CN102047072B - 近空值子孔径测量的拼接 - Google Patents
近空值子孔径测量的拼接 Download PDFInfo
- Publication number
- CN102047072B CN102047072B CN2009801198680A CN200980119868A CN102047072B CN 102047072 B CN102047072 B CN 102047072B CN 2009801198680 A CN2009801198680 A CN 2009801198680A CN 200980119868 A CN200980119868 A CN 200980119868A CN 102047072 B CN102047072 B CN 102047072B
- Authority
- CN
- China
- Prior art keywords
- wave front
- shape
- variable optical
- measurement
- wavefront
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
- G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
- G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/02—Interferometers
- G01B9/02055—Reduction or prevention of errors; Testing; Calibration
- G01B9/02056—Passive reduction of errors
- G01B9/02058—Passive reduction of errors by particular optical compensation or alignment elements, e.g. dispersion compensation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0207—Details of measuring devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Geometry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12333308P | 2008-04-08 | 2008-04-08 | |
| US61/123,333 | 2008-04-08 | ||
| PCT/US2009/002191 WO2009126269A2 (en) | 2008-04-08 | 2009-04-08 | Stitching of near-nulled subaperture measurements |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102047072A CN102047072A (zh) | 2011-05-04 |
| CN102047072B true CN102047072B (zh) | 2012-09-05 |
Family
ID=41132965
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009801198680A Active CN102047072B (zh) | 2008-04-08 | 2009-04-08 | 近空值子孔径测量的拼接 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8203719B2 (enExample) |
| EP (1) | EP2286179B1 (enExample) |
| JP (1) | JP5783899B2 (enExample) |
| KR (1) | KR101458257B1 (enExample) |
| CN (1) | CN102047072B (enExample) |
| WO (1) | WO2009126269A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104903678A (zh) * | 2012-11-30 | 2015-09-09 | Qed技术国际股份有限公司 | 集成的波前传感器和轮廓测定仪 |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5312100B2 (ja) * | 2009-03-03 | 2013-10-09 | キヤノン株式会社 | 測定方法及び測定装置 |
| EP2594896B1 (en) * | 2010-07-15 | 2016-02-10 | Canon Kabushiki Kaisha | Method and apparatus for measuring shape of surface to be inspected, and method for manufacturing optical element |
| TWI470184B (zh) * | 2011-08-20 | 2015-01-21 | Tonta Electro Optical Co Ltd | 表面輪廓偵測裝置及其對位方法以及全口徑量測資料的擷取方法 |
| US8913236B2 (en) | 2011-08-30 | 2014-12-16 | Corning Incorporated | Method and device for measuring freeform surfaces |
| CN103217125A (zh) * | 2013-03-26 | 2013-07-24 | 同济大学 | 一种基于子孔径拼接的高精度平面光学元件面型检测方法 |
| FR3009378B1 (fr) * | 2013-08-01 | 2016-12-09 | Thales Sa | Systeme de controle d'une surface optique a mesurer |
| US9435640B2 (en) | 2013-12-04 | 2016-09-06 | Zygo Corporation | Interferometer and method for measuring non-rotationally symmetric surface topography having unequal curvatures in two perpendicular principal meridians |
| NL2016625A (en) | 2015-04-20 | 2016-10-24 | Asml Netherlands Bv | Lithographic Method and Apparatus. |
| EP3190379A1 (de) | 2016-01-08 | 2017-07-12 | SwissOptic AG | Interferometrisches stitching-verfahren |
| DE102017217371A1 (de) * | 2017-09-29 | 2019-04-04 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
| CN109855560B (zh) * | 2018-12-28 | 2020-05-19 | 中国科学院长春光学精密机械与物理研究所 | 一种凸非球面反射镜面形的检测装置及检测方法 |
| CN109855561B (zh) * | 2018-12-28 | 2020-05-19 | 中国科学院长春光学精密机械与物理研究所 | 一种大口径反射镜面形的检测装置及检测方法 |
| CN110544207B (zh) * | 2019-08-29 | 2023-04-28 | 中国人民解放军国防科技大学 | 大面积微结构形貌的子孔径数据拼接方法、系统及介质 |
| CN111829445A (zh) * | 2020-07-09 | 2020-10-27 | 河海大学 | 一种基于双棱镜的高精度光学引伸计 |
| CN111829446A (zh) * | 2020-07-09 | 2020-10-27 | 河海大学 | 一种利用多个斜方棱镜的高精度双轴光学引伸计 |
| CN113049228B (zh) * | 2021-03-22 | 2023-03-24 | 中国科学院上海光学精密机械研究所 | 一种物镜波像差检测装置及检测方法 |
| KR102465766B1 (ko) * | 2021-05-04 | 2022-11-15 | 한국표준과학연구원 | 회전프리즘과 빔확장부를 이용한 광학표면의 형상오차 측정시스템 |
| US20230073048A1 (en) * | 2021-09-09 | 2023-03-09 | Meta Platforms Technologies, Llc | High-throughput testing and module integration of rotationally variant optical lens systems |
| CN114706222B (zh) * | 2022-03-31 | 2023-09-01 | 青岛虚拟现实研究院有限公司 | Vr设备镜头的光学装配方法 |
| GB2618587A (en) * | 2022-05-11 | 2023-11-15 | Adlens Ltd | Improvements in or relating to the manufacture of adjustable focal length lenses |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5757493A (en) * | 1996-10-16 | 1998-05-26 | Tropel Corporation | Interferometer with catadioptric imaging system having expanded range of numerical aperture |
| US5835217A (en) * | 1997-02-28 | 1998-11-10 | The Regents Of The University Of California | Phase-shifting point diffraction interferometer |
| US6392752B1 (en) * | 1999-06-14 | 2002-05-21 | Kenneth Carlisle Johnson | Phase-measuring microlens microscopy |
| CN1746648A (zh) * | 2005-10-31 | 2006-03-15 | 中国科学院光电技术研究所 | 一种大口径深型非球面镜检测系统 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3339970A1 (de) * | 1983-11-04 | 1985-05-15 | Karl Süss KG, Präzisionsgeräte für Wissenschaft und Industrie GmbH & Co, 8046 Garching | Einrichtung zum automatischen fokussieren von optischen geraeten |
| JPH05157532A (ja) * | 1991-11-20 | 1993-06-22 | Canon Inc | 測定用計算機ホログラム及びそれを用いた計測方法 |
| US6956657B2 (en) * | 2001-12-18 | 2005-10-18 | Qed Technologies, Inc. | Method for self-calibrated sub-aperture stitching for surface figure measurement |
| US7173691B2 (en) | 2003-12-22 | 2007-02-06 | Qed Technologies International, Inc. | Method for calibrating the geometry of a multi-axis metrology system |
| US7728987B2 (en) * | 2004-05-14 | 2010-06-01 | Carl Zeiss Smt Ag | Method of manufacturing an optical element |
| KR101427425B1 (ko) * | 2005-04-05 | 2014-08-08 | 퀘드 테크놀러지즈 인터내셔날, 인크. | 비구면을 정밀 고해상도로 측정하는 방법 |
| DE102006035022A1 (de) | 2006-07-28 | 2008-01-31 | Carl Zeiss Smt Ag | Verfahren zum Herstellen einer optischen Komponente, Interferometeranordnung und Beugungsgitter |
-
2009
- 2009-04-08 US US12/384,723 patent/US8203719B2/en active Active
- 2009-04-08 KR KR1020107024368A patent/KR101458257B1/ko active Active
- 2009-04-08 WO PCT/US2009/002191 patent/WO2009126269A2/en not_active Ceased
- 2009-04-08 CN CN2009801198680A patent/CN102047072B/zh active Active
- 2009-04-08 JP JP2011503991A patent/JP5783899B2/ja active Active
- 2009-04-08 EP EP09729531.5A patent/EP2286179B1/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5757493A (en) * | 1996-10-16 | 1998-05-26 | Tropel Corporation | Interferometer with catadioptric imaging system having expanded range of numerical aperture |
| US5835217A (en) * | 1997-02-28 | 1998-11-10 | The Regents Of The University Of California | Phase-shifting point diffraction interferometer |
| US6392752B1 (en) * | 1999-06-14 | 2002-05-21 | Kenneth Carlisle Johnson | Phase-measuring microlens microscopy |
| CN1746648A (zh) * | 2005-10-31 | 2006-03-15 | 中国科学院光电技术研究所 | 一种大口径深型非球面镜检测系统 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104903678A (zh) * | 2012-11-30 | 2015-09-09 | Qed技术国际股份有限公司 | 集成的波前传感器和轮廓测定仪 |
| CN104903678B (zh) * | 2012-11-30 | 2018-12-11 | Qed技术国际股份有限公司 | 集成的波前传感器和轮廓测定仪 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5783899B2 (ja) | 2015-09-24 |
| EP2286179A4 (en) | 2017-07-26 |
| EP2286179A2 (en) | 2011-02-23 |
| JP2011518322A (ja) | 2011-06-23 |
| KR20100134712A (ko) | 2010-12-23 |
| WO2009126269A3 (en) | 2010-01-14 |
| US20090251702A1 (en) | 2009-10-08 |
| CN102047072A (zh) | 2011-05-04 |
| EP2286179B1 (en) | 2021-05-19 |
| WO2009126269A2 (en) | 2009-10-15 |
| KR101458257B1 (ko) | 2014-11-04 |
| US8203719B2 (en) | 2012-06-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102047072B (zh) | 近空值子孔径测量的拼接 | |
| US7948638B2 (en) | Scanning interferometric methods and apparatus for measuring aspheric surfaces and wavefronts | |
| EP1869401B1 (en) | Method for accurate high-resolution measurements of aspheric surfaces | |
| EP1397640B1 (en) | Scanning interferometer for aspheric surfaces and wavefronts | |
| JP5971965B2 (ja) | 面形状計測方法、面形状計測装置、プログラム、および、光学素子の製造方法 | |
| US20010028462A1 (en) | Interferometer system and method of manufacturing projection optical system using same | |
| KR101930602B1 (ko) | 피조 간섭 측정에 의한 구면-비점수차 광학 영역의 측정 방법 | |
| US9234739B2 (en) | In situ calibration of interferometers | |
| US8913236B2 (en) | Method and device for measuring freeform surfaces | |
| WO2006091415A2 (en) | Scanning interferometer for aspheric surfaces and wavefronts | |
| US20130044332A1 (en) | Surface profile measurement apparatus and alignment method thereof and an improved sub-aperture measurement data acquisition method | |
| US20170074648A1 (en) | Method for calibrating a measuring device | |
| JP5896792B2 (ja) | 非球面計測方法、非球面計測装置および光学素子加工装置 | |
| JP2010133860A (ja) | 形状算出方法 | |
| US20100309458A1 (en) | Asphere measurement method and apparatus | |
| Burge et al. | Null test optics for the MMT and Magellan 6.5-mf/1.25 primary mirrors | |
| KR20110065365A (ko) | 비구면체 측정 방법 및 장치 | |
| O'Donohue et al. | New methods for calibrating systematic errors in interferometric measurements | |
| JP2016017744A (ja) | 非球面計測方法、非球面計測装置、プログラム、光学素子の加工装置、および、光学素子 | |
| JP6821407B2 (ja) | 計測方法、計測装置、光学機器の製造方法および光学機器の製造装置 | |
| Chen et al. | 3D profile measurement of a cylindrical surface with a multi-beam angle sensor |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |