CN102108556B - 一种防止药液稀释和保护硅片表面的方法 - Google Patents
一种防止药液稀释和保护硅片表面的方法 Download PDFInfo
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- CN102108556B CN102108556B CN2010106200380A CN201010620038A CN102108556B CN 102108556 B CN102108556 B CN 102108556B CN 2010106200380 A CN2010106200380 A CN 2010106200380A CN 201010620038 A CN201010620038 A CN 201010620038A CN 102108556 B CN102108556 B CN 102108556B
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- silicon chip
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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CN2010106200380A CN102108556B (zh) | 2010-12-31 | 2010-12-31 | 一种防止药液稀释和保护硅片表面的方法 |
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CN2010106200380A CN102108556B (zh) | 2010-12-31 | 2010-12-31 | 一种防止药液稀释和保护硅片表面的方法 |
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CN102108556A CN102108556A (zh) | 2011-06-29 |
CN102108556B true CN102108556B (zh) | 2013-04-24 |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1175085A (zh) * | 1996-06-13 | 1998-03-04 | Memc电子材料有限公司 | 洗涤半导体晶片的方法 |
JP2001156040A (ja) * | 1999-11-26 | 2001-06-08 | Shin Etsu Handotai Co Ltd | 単結晶ウェーハの処理方法とその装置 |
CN101634027A (zh) * | 2009-08-26 | 2010-01-27 | 北京市太阳能研究所有限公司 | 一种制备单晶硅绒面的方法 |
CN101805929A (zh) * | 2010-04-02 | 2010-08-18 | 日强光伏科技有限公司 | 一种多晶硅表面制绒方法 |
JP2010275147A (ja) * | 2009-05-28 | 2010-12-09 | Sumco Corp | シリコンウェーハの結晶欠陥評価方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN101515539B (zh) * | 2008-06-17 | 2010-06-16 | 深圳深爱半导体有限公司 | 重掺杂锑硅片的减薄腐蚀方法 |
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2010
- 2010-12-31 CN CN2010106200380A patent/CN102108556B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1175085A (zh) * | 1996-06-13 | 1998-03-04 | Memc电子材料有限公司 | 洗涤半导体晶片的方法 |
JP2001156040A (ja) * | 1999-11-26 | 2001-06-08 | Shin Etsu Handotai Co Ltd | 単結晶ウェーハの処理方法とその装置 |
JP2010275147A (ja) * | 2009-05-28 | 2010-12-09 | Sumco Corp | シリコンウェーハの結晶欠陥評価方法 |
CN101634027A (zh) * | 2009-08-26 | 2010-01-27 | 北京市太阳能研究所有限公司 | 一种制备单晶硅绒面的方法 |
CN101805929A (zh) * | 2010-04-02 | 2010-08-18 | 日强光伏科技有限公司 | 一种多晶硅表面制绒方法 |
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CN102108556A (zh) | 2011-06-29 |
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Application publication date: 20110629 Assignee: Yancheng Trina Solar Technology Co., Ltd. Assignor: Changzhou Trina Solar Ltd. Contract record no.: 2013320000702 Denomination of invention: Method for preventing liquor from being diluted and protecting surface of silicon wafer Granted publication date: 20130424 License type: Exclusive License Record date: 20130926 |
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Owner name: YANCHENG TIANHE LIGHT ENERGY SCIENCE + TECHNOLOGY Free format text: FORMER OWNER: TIANHE OPTICAL ENERGY CO., LTD., CHANGZHOU Effective date: 20131211 |
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Effective date of registration: 20131211 Address after: 112 room 18, 224007 Songjiang Road, Yancheng City economic and Technological Development Zone, Jiangsu, China Patentee after: Yancheng Trina Solar Technology Co., Ltd. Address before: 213031, No. 2, Tianhe Road, Xinbei Industrial Park, Jiangsu, Changzhou Patentee before: Changzhou Trina Solar Ltd. |