery Dennison Corporation Heat-sealable laminate
CN1562842A (zh) * 2004-03-25 2005-01-12 卢秀强 多层膜结构镀膜玻璃及生产方法
CN101054268A (zh) * 2007-05-24 2007-10-17 卢秀强 阳光控制低辐射、紫外线截止、光催化杀菌多功能镀膜玻璃及其制备方法
CN201082884Y (zh) * 2007-05-24 2008-07-09 江苏秀强玻璃工艺有限公司 阳光控制低辐射、紫外线截止、光催化杀菌多功能镀膜玻璃
CN101591769A (zh) * 2009-07-02 2009-12-02 复旦大学 一种C、N含量可调的共掺杂纳米TiO2薄膜的制备方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107761066A (zh) * 2015-06-30 2018-03-06 温州市科泓机器人科技有限公司 涂覆金属复合纳米涂层的制造工艺
CN108617123A (zh) * 2018-04-12 2018-10-02 Oppo广东移动通信有限公司 电子装置及其壳体和壳体的制造方法
WO2021237468A1 (zh) * 2020-05-26 2021-12-02 王晶 一种智能化的环境温度传感器

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