JP5783899B2 - 近ゼロサブ開口測定のスティッチング - Google Patents

近ゼロサブ開口測定のスティッチング Download PDF

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Publication number
JP5783899B2
JP5783899B2 JP2011503991A JP2011503991A JP5783899B2 JP 5783899 B2 JP5783899 B2 JP 5783899B2 JP 2011503991 A JP2011503991 A JP 2011503991A JP 2011503991 A JP2011503991 A JP 2011503991A JP 5783899 B2 JP5783899 B2 JP 5783899B2
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wavefront
measurement
shape
variable optical
data
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Japanese (ja)
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JP2011518322A (ja
JP2011518322A5 (enExample
Inventor
マーフィー，ポール
デブリーズ，ゲイリー
ブロフィー，クリストファー
フォーブス，グレッグ
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キューイーディー・テクノロジーズ・インターナショナル・インコーポレーテッド
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Publication of JP2011518322A5 publication Critical patent/JP2011518322A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02057—Passive reduction of errors by using common path configuration, i.e. reference and object path almost entirely overlapping
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02056—Passive reduction of errors
    • G01B9/02058—Passive reduction of errors by particular optical compensation or alignment elements, e.g. dispersion compensation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0207—Details of measuring devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Geometry (AREA)
  • Dispersion Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
JP2011503991A 2008-04-08 2009-04-08 近ゼロサブ開口測定のスティッチング Active JP5783899B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12333308P 2008-04-08 2008-04-08
US61/123,333 2008-04-08
PCT/US2009/002191 WO2009126269A2 (en) 2008-04-08 2009-04-08 Stitching of near-nulled subaperture measurements

Publications (3)

Publication Number Publication Date
JP2011518322A JP2011518322A (ja) 2011-06-23
JP2011518322A5 JP2011518322A5 (enExample) 2012-06-07
JP5783899B2 true JP5783899B2 (ja) 2015-09-24

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ID=41132965

Family Applications (1)

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JP2011503991A Active JP5783899B2 (ja) 2008-04-08 2009-04-08 近ゼロサブ開口測定のスティッチング

Country Status (6)

Country Link
US (1) US8203719B2 (enExample)
EP (1) EP2286179B1 (enExample)
JP (1) JP5783899B2 (enExample)
KR (1) KR101458257B1 (enExample)
CN (1) CN102047072B (enExample)
WO (1) WO2009126269A2 (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5312100B2 (ja) * 2009-03-03 2013-10-09 キヤノン株式会社 測定方法及び測定装置
EP2594896B1 (en) * 2010-07-15 2016-02-10 Canon Kabushiki Kaisha Method and apparatus for measuring shape of surface to be inspected, and method for manufacturing optical element
TWI470184B (zh) * 2011-08-20 2015-01-21 Tonta Electro Optical Co Ltd 表面輪廓偵測裝置及其對位方法以及全口徑量測資料的擷取方法
US8913236B2 (en) 2011-08-30 2014-12-16 Corning Incorporated Method and device for measuring freeform surfaces
KR101643113B1 (ko) * 2012-11-30 2016-08-10 퀘드 테크놀러지즈 인터내셔날, 인크. 통합된 파면 센서 및 프로파일로미터
CN103217125A (zh) * 2013-03-26 2013-07-24 同济大学 一种基于子孔径拼接的高精度平面光学元件面型检测方法
FR3009378B1 (fr) * 2013-08-01 2016-12-09 Thales Sa Systeme de controle d'une surface optique a mesurer
US9435640B2 (en) 2013-12-04 2016-09-06 Zygo Corporation Interferometer and method for measuring non-rotationally symmetric surface topography having unequal curvatures in two perpendicular principal meridians
KR102043384B1 (ko) 2015-04-20 2019-11-27 에이에스엠엘 네델란즈 비.브이. 리소그래피 방법 및 장치
EP3190379A1 (de) 2016-01-08 2017-07-12 SwissOptic AG Interferometrisches stitching-verfahren
DE102017217371A1 (de) * 2017-09-29 2019-04-04 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements
CN109855560B (zh) * 2018-12-28 2020-05-19 中国科学院长春光学精密机械与物理研究所 一种凸非球面反射镜面形的检测装置及检测方法
CN109855561B (zh) * 2018-12-28 2020-05-19 中国科学院长春光学精密机械与物理研究所 一种大口径反射镜面形的检测装置及检测方法
CN110544207B (zh) * 2019-08-29 2023-04-28 中国人民解放军国防科技大学 大面积微结构形貌的子孔径数据拼接方法、系统及介质
CN111829445A (zh) * 2020-07-09 2020-10-27 河海大学 一种基于双棱镜的高精度光学引伸计
CN111829446A (zh) * 2020-07-09 2020-10-27 河海大学 一种利用多个斜方棱镜的高精度双轴光学引伸计
CN113049228B (zh) * 2021-03-22 2023-03-24 中国科学院上海光学精密机械研究所 一种物镜波像差检测装置及检测方法
KR102465766B1 (ko) * 2021-05-04 2022-11-15 한국표준과학연구원 회전프리즘과 빔확장부를 이용한 광학표면의 형상오차 측정시스템
US20230073048A1 (en) * 2021-09-09 2023-03-09 Meta Platforms Technologies, Llc High-throughput testing and module integration of rotationally variant optical lens systems
CN114706222B (zh) * 2022-03-31 2023-09-01 青岛虚拟现实研究院有限公司 Vr设备镜头的光学装配方法
GB2618587A (en) * 2022-05-11 2023-11-15 Adlens Ltd Improvements in or relating to the manufacture of adjustable focal length lenses

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3339970A1 (de) * 1983-11-04 1985-05-15 Karl Süss KG, Präzisionsgeräte für Wissenschaft und Industrie GmbH & Co, 8046 Garching Einrichtung zum automatischen fokussieren von optischen geraeten
JPH05157532A (ja) * 1991-11-20 1993-06-22 Canon Inc 測定用計算機ホログラム及びそれを用いた計測方法
US5757493A (en) * 1996-10-16 1998-05-26 Tropel Corporation Interferometer with catadioptric imaging system having expanded range of numerical aperture
US5835217A (en) * 1997-02-28 1998-11-10 The Regents Of The University Of California Phase-shifting point diffraction interferometer
US6392752B1 (en) * 1999-06-14 2002-05-21 Kenneth Carlisle Johnson Phase-measuring microlens microscopy
US6956657B2 (en) * 2001-12-18 2005-10-18 Qed Technologies, Inc. Method for self-calibrated sub-aperture stitching for surface figure measurement
US7173691B2 (en) 2003-12-22 2007-02-06 Qed Technologies International, Inc. Method for calibrating the geometry of a multi-axis metrology system
US7728987B2 (en) 2004-05-14 2010-06-01 Carl Zeiss Smt Ag Method of manufacturing an optical element
KR101393171B1 (ko) 2005-04-05 2014-05-08 퀘드 테크놀러지즈 인터내셔날, 인크. 비구면을 정밀 고해상도로 측정하는 방법
CN100580407C (zh) * 2005-10-31 2010-01-13 中国科学院光电技术研究所 一种大口径深型非球面镜检测系统
DE102006035022A1 (de) * 2006-07-28 2008-01-31 Carl Zeiss Smt Ag Verfahren zum Herstellen einer optischen Komponente, Interferometeranordnung und Beugungsgitter

Also Published As

Publication number Publication date
EP2286179B1 (en) 2021-05-19
WO2009126269A2 (en) 2009-10-15
EP2286179A4 (en) 2017-07-26
CN102047072B (zh) 2012-09-05
CN102047072A (zh) 2011-05-04
JP2011518322A (ja) 2011-06-23
KR101458257B1 (ko) 2014-11-04
EP2286179A2 (en) 2011-02-23
US8203719B2 (en) 2012-06-19
KR20100134712A (ko) 2010-12-23
US20090251702A1 (en) 2009-10-08
WO2009126269A3 (en) 2010-01-14

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